Nissan Chemical Industries, Ltd.

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G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers 304
C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors 198
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or 164
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers 163
C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors 88
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1.

METHOD FOR IMMOBILIZING LECTIN

      
Application Number JP2018015163
Publication Number 2018/190357
Status In Force
Filing Date 2018-04-11
Publication Date 2018-10-18
Owner
  • NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japan)
  • NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
  • NATIONAL UNIVERSITY CORPORATION KYOTO INSTITUTE OF TECHNOLOGY (Japan)
Inventor
  • Tateno, Hiroaki
  • Katayama, Junko
  • Matoba, Kazutaka
  • Kumada, Yoichi

Abstract

A purpose of the present invention is to provide a highly sensitive and less expensive lectin-immobilized base material (for example, a lectin plate), said lectin-immobilized base material having stable qualities and being able to be sufficiently washed after a target sugar chain-containing antigen binds thereto. Another purpose of the present invention is to provide a method for immobilizing lectin to a base material therefor. Provided are: a method whereby a lectin-peptide fusion, in which a peptide capable of adsorbing to a base material surface such as a PS tag is fused with the N-terminal side or C-terminal side of lectin capable of recognizing a target sugar chain, is immobilized on the peptide side to a base material; and a lectin-immobilized base material produced by this method. By using the lectin-immobilized base material, a target sugar chain-containing antigen can be highly sensitively and evenly measured and, moreover, target sugar chain-containing cells, etc. can be separated (concentrated and harvested).

IPC Classes  ?

  • C12N 15/09 - Recombinant DNA-technology
  • C07K 7/06 - Linear peptides containing only normal peptide links having 5 to 11 amino acids
  • C07K 14/00 - Peptides having more than 20 amino acids; Gastrins; Somatostatins; Melanotropins; Derivatives thereof
  • C07K 17/00 - Carrier-bound or immobilised peptides; Preparation thereof
  • C07K 19/00 - Hybrid peptides
  • G01N 33/53 - Immunoassay; Biospecific binding assay; Materials therefor
  • G01N 33/543 - Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals

2.

SACCHARIFICATION REACTION LIQUID, SACCHARIFICATION ENZYME COMPOSITION, PRODUCTION METHOD FOR SUGAR, AND PRODUCTION METHOD FOR ETHANOL

      
Application Number JP2017037014
Publication Number 2018/070478
Status In Force
Filing Date 2017-10-12
Publication Date 2018-04-19
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Odaka, Kazutoshi
  • Sekiguchi, Kazutoshi

Abstract

A saccharification reaction liquid for saccharification of cellulose and/or hemicellulose, the reaction liquid comprising cellulose and/or hemicellulose, a saccharification enzyme, silica or a silica-containing substance, and at least one compound (A) selected from the group consisting of polyhydric alcohol compounds represented by general formula (1) and derivatives thereof, and acetylene glycols represented by general formula (2) and alkylene oxide adducts thereof. The symbols in the chemical formulas are as defined in the description.

IPC Classes  ?

  • C13K 1/02 - Glucose; Glucose-containing syrups obtained by saccharification of cellulosic materials
  • C12P 7/10 - Ethanol, i.e. non-beverage produced as by-product or from waste or cellulosic material substrate substrate containing cellulosic material
  • C12P 19/14 - Preparation of compounds containing saccharide radicals produced by the action of a carbohydrase, e.g. by alpha-amylase

3.

LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY DEVICE

      
Application Number JP2017035120
Publication Number 2018/062353
Status In Force
Filing Date 2017-09-28
Publication Date 2018-04-05
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Mandai, Atsuhiko
  • Miyamoto, Yasuhiro
  • Ishikawa, Kazunori
  • Lee, Ju Young

Abstract

The present invention provides: a liquid crystal alignment agent which is capable of suppressing coating defects that occur in an alignment film due to the effects of a wiring structure or C/H, and suppressing a defect in which the display of a liquid crystal display device becomes non-uniform, and which has a reduced viscosity and an increased proportion of resin components; and a liquid crystal alignment film using the liquid crystal alignment agent. The present invention pertains to a liquid crystal alignment agent characterized by containing: at least one polymer selected from the group consisting of a polyimide precursor and polyimide, which is an imidized product thereof, and containing a protecting group that is removed by heat; and a solvent component containing a solvent from Group A below, a solvent from Group B below, and isobutyl ketone. The solvent from Group A is at least one solvent selected from the group consisting of N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, γ-butyrolactone, and 1,3-dimethylimidazolidinone, and the solvent from Group B is at least one solvent selected from the group consisting of butyl cellosolve, 1-butoxy-2-propanol, 2-butoxy-1-propanol, and dipropylene glycol dimethyl ether.

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

4.

METHOD FOR CONTROLLING PESTS, PHARMACEUTICAL COMPOSITION FOR CONTROLLING PESTS, AND PEST CONTROL AGENT SET

      
Application Number JP2017017400
Publication Number 2017/195734
Status In Force
Filing Date 2017-05-08
Publication Date 2017-11-16
Owner
  • NIPPON SODA CO., LTD. (Japan)
  • NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Kawaguchi, Masahiro

Abstract

Provided are: a method by which various pests can be controlled even at low dosage with no problems in safety; and a pharmaceutical composition for controlling pests and a pest control agent set, which are suitable for use in said method. This method comprises applying 3-endo-[2-propoxy-4-(trifluoromethyl)phenoxy]-9-[5-(trifluoromethyl)-2-pyridyloxy]-9-azabicyclo[3.3.1]nonane or a salt thereof, along with (Z)-4-[5-(3,5-dichlorophenyl)-4,5-dihydro-5-(trifluoromethyl)-3-isoxazolyl]-N-[(methoxyimino)methyl]-2-methylbenzamide or a salt thereof, to a subject, and controls pests.

IPC Classes  ?

  • A01N 43/80 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms, as ring hetero atoms five-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,2
  • A01N 43/90 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having two or more relevant hetero rings, condensed among themselves or with a common carbocyclic ring system
  • A01P 7/02 - Acaricides
  • A01P 7/04 - Insecticides

5.

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NAPHTHOL ARALKYL RESIN

      
Application Number JP2017015490
Publication Number 2017/183612
Status In Force
Filing Date 2017-04-17
Publication Date 2017-10-26
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Karasawa, Ryo
  • Hashimoto, Keisuke

Abstract

[Problem] To provide a resist underlayer film for lithography, which does not undergo intermixing with a resist layer, has high dry etching resistance and high heat resistance, exhibits a low mass decrease at high temperatures and exhibits even coverage of an uneven substrate; and a resist underlayer film-forming composition for forming the resist underlayer film. [Solution] A resist underlayer film-forming composition that contains a polymer containing a unit structure represented by formula (1). The unit structure represented by formula (1) is the unit structure represented by formula (2). Provided is a method for producing a semiconductor device, which includes a step of forming a resist underlayer film on a semiconductor substrate using the resist underlayer film-forming composition, a step of forming a hard mask on the resist underlayer film, a step of further forming a resist film on the hard mask, a step of forming a resist pattern by irradiating and developing the resist with light or an electron beam, a step of forming a pattern by etching the hard mask by means of the resist pattern, a step of forming a pattern by etching the underlayer film by means of the patterned hard mask, and a step of processing the semiconductor substrate by means of the patterned resist underlayer film.

IPC Classes  ?

  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • G03F 7/20 - Exposure; Apparatus therefor
  • G03F 7/26 - Processing photosensitive materials; Apparatus therefor
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or

6.

INORGANIC OXIDE MICROPARTICLES HAVING AMPHIPHILIC ORGANIC SILANE COMPOUND BONDED THERETO, ORGANIC SOLVENT DISPERSION THEREOF, AND COMPOSITION FOR FILM FORMATION

      
Application Number JP2017012159
Publication Number 2017/170275
Status In Force
Filing Date 2017-03-24
Publication Date 2017-10-05
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Murakami, Natsumi
  • Furukawa, Tomoki
  • Koyama, Yoshinari

Abstract

[Problem] To provide: a dispersion of inorganic oxide microparticles dispersed in a high concentration in a solvent; a composition for film formation having high transparency, a high refractive index, high adhesion to an underlayer, and excetional weather resistance; and an optical member. [Solution] Inorganic oxide microparticles in which an amphiphilic organic silicon compound that has one or more selected from a polyoxyethylene group, a polyoxypropylene group, and a polyoxybutylene group as a hydrophilic group and has one or more selected from a C1-18 alkylene group and a vinylene group as a hydrophobic group is bonded to the surface of modified metal oxide colloidal particles (C) having a primary particle size of 2-100 nm, the modified metal oxide colloidal particles (C) having metal oxide colloidal particles (A) that have a primary particle size of 2-60 nm as a core and having the surface of the metal oxide colloidal particles (A) coated by a coating (B) that comprises metal oxide colloidal particles having a primary particle size of 1-4 nm; and a composition for film formation, the composition containing the inorganic oxide microparticles.

IPC Classes  ?

7.

FILM FORMING COMPOSITION AND METHOD FOR PRODUCING SAME

      
Application Number JP2017012367
Publication Number 2017/170385
Status In Force
Filing Date 2017-03-27
Publication Date 2017-10-05
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kato, Taku
  • Suzuki, Masayoshi
  • Murakami, Natsumi
  • Iijima, Daiki
  • Furukawa, Tomoki
  • Koyama, Yoshinari

Abstract

The present invention provides: a film forming composition which, as a coating composition that includes a hydrolysis condensate of a hydrolyzable silane and inorganic fine particles subjected to a special dispersion treatment, has high heat resistance and transparency, exhibits a high index of refraction while enabling thickening, and has excellent preservation stability of the film forming composition; and a method for producing the film forming composition.

IPC Classes  ?

  • C01G 23/047 - Titanium dioxide
  • C01G 23/04 - Oxides; Hydroxides
  • C09D 183/02 - Polysilicates
  • C09D 183/04 - Polysiloxanes
  • C09D 185/00 - Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
  • G02B 1/10 - Optical coatings produced by application to, or surface treatment of, optical elements
  • G02B 3/00 - Simple or compound lenses

8.

NEMATICIDAL COMPOSITION AND NEMATODE CONTROL METHOD

      
Application Number JP2017013020
Publication Number 2017/170743
Status In Force
Filing Date 2017-03-29
Publication Date 2017-10-05
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Imanaka Hotaka
  • Mimori Norihiko
  • Nakahira Kunimitsu
  • Iwasa, Motoyoshi

Abstract

The present invention provides a novel pest control agent composition, particularly intended for a nematicidal agent. This nematicidal agent composition contains: one or more active ingredients A selected from oxime-substituted amide compounds represented by formula (I) or N-oxides thereof or salts thereof; and one or more active ingredients B selected from compounds having germicidal, bactericidal, insecticidal, or miticidal activity. [Wherein: G1 represents a structure represented by G1-1 and G1-2; G2 represents a structure represented by G2-1, G2-2, etc.; W represents an oxygen atom, etc.; X1 represents trifluoromethyl, etc.; Y1 represents a halogen atom, etc.; Y2 represents a hydrogen atom, etc.; Y3 represents a halogen atom, a C2-C6 alkynyl, etc.; Y4 and Y5 each independently represent a hydrogen atom, etc.; R1 represents a C1-C6 alkyl, etc.; R2 and R3 each independently represent a hydrogen atom, methyl, etc.; and R4 represents a hydrogen atom, etc.]

IPC Classes  ?

  • A01N 43/40 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
  • A01N 37/02 - Saturated carboxylic acids or thio-analogues thereof; Derivatives thereof
  • A01N 37/24 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having three bonds to hetero atoms with at the most two bonds to halogen, e.g. carboxylic acids containing the group —CO—N, e.g. carboxylic acid amides or imides; Thio-analogues thereof the nitrogen atom being directly attached to an aromatic ring system, e.g. anilides containing at least one oxygen or sulfur atom being directly attached to the same aromatic ring system
  • A01N 37/28 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having three bonds to hetero atoms with at the most two bonds to halogen, e.g. carboxylic acids containing the group —CO—N, e.g. carboxylic acid amides or imides; Thio-analogues thereof containing the group ; Thio-analogues thereof
  • A01N 37/34 - Nitriles
  • A01N 37/44 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having three bonds to hetero atoms with at the most two bonds to halogen, e.g. carboxylic acids containing at least one carboxylic group or a thio-analogue, or a derivative thereof, and a nitrogen atom attached to the same carbon skeleton by a single or double bond, this nitrogen atom not being a member of a derivative or of a thio-analogue of
  • A01N 37/46 - N-acyl derivatives
  • A01N 37/52 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having three bonds to hetero atoms with at the most two bonds to halogen, e.g. carboxylic acids containing groups, e.g. carboxylic acid amidines
  • A01N 41/10 - Sulfones; Sulfoxides
  • A01N 43/16 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atom with one hetero atom six-membered rings with oxygen as the ring hetero atom
  • A01N 43/22 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atom with one hetero atom rings with more than six members
  • A01N 43/28 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atom with two or more hetero atoms five-membered rings with two hetero atoms in positions 1,3
  • A01N 43/36 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom five-membered rings
  • A01N 43/54 - 1,3-Diazines; Hydrogenated 1,3-diazines
  • A01N 43/56 - 1,2-Diazoles; Hydrogenated 1,2-diazoles
  • A01N 43/58 - 1,2-Diazines; Hydrogenated 1,2-diazines
  • A01N 43/653 - 1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
  • A01N 43/68 - 1,3,5-Triazines, not hydrogenated and not substituted at the ring nitrogen atoms with two or three nitrogen atoms directly attached to ring carbon atoms
  • A01N 43/707 - 1,2,3- or 1,2,4-Triazines; Hydrogenated 1,2,3- or 1,2,4-triazines
  • A01N 43/76 - 1,3-Oxazoles; Hydrogenated 1,3-oxazoles
  • A01N 43/78 - 1,3-Thiazoles; Hydrogenated 1,3-thiazoles
  • A01N 43/84 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms, as ring hetero atoms six-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,4
  • A01N 43/88 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms, as ring hetero atoms six-membered rings with three ring hetero atoms
  • A01N 43/90 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having two or more relevant hetero rings, condensed among themselves or with a common carbocyclic ring system
  • A01N 47/02 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid the carbon atom having no bond to a nitrogen atom
  • A01N 47/06 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid the carbon atom having no bond to a nitrogen atom containing —O—CO—O— groups; Thio-analogues thereof
  • A01N 47/12 - Carbamic acid derivatives, i.e. containing the group —O—CO—N; Thio-analogues thereof containing a —O—CO—N group, or a thio-analogue thereof, neither directly attached to a ring nor the nitrogen atom being a member of a heterocyclic ring
  • A01N 47/24 - Carbamic acid derivatives, i.e. containing the group —O—CO—N; Thio-analogues thereof containing the groups , or ; Thio-analogues thereof
  • A01N 47/32 - Ureas or thioureas containing the groups N—CO—N or N—CS—N containing N—CO—N or N—CS—N groups directly attached to a cycloaliphatic ring
  • A01N 47/34 - Ureas or thioureas containing the groups N—CO—N or N—CS—N containing the groups , e.g. biuret; Thio-analogues thereof; Urea-aldehyde condensation products
  • A01N 47/38 - Ureas or thioureas containing the groups N—CO—N or N—CS—N containing the group N—CO—N where at least one nitrogen atom is part of a heterocyclic ring; Thio-analogues thereof
  • A01N 51/00 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds having the sequences of atoms O—N—S, X—O—S, N—N—S, O—N—N or O-halogen, regardless of the number of bonds each atom has and with no atom of these sequenc
  • A01N 53/06 - Esters containing the group , wherein the carbon atom marked with an asterisk is acyclic or part of a ring or ring system; Thio-analogues thereof the carbon atom marked with an asterisk being acyclic and directly bound to a carbon atom of a six-membered aromatic ring, e.g. benzyl esters; Thio-analogues thereof
  • A01N 57/12 - Biocides, pest repellants or attractants, or plant growth regulators containing organic phosphorus compounds having phosphorus-to-oxygen bonds or phosphorus-to-sulfur bonds containing acyclic or cycloaliphatic radicals
  • A01N 63/02 - Substances produced by, or obtained from, microorganisms or animals
  • A01P 5/00 - Nematocides
  • C07D 213/81 - Amides; Imides

9.

NONLINEAR OPTICALLY ACTIVE COPOLYMER INTO WHICH ALICYCLIC GROUP IS INTRODUCED

      
Application Number JP2017010766
Publication Number 2017/159815
Status In Force
Filing Date 2017-03-16
Publication Date 2017-09-21
Owner
  • KYUSHU UNIVERSITY (Japan)
  • NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Yokoyama, Shiyoshi
  • Miura, Hiroki
  • Maeda, Daisuke
  • Yasui, Kei
  • Kashino, Tsubasa
  • Ozawa, Masaaki

Abstract

[Problem] To provide a nonlinear optically active copolymer which has adequate orientation characteristics and can suppress relaxation of orientation of a nonlinear optical material due to heat, and a nonlinear optical material obtained using the copolymer. [Solution] A nonlinear optically active copolymer including, in the same molecule thereof, at least a repeating unit A represented by formula [1] having an adamantyl group, and a repeating unit B represented by formula [2] having a nonlinear optically active region, and an organic nonlinear optical material in which the nonlinear optically active copolymer constitutes a portion of the material. (In the formulas, R1 and R2 each independently represent a hydrogen atom or a methyl group, W represents –O- or –NH-, L1 represents *-L2-NHC(=O)O- (where * represents an end bond with W) or a C1-30 divalent hydrocarbon group which may include a single bond, an ether bond, and/or an ester bond, L2 and L3 each independently represent a C1-30 divalent hydrocarbon group which may include an ether bond and/or an ester bond, Ad represents an adamantyl group which may be substituted with a C1-5 alkyl group, and Z represents an atomic group exhibiting nonlinear optical activity.)

IPC Classes  ?

  • C08F 8/30 - Introducing nitrogen atoms or nitrogen-containing groups
  • C08F 8/34 - Introducing sulfur atoms or sulfur-containing groups
  • C08F 220/36 - Esters containing nitrogen containing oxygen in addition to the carboxy oxygen
  • G02F 1/361 - Organic materials

10.

METHOD FOR PRODUCING OPTICALLY ACTIVE AMINE COMPOUND

      
Application Number JP2017008333
Publication Number 2017/154738
Status In Force
Filing Date 2017-03-02
Publication Date 2017-09-14
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kondo Shoichi
  • Kurihara Kazunori
  • Nishimura Takuya
  • Yamamoto Akio
  • Uni Miyuki
  • Takahashi Keiji

Abstract

The present invention addresses the problem of providing a novel method for producing an optically active amine compound that is useful as an intermediate for a medicine, an agrochemical, an electronic material and the like. A method for producing an optically active amine compound without requiring a step of introducing a protecting group for an amino group or a deprotection step, said method using an enamine compound represented by formula (4) which is substituted by a C1-C3 perfluoroalkyl group such as a trifluoromethyl group as a starting raw material, and comprising reacting the enamine compound with a hydrogen gas in an alcohol solvent in the presence of an optically active ruthenium complex catalyst.

IPC Classes  ?

  • C07C 227/32 - Preparation of optical isomers by stereospecific synthesis
  • C07C 229/20 - Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated the carbon skeleton being further substituted by halogen atoms or by nitro or nitroso groups
  • B01J 31/24 - Phosphines
  • C07B 53/00 - Asymmetric syntheses
  • C07B 61/00 - Other general methods

11.

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR FORMING RESIST PATTERN USING SAME

      
Application Number JP2017006882
Publication Number 2017/154600
Status In Force
Filing Date 2017-02-23
Publication Date 2017-09-14
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ogata, Hiroto
  • Usui, Yuki
  • Tamura, Mamoru
  • Kishioka, Takahiro

Abstract

[Problem] To provide a novel composition for forming a resist underlayer film which has a high dry etching rate and functions as an anti-reflection film during light exposure, while enabling embedment of a recess having a narrow space and a high aspect ratio. [Solution] A composition for forming a resist underlayer film, which contains a copolymer having a structural unit represented by formula (1), a crosslinkable compound, a crosslinking catalyst and a solvent. (In the formula, each of R1 and R2 independently represents an alkylene group having 1-3 carbon atoms or a single bond; Z represents an -O- group, an -S- group or an -S-S- group; and Ar represents an arylene group.)

IPC Classes  ?

  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • C08G 63/58 - Cyclic ethers; Cyclic carbonates; Cyclic sulfites
  • C08G 63/688 - Polyesters containing atoms other than carbon, hydrogen, and oxygen containing sulfur
  • G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
  • G03F 7/20 - Exposure; Apparatus therefor
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or

12.

SILICA SOL CONTAINING PHENYLPHOSPHONIC ACID, AND APPLICATION FOR SAME

      
Application Number JP2017007165
Publication Number 2017/150383
Status In Force
Filing Date 2017-02-24
Publication Date 2017-09-08
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kashima, Yoshiyuki
  • Takakuma, Noriyuki
  • Shimizu, Daisuke

Abstract

[Problem] To provide a coating-forming composition for an electrical steel sheet exhibiting excellent viscosity stability, in which an increase in viscosity over time is kept gradual, and in which excellent insulation properties, corrosion resistance, adhesion, and other characteristics required in a coating for an electrical steel sheet are maintained. [Solution] A coating-forming composition for an electrical steel sheet, including colloidal silica, a phosphate, phenylphosphonic acid or a salt thereof, and an aqueous medium.

IPC Classes  ?

  • C23C 22/00 - Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
  • C09D 1/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
  • C09D 5/08 - Anti-corrosive paints
  • C09D 7/12 - Other additives

13.

POLYAMIDE RESIN COMPOSITION INCLUDING METAL SALT OF PHENYLPHOSPHONIC ACID COMPOUND

      
Application Number JP2017003170
Publication Number 2017/135189
Status In Force
Filing Date 2017-01-30
Publication Date 2017-08-10
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Odaka, Kazutoshi

Abstract

[Problem] To provide a polyamide resin composition to which is added a crystal nucleator suitable for promoting the crystallization of a polyamide resin, said composition making it possible to raise the crystallization rate and further improve the higher molding process properties in comparison with polyamide resins. [Solution] A polyamide resin composition containing a polyamide resin and a crystal nucleator that comprises a metal salt of a phenylphosphonic acid compound represented by formula [1]. (In the formula, R1 and R2 each independently represent a hydrogen atom, C1-10 alkyl group, or C2-11 alkoxycarbonyl group.)

IPC Classes  ?

  • C08L 77/00 - Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
  • C08K 5/5317 - Phosphonic compounds, e.g. R—P(:O)(OR')2

14.

AROMATIC POLYAMIDE SURFACE MODIFIER OF SILICA SOL

      
Application Number JP2017002135
Publication Number 2017/130905
Status In Force
Filing Date 2017-01-23
Publication Date 2017-08-03
Owner
  • KANAGAWA UNIVERSITY (Japan)
  • NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Yokozawa Tsutomu
  • Ebara Kazuya

Abstract

An aromatic polyamide characterized by being represented by formula (1) can be utilized as a modifier of the surface of inorganic microparticles. (In the formula, X represents a C1-10 alkylene group, R' each independently represent a C1-10 alkyl group or C6-20 aryl group, R1 and R2 each independently represent a C1-10 alkyl group, R3 each independently represent a C1-10 alkyl group or C6-20 aryl group, n represents an integer of 2 or higher, and k represents an integer of 1-3.)

IPC Classes  ?

  • C08G 69/08 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from amino carboxylic acids
  • C08K 9/00 - Use of pretreated ingredients
  • C08L 101/00 - Compositions of unspecified macromolecular compounds

15.

PRODUCTION METHOD FOR CARBON-BASED LIGHT-EMITTING MATERIAL

      
Application Number JP2017002446
Publication Number 2017/130999
Status In Force
Filing Date 2017-01-25
Publication Date 2017-08-03
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Isaji Tadayuki
  • Otani Naoki
  • Maeda Shinichi
  • Ueda Masahiro
  • Kawasaki Takeyoshi

Abstract

Provided is a production method for a carbon-based light-emitting material that generates light having a wavelength of 500 to 700 nm when exposed to excitation light having a wavelength of 300 to 600 nm. The production method comprises a step for mixing and heating a starting material containing ascorbic acid, an acid catalyst containing an inorganic acid, and a solvent.

IPC Classes  ?

  • C09K 11/08 - Luminescent, e.g. electroluminescent, chemiluminescent, materials containing inorganic luminescent materials
  • C09K 11/65 - Luminescent, e.g. electroluminescent, chemiluminescent, materials containing inorganic luminescent materials containing carbon

16.

NON-AQUEOUS INK COMPOSITIONS CONTAINING TRANSITION METAL COMPLEXES, AND USES THEREOF IN ORGANIC ELECTRONICS

      
Application Number JP2017001975
Publication Number 2017/126677
Status In Force
Filing Date 2017-01-20
Publication Date 2017-07-27
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Swisher, Robert
  • Sheina, Elena
  • Li, Sergey B.
  • Sims, Marc

Abstract

Described herein are non-aqueous ink compositions containing a polythiophene having a repeating unit complying with formula (I) described herein, a transition metal complex having at least one β-diketonate ligand, and a liquid carrier having one or more organic solvents. The present disclosure also concerns the uses of such non-aqueous ink compositions, for example, in organic electronic devices.

IPC Classes  ?

  • C09D 11/102 - Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
  • H01L 51/46 - Selection of materials
  • H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)

17.

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

      
Application Number JP2017001760
Publication Number 2017/126610
Status In Force
Filing Date 2017-01-19
Publication Date 2017-07-27
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Omura, Hiroyuki
  • Hatanaka, Tadashi
  • Takeda, Kayo
  • Yukawa, Shojiro

Abstract

[Problem] To provide a positive photosensitive resin composition which is suitable as a material for partition wall between pixels or a material for forming a patterned insulating film used in liquid crystal display elements, organic EL display elements and the like, and which enables retention of good images after curing, while being capable of maintaining high water repellency and high oil repellency even after oxygen plasma (ozone) processing and the like. [Solution] A positive photosensitive resin composition which is able to be thermally cured and contains the component (A), the component (B) and the component (C) described below and a solvent (D). Component (A): a polymer having a liquid repellent group and a quinonediazide group Component (B): an alkali-soluble resin Component (C): a 1, 2-quinonediazide compound (D) a solvent

IPC Classes  ?

  • G03F 7/023 - Macromolecular quinonediazides; Macromolecular additives, e.g. binders
  • G03F 7/004 - Photosensitive materials

18.

FLUORINE ATOM-CONTAINING COMPOUND AND USE THEREOF

      
Application Number JP2017000545
Publication Number 2017/122649
Status In Force
Filing Date 2017-01-11
Publication Date 2017-07-20
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Nakazawa Taichi
  • Endo Toshiyuki

Abstract

Provided is a fluorine atom-containing compound represented by formula (1) below (In the formula, Z represents a predetermined divalent group, each Ar independently represents a predetermined aromatic ring-containing group, and each ArF independently represents a predetermined fluorine atom-containing aryl group).

IPC Classes  ?

  • C07C 233/80 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring
  • C07C 231/02 - Preparation of carboxylic acid amides from carboxylic acids or from esters, anhydrides, or halides thereof by reaction with ammonia or amines
  • C07D 209/86 - Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
  • C09D 7/12 - Other additives
  • C09D 201/00 - Coating compositions based on unspecified macromolecular compounds
  • C09K 11/06 - Luminescent, e.g. electroluminescent, chemiluminescent, materials containing organic luminescent materials
  • H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)

19.

DIAMINE AND USE THEREOF

      
Application Number JP2017000843
Publication Number 2017/122730
Status In Force
Filing Date 2017-01-12
Publication Date 2017-07-20
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ho, Bangching
  • Ye, Chenjia
  • Kondo, Mitsumasa

Abstract

[Problem] To provide a novel diamine that produces a film having excellent flexibility and transparency and also having low retardation characteristics. [Solution] Disclosed are: a diamine characterized by being represented by formula (1-1); a polyamic acid and a polyimide obtained from said diamine; a film-forming composition including said polyimide; and a film and a flexible-device substrate which are formed therefrom. [Chem. 1] (In the formula, X represents an oxygen atom or a -NH- group, Y represents a halogen atom, a C1-5 alkyl group, a C1-5 haloalkyl group, or a C1-5 alkyl group, and n represents an integer from 0 to 4.)

IPC Classes  ?

  • C07C 219/34 - Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having amino groups and esterified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton
  • C07C 205/56 - Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups bound to carbon atoms of six-membered aromatic rings and carboxyl groups bound to acyclic carbon atoms of the carbon skeleton
  • C07C 213/02 - Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reactions involving the formation of amino groups from compounds containing hydroxy groups or etherified or esterified hydroxy groups
  • C07C 231/12 - Preparation of carboxylic acid amides by reactions not involving the formation of carboxamide groups
  • C07C 237/26 - Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups having the carbon atom of at least one of the carboxamide groups bound to a carbon atom of a ring other than a six-membered aromatic ring of the carbon skeleton of a ring being part of a condensed ring system formed by at least four rings, e.g. tetracycline
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • H05K 1/03 - Use of materials for the substrate

20.

ELECTRODE FOR ENERGY STORAGE DEVICES

      
Application Number JP2016088014
Publication Number 2017/119288
Status In Force
Filing Date 2016-12-21
Publication Date 2017-07-13
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Shibano Yuki
  • Hatanaka Tatsuya
  • Yoshimoto Takuji

Abstract

Provided is an electrode for energy storage devices, which is provided with a collector substrate, an undercoat layer that is formed on at least one surface of the collector substrate and contains carbon nanotubes, and an active material layer that is formed on the surface of the undercoat layer, and wherein the active material layer does not contain a conductive assistant.

IPC Classes  ?

  • H01M 4/13 - Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
  • H01G 11/28 - Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features arranged or disposed on a current collector; Layers or phases between electrodes and current collectors, e.g. adhesives
  • H01G 11/36 - Nanostructures, e.g. nanofibres, nanotubes or fullerenes
  • H01M 4/48 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
  • H01M 4/505 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
  • H01M 4/58 - Selection of substances as active materials, active masses, active liquids of polyanionic structures, e.g. phosphates, silicates or borates
  • H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
  • H01M 4/66 - Selection of materials

21.

LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT USING SAME

      
Application Number JP2017000178
Publication Number 2017/119461
Status In Force
Filing Date 2017-01-05
Publication Date 2017-07-13
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Konishi Reiku
  • Yamagiwa Hiroki

Abstract

Provided is a liquid crystal aligning agent which enables the achievement of a liquid crystal alignment film that maintains an adequate voltage holding ratio even after being exposed to light irradiation, without being deteriorated in the liquid crystal aligning properties. A liquid crystal aligning agent which is characterized by containing the component (A), the component (B) and the component (C) described below and an organic solvent. Component (A): at least one polymer selected from among polyimides and polyimide precursors, which are obtained using a tetracarboxylic acid derivative component and a diamine component that contains at least one diamine compound selected from among diamine compounds having a structure of formula (A-1), diamine compounds having a structure of formula (A-2) and diamine compounds having a structure of formula (A-3) Component (B): at least one polymer selected from the group consisting of polyimide precursors having a structural unit represented by formula (2) and imidized polymers of the polyimide precursors Component (C): a compound having two or more crosslinkable functional groups (In the formulae, the symbols are as defined in the description.)

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08G 73/14 - Polyamide-imides
  • C08K 5/3442 - Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

22.

ELECTRODE FOR ENERGY STORAGE DEVICES

      
Application Number JP2016088013
Publication Number 2017/119287
Status In Force
Filing Date 2016-12-21
Publication Date 2017-07-13
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Shibano Yuki
  • Hatanaka Tatsuya
  • Yoshimoto Takuji

Abstract

Provided is an electrode for energy storage devices, which is provided with: a collector substrate; an undercoat layer that is formed on at least one surface of the collector substrate and contains carbon nanotubes; and an active material layer that is formed on the surface of the undercoat layer and contains an active material which contains a titanium-containing oxide.

IPC Classes  ?

  • H01M 4/131 - Electrodes based on mixed oxides or hydroxides, or on mixtures of oxides or hydroxides, e.g. LiCoOx
  • H01G 11/28 - Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features arranged or disposed on a current collector; Layers or phases between electrodes and current collectors, e.g. adhesives
  • H01G 11/36 - Nanostructures, e.g. nanofibres, nanotubes or fullerenes
  • H01G 11/46 - Metal oxides
  • H01G 11/86 - Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
  • H01M 4/1391 - Processes of manufacture of electrodes based on mixed oxides or hydroxides, or on mixtures of oxides or hydroxides, e.g. LiCoOx
  • H01M 4/48 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
  • H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers

23.

COMPOSITION FOR FORMING SUBSTRATE FOR FLEXIBLE DEVICES

      
Application Number JP2017000147
Publication Number 2017/119450
Status In Force
Filing Date 2017-01-05
Publication Date 2017-07-13
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Koyama, Yoshinari
  • Kita, Hiroshi
  • Ye, Chenjia
  • Ho, Bangching

Abstract

[Problem] The purpose of the present invention is to provide a composition for forming a substrate for flexible devices, which forms a resin thin film characterized by having excellent heat resistance and low retardation, especially a resin thin film that is suitable as a substrate for flexible devices, and which forms a resin thin film that absorbs light beams having a specific wavelength, thereby enabling the application of a laser lift-off method. [Solution] A composition for forming a substrate for flexible devices, which contains a polyimide, titanium dioxide particles having particle diameters of from 3 nm to 200 nm, silicon dioxide particles having an average particle diameter of 100 nm or less as calculated from the specific surface area that is determined by a nitrogen adsorption method, and an organic solvent; and a resin thin film which is formed from this composition for forming a substrate for flexible devices.

IPC Classes  ?

  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08K 3/22 - Oxides; Hydroxides of metals
  • C08K 3/36 - Silica
  • H05K 1/03 - Use of materials for the substrate

24.

LIQUID CRYSTAL ALIGNING AGENT CONTAINING CROSSLINKING AGENT AND POLYMER THAT HAS SITE HAVING ISOCYANATE GROUP AND/OR BLOCKED ISOCYANATE GROUP AND SITE HAVING PHOTOREACTIVITY, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016088868
Publication Number 2017/115790
Status In Force
Filing Date 2016-12-27
Publication Date 2017-07-06
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Suzuki, Kanako
  • Moriuchi, Masato
  • Ashizawa, Ryoichi
  • Goto, Kohei

Abstract

Provided is a liquid crystal display element that can be baked at a low temperature when forming a liquid crystal alignment film capable of imparting an alignment regulating property and a pretilt angle developing property via a photoalignment method. Further provided is a liquid crystal display element in which the liquid crystal pretilt angles are highly stable, and display burn-in hardly occurs even due to long usage. Further provided are a vertical liquid crystal alignment film to be used in the liquid crystal display element, and a liquid crystal aligning agent with which it is possible to provide the vertical liquid crystal alignment film. A liquid crystal aligning agent of the present invention contains: component (A), which is a polymer including (A-1) a site having an isocyanate group and/or a blocked isocyanate group and (A-2) a site having photoreactivity; component (B), which is a compound having, in a molecule, at least two functional groups of at least one type selected from the group consisting of an amino group and a hydroxyl group; and an organic solvent.

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08F 220/36 - Esters containing nitrogen containing oxygen in addition to the carboxy oxygen
  • C08G 18/81 - Unsaturated isocyanates or isothiocyanates

25.

LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016088869
Publication Number 2017/115791
Status In Force
Filing Date 2016-12-27
Publication Date 2017-07-06
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ashizawa, Ryoichi
  • Moriuchi, Masato
  • Suzuki, Kanako
  • Goto, Kohei

Abstract

The present invention relates to a liquid crystal aligning agent which contains a polymer that has a moiety having an isocyanate group and/or a blocked isocyanate group, a moiety having a photoreactive group with photo-alignment properties, and a moiety having at least one functional group selected from among an amino group and a hydroxyl group in each molecule. The present invention provides a liquid crystal display element which enables firing at low temperatures during the formation of a liquid crystal alignment film by a photo-alignment method, said liquid crystal alignment film being able to be imparted with alignment controlling ability and pretilt angle developability.

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08F 220/36 - Esters containing nitrogen containing oxygen in addition to the carboxy oxygen
  • C08G 18/81 - Unsaturated isocyanates or isothiocyanates

26.

NANOPARTICLE-CONDUCTING POLYMER COMPOSITE FOR USE IN ORGANIC ELECTRONICS

      
Application Number JP2016005258
Publication Number 2017/115467
Status In Force
Filing Date 2016-12-28
Publication Date 2017-07-06
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Sims, Marc
  • Li, Sergey B.
  • Gaudin, Olivier
  • Pannone, Michael
  • Sheina, Elena

Abstract

Described herein are nanoparticle-conductive polymer composite films containing a polythiophene having a repeating unit complying with formula (I) described herein and one or more metallic or metalloid nanoparticles and their use, for example, in organic electronic devices. The present disclosure also concerns the use of one or more metallic or metalloid nanoparticles in organic electronic devices to improve light outcoupling leading to increased efficiency, to improve color saturation, and to improve color stability.

IPC Classes  ?

  • H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
  • C08K 3/10 - Metal compounds
  • C08K 3/20 - Oxides; Hydroxides
  • C08L 65/00 - Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
  • C09D 11/102 - Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
  • C09D 11/106 - Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
  • H01L 51/46 - Selection of materials

27.

RESIN COMPOSITION

      
Application Number JP2016085575
Publication Number 2017/110393
Status In Force
Filing Date 2016-11-30
Publication Date 2017-06-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Adachi, Isao
  • Sakaguchi, Takahiro
  • Sugawara, Yuki

Abstract

[Problem] To provide a thermosetting resin composition. [Solution] The resin composition contains a component (A), a component (B) and a solvent, and the content of the component (B) is 0.1 mass% to 5.0 mass%, based on the content of all components of the resin composition excluding the solvent. Component (A): a self-crosslinking copolymer having a structural unit represented by formula (1) and a structural unit represented by formula (2). Component (B): a compound represented by formula (3). (In the formulae: R0, in each case independently represents a hydrogen atom or a methyl group; X represents an -O- group or a -NH- group; R1 represents a single bond or an alkylene group; R2 represents an alkyl group; a represents an integer from 1 to 5; b represents an integer from 0 to 4; R3 represents a divalent organic group having an ether bond and/or an ester bond; R5 represents an alkyl group; f represents an integer from 1 to 5; g represents an integer from 0 to 4; R6 represents a single bond or an alkylene group; Y represents a single bond or an ester bond; A represents a monovalent to tetravalent organic group which may contain at least one hetero atom, or a hetero atom; and h represents an integer from 1 to 4.)

IPC Classes  ?

  • C08G 59/18 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
  • C08F 220/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
  • C08F 220/32 - Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
  • G02B 3/00 - Simple or compound lenses

28.

LIGHT-REFLECTING MATERIAL COMPOSITION INCLUDING AMMELINE

      
Application Number JP2016087831
Publication Number 2017/110755
Status In Force
Filing Date 2016-12-19
Publication Date 2017-06-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Nagahama, Noriaki
  • Saito, Masato

Abstract

[Problem] To provide a light-reflecting material composition with which it is possible to produce a light-reflecting body having high reflection characteristics not only for light in the visible light region but also for ultraviolet light having a wavelength of 400 nm or less. [Solution] A light-reflecting material composition including ammeline and a resin.

IPC Classes  ?

29.

TRIAZINE RING-CONTAINING POLYMER AND COMPOSITION FOR FILM FORMATION CONTAINING SAME

      
Application Number JP2016087959
Publication Number 2017/110810
Status In Force
Filing Date 2016-12-20
Publication Date 2017-06-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kaseyama Takahiro
  • Nishimura Naoya

Abstract

A thin film having high refractive index and excellent weather resistance is able to be formed using this triazine ring-containing polymer which contains a repeating unit structure represented by formula (1). (In formula (1), each of R and R' independently represents a hydrogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group; and Ar represents at least one moiety selected from the group consisting of moieties represented by formula (2) or formula (3).) (In formula (2) and formula (3), each of W1 and W2 independently represents CR1R2 (wherein each of R1 and R2 independently represents a hydrogen atom or an alkyl group which has 1-10 carbon atoms and may be substituted by a halogen atom (provided that R1 and R2 may combine together to form a ring)), C=O, O, S, SO or SO2.)

IPC Classes  ?

  • C08G 73/06 - Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule; Polyhydrazides; Polyamide acids or similar polyimide precursors

30.

IMPRINT MATERIAL

      
Application Number JP2016087665
Publication Number 2017/110697
Status In Force
Filing Date 2016-12-16
Publication Date 2017-06-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kobayashi, Junpei
  • Shuto, Keisuke
  • Kato, Taku
  • Suzuki, Masayoshi

Abstract

[Problem] To provide a novel imprint material. [Solution] An imprint material which contains a compound represented by formula (1) (component (A)); a compound represented by formula (2) (component (B)); a compound represented by formula (3) (component (C)); a compound represented by formula (4) (component (D)); and a photopolymerization initiator (component (E)). (In the formulae, each R1 independently represents a hydrogen atom or a methyl group; R2 represents a divalent or trivalent hydrocarbon group; j represents 0 or 1; k represents 2 or 3; X represents a divalent linking group having an ethylene oxide unit and/or a propylene oxide unit; R3 represents a hydrogen atom or an alkyl group; m represents 1 or 2; R5 represents a trivalent, tetravalent, pentavalent or hexavalent organic group which may have at least one heteroatom; n represents an integer of 3-6; and in cases where m represents 1, R4 represents an alkyl group which may be substituted by at least one substituent, and in cases where m represents 2, R4 represents an alkylene group which may be substituted by at least one substituent.)

IPC Classes  ?

  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
  • B29C 59/02 - Surface shaping, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
  • C08F 2/46 - Polymerisation initiated by wave energy or particle radiation
  • C08F 220/10 - Esters

31.

POLYAMIDE RESIN COMPOSITION INCLUDING CARBOXYLIC ACID DERIVATIVE

      
Application Number JP2016087668
Publication Number 2017/110699
Status In Force
Filing Date 2016-12-16
Publication Date 2017-06-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Odaka, Kazutoshi

Abstract

[Problem] To provide a polyamide resin composition containing an added crystal nucleator suitable for promoting the crystallization of a polyamide resin and not triggering discoloration in the resin, the polyamide resin composition being capable of raising the crystallization rate and achieving better molding process properties and heat resistance in comparison with the polyamide resin. [Solution] A polyamide resin composition including a polyamide resin and a crystal nucleator comprising a carboxylic acid derivative represented by formula [1]. B1-L1-A-L2-B2 [1] (In the formula, A represents an optionally substituted C1-6 alkylene group or C6-10 divalent aromatic group, B1 and B2 represent optionally substituted C3-6 cycloalkyl groups or optionally substituted C6-10 aromatic groups, and L1 and L2 represent -C(=O)NR1- or -C(=O)O-.)

IPC Classes  ?

  • C08L 77/00 - Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
  • C08K 5/20 - Carboxylic acid amides
  • C08L 77/02 - Polyamides derived from omega-amino carboxylic acids or from lactams thereof
  • C08L 77/06 - Polyamides derived from polyamines and polycarboxylic acids

32.

FLAME RETARDANT, HIGHLY HEAT RESISTANT POLYAMIDE COMPOSITION

      
Application Number JP2016087957
Publication Number 2017/110809
Status In Force
Filing Date 2016-12-20
Publication Date 2017-06-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Nagahama, Noriaki
  • Saito, Masato

Abstract

[Problem] To provide a nitrogen-based flame retardant having extremely few sublimation products that does not decompose even at high kneading temperatures exceeding 300°C, and a flame retardant, highly heat resistant polyamide composition containing said flame retardant. [Solution] A flame retardant, highly heat resistant polyamide composition including highly heat resistant polyamide having a glass transition temperature and/or melting point of 280°C or higher and ammeline of 90% or greater purity, and a flame retardant for highly heat resistant polyamide comprising ammeline of 90% or greater purity.

IPC Classes  ?

  • C08L 77/00 - Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
  • C08K 5/3492 - Triazines

33.

LIQUID CRYSTAL DISPLAY ELEMENT, LIQUID CRYSTAL OPTICAL ELEMENT, AND COMPOSITION FOR LIQUID CRYSTAL STRUCTURE STABILIZATION FILM

      
Application Number JP2016088295
Publication Number 2017/110976
Status In Force
Filing Date 2016-12-22
Publication Date 2017-06-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Noda, Takahiro
  • Goto, Kohei
  • Tsutsui, Kimiaki

Abstract

Provided is a liquid crystal display element which has excellent properties such as display characteristics and electrical characteristics and is suitable for use in a large-screen high-definition liquid crystal television receiver and the like. This liquid crystal display element is provided with: a polarizing plate; and a liquid crystal cell that comprises liquid crystals between substrates with a liquid crystal structure stabilization film, said substrates being arranged so that films for stabilizing a liquid crystal structure, which have an average surface roughness Ra of 1.0 nm or less and contain at least one polymer selected from the group consisting of polyamic acids containing a side chain structure, polyamic acid esters containing a side chain structure and polyimides obtained by imidizing polyamic acids or polyamic acid esters, and an additive that is capable of improving rubbing resistance, face each other.

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08L 101/00 - Compositions of unspecified macromolecular compounds
  • G02F 1/137 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering

34.

LIQUID CRYSTAL DISPLAY ELEMENT, LIQUID CRYSTAL OPTICAL ELEMENT, AND COMPOSITION FOR LIQUID CRYSTAL STRUCTURE-STABILIZING FILM

      
Application Number JP2016088296
Publication Number 2017/110977
Status In Force
Filing Date 2016-12-22
Publication Date 2017-06-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Noda, Takahiro
  • Goto, Kohei
  • Tsutsui, Kimiaki

Abstract

Provided is a liquid crystal structure-stabilizing film by which even ULH alignment is obtained without application of physical stress, in other words, a liquid crystal structure-stabilizing film having good initial ULH alignment. A ULH-mode liquid crystal display element obtained using cholesteric liquid crystal and a liquid crystal structure-stabilizing film in which a polymer for expressing anisotropy by polarized UV irradiation is used.

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • G02F 1/137 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering

35.

LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016088539
Publication Number 2017/111117
Status In Force
Filing Date 2016-12-22
Publication Date 2017-06-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Sugiyama, Takaaki
  • Goto, Kohei
  • Ashizawa, Ryoichi

Abstract

Provided is a liquid crystal alignment agent for obtaining a liquid crystal alignment film capable of reducing liquid crystal non-uniformities generated in an ODF scheme and the like. A liquid crystal alignment agent characterized in containing at least one type of polymer selected from the group consisting of: a polyamic acid obtained by reacting a tetracarboxylic acid dianhydride component and a diamine component containing a diamine having a crown ether structure and an aromatic ring, and a diamine having a side chain for expressing a liquid crystal pretilt angle; and a polyimide obtained by imidizing the polyamic acid.

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

36.

COMPOSITION INCLUDING HYDROPHOBIC CLUSTER AND CLAY MINERAL

      
Application Number JP2016087690
Publication Number 2017/104848
Status In Force
Filing Date 2016-12-16
Publication Date 2017-06-22
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Hirata, Osamu
  • Iwama, Takehisa
  • Sakata, Mizuki

Abstract

The present invention provides: a water-soluble or water-dispersible powdery composition which includes a powder obtained through dry pulverization of a mixture formed of a hydrophobic cluster (particularly, fullerene) and a clay mineral; and a method for producing the powdery composition.

IPC Classes  ?

37.

OIL-GELLING AGENT

      
Application Number JP2016086770
Publication Number 2017/099232
Status In Force
Filing Date 2016-12-09
Publication Date 2017-06-15
Owner
  • NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (Japan)
  • NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Yamanaka, Masamichi
  • Miyachi, Nobuhide

Abstract

[Problem] To provide a novel gelling agent containing a mono-urea derivative. [Solution] A gelling agent comprising a compound represented by formula [1] (in the formula, R1 represents a C2-20 straight chain or branched chain alkyl group, a C3-20 cyclic alkyl group, or a C12-20 straight chain or branched chain alkenyl group, Ar represents a C6-18 aryl group which is non-substituted or may be substituted with at least one substituent selected from the group consisting of C1-10 alkyl groups, C1-10 alkoxy groups, C6-18 aryloxy groups, a halogen atom, nitro groups, phenyl groups, C2-10 alkylcarbonyl groups, and C7-18 aralkyl groups).

IPC Classes  ?

  • C09K 3/00 - Materials not provided for elsewhere
  • A61K 8/42 - Amides
  • A61K 47/16 - Organic compounds, e.g. natural or synthetic hydrocarbons, polyolefins, mineral oil, petrolatum or ozokerite containing nitrogen
  • C07C 275/28 - Derivatives of urea, i.e. compounds containing any of the groups the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
  • C07C 275/30 - Derivatives of urea, i.e. compounds containing any of the groups the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton being further substituted by halogen atoms, or by nitro or nitroso groups
  • C07C 275/36 - Derivatives of urea, i.e. compounds containing any of the groups the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton being further substituted by singly-bound oxygen atoms having nitrogen atoms of urea groups and singly-bound oxygen atoms bound to carbon atoms of the same non-condensed six-membered aromatic ring with at least one of the oxygen atoms further bound to a carbon atom of a six-membered aromatic ring, e.g. N-aryloxyphenylureas

38.

NONAQUEOUS SECONDARY CELL

      
Application Number JP2016084898
Publication Number 2017/094598
Status In Force
Filing Date 2016-11-25
Publication Date 2017-06-08
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Hatanaka Tatsuya
  • Shibano Yuki
  • Yoshimoto Takuji

Abstract

A nonaqueous secondary cell provided with: a positive electrode provided with a positive-electrode current-collecting substrate and a positive-electrode active material layer formed thereon, the positive-electrode active material layer being able to absorb or discharge lithium; a negative electrode provided with a negative-electrode current-collecting substrate and a negative-electrode active material layer formed thereon, the negative-electrode active material layer being able to absorb or discharge lithium; a separator interposed between the positive and negative electrodes; and a nonaqueous electrolyte solution. The nonaqueous electrolyte solution contains a sulfonyl imide electrolyte and a nonaqueous organic solvent. An electroconductive protective layer obtained by dispersing an electroconductive carbon material in a binder resin is formed on one or both surfaces of the positive-electrode current-collecting substrate and/or the negative-electrode current-collecting substrate. Regardless of whether the nonaqueous electrolyte solution including the sulfonyl imide electrolyte is used, the nonaqueous secondary cell has good cycle characteristics and high output characteristics.

IPC Classes  ?

  • H01M 10/052 - Li-accumulators
  • H01M 4/136 - Electrodes based on inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy
  • H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
  • H01M 4/66 - Selection of materials
  • H01M 10/0568 - Liquid materials characterised by the solutes
  • H01M 10/0569 - Liquid materials characterised by the solvents

39.

TRIAZINE RING-CONTAINING POLYMER AND FILM-FORMING COMPOSITION CONTAINING SAME

      
Application Number JP2016085112
Publication Number 2017/094643
Status In Force
Filing Date 2016-11-28
Publication Date 2017-06-08
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Nishimura Naoya
  • Kaseyama Takahiro

Abstract

A triazine ring-containing polymer including a repeating unit structure represented, for example, by formula [4] has a high refractive index and excellent solubility in various organic solvents such as low-polarity solvents, hydrophobic solvents, and low-boiling-point solvents, and a thin film having a high refractive index and excellent transparency can be formed by using a composition including this triazine ring-containing polymer.

IPC Classes  ?

40.

DNA APTAMER BINDING TO MOLECULAR TARGETING DRUG AND METHOD FOR DETECTING MOLECULAR TARGETING DRUG USING SAME

      
Application Number JP2016085440
Publication Number 2017/094733
Status In Force
Filing Date 2016-11-29
Publication Date 2017-06-08
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Furusho, Hitoshi

Abstract

The present invention addresses the problem of providing a DNA aptamer capable of specifically binding to a molecular targeting drug, a composition comprising the DNA aptamer, and a method for detecting a molecular targeting drug using the DNA aptamer. A DNA aptamer characterized by specifically binding to a molecular targeting drug; a composition for detecting a molecular targeting drug, said composition comprising the DNA aptamer; a kit for detecting a molecular targeting drug; and a method for detecting a molecular targeting drug, said method being characterized by comprising using the DNA aptamer.

IPC Classes  ?

  • C12N 15/115 - Aptamers, i.e. nucleic acids binding a target molecule specifically and with high affinity without hybridising therewith
  • G01N 33/50 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
  • G01N 33/53 - Immunoassay; Biospecific binding assay; Materials therefor

41.

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING INDOLOCARBAZOLE NOVOLAK RESIN

      
Application Number JP2016085561
Publication Number 2017/094780
Status In Force
Filing Date 2016-11-30
Publication Date 2017-06-08
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Tokunaga, Hikaru
  • Saito, Daigo
  • Hashimoto, Keisuke
  • Sakamoto, Rikimaru

Abstract

Provided is a resist underlayer film forming composition containing a polymer including a structural unit represented by formula (1) (in formula (1), A is a divalent group including at least two amino groups, wherein the group has a condensed ring structure and is derived from a compound having an aromatic group that is substituted for a hydrogen atom on the condensed ring; each of B1 and B2 independently indicates a hydrogen atom, an alkyl group, a benzene-ring group, a condensed ring group, or a combination thereof; and, alternatively, B1 and B2 may form rings together with carbon atoms to which the aforementioned components are bonded).

IPC Classes  ?

  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • C08G 16/02 - Condensation polymers of aldehydes or ketones with monomers not provided for in the groups of aldehydes
  • G03F 7/20 - Exposure; Apparatus therefor
  • G03F 7/26 - Processing photosensitive materials; Apparatus therefor

42.

LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016085587
Publication Number 2017/094786
Status In Force
Filing Date 2016-11-30
Publication Date 2017-06-08
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Konishi, Reiku
  • Niitsu, Shinpei

Abstract

Provided is a liquid crystal aligning agent for forming a liquid crystal alignment film which is especially suitable for optical alignment, and which suppresses charge accumulation due to desymmetrization of alternating current drive and afterimages due to alternating current drive, while quickly reducing residual charge accumulated by DC voltage. A liquid crystal aligning agent which contains the following components (A) and (B). Component (A): At least one polymer selected from among polyimide precursors, which are obtained using a tetracarboxylic acid dianhydride component and a diamine component containing at least one diamine selected from among diamines having a structure of formula (A-1) and diamines having a structure of formula (A-2), and polyimides. Component (B): A polyamic acid obtained from a tetracarboxylic acid dianhydride containing a tetracarboxylic acid dianhydride represented by formula (B-1) and a diamine containing a diamine represented by formula (B-2). (In the formulae, the symbols are as defined in the description.)

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

43.

LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT EMPLOYING SAME

      
Application Number JP2016085953
Publication Number 2017/094898
Status In Force
Filing Date 2016-12-02
Publication Date 2017-06-08
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Yamagiwa, Hiroki

Abstract

Provided is a liquid crystal alignment agent with which a liquid crystal alignment film having good liquid crystal aligning properties, voltage retention rate, aging resistance, and so forth are obtained. The liquid crystal alignment agent is characterized in that the agent contains components (A) and (B) below. The component (A) is a copolymer having a structural unit represented by formula (1) and a structural unit represented by formula (2) (X1 and X2 are, independently of each other, tetravalent organic groups; Y1 and Y2 are, independently of each other, divalent organic groups; R1 is an alkyl group having 1 to 5 carbon atoms; A1 and A2 are, independently of each other, hydrogen atoms, or alkyl groups having 1 to 10 carbon atoms, alkenyl groups having 2 to 10 carbon atoms, or alkynyl groups having 2 to 10 carbon atoms, which may have a substituent). The component (B) is a compound having two or more crosslinking functional groups.

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

44.

LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016084841
Publication Number 2017/090691
Status In Force
Filing Date 2016-11-24
Publication Date 2017-06-01
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ishikawa, Kazunori
  • Sato, Natsuki

Abstract

Provided is a liquid crystal aligning agent which has excellent storage stability and is capable of providing a liquid crystal alignment film that exhibits excellent rubbing resistance, excellent liquid crystal alignment stability and quick reduction of accumulated charge, while being suppressed in flickering (namely, being at a low flicker level) immediately after driving. A liquid crystal aligning agent which contains: a polyamic acid ester having a specific repeating unit having a structure of formula (Y1-1) and a specific repeating unit having a structure of formula (Y2-1) (component A); and a polyamic acid having a specific structure (component B). (In the formulae, the symbols are as defined in the description.)

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

45.

ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION, AND RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUCH ADDITIVE

      
Application Number JP2016083116
Publication Number 2017/086213
Status In Force
Filing Date 2016-11-08
Publication Date 2017-05-26
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Nishita, Tokio
  • Sakamoto, Rikimaru

Abstract

[Problem] To provide a novel additive for a resist underlayer film-forming composition and a resist underlayer film-forming composition containing the additive. [Solution] An additive for a resist underlayer film-forming composition, which contains a copolymer having structural units represented by formula (1) to formula (3). A resist underlayer film-forming composition for lithography contains the additive, a resin that is different from the copolymer, an organic acid, a crosslinking agent and a solvent, the content of the copolymer being 3-40 parts by mass relative to 100 parts by mass of the resin. (In the formulae, R1 groups each independently denote a hydrogen atom or a methyl group, R2 denotes an alkylene group having 1-3 carbon atoms, A denotes a protecting group, R3 denotes an organic group having a lactone skeleton having a 4- to 7-membered ring, an adamantane skeleton, a tricyclodecane skeleton or a norbornane skeleton, and R4 denotes a straight chain, branched chain or cyclic organic group having 1-12 carbon atoms, in which at least 1 hydrogen atom is substituted by a fluoro group and which may further have at least 1 hydroxyl group as a substituent group.)

IPC Classes  ?

  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • C08F 220/24 - Esters containing halogen containing perhaloalkyl radicals
  • C08F 220/26 - Esters containing oxygen in addition to the carboxy oxygen
  • C08F 220/36 - Esters containing nitrogen containing oxygen in addition to the carboxy oxygen
  • C08F 220/38 - Esters containing sulfur

46.

METHOD FOR PRODUCING OLIGONUCLEOTIDE

      
Application Number JP2016084150
Publication Number 2017/086397
Status In Force
Filing Date 2016-11-17
Publication Date 2017-05-26
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Sugawara, Yudai

Abstract

Provided is a novel method for producing an oligonucleotide using a nucleoside or oligonucleotide that is easy to isolate and has high storage stability. A method for producing an oligonucleotide including a step for carrying out H-phosphonation of the 5'-hydroxy group or 3'-hydroxy group of a nucleoside or oligonucleotide that has a pseudo-solid-phase protecting group at at least one location selected from the group consisting of the 2' position, the 3' position, the 5' position, and nucleobase moieties, and that has a hydroxy group at the 5' position or the 3' position.

IPC Classes  ?

  • C07H 21/04 - Compounds containing two or more mononucleotide units having separate phosphate or polyphosphate groups linked by saccharide radicals of nucleoside groups, e.g. nucleic acids with deoxyribosyl as saccharide radical
  • C07H 19/10 - Pyrimidine radicals with the saccharide radical being esterified by phosphoric or polyphosphoric acids
  • C07H 19/20 - Purine radicals with the saccharide radical being esterified by phosphoric or polyphosphoric acids

47.

LONG-CHAIN ALKYLENE GROUP-CONTAINING EPOXY RESIN COMPOSITION

      
Application Number JP2016083398
Publication Number 2017/082356
Status In Force
Filing Date 2016-11-10
Publication Date 2017-05-18
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Suwa, Takeshi
  • Endo, Yuki
  • Tadokoro, Sayoko

Abstract

[Problem] To provide an epoxy resin composition including an epoxy compound having a low viscosity and a low dielectric constant and, when added to a general-purpose epoxy resin composition, is capable of reducing the viscosity of said composition and is capable of achieving a sufficiently reduced dielectric constant in an epoxy resin cured product obtained from said composition. [Solution] An epoxy resin composition including: (a) an epoxy component including at least an epoxy compound indicated by formula [1]; and (b) a curing agent. (In the formula, R1 to R3 each independently indicate a hydrogen atom or a methyl group and L1 to L3 each independently indicate a pentamethylene group, a hexamethylene group, or a heptamethylene group.)

IPC Classes  ?

  • C08G 59/32 - Epoxy compounds containing three or more epoxy groups
  • H05K 1/03 - Use of materials for the substrate

48.

MULTIFUNCTIONAL EPOXY COMPOUND AND CURABLE COMPOSITION CONTAINING SAME

      
Application Number JP2016080693
Publication Number 2017/077845
Status In Force
Filing Date 2016-10-17
Publication Date 2017-05-11
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Suwa, Takeshi
  • Tadokoro, Sayoko
  • Endo, Yuki
  • Ueda, Yuki

Abstract

[Problem] To provide a multifunctional epoxy compound which has a low permittivity, and, when added to a generic epoxy resin composition, can achieve a sufficient reduction in permittivity of a cured epoxy resin product obtained from the composition. [Solution] The epoxy compound is represented by formula [1]. (In the formula, R1 represents an alkyl group having 2-30 carbon atoms, R2-R4 each independently represent a hydrogen atom or an alkyl group having 1-10 carbon atoms, L represents a carbonyl group or a methylene group, A represents an aliphatic hydrocarbon group optionally including an (n+1)-valent ether bond, and n represents an integer of 2-8.)

IPC Classes  ?

  • C07D 303/24 - Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
  • C07D 301/14 - Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with organic peracids, or salts, anhydrides or esters thereof
  • C08G 59/20 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the epoxy compounds used

49.

EPOXY-BASED REACTIVE DILUENT AND EPOXY RESIN COMPOSITION INCLUDING SAME

      
Application Number JP2016080701
Publication Number 2017/077846
Status In Force
Filing Date 2016-10-17
Publication Date 2017-05-11
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ueda, Yuki
  • Endo, Yuki
  • Suwa, Takeshi

Abstract

[Problem] To provide an epoxy resin composition including a reactive diluent for an epoxy resin having low volatility, which does not reduce physical properties of a cured product such as heat resistance and curability to the extent possible, and that further can give an effect of lowering the dielectric constant. [Solution] Provided is at least one epoxy compound represented by formula [1], an epoxy resin composition including an epoxy resin, and a curable compound including the resin composition and a curing agent or an acid-generating agent. (In the formula, R1 and R2 represent a C2-27 alkyl group, and R3 a hydrogen atom or a C1-25 alkyl group, where the total number of carbon atoms of a -CR1R2R3 group is 10-30, X represents *-C(=O)O-, *CH2O-, or *-CH20C(=O)-, L represents a single bond or a C1-8 alkylene group which may include an ether bond, and E represents a group represented by formula [2] or formula [3]). (In the formulae, R4-R15 represent a hydrogen atom or a C1-10 alkyl group).

IPC Classes  ?

  • C08L 63/00 - Compositions of epoxy resins; Compositions of derivatives of epoxy resins
  • C07D 303/16 - Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by esterified hydroxyl radicals
  • C08G 59/18 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
  • C08K 5/1515 - Three-membered rings

50.

COMPOSITION FOR HOLE TRAPPING LAYER OF ORGANIC PHOTOELECTRIC CONVERSION ELEMENT

      
Application Number JP2016081285
Publication Number 2017/077883
Status In Force
Filing Date 2016-10-21
Publication Date 2017-05-11
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Yoshimoto Takuji
  • Oshima Juro
  • Sugawara Shun

Abstract

Provided is a composition for a hole trapping layer of an organic photoelectric conversion element, such composition: containing a solvent and a charge-transporting substance comprising a polyaniline derivative represented by formula (1); and providing a thin film that is suitable as a hole trapping layer of an organic photoelectric conversion element and can also be used to produce an inverse lamination type organic photoelectric conversion element. {R1-R6 each independently denote a hydrogen atom or the like, but one of the R1-R4 groups is a sulfonic acid group, one or more of the other R1-R4 groups is an alkoxy group having 1-20 carbon atoms, a thioalkoxy group having 1-20 carbon atoms, an alkyl group having 1-20 carbon atoms, an alkenyl group having 2-20 carbon atoms, an alkynyl group having 2-20 carbon atoms, a haloalkyl group having 1-20 carbon atoms, an aryl group having 6-20 carbon atoms or an aralkyl group having 7-20 carbon atoms, and m and n are numbers that satisfy the relationships 0 ≤ m ≤ 1, 0 ≤ n ≤ 1 and m+n=1.}

IPC Classes  ?

51.

PHOTOCURABLE RESIN COMPOSITION FOR MICROLENSES

      
Application Number JP2016081829
Publication Number 2017/077932
Status In Force
Filing Date 2016-10-27
Publication Date 2017-05-11
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Maeda Daisuke
  • Nishimura Naoya

Abstract

A microlens having high refractive index and low Abbe number is able to be produced by an optical nanoimprint method with use of, for example, a photocurable resin composition for microlenses, which contains a triazine ring-containing polymer comprising a repeating unit structure represented by formula (3) and having a weight average molecular weight of 500-5,000 and a reactive diluent such as N-vinyl formamide, and which does not contain a solvent.

IPC Classes  ?

  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
  • C08F 2/44 - Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
  • C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
  • C08L 79/00 - Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups
  • G02B 3/00 - Simple or compound lenses

52.

POLYMER AND RESIN COMPOSITION CONTAINING SAME

      
Application Number JP2016079507
Publication Number 2017/073268
Status In Force
Filing Date 2016-10-04
Publication Date 2017-05-04
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Sugawara, Yuki
  • Sakaguchi, Takahiro
  • Adachi, Isao

Abstract

[Problem] To provide: a resin composition which is capable of forming a cured film that has high refractive index, high transparency and high heat resistance; and a polymer which is used for this resin composition. [Solution] A polymer which has a structural unit represented by formula (1); and a resin composition which contains this polymer, a crosslinking agent and a solvent. (In the formula, each of A1 and A2 independently represents an -O- group or a -C(=O)O- group; X represents a divalent organic group having at least one aromatic ring or heterocyclic ring, and in cases where X has two or more aromatic rings or heterocyclic rings, the rings may combine together via a single bond or via a heteroatom, or may form a fused ring; and Y represents a divalent organic group having at least one aromatic ring or fused ring.)

IPC Classes  ?

53.

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LONG-CHAIN ALKYL GROUP-CONTAINING NOVOLAC

      
Application Number JP2016080575
Publication Number 2017/069063
Status In Force
Filing Date 2016-10-14
Publication Date 2017-04-27
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Saito, Daigo
  • Endo, Takafumi
  • Karasawa, Ryo
  • Sakamoto, Rikimaru

Abstract

[Problem] To provide a resist underlayer film-forming composition for obtaining improved filling performance with respect to a pattern during baking by enhancing thermal reflow property of a polymer, and thereby enabling formation of a highly flat coating film on a substrate. [Solution] This resist underlayer film-forming composition comprises a novolac resin that is obtained from a reaction between an aromatic compound (A) and an aldehyde (B) having a formyl group bound to a secondary or tertiary carbon atom of an alkyl group having 2-26 carbon atoms. The novolac resin includes a unit structure represented by formula (1) (in formula (1), A represents a divalent group derived from an aromatic compound having 6-40 carbon atoms; b1 represents an alkyl group having 1-16 carbon atoms; b2 represents a hydrogen atom or an alkyl group having 1-9 carbon atoms). "A" is a divalent group derived from an aromatic compound containing an amino group and/or a hydroxyl group. Also provided is a method for forming a resist pattern used for production of a semiconductor, the method comprising a step for forming an underlayer film by applying and baking, on a semiconductor substrate, the resist underlayer film-forming composition.

IPC Classes  ?

  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • C08G 8/10 - Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
  • C08G 12/08 - Amines aromatic
  • G03F 7/26 - Processing photosensitive materials; Apparatus therefor

54.

COMPOSITION FOR FORMING OPTICAL WAVEGUIDE

      
Application Number JP2016081325
Publication Number 2017/069262
Status In Force
Filing Date 2016-10-21
Publication Date 2017-04-27
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Nagasawa, Takehiro
  • Ohmori, Kentaro

Abstract

[Problem] To provide a composition for forming an optical waveguide, the composition having high heat resistance and low optical propagation loss in a long wavelength region, and with the composition a GI type optical waveguide can be produced. [Solution] Provided is a composition for forming an optical waveguide, the composition including: (a) 100 parts by mass of a reactive silicone compound comprising polycondensate of a diarylsilicate compound A represented by formula [1] and an alkoxysilicon compound B represented by formula [2]; and (b) 1 to 200 parts by mass of a di(meth)acrylate compound represented by formula [3]. Formula [1] (In the formula, Ar1 and Ar2 represent an optionally substituted phenyl group, a naphthyl group or a biphenyl group.) Formula [2] (In the formula, Ar3 represents a phenyl group, naphthyl group or a biphenyl group having at least one group having a polymerizable double bond; R1 represents a methyl group or an ethyl group; R2 represents a methyl group, an ethyl group or a vinylphenyl group; and a represents 2 or 3.) Formula [3] (In the formula, R3 and R4 represent a hydrogen atom or a methyl group; R5 represents a hydrogen atom, a methyl group or an ethyl group; L1 and L2 represent an alkylene group; and m and n represent 0 or a positive integer such that m + n is 0 to 20.)

IPC Classes  ?

  • G02B 6/12 - Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
  • C08F 230/08 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing a metal containing silicon
  • C08F 290/14 - Polymers provided for in subclass

55.

METHOD FOR PRODUCING PURIFIED AQUEOUS SOLUTION OF SILICIC ACID

      
Application Number JP2016080586
Publication Number 2017/069065
Status In Force
Filing Date 2016-10-14
Publication Date 2017-04-27
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Sakaida, Hiroaki
  • Ishimizu Eiichiro

Abstract

[Problem] To obtain a purified aqueous solution of silicic acid containing less metal impurities, such as Cu, Ni, and the like, by using water glass as a raw material with a purification step shorter than that in conventional methods but without using any unnecessary additives. [Solution] A method for producing a purified aqueous solution of silicic acid, the method comprising: (a) a step for passing an alkaline aqueous solution of silicic acid having a silica concentration of 0.5-10 mass% through a column loaded with a polyamine-, iminodiacetic acid-, or aminophosphoric acid-type chelating resin; and (b) a step for passing the aqueous solution passed at step (a) through a column loaded with a hydrogen-type cation exchange resin.

IPC Classes  ?

  • C01B 33/141 - Preparation of hydrosols or aqueous dispersions

56.

LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016080896
Publication Number 2017/069133
Status In Force
Filing Date 2016-10-19
Publication Date 2017-04-27
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Negi, Takayuki
  • Nagi, Tatsuya
  • Nagai, Kentaro
  • Beppu, Koichiro

Abstract

The present invention provides: a highly efficient liquid crystal alignment film having alignment control performance applied thereto and having excellent characteristics such as voltage retention rate; a polymer composition to which same is applied; and an in-plane switching liquid crystal display element. The present invention provides a production method for a substrate including the liquid crystal alignment film, said method having: a step in which a polymer composition is coated upon a substrate having a conductive film for in-plane switching and a coating film is formed, said polymer composition being obtained by causing a composition to come in contact with an ion exchange resin, said composition containing a photosensitive side-chain polymer (A) exhibiting liquid crystal properties in a prescribed temperature range and an organic solvent (B); a step in which polarized ultraviolet rays are irradiated upon the obtained coating film; and a step in which the obtained coating film is heated.

IPC Classes  ?

  • C08L 101/12 - Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
  • C08F 6/00 - Post-polymerisation treatments
  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

57.

MANUFACTURING METHOD FOR GI OPTICAL WAVEGUIDE

      
Application Number JP2016081320
Publication Number 2017/069259
Status In Force
Filing Date 2016-10-21
Publication Date 2017-04-27
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ishigure Takaaki
  • Yoshida, Sho
  • Saito, Yuki
  • Yasuhara, Kazuki
  • Nagasawa, Takehiro
  • Ohmori, Kentaro

Abstract

Provided is a manufacturing method for an optical waveguide, said method having: a first step, in which a needle-shaped part of a discharge part tip is inserted into uncured cladding; a second step, in which, while discharging an uncured material from the needle-shaped part, the needle-shaped part is moved inside the uncured cladding, and an uncured core having a periphery surrounded by the uncured cladding is formed; a third step, in which the needle-shaped part is removed from the uncured cladding; and a fourth step, in which the uncured cladding and the uncured core are cured. Therein, the uncured cladding comprises at least (a) a reactive silicone compound comprising a polycondensate of a diaryl silicic acid compound A represented by formula [1] and an alkoxy silicon compound B represented by formula [2], and (b) a composition that includes a di(meth)acrylate compound represented by formula [3], and the uncured core comprises a composition that includes (x) the reactive silicone compound and (y) an aromatic vinyl compound represented by formula [4].

IPC Classes  ?

  • G02B 6/13 - Integrated optical circuits characterised by the manufacturing method
  • C08F 230/08 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing a metal containing silicon
  • C08F 290/14 - Polymers provided for in subclass
  • G02B 6/12 - Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind

58.

THERMOSETTING RESIN COMPOSITION

      
Application Number JP2016078083
Publication Number 2017/064992
Status In Force
Filing Date 2016-09-23
Publication Date 2017-04-20
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Sakaguchi, Takahiro
  • Sugawara, Yuki
  • Adachi, Isao

Abstract

[Problem] To provide: a thermosetting resin composition; a thermosetting resin composition for protective films; a thermosetting resin composition for planarization films; and a method for producing a cured film, a protective film or a planarization film with use of one of the above-described resin compositions. [Solution] A thermosetting resin composition which contains a polymer having a structural unit represented by formula (1), from 0% by mass to 30% by mass of a curing agent relative to the polymer, and a solvent, and wherein if a curing agent is contained therein, the curing agent is at least one compound selected from the group consisting of polyfunctional (meth)acrylate compounds and polyfunctional blocked isocyanate compounds. (In the formula, A1 represents an alkenyl group or alkynyl group having 2 or 3 carbon atoms; and A2 represents an alkenylene group or alkynylene group having 2 carbon atoms.)

IPC Classes  ?

  • C08G 59/14 - Polycondensates modified by chemical after-treatment
  • C08F 290/14 - Polymers provided for in subclass
  • C08F 299/04 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
  • C08L 67/06 - Unsaturated polyesters
  • C09D 7/12 - Other additives
  • C09D 163/10 - Epoxy resins modified by unsaturated compounds

59.

LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016080407
Publication Number 2017/065226
Status In Force
Filing Date 2016-10-13
Publication Date 2017-04-20
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Soma, Saki
  • Morimoto, Yoshimichi

Abstract

The present invention provides: a liquid crystal alignment agent that makes it possible to obtain a liquid crystal alignment film that has excellent rubbing resistance, fast reduction of accumulated charge and a high alignment regulating force; a liquid crystal display element, particularly of the transverse electric field type, that has excellent display properties; and a novel diamine that constitutes the raw material of the liquid crystal alignment agent. The liquid crystal alignment agent contains a polymer that has a structure represented by formula (1) in the main chain. (R1 is hydrogen or a monovalent organic group, Ar is a phenyl group or naphthalene group that can have a substituent group, and * represents a site that bonds with another group.)

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C07D 277/42 - Amino or imino radicals substituted by hydrocarbon or substituted hydrocarbon radicals
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

60.

COATING MATERIAL FOR CHANNEL

      
Application Number JP2016080547
Publication Number 2017/065279
Status In Force
Filing Date 2016-10-14
Publication Date 2017-04-20
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Katayama, Junko
  • Hiroi, Yoshiomi
  • Aihara, Ayako
  • Abe, Natsuki
  • Nishino, Taito

Abstract

Provided are: a coating material for channels with which the inner surface of a channel can be coated by a very simple operation and which has the excellent ability to inhibit a biosubstance from adhering; a channel device and a platelet-producing channel device which each include the coating material for channels on at least some of the inner surface of the channel; and production processes therefor. The coating material for channels comprises a copolymer which comprises repeating units each including an organic group represented by the following formula (a) and repeating units each including an organic group represented by the following formula (b). The channel device and the platelet-producing channel device each include the coating material for channels on at least some of the inner surface of the channel. The production processes are for producing the devices. (In the formulae, Ua1, Ua2, Ua3, Ub1, Ub2, Ub3, and An- are as described in the description and the claims.)

IPC Classes  ?

  • C09D 201/06 - Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups containing oxygen atoms
  • A61K 35/19 - Platelets; Megacaryocytes
  • B01J 19/00 - Chemical, physical or physico-chemical processes in general; Their relevant apparatus
  • C08F 220/34 - Esters containing nitrogen
  • C08F 230/02 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing phosphorus
  • C09D 5/16 - Anti-fouling paints; Underwater paints
  • C09D 143/02 - Homopolymers or copolymers of monomers containing phosphorus
  • C12M 1/00 - Apparatus for enzymology or microbiology
  • C12M 1/26 - Inoculator or sampler
  • G01N 37/00 - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES - Details not covered by any other group of this subclass

61.

OPTICAL ELEMENT AND METHOD FOR PRODUCING SAME

      
Application Number JP2016079769
Publication Number 2017/061536
Status In Force
Filing Date 2016-10-06
Publication Date 2017-04-13
Owner
  • UNIVERSITY OF HYOGO (Japan)
  • NAGAOKA UNIVERSITY OF TECHNOLOGY (Japan)
  • NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Sasaki, Tomoyuki
  • Ono, Hiroshi
  • Kawatsuki, Nobuhiro
  • Goto, Kohei

Abstract

The present invention provides an element obtained by controlling liquid crystal alignment to achieve alignment of a discretionary state in a discretionary location in a liquid crystal element, and more specifically provides an optical element and/or a method for producing the element. The present invention provides the optical element, which has I) a first transparent base material layer, II) a first aligned liquid crystal alignment film layer, III) a liquid crystal layer filled with a photoreactive liquid crystal composition, and IV) a second transparent substrate layer in that order, wherein the photoreactive liquid crystal composition in layer III) contains: (A) a photoreactive polymer liquid crystal having a photoreactive side chain that brings about at least one type of reaction selected from the group consisting of (A-1) photocrosslinking and (A-2) photoisomerization; and (B) a low molecular weight liquid crystal.

IPC Classes  ?

  • G02F 1/13 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
  • C09K 19/20 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters
  • C09K 19/30 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing saturated or unsaturated non-aromatic rings, e.g. cyclohexane rings
  • C09K 19/32 - Non-steroidal liquid crystal compounds containing condensed ring systems, i.e. fused, bridged or spiro ring systems
  • C09K 19/38 - Polymers, e.g. polyamides
  • G02B 5/30 - Polarising elements
  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

62.

COMPOSITION FOR MANUFACTURING LIQUID-CRYSTAL ALIGNMENT FILM, LIQUID-CRYSTAL ALIGNMENT FILM USING SAME COMPOSITION AND METHOD FOR MANUFACTURING SAME, LIQUID-CRYSTAL DISPLAY ELEMENT HAVING LIQUID-CRYSTAL ALIGNMENT FILM AND METHOD FOR MANUFACTURING SAME

      
Application Number JP2016079784
Publication Number 2017/061541
Status In Force
Filing Date 2016-10-06
Publication Date 2017-04-13
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Harada, Yoshikazu

Abstract

The present invention provides a composition for manufacturing a liquid-crystal alignment film, which makes it possible to enlarge a range of light irradiation levels in which a stable alignment control ability is exhibited, thereby serving to efficiently obtain a liquid-crystal alignment film of good quality. The present invention provides a composition for manufacturing a liquid-crystal alignment film, the composition containing: (A) a side-chain polymer including a side chain that exhibits liquid crystal properties in a predetermined temperature range and that has a photoreactive group that causes photocrosslinking, photoisomerization, or photo-Fries rearrangement; (B) an organic solvent; and (C) an additive, and characterized in that the lowest triplet energy of the additive (C) is lower than the lowest triplet energy of a compound derived from the photoreactive group.

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08F 20/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
  • C08L 33/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
  • C09K 19/20 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters
  • C09K 19/30 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing saturated or unsaturated non-aromatic rings, e.g. cyclohexane rings
  • C09K 19/32 - Non-steroidal liquid crystal compounds containing condensed ring systems, i.e. fused, bridged or spiro ring systems
  • C09K 19/34 - Non-steroidal liquid crystal compounds containing at least one heterocyclic ring
  • C09K 19/38 - Polymers, e.g. polyamides
  • C09K 19/54 - Additives having no specific mesophase

63.

LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016079785
Publication Number 2017/061542
Status In Force
Filing Date 2016-10-06
Publication Date 2017-04-13
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Negi, Takayuki
  • Harada, Yoshikazu

Abstract

The present invention provides a composition for producing a liquid crystal alignment film, whereby it becomes possible to produce a high-quality liquid crystal alignment film with high efficiency by expanding the range of the amount of emitted light in which an alignment control ability can be exerted stably. The present invention provides a liquid crystal aligning agent comprising (A) a side-chain-type polymer having a side chain that can exhibit liquid crystallinity in a specific temperature range and having a photo-reactive group capable of causing photocrosslinking, photoisomerization or photo-Fries rearrangement, (B) an organic solvent, and (C) an additive represented by formula (C) (wherein Rc1 and Rc2 are substituents for a benzene ring, and independently represent a halogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a fluoroalkyl group having 1 to 10 carbon atoms, a fluoroalkenyl group having 2 to 10 carbon atoms, a fluoroalkoxy group having 1 to 10 carbon atoms, a carboxyl group, a hydroxy group, a (C1-10-alkyl)oxycarbonyl group, a cyano group or a nitro group; v and w independently represent the number of substituents on the benzene ring and independently represent an integer of 0 to 5).

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08F 20/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
  • C08K 5/00 - Use of organic ingredients
  • C08L 33/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
  • C09K 19/38 - Polymers, e.g. polyamides

64.

LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016079863
Publication Number 2017/061575
Status In Force
Filing Date 2016-10-06
Publication Date 2017-04-13
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Matsumoto, Kinya
  • Hashimoto, Jun
  • Sakumoto, Naoki
  • Mandai, Atsuhiko
  • Konishi, Reiku
  • Miyamoto, Yasuhiro

Abstract

Provided are: a liquid crystal alignment agent for obtaining a liquid crystal alignment film that is suitable for use in a photo-alignment, and that enables achieving good after-image characteristics without producing bright spots even when a negative liquid crystal is used; a liquid crystal alignment film obtained by using same; and a liquid crystal display element equipped with such a liquid crystal alignment film. The liquid crystal alignment agent for use in a photo-alignment comprises: a diamine component containing four or more types of diamines; and at least a polymer selected from the group consisting of polyimide precursors obtained from tetracarboxylic acid di-anhydride and polyimides which are imidized products of such polyimide precursors.

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

65.

LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016078687
Publication Number 2017/057496
Status In Force
Filing Date 2016-09-28
Publication Date 2017-04-06
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Mandai, Atsuhiko
  • Sakumoto, Naoki

Abstract

Provided is an in-plane switching liquid crystal display element which has good alignment properties and electrical characteristics. A liquid crystal display element that is provided with a first substrate and a second substrate, which are arranged to face each other with a liquid crystal being interposed therebetween, and which respectively have the characteristics described below. The first substrate is a substrate with electrodes, wherein: a pixel region in the liquid crystal-side surface thereof is provided with a first electrode and a plurality of second electrodes that are superposed on the first electrode, with an insulating film being interposed therebetween; one of the first electrode and each second electrode is configured to serve as a pixel electrode, while the other is configured to serve as a counter electrode; a first liquid crystal alignment film is formed on the liquid crystal-side surface of the first substrate so as to cover the second electrodes; and the first liquid crystal alignment film contains a polyimide that is imparted with liquid crystal aligning ability by means of polarized ultraviolet light irradiation. The second substrate is a substrate which has a second liquid crystal alignment film formed on the liquid crystal-side surface thereof, and wherein the second liquid crystal alignment film contains a photosensitive side chain polymer that exhibits liquid crystallinity depending on the temperature.

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08F 20/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

66.

COMPOSITION FOR FORMING RESIN THIN FILM

      
Application Number JP2016079145
Publication Number 2017/057741
Status In Force
Filing Date 2016-09-30
Publication Date 2017-04-06
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ebara, Kazuya
  • Yeh, Chengjia
  • Ho, Bangching

Abstract

[Problem] The purpose of the present invention is to provide a composition for forming a resin thin film, for obtaining a resin thin film, particularly a resin thin film that is suitable as a substrate for a flexible device, whereby the resin thin film not only has excellent heat resistance and solvent resistance, but also has the feature of low retardation. [Solution] The present invention is: a composition for forming a resin thin film, including a polyimide, silicon dioxide particles having an average particle diameter of 100 nm or less calculated from a specific surface area measured by a nitrogen adsorption method, a crosslinking agent, and an organic solvent; and a resin thin film formed from the composition for forming a resin thin film.

IPC Classes  ?

  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08K 3/36 - Silica

67.

METHOD FOR CO-CULTURING CANCER CELLS AND CANCER-SURROUNDING CELLS

      
Application Number JP2016078865
Publication Number 2017/057599
Status In Force
Filing Date 2016-09-29
Publication Date 2017-04-06
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kitahara, Masaki
  • Nishino, Taito

Abstract

The present invention provides a method for co-culturing cancer cells and cancer-surrounding cells, the method comprising culturing cancer cells, in a suspended state, and cancer-surrounding cells, in a state of being adhered to a solid phase, in a medium composition containing a structure in which cells or tissue can be suspended and cultured.

IPC Classes  ?

  • C12N 5/09 - Tumour cells
  • C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus
  • C12N 5/071 - Vertebrate cells or tissues, e.g. human cells or tissues
  • C12N 5/079 - Neural cells
  • C12Q 1/06 - Quantitative determination
  • G01N 33/15 - Medicinal preparations
  • G01N 33/48 - Biological material, e.g. blood, urine; Haemocytometers
  • G01N 33/50 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing

68.

LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016077012
Publication Number 2017/047596
Status In Force
Filing Date 2016-09-13
Publication Date 2017-03-23
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Suzuki, Kanako
  • Kawano, Yuta
  • Goto, Kohei
  • Katayama, Masaaki

Abstract

The present invention provides the following: a photo alignment method-use liquid crystal aligning agent used to obtain a photo alignment method-use liquid crystal alignment film that does not cause bright spots even when negative liquid crystals are used, and that is capable of achieving good after-image characteristics; a liquid crystal alignment film obtained from the liquid crystal aligning agent; and a liquid crystal display element provided with the liquid crystal aligning agent. Provided is the liquid crystal aligning agent which contains a polyimide or polyimide precursor obtained from a reaction between: a tetracarboxylic acid dianhydride represented by formula (1) (in the formula, X1 is as set forth in the present specification) or a derivative thereof; and a diamine component that contains a diamine represented by formula (2) (in the formula, R1, Z1 and n are as set forth in the present specification).

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

69.

POLYBENZOXAZOLE AND USE THEREOF

      
Application Number JP2016076908
Publication Number 2017/047561
Status In Force
Filing Date 2016-09-13
Publication Date 2017-03-23
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ebara Kazuya
  • Shindo Kazuya

Abstract

Provided are: a polymer for providing, by itself, without the use of inorganic components, a thin film having favorable water vapor barrier properties; and a use thereof. This polybenzoxazole is characterized by being represented by formula (2). (In the formula, R1-R13 independently represent a hydrogen atom, a halogen atom, a nitro group, a cyano group, or a C1-20 alkyl group, C2-20 alkenyl group, C2-20 alkynyl group, C6-20 aryl group, or C2-20 heteroaryl group which may be substituted with a halogen atom, and n represents an integer of 2 or greater).

IPC Classes  ?

  • C08G 73/22 - Polybenzoxazoles
  • B32B 27/00 - Layered products essentially comprising synthetic resin
  • B32B 27/40 - Layered products essentially comprising synthetic resin comprising polyurethanes

70.

METHOD FOR ROUGHENING SURFACE USING WET TREATMENT

      
Application Number JP2016077324
Publication Number 2017/047713
Status In Force
Filing Date 2016-09-15
Publication Date 2017-03-23
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Hashimoto, Keisuke
  • Someya, Yasunobu
  • Kishioka, Takahiro
  • Sakamoto, Rikimaru

Abstract

[Problem] To provide a method for roughening a substrate surface. [Solution] This surface roughening method includes: a first step for applying a composition (a3) that contains inorganic particles (a1) and an organic resin (a2) to the surface of a substrate, and then performing drying and curing to form an organic resin layer (A) on the substrate; and a second step for etching the substrate on which the organic resin layer (A) was formed using a solution that contains hydrogen fluoride, hydrogen peroxide, or an acid, whereby the surface of the substrate is roughened. In a particularly preferred embodiment: the etching is performed using a solution that contains hydrogen fluoride and ammonium fluoride, or hydrogen peroxide and ammonium; the organic resin layer (A) contains inorganic particles (a1) in a proportion of 5-50 parts by mass in relation to 100 parts by mass of the organic resin (a2); and a mixture comprising a solution of the organic resin (a2) and a silica sol or a titanium oxide sol in which silica or titanium oxide is dispersed as the inorganic particles (a1) in an organic solvent is used as the composition (a3). The present method is applicable to a light-extraction layer of an LED, or to a low-reflection glass for a solar cell.

IPC Classes  ?

  • H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
  • C03C 15/00 - Surface treatment of glass, not in the form of fibres or filaments, by etching
  • H01L 33/22 - Roughened surfaces, e.g. at the interface between epitaxial layers
  • H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
  • H05B 33/02 - Electroluminescent light sources - Details
  • H05B 33/10 - Apparatus or processes specially adapted to the manufacture of electroluminescent light sources

71.

SILICON-CONTAINING PLANARIZING PATTERN-REVERSAL COATING AGENT

      
Application Number JP2016075066
Publication Number 2017/043344
Status In Force
Filing Date 2016-08-26
Publication Date 2017-03-16
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Shigaki, Shuhei
  • Yaguchi, Hiroaki
  • Nakajima, Makoto

Abstract

[Problem] To provide a planarizing composition for a uneven substrate. [Solution] A composition coated on resist patterns and including a solvent and a modified polysiloxane wherein a polysiloxane comprising a hydrolyzed condensate of a hydrolyzable silane has some silanol groups that are capped. The proportion of silanol groups relative to total Si atoms in the modified polysiloxane is no more than 40 mol%. In this modified polysiloxane, the proportion of silanol groups in the polysiloxane is adjusted by reactions with alcohol. A production method for a semiconductor device, including: a step (1) in which a resist film is formed upon a substrate; a step (2) in which the resist film is exposed then developed and a resist pattern is formed; a step (3) in which the composition is coated upon the resist pattern during or after developing; and a step (4) in which the resist pattern is removed by etching and the pattern is reversed. The production method includes a step (3-1) in which, after step (3), the coated surface is etched back and the surface of the resist pattern is exposed.

IPC Classes  ?

  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
  • C08G 77/38 - Polysiloxanes modified by chemical after-treatment
  • C09D 7/12 - Other additives
  • C09D 183/04 - Polysiloxanes
  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • G03F 7/20 - Exposure; Apparatus therefor
  • G03F 7/40 - Treatment after imagewise removal, e.g. baking

72.

RESIST PATTERN COATING COMPOSITION INCLUDING VINYL GROUP- OR (METH) ACRYLOXY GROUP-CONTAINING POLYSILOXANE

      
Application Number JP2016076644
Publication Number 2017/043635
Status In Force
Filing Date 2016-09-09
Publication Date 2017-03-16
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Shigaki, Shuhei
  • Sakamoto, Rikimaru
  • Nakajima, Makoto
  • Shibayama, Wataru

Abstract

[Problem] To provide a coating composition for coating upon a resist pattern and reversing a pattern, in a solvent development lithography process. [Solution] A composition coated on a resist pattern and including: a polysiloxane being a hydrolysis condensate of a hydrolyzable silane; and a carboxylic acid ester solvent or an ester solvent. The hydrolyzable silane includes a vinyl group or a (meth) acryloxy group. The hydrolyzable silane contains 20-100 mol% of hydrolyzable silane including a vinyl group or a (meth) acryloxy group, relative to the total hydrolyzable silane. A production method for a semiconductor device, including: a step (1) in which a resist is coated upon a substrate; a step (2) in which the resist film is exposed then developed and a resist pattern is formed; a step (3) in which the composition is coated upon the resist pattern during or after developing; and a step (4) in which the resist pattern is removed by etching and the pattern is reversed.

IPC Classes  ?

  • G03F 7/40 - Treatment after imagewise removal, e.g. baking
  • G03F 7/20 - Exposure; Apparatus therefor
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
  • C08G 77/20 - Polysiloxanes containing silicon bound to unsaturated aliphatic groups

73.

NOVEL DIAMINE COMPOUND HAVING RADICAL GENERATION ABILITY AND BASE GENERATION ABILITY, AND NOVEL IMIDE POLYMER USING SAID NOVEL DIAMINE COMPOUND AS STARTING MATERIAL

      
Application Number JP2016074827
Publication Number 2017/038627
Status In Force
Filing Date 2016-08-25
Publication Date 2017-03-09
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kawano, Yuta
  • Ashizawa, Ryoichi

Abstract

Provided are: a novel diamine having radical generation ability and base generation ability by means of irradiation of ultraviolet light; and a novel imide polymer which uses this novel diamine as a starting material. A diamine represented by formula (1); and an imide polymer which is composed of a polyimide precursor that uses the diamine as a starting material and/or a polyimide that is obtained by imidizing the polyimide precursor. (In formula (1), each of T1 and T2 represents a single bond or a linking group such as -O-, -COO-; G represents a divalent heterocyclic group having two nitrogen atoms; each of R1 and R2 represents an alkyl group having 1-10 carbon atoms, or the like; and Q represents a group represented by formula AA.) (In formula AA, R represents a hydrogen atom or the like; and R3 represents a nitrogen atom or the like.)

IPC Classes  ?

  • C07D 295/135 - Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

74.

POLYMERIZABLE COMPOSITION COMPRISING SILSESQUIOXANE COMPOUND HAVING ACRYLIC GROUP

      
Application Number JP2016075699
Publication Number 2017/038943
Status In Force
Filing Date 2016-09-01
Publication Date 2017-03-09
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Yasui, Kei
  • Nagasawa, Takehiro
  • Kato, Taku
  • Shuto, Keisuke

Abstract

[Problem] To provide a polymerizable composition suitable for making a molded object capable of maintaining a high refractive index and capable of preventing dimensional changes and changes in transmittance caused by high temperature thermal hysteresis. [Solution] Provided are: a polymerizable composition including (a) 100 parts by mass of a specific reactive silsesquioxane compound and (b) 10 to 2000 parts by mass of a specific fluorene compound; a cured product resulting from curing the polymerizable composition; and a resin lens produced using the polymerizable composition.

IPC Classes  ?

  • C08F 220/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
  • C08F 230/08 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing a metal containing silicon
  • C08F 290/06 - Polymers provided for in subclass
  • C08G 77/20 - Polysiloxanes containing silicon bound to unsaturated aliphatic groups
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
  • G02B 3/00 - Simple or compound lenses

75.

MANUFACTURING METHOD OF LUMINOUS NANOCARBON

      
Application Number JP2016074670
Publication Number 2017/033973
Status In Force
Filing Date 2016-08-24
Publication Date 2017-03-02
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Hiejima, Yusuke
  • Hayashi, Hiromichi
  • Kanakubo, Mitsuhiro

Abstract

Provided is a manufacturing method of luminous nanocarbons capable of efficiently mass-manufacturing the luminous nanocarbons. The manufacturing method of luminous nanocarbons (Product) from a raw material aqueous solution comprising a carbon source compound and a nitrogen source compound comprises a reacting step wherein the raw material aqueous solution of a storage container (reservoir) is heated in a heating unit (furnace) of a reacting container to be reacted at a reacting temperature of at least 100 degrees Celsius and at most 500 degrees Celsius and a cooling step of cooling a reactant solution in an ice bath, the reactant solution comprising reaction products generated in the reacting step.

IPC Classes  ?

  • B82Y 30/00 - Nanotechnology for materials or surface science, e.g. nanocomposites
  • B82Y 40/00 - Manufacture or treatment of nanostructures
  • C09K 11/08 - Luminescent, e.g. electroluminescent, chemiluminescent, materials containing inorganic luminescent materials
  • C09K 11/65 - Luminescent, e.g. electroluminescent, chemiluminescent, materials containing inorganic luminescent materials containing carbon

76.

NOVEL SUGAR DERIVATIVE GELLING AGENT

      
Application Number JP2016074860
Publication Number 2017/034004
Status In Force
Filing Date 2016-08-25
Publication Date 2017-03-02
Owner
  • KYUSHU UNIVERSITY (Japan)
  • INSTITUTE OF SYSTEMS, INFORMATION TECHNOLOGIES AND NANOTECHNOLOGIES (Japan)
  • NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ono, Fumiyasu
  • Saruhashi, Koichiro
  • Hirata, Osamu
  • Shinkai, Seiji
  • Yamamoto, Tatsuhiro

Abstract

[Problem] To provide a novel gelling agent containing a sugar derivative. [Solution] A gelling agent comprising a compound represented by the formula (1) or (2). (in the formulae: R1 represents a C9-20 straight or branched alkyl, a C13-20 cyclic alkyl, or a C9-20 straight or branched alkenyl; R2 represents a hydrogen atom, a C1-10 straight or branched alkyl, or an optionally substituted aryl; and R3 and R4 represents a hydroxyl).

IPC Classes  ?

  • C07H 9/04 - Cyclic acetals
  • A61K 8/60 - Sugars; Derivatives thereof
  • A61K 47/26 - Carbohydrates, e.g. sugar alcohols, amino sugars, nucleic acids, mono-, di- or oligo-saccharides; Derivatives thereof, e.g. polysorbates, sorbitan fatty acid esters or glycyrrhizin
  • C09K 3/00 - Materials not provided for elsewhere

77.

METHOD FOR PREPARING HIGH-WATER-CONTENT EMULSION GEL USING OIL GEL-FORMING AGENT

      
Application Number JP2016074862
Publication Number 2017/034005
Status In Force
Filing Date 2016-08-25
Publication Date 2017-03-02
Owner
  • NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
  • KYUSHU UNIVERSITY (Japan)
  • INSTITUTE OF SYSTEMS, INFORMATION TECHNOLOGIES AND NANOTECHNOLOGIES (Japan)
Inventor
  • Saruhashi, Koichiro
  • Hirata, Osamu
  • Ono, Fumiyasu
  • Shinkai, Seiji
  • Yamamoto, Tatsuhiro

Abstract

[Problem] To provide a stable high-water-content W/O-type emulsion gel. [Solution] A W/O-type emulsion gel which comprises a gel-forming agent comprising a compound represented by formula (1) or (2) (wherein R1 and R3 independently represent a linear or branched alkyl group having 1 to 20 carbon atoms, a cyclic alkyl group having 3 to 20 carbon atoms, or a linear or branched alkenyl group having 2 to 20 carbon atoms; n represents an integer of 0 or 1 to 4; R2 represents a hydrogen atom, a linear or branched alkyl group having 1 to 10 carbon atoms, or an aryl group which may have a substituent; and R4 and R5 independently represent a hydroxy group), a surfactant, and a solvent mixture comprising a hydrophobic organic solvent and water, wherein the gel-forming agent is contained in an amount of 0.1 to 20% by mass relative to the mass of the solvent mixture.

IPC Classes  ?

  • A61K 8/60 - Sugars; Derivatives thereof
  • A61K 47/14 - Esters of carboxylic acids, e.g. fatty acid monoglycerides, medium-chain triglycerides, parabens or PEG fatty acid esters
  • A61K 47/26 - Carbohydrates, e.g. sugar alcohols, amino sugars, nucleic acids, mono-, di- or oligo-saccharides; Derivatives thereof, e.g. polysorbates, sorbitan fatty acid esters or glycyrrhizin
  • A61K 8/06 - Emulsions
  • A61K 8/31 - Hydrocarbons
  • A61K 8/37 - Esters of carboxylic acids
  • A61K 8/41 - Amines
  • A61K 8/49 - Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds
  • A61K 8/89 - Polysiloxanes
  • A61K 9/107 - Emulsions

78.

LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016074142
Publication Number 2017/030170
Status In Force
Filing Date 2016-08-18
Publication Date 2017-02-23
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Hayashi, Aiko
  • Ashizawa, Ryoichi

Abstract

Provided is a liquid crystal aligning agent which is especially suitable for PSA liquid crystal display elements having high response speed. A liquid crystal aligning agent which contains at least one polymer selected from the group consisting of polyamic acids obtained by reacting a diamine component containing a diamine compound having a bond dissociation energy barrier in triplet state of 30 kcal/mol or less as calculated with use of Gaussian09, preferably a diamine represented by one of formulae (2), and a tetracarboxylic acid dianhydride component and polyimide polymers obtained by imidizing the polyamic acids. (In the formulae, each of X1-X3 and X5 represents a single bond or the like; X4 represents an alkyl group having 1-18 carbon atoms, or the like; T represents an alkylene group having 1-6 carbon atoms; R1 represents an OH group or the like; each of R2-R5 represents a hydrogen atom; and Y represents a -CH2- group or the like.)

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

79.

REACTIVE SILSESQUIOXANE COMPOUND AND POLYMERIZABLE COMPOSITION CONTAINING AROMATIC VINYL COMPOUND

      
Application Number JP2016073757
Publication Number 2017/030090
Status In Force
Filing Date 2016-08-12
Publication Date 2017-02-23
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Nagasawa, Takehiro
  • Kato, Taku
  • Ohmori, Kentaro
  • Shuto, Keisuke
  • Takase, Kenji

Abstract

[Problem] To provide a polymerizable composition suitable for preparing a molded article that maintains a high refractive index and a low Abbe number while making it possible to minimize changes in size caused by a thermal history of high temperatures. [Solution] A polymerizable composition containing (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10-500 parts by mass of a specific fluorene compound, and (c) 1-100 parts by mass of a specific aromatic vinyl compound. Also provided is a cured article obtained by curing the polymerizable composition.

IPC Classes  ?

  • C08F 220/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
  • C08F 230/08 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing a metal containing silicon
  • C08F 290/06 - Polymers provided for in subclass
  • C08G 77/20 - Polysiloxanes containing silicon bound to unsaturated aliphatic groups
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

80.

NOVEL IMIDE POLYMER USED FOR LIQUID CRYSTAL ALIGNING AGENT AND LIKE

      
Application Number JP2016074141
Publication Number 2017/030169
Status In Force
Filing Date 2016-08-18
Publication Date 2017-02-23
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ashizawa, Ryoichi
  • Minami, Satoshi
  • Katayama, Masaaki

Abstract

Provided is a polyimide polymer which is especially suitable for a liquid crystal aligning agent for PSA liquid crystal display elements. At least one polyimide polymer which is selected from the group consisting of polyamic acids obtained by reacting a diamine component containing a diamine compound represented by formula (1) and a tetracarboxylic acid dianhydride component and polyimides obtained by imidizing the polyamic acids. (In the formula, X1 represents a single bond or the like; each of X2 and X3 represents a single bond, a cyclohexane ring or the like; and X4 represents an alkyl group having 1-18 carbon atoms, or the like.)

IPC Classes  ?

  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

81.

POLYESTER RESIN COMPOSITION CONTAINING AMINOTRIAZINE DERIVATIVE AND FATTY ACID

      
Application Number JP2016073454
Publication Number 2017/026486
Status In Force
Filing Date 2016-08-09
Publication Date 2017-02-16
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Nagahama, Takuma
  • Odaka, Kazutoshi

Abstract

[Problem] To provide a nucleating agent-containing polyester resin composition that accelerates crystallization of a polyester resin, that enables production of, at high productivity without causing a plate-out, a polyester resin molding capable of maintaining high transparency even after crystallization, and that can be used in a wide range of use applications. [Solution] A polyester resin composition containing 100 parts by mass of a polyester resin, 0.01-10 parts by mass of a 2-amino-1,3,5-triazine derivative represented by formula [1], and 0.01-10 parts by mass of a fatty acid having 14-30 carbon atoms, and a polyester resin molded object obtained through crystallization of the polyester resin composition (in the formula: R1 and R2 each independently represent -C(=O)R5, -C(=O)OR6, -C(=O)NR7R8, or -SO2R9; R3 and R4 each independently represent a hydrogen atom, an alkyl group having 1-6 carbon atoms, -C(=O)R5, -C(=O)OR6, -C(=O)NR7R8, or -SO2R9; R5, R6, and R9 each independently represent an alkyl group having 1-20 carbon atoms or a phenyl group optionally substituted with an alkyl group having 1-6 carbon atoms; and R7 and R8 each independently represent a hydrogen atom, an alkyl group having 1-20 carbon atoms, or a phenyl group optionally substituted with an alkyl group having 1-6 carbon atoms).

IPC Classes  ?

  • C08L 67/00 - Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
  • C08K 5/09 - Carboxylic acids; Metal salts thereof; Anhydrides thereof
  • C08K 5/3492 - Triazines
  • C08L 67/04 - Polyesters derived from hydroxy carboxylic acids, e.g. lactones
  • C08L 101/16 - Compositions of unspecified macromolecular compounds the macromolecular compounds being biodegradable

82.

GLASS SUBSTRATE SUITABLE FOR COVER GLASS, ETC., OF MOBILE DISPLAY DEVICE

      
Application Number JP2016072214
Publication Number 2017/022638
Status In Force
Filing Date 2016-07-28
Publication Date 2017-02-09
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ota, Shotaro
  • Iinuma, Yosuke
  • Eguchi, Kazuki

Abstract

Provided is a glass substrate suitable particularly as a cover glass or the like for a mobile display device, the glass substrate having high scratch resistance and smoothness, good visibility, and low reflectance. A glass substrate having, between a fluorine coating layer on a front surface side and a DLC layer on a substrate side, an intermediate layer containing a polysiloxane obtained by polycondensation of an alkoxy silane including an alkoxy silane represented by formula (1) and, as needed, an alkoxy silane represented by formula (2). (1): R1[Si(OR2)3]P (In formula (1), R1 represents a C1-12 hydrocarbon group substituted by a ureido group, R2 represents a C1-5 alkyl group, and p represents an integer of 1 or 2.) (2): (R3)nSi(OR4)4-n (In formula (2), R3 represents a hydrogen atom or a C1-8 hydrocarbon group which may be substituted by a hetero atom, a halogen atom, a vinyl group, an amino group, a glycidoxy group, a mercapto group, a methacryloxy group, an isocyanate group, or an acryloxy group, R4 represents a C1-5 alkyl group, and n represents an integer of 0-3.)

IPC Classes  ?

  • G02B 1/14 - Protective coatings, e.g. hard coatings
  • B32B 9/00 - Layered products essentially comprising a particular substance not covered by groups
  • B32B 17/10 - Layered products essentially comprising sheet glass, or fibres of glass, slag or the like comprising glass as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
  • B32B 27/00 - Layered products essentially comprising synthetic resin
  • C03C 17/42 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
  • C09D 5/00 - Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
  • C09D 183/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
  • G02B 1/18 - Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

83.

LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016072209
Publication Number 2017/022636
Status In Force
Filing Date 2016-07-28
Publication Date 2017-02-09
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Yamagiwa, Hiroki
  • Hori, Takao

Abstract

Provided are a polyamic acid ester capable of exhibiting various types of characteristics at high levels even when being blended with various polyamic acids, and a polyamic acid ester/polyamic acid blend-based liquid crystal alignment agent. This liquid crystal alignment agent contains: a polyamic acid ester (A) having a repeating unit represented by formula (1) and a repeating unit represented by formula (2); and a polyamic acid (B) (the definitions of the signs in the formulae are as described in the specification).

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

84.

LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT

      
Application Number JP2016072279
Publication Number 2017/018501
Status In Force
Filing Date 2016-07-29
Publication Date 2017-02-02
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Nagi, Tatsuya

Abstract

The present invention relates to a polymer composition which contains (A) a photosensitive side-chain polymer that exhibits liquid crystallinity in a predetermined temperature range and has a repeating unit comprising a vertically aligning group, and (B) an organic solvent. The present invention provides: a liquid crystal alignment film which has excellent tilt angle characteristics, while being provided with alignment controllability with high efficiency; a polymer composition which enables the achievement of this liquid crystal alignment film; a twisted nematic liquid crystal display element; and a vertical field switching mode liquid crystal display element.

IPC Classes  ?

  • C08L 101/02 - Compositions of unspecified macromolecular compounds characterised by the presence of specified groups
  • C08F 20/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
  • C08K 5/00 - Use of organic ingredients
  • C09K 19/38 - Polymers, e.g. polyamides
  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

85.

COLLECTOR FOR ENERGY STORAGE DEVICE, ELECTRODE FOR ENERGY STORAGE DEVICE, AND ENERGY STORAGE DEVICE

      
Application Number JP2016071223
Publication Number 2017/018287
Status In Force
Filing Date 2016-07-20
Publication Date 2017-02-02
Owner
  • NATIONAL UNIVERSITY CORPORATION UNIVERSITY OF FUKUI (Japan)
  • NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Shimada Naoki
  • Asai Hanako
  • Nakane Koji
  • Ogata Nobuo
  • Shibano Yuki
  • Kojima Keisuke

Abstract

Provided is a collector for an energy storage device, said collector being provided with a conductive nanofiber aggregation that is provided with: an aggregation of nanofibers having an average diameter of 50-2,000 nm and configured to contain (a) a thermoplastic resin, (b) a hyperbranched polymer that has an ammonium group at a molecular terminal, while having a weight average molecular weight of 1,000-5,000,000, and (c) fine metal particles; and a copper plating layer formed on part or all of the surface of the aggregation of nanofibers.

IPC Classes  ?

  • H01M 4/66 - Selection of materials
  • H01G 11/68 - Current collectors characterised by their material
  • H01G 11/70 - Current collectors characterised by their structure
  • H01G 11/86 - Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes

86.

ARTIFICIAL NUCLEOSIDE, ARTIFICIAL NUCLEOTIDE, AND ARTIFICIAL OLIGONUCLEOTIDE

      
Application Number JP2016071637
Publication Number 2017/018360
Status In Force
Filing Date 2016-07-22
Publication Date 2017-02-02
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Iriyama, Yusuke

Abstract

Provided is an artificial nucleoside, or artificial nucleotide, that is a compound represented by formula (I) or a salt thereof. In formula (I), Bx is a pyrimidine base, thioxopyrimidine base, or purine base, R1, R2, R3 and R4 are hydrogen atoms, C1-6 alkyl groups, and the like, and Z1 and Z2 are hydrogen atoms, hydroxyl-group protecting groups, phosphorus-containing groups, and the like.

IPC Classes  ?

  • C07H 19/067 - Pyrimidine radicals with ribosyl as the saccharide radical
  • C07H 19/167 - Purine radicals with ribosyl as the saccharide radical
  • C07H 21/02 - Compounds containing two or more mononucleotide units having separate phosphate or polyphosphate groups linked by saccharide radicals of nucleoside groups, e.g. nucleic acids with ribosyl as saccharide radical
  • A61K 31/7068 - Compounds having saccharide radicals and heterocyclic rings having nitrogen as a ring hetero atom, e.g. nucleosides, nucleotides containing six-membered rings with nitrogen as a ring hetero atom containing condensed or non-condensed pyrimidines having oxo groups directly attached to the pyrimidine ring, e.g. cytidine, cytidylic acid
  • A61K 31/7072 - Compounds having saccharide radicals and heterocyclic rings having nitrogen as a ring hetero atom, e.g. nucleosides, nucleotides containing six-membered rings with nitrogen as a ring hetero atom containing condensed or non-condensed pyrimidines having oxo groups directly attached to the pyrimidine ring, e.g. cytidine, cytidylic acid having two oxo groups directly attached to the pyrimidine ring, e.g. uridine, uridylic acid, thymidine, zidovudine
  • A61K 31/7076 - Compounds having saccharide radicals and heterocyclic rings having nitrogen as a ring hetero atom, e.g. nucleosides, nucleotides containing six-membered rings with nitrogen as a ring hetero atom containing condensed or non-condensed pyrimidines containing purines, e.g. adenosine, adenylic acid
  • A61K 31/708 - Compounds having saccharide radicals and heterocyclic rings having nitrogen as a ring hetero atom, e.g. nucleosides, nucleotides containing six-membered rings with nitrogen as a ring hetero atom containing condensed or non-condensed pyrimidines containing purines, e.g. adenosine, adenylic acid having oxo groups directly attached to the purine ring system, e.g. guanosine, guanylic acid
  • A61K 31/712 - Nucleic acids or oligonucleotides having modified sugars, i.e. other than ribose or 2'-deoxyribose
  • A61K 48/00 - Medicinal preparations containing genetic material which is inserted into cells of the living body to treat genetic diseases; Gene therapy
  • C12N 15/09 - Recombinant DNA-technology

87.

NON-AQUEOUS INK COMPOSITIONS CONTAINING METALLIC NANOPARTICLES SUITABLE FOR USE IN ORGANIC ELECTRONICS

      
Application Number US2016041046
Publication Number 2017/014945
Status In Force
Filing Date 2016-07-06
Publication Date 2017-01-26
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Wang, Jing
  • Li, Sergey, B.
  • Difalco, Laura
  • Decampo, Floryan
  • Chen, Shilei

Abstract

Described herein are non-aqueous ink compositions containing a polythiophene having a repeating unit complying with formula (I) described herein, one or more metallic nanoparticles, and a liquid carrier having one or more organic solvents. The present disclosure also concerns the uses of such non-aqueous ink compositions, for example, in organic electronic devices.

IPC Classes  ?

  • C09D 11/03 - Printing inks characterised by features other than the chemical nature of the binder
  • C09D 11/037 - Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
  • H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof

88.

NON-AQUEOUS INK COMPOSITIONS CONTAINING METALLOID NANOPARTICLES SUITABLE FOR USE IN ORGANIC ELECTRONICS

      
Application Number US2016041048
Publication Number 2017/014946
Status In Force
Filing Date 2016-07-06
Publication Date 2017-01-26
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Wang, Jing
  • Sheina, Elena
  • Swisher, Robert
  • Decampo, Floryan
  • Skillman, Carolyn
  • Li, Sergey, B.

Abstract

Described herein are non-aqueous ink compositions containing a polythiophene having a repeating unit complying with Formula (I) described below, one or more metalloid nanoparticles, and a liquid carrier having one or more organic solvents. The present disclosure also concerns the uses of such non-aqueous ink compositions, for example, in organic electronic devices. Formula (I) wherein R1 and R2 are each, independently, H, alkyl, fluoroalkyl, alkoxy, aryloxy, or -O-[Z-O]p-Re;wherein Z is an optionally halogenated hydrocarbylene group, p is equal to or greater than 1, and Re is H, alkyl, fluoroalkyl, or aryl.

IPC Classes  ?

  • C09D 11/10 - Printing inks based on artificial resins
  • C09D 11/03 - Printing inks characterised by features other than the chemical nature of the binder
  • C09D 11/106 - Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds

89.

COMPOSITION FOR PRODUCING LIQUID CRYSTAL ALIGNMENT FILM, LIQUID CRYSTAL ALIGNMENT FILM USING SAID COMPOSITION AND PRODUCTION METHOD THEREFOR, AND LIQUID CRYSTAL DISPLAY ELEMENT HAVING LIQUID CRYSTAL ALIGNMENT FILM AND PRODUCTION METHOD THEREFOR

      
Application Number JP2016069849
Publication Number 2017/006922
Status In Force
Filing Date 2016-07-05
Publication Date 2017-01-12
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Moriuchi, Masato

Abstract

The present invention provides a composition for producing a liquid crystal alignment film, said composition widening the range of light exposure in which alignment control capability is evenly produced, and allowing a high-quality liquid crystal alignment film to be efficiently obtained. The present invention provides a composition for producing a liquid crystal alignment film, said composition including (A) a photosensitive side-chain polymer that exhibits liquid crystallinity within a predetermined temperature range and (B) an organic solvent, said composition including a compound having a structure as expressed in formula (I). (In the formula, C1, C2, C3, and C4 each independently represent a phenyl group, a biphenyl group, or a naphthyl group, any of which may have a substituent group; P1 and P2 each independently represent *-N=N-* (where, * represents a bonding site for C1, C2, C3, or C4); L represents a straight-chain or branched-chain alkylene group that has a carbon number of 1-15 and may have a substituent group; n1 represents an integer from 0 to 5; and m4 represents an integer from 1 to 5.)

IPC Classes  ?

  • G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
  • C08F 20/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
  • C08F 20/36 - Esters containing nitrogen containing oxygen in addition to the carboxy oxygen

90.

ION COMPLEX MATERIAL HAVING ABILITY TO INHIBIT ADHESION OF BIOLOGICAL MATERIALS, AND METHOD FOR PRODUCING SAME

      
Application Number JP2016069602
Publication Number 2017/006850
Status In Force
Filing Date 2016-07-01
Publication Date 2017-01-12
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Hiroi, Yoshiomi
  • Endo, Masahisa
  • Abe, Natsuki
  • Nishino, Taito

Abstract

The present invention provides a copolymer or the like obtained by polymerizing a monomer mixture that includes at least compounds represented by formulas (A) and (B) (in the formulas, Ta, Tb, Qa, Qb, Ra, Rb, Ua1, Ua2, Ua3, Ub1, Ub2, Ub3, An−, and m are as defined in the description and claims). This copolymer can be used as an ion complex material having an exceptional ability to inhibit adhesion of biological materials.

IPC Classes  ?

  • C08F 230/02 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing phosphorus
  • C09D 5/16 - Anti-fouling paints; Underwater paints
  • C09D 201/02 - Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups

91.

IMPRINT MATERIAL

      
Application Number JP2016066010
Publication Number 2017/002506
Status In Force
Filing Date 2016-05-31
Publication Date 2017-01-05
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kobayashi, Junpei
  • Kato, Taku
  • Shuto, Keisuke
  • Suzuki, Masayoshi

Abstract

[Problem] To provide a novel imprint material. [Solution] An imprint material which contains the component (A), component (B), component (C) and component (D) described below. (A) a compound represented by formula (1) (B) a compound represented by formula (2) (C) a compound represented by formula (3) (D) a photopolymerization initiator (In the formulae, each R1 independently represents a hydrogen atom or a methyl group; R2 represents a hydrocarbon group having 1-5 carbon atoms, which may have a hydroxy group as a substituent; m represents 2 or 3; X represents a divalent linking group having an ethylene oxide unit and/or a propylene oxide unit; R3 represents a hydrogen atom or an alkyl group having 1-3 carbon atoms; n represents 1 or 2; in cases where n is 1, R4 represents an alkyl group having 1-12 carbon atoms, which may be substituted by at least one substituent; and in cases where n is 2, R4 represents an alkylene group having 1-12 carbon atoms, which may be substituted by at least one substituent.)

IPC Classes  ?

  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
  • B29C 59/02 - Surface shaping, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
  • C08F 2/44 - Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
  • C08F 220/26 - Esters containing oxygen in addition to the carboxy oxygen
  • C08F 283/12 - Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass on to polysiloxanes
  • C08F 290/06 - Polymers provided for in subclass

92.

COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM AND COMPRISING EPOXY ADDUCT HAVING LONG-CHAIN ALKYL GROUP

      
Application Number JP2016068283
Publication Number 2017/002653
Status In Force
Filing Date 2016-06-20
Publication Date 2017-01-05
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Endo, Takafumi
  • Saito, Daigo
  • Karasawa, Ryo
  • Sakamoto, Rikimaru

Abstract

[Problem] To provide a composition for forming a resist underlayer film for the formation of a highly smooth coating on a substrate. [Solution] A composition for forming a resist underlayer film and comprising an epoxy adduct (C) obtained by reacting an epoxy group-containing compound (A), and an epoxy adduct-forming compound (B), wherein an alkyl group having a carbon number of at least 3 and optionally having a branch is included in compound (A) and/or compound (B). The epoxy adduct-forming compound (B) is one selected from the group consisting of a carboxylic acid (B1), a carboxylic acid anhydride (B2), a phenol compound (B3), a hydroxyl group-containing compound (B4), a thiol compound (B5), an amino compound (B6), and an imide compound (B7). The alkyl group having a carbon number of at least 3 and optionally having a branch can be included in the epoxy adduct-forming compound (B). The alkyl group optionally having a branch can have a carbon number of 3-19.

IPC Classes  ?

  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or

93.

METHOD FOR PRODUCING CYCLODEXTRIN DERIVATIVE, AND POLYMER THEREOF

      
Application Number JP2016069601
Publication Number 2017/002955
Status In Force
Filing Date 2016-07-01
Publication Date 2017-01-05
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Yoshino, Hironobu

Abstract

The present invention addresses the problem of providing a method for efficiently producing a desired cyclodextrin derivative at high yield and high purity, and a polymer in which this cyclodextrin derivative is used. Provided are: a method for producing a cyclodextrin derivative, the method including reacting an aminated cyclodextrin derivative shown by formula (B) with an acylating agent in the presence of a protic solvent and an aliphatic amine to obtain an amidated product shown by formula (A), and subsequently purifying the resulting amidated product as necessary; and a polymer in which the resulting high-purity amidated product is used (in the formulas, n, R1, R2, and X are as described in the specification and claims).

IPC Classes  ?

94.

PHOTOCURABLE RESIN COMPOSITION

      
Application Number JP2016067824
Publication Number 2016/208472
Status In Force
Filing Date 2016-06-15
Publication Date 2016-12-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Ohashi, Takuya
  • Enomoto, Tomoyuki

Abstract

[Problem] To provide a novel photocurable resin composition. [Solution] A photocurable resin composition which contains: a polymer which has a weight average molecular weight of from 1,000 to 50,000 and comprises a structural unit represented by formula (1), while having a structure represented by formula (2) at an end; a radical photopolymerization initiator; and a solvent. (In the formulae, X represents an alkyl group having 1-6 carbon atoms, a vinyl group, an allyl group or a glycidyl group; each of m and n independently represents 0 or 1; Q represents a divalent hydrocarbon group having 1-16 carbon atoms; Z represents a divalent linking group having 1-4 carbon atoms, and the divalent linking group is bonded to an -O- group in formula (1); and R1 represents a hydrogen atom or a methyl group.)

IPC Classes  ?

  • C08F 290/06 - Polymers provided for in subclass
  • G03F 7/004 - Photosensitive materials
  • G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
  • G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable

95.

STICK-SHAPED SUBSTRATE CONTAINING LIPID-PEPTIDE-TYPE COMPOUND

      
Application Number JP2016067551
Publication Number 2016/208442
Status In Force
Filing Date 2016-06-13
Publication Date 2016-12-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kashino, Tsubasa
  • Imoto, Takayuki

Abstract

[Problem] To provide an external skin preparation solid substrate exhibiting high breaking strength and usable as a stick-shaped substrate or the like. [Solution] An external skin preparation solid substrate containing: a lipid-peptide-type compound comprising one or more types selected from among a compound represented by formula (1), a compound similar thereto, or a pharmaceutically usable salt thereof; a surfactant; water; and 1,3-alkanediol. (In the formula, R1 represents a C9-23 aliphatic group, R2 represents a hydrogen atom or a C1-4 alkyl group that may have a C1 or C2 branched chain, R3 represents a -(CH2)n-X group, n represents a number from 1 to 4, and X represents an amino group, a guanidino group, a -CONH2 group, or a five-membered or six-membered ring group which may have 1 to 3 nitrogen atoms or a condensed heterocyclic group configured from the five-membered ring and the six-membered ring.)

IPC Classes  ?

96.

METHOD FOR ADJUSTING HARDNESS OF STICK-SHAPED SUBSTRATE CONTAINING LIPID-PEPTIDE-TYPE COMPOUND

      
Application Number JP2016067693
Publication Number 2016/208460
Status In Force
Filing Date 2016-06-14
Publication Date 2016-12-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Kashino, Tsubasa

Abstract

[Problem] To provide a method for adjusting the hardness of a stick-shaped substrate containing a lipid-peptide-type compound. [Solution] A method for adjusting the hardness of a gelled external skin preparation solid substrate that contains a surfactant, water, and a lipid-peptide-type compound comprising a compound represented by formula (1) or the like, the method being characterized by involving: a step for setting the pH of a solution to a slightly acidic or neutral level by adding a pH control agent to a solution in which the external skin preparation solid substrate is dissolved, or to a solution that contains a surfactant, water, and a lipid-peptide-type compound comprising one or more of the compounds represented by formulas (1)-(3) or pharmaceutically usable salts thereof; and thereafter, a step for forming an external skin preparation solid substrate by gelling the solution. (In the formula, R1 represents a C9-23 aliphatic group, R2 represents a hydrogen atom or the like, R3 represents a -(CH2)n-X group, n represents a number from 1 to 4, and X represents an amino group or the like.)

IPC Classes  ?

  • A61K 8/64 - Proteins; Peptides; Derivatives or degradation products thereof
  • A61K 8/02 - Cosmetics or similar toiletry preparations characterised by special physical form
  • A61Q 19/00 - Preparations for care of the skin

97.

STICK-SHAPED SUBSTRATE CONTAINING LIPID-PEPTIDE-TYPE COMPOUND

      
Application Number JP2016067828
Publication Number 2016/208473
Status In Force
Filing Date 2016-06-15
Publication Date 2016-12-29
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kashino, Tsubasa
  • Imoto, Takayuki

Abstract

[Problem] To provide an external skin preparation solid substrate exhibiting high breaking strength and excellent thermal stability, and usable as a stick-shaped substrate or the like. [Solution] An external skin preparation solid substrate containing: a lipid-peptide-type compound comprising one or more types selected from among a compound represented by formula (1), a compound similar thereto, or a pharmaceutically usable salt thereof; a surfactant; water; and a C8-30 saturated or unsaturated monovalent alcohol. (In the formula, R1 represents a C9-23 aliphatic group, R2 represents a hydrogen atom or a C1-4 alkyl group that may have a C1 or C2 branched chain, R3 represents a -(CH2)n-X group, n represents a number from 1 to 4, and X represents an amino group, a guanidino group, a -CONH2 group, or a five-membered or six-membered ring which may have 1 to 3 nitrogen atoms or a condensed heterocycle configured from the five-membered ring and the six-membered ring.)

IPC Classes  ?

  • A61K 47/42 - Proteins; Polypeptides; Degradation products thereof; Derivatives thereof, e.g. albumin, gelatin or zein
  • A61K 8/34 - Alcohols
  • A61K 8/64 - Proteins; Peptides; Derivatives or degradation products thereof
  • A61K 8/86 - Polyethers
  • A61K 9/06 - Ointments; Bases therefor
  • A61K 31/167 - Amides, e.g. hydroxamic acids having aromatic rings, e.g. colchicine, atenolol, progabide having the nitrogen atom of a carboxamide group directly attached to the aromatic ring, e.g. lidocaine, paracetamol
  • A61K 31/506 - Pyrimidines; Hydrogenated pyrimidines, e.g. trimethoprim not condensed and containing further heterocyclic rings
  • A61K 47/10 - Alcohols; Phenols; Salts thereof, e.g. glycerol; Polyethylene glycols [PEG]; Poloxamers; PEG/POE alkyl ethers
  • A61K 47/12 - Carboxylic acids; Salts or anhydrides thereof
  • A61K 47/14 - Esters of carboxylic acids, e.g. fatty acid monoglycerides, medium-chain triglycerides, parabens or PEG fatty acid esters
  • A61K 47/24 - Organic compounds, e.g. natural or synthetic hydrocarbons, polyolefins, mineral oil, petrolatum or ozokerite containing atoms other than carbon, hydrogen, oxygen, halogen, nitrogen or sulfur, e.g. cyclomethicone or phospholipids
  • A61Q 1/00 - Make-up preparations; Body powders; Preparations for removing make-up
  • A61Q 19/00 - Preparations for care of the skin

98.

CHARGE-TRANSPORTING VARNISH AND ORGANIC ELECTROLUMINESCENT ELEMENT

      
Application Number JP2016067306
Publication Number 2016/204079
Status In Force
Filing Date 2016-06-10
Publication Date 2016-12-22
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Nakazawa Taichi
  • Endo Toshiyuki
  • Takayama Yuki

Abstract

Provided is a charge-transporting varnish which comprises an amide compound containing fluorine atoms and represented by formula (1) and a charge-transporting substance. [In the formula, Ar1 represents a group represented by any of formulae (1-1) to (1-9) and Ar2 and Ar3 each represent a given fluorinated aryl or aralkyl group.]

IPC Classes  ?

  • H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
  • C07C 233/75 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring

99.

POLYMER FOR GEL FORMATION AND DERMATOLOGICAL ADHESIVE MATERIAL

      
Application Number JP2016068029
Publication Number 2016/204258
Status In Force
Filing Date 2016-06-17
Publication Date 2016-12-22
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
  • Kashino, Tsubasa
  • Iwama, Takehisa
  • Shibata, Masashi

Abstract

A dermatological adhesive material that is a liquid composition including (a) a copolymer that includes monomer units (I) having a polyalkylene glycol skeleton with a degree of polymerization of 2-100 in a side chain and monomer units (II) having a C3-30 branched alkyl group in a side chain, (b) water, and (c) an oily component, and changes into a gel on the skin. A hydrogel having excellent tight adhesiveness to the skin surface on the skin and adhesiveness to the skin can be formed by applying this dermatological adhesive material to skin.

IPC Classes  ?

  • C08F 290/06 - Polymers provided for in subclass
  • A61K 8/02 - Cosmetics or similar toiletry preparations characterised by special physical form
  • A61K 8/81 - Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
  • A61K 9/08 - Solutions
  • A61K 47/32 - Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. carbomers
  • A61Q 19/00 - Preparations for care of the skin

100.

FILM-FORMING COMPOSITION FOR INK-JET COATING

      
Application Number JP2016066127
Publication Number 2016/199630
Status In Force
Filing Date 2016-06-01
Publication Date 2016-12-15
Owner NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor Nishimura Naoya

Abstract

A film-forming composition for ink-jet coating which comprises: a triazine-ring-containing polymer including, for example, the repeating unit structure represented by the following formula [3]; and an organic solvent comprising more than 50 mass% solvent based on a glycol dialkyl ether. The composition is less apt to corrode the heads of ink-jet coating devices, and droplets thereof are satisfactorily ejected in ink-jet coating. Therefore, with the composition, it is possible to easily produce a high-refractive-index film according to a desired pattern through pattern printing by an ink-jet coating device.

IPC Classes  ?

  • C09D 179/04 - Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
  • B41J 2/01 - Ink jet
  • B41M 5/00 - Duplicating or marking methods; Sheet materials for use therein
  • C08G 73/02 - Polyamines
  • C09D 7/12 - Other additives
  • G02B 5/00 - Optical elements other than lenses
  • H01L 21/312 - Organic layers, e.g. photoresist
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