Nanotronics Imaging, Inc.

United States of America

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IPC Class
G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM) 6
G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes 5
G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric 4
G06K 9/62 - Methods or arrangements for recognition using electronic means 4
G06N 3/08 - Learning methods 4
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Found results for  patents

1.

THRESHOLD DETERMINATION FOR PREDICTIVE PROCESS CONTROL OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number US2023072403
Publication Number 2024/059406
Status In Force
Filing Date 2023-08-17
Publication Date 2024-03-21
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John, B.
  • Constantin, Sarah
  • Bordelanne, Valerie
  • Limoge, Damas
  • Lee, Jonathan

Abstract

A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 13/04 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
  • G06N 3/02 - Neural networks

2.

ARTIFICIAL INTELLIGENCE PROCESS CONTROL FOR ASSEMBLY PROCESSES

      
Application Number US2023028052
Publication Number 2024/020048
Status In Force
Filing Date 2023-07-18
Publication Date 2024-01-25
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Lee, Jonathan
  • Doshi, Anuj

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes a monitoring platform and an analytics platform. The monitoring platform is configured to capture data of an operator during assembly of an article of manufacture. The monitoring platform includes one or more cameras and one or more microphones. The analytics platform is in communication with the monitoring platform. The analytics platform is configured to analyze the data captured by the monitoring platform.

IPC Classes  ?

  • G06Q 10/0639 - Performance analysis of employees; Performance analysis of enterprise or organisation operations
  • G06T 1/00 - General purpose image data processing
  • G06T 7/00 - Image analysis

3.

DYNAMIC MONITORING AND SECURING OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number US2023068606
Publication Number 2024/015672
Status In Force
Filing Date 2023-06-16
Publication Date 2024-01-18
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Putman, John, B.
  • Lee, Jonathan
  • Limoge, Damas

Abstract

A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric

4.

AUTOFOCUS SYSTEM AND METHOD

      
Application Number US2023068608
Publication Number 2024/015673
Status In Force
Filing Date 2023-06-16
Publication Date 2024-01-18
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Schmidt, Patrick
  • Sharoukhov, Denis
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

A microscopy system and method of focusing the same are disclosed herein. The microscopy system may include an objective, and imaging device, an illumination source, an epi-illumination module, and a controller. The imaging device is configured to capture a single image of a specimen positioned on a stage of the microscopy system. The illumination source is configured to illuminate the specimen positioned on the stage. The epi-illumination module includes a focusing mechanism in a first primary optical path of a light generated by the illumination source. The focusing mechanism is tilted in relation to a plane perpendicular to the first primary optical path. The controller is in communication with the illumination source. The controller is configured to focus the microscopy system based on a pattern produced by the focusing mechanism on the single image captured by the imaging device.

IPC Classes  ?

  • G02B 7/32 - Systems for automatic generation of focusing signals using parallactic triangle with a base line using active means, e.g. light emitter
  • G02B 7/28 - Systems for automatic generation of focusing signals
  • H04N 23/67 - Focus control based on electronic image sensor signals

5.

SYSTEM AND METHOD FOR GENERATING TRAINING DATA SETS FOR SPECIMEN DEFECT DETECTION

      
Application Number US2023066833
Publication Number 2023/230408
Status In Force
Filing Date 2023-05-10
Publication Date 2023-11-30
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Doshi, Anuj
  • Lee, Jonathan
  • Putman, John, B.

Abstract

A system and method for generating a training data set for training a machine learning model to detect defects in specimens is described herein. A computing system cause presentation of an image on a device of a user. The image includes at least one defect on an example specimen. The computing system receives an annotated image from the user. The user annotated the image using an input via the device. The input includes a first indication of a location of the defect and a second indication of a class corresponding to the defect. The computing system adjusts the annotated image to standardize the input based on an error profile of the user and the class corresponding to the defect. The computing system uploads the annotated image for training the machine learning model.

IPC Classes  ?

  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06V 10/22 - Image preprocessing by selection of a specific region containing or referencing a pattern; Locating or processing of specific regions to guide the detection or recognition
  • G06T 7/00 - Image analysis

6.

METHOD, SYSTEMS AND APPARATUS FOR INTELLIGENTLY EMULATING FACTORY CONTROL SYSTEMS AND SIMULATING RESPONSE DATA

      
Application Number US2022042223
Publication Number 2023/043623
Status In Force
Filing Date 2022-08-31
Publication Date 2023-03-23
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John, B.
  • Lee, Jonathan
  • Putman, Matthew, C.

Abstract

A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.

IPC Classes  ?

  • G05B 19/04 - Programme control other than numerical control, i.e. in sequence controllers or logic controllers
  • G05B 23/02 - Electric testing or monitoring
  • G06N 3/063 - Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
  • G06N 3/08 - Learning methods
  • G05B 19/05 - Programmable logic controllers, e.g. simulating logic interconnections of signals according to ladder diagrams or function charts
  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements

7.

FAULT PROTECTED SIGNAL SPLITTER APPARATUS

      
Application Number US2022042230
Publication Number 2023/038836
Status In Force
Filing Date 2022-08-31
Publication Date 2023-03-16
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John, B.
  • Putman, Matthew, C.
  • Limoge, Damas
  • Moskie, Michael
  • Lee, Jonathan

Abstract

A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.

IPC Classes  ?

  • G01R 31/3177 - Testing of logic operation, e.g. by logic analysers
  • H01P 5/16 - Conjugate devices, i.e. devices having at least one port decoupled from one other port
  • H03M 1/10 - Calibration or testing

8.

SYSTEM, METHOD AND APPARATUS FOR MACROSCOPIC INSPECTION OF REFLECTIVE SPECIMENS

      
Application Number US2022037152
Publication Number 2023/287992
Status In Force
Filing Date 2022-07-14
Publication Date 2023-01-19
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Lee, Jonathan
  • Limoge, Damas
  • Putman, Matthew, C.
  • Putman, John, B.
  • Moskie, Michael

Abstract

An inspection apparatus includes a specimen stage configured to retain a specimen, at least three imaging devices arranged in a triangular array positioned above the specimen stage, each of the at least three imaging devices configured to capture an image of the specimen, one or more sets of lights positioned between the specimen stage and the at least three imaging devices, and a control system in communication with the at least three imaging devices.

IPC Classes  ?

  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06T 5/00 - Image enhancement or restoration
  • H04N 5/50 - Tuning indicators; Automatic tuning control
  • H04N 5/232 - Devices for controlling television cameras, e.g. remote control
  • H04N 5/247 - Arrangement of television cameras

9.

IMITATION LEARNING IN A MANUFACTURING ENVIRONMENT

      
Application Number US2022017943
Publication Number 2022/183016
Status In Force
Filing Date 2022-02-25
Publication Date 2022-09-01
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Sundstrom, Andrew
  • Limore, Damas
  • Pinskiy, Vadim
  • Nirmaleswaran, Aswin, Raghav
  • Kim, Eun-Sol

Abstract

A computing system identifies a trajectory example generated by a human operator. The trajectory example includes trajectory information of the human operator while performing a task to be learned by a control system of the computing system. Based on the trajectory example, the computing system trains the control system to perform the task exemplified in the trajectory example. Training the control system includes generating an output trajectory of a robot performing the task. The computing system identifies an updated trajectory example generated by the human operator based on the trajectory example and the output trajectory of the robot performing the task. Based on the updated trajectory example, the computing system continues to train the control system to perform the task exemplified in the updated trajectory example.

IPC Classes  ?

  • G06N 3/08 - Learning methods
  • G06N 5/04 - Inference or reasoning models
  • G06K 9/62 - Methods or arrangements for recognition using electronic means

10.

DEEP LEARNING MODEL FOR NOISE REDUCTION IN LOW SNR IMAGING CONDITIONS

      
Application Number US2021044633
Publication Number 2022/031903
Status In Force
Filing Date 2021-08-05
Publication Date 2022-02-10
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Sharoukhov, Denis, Y.
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

Embodiments disclosed herein are generally related to a system for noise reduction in low signal to noise ratio imaging conditions. A computing system obtains a set of images of a specimen. The set of images includes at least two images of the specimen. The computing system inputs the set of images of the specimen into a trained denoising model. The trained denoising model is configured to output a single denoised image of the specimen. The computing system receives, as output from the trained denoising model, a single denoised image of the specimen.

IPC Classes  ?

  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • H01J 37/21 - Means for adjusting the focus

11.

DEEP LEARNING MODEL FOR AUTO-FOCUSING MICROSCOPE SYSTEMS

      
Application Number US2021044988
Publication Number 2022/032126
Status In Force
Filing Date 2021-08-06
Publication Date 2022-02-10
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Sharoukhov, Denis Y.
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

A computing system receives, from an image sensor, at least two images of a specimen positioned on a specimen stage of a microscope system. The computing system provides the at least two images to an autofocus model for detecting at least one distances to a focal plane of the specimen. The computing system identifies, via the autofocus model, the at least one distance to the focal plane of the specimen. Based on the identifying, the computing system automatically adjusts a position of the specimen stage with respect to an objective lens of the microscope system.

IPC Classes  ?

  • G02B 7/28 - Systems for automatic generation of focusing signals
  • G02B 7/36 - Systems for automatic generation of focusing signals using image sharpness techniques
  • G02B 21/24 - Base structure

12.

SYSTEMS, METHODS, AND MEDIA FOR MANUFACTURING PROCESSES

      
Application Number US2021038085
Publication Number 2021/257988
Status In Force
Filing Date 2021-06-18
Publication Date 2021-12-23
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Sundstrom, Andrew
  • Kim, Eun-Sol
  • Limoge, Damas
  • Pinskiy, Vadim
  • Putman, Matthew, C.

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G06N 3/08 - Learning methods
  • G06N 3/00 - Computing arrangements based on biological models
  • G05B 19/00 - Programme-control systems
  • G05B 19/18 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form

13.

CONTROLLED GROWTH SYSTEM FOR BIOLOGICALS

      
Application Number US2021035686
Publication Number 2021/247852
Status In Force
Filing Date 2021-06-03
Publication Date 2021-12-09
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Limoge, Damas
  • Pinskiy, Vadim
  • Musselman, Parker

Abstract

A controlled growth system is provided herein. The controlled growth system includes a controlled growth environment, a controller, a sensor, and a computing system. The controlled growth environment is configured to grow a biologic. The controller is in communication with the controlled growth environment. The controller is configured to manage process parameters of the controlled growth environment. The sensor is configured to monitor the biologic during a growth process. The computing system is in communication with the sensor and the controller. The computing system is programmed to perform operations for achieving a desired final quality metric for the biologic.

IPC Classes  ?

  • A01G 9/24 - Devices for heating, ventilating, regulating temperature, or watering, in greenhouses, forcing-frames, or the like
  • A01G 18/69 - Arrangements for managing the environment, e.g. sprinklers
  • A01G 7/00 - Botany in general
  • A01G 7/04 - Electric or magnetic treatment of plants for promoting growth
  • A01G 18/00 - Cultivation of mushrooms
  • G01N 21/00 - Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light

14.

SYSTEMS, METHODS, AND MEDIA FOR MANUFACTURING PROCESSES

      
Application Number US2021021440
Publication Number 2021/183468
Status In Force
Filing Date 2021-03-09
Publication Date 2021-09-16
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Nirmaleswaran, Aswin Raghav
  • Kim, Eun-Sol

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G06F 19/00 - Digital computing or data processing equipment or methods, specially adapted for specific applications (specially adapted for specific functions G06F 17/00;data processing systems or methods specially adapted for administrative, commercial, financial, managerial, supervisory or forecasting purposes G06Q;healthcare informatics G16H)

15.

DEFECT DETECTION SYSTEM

      
Application Number US2021021449
Publication Number 2021/183473
Status In Force
Filing Date 2021-03-09
Publication Date 2021-09-16
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Ivanov, Tonislav
  • Babeshko, Denis
  • Pinskiy, Vadim
  • Putman, Matthew, C.
  • Sundstrom, Andrew

Abstract

A computing system generates a training data set for training the prediction model to detect defects present in a target surface of a target specimen and training the prediction model to detect defects present in the target surface of the target specimen based on the training data set. The computing system generates the training data set by identifying a set of images for training the prediction model, the set of images comprising a first subset of images. A deep learning network generates a second subset of images for subsequent labelling based on the set of images comprising the first subset of images. The deep learning network generates a third subset of images for labelling based on the set of images comprising the first subset of images and the labeled second subset of images. The computing system continues the process until a threshold number of labeled images is generated.

IPC Classes  ?

  • G06N 3/02 - Neural networks
  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06T 7/10 - Segmentation; Edge detection

16.

METHOD, SYSTEMS AND APPARATUS FOR INTELLIGENTLY EMULATING FACTORY CONTROL SYSTEMS AND SIMULATING RESPONSE DATA

      
Application Number US2021019857
Publication Number 2021/173961
Status In Force
Filing Date 2021-02-26
Publication Date 2021-09-02
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Putman, John, B.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Williams, James, Iii

Abstract

A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.

IPC Classes  ?

  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G05B 13/04 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
  • G05B 19/04 - Programme control other than numerical control, i.e. in sequence controllers or logic controllers
  • G06F 9/455 - Emulation; Interpretation; Software simulation, e.g. virtualisation or emulation of application or operating system execution engines
  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06N 3/08 - Learning methods

17.

SYSTEMS, METHODS, AND MEDIA FOR MANUFACTURING PROCESSES

      
Application Number US2021018858
Publication Number 2021/168308
Status In Force
Filing Date 2021-02-19
Publication Date 2021-08-26
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Limoge, Damas, W.
  • Nouri Gooshki, Sadegh
  • Nirmaleswaran, Aswin Raghav
  • Hough, Fabian

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/4099 - Surface or curve machining, making 3D objects, e.g. desktop manufacturing
  • G06N 3/08 - Learning methods

18.

DEEP PHOTOMETRIC LEARNING (DPL) SYSTEMS, APPARATUS AND METHODS

      
Application Number US2021016474
Publication Number 2021/158703
Status In Force
Filing Date 2021-02-03
Publication Date 2021-08-12
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Narong, Tanaporn, Na
  • Sharoukhov, Denis, Y.
  • Ivanov, Tonislav

Abstract

An imaging system is disclosed herein. The imaging system includes an imaging apparatus and a computing system. The imaging apparatus includes a plurality of light sources positioned at a plurality of positions and a plurality of angles relative to a stage configured to support a specimen. The imaging apparatus is configured to capture a plurality of images of a surface of the specimen. The computing system in communication with the imaging apparatus. The computing system configured to generate a 3D-reconstruction of the surface of the specimen by receiving, from the imaging apparatus, the plurality of images of the surface of the specimen, generating, by the imaging apparatus via a deep learning model, a height map of the surface of the specimen based on the plurality of images, and outputting a 3D-reconstruction of the surface of the specimen based on the height map generated by the deep learning model.

IPC Classes  ?

19.

SECURING INDUSTRIAL PRODUCTION FROM SOPHISTICATED ATTACKS

      
Application Number US2020061434
Publication Number 2021/102223
Status In Force
Filing Date 2020-11-20
Publication Date 2021-05-27
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to detect a cyberattack to the manufacturing system. The control module is configured to perform operations. The operations include receiving control values for a first station of the one or more stations. The operations further include determining that there is a cyberattack based on the control values for the first station using one or more machine learning algorithms. The operations further include generating an alert to cease processing of the component. In some embodiments, the operations further include correcting errors caused by the cyberattack.

IPC Classes  ?

  • G06F 11/00 - Error detection; Error correction; Monitoring
  • H04L 12/22 - Arrangements for preventing the taking of data from a data transmission channel without authorisation

20.

SYSTEMS, METHODS, AND MEDIA FOR MANUFACTURING PROCESSES

      
Application Number US2020059339
Publication Number 2021/092329
Status In Force
Filing Date 2020-11-06
Publication Date 2021-05-14
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Sundstrom, Andrew
  • Limoge, Damas
  • Kim, Eun-Sol
  • Pinskiy, Vadim
  • Putman, Matthew, C.

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G06N 20/20 - Ensemble learning
  • G06Q 10/06 - Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling

21.

SYSTEMS, METHODS, AND MEDIA FOR MANUFACTURING PROCESSES

      
Application Number US2020059336
Publication Number 2021/092327
Status In Force
Filing Date 2020-11-06
Publication Date 2021-05-14
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Limoge, Damas
  • Hough, Fabian
  • Nouri Gooshki, Sadegh
  • Nirmaleswaran, Aswin, Raghav
  • Pinskiy, Vadim

Abstract

A manufacturing system is disclosed herein. The manufacturing system may include one or more station, a monitoring platform, and a control module. Each station is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • B29C 35/02 - Heating or curing, e.g. crosslinking or vulcanising
  • B29C 35/08 - Heating or curing, e.g. crosslinking or vulcanising by wave energy or particle radiation
  • B29C 41/08 - Coating a former, core or other substrate by spraying or fluidisation, e.g. spraying powder
  • B29C 67/02 - Moulding by agglomerating
  • B29C 70/64 - Shaping composites, i.e. plastics material comprising reinforcements, fillers or preformed parts, e.g. inserts comprising fillers only the filler influencing the surface characteristics of the material, e.g. by concentrating near the surface or by incorporation into the surface by force
  • G05B 23/02 - Electric testing or monitoring

22.

DYNAMIC MONITORING AND SECURING OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number US2020052254
Publication Number 2021/071675
Status In Force
Filing Date 2020-09-23
Publication Date 2021-04-15
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Putman, John, B.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew
  • Williams Iii, James

Abstract

A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.

IPC Classes  ?

  • G06N 20/00 - Machine learning
  • G06F 11/30 - Monitoring
  • G06Q 10/06 - Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
  • G06F 19/00 - Digital computing or data processing equipment or methods, specially adapted for specific applications (specially adapted for specific functions G06F 17/00;data processing systems or methods specially adapted for administrative, commercial, financial, managerial, supervisory or forecasting purposes G06Q;healthcare informatics G16H)

23.

SYSTEMS, METHODS, AND MEDIA FOR MANUFACTURING PROCESSES

      
Application Number US2020049886
Publication Number 2021/050508
Status In Force
Filing Date 2020-09-09
Publication Date 2021-03-18
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Hough, Fabian
  • Putman, John, B.
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Nirmaleswaran, Aswin, Raghav
  • Nouri Gooshki, Sadegh

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a product. The monitoring platform is configured to monitor progression of the product throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the product.

IPC Classes  ?

  • B29B 11/14 - Making preforms characterised by structure or composition
  • B29B 11/16 - Making preforms characterised by structure or composition comprising fillers or reinforcements
  • B29C 51/02 - Combined thermoforming and manufacture of the preform

24.

SYSTEM, METHOD AND APPARATUS FOR MACROSCOPIC INSPECTION OF REFLECTIVE SPECIMENS

      
Application Number US2020040255
Publication Number 2021/025811
Status In Force
Filing Date 2020-06-30
Publication Date 2021-02-11
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Putman, John, B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.

IPC Classes  ?

  • G01N 15/14 - Electro-optical investigation
  • G06T 7/00 - Image analysis
  • G06K 9/62 - Methods or arrangements for recognition using electronic means

25.

PREDICTIVE PROCESS CONTROL FOR A MANUFACTURING PROCESS

      
Application Number US2020039064
Publication Number 2020/263783
Status In Force
Filing Date 2020-06-23
Publication Date 2020-12-30
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John, B.
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in- specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in- specification. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric

26.

SYSTEMS, METHODS, AND MEDIA FOR ARTIFICIAL INTELLIGENCE PROCESS CONTROL IN ADDITIVE MANUFACTURING

      
Application Number US2020029020
Publication Number 2020/215093
Status In Force
Filing Date 2020-04-20
Publication Date 2020-10-22
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Pinskiy, Vadim
  • Putman, Matthew, C.
  • Limoge, Damas
  • Nirmaleswaran, Aswin, Raghav

Abstract

Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low- resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.

IPC Classes  ?

  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)

27.

DYNAMIC TRAINING FOR ASSEMBLY LINES

      
Application Number US2019053746
Publication Number 2020/176137
Status In Force
Filing Date 2019-09-30
Publication Date 2020-09-03
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine- learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.

IPC Classes  ?

  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
  • H01L 21/66 - Testing or measuring during manufacture or treatment

28.

ASSEMBLY ERROR CORRECTION FOR ASSEMBLY LINES

      
Application Number US2020029022
Publication Number 2020/176908
Status In Force
Filing Date 2020-04-20
Publication Date 2020-09-03
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.

IPC Classes  ?

  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G06N 20/20 - Ensemble learning

29.

FLUORESCENCE MICROSCOPY INSPECTION SYSTEMS, APPARATUS AND METHODS

      
Application Number US2020016497
Publication Number 2020/163267
Status In Force
Filing Date 2020-02-04
Publication Date 2020-08-13
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Putman, John, B.
  • Pinskiy, Vadim
  • Sharoukhov, Denis

Abstract

A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.

IPC Classes  ?

  • H04N 7/18 - Closed-circuit television [CCTV] systems, i.e. systems in which the video signal is not broadcast
  • G02B 21/16 - Microscopes adapted for ultraviolet illumination
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/10 - Condensers affording dark-field illumination
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints
  • H04N 5/247 - Arrangement of television cameras
  • G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens
  • G06T 7/00 - Image analysis

30.

METHOD AND SYSTEM FOR AUTOMATICALLY MAPPING FLUID OBJECTS ON A SUBSTRATE

      
Application Number US2019053187
Publication Number 2020/081211
Status In Force
Filing Date 2019-09-26
Publication Date 2020-04-23
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Putman, John, B.
  • Cruickshank, John
  • Orlando, Julie
  • Frankel, Adele
  • Scott, Brandon

Abstract

A method and system for mapping fluid objects on a substrate using a microscope inspection system that includes a light source, imaging device, stage for moving a substrate disposed on the stage, and a control module. A computer analysis system includes an object identification module that identifies for each of the objects on the substrate, an object position on the substrate including a set of X, Y, and Θ coordinates using algorithms, networks, machines and systems including artificial intelligence and image processing algorithms. At least one of the objects is fluid and has shifted from a prior position or deformed from a prior size.

IPC Classes  ?

  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/00 - Microscopes
  • G06K 9/32 - Aligning or centering of the image pick-up or image-field
  • G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods

31.

MACRO INSPECTION SYSTEMS, APPARATUS AND METHODS

      
Application Number US2019054386
Publication Number 2020/076591
Status In Force
Filing Date 2019-10-03
Publication Date 2020-04-16
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie
  • Moskie, Michael

Abstract

The disclosed technology relates to an inspection apparatus that includes a stage configured to retain a specimen for inspection, an imaging device having a field of view encompassing at least a portion of the stage to view a specimen retained on the stage, a lens having a view encompassing the specimen retained on the stage, and a plurality of lights disposed on a moveable platform. The inspection apparatus can further include a control module configured to control a position of the stage, an elevation of the moveable platform, and a focus of the lens. In some implementations, the inspection apparatus includes an image processing system configured for receiving image data from the imaging device, analyzing the image data to determine a specimen classification, and automatically selecting an illumination profile based on the specimen classification. Methods and machine-readable media are also contemplated.

IPC Classes  ?

  • G06K 9/20 - Image acquisition
  • G06K 9/36 - Image preprocessing, i.e. processing the image information without deciding about the identity of the image
  • G06K 9/60 - Combination of image acquisition and preprocessing functions
  • G02B 21/00 - Microscopes
  • G02B 21/06 - Means for illuminating specimen
  • G02B 21/26 - Stages; Adjusting means therefor
  • G01B 11/00 - Measuring arrangements characterised by the use of optical techniques

32.

SYSTEMS, DEVICES, AND METHODS FOR PROVIDING FEEDBACK ON AND IMPROVING THE ACCURACY OF SUPER-RESOLUTION IMAGING

      
Application Number US2019033293
Publication Number 2020/009749
Status In Force
Filing Date 2019-05-21
Publication Date 2020-01-09
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Putman, John, B.
  • Pinskiy, Vadim
  • Succar, Joseph, R.

Abstract

Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.

IPC Classes  ?

  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction

33.

SYSTEMS, APPARATUS, AND METHODS FOR SORTING COMPONENTS USING ILLUMINATION

      
Application Number US2019034499
Publication Number 2019/232116
Status In Force
Filing Date 2019-05-30
Publication Date 2019-12-05
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John B.
  • Yancey, Jonathan
  • Stanwix, Justin

Abstract

An illumination apparatus, method and system to facilitate manual sorting of components. The illumination apparatus can include an array of lights and a component holder receptacle configured to receive a component holder retaining components. The illumination apparatus can further include a control module configured to receive information identifying components for sorting and location information for locating the one or more components on the component holder, and to selectively control activation of individual lights of the array of lights to illuminate the one or more components.

IPC Classes  ?

34.

SYSTEMS, DEVICES AND METHODS FOR AUTOMATIC MICROSCOPE FOCUS

      
Application Number US2019029076
Publication Number 2019/212848
Status In Force
Filing Date 2019-04-25
Publication Date 2019-11-07
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John, B.
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Sharoukhov, Denis, Y.

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two offset focusing cameras. Each offset focusing camera can be positioned on a different side of an image forming conjugate plane so that their sharpness curves intersect at the image forming conjugate plane. Focus of a specimen can be adjusted by using sharpness values determined from images taken by the offset focusing cameras.

IPC Classes  ?

  • G02B 21/24 - Base structure
  • G02B 21/00 - Microscopes
  • B82Y 20/00 - Nanooptics, e.g. quantum optics or photonic crystals
  • B82Y 15/00 - Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors

35.

SYSTEMS, METHODS, AND MEDIA FOR ARTIFICIAL INTELLIGENCE FEEDBACK CONTROL IN ADDITIVE MANUFACTURING

      
Application Number US2019024795
Publication Number 2019/195095
Status In Force
Filing Date 2019-03-29
Publication Date 2019-10-10
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Williams, James
  • Limoge, Damas
  • Nirmaleswaran, Aswin, Raghav
  • Chris, Mario

Abstract

Additive manufacturing systems using artificial intelligence can identify an anomaly in a printed layer of an object from a generated topographical image of the printed layer. The additive manufacturing systems can also use artificial intelligence to determine a correlation between the identified anomaly and one or more print parameters, and adaptively adjust one or more print parameters. The additive manufacturing systems can also use artificial intelligence to optimize one or more printing parameters to achieve desired mechanical, optical and/or electrical properties.

IPC Classes  ?

  • B29C 64/00 - Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
  • G06N 20/00 - Machine learning

36.

SYSTEMS, DEVICES AND METHODS FOR AUTOMATIC MICROSCOPIC FOCUS

      
Application Number US2019022070
Publication Number 2019/178241
Status In Force
Filing Date 2019-03-13
Publication Date 2019-09-19
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John, B.
  • Putman, Matthew, C.
  • Orlando, Julie
  • Fashbaugh, Dylan

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two cameras. The first camera can be positioned in a first image forming conjugate plane and receives light from a first illumination source that transmits light in a first wavelength range. The second camera can be positioned at an offset distance from the first image forming conjugate plane and receives light from a second illumination source that transmits light in a second wavelength range.

IPC Classes  ?

  • G02B 7/28 - Systems for automatic generation of focusing signals
  • G02B 21/06 - Means for illuminating specimen
  • G02B 21/02 - Objectives
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/26 - Stages; Adjusting means therefor
  • G06T 7/80 - Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration

37.

SYSTEMS, DEVICES, AND METHODS FOR COMBINED WAFER AND PHOTOMASK INSPECTION

      
Application Number US2019017513
Publication Number 2019/164695
Status In Force
Filing Date 2019-02-11
Publication Date 2019-08-29
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Griffith, Randolph, E.
  • Andresen, Jeff
  • Pozzi-Loyola, Scott
  • Moskie, Michael
  • Scranton, Steve

Abstract

Systems, devices, and methods for combined wafer and photomask inspection are provided. In some embodiments, chucks are provided, the chucks comprising: a removable insert, wherein the removable insert is configured to support a wafer so that an examination surface of the wafer lies within a focal range when the chuck is in a first configuration, wherein the removable insert is inserted into the chuck in the first configuration; and a first structure forming a recess that has a depth sufficient to support a photomask so that an examination surface of the photomask lies within the focal range when the chuck is in a second configuration, wherein the removable insert is not inserted into the chuck in the second configuration.

IPC Classes  ?

  • G01N 21/01 - Arrangements or apparatus for facilitating the optical investigation
  • G01N 21/88 - Investigating the presence of flaws, defects or contamination
  • G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined
  • G01N 21/956 - Inspecting patterns on the surface of objects

38.

APPARATUS FOR CUTTING SPECIMENS FOR MICROSCOPIC EXAMINATION

      
Application Number US2019016029
Publication Number 2019/156884
Status In Force
Filing Date 2019-01-31
Publication Date 2019-08-15
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Putman, John, B.
  • Jaime, Alejandro, S.
  • Griffith, Randolph, E.

Abstract

Cutting apparatuses comprising: a base; a first platen and a second platen that are coupled to the base and that are configured to hold a specimen, wherein the first platen includes a first cutting surface and the second platen includes a second cutting surface; a moveable carriage that is moveably coupled to the base; a cutting arm that is pivotably coupled at a pivot point to the carriage and that is configured to hold a cutting blade; and a spring coupled to the arm so as to apply a directional force to the arm and the blade, wherein the moveable carriage can be moved in a manner that causes the blade to slide on at least one of the first cutting surface and the second cutting surface while being pressed against the at least one of the first cutting surface and the second cutting surface by the directional force.

IPC Classes  ?

  • G01N 1/06 - Devices for withdrawing samples in the solid state, e.g. by cutting providing a thin slice, e.g. microtome
  • G01N 1/04 - Devices for withdrawing samples in the solid state, e.g. by cutting
  • G01N 1/02 - Devices for withdrawing samples
  • B26D 7/26 - Means for mounting or adjusting the cutting member; Means for adjusting the stroke of the cutting member

39.

APPARATUS AND METHOD TO REDUCE VIGNETTING IN MICROSCOPIC IMAGING

      
Application Number US2017054701
Publication Number 2019/070226
Status In Force
Filing Date 2017-10-02
Publication Date 2019-04-11
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Fashbaugh, Dylan
  • Horstmeyer, Roarke

Abstract

A method for altering the intensity of light across the field of view of an image sensor in a microscope apparatus having a light source, an image sensor having pixels, and a specimen stage, wherein light from the light source travels along a light path to the specimen stage and then to the image sensor includes interposing a programmable spatial light modulator, pSLM, in the light path between the light source and the image sensor, the pSLM having a plurality of pixels; and modulating the intensity of light passing through one or more pixels of the plurality of pixels of the pSLM to produce an altered illumination landscape at the field of view of the image sensor that differs from an unaltered illumination landscape that would otherwise be produced at the image sensor. Vignetting can be specifically addressed.

IPC Classes  ?

40.

CAMERA AND SPECIMEN ALIGNMENT TO FACILITATE LARGE AREA IMAGING IN MICROSCOPY

      
Application Number US2017032826
Publication Number 2018/147888
Status In Force
Filing Date 2017-05-16
Publication Date 2018-08-16
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Scott, Brandon
  • Fashbaugh, Dylan

Abstract

A microscope system and method allow for a desired x'-direction scanning along a specimen to be angularly offset from an x-direction of the XY translation stage, and rotates an image sensor associated with the microscope to place the pixel rows of the image sensor substantially parallel to the desired x'-direction. The angle of offset of the x'-direction relative to the x-direction is determined and the XY translation stage is employed to move the specimen relative to the image sensor to different positions along the desired x'-direction without a substantial shift of the image sensor relative to the specimen in a y'-direction, the y'-direction being orthogonal to the x' direction of the specimen. The movement is based on the angle of offset.

IPC Classes  ?

  • G02B 21/26 - Stages; Adjusting means therefor
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

41.

UNIQUE OBLIQUE LIGHTING TECHNIQUE USING A BRIGHTFIELD DARKFIELD OBJECTIVE AND IMAGING METHOD RELATING THERETO

      
Application Number US2015055283
Publication Number 2016/061070
Status In Force
Filing Date 2015-10-13
Publication Date 2016-04-21
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Orlando, Julie A.
  • Bulman, Joseph G.

Abstract

A process is provided for imaging a surface of a specimen with an imaging system that employs a BD objective having a darkfield channel and a bright field channel, the BD objective having a circumference. The specimen is obliquely illuminated through the darkfield channel with a first arced illuminating light that obliquely illuminates the specimen through a first arc of the circumference. The first arced illuminating light reflecting off of the surface of the specimen is recorded as a first image of the specimen from the first arced illuminating light reflecting off the surface of the specimen, and a processor generates a 3D topography of the specimen by processing the first image through a topographical imaging technique. Imaging apparatus is also provided as are further process steps for other embodiments.

IPC Classes  ?