Nanotronics Imaging, Inc.

United States of America

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G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes 39
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1.

FLUORESCENCE MICROSCOPY INSPECTION SYSTEMS, APPARATUS AND METHODS

      
Application Number 18398955
Status Pending
Filing Date 2023-12-28
First Publication Date 2024-04-18
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Lee, Jonathan
  • Bordelanne, Valerie

Abstract

A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.

IPC Classes  ?

  • G02B 21/16 - Microscopes adapted for ultraviolet illumination
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums

2.

THRESHOLD DETERMINATION FOR PREDICTIVE PROCESS CONTROL OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number US2023072403
Publication Number 2024/059406
Status In Force
Filing Date 2023-08-17
Publication Date 2024-03-21
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John, B.
  • Constantin, Sarah
  • Bordelanne, Valerie
  • Limoge, Damas
  • Lee, Jonathan

Abstract

A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 13/04 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
  • G06N 3/02 - Neural networks

3.

THRESHOLD DETERMINATION FOR PREDICTIVE PROCESS CONTROL OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number 18240891
Status Pending
Filing Date 2023-08-31
First Publication Date 2024-03-14
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Constantin, Sarah
  • Bordelanne, Valerie
  • Limoge, Damas
  • Lee, Jonathan

Abstract

A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 13/04 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators

4.

Artificial Intelligence Process Control for Assembly Processes

      
Application Number 18354357
Status Pending
Filing Date 2023-07-18
First Publication Date 2024-01-25
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Lee, Jonathan
  • Doshi, Anuj

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes a monitoring platform and an analytics platform. The monitoring platform is configured to capture data of an operator during assembly of an article of manufacture. The monitoring platform includes one or more cameras and one or more microphones. The analytics platform is in communication with the monitoring platform. The analytics platform is configured to analyze the data captured by the monitoring platform.

IPC Classes  ?

5.

ARTIFICIAL INTELLIGENCE PROCESS CONTROL FOR ASSEMBLY PROCESSES

      
Application Number US2023028052
Publication Number 2024/020048
Status In Force
Filing Date 2023-07-18
Publication Date 2024-01-25
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Lee, Jonathan
  • Doshi, Anuj

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes a monitoring platform and an analytics platform. The monitoring platform is configured to capture data of an operator during assembly of an article of manufacture. The monitoring platform includes one or more cameras and one or more microphones. The analytics platform is in communication with the monitoring platform. The analytics platform is configured to analyze the data captured by the monitoring platform.

IPC Classes  ?

  • G06Q 10/0639 - Performance analysis of employees; Performance analysis of enterprise or organisation operations
  • G06T 1/00 - General purpose image data processing
  • G06T 7/00 - Image analysis

6.

AUTOFOCUS SYSTEM AND METHOD

      
Application Number 18045007
Status Pending
Filing Date 2022-10-07
First Publication Date 2024-01-18
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Schmidt, Patrick
  • Sharoukhov, Denis
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

A microscopy system and method of focusing the same are disclosed herein. The microscopy system may include an objective, and imaging device, an illumination source, an epi-illumination module, and a controller. The imaging device is configured to capture a single image of a specimen positioned on a stage of the microscopy system. The illumination source is configured to illuminate the specimen positioned on the stage. The epi-illumination module includes a focusing mechanism in a first primary optical path of a light generated by the illumination source. The focusing mechanism is tilted in relation to a plane perpendicular to the first primary optical path. The controller is in communication with the illumination source. The controller is configured to focus the microscopy system based on a pattern produced by the focusing mechanism on the single image captured by the imaging device.

IPC Classes  ?

  • G02B 21/24 - Base structure
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

7.

Dynamic monitoring and securing of factory processes, equipment and automated systems

      
Application Number 18329295
Grant Number 11953863
Status In Force
Filing Date 2023-06-05
First Publication Date 2024-01-18
Grant Date 2024-04-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Lee, Jonathan
  • Limoge, Damas

Abstract

A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric

8.

DYNAMIC MONITORING AND SECURING OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number US2023068606
Publication Number 2024/015672
Status In Force
Filing Date 2023-06-16
Publication Date 2024-01-18
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Putman, John, B.
  • Lee, Jonathan
  • Limoge, Damas

Abstract

A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric

9.

AUTOFOCUS SYSTEM AND METHOD

      
Application Number US2023068608
Publication Number 2024/015673
Status In Force
Filing Date 2023-06-16
Publication Date 2024-01-18
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Schmidt, Patrick
  • Sharoukhov, Denis
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

A microscopy system and method of focusing the same are disclosed herein. The microscopy system may include an objective, and imaging device, an illumination source, an epi-illumination module, and a controller. The imaging device is configured to capture a single image of a specimen positioned on a stage of the microscopy system. The illumination source is configured to illuminate the specimen positioned on the stage. The epi-illumination module includes a focusing mechanism in a first primary optical path of a light generated by the illumination source. The focusing mechanism is tilted in relation to a plane perpendicular to the first primary optical path. The controller is in communication with the illumination source. The controller is configured to focus the microscopy system based on a pattern produced by the focusing mechanism on the single image captured by the imaging device.

IPC Classes  ?

  • G02B 7/32 - Systems for automatic generation of focusing signals using parallactic triangle with a base line using active means, e.g. light emitter
  • G02B 7/28 - Systems for automatic generation of focusing signals
  • H04N 23/67 - Focus control based on electronic image sensor signals

10.

Systems, devices, and methods for providing feedback on and improving the accuracy of super-resolution imaging

      
Application Number 18240910
Grant Number 11948270
Status In Force
Filing Date 2023-08-31
First Publication Date 2023-12-28
Grant Date 2024-04-02
Owner Nanotronics Imaging , Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Succar, Joseph R.

Abstract

Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.

IPC Classes  ?

  • G06K 9/32 - Aligning or centering of the image pick-up or image-field
  • G06F 18/2411 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on the proximity to a decision surface, e.g. support vector machines
  • G06F 18/2413 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on distances to training or reference patterns
  • G06T 3/4038 - Image mosaicing, e.g. composing plane images from plane sub-images
  • G06T 3/4053 - based on super-resolution, i.e. the output image resolution being higher than the sensor resolution
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06V 10/764 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects
  • G06V 10/98 - Detection or correction of errors, e.g. by rescanning the pattern or by human intervention; Evaluation of the quality of the acquired patterns
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts

11.

SYSTEMS, METHODS, AND MEDIA FOR ARTIFICIAL INTELLIGENCE PROCESS CONTROL IN ADDITIVE MANUFACTURING

      
Application Number 18452914
Status Pending
Filing Date 2023-08-21
First Publication Date 2023-12-07
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Pinskiy, Vadim
  • Putman, Matthew C.
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav

Abstract

Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/209 - Heads; Nozzles
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B22F 10/30 - Process control
  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes
  • G06F 18/20 - Analysing
  • G06F 18/2411 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on the proximity to a decision surface, e.g. support vector machines
  • G06V 10/764 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects
  • G06V 10/82 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using neural networks
  • G06V 10/98 - Detection or correction of errors, e.g. by rescanning the pattern or by human intervention; Evaluation of the quality of the acquired patterns

12.

System and Method for Generating Training Data Sets for Specimen Defect Detection

      
Application Number 18449320
Status Pending
Filing Date 2023-08-14
First Publication Date 2023-12-07
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Doshi, Anuj
  • Lee, Jonathan
  • Putman, John B.

Abstract

A system and method for generating a training data set for training a machine learning model to detect defects in specimens is described herein. A computing system cause presentation of an image on a device of a user. The image includes at least one defect on an example specimen. The computing system receives an annotated image from the user. The user annotated the image using an input via the device. The input includes a first indication of a location of the defect and a second indication of a class corresponding to the defect. The computing system adjusts the annotated image to standardize the input based on an error profile of the user and the class corresponding to the defect. The computing system uploads the annotated image for training the machine learning model.

IPC Classes  ?

  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06T 7/00 - Image analysis
  • G06V 10/22 - Image preprocessing by selection of a specific region containing or referencing a pattern; Locating or processing of specific regions to guide the detection or recognition

13.

Fault protected signal splitter apparatus

      
Application Number 18366534
Grant Number 11894596
Status In Force
Filing Date 2023-08-07
First Publication Date 2023-11-30
Grant Date 2024-02-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Limoge, Damas
  • Moskie, Michael
  • Lee, Jonathan

Abstract

A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.

IPC Classes  ?

  • H01P 5/16 - Conjugate devices, i.e. devices having at least one port decoupled from one other port
  • H03M 1/10 - Calibration or testing
  • H02H 7/20 - Emergency protective circuit arrangements specially adapted for specific types of electric machines or apparatus or for sectionalised protection of cable or line systems, and effecting automatic switching in the event of an undesired change from norm for electronic equipment
  • G01R 31/3177 - Testing of logic operation, e.g. by logic analysers

14.

SYSTEM AND METHOD FOR GENERATING TRAINING DATA SETS FOR SPECIMEN DEFECT DETECTION

      
Application Number US2023066833
Publication Number 2023/230408
Status In Force
Filing Date 2023-05-10
Publication Date 2023-11-30
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Doshi, Anuj
  • Lee, Jonathan
  • Putman, John, B.

Abstract

A system and method for generating a training data set for training a machine learning model to detect defects in specimens is described herein. A computing system cause presentation of an image on a device of a user. The image includes at least one defect on an example specimen. The computing system receives an annotated image from the user. The user annotated the image using an input via the device. The input includes a first indication of a location of the defect and a second indication of a class corresponding to the defect. The computing system adjusts the annotated image to standardize the input based on an error profile of the user and the class corresponding to the defect. The computing system uploads the annotated image for training the machine learning model.

IPC Classes  ?

  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06V 10/22 - Image preprocessing by selection of a specific region containing or referencing a pattern; Locating or processing of specific regions to guide the detection or recognition
  • G06T 7/00 - Image analysis

15.

PREDICTIVE PROCESS CONTROL FOR A MANUFACTURING PROCESS

      
Application Number 18357560
Status Pending
Filing Date 2023-07-24
First Publication Date 2023-11-16
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric

16.

DYNAMIC MONITORING AND SECURING OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number 18343421
Status Pending
Filing Date 2023-06-28
First Publication Date 2023-11-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.

IPC Classes  ?

  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G06N 3/063 - Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • G06N 3/08 - Learning methods
  • G05B 23/02 - Electric testing or monitoring

17.

ASSEMBLY ERROR CORRECTION FOR ASSEMBLY LINES

      
Application Number 18353648
Status Pending
Filing Date 2023-07-17
First Publication Date 2023-11-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path

18.

Fault protected signal splitter apparatus

      
Application Number 18343407
Grant Number 11955686
Status In Force
Filing Date 2023-06-28
First Publication Date 2023-10-26
Grant Date 2024-04-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Limoge, Damas
  • Moskie, Michael
  • Lee, Jonathan

Abstract

A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.

IPC Classes  ?

  • H01P 5/16 - Conjugate devices, i.e. devices having at least one port decoupled from one other port
  • G01R 31/3177 - Testing of logic operation, e.g. by logic analysers
  • H02H 7/20 - Emergency protective circuit arrangements specially adapted for specific types of electric machines or apparatus or for sectionalised protection of cable or line systems, and effecting automatic switching in the event of an undesired change from norm for electronic equipment
  • H03M 1/10 - Calibration or testing

19.

SYSTEM AND METHOD FOR IMPROVING ASSEMBLY LINE PROCESSES

      
Application Number 18333016
Status Pending
Filing Date 2023-06-12
First Publication Date 2023-10-12
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path

20.

SYSTEM, METHOD AND APPARATUS FOR MACROSCOPIC INSPECTION OF REFLECTIVE SPECIMENS

      
Application Number 18324334
Status Pending
Filing Date 2023-05-26
First Publication Date 2023-10-05
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.

IPC Classes  ?

  • H04N 23/695 - Control of camera direction for changing a field of view, e.g. pan, tilt or based on tracking of objects
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • H04N 23/56 - Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums
  • G06T 5/00 - Image enhancement or restoration
  • G06T 7/00 - Image analysis

21.

Predictive process control for a manufacturing process

      
Application Number 18329265
Grant Number 11953893
Status In Force
Filing Date 2023-06-05
First Publication Date 2023-10-05
Grant Date 2024-04-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)

22.

Method, systems and apparatus for intelligently emulating factory control systems and simulating response data

      
Application Number 18329283
Grant Number 11947671
Status In Force
Filing Date 2023-06-05
First Publication Date 2023-10-05
Grant Date 2024-04-02
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Lee, Jonathan
  • Putman, Matthew C.

Abstract

A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.

IPC Classes  ?

  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures

23.

FLUORESCENCE MICROSCOPY INSPECTION SYSTEMS, APPARATUS AND METHODS WITH DARKFIELD CHANNEL

      
Application Number 18324317
Status Pending
Filing Date 2023-05-26
First Publication Date 2023-09-21
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sharoukhov, Denis

Abstract

A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.

IPC Classes  ?

  • G02B 21/16 - Microscopes adapted for ultraviolet illumination
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums

24.

METHOD, SYSTEMS AND APPARATUS FOR INTELLIGENTLY EMULATING FACTORY CONTROL SYSTEMS AND SIMULATING RESPONSE DATA

      
Application Number 18324370
Status Pending
Filing Date 2023-05-26
First Publication Date 2023-09-21
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.

IPC Classes  ?

  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06N 20/00 - Machine learning
  • G06F 30/20 - Design optimisation, verification or simulation
  • G06F 9/455 - Emulation; Interpretation; Software simulation, e.g. virtualisation or emulation of application or operating system execution engines

25.

Threshold determination for predictive process control of factory processes, equipment and automated systems

      
Application Number 17931442
Grant Number 11747772
Status In Force
Filing Date 2022-09-12
First Publication Date 2023-09-05
Grant Date 2023-09-05
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Constantin, Sarah
  • Bordelanne, Valerie
  • Limoge, Damas
  • Lee, Jonathan

Abstract

A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 13/04 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators

26.

System and method for generating training data sets for specimen defect detection

      
Application Number 17938885
Grant Number 11727672
Status In Force
Filing Date 2022-10-07
First Publication Date 2023-08-15
Grant Date 2023-08-15
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Doshi, Anuj
  • Lee, Jonathan
  • Putman, John B.

Abstract

A system and method for generating a training data set for training a machine learning model to detect defects in specimens is described herein. A computing system cause presentation of an image on a device of a user. The image includes at least one defect on an example specimen. The computing system receives an annotated image from the user. The user annotated the image using an input via the device. The input includes a first indication of a location of the defect and a second indication of a class corresponding to the defect. The computing system adjusts the annotated image to standardize the input based on an error profile of the user and the class corresponding to the defect. The computing system uploads the annotated image for training the machine learning model.

IPC Classes  ?

  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06T 7/00 - Image analysis
  • G06V 10/22 - Image preprocessing by selection of a specific region containing or referencing a pattern; Locating or processing of specific regions to guide the detection or recognition

27.

System, method and apparatus for macroscopic inspection of reflective specimens

      
Application Number 18175216
Grant Number 11961210
Status In Force
Filing Date 2023-02-27
First Publication Date 2023-06-29
Grant Date 2024-04-16
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Lee, Jonathan
  • Limoge, Damas
  • Putman, Matthew C.
  • Putman, John B.
  • Moskie, Michael

Abstract

An inspection apparatus includes a specimen stage configured to retain a specimen, at least three imaging devices arranged in a triangular array positioned above the specimen stage, each of the at least three imaging devices configured to capture an image of the specimen, one or more sets of lights positioned between the specimen stage and the at least three imaging devices, and a control system in communication with the at least three imaging devices.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06T 7/00 - Image analysis
  • H04N 23/56 - Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means
  • H04N 23/695 - Control of camera direction for changing a field of view, e.g. pan, tilt or based on tracking of objects
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums

28.

Deep Photometric Learning (DPL) Systems, Apparatus and Methods

      
Application Number 18164940
Status Pending
Filing Date 2023-02-06
First Publication Date 2023-06-15
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Narong, Tanaporn Na
  • Sharoukhov, Denis
  • Ivanov, Tonislav

Abstract

An imaging system is disclosed herein. The imaging system includes an imaging apparatus and a computing system. The imaging apparatus includes a plurality of light sources positioned at a plurality of positions and a plurality of angles relative to a stage configured to support a specimen. The imaging apparatus is configured to capture a plurality of images of a surface of the specimen. The computing system in communication with the imaging apparatus. The computing system configured to generate a 3D-reconstruction of the surface of the specimen by receiving, from the imaging apparatus, the plurality of images of the surface of the specimen, generating, by the imaging apparatus via a deep learning model, a height map of the surface of the specimen based on the plurality of images, and outputting a 3D-reconstruction of the surface of the specimen based on the height map generated by the deep learning model.

IPC Classes  ?

  • G06T 7/586 - Depth or shape recovery from multiple images from multiple light sources, e.g. photometric stereo
  • G06N 3/08 - Learning methods
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • H04N 23/56 - Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means

29.

Dynamic monitoring and securing of factory processes, equipment and automated systems

      
Application Number 17812879
Grant Number 11669058
Status In Force
Filing Date 2022-07-15
First Publication Date 2023-06-06
Grant Date 2023-06-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Lee, Jonathan
  • Limoge, Damas

Abstract

A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric

30.

Unique oblique lighting technique using a brightfield darkfield objective and imaging method relating thereto

      
Application Number 18158277
Grant Number 11846765
Status In Force
Filing Date 2023-01-23
First Publication Date 2023-05-25
Grant Date 2023-12-19
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Orlando, Julie A.
  • Bulman, Jospeh G.

Abstract

A process is provided for imaging a surface of a specimen with an imaging system that employs a BD objective having a darkfield channel and a bright field channel, the BD objective having a circumference. The specimen is obliquely illuminated through the darkfield channel with a first arced illuminating light that obliquely illuminates the specimen through a first arc of the circumference. The first arced illuminating light reflecting off of the surface of the specimen is recorded as a first image of the specimen from the first arced illuminating light reflecting off the surface of the specimen, and a processor generates a 3D topography of the specimen by processing the first image through a topographical imaging technique. Imaging apparatus is also provided as are further process steps for other embodiments.

IPC Classes  ?

  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 5/00 - Optical elements other than lenses
  • G02B 21/08 - Condensers
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

31.

Apparatus and method for manipulating objects with gesture controls

      
Application Number 17817499
Grant Number 11747911
Status In Force
Filing Date 2022-08-04
First Publication Date 2023-04-20
Grant Date 2023-09-05
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Roossin, Paul

Abstract

An apparatus for manipulating an object includes first and second gesture controllers, each operatively connected to the object and structured and programmed such that, in a first-action active state, each can causes a first action to be carried out on the object by an appropriate first-action gesture made in the gesture controller. Only one of the first and second gesture controllers at any given time is capable of being in the first-action active state, and the first-action active state is transferable between the first and second gesture controllers upon the detecting of a first-action transfer gesture by one of said first gesture controller and said second gesture controller. Specific gesture control apparatus and methods for manipulating an object are also disclosed.

IPC Classes  ?

  • G06F 3/01 - Input arrangements or combined input and output arrangements for interaction between user and computer

32.

Systems, devices and methods for automatic microscope focus

      
Application Number 18061807
Grant Number 11796785
Status In Force
Filing Date 2022-12-05
First Publication Date 2023-04-13
Grant Date 2023-10-24
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Sharoukhov, Denis Y.

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two offset focusing cameras. Each offset focusing camera can be positioned on a different side of an image forming conjugate plane so that their sharpness curves intersect at the image forming conjugate plane. Focus of a specimen can be adjusted by using sharpness values determined from images taken by the offset focusing cameras.

IPC Classes  ?

  • G02B 21/24 - Base structure
  • G02B 21/00 - Microscopes
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 7/38 - Systems for automatic generation of focusing signals using image sharpness techniques measured at different points on the optical axis
  • G01N 15/14 - Electro-optical investigation
  • H04N 23/67 - Focus control based on electronic image sensor signals
  • H04N 23/45 - Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from two or more image sensors being of different type or operating in different modes, e.g. with a CMOS sensor for moving images in combination with a charge-coupled device [CCD] for still images

33.

METHOD, SYSTEMS AND APPARATUS FOR INTELLIGENTLY EMULATING FACTORY CONTROL SYSTEMS AND SIMULATING RESPONSE DATA

      
Application Number US2022042223
Publication Number 2023/043623
Status In Force
Filing Date 2022-08-31
Publication Date 2023-03-23
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John, B.
  • Lee, Jonathan
  • Putman, Matthew, C.

Abstract

A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.

IPC Classes  ?

  • G05B 19/04 - Programme control other than numerical control, i.e. in sequence controllers or logic controllers
  • G05B 23/02 - Electric testing or monitoring
  • G06N 3/063 - Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
  • G06N 3/08 - Learning methods
  • G05B 19/05 - Programmable logic controllers, e.g. simulating logic interconnections of signals according to ladder diagrams or function charts
  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements

34.

FAULT PROTECTED SIGNAL SPLITTER APPARATUS

      
Application Number US2022042230
Publication Number 2023/038836
Status In Force
Filing Date 2022-08-31
Publication Date 2023-03-16
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John, B.
  • Putman, Matthew, C.
  • Limoge, Damas
  • Moskie, Michael
  • Lee, Jonathan

Abstract

A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.

IPC Classes  ?

  • G01R 31/3177 - Testing of logic operation, e.g. by logic analysers
  • H01P 5/16 - Conjugate devices, i.e. devices having at least one port decoupled from one other port
  • H03M 1/10 - Calibration or testing

35.

Fault protected signal splitter apparatus

      
Application Number 17817840
Grant Number 11784386
Status In Force
Filing Date 2022-08-05
First Publication Date 2023-03-16
Grant Date 2023-10-10
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Limoge, Damas
  • Moskie, Michael
  • Lee, Jonathan

Abstract

A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.

IPC Classes  ?

  • H01P 5/16 - Conjugate devices, i.e. devices having at least one port decoupled from one other port
  • H03M 1/10 - Calibration or testing
  • G01R 31/3177 - Testing of logic operation, e.g. by logic analysers
  • H02H 7/20 - Emergency protective circuit arrangements specially adapted for specific types of electric machines or apparatus or for sectionalised protection of cable or line systems, and effecting automatic switching in the event of an undesired change from norm for electronic equipment

36.

Method, systems and apparatus for intelligently emulating factory control systems and simulating response data

      
Application Number 17447767
Grant Number 11669617
Status In Force
Filing Date 2021-09-15
First Publication Date 2023-03-16
Grant Date 2023-06-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Lee, Jonathan
  • Putman, Matthew C.

Abstract

A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.

IPC Classes  ?

  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures

37.

AIPC

      
Application Number 1712041
Status Registered
Filing Date 2022-12-21
Registration Date 2022-12-21
Owner Nanotronics Imaging, Inc. (USA)
NICE Classes  ? 42 - Scientific, technological and industrial services, research and design

Goods & Services

Research and development services and scientific consulting in the fields of imaging, optical inspection, nanotechnology, medical technology, manufacturing technology and industrial technology; development of custom hardware and software for collecting data in manufacturing, medical and industrial applications; development of custom hardware and software for controlling parameters in manufacturing, medical and industrial applications; development of custom software and hardware for analyzing data and applying deep machine learning in manufacturing, medical and industrial applications.

38.

NANOTRONICS

      
Application Number 1712201
Status Registered
Filing Date 2023-01-11
Registration Date 2023-01-11
Owner Nanotronics Imaging, Inc. (USA)
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Scientific apparatus used in industrial applications for inspection, quality control, and process control.

39.

Fueled by AIPC

      
Application Number 1711126
Status Registered
Filing Date 2022-12-21
Registration Date 2022-12-21
Owner Nanotronics Imaging, Inc. (USA)
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology. Software as a service (SAAS) services featuring software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology.

40.

AIPC BOARD

      
Application Number 1711130
Status Registered
Filing Date 2022-12-21
Registration Date 2022-12-21
Owner Nanotronics Imaging, Inc. (USA)
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable software for predictive and AI modeling, performing analysis, as well as displaying and monitoring processes, all of the foregoing in the fields of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology. Software as a service (SAAS) services featuring software for predictive and AI modeling, performing analysis, as well as displaying and monitoring processes, all of the foregoing in the fields of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology.

41.

nControl Fueled by AIPC

      
Application Number 1710514
Status Registered
Filing Date 2022-12-21
Registration Date 2022-12-21
Owner Nanotronics Imaging, Inc. (USA)
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable software for controlling parameters in manufacturing, medical and industrial application; downloadable software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology; hardware for controlling parameters in manufacturing, medical and industrial application; signal conditioners, equipment controllers and wiring. Software as a service (SAAS) services featuring software for for controlling parameters in manufacturing, medical and industrial application; software as a service (SAAS) services featuring software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology.

42.

DLC EDGE

      
Application Number 1709050
Status Registered
Filing Date 2022-12-21
Registration Date 2022-12-21
Owner Nanotronics Imaging, Inc. (USA)
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Computer hardware to run predictive and AI models and perform analysis in the field of imaging, optical inspection, nanotechnology, process control, research and development, medical technology, manufacturing technology, and industrial technology; downloadable software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, process control, research and development, medical technology, manufacturing technology, and industrial technology.

43.

nSpec

      
Application Number 1709283
Status Registered
Filing Date 2022-12-28
Registration Date 2022-12-28
Owner Nanotronics Imaging, Inc. (USA)
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Automated microscopes, microscopes, and scientific apparatus used in industrial applications for inspection, quality control and process control.

44.

SYSTEM, METHOD AND APPARATUS FOR MACROSCOPIC INSPECTION OF REFLECTIVE SPECIMENS

      
Application Number US2022037152
Publication Number 2023/287992
Status In Force
Filing Date 2022-07-14
Publication Date 2023-01-19
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Lee, Jonathan
  • Limoge, Damas
  • Putman, Matthew, C.
  • Putman, John, B.
  • Moskie, Michael

Abstract

An inspection apparatus includes a specimen stage configured to retain a specimen, at least three imaging devices arranged in a triangular array positioned above the specimen stage, each of the at least three imaging devices configured to capture an image of the specimen, one or more sets of lights positioned between the specimen stage and the at least three imaging devices, and a control system in communication with the at least three imaging devices.

IPC Classes  ?

  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06T 5/00 - Image enhancement or restoration
  • H04N 5/50 - Tuning indicators; Automatic tuning control
  • H04N 5/232 - Devices for controlling television cameras, e.g. remote control
  • H04N 5/247 - Arrangement of television cameras

45.

PRISM

      
Serial Number 97749628
Status Registered
Filing Date 2023-01-11
Registration Date 2023-10-31
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Scientific apparatus used in industrial and biological applications for visual inspection, quality control, and process control utilizing illumination at one or more frequencies of light, in the field of semiconductors Scientific apparatus used in industrial and biological inspection utilizing photoluminescence spectroscopy

46.

NSPEC

      
Serial Number 97730729
Status Registered
Filing Date 2022-12-23
Registration Date 2023-10-31
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Automated microscopes, microscopes, and Scientific apparatus used in industrial applications for inspection, quality control, and process control for manufacturing and industrial technology

47.

NANOTRONICS

      
Serial Number 97710989
Status Registered
Filing Date 2022-12-09
Registration Date 2023-10-24
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Scientific apparatus used in industrial applications for inspection, quality control, and process control for manufacturing and industrial technology Scientific research and development services; custom design and engineering of computer hardware and software in the fields of imaging, nanotechnology, inspection, quality control, process control, manufacturing technology, and industrial technology

48.

Defect Detection System

      
Application Number 17819806
Status Pending
Filing Date 2022-08-15
First Publication Date 2022-12-08
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Ivanov, Tonislav
  • Babeshko, Denis
  • Pinskiy, Vadim
  • Putman, Matthew C.
  • Sundstrom, Andrew

Abstract

A computing system generates a training data set for training the prediction model to detect defects present in a target surface of a target specimen and training the prediction model to detect defects present in the target surface of the target specimen based on the training data set. The computing system generates the training data set by identifying a set of images for training the prediction model, the set of images comprising a first subset of images. A deep learning network generates a second subset of images for subsequent labelling based on the set of images comprising the first subset of images. The deep learning network generates a third subset of images for labelling based on the set of images comprising the first subset of images and the labeled second subset of images. The computing system continues the process until a threshold number of labeled images is generated.

IPC Classes  ?

  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06V 10/82 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using neural networks
  • G06N 3/08 - Learning methods
  • G06N 20/20 - Ensemble learning
  • G06V 30/19 - Recognition using electronic means
  • G06V 10/70 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning
  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06V 10/778 - Active pattern-learning, e.g. online learning of image or video features
  • G06V 10/94 - Hardware or software architectures specially adapted for image or video understanding

49.

Macro inspection systems, apparatus and methods

      
Application Number 17817826
Grant Number 11656184
Status In Force
Filing Date 2022-08-05
First Publication Date 2022-12-01
Grant Date 2023-05-23
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

The disclosed technology relates to an inspection apparatus that includes a stage configured to retain a specimen for inspection, an imaging device having a field of view encompassing at least a portion of the stage to view a specimen retained on the stage, and a plurality of lights disposed on a moveable platform. The inspection apparatus can further include a control module coupled to the imaging device, each of the lights and the moveable platform. The control module is configured to perform operations including: receiving image data from the imaging device, where the image data indicates an illumination landscape of light incident on the specimen; and automatically modifying, based on the image data, an elevation of the moveable platform or an intensity of one or more of the lights to adjust the illumination landscape. Methods and machine-readable media are also contemplated.

IPC Classes  ?

  • G01N 21/88 - Investigating the presence of flaws, defects or contamination
  • G01N 21/00 - Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
  • G02B 21/26 - Stages; Adjusting means therefor
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/06 - Means for illuminating specimen
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06T 7/00 - Image analysis
  • H04N 5/235 - Circuitry for compensating for variation in the brightness of the object

50.

NDEX

      
Serial Number 97598748
Status Pending
Filing Date 2022-09-20
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable mobile applications for identifying and classifying objects in images, and for use in reporting, monitoring and training individuals and AI models, in the fields of manufacturing, education, medicine and pharmaceuticals; Downloadable software for locating, identifying and classifying objects in images, and for use in reporting, monitoring and training individuals and AI models, in the fields of manufacturing, education, medicine and pharmaceuticals Software as a service (SAAS) services featuring software for identifying and classifying objects in images, and for use in reporting, monitoring and training individuals and AI models, in the fields of manufacturing, education, medicine and pharmaceuticals

51.

System, method and apparatus for macroscopic inspection of reflective specimens

      
Application Number 17664535
Grant Number 11663703
Status In Force
Filing Date 2022-05-23
First Publication Date 2022-09-08
Grant Date 2023-05-30
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 7/00 - Image analysis
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • H04N 23/56 - Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums
  • H04N 23/695 - Control of camera direction for changing a field of view, e.g. pan, tilt or based on tracking of objects

52.

Method and system for mapping objects on unknown specimens

      
Application Number 17663599
Grant Number 11815673
Status In Force
Filing Date 2022-05-16
First Publication Date 2022-09-01
Grant Date 2023-11-14
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Cruickshank, John
  • Orlando, Julie
  • Frankel, Adele
  • Scott, Brandon

Abstract

A method and system for mapping fluid objects on a substrate using a microscope inspection system that includes a light source, imaging device, stage for moving a substrate disposed on the stage, and a control module. A computer analysis system includes an object identification module that identifies for each of the objects on the substrate, an object position on the substrate including a set of X, Y, and θ coordinates using algorithms, networks, machines and systems including artificial intelligence and image processing algorithms. At least one of the objects is fluid and has shifted from a prior position or deformed from a prior size.

IPC Classes  ?

  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/00 - Microscopes
  • G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts

53.

IMITATION LEARNING IN A MANUFACTURING ENVIRONMENT

      
Application Number US2022017943
Publication Number 2022/183016
Status In Force
Filing Date 2022-02-25
Publication Date 2022-09-01
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Sundstrom, Andrew
  • Limore, Damas
  • Pinskiy, Vadim
  • Nirmaleswaran, Aswin, Raghav
  • Kim, Eun-Sol

Abstract

A computing system identifies a trajectory example generated by a human operator. The trajectory example includes trajectory information of the human operator while performing a task to be learned by a control system of the computing system. Based on the trajectory example, the computing system trains the control system to perform the task exemplified in the trajectory example. Training the control system includes generating an output trajectory of a robot performing the task. The computing system identifies an updated trajectory example generated by the human operator based on the trajectory example and the output trajectory of the robot performing the task. Based on the updated trajectory example, the computing system continues to train the control system to perform the task exemplified in the updated trajectory example.

IPC Classes  ?

  • G06N 3/08 - Learning methods
  • G06N 5/04 - Inference or reasoning models
  • G06K 9/62 - Methods or arrangements for recognition using electronic means

54.

Imitation Learning in a Manufacturing Environment

      
Application Number 17652607
Status Pending
Filing Date 2022-02-25
First Publication Date 2022-08-25
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Sundstrom, Andrew
  • Limoge, Damas
  • Pinskiy, Vadim
  • Nirmaleswaran, Aswin Raghav
  • Kim, Eun-Sol

Abstract

A computing system identifies a trajectory example generated by a human operator. The trajectory example includes trajectory information of the human operator while performing a task to be learned by a control system of the computing system. Based on the trajectory example, the computing system trains the control system to perform the task exemplified in the trajectory example. Training the control system includes generating an output trajectory of a robot performing the task. The computing system identifies an updated trajectory example generated by the human operator based on the trajectory example and the output trajectory of the robot performing the task. Based on the updated trajectory example, the computing system continues to train the control system to perform the task exemplified in the updated trajectory example.

IPC Classes  ?

  • G05B 19/423 - Teaching successive positions by walk-through, i.e. the tool head or end effector being grasped and guided directly, with or without servo-assistance, to follow a path

55.

Fault protected signal splitter apparatus

      
Application Number 17646247
Grant Number 11411293
Status In Force
Filing Date 2021-12-28
First Publication Date 2022-08-09
Grant Date 2022-08-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Limoge, Damas
  • Moskie, Michael
  • Lee, Jonathan

Abstract

A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.

IPC Classes  ?

  • H01P 5/16 - Conjugate devices, i.e. devices having at least one port decoupled from one other port
  • H03M 1/10 - Calibration or testing
  • G01R 31/3177 - Testing of logic operation, e.g. by logic analysers

56.

Systems, devices, and methods for automatic microscopic focus

      
Application Number 17657815
Grant Number 11656429
Status In Force
Filing Date 2022-04-04
First Publication Date 2022-07-21
Grant Date 2023-05-23
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Orlando, Julie
  • Fashbaugh, Dylan

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two cameras. The first camera can be positioned in a first image forming conjugate plane and receives light from a first illumination source that transmits light in a first wavelength range. The second camera can be positioned at an offset distance from the first image forming conjugate plane and receives light from a second illumination source that transmits light in a second wavelength range.

IPC Classes  ?

  • G02B 7/28 - Systems for automatic generation of focusing signals
  • G02B 21/06 - Means for illuminating specimen
  • G06T 7/80 - Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
  • G02B 21/02 - Objectives
  • G02B 21/24 - Base structure
  • G02B 21/26 - Stages; Adjusting means therefor
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

57.

Fluorescence microscopy inspection systems, apparatus and methods with darkfield channel

      
Application Number 17657818
Grant Number 11662563
Status In Force
Filing Date 2022-04-04
First Publication Date 2022-07-14
Grant Date 2023-05-30
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sharoukhov, Denis

Abstract

A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.

IPC Classes  ?

  • G02B 21/16 - Microscopes adapted for ultraviolet illumination
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums

58.

NCONTROL LIVE

      
Serial Number 97501106
Status Pending
Filing Date 2022-07-13
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

computer hardware for controlling parameters in manufacturing, medical and industrial applications; real-time factory control computer hardware and embedded software systems comprised of software for controlling parameters in manufacturing, medical, and industrial applications, and also including process stations featuring cameras, proximity sensors, bar code readers, and material stress and strain indicators; downloadable computer software and mobile applications for factory control, interactive process control, quality control, displaying and monitoring engineering processes, as well as instruction, inspection, and performance evaluation; computer hardware and embedded operating software dashboards being software for displaying and monitoring real-time control system metrics

59.

NCONTROL

      
Serial Number 97470260
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable software for controlling parameters in manufacturing, medical, and industrial applications; Downloadable software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology; Computer hardware for controlling parameters in manufacturing, medical, and industrial applications; signal conditioners in the nature of signal processors that convert one type of signal to another and amplify signals to signals more robust; Equipment controllers in the nature of electrical, electronic, and electro-mechanical controllers for operating equipment and wiring sold as integral part therewith, namely, communication and power wires Software as a service (SAAS) services featuring software for for controlling parameters in manufacturing, medical, and industrial application; Software as a service (SAAS) services featuring software for predictive and AI modeling, and performing analysis in the field of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology

60.

FUELED BY AIPC

      
Serial Number 97470268
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology Software as a service (SAAS) services featuring software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology

61.

AIPC BOARD

      
Serial Number 97470270
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable software for predictive and AI modeling, performing analysis, as well as displaying and monitoring processes, all of the foregoing in the fields of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology Software as a service (SAAS) services featuring software for predictive and AI modeling, performing analysis, as well as displaying and monitoring processes, all of the foregoing in the fields of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology

62.

THE BOARD

      
Serial Number 97470274
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable software for predictive and AI modeling, performing analysis of engineering data, as well as displaying and monitoring engineering processes Software as a service (SAAS) services featuring software for predictive and AI modeling, performing analysis of engineering data, as well as displaying and monitoring engineering processes

63.

DLC CLOUD

      
Serial Number 97470275
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ? 42 - Scientific, technological and industrial services, research and design

Goods & Services

Software as a service (SAAS) services featuring software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, process control, research and development, manufacturing technology, and industrial technology; none of the foregoing related to cybersecurity

64.

DLC

      
Serial Number 97470293
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Computer hardware to run predictive and AI models and perform analysis in the field of imaging, optical inspection, nanotechnology, process control, research and development, manufacturing technology, and industrial technology; Downloadable software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, process control, research and development, manufacturing technology, and industrial technology; none of the foregoing related to cybersecurity

65.

CLEANCUBE

      
Serial Number 97470282
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ? 11 - Environmental control apparatus

Goods & Services

portable environmental test chamber system primarily comprising a cabinet with an airlock for maintaining relative humidity and temperature and also controlling particulate count for components of electronics used in manufacturing and the system also includes electronic controls for controlling temperature and humidity control cabinets and scientific apparatus in the nature of circulation apparatus being electronic components in the nature programmable logic controllers, the system being used in laboratories, nanotechnology, process control, quality control, research and development, and medical technology, the foregoing specifically excluding air purification and sterilization units

66.

NCONTROL FUELED BY AIPC

      
Serial Number 97470265
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable software for controlling parameters in manufacturing, medical, and industrial applications; Downloadable software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology; Computer hardware for controlling parameters in manufacturing, medical, and industrial applications; signal conditioners in the nature of signal processors that convert one type of signal to another and amplify signals to signals more robust; Equipment controllers in the nature of electrical, electronic, and electro-mechanical controllers for operating equipment and wiring sold as integral part therewith, namely, communication and power wires Software as a service (SAAS) services featuring software for controlling parameters in manufacturing, medical and industrial application; Software as a service (SAAS) services featuring software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, quality control, research and development, medical technology, manufacturing technology, and industrial technology

67.

DLC EDGE

      
Serial Number 97470279
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Computer hardware to run predictive and AI models and perform analysis in the field of imaging, optical inspection, nanotechnology, process control, research and development, manufacturing technology, and industrial technology; Downloadable software for predictive and AI modeling and performing analysis in the field of imaging, optical inspection, nanotechnology, process control, research and development, manufacturing technology, and industrial technology; none of the foregoing related to cybersecurity

68.

IMMUNE SYSTEM FOR THE FACTORY

      
Serial Number 97470285
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Computer hardware with preinstalled software for monitoring and controlling manufacturing plant processes and for mitigation in the event of interruptions, accidents, physical breaches, security breaches, and malicious attacks Software as a service (SAAS) services featuring software for monitoring and controlling manufacturing plant processes and for mitigation in the event of interruptions, accidents, physical breaches, security breaches, and malicious attacks

69.

NTWO

      
Serial Number 97470288
Status Pending
Filing Date 2022-06-22
Owner Nanotronics Imaging, Inc. ()
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Electronic hardware with preinstalled embedded software for signal conditioning, conversion between digital and analog, and signal replication; Digital to analog converters (DACs); Analog to digital converters (ADCs)

70.

Assembly error correction for assembly lines

      
Application Number 17646063
Grant Number 11703824
Status In Force
Filing Date 2021-12-27
First Publication Date 2022-04-21
Grant Date 2023-07-18
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
  • G06N 20/20 - Ensemble learning

71.

Deep Learning Model for Noise Reduction in Low SNR Imaging Conditions

      
Application Number 17444499
Status Pending
Filing Date 2021-08-05
First Publication Date 2022-02-10
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Sharoukhov, Denis
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

Embodiments disclosed herein are generally related to a system for noise reduction in low signal to noise ratio imaging conditions. A computing system obtains a set of images of a specimen. The set of images includes at least two images of the specimen. The computing system inputs the set of images of the specimen into a trained denoising model. The trained denoising model is configured to output a single denoised image of the specimen. The computing system receives, as output from the trained denoising model, a single denoised image of the specimen.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06T 3/40 - Scaling of a whole image or part thereof

72.

Deep Learning Model for Auto-Focusing Microscope Systems

      
Application Number 17444603
Status Pending
Filing Date 2021-08-06
First Publication Date 2022-02-10
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Sharoukhov, Denis
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

A computing system receives, from an image sensor, at least two images of a specimen positioned on a specimen stage of a microscope system. The computing system provides the at least two images to an autofocus model for detecting at least one distances to a focal plane of the specimen. The computing system identifies, via the autofocus model, the at least one distance to the focal plane of the specimen. Based on the identifying, the computing system automatically adjusts a position of the specimen stage with respect to an objective lens of the microscope system.

IPC Classes  ?

  • H04N 5/232 - Devices for controlling television cameras, e.g. remote control
  • G06T 7/00 - Image analysis

73.

System and method for improving assembly line processes

      
Application Number 17452169
Grant Number 11675330
Status In Force
Filing Date 2021-10-25
First Publication Date 2022-02-10
Grant Date 2023-06-13
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
  • G06N 20/20 - Ensemble learning

74.

DEEP LEARNING MODEL FOR NOISE REDUCTION IN LOW SNR IMAGING CONDITIONS

      
Application Number US2021044633
Publication Number 2022/031903
Status In Force
Filing Date 2021-08-05
Publication Date 2022-02-10
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Sharoukhov, Denis, Y.
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

Embodiments disclosed herein are generally related to a system for noise reduction in low signal to noise ratio imaging conditions. A computing system obtains a set of images of a specimen. The set of images includes at least two images of the specimen. The computing system inputs the set of images of the specimen into a trained denoising model. The trained denoising model is configured to output a single denoised image of the specimen. The computing system receives, as output from the trained denoising model, a single denoised image of the specimen.

IPC Classes  ?

  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • H01J 37/21 - Means for adjusting the focus

75.

DEEP LEARNING MODEL FOR AUTO-FOCUSING MICROSCOPE SYSTEMS

      
Application Number US2021044988
Publication Number 2022/032126
Status In Force
Filing Date 2021-08-06
Publication Date 2022-02-10
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Sharoukhov, Denis Y.
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

A computing system receives, from an image sensor, at least two images of a specimen positioned on a specimen stage of a microscope system. The computing system provides the at least two images to an autofocus model for detecting at least one distances to a focal plane of the specimen. The computing system identifies, via the autofocus model, the at least one distance to the focal plane of the specimen. Based on the identifying, the computing system automatically adjusts a position of the specimen stage with respect to an objective lens of the microscope system.

IPC Classes  ?

  • G02B 7/28 - Systems for automatic generation of focusing signals
  • G02B 7/36 - Systems for automatic generation of focusing signals using image sharpness techniques
  • G02B 21/24 - Base structure

76.

Systems, methods, and media for artificial intelligence process control in additive manufacturing

      
Application Number 17444619
Grant Number 11731368
Status In Force
Filing Date 2021-08-06
First Publication Date 2022-01-27
Grant Date 2023-08-22
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Pinskiy, Vadim
  • Putman, Matthew C.
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav

Abstract

Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.

IPC Classes  ?

  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/209 - Heads; Nozzles
  • B33Y 10/00 - Processes of additive manufacturing
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B22F 10/30 - Process control
  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes
  • G06F 18/20 - Analysing
  • G06F 18/2411 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on the proximity to a decision surface, e.g. support vector machines
  • G06V 10/764 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects
  • G06V 10/82 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using neural networks
  • G06V 10/98 - Detection or correction of errors, e.g. by rescanning the pattern or by human intervention; Evaluation of the quality of the acquired patterns
  • B22F 10/12 - Formation of a green body by photopolymerisation, e.g. stereolithography [SLA] or digital light processing [DLP]
  • B22F 10/18 - Formation of a green body by mixing binder with metal in filament form, e.g. fused filament fabrication [FFF]
  • B22F 10/25 - Direct deposition of metal particles, e.g. direct metal deposition [DMD] or laser engineered net shaping [LENS]
  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]

77.

Systems, Methods, and Media for Manufacturing Processes

      
Application Number 17447144
Status Pending
Filing Date 2021-09-08
First Publication Date 2021-12-23
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Hough, Fabian
  • Putman, John B.
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav
  • Nouri Gooshki, Sadegh

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a computing system. The computing system receives an image of the product at a step of the multi-step manufacturing process. The computing system determines a current state of the product based on the image of the product. The computing system determines, via a deep learning model, that the product is not within specification based on the current state of the product and the image of the product. Based on the determining, the computing system adjusts a control logic for at least a following station. The adjusting includes generating, by the deep learning model, a corrective action to be performed by the following station.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • G05B 19/4099 - Surface or curve machining, making 3D objects, e.g. desktop manufacturing
  • G06N 3/08 - Learning methods
  • B33Y 10/00 - Processes of additive manufacturing

78.

SYSTEMS, METHODS, AND MEDIA FOR MANUFACTURING PROCESSES

      
Application Number US2021038085
Publication Number 2021/257988
Status In Force
Filing Date 2021-06-18
Publication Date 2021-12-23
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Sundstrom, Andrew
  • Kim, Eun-Sol
  • Limoge, Damas
  • Pinskiy, Vadim
  • Putman, Matthew, C.

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G06N 3/08 - Learning methods
  • G06N 3/00 - Computing arrangements based on biological models
  • G05B 19/00 - Programme-control systems
  • G05B 19/18 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form

79.

SYSTEMS, METHODS, AND MEDIA FOR ARTIFICIAL INTELLIGENCE FEEDBACK CONTROL IN MANUFACTURING

      
Application Number 17445660
Status Pending
Filing Date 2021-08-23
First Publication Date 2021-12-16
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Williams, Iii, James
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav
  • Chris, Mario

Abstract

Additive manufacturing systems using artificial intelligence can identify an anomaly in a printed layer of an object from a generated topographical image of the printed layer. The additive manufacturing systems can also use artificial intelligence to determine a correlation between the identified anomaly and one or more print parameters, and adaptively adjust one or more print parameters. The additive manufacturing systems can also use artificial intelligence to optimize one or more printing parameters to achieve desired mechanical, optical and/or electrical properties.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/209 - Heads; Nozzles
  • B33Y 10/00 - Processes of additive manufacturing
  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

80.

Controlled growth system for biologicals

      
Application Number 17303620
Grant Number 11889797
Status In Force
Filing Date 2021-06-03
First Publication Date 2021-12-09
Grant Date 2024-02-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Limoge, Damas
  • Pinskiy, Vadim
  • Musselman, Parker

Abstract

A controlled growth system is provided herein. The controlled growth system includes a controlled growth environment, a controller, a sensor, and a computing system. The controlled growth environment is configured to grow a biologic. The controller is in communication with the controlled growth environment. The controller is configured to manage process parameters of the controlled growth environment. The sensor is configured to monitor the biologic during a growth process. The computing system is in communication with the sensor and the controller. The computing system is programmed to perform operations for achieving a desired final quality metric for the biologic.

IPC Classes  ?

  • A01G 18/00 - Cultivation of mushrooms
  • A01G 9/24 - Devices for heating, ventilating, regulating temperature, or watering, in greenhouses, forcing-frames, or the like
  • A01G 31/04 - Hydroponic culture on conveyors
  • A01G 2/00 - Vegetative propagation
  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • A01G 31/06 - Hydroponic culture on racks or in stacked containers
  • A01G 31/00 - Soilless cultivation, e.g. hydroponics

81.

CONTROLLED GROWTH SYSTEM FOR BIOLOGICALS

      
Application Number US2021035686
Publication Number 2021/247852
Status In Force
Filing Date 2021-06-03
Publication Date 2021-12-09
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Limoge, Damas
  • Pinskiy, Vadim
  • Musselman, Parker

Abstract

A controlled growth system is provided herein. The controlled growth system includes a controlled growth environment, a controller, a sensor, and a computing system. The controlled growth environment is configured to grow a biologic. The controller is in communication with the controlled growth environment. The controller is configured to manage process parameters of the controlled growth environment. The sensor is configured to monitor the biologic during a growth process. The computing system is in communication with the sensor and the controller. The computing system is programmed to perform operations for achieving a desired final quality metric for the biologic.

IPC Classes  ?

  • A01G 9/24 - Devices for heating, ventilating, regulating temperature, or watering, in greenhouses, forcing-frames, or the like
  • A01G 18/69 - Arrangements for managing the environment, e.g. sprinklers
  • A01G 7/00 - Botany in general
  • A01G 7/04 - Electric or magnetic treatment of plants for promoting growth
  • A01G 18/00 - Cultivation of mushrooms
  • G01N 21/00 - Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light

82.

Dynamic monitoring and securing of factory processes, equipment and automated systems

      
Application Number 17445657
Grant Number 11693956
Status In Force
Filing Date 2021-08-23
First Publication Date 2021-12-09
Grant Date 2023-07-04
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.

IPC Classes  ?

  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G06N 3/063 - Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
  • G06N 3/08 - Learning methods
  • G05B 23/02 - Electric testing or monitoring

83.

Method, systems and apparatus for intelligently emulating factory control systems and simulating response data

      
Application Number 17444621
Grant Number 11663327
Status In Force
Filing Date 2021-08-06
First Publication Date 2021-11-25
Grant Date 2023-05-30
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.

IPC Classes  ?

  • G06F 21/00 - Security arrangements for protecting computers, components thereof, programs or data against unauthorised activity
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06N 20/00 - Machine learning
  • G06F 30/20 - Design optimisation, verification or simulation
  • G06F 9/455 - Emulation; Interpretation; Software simulation, e.g. virtualisation or emulation of application or operating system execution engines

84.

System, method and apparatus for macroscopic inspection of reflective specimens

      
Application Number 17375229
Grant Number 11593919
Status In Force
Filing Date 2021-07-14
First Publication Date 2021-11-04
Grant Date 2023-02-28
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Lee, Jonathan
  • Limoge, Damas
  • Putman, Matthew C.
  • Putman, John B.
  • Moskie, Michael

Abstract

An inspection apparatus includes a specimen stage configured to retain a specimen, at least three imaging devices arranged in a triangular array positioned above the specimen stage, each of the at least three imaging devices configured to capture an image of the specimen, one or more sets of lights positioned between the specimen stage and the at least three imaging devices, and a control system in communication with the at least three imaging devices.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 7/00 - Image analysis
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • H04N 5/247 - Arrangement of television cameras
  • H04N 5/225 - Television cameras
  • H04N 5/232 - Devices for controlling television cameras, e.g. remote control

85.

Predictive process control for a manufacturing process

      
Application Number 17304611
Grant Number 11709483
Status In Force
Filing Date 2021-06-23
First Publication Date 2021-10-14
Grant Date 2023-07-25
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)

86.

DYNAMIC MONITORING AND SECURING OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number 17304614
Status Pending
Filing Date 2021-06-23
First Publication Date 2021-10-14
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.

IPC Classes  ?

  • H04L 29/06 - Communication control; Communication processing characterised by a protocol
  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • G06N 3/08 - Learning methods

87.

Systems, Methods, and Media for Manufacturing Processes

      
Application Number 17304349
Status Pending
Filing Date 2021-06-18
First Publication Date 2021-10-07
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Sundstrom, Andrew
  • Kim, Eun-Sol
  • Limoge, Damas
  • Pinskiy, Vadim
  • Putman, Matthew C.

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
  • G06T 7/33 - Determination of transform parameters for the alignment of images, i.e. image registration using feature-based methods
  • G06T 7/00 - Image analysis
  • G06T 1/00 - General purpose image data processing
  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints

88.

Predictive process control for a manufacturing process

      
Application Number 17304613
Grant Number 11669078
Status In Force
Filing Date 2021-06-23
First Publication Date 2021-10-07
Grant Date 2023-06-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)

89.

SYSTEMS, METHODS, AND MEDIA FOR MANUFACTURING PROCESSES

      
Application Number US2021021440
Publication Number 2021/183468
Status In Force
Filing Date 2021-03-09
Publication Date 2021-09-16
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Nirmaleswaran, Aswin Raghav
  • Kim, Eun-Sol

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G06F 19/00 - Digital computing or data processing equipment or methods, specially adapted for specific applications (specially adapted for specific functions G06F 17/00;data processing systems or methods specially adapted for administrative, commercial, financial, managerial, supervisory or forecasting purposes G06Q;healthcare informatics G16H)

90.

DEFECT DETECTION SYSTEM

      
Application Number US2021021449
Publication Number 2021/183473
Status In Force
Filing Date 2021-03-09
Publication Date 2021-09-16
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Ivanov, Tonislav
  • Babeshko, Denis
  • Pinskiy, Vadim
  • Putman, Matthew, C.
  • Sundstrom, Andrew

Abstract

A computing system generates a training data set for training the prediction model to detect defects present in a target surface of a target specimen and training the prediction model to detect defects present in the target surface of the target specimen based on the training data set. The computing system generates the training data set by identifying a set of images for training the prediction model, the set of images comprising a first subset of images. A deep learning network generates a second subset of images for subsequent labelling based on the set of images comprising the first subset of images. The deep learning network generates a third subset of images for labelling based on the set of images comprising the first subset of images and the labeled second subset of images. The computing system continues the process until a threshold number of labeled images is generated.

IPC Classes  ?

  • G06N 3/02 - Neural networks
  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06T 7/10 - Segmentation; Edge detection

91.

Defect detection system

      
Application Number 17195760
Grant Number 11416711
Status In Force
Filing Date 2021-03-09
First Publication Date 2021-09-09
Grant Date 2022-08-16
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Ivanov, Tonislav
  • Babeshko, Denis
  • Pinskiy, Vadim
  • Putman, Matthew C.
  • Sundstrom, Andrew

Abstract

A computing system generates a training data set for training the prediction model to detect defects present in a target surface of a target specimen and training the prediction model to detect defects present in the target surface of the target specimen based on the training data set. The computing system generates the training data set by identifying a set of images for training the prediction model, the set of images comprising a first subset of images. A deep learning network generates a second subset of images for subsequent labelling based on the set of images comprising the first subset of images. The deep learning network generates a third subset of images for labelling based on the set of images comprising the first subset of images and the labeled second subset of images. The computing system continues the process until a threshold number of labeled images is generated.

IPC Classes  ?

  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06V 10/82 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using neural networks
  • G06N 3/08 - Learning methods
  • G06N 20/20 - Ensemble learning
  • G06V 30/19 - Recognition using electronic means
  • G06V 10/70 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning
  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06V 10/778 - Active pattern-learning, e.g. online learning of image or video features
  • G06V 10/94 - Hardware or software architectures specially adapted for image or video understanding

92.

METHOD, SYSTEMS AND APPARATUS FOR INTELLIGENTLY EMULATING FACTORY CONTROL SYSTEMS AND SIMULATING RESPONSE DATA

      
Application Number US2021019857
Publication Number 2021/173961
Status In Force
Filing Date 2021-02-26
Publication Date 2021-09-02
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Putman, John, B.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Williams, James, Iii

Abstract

A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.

IPC Classes  ?

  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G05B 13/04 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
  • G05B 19/04 - Programme control other than numerical control, i.e. in sequence controllers or logic controllers
  • G06F 9/455 - Emulation; Interpretation; Software simulation, e.g. virtualisation or emulation of application or operating system execution engines
  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06N 3/08 - Learning methods

93.

Systems, Methods, and Media for Manufacturing Processes

      
Application Number 17180422
Status Pending
Filing Date 2021-02-19
First Publication Date 2021-08-26
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Nouri Gooshki, Sadegh
  • Nirmaleswaran, Aswin Raghav
  • Hough, Fabian

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G06N 3/08 - Learning methods
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

94.

SYSTEMS, METHODS, AND MEDIA FOR MANUFACTURING PROCESSES

      
Application Number US2021018858
Publication Number 2021/168308
Status In Force
Filing Date 2021-02-19
Publication Date 2021-08-26
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Limoge, Damas, W.
  • Nouri Gooshki, Sadegh
  • Nirmaleswaran, Aswin Raghav
  • Hough, Fabian

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/4099 - Surface or curve machining, making 3D objects, e.g. desktop manufacturing
  • G06N 3/08 - Learning methods

95.

SECURING INDUSTRIAL PRODUCTION FROM SOPHISTICATED ATTACKS

      
Application Number 16953550
Status Pending
Filing Date 2020-11-20
First Publication Date 2021-08-19
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to detect a cyberattack to the manufacturing system. The control module is configured to perform operations. The operations include receiving control values for a first station of the one or more stations. The operations further include determining that there is a cyberattack based on the control values for the first station using one or more machine learning algorithms. The operations further include generating an alert to cease processing of the component. In some embodiments, the operations further include correcting errors caused by the cyberattack.

IPC Classes  ?

  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06N 20/00 - Machine learning

96.

DEEP PHOTOMETRIC LEARNING (DPL) SYSTEMS, APPARATUS AND METHODS

      
Application Number US2021016474
Publication Number 2021/158703
Status In Force
Filing Date 2021-02-03
Publication Date 2021-08-12
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew, C.
  • Pinskiy, Vadim
  • Narong, Tanaporn, Na
  • Sharoukhov, Denis, Y.
  • Ivanov, Tonislav

Abstract

An imaging system is disclosed herein. The imaging system includes an imaging apparatus and a computing system. The imaging apparatus includes a plurality of light sources positioned at a plurality of positions and a plurality of angles relative to a stage configured to support a specimen. The imaging apparatus is configured to capture a plurality of images of a surface of the specimen. The computing system in communication with the imaging apparatus. The computing system configured to generate a 3D-reconstruction of the surface of the specimen by receiving, from the imaging apparatus, the plurality of images of the surface of the specimen, generating, by the imaging apparatus via a deep learning model, a height map of the surface of the specimen based on the plurality of images, and outputting a 3D-reconstruction of the surface of the specimen based on the height map generated by the deep learning model.

IPC Classes  ?

97.

Method, systems and apparatus for intelligently emulating factory control systems and simulating response data

      
Application Number 16900124
Grant Number 11086988
Status In Force
Filing Date 2020-06-12
First Publication Date 2021-08-10
Grant Date 2021-08-10
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.

IPC Classes  ?

  • G06F 21/00 - Security arrangements for protecting computers, components thereof, programs or data against unauthorised activity
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06N 20/00 - Machine learning
  • G06F 30/20 - Design optimisation, verification or simulation
  • G06F 9/455 - Emulation; Interpretation; Software simulation, e.g. virtualisation or emulation of application or operating system execution engines

98.

Deep photometric learning (DPL) systems, apparatus and methods

      
Application Number 17166976
Grant Number 11574413
Status In Force
Filing Date 2021-02-03
First Publication Date 2021-08-05
Grant Date 2023-02-07
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Narong, Tanaporn Na
  • Sharoukhov, Denis
  • Ivanov, Tonislav

Abstract

An imaging system is disclosed herein. The imaging system includes an imaging apparatus and a computing system. The imaging apparatus includes a plurality of light sources positioned at a plurality of positions and a plurality of angles relative to a stage configured to support a specimen. The imaging apparatus is configured to capture a plurality of images of a surface of the specimen. The computing system in communication with the imaging apparatus. The computing system configured to generate a 3D-reconstruction of the surface of the specimen by receiving, from the imaging apparatus, the plurality of images of the surface of the specimen, generating, by the imaging apparatus via a deep learning model, a height map of the surface of the specimen based on the plurality of images, and outputting a 3D-reconstruction of the surface of the specimen based on the height map generated by the deep learning model.

IPC Classes  ?

  • G06T 7/586 - Depth or shape recovery from multiple images from multiple light sources, e.g. photometric stereo
  • H04N 5/225 - Television cameras
  • G06N 3/08 - Learning methods
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

99.

Systems, devices, and methods for providing feedback on and improving the accuracy of super-resolution imaging

      
Application Number 17222425
Grant Number 11748846
Status In Force
Filing Date 2021-04-05
First Publication Date 2021-07-22
Grant Date 2023-09-05
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Succar, Joseph

Abstract

Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.

IPC Classes  ?

  • G03H 1/00 - HOLOGRAPHIC PROCESSES OR APPARATUS - Details peculiar thereto
  • G06T 3/40 - Scaling of a whole image or part thereof
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06V 10/98 - Detection or correction of errors, e.g. by rescanning the pattern or by human intervention; Evaluation of the quality of the acquired patterns
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
  • G06F 18/2411 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on the proximity to a decision surface, e.g. support vector machines
  • G06F 18/2413 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on distances to training or reference patterns
  • G06V 10/764 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects

100.

Unique oblique lighting technique using a brightfield darkfield objective and imaging method relating thereto

      
Application Number 17208222
Grant Number 11561383
Status In Force
Filing Date 2021-03-22
First Publication Date 2021-07-08
Grant Date 2023-01-24
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Orlando, Julie A.
  • Bulman, Jospeh G.

Abstract

A process is provided for imaging a surface of a specimen with an imaging system that employs a BD objective having a darkfield channel and a bright field channel, the BD objective having a circumference. The specimen is obliquely illuminated through the darkfield channel with a first arced illuminating light that obliquely illuminates the specimen through a first arc of the circumference. The first arced illuminating light reflecting off of the surface of the specimen is recorded as a first image of the specimen from the first arced illuminating light reflecting off the surface of the specimen, and a processor generates a 3D topography of the specimen by processing the first image through a topographical imaging technique. Imaging apparatus is also provided as are further process steps for other embodiments.

IPC Classes  ?

  • G02B 5/00 - Optical elements other than lenses
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/08 - Condensers
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