Mitsubishi Gas Chemical Company, Inc.

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[Owner] Mitsubishi Gas Chemical Company, Inc. 1,075
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IPC Class
G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics 95
C08J 5/24 - Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs 79
B32B 27/08 - Layered products essentially comprising synthetic resin as the main or only constituent of a layer next to another layer of a specific substance of synthetic resin of a different kind 74
B32B 27/36 - Layered products essentially comprising synthetic resin comprising polyesters 72
H05K 1/03 - Use of materials for the substrate 68
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1.

GLYCIDYL (METH)ACRYLATE COMPOSITION

      
Application Number 18272216
Status Pending
Filing Date 2022-01-19
First Publication Date 2024-04-25
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Yuri, Michihiro
  • Suzuki, Kouji
  • Suzuki, Shu

Abstract

Provided are a glycidyl (meth)acrylate composition, which includes a phenolic polymerization inhibitor that is unlikely to deteriorate such that the glycidyl (meth)acrylate composition can be stably stored for a long period of time, and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate resin composition. More specifically, provided are: a glycidyl (meth)acrylate composition including a glycidyl (meth)acrylate, a quaternary ammonium salt, a strong acid salt, and a phenolic polymerization inhibitor; and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate composition, the method including adjusting the content of a strong acid salt in the glycidyl (meth)acrylate composition to a certain amount relative to an amount of a quaternary ammonium salt by mole.

IPC Classes  ?

  • C08F 2/40 - Polymerisation using regulators, e.g. chain terminating agents using retarding agents
  • C08K 5/13 - Phenols; Phenolates

2.

COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD

      
Application Number 18278877
Status Pending
Filing Date 2022-03-04
First Publication Date 2024-04-25
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Takakuwa, Hiroaki
  • Horita, Akinobu
  • Kikunaga, Takahiro

Abstract

A cleaning composition for semiconductor substrates, containing an alkaline compound (A), a corrosion inhibitor (B), and water, wherein the alkaline compound (A) is at least one selected from the group consisting of a quaternary ammonium hydroxide (A1) and potassium hydroxide (A2), and the corrosion inhibitor (B) is at least one selected from the group consisting of 4-substituted pyrazoles, potassium tris(1-pyrazolyl)borohydride, 2-(4-thiazolyl)benzimidazole, and halogenated-8-hydroxyquinolines.

IPC Classes  ?

  • C11D 3/28 - Heterocyclic compounds containing nitrogen in the ring
  • C11D 3/00 - Other compounding ingredients of detergent compositions covered in group
  • C11D 3/04 - Water-soluble compounds
  • C11D 3/20 - Organic compounds containing oxygen
  • C11D 3/30 - Amines; Substituted amines
  • C11D 3/43 - Solvents

3.

METHOD FOR PRODUCING 2,4-DIALKYLBENZALDEHYDE

      
Application Number 17769151
Status Pending
Filing Date 2020-10-16
First Publication Date 2024-04-25
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Shishimi, Toru
  • Utamura, Tatsuya
  • Matsuura, Yutaka
  • Nagao, Shinichi

Abstract

An object of the present invention is to provide a method for producing 2,4-dialkylbenzaldehyde with excellent conversion rate and yield, and excellent regioselectivity for formylation, by allowing carbon monoxide to react on a starting material containing a specific m-dialkylbenzene in the presence of hydrogen fluoride and boron trifluoride. The method for producing 2,4-dialkylbenzaldehyde according to the present invention comprises a step of allowing carbon monoxide to react on a starting material containing m-dialkylbenzene represented by formula (1) in the presence of hydrogen fluoride and boron trifluoride for formylation at least at a position (a), wherein the starting material is a dialkylbenzene containing more than 90 mol % of m-dialkylbenzene represented by formula (1), and the number of moles of boron trifluoride relative to 1 mole of m-dialkylbenzene represented by formula (1) is 0.7 mol or more and 3.0 mol or less: An object of the present invention is to provide a method for producing 2,4-dialkylbenzaldehyde with excellent conversion rate and yield, and excellent regioselectivity for formylation, by allowing carbon monoxide to react on a starting material containing a specific m-dialkylbenzene in the presence of hydrogen fluoride and boron trifluoride. The method for producing 2,4-dialkylbenzaldehyde according to the present invention comprises a step of allowing carbon monoxide to react on a starting material containing m-dialkylbenzene represented by formula (1) in the presence of hydrogen fluoride and boron trifluoride for formylation at least at a position (a), wherein the starting material is a dialkylbenzene containing more than 90 mol % of m-dialkylbenzene represented by formula (1), and the number of moles of boron trifluoride relative to 1 mole of m-dialkylbenzene represented by formula (1) is 0.7 mol or more and 3.0 mol or less: a wherein R1 represents an alkyl group having 1 or more and 3 or less carbon atoms, and R2represents a chain or cyclic alkyl group having 2 or more and 7 or less carbon atoms, with a secondary or tertiary carbon at the benzylic position, provided that the number of carbons of R2 is larger than the number of carbons of R1.

IPC Classes  ?

  • C07C 45/49 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reaction with carbon monoxide

4.

CARBON DIOXIDE ABSORBENT

      
Application Number 18267616
Status Pending
Filing Date 2021-12-14
First Publication Date 2024-04-18
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Kouno, Kazuki
  • Kawashima, Yuki

Abstract

A carbon dioxide absorbent containing a polyamine compound (A) having an alicyclic hydrocarbon structure, wherein a content of the polyamine compound (A) is 60% by mass or more.

IPC Classes  ?

5.

RESIN COMPOSITION, AND PRINTING INK AND ELECTROCONDUCTIVE PASTE EACH USING SAME

      
Application Number 18276107
Status Pending
Filing Date 2022-02-10
First Publication Date 2024-04-18
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Goto, Toshihito
  • Ogawa, Noriyoshi

Abstract

According to the present invention, a resin composition can be provided, which comprises a solvent represented by general formula (1) and a polycarbonate resin containing a structural unit (a) represented by general formula (A) (provided that a polycarbonate homopolymer composed only of a structural unit represented by formula (i) is excluded). (In formula (1), Ra represents a hydrogen atom or the like; Rb represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or the like; Rc to Rf independently represent a hydrogen atom or the like; and n represents an integer of 1 to 10.) (In formula (A), R1 to R8 independently represent a hydrogen atom or the like; and X represents —O— or the like.)

IPC Classes  ?

  • C08G 64/06 - Aromatic polycarbonates not containing aliphatic unsaturation
  • C09D 7/63 - Additives non-macromolecular organic
  • C09D 11/102 - Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
  • C09D 169/00 - Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates

6.

METHODS FOR PRODUCING POLYCARBONATE COPOLYMER AND POLYSILOXANE COMPOUND, POLYCARBONATE COPOLYMER, POLYSILOXANE COMPOUND, COMPOSITION, AND MOLDED BODY

      
Application Number 18515885
Status Pending
Filing Date 2023-11-21
First Publication Date 2024-04-18
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Uera, Kazuyoshi
  • Kamatani, Kohei
  • Tomita, Keisuke
  • Akimoto, Hisato

Abstract

A polycarbonate copolymer which has siloxane constituent units represented by any of formulae (1-1) to (1-4) and prescribed polycarbonate constituent units. A polycarbonate copolymer which has siloxane constituent units represented by any of formulae (1-1) to (1-4) and prescribed polycarbonate constituent units.

IPC Classes  ?

  • C08L 83/16 - Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Compositions of derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
  • C08G 64/16 - Aliphatic-aromatic or araliphatic polycarbonates
  • C08G 64/38 - General preparatory processes using other monomers
  • C08G 77/60 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon in which all the silicon atoms are connected by linkages other than oxygen atoms
  • C08L 69/00 - Compositions of polycarbonates; Compositions of derivatives of polycarbonates

7.

POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION

      
Application Number 18273014
Status Pending
Filing Date 2022-01-11
First Publication Date 2024-04-11
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Matsuura, Kodai
  • Horiuchi, Junya
  • Okada, Yu
  • Omatsu, Tadashi
  • Echigo, Masatoshi

Abstract

A polymer having a constituent unit derived from a monomer represented by the following formula (0), wherein the polymer has sites in which the constituent units are linked by direct bonding between aromatic rings of the monomer represented by the formula (0): A polymer having a constituent unit derived from a monomer represented by the following formula (0), wherein the polymer has sites in which the constituent units are linked by direct bonding between aromatic rings of the monomer represented by the formula (0): A polymer having a constituent unit derived from a monomer represented by the following formula (0), wherein the polymer has sites in which the constituent units are linked by direct bonding between aromatic rings of the monomer represented by the formula (0): wherein R is a monovalent group, and m is an integer of 1 to 5, wherein at least one R is a hydroxyl group, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, or an amino group having 0 to 40 carbon atoms and optionally having a substituent.

IPC Classes  ?

  • C08G 61/02 - Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
  • C08G 8/16 - Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with amino- or nitrophenols
  • C08G 8/22 - Resorcinol
  • G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • G03F 7/22 - Exposing sequentially with the same light pattern different positions of the same surface
  • G03F 7/26 - Processing photosensitive materials; Apparatus therefor
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or

8.

COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

      
Application Number 18276480
Status Pending
Filing Date 2022-02-04
First Publication Date 2024-04-11
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Oie, Toshiyuki
  • Adaniya, Tomoyuki

Abstract

Provided is a composition for cleaning semiconductor substrates, having high removal rate of tungsten oxide with high Ti/W etching selectivity. Provided is a composition for cleaning semiconductor substrates, having high removal rate of tungsten oxide with high Ti/W etching selectivity. The composition for cleaning semiconductor substrates, comprising an oxidizing agent (A), a fluorine compound (B), a metallic tungsten corrosion inhibiter (C), and a tungsten oxide etching accelerator (D), wherein the addition ratio of the oxidizing agent (A) is from 0.0001 to 10% by mass relative to the total mass of the composition for cleaning semiconductor substrates; the addition ratio of the fluorine compound (B) is from 0.005 to 10% by mass relative to the total mass of the composition for cleaning semiconductor substrates; and the addition ratio of the metallic tungsten corrosion inhibiter (C) is from 0.0001 to 5% by mass relative to the total mass of the composition for cleaning semiconductor substrates.

IPC Classes  ?

  • C11D 3/24 - Organic compounds containing halogen
  • C11D 3/00 - Other compounding ingredients of detergent compositions covered in group
  • C11D 11/00 - Special methods for preparing compositions containing mixtures of detergents

9.

ACID MATRIX APPLICATIONS: WELL STIMULATION AND COMPLETION FLUIDS USING VISCOELASTIC SURFACTANTS AND MODIFIED ADDITIVES

      
Application Number 17766977
Status Pending
Filing Date 2020-10-07
First Publication Date 2024-04-11
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Advincula, Rigoberto C.
  • Mimura, Kunitoshi
  • Ohno, Daisuke
  • Shimada, Masahiro

Abstract

A composition for an oil or gas well formation, containing a viscoelastic surfactant; and a modified nanomaterial and a producing method of the composition, and a forming method of the oil or gas well. The modified nanomaterial optionally contains a nanocellulose. The modified nanomaterial optionally has, on its surface, a sulfate group, a sulfite group, a carboxy group, an ethylene oxide chain, an amino group, an ester group, a silane group, a tertiary ammonium group or a mixture thereof.

IPC Classes  ?

  • C09K 8/20 - Natural organic compounds or derivatives thereof, e.g. polysaccharides or lignin derivatives

10.

COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, COMPOSITION FOR OPTICAL MEMBER FORMATION, RESIN FOR UNDERLAYER FILM FORMATION, RESIST RESIN, RADIATION-SENSITIVE RESIN, AND RESIN FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY

      
Application Number 18013870
Status Pending
Filing Date 2021-07-08
First Publication Date 2024-04-11
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Yamamoto, Hiroaki
  • Matsuura, Kodai
  • Horiuchi, Junya
  • Iwasaki, Atsuko
  • Makinoshima, Takashi
  • Echigo, Masatoshi

Abstract

A composition for film formation containing a polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1-0), (1A), and (1B), wherein the repeating units are linked by a direct bond between aromatic rings: A composition for film formation containing a polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1-0), (1A), and (1B), wherein the repeating units are linked by a direct bond between aromatic rings:

IPC Classes  ?

  • C08G 61/02 - Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
  • C08G 61/12 - Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
  • C09D 165/00 - Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
  • G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

11.

MOLDED ARTICLE MANUFACTURING METHOD, RESIN IMPREGNATING APPARATUS, AND 3D PRINTER

      
Application Number 18039916
Status Pending
Filing Date 2021-10-29
First Publication Date 2024-04-11
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Matsumoto, Nobuhiko
  • Ikeuchi, Kousuke
  • Hashimoto, Ryoma

Abstract

Provided are a method for manufacturing a molded article consisting of a fiber-reinforced composite material containing a cured product of a thermosetting resin or a thermosetting resin composition and continuous reinforcing fibers, the method including, in this order, Steps (I) to (III) described below, a resin impregnating apparatus suitably used for the manufacturing method, and a 3D printer. Step (I): A coating step of coating a surface of a continuous reinforcing fiber bundle with a thermosetting resin or a thermosetting resin composition. Step (II): A resin impregnating step of twisting the continuous reinforcing fiber bundle after step (I) and obtaining a prepreg impregnated with the thermosetting resin or the thermosetting resin composition. Step (III): A heating and molding step of disposing the prepreg obtained in step (II) above and then heating the prepreg.

IPC Classes  ?

  • B29B 15/12 - Coating or impregnating of reinforcements of indefinite length
  • B33Y 70/10 - Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
  • B33Y 80/00 - Products made by additive manufacturing

12.

RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN

      
Application Number 18277366
Status Pending
Filing Date 2022-01-28
First Publication Date 2024-04-04
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Horiuchi, Junya
  • Makinoshima, Takashi
  • Sato, Takashi
  • Echigo, Masatoshi

Abstract

An object of the present invention is to provide a novel resin that is useful as a film forming material for lithography and the like. The problem can be solved by a resin containing a constituent unit represented by the following formula (1) or (1)′: An object of the present invention is to provide a novel resin that is useful as a film forming material for lithography and the like. The problem can be solved by a resin containing a constituent unit represented by the following formula (1) or (1)′: An object of the present invention is to provide a novel resin that is useful as a film forming material for lithography and the like. The problem can be solved by a resin containing a constituent unit represented by the following formula (1) or (1)′: wherein the variables in the formulas are as described in the specification.

IPC Classes  ?

  • C08G 8/20 - Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols
  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • G03F 7/20 - Exposure; Apparatus therefor
  • G03F 7/26 - Processing photosensitive materials; Apparatus therefor
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or

13.

CARBON DIOXIDE ABSORBER

      
Application Number 18273103
Status Pending
Filing Date 2021-12-20
First Publication Date 2024-03-28
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Kouno, Kazuki
  • Kawashima, Yuki
  • Asai, Ryo
  • Kirino, Tomoaki

Abstract

A carbon dioxide absorbent containing an amine compound (A) having a heterocyclic structure (X) selected from the group consisting of an oxygen-containing heterocyclic structure and a sulfur-containing heterocyclic structure, a content of the amine compound (A) being 65% by mass or more.

IPC Classes  ?

  • B01D 53/14 - Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by absorption
  • C07D 295/13 - Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
  • C07D 307/14 - Radicals substituted by nitrogen atoms not forming part of a nitro radical
  • C07D 307/52 - Radicals substituted by nitrogen atoms not forming part of a nitro radical
  • C07D 309/04 - Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
  • C07D 333/20 - Radicals substituted by singly bound hetero atoms other than halogen by nitrogen atoms

14.

BISIMIDE PHENOL COMPOUND

      
Application Number 18504785
Status Pending
Filing Date 2023-11-08
First Publication Date 2024-03-21
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Hikichi, Tatsuya
  • Wakahara, Daiki
  • Ohnishi, Nobuyoshi

Abstract

A bisimide phenyl ester acid dianhydride represented by the following formula (2): A bisimide phenyl ester acid dianhydride represented by the following formula (2): A bisimide phenyl ester acid dianhydride represented by the following formula (2): where R3 and R4 each independently represents a hydrogen atom or an organic group having 1 to 10 carbon atoms; each m is independently an integer of 1 to 4; and each A independently represents an aromatic ring or an alicyclic ring.

IPC Classes  ?

  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

15.

PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE

      
Application Number 18038574
Status Pending
Filing Date 2021-11-10
First Publication Date 2024-03-14
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Sato, Yumi
  • Miyahara, Daichi
  • Umeki, Miho

Abstract

A photosensitive polyimide resin composition containing: a ring-closed polyimide resin (A) having a structure represented by Formula (1) and a weight average molecular weight of 70000 or less; and a polyfunctional radically polymerizable compound (B) having 4 or more and 100 or less radically polymerizable functional groups. A photosensitive polyimide resin composition containing: a ring-closed polyimide resin (A) having a structure represented by Formula (1) and a weight average molecular weight of 70000 or less; and a polyfunctional radically polymerizable compound (B) having 4 or more and 100 or less radically polymerizable functional groups.

IPC Classes  ?

  • G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists

16.

PHOTOCURABLE COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL MATERIAL CONTAINING SAID CURED PRODUCT

      
Application Number 18273244
Status Pending
Filing Date 2022-01-11
First Publication Date 2024-03-14
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Kinjo, Kota
  • Namiki, Kosuke
  • Furukawa, Kikuo
  • Koshiishi, Eiji

Abstract

According to the present invention, there can be provided a photocurable composition comprising a sulfur (a) having a cyclic structure represented by the following formula (1), an episulfide compound (b), and a photopolymerization initiator (c), wherein the content of the sulfur (a) is 1 to 28 parts by mass, with respect to the total mass (100 parts by mass) of the sulfur (a) and the episulfide compound (b): According to the present invention, there can be provided a photocurable composition comprising a sulfur (a) having a cyclic structure represented by the following formula (1), an episulfide compound (b), and a photopolymerization initiator (c), wherein the content of the sulfur (a) is 1 to 28 parts by mass, with respect to the total mass (100 parts by mass) of the sulfur (a) and the episulfide compound (b):

IPC Classes  ?

  • C08L 81/04 - Polysulfides
  • C08J 3/28 - Treatment by wave energy or particle radiation
  • C08K 5/375 - Sulfides containing six-membered aromatic rings
  • C08K 5/45 - Heterocyclic compounds having sulfur in the ring
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

17.

POLYESTER RESIN AND METHOD FOR PRODUCING POLYESTER RESIN

      
Application Number 18500152
Status Pending
Filing Date 2023-11-02
First Publication Date 2024-03-07
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Shinohara, Katsumi
  • Sato, Kazua
  • Ikarashi, Hiroki

Abstract

A polyester resin containing: a diol constituent unit containing a unit a1 derived from spiroglycol represented by formula (1) and a unit a2 derived from ethylene glycol; and a dicarboxylic acid constituent unit containing a unit b derived from terephthalic acid and/or an ester thereof. A content of the unit a1 is from 5 to 60 mol % and a content of the unit a2 is from 30 to 95 mol %, based on a total amount of the unit a1 and the unit a2. A content of the unit b is from 80 to 100 mol % based on a total amount of the dicarboxylic acid constituent unit. A polyester resin containing: a diol constituent unit containing a unit a1 derived from spiroglycol represented by formula (1) and a unit a2 derived from ethylene glycol; and a dicarboxylic acid constituent unit containing a unit b derived from terephthalic acid and/or an ester thereof. A content of the unit a1 is from 5 to 60 mol % and a content of the unit a2 is from 30 to 95 mol %, based on a total amount of the unit a1 and the unit a2. A content of the unit b is from 80 to 100 mol % based on a total amount of the dicarboxylic acid constituent unit.

IPC Classes  ?

  • C08G 63/672 - Dicarboxylic acids and dihydroxy compounds

18.

SYSTEM FOR PRODUCING HYDROCARBON COMPOUND AND METHOD FOR PRODUCING HYDROCARBON COMPOUND

      
Application Number 18272425
Status Pending
Filing Date 2022-02-24
First Publication Date 2024-02-29
Owner
  • MITSUBISHI HEAVY INDUSTRIES, LTD. (Japan)
  • MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Marushima, Shinya
  • Irie, Kenichi
  • Kamo, Takahiro
  • Tanioka, Tadateru
  • Ando, Yoshimasa
  • Tsutsumi, Atsushi

Abstract

Provided is a production system for producing a hydrocarbon compound, which is a hydrocarbon compound production system capable of managing an environmental load reducing effect derived from a raw material. The hydrocarbon compound production system includes a hydrogen production device that generates hydrogen, a carbon dioxide supply device that supplies a carbon dioxide, and a hydrocarbon compound production device that generates a hydrocarbon compound from each of the hydrogen generated by the hydrogen production device and the carbon dioxide supplied from the carbon dioxide supply device, wherein, on the basis of at least either one of respective environmental indicators of the hydrogen generated by the hydrogen production device and the carbon dioxide supplied from the carbon dioxide supply device, an environmental load level of the hydrocarbon compound generated by the hydrocarbon compound production device is categorized.

IPC Classes  ?

  • C10G 2/00 - Production of liquid hydrocarbon mixtures of undefined composition from oxides of carbon

19.

COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAME

      
Application Number 18269091
Status Pending
Filing Date 2021-10-04
First Publication Date 2024-02-15
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Imagawa, Yousuke
  • Takemura, Kouhei
  • Sugihara, Ryosuke
  • Sado, Mariko

Abstract

A composition that includes Compound (a) and Compound (b). Compound (a) is represented by formula (1): A composition that includes Compound (a) and Compound (b). Compound (a) is represented by formula (1): A composition that includes Compound (a) and Compound (b). Compound (a) is represented by formula (1): where: Ar represents an aromatic ring; m represents an integer of 2 to 8; n represents an integer of 0 to 6, provided that m+n is the number of carbon atoms constituting the aromatic ring, or less; and R1 each independently represents an alkylthio group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group. Compound (b) is represented by formula (2): A composition that includes Compound (a) and Compound (b). Compound (a) is represented by formula (1): where: Ar represents an aromatic ring; m represents an integer of 2 to 8; n represents an integer of 0 to 6, provided that m+n is the number of carbon atoms constituting the aromatic ring, or less; and R1 each independently represents an alkylthio group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group. Compound (b) is represented by formula (2): A composition that includes Compound (a) and Compound (b). Compound (a) is represented by formula (1): where: Ar represents an aromatic ring; m represents an integer of 2 to 8; n represents an integer of 0 to 6, provided that m+n is the number of carbon atoms constituting the aromatic ring, or less; and R1 each independently represents an alkylthio group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group. Compound (b) is represented by formula (2): where p represents an integer of 0 to 4, and q represents an integer of 0 to 2.

IPC Classes  ?

  • C08G 75/08 - Polythioethers from cyclic thioethers from thiiranes
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

20.

ROUGHENING TREATMENT METHOD FOR STAINLESS STEEL SURFACE, METHOD FOR MANUFACTURING ROUGHENED STAINLESS STEEL, AND AQUEOUS COMPOSITION USED IN SAID METHODS

      
Application Number 18266624
Status Pending
Filing Date 2021-12-13
First Publication Date 2024-02-08
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Ikeda, Kazuhiko
  • Fujii, Tomoko
  • Matsunaga, Hiroshi

Abstract

The problem of the present invention is to provide a roughening treatment method in which the surface of stainless steel is sufficiently roughened in an efficient manner with few steps, while maintaining good surface quality of the stainless steel after treatment. The above problem is solved by a roughening treatment method for stainless steel, which comprises a roughening treatment step that uses a first aqueous composition, and a post-treatment step that uses a second aqueous composition. Namely, the roughening treatment step is to roughen the surface of stainless steel containing copper or a metal having an ionization tendency larger than copper by bringing the first aqueous composition into contact with the surface, wherein the first aqueous composition comprises 0.1% to 20% by mass of hydrogen peroxide based on the total amount of the first aqueous composition, 0.25% to 40% by mass of copper ions based on the total amount of the first aqueous composition, and 1% to 30% by mass of halide ions based on the total amount of the first aqueous composition, wherein the post-treatment step is to perform a post-treatment by bringing the second aqueous composition into contact, under acidic conditions, with the surface of the stainless steel that has been treated in the roughening treatment step, and wherein the second aqueous composition comprises at least a peroxide.

IPC Classes  ?

  • C23F 1/28 - Acidic compositions for etching iron group metals

21.

AQUEOUS COMPOSITION, STAINLESS STEEL SURFACE ROUGHENING METHOD USING SAME, AND METHOD FOR MANUFACTURING ROUGHENED STAINLESS STEEL

      
Application Number 18266888
Status Pending
Filing Date 2021-12-13
First Publication Date 2024-02-08
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Ikeda, Kazuhiko
  • Fujii, Tomoko
  • Matsunaga, Hiroshi

Abstract

The problem of the present invention is to provide an aqueous composition with which the surface of stainless steel is sufficiently roughened in an efficient manner with few steps, while maintaining good quality (e.g., thickness) of the stainless steel after treatment. The above problem is solved by the following aqueous composition for roughening the surface of stainless steel. Namely, the aqueous composition comprises 0.1% to 10% by mass of hydrogen peroxide based on the total amount of the aqueous composition, 1% to 30% by mass of halide ions based on the total amount of the aqueous composition, and 0% to 3% by mass of copper ions based on the total amount of the aqueous composition.

IPC Classes  ?

  • C23F 1/28 - Acidic compositions for etching iron group metals

22.

RECESS ETCHING SOLUTION, RECESS ETCHING METHOD, AND SURFACE-TREATED SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD

      
Application Number 18255975
Status Pending
Filing Date 2021-12-06
First Publication Date 2024-02-08
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Okabe, Satoshi
  • Oie, Toshiyuki
  • Adaniya, Tomoyuki
  • Hommo, Yoshihiro
  • Chen, Chung-Yi
  • Wang, Po-Hung

Abstract

A recess etching solution for recess etching a metal wiring in a semiconductor substrate manufacturing process; and a recess etching method employing the same. The recess etching solution is for applying recess etching to a surface of a cobalt-containing metal layer embedded in a via or a trench formed in a semiconductor substrate, and contains (A) an organic acid, one of or both of (B) a nitrogen-containing heterocyclic compound and (C) an organic solvent, and (D) water. The recess etching method includes applying recess etching to a surface of a cobalt-containing metal layer by bringing the recess etching solution into contact with the surface of the cobalt-containing metal layer embedded in a via or a trench formed in a semiconductor substrate.

IPC Classes  ?

  • H01L 21/3213 - Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
  • C09K 13/00 - Etching, surface-brightening or pickling compositions

23.

RESIN COMPOSITION, PREPREG, RESIN SHEET, LAMINATE, METAL FOIL-CLAD LAMINATE, AND PRINTED WIRING BOARD

      
Application Number 18276539
Status Pending
Filing Date 2022-01-26
First Publication Date 2024-02-08
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Ogashiwa, Takaaki
  • Miyahira, Tetsuro
  • Takamura, Tatsuro
  • Ito, Sayaka

Abstract

An object is to provide a resin composition having a high permittivity and a low dissipation factor, and also a low coefficient of thermal expansion and a good appearance, and suitably used for producing an insulation layer of a printed wiring board, and a prepreg, a resin sheet, a laminate, a metal foil-clad laminate, and a printed wiring board obtainable by using the resin composition. The resin composition contains: (A) BaTi4O9; (B) a filler different from the BaTi4O9 (A); and (C) a thermosetting resin; wherein a median particle size of the BaTi4O9 (A) is 0.10 to 1.00 μm, and a volume ratio of the BaTi4O9 (A) to the filler (B), the BaTi4O9(A):the filler (B), ranges from 15:85 to 80:20.

IPC Classes  ?

  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08K 7/18 - Solid spheres inorganic
  • C08K 3/22 - Oxides; Hydroxides of metals
  • C08J 5/24 - Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
  • C08J 5/18 - Manufacture of films or sheets
  • H05K 1/03 - Use of materials for the substrate

24.

METHOD FOR PRODUCING PATTERNED SUBSTRATE

      
Application Number 18038770
Status Pending
Filing Date 2021-11-10
First Publication Date 2024-01-25
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Miyahara, Daichi
  • Sato, Yumi
  • Umeki, Miho

Abstract

A method for producing a patterned substrate, including: step (a) of forming a film composed of a photosensitive polyimide resin composition on a substrate; step (b) of exposing the film; and step (c) of developing the exposed film using a developer to form a pattern formed of the film on the substrate, wherein a relative energy difference (RED) between the developer and the film before exposure is 0.50 or greater and 1.4 or less.

IPC Classes  ?

  • G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
  • G03F 7/40 - Treatment after imagewise removal, e.g. baking
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C09D 179/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

25.

PRESSURE VESSEL AND METHOD FOR PRODUCING PRESSURE VESSEL

      
Application Number 18266100
Status Pending
Filing Date 2021-10-06
First Publication Date 2024-01-25
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Matsumoto, Nobuhiko
  • Ikeuchi, Kousuke
  • Mitadera, Jun

Abstract

Provided are a pressure vessel with excellent gas barrier properties, less likely to cause cracks, and excellent internal pressure fatigue properties, and a production method thereof. The pressure vessel includes a layer at least in the body part, and the layer includes a fiber-reinforced resin material that contains a resin component and a continuous reinforcing fiber. A ratio (inner region/outer region) of the continuous reinforcing fiber content (vol. %) in the inner region to a continuous reinforcing fiver content (vol. %) in the outer region is from 0.80 to 0.99, where the inner region is up to 0.1% from the inner side of the layer in the thickness direction, and the outer region is up to 0.1% from the outer side of the layer in the thickness direction, and the continuous reinforcing fiber content (vol. %) in the central region of the layer, which is between up to more than 0.1% from the inner side in the thickness direction and up to more than 0.1% from the outer side in the thickness direction, is from 40 to 60 vol. %.

IPC Classes  ?

  • F17C 1/06 - Protecting sheatings built-up from wound-on bands or filamentary material, e.g. wires
  • C08J 5/24 - Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs

26.

OXYGEN ABSORBING RESIN COMPOSITION, OXYGEN ABSORBING FILM, OXYGEN ABSORBING MULTI-LAYER FILM, AND COVER MATERIAL

      
Application Number 18038751
Status Pending
Filing Date 2021-11-15
First Publication Date 2024-01-18
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Watanabe, Keisuke
  • Itou, Yoshiki

Abstract

An oxygen absorbing resin composition containing a polyolefin, an iron powder, titanium oxide, and calcium oxide, a content of the iron powder being from 10 to 50 mass % in the oxygen absorbing resin composition, a mass ratio of the titanium oxide to the iron powder [titanium oxide/iron powder] being from 0.1 to 0.5, and a mass ratio of the calcium oxide to the iron powder [calcium oxide/iron powder] being from 0.1 to 0.5.

IPC Classes  ?

  • C08J 5/18 - Manufacture of films or sheets
  • C08K 3/22 - Oxides; Hydroxides of metals
  • C08K 3/08 - Metals
  • B65D 65/40 - Applications of laminates for particular packaging purposes
  • B32B 15/20 - Layered products essentially comprising metal comprising aluminium or copper
  • B32B 15/085 - Layered products essentially comprising metal comprising metal as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin comprising polyolefins
  • B32B 27/32 - Layered products essentially comprising synthetic resin comprising polyolefins
  • B32B 27/18 - Layered products essentially comprising synthetic resin characterised by the use of special additives
  • B32B 27/30 - Layered products essentially comprising synthetic resin comprising acrylic resin
  • B32B 27/34 - Layered products essentially comprising synthetic resin comprising polyamides
  • B32B 27/08 - Layered products essentially comprising synthetic resin as the main or only constituent of a layer next to another layer of a specific substance of synthetic resin of a different kind

27.

Compound and method for producing same

      
Application Number 18252821
Grant Number 11919833
Status In Force
Filing Date 2022-04-12
First Publication Date 2023-12-28
Grant Date 2024-03-05
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Yokoo Yamazoe, Aoi
  • Kanbara, Yutaka

Abstract

Provided is a method for producing a methyl-adduct compound, the method including methylating, in the presence of potassium carbonate and dimethyl carbonate, a dinitrile compound represented by Formula (1) below to obtain a methyl-adduct compound represented by Formula (2) below: 4 are each methyl.

IPC Classes  ?

  • C07C 211/27 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing at least one six-membered aromatic ring having amino groups linked to the six-membered aromatic ring by saturated carbon chains
  • C07C 209/48 - Preparation of compounds containing amino groups bound to a carbon skeleton by reduction of carboxylic acids or esters thereof in presence of ammonia or amines, or by reduction of nitriles, carboxylic acid amides, imines or imino-ethers by reduction of nitriles
  • C07C 253/30 - Preparation of carboxylic acid nitriles by reactions not involving the formation of cyano groups
  • C07C 255/33 - Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring with cyano groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by saturated carbon chains

28.

RESIN COMPOSITION, COATING FILM USING SAME, AND ELECTROLYTE

      
Application Number 18276534
Status Pending
Filing Date 2022-02-18
First Publication Date 2023-12-28
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Ogawa, Noriyoshi
  • Goto, Toshihito

Abstract

According to the present invention, there can be provided a resin composition, comprising: a polycarbonate resin comprising a constituent unit represented by the following general formula (1): According to the present invention, there can be provided a resin composition, comprising: a polycarbonate resin comprising a constituent unit represented by the following general formula (1): According to the present invention, there can be provided a resin composition, comprising: a polycarbonate resin comprising a constituent unit represented by the following general formula (1): wherein R1 to R4 and R11 to R14 each independently hydrogen, fluorine, chlorine, bromine or iodine, etc., a represents an integer of 1 to 1,000, and X represents —S—, etc.; and a carbonate-based organic solvent, wherein the content of the polycarbonate resin in the resin composition is 0.05% to 50% by mass; the content of the carbonate-based organic solvent in the resin composition is 50% to 99.5% by mass, and the total percentage of constituent units represented by the following formulae (2) to (4) in all of the constituent units represented by the general formula (1) is 0% to 75% at a molar percentage: According to the present invention, there can be provided a resin composition, comprising: a polycarbonate resin comprising a constituent unit represented by the following general formula (1): wherein R1 to R4 and R11 to R14 each independently hydrogen, fluorine, chlorine, bromine or iodine, etc., a represents an integer of 1 to 1,000, and X represents —S—, etc.; and a carbonate-based organic solvent, wherein the content of the polycarbonate resin in the resin composition is 0.05% to 50% by mass; the content of the carbonate-based organic solvent in the resin composition is 50% to 99.5% by mass, and the total percentage of constituent units represented by the following formulae (2) to (4) in all of the constituent units represented by the general formula (1) is 0% to 75% at a molar percentage:

IPC Classes  ?

  • C08G 64/06 - Aromatic polycarbonates not containing aliphatic unsaturation
  • C09D 169/00 - Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates
  • C09D 7/20 - Diluents or solvents
  • H01M 10/0565 - Polymeric materials, e.g. gel-type or solid-type

29.

EPOXY RESIN CURING AGENT, EPOXY RESIN COMPOSITION, PAINT, AND ADHESIVE

      
Application Number 18030844
Status Pending
Filing Date 2021-09-10
First Publication Date 2023-12-28
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Hanaoka, Takuma
  • Kouno, Kazuki
  • Ohno, Yuma

Abstract

Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains metaxylylenediamine and paraxylylenediamine at a mass ratio of 99/1 to 51/49, an epoxy resin composition, and a paint and an adhesive containing these.

IPC Classes  ?

30.

EPOXY RESIN COMPOSITION, GAS BARRIER LAMINATE, AND PACKAGING MATERIAL

      
Application Number 18036944
Status Pending
Filing Date 2021-10-06
First Publication Date 2023-12-28
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Kobayashi, Naoko
  • Kouno, Kazuki
  • Hashimoto, Ryoma

Abstract

An epoxy resin composition containing an epoxy resin, an epoxy resin curing agent containing an amine-based curing agent, and a polyalkylene glycol, as well as a gas barrier laminate and a packaging material in which the epoxy resin composition is used.

IPC Classes  ?

  • C08L 63/00 - Compositions of epoxy resins; Compositions of derivatives of epoxy resins
  • C08K 5/544 - Silicon-containing compounds containing nitrogen
  • C08K 5/17 - Amines; Quaternary ammonium compounds
  • C08K 5/20 - Carboxylic acid amides

31.

PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE

      
Application Number 18038245
Status Pending
Filing Date 2021-11-10
First Publication Date 2023-12-21
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Umeki, Miho
  • Sato, Yumi
  • Miyahara, Daichi

Abstract

A photosensitive polyimide resin composition containing: a ring-closed polyimide resin (A) having a structure represented by Formula (1); and a polyfunctional radically polymerizable compound (B) having radically polymerizable functional groups and oxyalkylene groups, wherein a number of the radically polymerizable functional groups in the polyfunctional radically polymerizable compound (B) is 3 or greater and 100 or less, and wherein a total number of moles of the oxyalkylene groups added in the polyfunctional radically polymerizable compound (B) is 5 or greater and 100 or less.

IPC Classes  ?

  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

32.

METHOD FOR PRODUCING FLUORENONE

      
Application Number 18251771
Status Pending
Filing Date 2021-11-04
First Publication Date 2023-12-21
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Watanabe, Yuki
  • Sumi, Hiroki
  • Fujita, Hideaki
  • Nakamura, Goh
  • Kumano, Tatsuyuki

Abstract

A method for producing fluorenone including a pretreatment step of heating fluorene in the presence of a lower aliphatic carboxylic acid, a bromine compound, and a metal catalyst, and an oxidation step of continuously supplying fluorene and oxygen to perform an oxidation reaction, in the order indicated.

IPC Classes  ?

  • C07C 45/36 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation with molecular oxygen of CHx-moieties in unsaturated compounds in compounds containing six-membered aromatic rings
  • B01J 31/04 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing carboxylic acids or their salts
  • B01J 35/12 - Liquids or melts

33.

THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME

      
Application Number 18033163
Status Pending
Filing Date 2021-10-25
First Publication Date 2023-12-14
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Kato, Noriyuki
  • Ikeda, Shinya
  • Motegi, Atsushi
  • Ogata, Tatsunobu
  • Harada, Yutaro
  • Nishimori, Katsushi
  • Ishihara, Kentaro

Abstract

A thermoplastic resin including a constituent unit (A) derived from a monomer represented by general formula (1). In general formula (1), R1 and R11 each independently represent a hydrogen atom, an aryl group having 6-12 carbon atoms, or a linear or branched alkyl group having 1-4 carbon atoms, and X represents one of general formulas (a) to (d). In general formulas (a) to (d), R21 to R57 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a linear or branched alkyl group having 1-4 carbon atoms, or a linear or branched alkoxy group having 1-7 carbon atoms.

IPC Classes  ?

  • C08L 69/00 - Compositions of polycarbonates; Compositions of derivatives of polycarbonates
  • C08G 64/16 - Aliphatic-aromatic or araliphatic polycarbonates
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

34.

FILAMENT, MATERIAL, AND METHOD FOR PRODUCING THE MATERIAL

      
Application Number 18030472
Status Pending
Filing Date 2021-09-01
First Publication Date 2023-12-14
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Yamanaka, Masaki
  • Matsumoto, Nobuhiko

Abstract

Provided are a filament that does not impair the strength that is intrinsic to the filament and contains a disperse dye, and has excellent color fastness, a material using the filament, and a method for producing the material. The filament containing a polyamide resin having an aromatic ring and/or a hetero ring, and a disperse dye having an aromatic ring and/or a hetero ring.

IPC Classes  ?

  • D01F 6/60 - Monocomponent man-made filaments or the like of synthetic polymers; Manufacture thereof from homopolycondensation products from polyamides
  • D06P 1/18 - Azo dyes
  • D06P 1/20 - Anthraquinone dyes
  • D06P 3/26 - Polyamides; Polyurethanes using dispersed dyestuffs
  • D01F 8/12 - Conjugated, i.e. bi- or multicomponent, man-made filaments or the like; Manufacture thereof from synthetic polymers with at least one polyamide as constituent

35.

ALDEHYDE COMPOSITION

      
Application Number 18250238
Status Pending
Filing Date 2021-11-02
First Publication Date 2023-12-14
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Utamura, Tatsuya
  • Nishiuchi, Junya

Abstract

An aldehyde composition containing an aldehyde represented by Formula (1) and an aldehyde represented by Formula (2) is provided. A mass ratio [(1)/(2)] of the aldehyde represented by Formula (1) to the aldehyde represented by Formula (2) is from 96/4 to 99.97/0.03. An aldehyde composition containing an aldehyde represented by Formula (1) and an aldehyde represented by Formula (2) is provided. A mass ratio [(1)/(2)] of the aldehyde represented by Formula (1) to the aldehyde represented by Formula (2) is from 96/4 to 99.97/0.03.

IPC Classes  ?

  • C07C 47/228 - Unsaturated compounds having —CHO groups bound to acyclic carbon atoms containing six-membered aromatic rings, e.g. phenylacetaldehyde
  • C11B 9/00 - Essential oils; Perfumes

36.

BIOABSORBABLE FIBROUS MEDICAL MATERIAL

      
Application Number 18250383
Status Pending
Filing Date 2021-10-25
First Publication Date 2023-12-14
Owner
  • MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
  • National University Corporation Tokai National Higher Education and Research System (Japan)
Inventor
  • Maehara, Akira
  • Hirata, Hitoshi
  • Murayama, Atsuhiko
  • Nakagawa, Yasunobu

Abstract

An object of the present invention is to provide a bioabsorbable and stretchable fibrous medical material that enables formation of ligation which provides a small and hard-to-unravel knot even with a weak force. The present invention provides a fibrous medical material which is a fibrous material composed of a molded article provided by spinning and drawing a bioabsorbable aliphatic polymer, wherein an elongation at break is 75% or greater, an intermediate elastic modulus in tension at a strain ranging from 0.25% and 10% is lower than an initial elastic modulus in tension at a strain ranging from 0.05% to 0.25%, the intermediate elastic modulus in tension is 400 MPa or less, and a residual strain rate after 100% deformation is 70% or less.

IPC Classes  ?

  • A61L 17/10 - At least partly resorbable materials containing macromolecular materials

37.

ALICYCLIC ALCOHOL, ALICYCLIC ALCOHOL COMPOSITION, AND PERFUME COMPOSITION

      
Application Number 18248899
Status Pending
Filing Date 2021-10-19
First Publication Date 2023-12-07
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Tomaki, Keisuke
  • Shirai, Shinyou

Abstract

An alicyclic alcohol of Formula (1) and a fragrance composition including the same is described. An alicyclic alcohol composition containing an alicyclic alcohol of Formula (1) and an alicyclic alcohol of Formula (2), is also described, and this composition may also include an alicyclic alcohol of Formula (3). The alicyclic alcohol composition may comprise Formula (1) at a content of 85 mass % to 98 mass %. An alicyclic alcohol of Formula (1) and a fragrance composition including the same is described. An alicyclic alcohol composition containing an alicyclic alcohol of Formula (1) and an alicyclic alcohol of Formula (2), is also described, and this composition may also include an alicyclic alcohol of Formula (3). The alicyclic alcohol composition may comprise Formula (1) at a content of 85 mass % to 98 mass %.

IPC Classes  ?

  • C07C 31/135 - Monohydroxylic alcohols containing saturated rings monocyclic with five- or six-membered rings; Naphthenic alcohols
  • C11B 9/00 - Essential oils; Perfumes

38.

TRIARYLMETHANE COMPOUNDS

      
Application Number 18231676
Status Pending
Filing Date 2023-08-08
First Publication Date 2023-12-07
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Reuter, Karl
  • Andrushko, Vasyl
  • Kantor, Mark
  • Stolz, Florian
  • Shiratake, Munenori
  • Ishihara, Kentaro
  • Hirose, Koji
  • Ikeda, Shinya
  • Kato, Noriyuki
  • Kondo, Mitsuteru
  • Murata, Shoko
  • Oshima, Kensuke

Abstract

The present invention relates to triarylmethane compounds of the formula (I), which suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices. R1 , R2 are e.g. hydrogen; Y is an alkylene group having 2, 3 or 4 carbon atoms, Ar is selected from mono- or polycyclic aryl and mono- or polycyclic hetaryl; X1, X2, X3, X4 are CH, C—Rx or N, provided that in each ring at most two of X1, X2, X3, X4 are N; Rx is e.g. halogen, CN or CH═CH2. The invention also relates to thermoplastic resins comprising a polymerized unit of the compound of formula (I). The present invention relates to triarylmethane compounds of the formula (I), which suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices. R1 , R2 are e.g. hydrogen; Y is an alkylene group having 2, 3 or 4 carbon atoms, Ar is selected from mono- or polycyclic aryl and mono- or polycyclic hetaryl; X1, X2, X3, X4 are CH, C—Rx or N, provided that in each ring at most two of X1, X2, X3, X4 are N; Rx is e.g. halogen, CN or CH═CH2. The invention also relates to thermoplastic resins comprising a polymerized unit of the compound of formula (I).

IPC Classes  ?

  • C07C 43/23 - Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
  • C08G 64/06 - Aromatic polycarbonates not containing aliphatic unsaturation
  • C08G 64/30 - General preparatory processes using carbonates
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
  • C08G 63/193 - Hydroxy compounds containing aromatic rings containing two or more aromatic rings

39.

METHOD FOR PRODUCING FLUORENONE

      
Application Number 18249179
Status Pending
Filing Date 2021-10-21
First Publication Date 2023-12-07
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Sumi, Hiroki
  • Watanabe, Yuki
  • Fujita, Hideaki
  • Nakamura, Goh
  • Kumano, Tatsuyuki

Abstract

Provided is a method for producing fluorenone comprising an oxidation step of oxidizing fluorene in the presence of an aliphatic carboxylic acid having 2 to 3 carbon atoms, a metal catalyst, a bromine compound, and oxygen, a solvent removal step of removing the aliphatic carboxylic acid, a heating step at 120 to 350° C., and a distillation step in the order indicated.

IPC Classes  ?

  • C07C 49/675 - Unsaturated compounds containing a keto group being part of a ring containing six-membered aromatic rings a keto group being part of a condensed ring system having three rings

40.

RESIN COMPOSITION, CURED PRODUCT, SEALING MATERIAL, ADHESIVE, INSULATING MATERIAL, COATING MATERIAL, PREPREG, MULTILAYERED BODY, AND FIBER-REINFORCED COMPOSITE MATERIAL

      
Application Number 18181472
Status Pending
Filing Date 2023-03-09
First Publication Date 2023-11-30
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Ikeda, Kousuke
  • Yasuda, Yoshihiro
  • Katagiri, Masayuki

Abstract

Provided is a resin composition comprises a cyanate ester compound (A), an amine adduct compound (B) and a borate ester (C).

IPC Classes  ?

  • C08G 18/58 - Epoxy resins
  • C08G 18/10 - Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
  • C08J 5/24 - Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs

41.

EPOXY RESIN CURING AGENT, EPOXY RESIN COMPOSITION, AND USE OF AMINE COMPOSITION

      
Application Number 18025280
Status Pending
Filing Date 2021-08-19
First Publication Date 2023-11-30
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Kouno, Kazuki
  • Ikeuchi, Kousuke
  • Ohno, Yuma
  • Ota, Emi
  • Yokoo, Aoi

Abstract

Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains bis(aminomethyl)cyclohexane (A) and a compound (B) represented by the following formula (1), and wherein the content of the component (B) based on 100 parts by mass of the component (A) is from 0.01 to 2.0 parts by mass, an epoxy resin composition, and use of an amine composition for an epoxy resin curing agent, wherein R1 represents an alkyl group having 1 to 6 carbon atoms, and p is a number of 1 to 3. Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains bis(aminomethyl)cyclohexane (A) and a compound (B) represented by the following formula (1), and wherein the content of the component (B) based on 100 parts by mass of the component (A) is from 0.01 to 2.0 parts by mass, an epoxy resin composition, and use of an amine composition for an epoxy resin curing agent, wherein R1 represents an alkyl group having 1 to 6 carbon atoms, and p is a number of 1 to 3.

IPC Classes  ?

42.

COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAME

      
Application Number 18030847
Status Pending
Filing Date 2021-09-10
First Publication Date 2023-11-23
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Imagawa, Yousuke
  • Takemura, Kouhei
  • Sugihara, Ryosuke
  • Sado, Mariko

Abstract

A composition containing: a compound (a) represented by Formula (1): A composition containing: a compound (a) represented by Formula (1): A composition containing: a compound (a) represented by Formula (1): wherein Ar represents an aromatic ring, m represents an integer of 2 to 8, n represents an integer of 0 to 6, provided that m+n is equal to or less than a number of carbon atoms that constitute the aromatic ring, and R1 each independently represents an alkylthio group, an epoxyalkylthio group, a thiol group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group; and 1,2,3,5,6-pentathiepane (b).

IPC Classes  ?

  • C08G 18/38 - Low-molecular-weight compounds having hetero atoms other than oxygen
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
  • G02C 7/02 - Lenses; Lens systems

43.

FILAMENT, STRUCTURE, RESIN COMPOSITION, AND METHOD FOR PRODUCING FILAMENT

      
Application Number 18030463
Status Pending
Filing Date 2021-09-01
First Publication Date 2023-11-23
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Yamanaka, Masaki
  • Matsumoto, Nobuhiko

Abstract

Provided are: a filament containing a polyamide resin, the filament having a high strength and a high retention percentage of mechanical properties after water absorption; a structure; a resin composition; and a method for producing the filament. The filament includes a polyamide resin containing diamine-derived structural units and dicarboxylic acid-derived structural units. 70 mol % or more of the diamine-derived structural units are derived from xylylenediamine, and 70 mol % or more of the dicarboxylic acid-derived structural units are derived from α,ω-linear aliphatic dicarboxylic acid having from 11 to 14 carbons. The content of a compound with a molecular weight of 310 or more and 1000 or less is 0.1 mass % or more and 1.5 mass % or less, and the content of a compound with a molecular weight of less than 310 is 0.1 mass % or less.

IPC Classes  ?

  • D01F 6/60 - Monocomponent man-made filaments or the like of synthetic polymers; Manufacture thereof from homopolycondensation products from polyamides
  • C08G 69/26 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
  • D01F 8/12 - Conjugated, i.e. bi- or multicomponent, man-made filaments or the like; Manufacture thereof from synthetic polymers with at least one polyamide as constituent

44.

COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD

      
Application Number 18246531
Status Pending
Filing Date 2021-09-22
First Publication Date 2023-11-16
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Horie, Hiroaki
  • Horita, Akinobu
  • Hamanaka, Makoto
  • Shimada, Kenji
  • Kikunaga, Takahiro

Abstract

A cleaning composition for semiconductor substrates. The cleaning composition comprises hydrogen peroxide, a hydrogen peroxide stabilizing agent, an alkaline compound, and water. The hydrogen peroxide stabilizing agent is oxalic acid, diethylenetriaminepentaacetic acid, hydroxyethyliminodiacetic acid, potassium oxalate, 5-phenyl-1H-tetrazole, triethylenetetraminehexaacetic acid, trans-1,2-cyclohexanediaminetetraacetic acid, 8-quinolinol, L(+)-isoleucine, DL-valine, L(-)-proline, hydroxyethylethylenediaminetriacetic acid, N,N-di(2-hydroxyethyl)glycine, glycine, L-tryptophan, 2,6-pyridinedicarboxylic acid, benzothiazole, or DL-alanine. The alkaline compound is a quaternary ammonium hydroxide or potassium hydroxide.

IPC Classes  ?

  • C11D 3/04 - Water-soluble compounds
  • C11D 3/39 - Organic or inorganic per-compounds
  • C11D 3/30 - Amines; Substituted amines
  • C11D 11/00 - Special methods for preparing compositions containing mixtures of detergents

45.

SINGLE-LAYER CONTAINER, MANUFACTURING METHOD THEREOF, AND RECYCLED POLYESTER MANUFACTURING METHOD

      
Application Number 18021973
Status Pending
Filing Date 2021-07-30
First Publication Date 2023-11-09
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Daito, Masayuki
  • Otsuka, Kosuke
  • Yamada, Takumi

Abstract

Provided is a single-layer container containing a polyester resin (X), a polyamide resin (Y), a blue colorant (A), and a red colorant (B). The content of the polyamide resin (Y) is from 0.05 to 7.0 mass%, and the content of the blue colorant (A) is from 1 to 40 ppm.

IPC Classes  ?

  • B29C 45/18 - Feeding the material into the injection moulding apparatus
  • C08G 63/688 - Polyesters containing atoms other than carbon, hydrogen, and oxygen containing sulfur
  • C08K 5/00 - Use of organic ingredients
  • C08G 63/183 - Terephthalic acids
  • B29C 49/00 - Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
  • C08G 69/26 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
  • C08K 5/098 - Metal salts of carboxylic acids
  • C08J 11/06 - Recovery or working-up of waste materials of polymers without chemical reactions

46.

PRODUCTION METHOD FOR POLYSILOXANE, COMPOSITION INCLUDING POLYSILOXANE, AND MOLDED BODY

      
Application Number 18027171
Status Pending
Filing Date 2021-09-22
First Publication Date 2023-11-09
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Akimoto, Hisato
  • Kamatani, Kohei
  • Taguchi, Daisuke
  • Uera, Kazuyoshi

Abstract

The present invention provides, for example, a method for efficiently producing a polysiloxane having a siloxane constituent unit while making it possible to improve safety and reduce environmental burden. The above-mentioned problem is solved by a method comprising a polymerization step of polymerizing a silane-based compound and a diol compound in the presence of a transesterification catalyst including at least a phosphorus compound, in which the silane-based compound is selected from a specific diaryloxysilane compound, a specific dialkoxysilane compound, and a specific silicon compound, and in the polymerization step, a polysiloxane having a siloxane constituent unit represented by any of formula (1-1) to formula (1-4) is produced. (In the formulas, R1-R10, R30-R33, Z1, Z2, J1, K1, A1, A2, L1, L2, and X are as described in the description of the present application.) The present invention provides, for example, a method for efficiently producing a polysiloxane having a siloxane constituent unit while making it possible to improve safety and reduce environmental burden. The above-mentioned problem is solved by a method comprising a polymerization step of polymerizing a silane-based compound and a diol compound in the presence of a transesterification catalyst including at least a phosphorus compound, in which the silane-based compound is selected from a specific diaryloxysilane compound, a specific dialkoxysilane compound, and a specific silicon compound, and in the polymerization step, a polysiloxane having a siloxane constituent unit represented by any of formula (1-1) to formula (1-4) is produced. (In the formulas, R1-R10, R30-R33, Z1, Z2, J1, K1, A1, A2, L1, L2, and X are as described in the description of the present application.)

IPC Classes  ?

  • C08G 77/18 - Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
  • C08G 77/08 - Preparatory processes characterised by the catalysts used
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
  • C08L 83/06 - Polysiloxanes containing silicon bound to oxygen-containing groups

47.

METHOD FOR PRODUCING AROMATIC NITRILE COMPOUND AND METHOD FOR PRODUCING CARBONATE ESTER

      
Application Number 18140333
Status Pending
Filing Date 2023-04-27
First Publication Date 2023-11-02
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Harada, Hidefumi
  • Isobe, Takehiko
  • Shimokawa, Keisuke
  • Umezu, Ryotaro

Abstract

The present invention provides a method for producing an aromatic nitrile compound, the method comprising a dehydration reaction wherein a desired compound can be selectively obtained with high yield while suppressing the generation of byproducts during the regeneration of an aromatic amide compound into the corresponding aromatic nitrile compound. In addition, the present invention realizes a method for efficiently producing a carbonate ester by applying the abovementioned production method to a method for producing a carbonate ester. The above are achieved by means of a method for producing an aromatic nitrile compound involving a dehydration reaction wherein an aromatic amide compound is dehydrated, the method having a contact step for bringing the aromatic amide compound into contact with a catalyst in a gas phase during the dehydration reaction.

IPC Classes  ?

  • C07C 253/20 - Preparation of carboxylic acid nitriles by dehydratation of carboxylic acid amides
  • B01J 23/04 - Alkali metals
  • B01J 23/10 - Catalysts comprising metals or metal oxides or hydroxides, not provided for in group of rare earths
  • C07C 68/04 - Preparation of esters of carbonic or haloformic acids from carbon dioxide or inorganic carbonates
  • C07D 213/84 - Nitriles

48.

COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND

      
Application Number 18268940
Status Pending
Filing Date 2021-12-21
First Publication Date 2023-11-02
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Omatsu, Tadashi
  • Okada, Yu
  • Koguma, Takeru
  • Matsumoto, Masahiro
  • Niimi, Yushi
  • Echigo, Masatoshi

Abstract

Provided is a compound, a polymer, a composition, a composition for film formation, a pattern formation method, an insulating film formation method, and a method for producing a compound, by which a resist having excellent exposure sensitivity can be obtained. Provided is a compound, a polymer, a composition, a composition for film formation, a pattern formation method, an insulating film formation method, and a method for producing a compound, by which a resist having excellent exposure sensitivity can be obtained. A compound represented by the following formula (1): Provided is a compound, a polymer, a composition, a composition for film formation, a pattern formation method, an insulating film formation method, and a method for producing a compound, by which a resist having excellent exposure sensitivity can be obtained. A compound represented by the following formula (1): Provided is a compound, a polymer, a composition, a composition for film formation, a pattern formation method, an insulating film formation method, and a method for producing a compound, by which a resist having excellent exposure sensitivity can be obtained. A compound represented by the following formula (1): wherein RA is a hydrogen atom, a methyl group, or a trifluoromethyl group; RX is ORB or a hydrogen atom; RB is a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; and P is a hydroxy group, an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, a carbonate ester group, a nitro group, an amino group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphine group, a phosphone group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group.

IPC Classes  ?

  • C07C 37/20 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms using aldehydes or ketones
  • C07C 39/373 - Halogenated derivatives with all hydroxy groups on non-condensed rings and with unsaturation outside the aromatic rings
  • C07C 41/22 - Preparation of ethers by reactions not forming ether-oxygen bonds by substitution of halogen atoms by other halogen atoms
  • C07C 41/26 - Preparation of ethers by reactions not forming ether-oxygen bonds by introduction of hydroxy or O-metal groups
  • C07C 41/30 - Preparation of ethers by reactions not forming ether-oxygen bonds by increasing the number of carbon atoms, e.g. by oligomerisation
  • C07C 43/225 - Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing halogen
  • C07C 43/23 - Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
  • C07C 45/63 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of C=O groups by substitution of halogen atoms by other halogen atoms
  • C07C 49/84 - Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
  • C07C 59/70 - Ethers of hydroxy-acetic acid
  • C07C 67/08 - Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
  • C07C 69/63 - Halogen-containing esters of saturated acids
  • C07C 69/712 - Ethers the hydroxy group of the ester being etherified with a hydroxy compound having the hydroxy group bound to a carbon atom of a six-membered aromatic ring
  • C07C 69/96 - Esters of carbonic or haloformic acids
  • C07D 309/12 - Oxygen atoms only hydrogen atoms and one oxygen atom directly attached to ring carbon atoms, e.g. tetrahydropyranyl ethers
  • C08F 12/16 - Halogens
  • C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
  • C08F 246/00 - Copolymers in which the nature of only the monomers in minority is defined
  • G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
  • G03F 7/20 - Exposure; Apparatus therefor

49.

METHOD FOR PRODUCING CARBONYL HALIDE

      
Application Number 18350092
Status Pending
Filing Date 2023-07-11
First Publication Date 2023-11-02
Owner
  • NATIONAL UNIVERSITY CORPORATION KOBE UNIVERSITY (Japan)
  • AGC Inc. (Japan)
  • MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Tsuda, Akihiko
  • Okazoe, Takashi
  • Harada, Hidefumi

Abstract

The objective of the present invention is to provide a method for producing a carbonyl halide efficiently to the used halogenated methane. The method for producing a carbonyl halide according to the present invention is characterized in comprising the steps of preparing a mixed gas comprising oxygen and a halogenated methane having one or more halogeno groups selected from the group consisting of chloro, bromo and iodo, and flowing the mixed gas and irradiating a high energy light to the flowed mixed gas.

IPC Classes  ?

50.

CYANINE COMPOUND AND PHOTOELECTRIC CONVERSION ELEMENT

      
Application Number 18026687
Status Pending
Filing Date 2021-09-01
First Publication Date 2023-10-26
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Yamamoto, Takashi
  • Funabiki, Kazumasa
  • Arisawa, Yuta
  • Aotani, Kenyu

Abstract

Provided is a cyanine compound being bound counterions consisting of an anion and a cation, wherein the anion is represented by the following formula (I-1): Provided is a cyanine compound being bound counterions consisting of an anion and a cation, wherein the anion is represented by the following formula (I-1): Provided is a cyanine compound being bound counterions consisting of an anion and a cation, wherein the anion is represented by the following formula (I-1): wherein R1 and R2 each independently represent a hydrogen atom or a monovalent organic group; R3 and R4 each independently represent a monovalent group such as a phenyl group; X represents a hydrogen atom, a halogen atom or a monovalent organic group; and Y represents a divalent group such as a n-propenyl group.

IPC Classes  ?

  • C09B 23/16 - Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing hetero atoms
  • H10K 85/60 - Organic compounds having low molecular weight

51.

COMPOSITION AND SILOXANE-BASED THERMOPLASTIC RESIN USING SAME, AND METHODS FOR PRODUCING SAME

      
Application Number 18026697
Status Pending
Filing Date 2021-09-22
First Publication Date 2023-10-26
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Uera, Kazuyoshi
  • Kamatani, Kohei
  • Akimoto, Hisato
  • Taguchi, Daisuke

Abstract

To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially. To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially. A composition containing a siloxane block-containing diol compound, wherein To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially. A composition containing a siloxane block-containing diol compound, wherein the siloxane block-containing diol compound is represented by the following formula (I): To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially. A composition containing a siloxane block-containing diol compound, wherein the siloxane block-containing diol compound is represented by the following formula (I): To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially. A composition containing a siloxane block-containing diol compound, wherein the siloxane block-containing diol compound is represented by the following formula (I): wherein To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially. A composition containing a siloxane block-containing diol compound, wherein the siloxane block-containing diol compound is represented by the following formula (I): wherein R1 and R2 are each independently an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 30 carbon atoms which may have a substituent, To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially. A composition containing a siloxane block-containing diol compound, wherein the siloxane block-containing diol compound is represented by the following formula (I): wherein R1 and R2 are each independently an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 30 carbon atoms which may have a substituent, m is an integer of 1 to 25, To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially. A composition containing a siloxane block-containing diol compound, wherein the siloxane block-containing diol compound is represented by the following formula (I): wherein R1 and R2 are each independently an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 30 carbon atoms which may have a substituent, m is an integer of 1 to 25, n is an integer of 3 to 200, and To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially. A composition containing a siloxane block-containing diol compound, wherein the siloxane block-containing diol compound is represented by the following formula (I): wherein R1 and R2 are each independently an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 30 carbon atoms which may have a substituent, m is an integer of 1 to 25, n is an integer of 3 to 200, and Xs each independently represent any of the following formulae (I1) to (I6): To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially. A composition containing a siloxane block-containing diol compound, wherein the siloxane block-containing diol compound is represented by the following formula (I): wherein R1 and R2 are each independently an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 30 carbon atoms which may have a substituent, m is an integer of 1 to 25, n is an integer of 3 to 200, and Xs each independently represent any of the following formulae (I1) to (I6):

IPC Classes  ?

  • C08F 293/00 - Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
  • C08G 77/42 - Block- or graft-polymers containing polysiloxane sequences

52.

COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAID COMPOSITION

      
Application Number 18030836
Status Pending
Filing Date 2021-09-10
First Publication Date 2023-10-26
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Imagawa, Yousuke
  • Takemura, Kouhei
  • Sugihara, Ryosuke
  • Sado, Mariko

Abstract

A composition containing: a compound (a) represented by Formula (1): A composition containing: a compound (a) represented by Formula (1): A composition containing: a compound (a) represented by Formula (1): wherein Ar represents an aromatic ring, m represents an integer of 2 to 8, n represents an integer of 0 to 6, provided that m+n is equal to or less than a number of carbon atoms that constitute the aromatic ring, and R1 each independently represents an alkylthio group, an epoxyalkylthio group, a thiol group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group; and a polythiol (b).

IPC Classes  ?

  • C07D 409/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
  • C08G 75/06 - Polythioethers from cyclic thioethers
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
  • G02C 7/02 - Lenses; Lens systems

53.

POLYIMIDE RESIN COMPOSITION AND MOLDED BODY

      
Application Number 18044918
Status Pending
Filing Date 2021-09-10
First Publication Date 2023-10-26
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Sakai, Atsushi
  • Sato, Yuuki
  • Fukushima, Takuya

Abstract

A polyimide resin composition having a polyimide resin (A) and a polyether sulfone resin (B), wherein the polyimide resin (A) comprises a repeating structural unit of formula (1) and a repeating structural unit of formula (2), a content ratio of the repeating structural unit of the formula (1) with respect to the total of the repeating structural unit of the formula (1) and the repeating structural unit of the formula (2) is 20 to 70 mol %, and a mass ratio of the component (A) to the component (B), [(A)/(B)], is 0.1/99.9 to 65/35; and a molded article containing the same: A polyimide resin composition having a polyimide resin (A) and a polyether sulfone resin (B), wherein the polyimide resin (A) comprises a repeating structural unit of formula (1) and a repeating structural unit of formula (2), a content ratio of the repeating structural unit of the formula (1) with respect to the total of the repeating structural unit of the formula (1) and the repeating structural unit of the formula (2) is 20 to 70 mol %, and a mass ratio of the component (A) to the component (B), [(A)/(B)], is 0.1/99.9 to 65/35; and a molded article containing the same: A polyimide resin composition having a polyimide resin (A) and a polyether sulfone resin (B), wherein the polyimide resin (A) comprises a repeating structural unit of formula (1) and a repeating structural unit of formula (2), a content ratio of the repeating structural unit of the formula (1) with respect to the total of the repeating structural unit of the formula (1) and the repeating structural unit of the formula (2) is 20 to 70 mol %, and a mass ratio of the component (A) to the component (B), [(A)/(B)], is 0.1/99.9 to 65/35; and a molded article containing the same: where R1 represents a divalent group of 6 to 22 carbon atoms with an alicyclic hydrocarbon structure; R2 represents a divalent chain aliphatic group of 5 to 16 carbon atoms; and X1 and X2 each independently represent a tetravalent group of 6 to 22 carbon atoms and having an aromatic ring.

IPC Classes  ?

  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08L 81/06 - Polysulfones; Polyethersulfones

54.

THERMOPLASTIC RESIN, COMPOSITION, MOLDED ARTICLE, OPTICAL LENS, AND METHOD FOR PRODUCING THERMOPLASTIC RESIN

      
Application Number 18027164
Status Pending
Filing Date 2021-09-22
First Publication Date 2023-10-19
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Taguchi, Daisuke
  • Kamatani, Kohei
  • Akimoto, Hisato
  • Uera, Kazuyoshi

Abstract

The problem of the present invention is to provide: a thermoplastic resin having excellent heat resistance and excellent flame retardancy and having a siloxane constituent unit, particularly a thermoplastic resin suitable for optical applications; a composition containing the thermoplastic resin; and others. The problem is solved by a thermoplastic resin containing a structural unit (A) represented by general formula (I). (In general formula (I), Ra to Rct independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms in total and optionally having a substituent, or an aryl group having 6 to 30 carbon atoms in total and optionally having a substituent; Xa and Xb independently represent an alkyl group having 1 to 20 carbon atoms in total and optionally having a substituent, or an aryl group having 6 to 30 carbon atoms in total and optionally having a substituent; the substituent is any one of a halogen atom, a cyano group, an alkenyl group, an alkynyl group and an alkoxy group; and m represents an integer of 1 to 3.) The problem of the present invention is to provide: a thermoplastic resin having excellent heat resistance and excellent flame retardancy and having a siloxane constituent unit, particularly a thermoplastic resin suitable for optical applications; a composition containing the thermoplastic resin; and others. The problem is solved by a thermoplastic resin containing a structural unit (A) represented by general formula (I). (In general formula (I), Ra to Rct independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms in total and optionally having a substituent, or an aryl group having 6 to 30 carbon atoms in total and optionally having a substituent; Xa and Xb independently represent an alkyl group having 1 to 20 carbon atoms in total and optionally having a substituent, or an aryl group having 6 to 30 carbon atoms in total and optionally having a substituent; the substituent is any one of a halogen atom, a cyano group, an alkenyl group, an alkynyl group and an alkoxy group; and m represents an integer of 1 to 3.)

IPC Classes  ?

  • C08G 77/52 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages containing aromatic rings
  • C08L 83/14 - Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Compositions of derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

55.

FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD

      
Application Number 18014130
Status Pending
Filing Date 2021-07-08
First Publication Date 2023-10-19
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Sato, Takashi
  • Omatsu, Tadashi
  • Makinoshima, Takashi
  • Echigo, Masatoshi

Abstract

The present invention provides a film forming composition for lithography containing at least one selected from a compound having a predetermined structure and a resin obtained using the compound as a monomer.

IPC Classes  ?

  • G03F 7/004 - Photosensitive materials
  • G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • C09D 133/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or

56.

LINER FOR PRESSURE VESSEL AND HIGH-PRESSURE GAS STORAGE TANK

      
Application Number 18019420
Status Pending
Filing Date 2021-06-25
First Publication Date 2023-10-19
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Ikeuchi, Kousuke
  • Matsumoto, Nobuhiko

Abstract

Provided is a liner for a pressure vessel, the liner being constituted from a fiber-reinforced composite material containing a cured product of a thermosetting resin or a thermosetting resin composition, and continuous reinforcing fibers. Also provided is a high-pressure gas storage tank provided with the liner.

IPC Classes  ?

  • C08J 5/24 - Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
  • C08G 59/44 - Amides

57.

Epoxy resin curing agent, epoxy resin composition, and use of amine composition

      
Application Number 18025328
Grant Number 11945906
Status In Force
Filing Date 2021-08-19
First Publication Date 2023-10-12
Grant Date 2024-04-02
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Ikeuchi, Kousuke
  • Kouno, Kazuki
  • Ohno, Yuma
  • Ota, Emi
  • Yokoo, Aoi

Abstract

Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains bis(aminomethyl)cyclohexane (A), a compound (B) represented by the specific formula (1), and a compound (C) represented by the specific formula (2), and wherein a mass ratio of the component (B) to the component (C) [(B)/(C)] is from 0.01 to 5.0, an epoxy resin composition, and use of an amine composition for an epoxy resin curing agent.

IPC Classes  ?

58.

ALLERGIC DISEASE DETERMINATION METHOD AND DETERMINATION SYSTEM

      
Application Number 18043999
Status Pending
Filing Date 2021-09-06
First Publication Date 2023-10-12
Owner
  • MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
  • NATIONAL UNIVERSITY CORPORATION CHIBA UNIVERSITY (Japan)
Inventor
  • Sawano, Erika
  • Takase, Yuki
  • Shimojo, Naoki
  • Yamaide, Fumiya
  • Nakano, Taiji

Abstract

An allergic disease determination method includes contacting probes selected from an allergen and a fragment thereof and a biological sample collected from a subject; detecting a reaction between the probes and an antibody contained in the biological sample; determining a type of the antibody reacted with the probes; inputting data associated with the reaction of each of the at least two types of probes with the antibody and data associated with a type of the bound antibody into a prediction model and acquiring a prediction result; and determining an allergic disease on the basis of the prediction result. The prediction model is a nonlinear model or a model having two or more explanatory variables and two or more terms, the model being created using training data associated with the reaction of at least the probes with the antibody and training data associated with the type of the bound antibody.

IPC Classes  ?

  • G01N 33/68 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving proteins, peptides or amino acids
  • G01N 33/543 - Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
  • B01L 3/00 - Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers

59.

UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM, AND PATTERN FORMATION METHOD

      
Application Number 18021160
Status Pending
Filing Date 2021-08-03
First Publication Date 2023-10-12
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Yamamoto, Hiroaki
  • Iwasaki, Atsuko
  • Makinoshima, Takashi
  • Echigo, Masatoshi

Abstract

An object of the present invention is to provide a resist underlayer film forming composition for lithography that has features of having excellent smoothing performance on an uneven substrate, good embedding performance into a fine hole pattern, and a smoothed wafer surface after film formation, and the like. The object can be achieved by an underlayer film forming composition for lithography containing a compound having a protecting group.

IPC Classes  ?

  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • C08G 8/10 - Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
  • C08G 8/32 - Chemically modified polycondensates by organic acids or derivatives thereof, e.g. fatty oils
  • C08G 12/08 - Amines aromatic
  • C08G 12/40 - Chemically modified polycondensates
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
  • G03F 7/16 - Coating processes; Apparatus therefor

60.

Epoxy resin curing agent, epoxy resin composition, and use of amine composition

      
Application Number 18025275
Grant Number 11939420
Status In Force
Filing Date 2021-08-19
First Publication Date 2023-10-12
Grant Date 2024-03-26
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Ohno, Yuma
  • Kouno, Kazuki
  • Ikeuchi, Kousuke
  • Ota, Emi
  • Yokoo, Aoi

Abstract

2—.

IPC Classes  ?

61.

Multilayered Container And Method For Producing Same

      
Application Number 18209059
Status Pending
Filing Date 2023-06-13
First Publication Date 2023-10-12
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor Miyabe, Takanori

Abstract

A multilayer container having a polyester layer comprising a thermoplastic polyester resin (X) and a polyamide layer comprising a polyamide resin (Y), wherein the polyester layer is an innermost layer and the polyamide layer is an interlayer, and the polyamide resin (Y) comprises a polyamide resin (Y-1) comprising a structural unit derived from a diamine and a structural unit derived from a dicarboxylic acid, 70 mol % or more of the structural unit derived from a diamine being a structural unit derived from xylylenediamine; and 70 mol % or more of the structural unit derived from a dicarboxylic acid being a structural unit derived from an α,ω-linear aliphatic dicarboxylic acid having 4 to 20 carbon atoms, and wherein a stretching ratio in a transverse direction (TD) is 2.2 times or more, and a stretching ratio in a machine direction (MD) to the stretching ratio in the transverse direction (TD) (MD/TD) is 0.6 or more and less than 1.0.

IPC Classes  ?

  • B32B 1/02 - Receptacles, e.g. tanks
  • B29C 49/06 - Injection blow-moulding
  • B29C 49/12 - Stretching rods
  • B32B 27/08 - Layered products essentially comprising synthetic resin as the main or only constituent of a layer next to another layer of a specific substance of synthetic resin of a different kind
  • B32B 27/34 - Layered products essentially comprising synthetic resin comprising polyamides
  • B32B 27/36 - Layered products essentially comprising synthetic resin comprising polyesters
  • B65D 1/02 - Bottles or similar containers with necks or like restricted apertures, designed for pouring contents
  • C08G 63/12 - Polyesters derived from hydroxy carboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
  • C08G 69/26 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
  • C08G 63/183 - Terephthalic acids

62.

ANTI-REFLECTION SUBSTRATE

      
Application Number 18009106
Status Pending
Filing Date 2021-05-31
First Publication Date 2023-10-05
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Yamamoto, Yoshiaki
  • Wakayama, Shota

Abstract

- - - Provided is an antireflection substrate formed by laminating the following layers (A), (B), (C) and (D) in this order: a substrate layer (A), a hard coating layer (B), a light absorbing layer (C), and a low refractive index layer (D), formed by curing a low refractive index resin composition containing an active energy ray-curable resin, hollow silica and a fluorine compound by an active energy ray, where the film thickness of the light absorbing layer (C) is 1 to 20 nm. - - -

IPC Classes  ?

  • C09D 151/08 - Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
  • C09D 175/06 - Polyurethanes from polyesters
  • G02B 1/111 - Anti-reflection coatings using layers comprising organic materials

63.

Polyester resin and method for producing polyester resin

      
Application Number 18249208
Grant Number 11840603
Status In Force
Filing Date 2021-11-08
First Publication Date 2023-10-05
Grant Date 2023-12-12
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Shinohara, Katsumi
  • Sato, Kazua
  • Ikarashi, Hiroki

Abstract

A polyester resin containing: a diol constituent unit containing a unit a1 derived from spiroglycol represented by formula (1) and a unit a2 derived from ethylene glycol; and a dicarboxylic acid constituent unit containing a unit b derived from terephthalic acid and/or an ester thereof. A content of the unit a1 is from 5 to 60 mol % and a content of the unit a2 is from 30 to 95 mol %, based on a total amount of the unit a1 and the unit a2. A content of the unit b is from 80 to 100 mol % based on a total amount of the dicarboxylic acid constituent unit.

IPC Classes  ?

  • C08G 63/672 - Dicarboxylic acids and dihydroxy compounds

64.

POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION

      
Application Number 18016093
Status Pending
Filing Date 2021-07-15
First Publication Date 2023-10-05
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Matsuura, Kodai
  • Horiuchi, Junya
  • Makinoshima, Takashi
  • Echigo, Masatoshi

Abstract

A polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B); or a polycyclic polyphenolic resin having repeating units derived from an aromatic hydroxy compound represented by the formula (C-1A), wherein the repeating units are linked to each other by a direct bonding between aromatic rings: A polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B); or a polycyclic polyphenolic resin having repeating units derived from an aromatic hydroxy compound represented by the formula (C-1A), wherein the repeating units are linked to each other by a direct bonding between aromatic rings: A polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B); or a polycyclic polyphenolic resin having repeating units derived from an aromatic hydroxy compound represented by the formula (C-1A), wherein the repeating units are linked to each other by a direct bonding between aromatic rings: wherein in the formula (1A), R1 is a 2n-valent group having 1 to 60 carbon atoms or a single bond, each R2 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group or a hydroxy group, and each m is independently an integer of 0 to 3; each n is independently an integer of 1 to 4; and in the formula (1B), R2 and m are as defined in the formula (1A), and A polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B); or a polycyclic polyphenolic resin having repeating units derived from an aromatic hydroxy compound represented by the formula (C-1A), wherein the repeating units are linked to each other by a direct bonding between aromatic rings: wherein in the formula (1A), R1 is a 2n-valent group having 1 to 60 carbon atoms or a single bond, each R2 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group or a hydroxy group, and each m is independently an integer of 0 to 3; each n is independently an integer of 1 to 4; and in the formula (1B), R2 and m are as defined in the formula (1A), and A polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B); or a polycyclic polyphenolic resin having repeating units derived from an aromatic hydroxy compound represented by the formula (C-1A), wherein the repeating units are linked to each other by a direct bonding between aromatic rings: wherein in the formula (1A), R1 is a 2n-valent group having 1 to 60 carbon atoms or a single bond, each R2 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group or a hydroxy group, and each m is independently an integer of 0 to 3; each n is independently an integer of 1 to 4; and in the formula (1B), R2 and m are as defined in the formula (1A), and wherein in the formula (C-1A), R1 is a 2n-valent group having 1 to 60 carbon atoms or a single bond, each R2 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group or a hydroxy group, and each m is independently an integer of 0 to 9; and n is an integer of 1 to 4, and each p is independently an integer of 0 to 3.

IPC Classes  ?

  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
  • C08F 216/18 - Acyclic compounds
  • C08L 71/10 - Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
  • G03F 7/004 - Photosensitive materials
  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

65.

RESIN, METHOD FOR PRODUCING RESIN, CURABLE RESIN COMPOSITION, AND CURED PRODUCT

      
Application Number 18018985
Status Pending
Filing Date 2021-07-02
First Publication Date 2023-10-05
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Uotani, Takuya
  • Takano, Yoichi
  • Innan, Susumu
  • Itoh, Syouichi
  • Yoshinaka, Satoshi
  • Suzuki, Mika
  • Ogiwara, Masashi
  • Oka, Hiroaki

Abstract

To provide a novel resin having excellent dielectric properties, a method for producing the resin, a curable resin composition, and a cured product. The resin contains constituent units described in Group (1). R1 each independently represent a methylene group, a methylene oxy group, a methylene oxy methylene group, or an oxy methylene group. R2 and R3 each independently represent a halogen atom, an alkyl group having from 1 to 10 carbons, a halogenated alkyl group having from 1 to 10 carbons, a hydroxy alkyl group having from 1 to 10 carbons, or an aryl group having from 6 to 12 carbons. R4, R5, and R6 each independently represent a hydrogen atom, a halogen atom, an alkyl group having from 1 to 10 carbons, a halogenated alkyl group having from 1 to 10 carbons, a hydroxy group, a hydroxy alkyl group having from 1 to 10 carbons, or an aryl group having from 6 to 12 carbons. To provide a novel resin having excellent dielectric properties, a method for producing the resin, a curable resin composition, and a cured product. The resin contains constituent units described in Group (1). R1 each independently represent a methylene group, a methylene oxy group, a methylene oxy methylene group, or an oxy methylene group. R2 and R3 each independently represent a halogen atom, an alkyl group having from 1 to 10 carbons, a halogenated alkyl group having from 1 to 10 carbons, a hydroxy alkyl group having from 1 to 10 carbons, or an aryl group having from 6 to 12 carbons. R4, R5, and R6 each independently represent a hydrogen atom, a halogen atom, an alkyl group having from 1 to 10 carbons, a halogenated alkyl group having from 1 to 10 carbons, a hydroxy group, a hydroxy alkyl group having from 1 to 10 carbons, or an aryl group having from 6 to 12 carbons.

IPC Classes  ?

66.

MULTI-LAYER CONTAINER, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING RECLAIMED POLYESTER

      
Application Number 18022034
Status Pending
Filing Date 2021-08-11
First Publication Date 2023-09-28
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Otsuka, Kosuke
  • Daito, Masayuki
  • Yamada, Takumi

Abstract

Provided is a multilayer container having a polyester layer containing a polyester resin (X), and a polyamide layer containing a polyamide resin (Y) and a yellowing inhibitor (A). The content of the polyamide resin (Y) is from 0.05 to 7.0 mass % relative to the total amount of all polyamide layers and all polyester layers. The yellowing inhibitor (A) is a dye. The content of the yellowing inhibitor (A) is from 400 to 800 ppm relative to the polyamide layer. An L* of the multilayer container is 87.5 or greater.

IPC Classes  ?

  • B65D 65/40 - Applications of laminates for particular packaging purposes
  • B29C 49/06 - Injection blow-moulding
  • B29C 49/22 - Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor using multilayered preforms or parisons
  • B32B 27/20 - Layered products essentially comprising synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
  • B32B 27/34 - Layered products essentially comprising synthetic resin comprising polyamides
  • B32B 27/36 - Layered products essentially comprising synthetic resin comprising polyesters
  • B32B 27/08 - Layered products essentially comprising synthetic resin as the main or only constituent of a layer next to another layer of a specific substance of synthetic resin of a different kind

67.

POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION

      
Application Number 18015818
Status Pending
Filing Date 2021-07-15
First Publication Date 2023-09-21
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Horiuchi, Junya
  • Matsuura, Kodai
  • Okada, Yu
  • Omatsu, Tadashi
  • Makinoshima, Takashi
  • Echigo, Masatoshi

Abstract

A polymer having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B), wherein the repeating units are linked to each other by direct bonding between aromatic rings: A polymer having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B), wherein the repeating units are linked to each other by direct bonding between aromatic rings: A polymer having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B), wherein the repeating units are linked to each other by direct bonding between aromatic rings: wherein each R is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group, or a hydroxy group, at least one R is a group containing a hydroxy group, and each m is independently an integer of 1 to 10.

IPC Classes  ?

  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
  • C08G 61/10 - Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aromatic carbon atoms, e.g. polyphenylenes
  • G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
  • G03F 7/004 - Photosensitive materials
  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks

68.

THERMOPLASTIC RESIN COMPOSITION FOR OPTICAL MATERIAL, MOLDED ARTICLE, COMPOUNDING AGENT, METHOD FOR PRODUCING THERMOPLASTIC RESIN COMPOSITION, AND METHOD FOR IMPROVING TRANSMISSIVITY

      
Application Number 18020531
Status Pending
Filing Date 2021-08-11
First Publication Date 2023-09-21
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Kato, Noriyuki
  • Nishimori, Katsushi
  • Ikeda, Shinya
  • Motegi, Atsushi
  • Murata Suzuki, Shoko
  • Ochi, Noriaki
  • Kanda, Masahiro
  • Nagai, Masayuki
  • Morishita, Takami
  • Ikeda, Shinichi

Abstract

A thermoplastic resin composition for an optical material is provided. The thermoplastic resin composition contains a compounding agent represented by general formula (1). (In general formula (1), R1 to R5 independently represent a hydrogen atom, or an alkyl group having 1 to 20 carbon atoms in total which may have a substituent; R6 to R9 independently represent a hydrogen atom, or an alkyl group having 1 to 20 carbon atoms in total which may have a substituent; and R10 represents a hydrogen atom, or an alkyl group having 1 to carbon atoms in total.)

IPC Classes  ?

  • C08G 64/06 - Aromatic polycarbonates not containing aliphatic unsaturation
  • C08K 5/13 - Phenols; Phenolates
  • C08K 5/527 - Cyclic esters
  • C08K 5/103 - Esters; Ether-esters of monocarboxylic acids with polyalcohols

69.

PALLADIUM-CONTAINING COMPOSITION AND HYDROGEN PEROXIDE PRODUCTION METHOD

      
Application Number 18318157
Status Pending
Filing Date 2023-05-16
First Publication Date 2023-09-14
Owner
  • MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
  • KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION (Japan)
Inventor
  • Ishihara, Tatsumi
  • Okuda, Norikazu
  • Kimizuka, Ken-Ichi
  • Tasaki, Ken

Abstract

It is desired to develop a method of producing hydrogen peroxide, which is capable of producing hydrogen peroxide with high production efficiency. According to the present invention, provided is a palladium-containing composition comprising palladium particles and a coating agent that coats the surface of the palladium particles, wherein a compound having an O═X structure (wherein X represents any of a phosphorus atom, a sulfur atom, and a carbon atom) is comprised as the coating agent.

IPC Classes  ?

  • B01J 31/28 - Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups of the platinum group metals, iron group metals or copper
  • C01B 15/029 - Preparation from hydrogen and oxygen
  • B01J 35/02 - Solids

70.

METHOD FOR PRODUCING A-HYDROXY CARBOXYLIC ACID COMPOSITION

      
Application Number 18017449
Status Pending
Filing Date 2021-07-28
First Publication Date 2023-08-31
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Yuri, Michihiro
  • Suzuki, Shu

Abstract

A method for producing an a-hydroxycarboxylic acid compositions includes distilling a mixed solution containing an α-hydroxycarboxylic acid, water, and an organic impurity, wherein the distillation is performed under a condition that an upper limit temperature of a bottoms liquid is 140° C. or lower.

IPC Classes  ?

  • C07C 51/44 - Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation by distillation
  • C07C 51/377 - Preparation of carboxylic acids or their salts, halides, or anhydrides by reactions not involving formation of carboxyl groups by hydrogenolysis of functional groups

71.

OXYGEN SCAVENGER COMPOSITION AND METHOD FOR PRODUCING SAME

      
Application Number 18012534
Status Pending
Filing Date 2021-06-29
First Publication Date 2023-08-24
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Sato, Daiki
  • Kaji, Natsuko
  • Sasaki, Kazuhisa
  • Noro, Kensuke
  • Kagimoto, Kouta

Abstract

An oxygen scavenger composition contains a mixed granule of a composition containing a water retention agent, a swelling agent, a metal halide, water, an iron and an alkaline substance, wherein the alkaline substance contains at least one selected from the group consisting of hydroxides of alkali metals, hydroxides of alkaline earth metals and salts composed of a weak acid and a strong base.

IPC Classes  ?

  • B01J 20/02 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
  • B01J 20/14 - Diatomaceous earth
  • B01J 20/10 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
  • B01J 20/20 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising carbon obtained by carbonising processes
  • B01J 20/12 - Naturally occurring clays or bleaching earth
  • B01J 20/24 - Naturally occurring macromolecular compounds, e.g. humic acids or their derivatives
  • B01J 20/04 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising compounds of alkali metals, alkaline earth metals or magnesium
  • B01J 20/28 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
  • B01J 20/30 - Processes for preparing, regenerating or reactivating
  • B65D 81/26 - Adaptations for preventing deterioration or decay of contents; Applications to the container or packaging material of food preservatives, fungicides, pesticides or animal repellants with provision for draining away, or absorbing, fluids, e.g. exuded by contents; Applications of corrosion inhibitors or desiccators
  • B01D 53/46 - Removing components of defined structure

72.

METHOD FOR PRODUCING AROMATIC AMINOMETHYL

      
Application Number 18004261
Status Pending
Filing Date 2021-07-06
First Publication Date 2023-08-24
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Tomaki, Keisuke
  • Shirai, Shinyou

Abstract

A method for producing an aromatic aminomethyl, comprising hydrogenating an aromatic nitrile in an organic solvent comprising a polar organic solvent having a solubility parameter (SP value) of 9 or more in the presence of a quaternary ammonium compound, at least one metal hydroxide selected from the group consisting of an alkali metal hydroxide and an alkaline earth metal hydroxide, and a hydrogenation catalyst.

IPC Classes  ?

  • C07C 209/48 - Preparation of compounds containing amino groups bound to a carbon skeleton by reduction of carboxylic acids or esters thereof in presence of ammonia or amines, or by reduction of nitriles, carboxylic acid amides, imines or imino-ethers by reduction of nitriles
  • C07C 209/84 - Purification

73.

RESIN COMPOSITION AND MOLDED ARTICLE

      
Application Number 18003565
Status Pending
Filing Date 2021-06-22
First Publication Date 2023-08-17
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Sakai, Atsushi
  • Sato, Yuuki

Abstract

A resin composition containing a liquid crystal polymer (A) and a predetermined polyimide resin (B), wherein the liquid crystal polymer (A) contains at least one repeating structural unit selected from the group consisting of repeating structural units represented by the following formulas (I) to (IV), and a molded article containing the same: A resin composition containing a liquid crystal polymer (A) and a predetermined polyimide resin (B), wherein the liquid crystal polymer (A) contains at least one repeating structural unit selected from the group consisting of repeating structural units represented by the following formulas (I) to (IV), and a molded article containing the same: A resin composition containing a liquid crystal polymer (A) and a predetermined polyimide resin (B), wherein the liquid crystal polymer (A) contains at least one repeating structural unit selected from the group consisting of repeating structural units represented by the following formulas (I) to (IV), and a molded article containing the same: wherein a, b, and c represent an average number of repeating structural units.

IPC Classes  ?

  • C08G 63/06 - Polyesters derived from hydroxy carboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from hydroxy carboxylic acids
  • C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08L 67/04 - Polyesters derived from hydroxy carboxylic acids, e.g. lactones
  • C08J 5/04 - Reinforcing macromolecular compounds with loose or coherent fibrous material
  • C08K 7/06 - Elements
  • C08K 7/14 - Glass

74.

METHOD FOR ISOMERIZING ALIPHATIC DIAMINE, METHOD FOR PRODUCING DIISOCYANATE, METHOD FOR PRODUCING POLYURETHANE, AND POLYURETHANE

      
Application Number 18004599
Status Pending
Filing Date 2021-07-06
First Publication Date 2023-08-10
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Ueno, Masayoshi
  • Iida, Akifumi
  • Nagamatsu, Kentaro

Abstract

A method for isomerizing an aliphatic diamine represented by Formula (1) below in the presence of an imine compound obtained by dehydration condensation of an aliphatic diamine represented by Formula (1) below and an aldehyde and/or a ketone; and in the presence of an alkali metal. A ratio of a total amount of the alkali metal to a total amount of the aliphatic diamine is 0.5 mol % or greater and 6.0 mol % or less, and R represents a single bond or an unsubstituted aliphatic or alicyclic alkylene group having 1 to 8 carbon atoms, and n represents an integer from 0 to 5. A method for isomerizing an aliphatic diamine represented by Formula (1) below in the presence of an imine compound obtained by dehydration condensation of an aliphatic diamine represented by Formula (1) below and an aldehyde and/or a ketone; and in the presence of an alkali metal. A ratio of a total amount of the alkali metal to a total amount of the aliphatic diamine is 0.5 mol % or greater and 6.0 mol % or less, and R represents a single bond or an unsubstituted aliphatic or alicyclic alkylene group having 1 to 8 carbon atoms, and n represents an integer from 0 to 5.

IPC Classes  ?

  • C07C 209/68 - Preparation of compounds containing amino groups bound to a carbon skeleton from amines, by reactions not involving amino groups, e.g. reduction of unsaturated amines, aromatisation, or substitution of the carbon skeleton

75.

METHOD FOR PRODUCING OXYMETHYLENE COPOLYMER

      
Application Number 18137160
Status Pending
Filing Date 2023-04-20
First Publication Date 2023-08-10
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Takahashi, Toru
  • Nakaya, Daigo
  • Oshima, Kensuke
  • Sunaga, Daisuke

Abstract

A method for producing an oxymethylene copolymer, in which a copolymer starting material containing a trioxane and a comonomer is subjected to a polymerization reaction in the presence of a polymerization initiator that contains an acidic compound (A), and where: the copolymer starting material contains a basic compound (B); an acidic compound (C) that is different from the acidic compound (A) is added into the copolymer starting material before performing the polymerization reaction, thereby causing a reaction between the basic compound (B) and the acidic compound (C) in advance; and the polymerization reaction is carried out by means of melt polymerization.

IPC Classes  ?

  • C08G 2/24 - Copolymerisation of aldehydes or ketones with acetals

76.

RESIN SHEET FOR MOLDING AND MOLDED ARTICLE USING SAME

      
Application Number 18007643
Status Pending
Filing Date 2021-05-27
First Publication Date 2023-08-03
Owner
  • MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
  • MGC FILSHEET CO., LTD. (Japan)
Inventor
  • Tokita, Atsuhiro
  • Nonaka, Kenta
  • Takasaki, Masato

Abstract

A resin sheet for molding includes a substrate layer that contains polycarbonate resin (a1), a high-hardness resin layer that contains high-hardness resin and that is provided on at least one surface of the substrate layer, a hard coat layer or a hard coat antiglare layer that is provided on at least one surface of the high-hardness resin layer, and a wet antireflection layer that is laminated on a surface of the hard coat layer or the hard coat antiglare layer on the side opposite from the high-hardness resin layer, wherein the glass transition temperatures of the polycarbonate resin (a1) and the high-hardness resin satisfy the following relationship: −10° C.≤(glass transition temperature of high-hardness resin)−(glass transition temperature of polycarbonate resin (a1))≤40° C.

IPC Classes  ?

  • B32B 27/30 - Layered products essentially comprising synthetic resin comprising acrylic resin
  • C08L 69/00 - Compositions of polycarbonates; Compositions of derivatives of polycarbonates
  • C08L 25/14 - Copolymers of styrene with unsaturated esters
  • C08J 7/04 - Coating
  • C09D 5/00 - Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
  • C09D 135/02 - Homopolymers or copolymers of esters
  • B32B 27/36 - Layered products essentially comprising synthetic resin comprising polyesters
  • B32B 27/08 - Layered products essentially comprising synthetic resin as the main or only constituent of a layer next to another layer of a specific substance of synthetic resin of a different kind

77.

RESIN COMPOSITION, RESIN SHEET, MULTILAYERED ARTICLE AND CARD

      
Application Number 18021310
Status Pending
Filing Date 2021-07-27
First Publication Date 2023-08-03
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Ohno, Shotaro
  • Takeda, Masahide
  • Nakajima, Mamoru
  • Tomita, Keisuke
  • Suzuki, Kentaro

Abstract

Provided are a resin composition which can provide a resin sheet having excellent light shielding properties with titanium oxide sufficiently dispersed, as well as a resin sheet, a multilayered article and a card produced therefrom. The resin composition includes a polycarbonate resin in an amount of 30 to 95 parts by mass, and titanium oxide in an amount of 5 to 40 parts by mass, wherein the titanium oxide has an average primary particle size of 0.22 to 0.26 µm based on measurement of an image observed by a scanning electron microscope (SEM), and wherein the titanium oxide has an Si content of 1.0 to 1.8 % by mass and an Al content of 1.6 to 2.2 % by mass based on measurement by X-ray fluorescence (XRF) analysis after firing at 700° C. for 2 hours.

IPC Classes  ?

  • C08L 69/00 - Compositions of polycarbonates; Compositions of derivatives of polycarbonates
  • C08L 67/04 - Polyesters derived from hydroxy carboxylic acids, e.g. lactones
  • C08K 5/50 - Phosphorus bound to carbon only
  • C08K 3/22 - Oxides; Hydroxides of metals

78.

BIOCHIP, METHOD FOR PRODUCING SAME, AND USE OF SAME

      
Application Number 18043368
Status Pending
Filing Date 2021-09-06
First Publication Date 2023-08-03
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Sawano, Erika
  • Takase, Yuki
  • Sakai, Haruka
  • Tashiro, Hideo
  • Tashiro, Tomoko

Abstract

A biochip is described having a substrate that has disposed on a surface at least one spot containing a complex between a solid carrier modified by a reactive group and a substance to be immobilized that has been modified via a spacer by a group that reacts with the reactive group. A method for producing the biochip and a method for detecting a target substance using the biochip are also described.

IPC Classes  ?

  • B01L 3/00 - Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
  • G01N 33/543 - Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
  • G01N 33/563 - Immunoassay; Biospecific binding assay; Materials therefor involving antibody fragments

79.

AUXILIARY MATERIAL FOR FIBER-REINFORCED COMPOSITE MATERIAL PROCESSING AND MACHINING METHOD

      
Application Number 17918872
Status Pending
Filing Date 2021-04-01
First Publication Date 2023-08-03
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Yokosuka, Ryota
  • Nonaka, Hiroyuki
  • Soutome, Hiroki

Abstract

An auxiliary material for fiber-reinforced composite material processing having a supporting material and an adhesive layer disposed on the supporting material, in which an elastic modulus at 23° C. of the supporting material is 0.1 to 30 GPa.

IPC Classes  ?

  • C08J 5/04 - Reinforcing macromolecular compounds with loose or coherent fibrous material
  • C08J 5/12 - Bonding of a preformed macromolecular material to the same or other solid material such as metal, glass, leather, e.g. using adhesives
  • C09J 7/24 - Plastics; Metallised plastics based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds

80.

ETCHING LIQUID FOR TITANIUM AND/OR TITANIUM ALLOY, METHOD FOR ETCHING TITANIUM AND/OR TITANIUM ALLOY WITH USE OF SAID ETCHING LIQUID, AND METHOD FOR PRODUCING SUBSTRATE WITH USE OF SAID ETCHING LIQUID

      
Application Number 17996170
Status Pending
Filing Date 2021-04-07
First Publication Date 2023-07-27
Owner
  • MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
  • Mitsubishi Gas Chemical Trading, Inc. (Japan)
Inventor
  • Naito, Yukihide
  • Matsunaga, Hiroshi
  • Tamai, Satoshi

Abstract

An etching method for quickly removing a seed layer that is formed of titanium and/or a titanium alloy, while suppressing dissolution of other metals from copper wiring lines and the like, for continuous and stable processing; and a composition which is used for this etching method. The composition comprises, based on a total amount of the composition, 0.01 to 0.23% by mass hydrogen peroxide, 0.2 to 3% by mass fluoride, 0.0005 to 0.025% by mass of a halide ion other than a fluoride ion, and water. A method for using the composition to produce a substrate is also described.

IPC Classes  ?

  • H01L 21/3213 - Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer

81.

OPTICAL FILM

      
Application Number 18015421
Status Pending
Filing Date 2021-07-09
First Publication Date 2023-07-27
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Kato, Noriyuki
  • Ikeda, Shinya
  • Hirakawa, Manabu

Abstract

An optical film is provided in which a wavelength dispersion characteristic at a wavelength of 400 nm to 800 nm satisfies the following general formula (1): An optical film is provided in which a wavelength dispersion characteristic at a wavelength of 400 nm to 800 nm satisfies the following general formula (1): Δ ⁢ λ Δ ⁢ 5 ⁢ 5 ⁢ 0 = a ⁢ λ - b ( 1 ) An optical film is provided in which a wavelength dispersion characteristic at a wavelength of 400 nm to 800 nm satisfies the following general formula (1): Δ ⁢ λ Δ ⁢ 5 ⁢ 5 ⁢ 0 = a ⁢ λ - b ( 1 ) wherein a has a value of 1500

IPC Classes  ?

  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
  • C08J 5/18 - Manufacture of films or sheets

82.

POLYAMIDE RESIN, POLYAMIDE RESIN COMPOSITION, AND MOLDED ARTICLE

      
Application Number 17927646
Status Pending
Filing Date 2021-05-24
First Publication Date 2023-07-27
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Otsuka, Kosuke
  • Okajima, Yuya

Abstract

Provided are a polyamide resin with a high melting point and a high glass transition temperature, a polyamide resin composition, and a molded article. The polyamide resin includes diamine-derived structural units and dicarboxylic acid-derived structural units, in which 50 mol % or more of the diamine-derived structural units are structural units derived from p-benzenediethanamine, and 65 mol % or more of the dicarboxylic acid-derived structural units are structural units derived from an aromatic dicarboxylic acid.

IPC Classes  ?

  • C08G 69/32 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
  • C08G 69/26 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
  • C08K 3/32 - Phosphorus-containing compounds

83.

RESIN COMPOSITION

      
Application Number 18011331
Status Pending
Filing Date 2021-06-18
First Publication Date 2023-07-27
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Suematsu, Mitsutake
  • Ikeda, Shinya
  • Kato, Noriyuki
  • Kondo, Mitsuteru
  • Nishimori, Katsushi

Abstract

Provided is a resin composition that is highly fluid and has good moldability, and that has excellent optical properties. More specifically, provided is a resin composition that contains a thermoplastic resin and a specific compounding agent containing a naphthalene structure and/or a fluorene structure.

IPC Classes  ?

  • C08G 64/06 - Aromatic polycarbonates not containing aliphatic unsaturation
  • C08G 64/30 - General preparatory processes using carbonates
  • C08K 5/06 - Ethers; Acetals; Ketals; Ortho-esters
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

84.

POLYAMIDE RESIN

      
Application Number 18021791
Status Pending
Filing Date 2021-06-09
First Publication Date 2023-07-20
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Otsuka, Kosuke
  • Okajima, Yuya

Abstract

Provided is a polyamide resin having a high glass transition temperature and a low water absorption rate and from which a molded article that exhibits minimal deformation after water absorption is obtained. The polyamide resin includes diamine-derived structural units and dicarboxylic acid-derived structural units. More than 30 mol% of the diamine-derived structural units are derived from a diamine represented by the following formula, and more than 30 mol% of the dicarboxylic acid-derived structural units are derived from an aromatic dicarboxylic acid: Provided is a polyamide resin having a high glass transition temperature and a low water absorption rate and from which a molded article that exhibits minimal deformation after water absorption is obtained. The polyamide resin includes diamine-derived structural units and dicarboxylic acid-derived structural units. More than 30 mol% of the diamine-derived structural units are derived from a diamine represented by the following formula, and more than 30 mol% of the dicarboxylic acid-derived structural units are derived from an aromatic dicarboxylic acid:

IPC Classes  ?

  • C08G 69/26 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids

85.

POLYAMIDE RESIN

      
Application Number 18021796
Status Pending
Filing Date 2021-06-09
First Publication Date 2023-07-20
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Otsuka, Kosuke
  • Okajima, Yuya

Abstract

Provided is a polyamide resin having a low mass loss at a temperature slightly higher than the melting point. The polyamide resin includes diamine-derived structural units and dicarboxylic acid-derived structural units, and of the diamine-derived structural units, from 70 to 97 mol % are derived from p-benzenediethanamine and from 3 to 30 mol % are derived from a diamine represented by formula (1). 50 mol % or more of the dicarboxylic acid-derived structural units are derived from an aromatic dicarboxylic acid. Provided is a polyamide resin having a low mass loss at a temperature slightly higher than the melting point. The polyamide resin includes diamine-derived structural units and dicarboxylic acid-derived structural units, and of the diamine-derived structural units, from 70 to 97 mol % are derived from p-benzenediethanamine and from 3 to 30 mol % are derived from a diamine represented by formula (1). 50 mol % or more of the dicarboxylic acid-derived structural units are derived from an aromatic dicarboxylic acid.

IPC Classes  ?

  • C08G 69/26 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids

86.

METHOD FOR PRODUCING POLYMERIC MOLDED PRODUCT

      
Application Number 18000453
Status Pending
Filing Date 2021-06-02
First Publication Date 2023-07-13
Owner
  • Mitsubishi Gas Chemical Company, Inc. (Japan)
  • The University of Tokyo (Japan)
Inventor
  • Maehara, Akira
  • Iwata, Tadahisa
  • Omura, Taku
  • Kabe, Taizo

Abstract

An object of the present invention is to provide a method for producing a polymeric molded product, which does not undergo a considerable molecular weight reduction during melt-molding, even in a polymer may easily lose its molecular weight when it is in a melted state. The present invention provides a method for producing a polymeric molded product, which comprises melt-molding a polymer comprising lamellar crystals that are different in lamella thickness, in a temperature range where some of the lamellar crystals undergo melting and flowing, and the other balance lamellar crystals remain unmelted.

IPC Classes  ?

  • B29C 48/00 - Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
  • B29C 48/92 - Measuring, controlling or regulating
  • B29C 48/78 - Thermal treatment of the extrusion moulding material or of preformed parts or layers, e.g. by heating or cooling

87.

POLYAMIDE RESIN, POLYAMIDE RESIN COMPOSITION, AND MOLDED ARTICLE

      
Application Number 17927247
Status Pending
Filing Date 2021-05-24
First Publication Date 2023-07-13
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Otsuka, Kosuke
  • Okajima, Yuya

Abstract

Provided are a polyamide resin having high crystallinity, a high glass transition temperature, and a low mass loss rate, and a polyamide resin composition and a molded article in which the polyamide resin is used. The polyamide resin includes a diamine-derived structural unit and a dicarboxylic acid-derived structural unit, in which 50 mol % or more of the diamine-derived structural units are structural unit derived from p-benzenediethanamine, and of the dicarboxylic acid-derived structural units, from not less than 20 mol % to less than 95 mol % are structural units derived from an aromatic dicarboxylic acid and from more than 5 mol % to not more than 80 mol % are structural units derived from an α,ω-linear aliphatic dicarboxylic acid having from 4 to 15 carbons.

IPC Classes  ?

  • C08G 69/26 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
  • C08K 5/5313 - Phosphinic compounds, e.g. R2=P(:O)OR'
  • C08K 3/22 - Oxides; Hydroxides of metals
  • C08K 3/34 - Silicon-containing compounds

88.

METHOD FOR PRODUCING POLYMERIC MOLDED PRODUCT COMPRISING PRETREATMENT BY HEATING

      
Application Number 18000446
Status Pending
Filing Date 2021-06-02
First Publication Date 2023-07-06
Owner
  • Mitsubishi Gas Chemical Company, Inc. (Japan)
  • The University of Tokyo (Japan)
Inventor
  • Maehara, Akira
  • Iwata, Tadahisa
  • Omura, Taku
  • Kabe, Taizo

Abstract

An object of the present invention is to provide a method for producing a polymeric molded product, the method enabling expansion of a temperature range that can be used for partial melting. The present invention provides a method for producing a polymeric molded product, which comprises subjecting a crystalline polyhydroxyalkanoate to a heating treatment at a temperature equal to or higher than a glass transition temperature; and melt-molding a polyhydroxyalkanoate yielded by the heating treatment, which comprises lamellar crystals that are different in lamellar thickness, in a temperature range where some of the lamellar crystals undergo melting and flowing, and the other balance lamellar crystals remain unmelted.

IPC Classes  ?

  • B29C 48/78 - Thermal treatment of the extrusion moulding material or of preformed parts or layers, e.g. by heating or cooling
  • B29C 48/00 - Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor

89.

POLYCARBONATE RESIN, AND OPTICAL LENS AND OPTICAL FILM USING SAME

      
Application Number 17923133
Status Pending
Filing Date 2021-04-28
First Publication Date 2023-06-22
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Suematsu, Mitsutake
  • Ikeda, Shinya
  • Kato, Noriyuki
  • Kondo, Mitsuteru
  • Nishimori, Katsushi
  • Harada, Yutaro
  • Murata Suzuki, Shoko

Abstract

Provided is a polycarbonate resin which maintains favorable properties as an optical material while having fluidity suitable for molding. Furthermore, provided are an optical lens and an optical film that use the polycarbonate resin. The polycarbonate resin is characterized by comprising a component unit (A) expressed by general formula (1) and a component unit (B) expressed by general formula (2). Provided is a polycarbonate resin which maintains favorable properties as an optical material while having fluidity suitable for molding. Furthermore, provided are an optical lens and an optical film that use the polycarbonate resin. The polycarbonate resin is characterized by comprising a component unit (A) expressed by general formula (1) and a component unit (B) expressed by general formula (2). Provided is a polycarbonate resin which maintains favorable properties as an optical material while having fluidity suitable for molding. Furthermore, provided are an optical lens and an optical film that use the polycarbonate resin. The polycarbonate resin is characterized by comprising a component unit (A) expressed by general formula (1) and a component unit (B) expressed by general formula (2).

IPC Classes  ?

  • C08G 64/16 - Aliphatic-aromatic or araliphatic polycarbonates
  • G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

90.

COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT

      
Application Number 17924277
Status Pending
Filing Date 2021-05-10
First Publication Date 2023-06-15
Owner
  • The School Corporation Kansai University (Japan)
  • MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Kudo, Hiroto
  • Sato, Takashi
  • Omatsu, Tadashi
  • Echigo, Masatoshi

Abstract

To provide a compound which is high in sensitivity and which provides high resolution and high flatness. A compound represented by the following formula (P-0): To provide a compound which is high in sensitivity and which provides high resolution and high flatness. A compound represented by the following formula (P-0): To provide a compound which is high in sensitivity and which provides high resolution and high flatness. A compound represented by the following formula (P-0): wherein Ar is a group having an aryl group having 6 to 60 carbon atoms, each ORTS is independently a hydroxy group or a group having a specified ion moiety, and n1 is an integer of 1 to 20, provided that at least one ORTS is a group having a specified ion moiety.

IPC Classes  ?

  • G03F 7/004 - Photosensitive materials
  • G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
  • C07C 381/12 - Sulfonium compounds
  • C07C 309/06 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
  • C07D 311/78 - Ring systems having three or more relevant rings

91.

CELLULOSE FIBER, FIBER REINFORCED RESIN COMPOSITION, METHOD FOR PRODUCING CELLULOSE FIBER, AND METHOD FOR PRODUCING FIBER REINFORCED RESIN COMPOSITION

      
Application Number 17925055
Status Pending
Filing Date 2021-05-25
First Publication Date 2023-06-15
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Aoyama, Kimihiro
  • Mizusaka, Tetsuhiko

Abstract

Provided are a cellulose fiber containing cellulose II, the cellulose fiber having improved heat resistance, as well as a fiber reinforced resin composition, a method for producing the cellulose fiber, and a method for producing the fiber reinforced resin composition. The cellulose fiber contains the cellulose II having a content of an imidazolium salt of 1% by mass or less.

IPC Classes  ?

  • D01F 2/02 - Monocomponent artificial filaments or the like of cellulose or cellulose derivatives; Manufacture thereof from solutions of cellulose in acids, bases, or salts
  • C08J 5/06 - Reinforcing macromolecular compounds with loose or coherent fibrous material using pretreated fibrous materials
  • C08J 5/24 - Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
  • C08K 5/3445 - Five-membered rings
  • D01D 5/06 - Wet spinning methods

92.

COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER

      
Application Number 17924521
Status Pending
Filing Date 2021-05-12
First Publication Date 2023-06-08
Owner Mitsubishi Gas Chemical Company, Inc. (Japan)
Inventor
  • Omatsu, Tadashi
  • Matsumoto, Masahiro
  • Yuri, Michihiro
  • Kataoka, Kentaro
  • Sato, Takashi
  • Echigo, Masatoshi

Abstract

An iodine-containing (meth)acrylate compound represented by formula (1): An iodine-containing (meth)acrylate compound represented by formula (1): An iodine-containing (meth)acrylate compound represented by formula (1): wherein R1 represents a hydrogen atom, methyl, or halogen; each R2 independently represents a hydrogen atom, a linear organic group having 1 to 20 carbon atoms, a branched organic group having 3 to 20 carbon atoms, or a cyclic organic group having 3 to 20 carbon atoms; A represents an organic group having 1 to 30 carbon atoms; A contains at least one acyl group; n1 represents 0 or 1; and n2 represents an integer of 1 to 20.

IPC Classes  ?

  • C08F 20/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
  • C07C 69/653 - Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
  • C07C 67/24 - Preparation of carboxylic acid esters by reacting carboxylic acids or derivatives thereof with a carbon-to-oxygen ether bond, e.g. acetal, tetrahydrofuran
  • C08F 8/12 - Hydrolysis
  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists

93.

OXYGEN SCAVENGER COMPOSITION

      
Application Number 17910909
Status Pending
Filing Date 2021-03-04
First Publication Date 2023-06-08
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Sato, Daiki
  • Inoue, Atsushi

Abstract

An oxygen scavenger composition comprising a water retention agent, a swelling agent, an ammonium salt, water, and iron.

IPC Classes  ?

  • B01J 20/14 - Diatomaceous earth
  • B01J 20/28 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
  • B01J 20/30 - Processes for preparing, regenerating or reactivating
  • B01J 37/04 - Mixing

94.

CURABLE RESIN COMPOSITION, MOLDED ARTICLE AND METHOD FOR PRODUCING SAME

      
Application Number 17925352
Status Pending
Filing Date 2021-05-20
First Publication Date 2023-06-08
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Ogawa, Noriyoshi
  • Ishikawa, Shun

Abstract

A curable resin composition contains a polycarbonate resin and a styrenic monomer, the polycarbonate resin comprising a terminal structure that has an unsaturated group represented by the following Formula (1): A curable resin composition contains a polycarbonate resin and a styrenic monomer, the polycarbonate resin comprising a terminal structure that has an unsaturated group represented by the following Formula (1): and a constitutional unit represented by the following Formula (2): A curable resin composition contains a polycarbonate resin and a styrenic monomer, the polycarbonate resin comprising a terminal structure that has an unsaturated group represented by the following Formula (1): and a constitutional unit represented by the following Formula (2):

IPC Classes  ?

  • C08F 290/06 - Polymers provided for in subclass
  • C08F 283/02 - Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass on to polycarbonates or saturated polyesters
  • C08F 212/08 - Styrene
  • C08G 64/04 - Aromatic polycarbonates
  • C08G 64/42 - Chemical after-treatment
  • C08G 64/12 - Aromatic polycarbonates not containing aliphatic unsaturation containing atoms other than carbon, hydrogen or oxygen containing nitrogen
  • C08G 64/22 - General preparatory processes using carbonyl halides
  • C08L 69/00 - Compositions of polycarbonates; Compositions of derivatives of polycarbonates

95.

OPTICAL FILM, AND OPTICAL LAMINATE AND EYEWEAR HAVING THE SAME

      
Application Number 17916885
Status Pending
Filing Date 2021-04-02
First Publication Date 2023-05-25
Owner
  • NIPPON KAYAKU KABUSHIKI KAISHA (Japan)
  • MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
  • MGC FILSHEET CO., LTD. (Japan)
Inventor
  • Yahagi, Yoshiyuki
  • Hoshino, Saki
  • Aikawa, Yuki
  • Murai, Katsuyuki
  • Nakamura, Kyousuke
  • Sakajiri, Aya
  • Kaneda, Masashi

Abstract

An object of the present invention is to provide an eyewear such as polarized sunglasses using an optical film including a light reflective layer and a polarizing element layer, the eyewear having a metallic color tone conforming to signal visibility standards of various countries, and an optical film and an optical laminate for the eyewear. The present invention provides an optical film obtained by laminating a light reflective layer and a polarizing element layer, in which the optical film satisfies one or more of conditions (a) to (d).

IPC Classes  ?

96.

CARBON DIOXIDE DETECTOR

      
Application Number 17919389
Status Pending
Filing Date 2021-04-12
First Publication Date 2023-05-25
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Okazaki, Haruka
  • Itou, Yoshiki
  • Oka, Naoki

Abstract

A carbon dioxide detector includes a carrier impregnated with an ink composition containing a pH indicator, an alkaline agent, a water retention agent, and water, and has a water content of 30 to 40 mass %.

IPC Classes  ?

  • G01N 21/78 - Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
  • G01N 33/00 - Investigating or analysing materials by specific methods not covered by groups
  • G01N 31/22 - Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroups; Apparatus specially adapted for such methods using chemical indicators

97.

POLYACETAL RESIN COMPOSITION, EXTRUSION-MOLDED ARTICLE, AND INJECTION-MOLDED ARTICLE

      
Application Number 17801660
Status Pending
Filing Date 2021-03-03
First Publication Date 2023-05-18
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor Sunaga, Daisuke

Abstract

The present invention provides a polyacetal resin composition, which comprises a polyacetal resin, and which further comprises the following (A), (B) and (C), with respect to 100 parts by weight of the polyacetal resin: (A) 0.05 to 5.5 parts by weight of a low-density polyethylene having a melt flow rate of 1.0 to 50 g/10 minutes (190° C., 2.16 kg), (B) 0.05 to 2.0 parts by weight of a fatty acid compound (excluding calcium stearate), and (C) 0.001 to 1.0 part by weight of a layered double hydroxide represented by the following general formula (1): [(M2+)x(M3+)y(OH)2(x+y)](An·)x/u·z(H2O) (1) (wherein, in the general formula (1), M2+ represents a divalent metal ion, M3+ represents a trivalent metal ion, An- represents an n-valent anion, wherein one or more of the anions are contained in the layered double hydroxide, x represents a number in the range of 0 < x ≤ 6.0, n represents 1, 2, or 3. and y and z each represent a number of 0 or greater).

IPC Classes  ?

  • C08L 59/00 - Compositions of polyacetals; Compositions of derivatives of polyacetals
  • C08L 23/06 - Polyethene
  • C08K 5/10 - Esters; Ether-esters
  • C08K 3/26 - Carbonates; Bicarbonates
  • C08K 5/20 - Carboxylic acid amides
  • B29C 45/00 - Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
  • B29C 48/00 - Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor

98.

Laminated resin sheet for molding, and molded article using same

      
Application Number 17793729
Grant Number 11897980
Status In Force
Filing Date 2021-02-03
First Publication Date 2023-05-11
Grant Date 2024-02-13
Owner
  • MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
  • MGC FILSHEET CO., LTD. (Japan)
Inventor
  • Takasaki, Masato
  • Tokita, Atsuhiro

Abstract

Tg2)≤40° C.

IPC Classes  ?

  • C08F 220/14 - Methyl esters
  • B32B 7/027 - Thermal properties
  • B32B 7/02 - Physical, chemical or physicochemical properties
  • B32B 27/08 - Layered products essentially comprising synthetic resin as the main or only constituent of a layer next to another layer of a specific substance of synthetic resin of a different kind
  • B32B 27/30 - Layered products essentially comprising synthetic resin comprising acrylic resin
  • B32B 27/32 - Layered products essentially comprising synthetic resin comprising polyolefins
  • B32B 27/36 - Layered products essentially comprising synthetic resin comprising polyesters
  • C09D 5/00 - Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes

99.

FILM INSERT MOLDED ARTICLE AND MANUFACTURING METHOD FOR FILM INSERT MOLDED ARTICLE

      
Application Number 17912983
Status Pending
Filing Date 2021-03-25
First Publication Date 2023-05-11
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Fukunaga, Yasutaka
  • Kamei, Shota
  • Nakaseko, Hiroshi
  • Suzuki, Katsunori

Abstract

Provided are a film insert molded article, an insert film, and the like that enable realization of complex shapes, that can prevent occurrence of cracks and breaks, and that have an excellent chemical resistance property and abrasion resistance property. This film insert molded article and the like are provided with a shaped curable insert film and a thermoplastic resin layer layered on the insert film, the insert film including a curable hard-coating layer which is uncured.

IPC Classes  ?

  • B29C 45/14 - Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
  • B32B 27/08 - Layered products essentially comprising synthetic resin as the main or only constituent of a layer next to another layer of a specific substance of synthetic resin of a different kind
  • B32B 27/36 - Layered products essentially comprising synthetic resin comprising polyesters

100.

PREPREG, FIBER-REINFORCED COMPOSITE MATERIAL, HIGH-PRESSURE GAS STORAGE TANK, METHOD FOR PRODUCING PREPREG, AND METHOD FOR PRODUCING HIGH-PRESSURE GAS STORAGE TANK

      
Application Number 17913333
Status Pending
Filing Date 2021-03-12
First Publication Date 2023-05-11
Owner MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japan)
Inventor
  • Ikeuchi, Kousuke
  • Matsumoto, Nobuhiko

Abstract

Provided are a prepreg in which reinforcing fibers are impregnated with an epoxy resin composition containing an epoxy resin (A) and an epoxy resin curing agent (B) containing a reaction product (X) of a component (x1) and a component (x2) described below, a fiber-reinforced composite material that is a cured product of the prepreg, a method for producing the prepreg, and a method for producing a high-pressure gas storage tank. Provided are a prepreg in which reinforcing fibers are impregnated with an epoxy resin composition containing an epoxy resin (A) and an epoxy resin curing agent (B) containing a reaction product (X) of a component (x1) and a component (x2) described below, a fiber-reinforced composite material that is a cured product of the prepreg, a method for producing the prepreg, and a method for producing a high-pressure gas storage tank. (x1) At least one selected from the group consisting of meta-xylylenediamine and para-xylylenediamine Provided are a prepreg in which reinforcing fibers are impregnated with an epoxy resin composition containing an epoxy resin (A) and an epoxy resin curing agent (B) containing a reaction product (X) of a component (x1) and a component (x2) described below, a fiber-reinforced composite material that is a cured product of the prepreg, a method for producing the prepreg, and a method for producing a high-pressure gas storage tank. (x1) At least one selected from the group consisting of meta-xylylenediamine and para-xylylenediamine (x2) At least one selected from the group consisting of unsaturated carboxylic acids represented by General Formula (1) below and derivatives thereof. Provided are a prepreg in which reinforcing fibers are impregnated with an epoxy resin composition containing an epoxy resin (A) and an epoxy resin curing agent (B) containing a reaction product (X) of a component (x1) and a component (x2) described below, a fiber-reinforced composite material that is a cured product of the prepreg, a method for producing the prepreg, and a method for producing a high-pressure gas storage tank. (x1) At least one selected from the group consisting of meta-xylylenediamine and para-xylylenediamine (x2) At least one selected from the group consisting of unsaturated carboxylic acids represented by General Formula (1) below and derivatives thereof. Provided are a prepreg in which reinforcing fibers are impregnated with an epoxy resin composition containing an epoxy resin (A) and an epoxy resin curing agent (B) containing a reaction product (X) of a component (x1) and a component (x2) described below, a fiber-reinforced composite material that is a cured product of the prepreg, a method for producing the prepreg, and a method for producing a high-pressure gas storage tank. (x1) At least one selected from the group consisting of meta-xylylenediamine and para-xylylenediamine (x2) At least one selected from the group consisting of unsaturated carboxylic acids represented by General Formula (1) below and derivatives thereof. (In Formula (1), R1 and R2 each independently represent a hydrogen atom, an alkyl group having from 1 to 8 carbons, an aryl group having from 6 to 12 carbons, or an aralkyl group having from 7 to 13 carbons.)

IPC Classes  ?

  • C08J 5/24 - Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
  • C08G 59/18 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
  • C08G 59/44 - Amides
  • F17C 1/16 - Pressure vessels, e.g. gas cylinder, gas tank, replaceable cartridge constructed of plastics materials
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