Provided is a new method for producing an imidic acid, or an imidic acid salt, having a phosphoryl group by a method for producing an imidic acid or an imidic acid salt represented by general formula [1] that has a reaction step that reacts a phosphoryl isocyanate represented by general formula [2] with a compound represented by general formula [3].
The present disclosure provides a lithium-ion secondary battery: in which the surface roughness (Ra) of the surface of a positive electrode active substance layer containing a positive electrode active substance is less than １．０×１０４Å; and which contains a non-aqueous electrolytic solution containing at least one compound selected from the group consisting of compounds represented by general formulae (1)-(10) set forth in the description.
H01M 10/0567 - Liquid materials characterised by the additives
H01M 4/131 - Electrodes based on mixed oxides or hydroxides, or on mixtures of oxides or hydroxides, e.g. LiCoOx
H01M 4/505 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
H01M 4/525 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy
In a dry etching method according to the present disclosure, a film to be etched is formed on a surface of an object to be treated, contains a metal including at least one metal selected from the group consisting of In, Ga, Cu, Co, Fe, Sn, Zn, Al, Ta, and As, an oxide of the metal, or a nitride of the metal, and is etched by bringing a β-diketone into contact with a gas containing a halogen atom in the molecule.
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
The present invention provides: a nonaqueous electrolyte solution which comprises (I) at least one compound that is selected from the group consisting of compounds represented by general formula (1), compounds represented by general formula (2), compounds represented by general formula (3), compounds represented by general formula (4-1), compounds represented by general formula (4-2), compounds represented by general formula (4-3), compounds represented by general formula (5) and compounds represented by general formula (6), the compounds being set forth in the description, (II) a solute and (III) a nonaqueous organic solvent, and which thereby has a low initial resistance value; a nonaqueous electrolyte battery; and a compound which is suitable for use in the nonaqueous electrolyte solution.
C07D 243/04 - Heterocyclic compounds containing seven-membered rings having two nitrogen atoms as the only ring hetero atoms having the nitrogen atoms in positions 1 and 3
C07D 251/08 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
C07D 251/10 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
C07D 251/22 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to two ring carbon atoms
A rechargeable battery is disclosed. The rechargeable battery includes an anode, a cathode including a lithium-ion intercalation host, and an electrolyte including a solvent and a halogen-containing compounding that functions as an active cathode conversion material, wherein the electrolyte is in contact with the anode and the cathode.
This electronic device manufacturing method comprises: a lamination step for providing a resist underlayer film, a resist film, and a top coat film in the stated order on a substrate to obtain a laminate; an exposure step for irradiating the top coat film side of the laminate with actinic rays; and a developing step for removing at least a portion of the resist film by using a developer. In the electronic device manufacturing method, the resist underlayer film contains at least one first sensitizing element selected from the group consisting of metal elements, metalloid elements, and iodine, and the top coat film contains at least one second sensitizing element selected from the group consisting of metal elements, metalloid elements, and iodine.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
7.
RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE WITH MULTILAYER FILM, METHOD FOR MANUFACTURING SUBSTRATE WITH PATTERN, METHOD FOR MANUFACTURING PATTERNED CURED FILM, AND METHOD FOR MANUFACTURING RESIN COMPOSITION
This resin composition comprises: a polymer having a structural unit represented by [(R2dd(R3ee(OR4fg/2g/2] and a structural unit represented by [(R1bc/2owow of 3 or less. When a plurality of R2are present, each independently represents an aryl group or an aralkyl group; when a plurality of R3are present, each independently represents a hydrogen atom, a straight chain or branched aliphatic hydrocarbon group, or an aromatic hydrocarbon group; when a plurality of R4are present, each independently represents a hydrogen atom, or a straight chain or branched aliphatic hydrocarbon group; d represents a number of 1 to 3 inclusive; e represents a number of 0 to 2 inclusive; f represents a number not less than 0 but less than 3; g represents a number more than 0 but not more than 3; and d+e+f+g=4. M represents at least one selected from the group consisting of Fe, Co, Ni, Cu, Zn, Ga, Ge, Мo, Pd, Ag, Sn, Cs, Ba, W and Hf; when a plurality of R1 are present, each independently represents a hydrogen atom, a hydroxy group, a halogen group, an alkoxy group, a straight chain or branched aliphatic hydrocarbon group, or an aromatic hydrocarbon group; b represents a number not less than 0 but less than 6; c represents a number more than 0 but not more than 6; and b+c=3 to 6.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08G 79/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon
The purpose of the present disclosure is to provide a technology which is capable of etching a film that contains at least Si and N in a substrate that comprises a film that contains at least Si and O and the film that contains at least Si and N, while suppressing the etching of the film that contains at least Si and O. The present disclosure provides an etching method for etching a film that contains Si and N by bringing (I) an HF gas and (II) at least one compound that is selected from the group consisting of a sulfonyl compound, a carbonyl compound, a sulfonyl isocyanate compound and an isocyanate compound into contact with a substrate which comprises a film that contains at least Si and O and a film that contains at least Si and N.
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
9.
RESIN COMPOSITION FOR FORMING RESIST UPPER LAYER FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD
Provided is a resin composition for forming a resist upper layer film, the resin composition comprising at least one sensitizing element selected from the group consisting of Ge, Mo, Hf, Zr, Ta, W, Cr, Co, Fe, Pt, Sn, and Sb, wherein the amount of sensitizing elements in nonvolatile components is at least 5 at%. Also provided is a pattern forming method comprising: a step for forming a photoresist film on a substrate; a step for forming a resist upper layer film on the photoresist film by using the resin composition for forming a resist upper layer film; an exposure step for exposing the photoresist film and the resist upper layer film; and a step for removing at least a portion of the photoresist film by using a developer.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
ROROO is the concentration of the sensitizing element or elements in the surface of the topcoat film that is on the opposite side from the resist film.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
This substrate processing method comprises: a preparation step for preparing a substrate in which at least a first surface containing silicon oxide and a second surface containing silicon or a silicon compound other than silicone oxide are exposed; a surface modification step for forming an etching selectivity imparting film on at least part of the first surface and at least part of the second surface by means of a silylation process in which a silylation agent is contacted with the first surface and the second surface; and an etching step for selectively etching the second surface relative to the first surface using an etching agent after the surface modification step.
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
12.
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD
A substrate processing method according to the present invention comprises: a preparation step for preparing a substrate that has, on a surface thereof, a first surface which contains Si and a second surface which has a different chemical composition from the first surface and which contains Si; a surface modification step for, after performing a silylation treatment in which a silylating agent is brought in contact with the first surface and the second surface, performing a water repellency adjustment treatment in which the water repellency of the second surface is selectively decreased, with respect to the first surface; and a processing step for selectively performing processing with respect to the second surface after the surface modification step.
The present disclosure provides: a trifluoromethane sulfonylation agent composition containing a compound represented by general formula (1) or (11) disclosed in the description; and a method for producing a trifluoromethanesulfonyloxy compound or a method for producing a trifluoromethane sulfonyl compound, said methods for causing the trifluoromethane sulfonylation agent composition to react with a specific substrate or a compound represented by general formula (2) disclosed in the description.
C07C 303/28 - Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of esters of sulfonic acids by reaction of hydroxy compounds with sulfonic acids or derivatives thereof
C07C 303/36 - Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids
C07C 311/08 - Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton having the nitrogen atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring
14.
SURFACE TREATMENT COMPOSITION AND METHOD FOR PRODUCING WAFER
The present invention pertains to a surface treatment composition which is supplied as vapor to the surface of a wafer having a concave–convex pattern on the surface and is used to form a water-repellent protective film on the surface, the surface treatment composition containing a silylating agent and a solvent, wherein the silylating agent contains a silicon compound represented by (R133Si-X (R1's are each independently a group selected from the group consisting of a C1-10 hydrocarbon group and a C1-10 hydrocarbon group in which some or all of the hydrogen atoms are substituted with fluorine atoms, and X is an amino group), and the solvent contains at least 75 mass% of a hydrocarbon solvent per 100 mass% of the total amount of the solvent.
333)-. Also provided is a curable compound comprising the maleimide compound or the maleamic acid compound. Also provided is a cured product of the curable compound. Also provided is an electronic device that is provided with the cured product.
C07D 207/452 - Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide with hydrocarbon radicals, substituted by hetero atoms, directly attached to the ring nitrogen atom
C07C 231/02 - Preparation of carboxylic acid amides from carboxylic acids or from esters, anhydrides, or halides thereof by reaction with ammonia or amines
C07C 235/78 - Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups and doubly-bound oxygen atoms bound to the same carbon skeleton with the carbon atoms of the carboxamide groups bound to acyclic carbon atoms of an unsaturated carbon skeleton the carbon skeleton containing rings
EPOXY COMPOUND, EPOXY RESIN, EPOXY RESIN COMPOSITION, CURED PRODUCT, PREPREG, FIBER-REINFORCED COMPOSITE MATERIAL, PRODUCING METHODS THEREFOR, SEALING MATERIAL, SEMICONDUCTOR DEVICE, METHOD FOR SEALING SEMICONDUCTOR ELEMENT, AND METHOD FOR USING SAME AS SEALING MATERIAL
Provided is a glycidyl amine-type fluorine-containing epoxy compound. The present disclosure relates to a fluorine-containing epoxy compound represented by general formula (1). In general formula (1), n each independently represents an integer of 0 to 4, and R1 each independently represents a monovalent substituent and is one selected from the group consisting of a halogen atom, an alkyl group, an alkoxy group, a haloalkoxy group, and an aryl group.
The present invention provides a method for producing phosphorus trifluoride and a method for producing phosphorus pentafluoride, which have high reaction efficiency, low reaction temperature and an excellent energy efficiency. The method for producing phosphorus trifluoride comprises: a step of introducing phosphorus trichloride and hydrogen fluoride into a first reactor; and a step of discharging phosphorus trifluoride from the first reactor, wherein the first reactor contains carbon material. The method for producing dichloro-phosphorus trifluoride comprises a step of introducing the phosphorus trifluoride obtained above and chlorine into a second reactor; and a step of discharging dichloro-phosphorus trifluoride from the second reactor. The method for producing phosphorus pentafluoride comprises: a step of introducing the dichloro-phosphorus trifluoride obtained above and hydrogen fluoride into a third reactor; and a step of discharging phosphorus pentafluoride from the third reactor. The method for producing lithium hexafluorophosphate comprises a step of introducing the phosphorus pentafluoride obtained above and lithium fluoride into a fourth reactor; and a step of discharging lithium hexafluorophosphate from the fourth reactor.
The present disclosure provides a non-aqueous electrolyte containing at least one compound selected from the group consisting of (I) compounds represented by general formula (1) set forth in the specification and compounds represented by general formula (2) set forth in the specification. The present disclosure also provides: a non-aqueous electrolyte battery comprising at least a positive electrode, a negative electrode, and the non-aqueous electrolyte; and a production method for the non-aqueous electrolyte battery using the non-aqueous electrolyte.
A composition for film formation according to the present disclosure is used for the purpose of forming a water repellent film on at least a part of the surface of a substrate by being supplied to the substrate, the surface of which is covered with a protic liquid. This composition for film formation contains a silylating agent which silylates the surface of the substrate, a catalytic compound which promotes the silylation reaction by the silylating agent, and an aprotic solvent; and the content of the catalytic compound is 1.0% by mass or more in 100% by mass of this composition for film formation.
H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting
C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
20.
PLATINUM GROUP ELEMENT RESOURCE RECOVERY DEVICE, FILM FORMATION SYSTEM, PLATINUM GROUP ELEMENT RESOURCE RECOVERY TUBE, AND PLATINUM GROUP ELEMENT RESOURCE RECOVERY METHOD
The present disclosure provides a platinum group element resource recovery device. This is a device for recovering a platinum group element resource and has: a recovery section that receives an input gas containing a platinum group element resource and that recovers the platinum group element resource contained in the input gas; and a treatment section that receives a pass-through gas that has passed through the recovery section. The recovery section has at least a trunk section, a gas inflow port that can feed the input gas to the trunk section, and a packed bed within the trunk section. The packed bed is not in contact with the gas inflow port and contains at least either one of a solid alkali agent and a reaction product of the solid alkali agent and the input gas. The height (L) of the packed bed and the area (S) of a cross section containing an inner diameter of the trunk section satisfy L/√S = 0.11 to 1.13.
C22B 11/02 - Obtaining noble metals by dry processes
B01D 53/64 - Heavy metals or compounds thereof, e.g. mercury
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating
21.
RESIN CURING AGENT, CURABLE RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC DEVICE, LAMINATE SHEET MATERIAL, ELECTRONIC COMPONENT SEALING MATERIAL, ESTER COMPOUND, METHOD FOR PRODUCING ESTER COMPOUND, AND METHOD FOR PRODUCING NOVOLAC RESIN
33)H-, and at least two aromatic ester partial structures, includes, at the end of a molecule, at least one or two partial structures selected from the group consisting of an aryloxycarbonyl structure, an arylcarbonyloxy structure, and a hydroxyaryl structure, and includes a specific partial structure; and a novolak resin including a specific partial structure.
C08G 59/40 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the curing agents used
C07C 67/14 - Preparation of carboxylic acid esters from carboxylic acid halides
Provided is an aralkyl resin having a structural unit represented by general formula (1) or (2). In general formulas (1) and (2), R1represents a monovalent substituent, excluding monovalent substituents in which an atom directly bonding to an aromatic ring is an oxygen atom, and may be identical or different when there are a plurality of R1. In general formula (1) n is an integer of 0-2, when n is 0, p is an integer of ≤4, when n is 1, p is an integer of ≤6, and when n is 2, p is an integer of ≤8. In general formula (2), m and k are each an integer of 0-2, when m+k is 0, p+q is an integer of ≤8, when m+k is 1, p+q is an integer of ≤10, when m+k is 2, p+q is an integer of ≤12, when m+k is 3, p+q is an integer of ≤14, when m+k is 4, p+q is an integer of ≤16, and X is a single bond or a divalent substituent other than an oxygen atom.
A windowpane being mounted to a moving object and comprising an information acquisition region, wherein the windowpane is provided with a glass plate α and a functional film, the glass plate α is provided with a main surface A that is potentially exposed to the indoor side of the moving object and a main surface B on the opposite side of the main surface A, the functional film opposes the main surface A or the main surface B, the functional film is provided with a base material film and a functional layer provided on the base material film, the functional film is provided with a region in which the functional layer is formed and a region in which the functional layer is not formed, and the information acquisition region is located in the region in which the functional layer is not formed.
Provided is a terminal, to which a power line is connected, and which is connected to a substrate, the terminal including: a left-right pair of pedestal parts; two leg parts that rise from an inner side of the pedestal parts; a bridge part that connects the two leg parts; a neck part that extends from the bridge part in a direction orthogonal to an extending direction of the bridge part; and a connecting part that is provided on a tip of the neck part and to which a power line for supplying power is connected. The width of the leg parts and the width of the pedestal parts are the same at least at the boundary between the pedestal parts and the leg parts. The boundary between the neck part and the bridge part is located inward from a region within a distance that is half the width of the pedestal parts from an imaginary line that connects the centers of the two.
H01R 4/18 - Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation effected solely by twisting, wrapping, bending, crimping, or other permanent deformation by crimping
25.
NON-AQUEOUS ELECTROLYTIC SOLUTION, NON-AQUEOUS ELECTROLYTE BATTERY, AND COMPOUND
The present disclosure provides a non-aqueous electrolytic solution including at least one of compounds selected from the group consisting of (I) a compound represented by general formula (1) described in the description, a compound represented by general formula (2) described in the description, and a compound represented by general formula (3) described in the description, and a non-aqueous electrolyte battery comprising at least a positive electrode, a negative electrode, a separator, and the non-aqueous electrolytic solution.
H01M 10/0567 - Liquid materials characterised by the additives
C07C 311/48 - Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom
A single-crystal silicon carbide wafer (31) according to the present invention includes boron in a concentration of at most 1.0×1016atoms/cm3, and has a central region (33) in which the basal plane dislocation density is at most 100/cm2 on the surface thereof. The central region (33) includes the center of the surface of the single-crystal silicon carbide wafer (31). The area of the central region (33) is at least one fourth of the area of the surface of the single-crystal silicon carbide wafer (31).
This silicon carbide single crystal wafer includes boron at a concentration of 1.0 × 1016atoms/cm3 or less and has, on the surface thereof, a region in which the orientation difference within a crystal plane of the silicon carbide single crystal wafer (31) is 50 arcsec or less. The area of said region is at least one-quarter of the area of the silicon carbide single crystal wafer surface.
The present invention provides: a non-aqueous electrolytic solution including (I) a compound represented by general formula (1) described in the description (for example, a compound represented by the following formula (a-1)), (II) a solute, and (III) a non-aqueous organic solvent; a non-aqueous electrolytic solution and a non-aqueous electrolyte battery that are capable of improving a high-temperature cycle characteristic and suppressing the resistance increase of the battery because of the compound represented by general formula (1) and an additive for the non-aqueous electrolytic solution; and a compound and an additive for a non-aqueous electrolytic solution that can be suitably used for the non-aqueous electrolytic solution.
Provided is polyimide having a structural unit represented by general formula (1). In general formula (1), R1is a divalent organic group represented by general formula (2) and R2is a tetravalent organic group including an alicyclic skeleton. In general formula (2), each of the two ns is independently an integer of 0-4, and each R3 is independently a monovalent substituent.
The present disclosure provides a non-aqueous solution that comes into contact with an austenitic stainless steel. The non-aqueous solution contains a non-aqueous solvent or solvents and an imidic acid represented by a specified structure or a salt of the imidic acid, in which the content of a non-aqueous solvent having a relative permittivity of 10 or less (at 25°C) in the non-aqueous solvent or solvents is 50 to 100% by volume.
Provided is an aerosol composition for cleaning which is capable of stably ejecting a cleaning ingredient. Also provided is a noncombustible cleaner for components which is capable of stably ejecting a cleaning ingredient. The aerosol composition for cleaning according to one aspect of the present invention comprises a fluorinated detergent, a first propellant gas, and a second propellant gas, which has a higher molecular weight and a lower partial pressure than the first propellant gas. The cleaner for components according to another aspect of the present invention comprises the aerosol composition for cleaning and a spray can containing the aerosol composition for cleaning.
B65D 83/14 - Containers or packages with special means for dispensing contents for delivery of liquid or semi-liquid contents by internal gaseous pressure, i.e. aerosol containers comprising propellant
C09K 3/30 - Materials not provided for elsewhere for aerosols
Provided are: a solvent composition that contains monochlorotrifluoropropene and a perfluoroolefin having a boiling point of 30-120°C at normal pressure; a cleaning agent that contains the solvent composition; a cleaning method in which the cleaning agent is used; a coating film-forming composition that contains the solvent composition; a method for producing a substrate having a coating film by using the coating film-forming composition; a solvent composition which has no adverse effect on the global environment when an aerosol containing the solvent composition is used, has little effect on resin materials, exhibits sufficient volatility and exhibits excellent solubility of oils and the like; and applications of these.
71471471471471414 are present at quantities effective for forming the azeotropic composition or the pseudoazeotropic composition. Also provided are a cleaning agent, a solvent, an aerosol and a heat transfer medium that contain the azeotropic composition, the pseudoazeotropic composition or the composition.
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
36.
NON-AQUEOUS ELECTROLYTE SOLUTION, NON-AQUEOUS SODIUM-ION BATTERY, NON-AQUEOUS POTASSIUM-ION BATTERY, METHOD FOR MANUFACTURING NON-AQUEOUS SODIUM-ION BATTERY, AND METHOD FOR MANUFACTURING NON-AQUEOUS POTASSIUM-ION BATTERY
22-Cl bond, sulfine compounds having a S(=O)-Cl bond, and silicon compounds having a Si-Cl bond; a non-aqueous sodium-ion battery and a non-aqueous potassium-ion battery using said non-aqueous electrolyte solution; and a method for manufacturing the non-aqueous sodium-ion battery and a method for manufacturing the non-aqueous potassium-ion battery.
Provided are a novel non-aqueous electrolyte capable of suppressing an increase in initial resistance, and a non-aqueous electrolyte secondary battery using the same. The non-aqueous electrolyte contains (I) a compound represented by general formula [1a], (II) a solute, and (III). The non-aqueous electrolyte secondary battery contains the non-aqueous electrolyte. [1a]: M+22-N-C(=O)-R]-(In general formula [1a], X represents a halogen atom, R represents a -CN group or -OCN group, and M+ represents an alkali metal ion.)
The present disclosure provides: an electrolyte for a non-aqueous sodium ion battery, the electrolyte including (I) fluorosulfate, (II) at least one type selected from the group consisting of compounds represented by specific general formulae (1)-(9), vinylene carbonate, tris(trimethylsilyl)borate, and tris(trimethylsilyl)phosphate, (III) sodium, and (IV) a non-aqueous solvent; a non-aqueous sodium ion battery provided with at least a positive electrode, a negative electrode, and the electrolyte for the non-aqueous sodium ion battery; and a method for producing the non-aqueous sodium ion battery.
The present disclosure provides: an electrolyte for a non-aqueous sodium ion battery, the electrolyte including (I) a non-aqueous solvent, (II) sodium, and (III) fluorosulfate, the content of (III) being 0.05-10.00 wt% relative to the total amount of the electrolyte for the non-aqueous sodium ion battery, and the content of a chain carbonate relative to the total amount of (I) being 0-70 wt%; a non-aqueous sodium ion battery provided with at least a positive electrode, a negative electrode, and the electrolyte for the non-aqueous sodium ion battery; and a method for producing the non-aqueous sodium ion battery.
A method for producing a curved glass plate which exhibits little distortion when used as a glass laminate, and a glass laminate for use in a vehicle which exhibits little distortion, are provided by: a method for producing a curved glass plate provided with a step (A) for heating flat glass in a heating furnace, a step (B) for conveying the flat glass heated in step (A) to a press-forming device, and a step (C) for molding a curved glass plate which has a concave surface and a convex surface by bending the flat glass using the press-forming device, wherein the surface of the flat glass on the side thereof which will become the concave surface in step (C) is more forcefully cooled in step (B) than is the surface on the side thereof which will become the convex surface in step (C); and a glass laminate for use in a vehicle which has a sight-through distortion of 1.5 minutes or less in a test region A as stipulated by JISR3212 (2015).
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
43.
COMPOSITION, CLEANING AGENT INCLUDING COMPOSITION, AEROSOL COMPOSITION, DEWATERING AGENT, FOAMING AGENT OR HEAT TRANSFER MEDIUM, SYSTEM USING HEAT TRANSFER MEDIUM, AND METHOD FOR CLEANING ARTICLE
This hydrochlorofluoroolefin-based novel composition contains Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water. In this composition, the proportion of Z-1-chloro-3,3,3-trifluoropropene is 55.00-99.98 mass%, the proportion of 1-chloro-1,3,3,3-tetrafluoropropane is 0.01-44.99 mass%, and the proportion of water is 0.01-10.00 mass%, relative to the total amount of Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water.
The present disclosure provides: a nonaqueous electrolytic solution containing a specific compound represented by general formula (1), a solute, and a nonaqueous organic solvent; a nonaqueous electrolytic solution battery comprising a positive electrode, a negative electrode and the nonaqueous electrolytic solution; and a method for producing a nonaqueous electrolytic solution battery having a step for preparing the nonaqueous electrolytic solution and a step for filling an empty cell provided with at least a positive electrode and a negative electrode, with the nonaqueous electrolytic solution.
The surface treatment composition of the present invention is a surface treatment composition including a silylating agent and a solvent that is supplied as a vapor to the surface of a wafer having an uneven pattern on the surface to form a water-repellent protective film on the surface, wherein the silylating agent includes a trialkylsilylamine, the solvent includes at least one or more selected from the group consisting of glycol ether acetate and glycol acetate, and the total content of glycol ether acetate and glycol acetate is 50 mass% or more in the total of 100 mass% of solvent.
C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting
46.
SURFACE MODIFIER, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND DISPLAY
The purpose of the present disclosure is to provide a novel surface modifier which can improve the surface roughness of a fluorine-containing resin suitable for use as a partition wall material when introduced to a photosensitive resin composition. The present disclosure is a surface modifier containing a fluorine-containing resin (A) having a structure represented by general formula (1). (In general formula (1), Ra's each independently represent a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group, or a fluorine atom, and an arbitrary number of hydrogen atoms in the alkyl group are substituted with fluorine atoms.)
C08F 20/26 - Esters containing oxygen in addition to the carboxy oxygen
C08F 299/00 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
G03F 7/033 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G09F 9/30 - Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
H05B 33/12 - Light sources with substantially two-dimensional radiating surfaces
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H05B 33/14 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material
H05B 33/22 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
The purpose of the present disclosure is to provide a photosensitive resin composition that can improve the surface roughness of a fluorine-containing resin suitable for use as a partition material. The present disclosure provides a photosensitive resin composition comprising: a fluorine-containing resin having a fluorine atom content rate of 20 to 60 mass%; a fluorine-containing surface conditioner containing a fluorine-based compound having a weight average molecular weight (Mw) of 1,000 to 15,000; a base resin; a solvent; and a photopolymerization initiator.
G03F 7/033 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G09F 9/30 - Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
H05B 33/12 - Light sources with substantially two-dimensional radiating surfaces
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H05B 33/14 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material
H05B 33/22 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
48.
SOLDER BONDED STRUCTURE, WINDOWPANE FOR VEHICLES, METHOD FOR PRODUCING SOLDER BONDED STRUCTURE, METHOD FOR PRODUCING GLASS ARTICLE, AND GLASS ARTICLE
A solder bonded structure in which a glass plate and a metal component are bonded to each other, and which is sequentially provided with the glass plate, a conductive layer, a metal layer, a solder layer and the metal component in this order. With respect to this solder bonded structure, the conductive layer contains a metal component and a glass component.
H01Q 1/32 - Adaptation for use in or on road or rail vehicles
H01R 43/02 - Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors for soldered or welded connections
49.
RESIN COMPOSITION, RESIN FILM, BASE MATERIAL, POLYMER, AND POLYMERIZABLE MONOMER
Provided is a resin composition comprising a polymer that has a structural unit derived from a polymerizable monomer represented by general formula (I). In general formula (I): R1is a group including at least one polymerizable group; R2and R3are each independently a hydrogen atom or a straight-chain or branched aliphatic hydrocarbon group; R4is a hydrogen atom or a straight-chain or branched aliphatic hydrocarbon group, where some or all of the hydrogen atoms in the aliphatic hydrocarbon group may be substituted by an acid group or a hydroxy group; R5is a bi-, tri-, or tetravalent straight-chain or branched aliphatic hydrocarbon group, where some or all of the hydrogen atoms in the aliphatic hydrocarbon group may be substituted by a fluorine atom or a hydroxy group; R6and R7each independently represent a fluorine-containing alkyl group; n is an integer of 1-5; when n is 2 or greater, a plurality of R2may be identical or different, and a plurality of R3may be identical or different; m is an integer of 1-3; and when m is 2 or 3, a plurality of R6may be identical or different, and a plurality of R7 may be identical or different.
C08F 16/02 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical by an alcohol radical
C08F 20/12 - Esters of monohydric alcohols or phenols
C08L 29/02 - Homopolymers or copolymers of unsaturated alcohols
C08L 33/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
Provided are: a silicon compound (HFIP group-containing aromatic alkoxysilane) containing an HFIP group and containing a reduced amount of a specific halogenated silane compound; a method for producing the same; a polysiloxane obtained by polymerizing the silicon compound which contains the HFIP group; and a method for producing the same. Provided is a silicon compound containing a silicon compound represented by formula (1) and a halogenated silane compound represented by formula (2), wherein the content of the halogenated silane compound represented by formula (2) is greater than 0 ppm by mass and no greater than 1,000 ppm by mass.
C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
51.
NONAQUEOUS ELECTROLYTE SOLUTION, NONAQUEOUS ELECTROLYTE BATTERY, AND COMPOUND
The present invention provides a nonaqueous electrolyte solution comprising: (I) at least one compound selected from the group consisting of compounds represented by general formula (1) in the description (for example, compounds represented by formula (1a)) and compounds represented by general formula (2) (for example, compounds represented by formula (2a)); (II) a solute; and (III) a nonaqueous organic solvent. Thus, provided are a nonaqueous electrolyte solution that has a low initial resistance value, a nonaqueous electrolyte battery, and a compound that can be suitably used in the nonaqueous electrolyte solution.
H01M 10/0567 - Liquid materials characterised by the additives
C07D 207/27 - 2-Pyrrolidones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms with substituted hydrocarbon radicals directly attached to the ring nitrogen atom
C07D 233/38 - One oxygen atom with acyl radicals or hetero atoms directly attached to ring nitrogen atoms
Provided is a liquid-repelling agent capable of producing a dividing wall in which a decrease in liquid repellency is unlikely to occur even if an oxygen plasma treatment or UV ozone treatment is carried out. This liquid-repelling agent (A) is characterized by containing a polymer having: a polymerization unit (a1) comprising a hydrocarbon having an alkyl group in which at least one hydrogen atom is substituted by a fluorine atom and which may include an etheric oxygen; and one or more polymerization units (a2) other than the polymerization unit (a1). The liquid-repelling agent is also characterized in that the number of ethylenically unsaturated double bonds contained in the polymerization unit (a1) and the polymerization unit (a2) is 3 or more.
C08F 220/26 - Esters containing oxygen in addition to the carboxy oxygen
C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H05B 33/22 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
An antenna device of the present disclosure is provided with a core-side feeder portion and a planar element. The planar element has a first side and a second side meeting the first side. The first side and the second side form a corner A with an angle of 70 degrees to 110 degrees. The vertex of the corner A and the core-side feeder portion are electrically connected. The length of the first side is 1.8 times to 2.2 times, or 0.45 times to 0.56 times, the length of the second side. With the antenna device, it is possible to obtain a high gain in a wide frequency band.
A selective film deposition method characterized in that a substrate, having a structure in which both a first surface region including a metal element and a second surface region including a non-metal inorganic material are exposed, is exposed to a solution containing an organic matter represented by general formula (1) and a solvent, to deposit a film of the organic matter in the first surface region selectively rather than in the second surface region. (1): R1mm (in general formula (1): R133(R2233(R2222R2, -SR2, or -SSR1; R2 is each a hydrogen atom or an alkyl group with 1 to 6 carbon atoms; and m is a positive integer where, when the hydrocarbon group includes r carbon atoms, m/r is 0.01 to 0.25)
By means of a nonaqueous electrolyte that contains a compound represented in general formula (1), a solute, and a nonaqueous organic solvent, a nonaqueous electrolyte battery, and the compound represented in general formula (1), the present invention provides a nonaqueous electrolyte which has low initial resistance value, a nonaqueous electrolyte battery, and a compound which can be favorably used in the aforementioned nonaqueous electrolyte. [In general formula (1), the R1f22fff's independently represent a fluorine atom or a C1-4 linear or C3-4 branched alkyl group, and the carbon-carbon bond in the alkyl group optionally contains an oxygen atom. Further, an arbitrary hydrogen atom in the alkyl group is optionally substituted with a fluorine atom. The Rf's independently represent a hydrogen atom, a lithium ion, a sodium ion, a potassium ion, or a C1-12 linear or C3-12 branched alkyl group, and the carbon-carbon bond in the alkyl group optionally contains an oxygen atom. Further, an arbitrary hydrogen atom in the alkyl group is optionally substituted with a fluorine atom. Also, the aforementioned alkyl group optionally contains an unsaturated bond. In the case that R2represents a lithium ion, a sodium ion or a potassium ion, the bond between the nitrogen atom and R2 in the general formula (1) represents an ionic bond. n is an integer 0-3.]
H01M 10/0567 - Liquid materials characterised by the additives
C07C 307/00 - Amides of sulfuric acids, i.e. compounds having singly-bound oxygen atoms of sulfate groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
The present invention provides a nonaqueous liquid electrolyte and a nonaqueous liquid electrolyte battery that have a low initial resistance value by means of a nonaqueous liquid electrolyte containing a nonaqueous organic solvent, a solute, and at least one compound selected from the group consisting of compounds represented by general formula (1) and compounds represented by general formulas (2)-(4) and (6) disclosed in the specification.
By adopting a non-aqueous electrolyte containing a compound expressed by general formula (1), a solute, and a non-aqueous organic solvent, and adopting a non-aqueous electrolyte battery and the compound expressed by general formula (1), the present invention provides a non-aqueous electrolyte having a low initial resistance value, a non-aqueous electrolyte battery, and a compound that can be used preferably in said non-aqueous electrolyte. [In general formula (1), R1f22fff independently represent a fluorine atom, a straight chain alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 to 4 carbon atoms, and an oxygen atom may be included between the carbon atom - carbon atom bonds of the alkyl group. Further, any hydrogen atom of the alkyl group may be substituted with a fluorine atom. R2 is an alkylene group having 2 to 4 carbon atoms, an oxygen atom may be included between the carbon atom - carbon atom bonds of the alkylene group, and the alkylene group may have an alkyl group as a side chain. Further, any hydrogen atom of the alkylene group and the alkyl group may be substituted with a fluorine atom.]
By adopting a non-aqueous electrolyte containing (I) a compound expressed by general formula (1), at least one compound selected from the group comprising the compounds expressed by general formulas (2), (3), and (5), (III) a solute, and (IV) a non-aqueous organic solvent, the present invention provides a non-aqueous electrolyte and a non-aqueous electrolyte battery capable of exhibiting a cycle characteristic improvement effect and an initial resistance value reduction effect in a well-balanced manner. (5): Si(R11yy(R124-y4-y
A wet etching solution according to the present disclosure is used, with respect to a semiconductor substrate which includes both a first metal layer that comprises a tungsten-based material and a second metal layer that comprises cobalt and/or a bronze-based material and in which an oxide layer is formed at least on the surface layer of the cobalt and/or the bronze-based material, for selectively removing the second metal layer while suppressing etching of the first metal layer. The etching solution comprises a solution obtained by dissolving into an organic solution a β-diketone in which a trifluoromethyl group and a carbonyl group are bonded.
Provided are a method for geometric isomerization of a specific geometric isomer (isomer 1) represented by formula (1) to produce a specific corresponding geometric isomer (isomer 2) represented by formula (1), the method including a step for bringing the specific geometric isomer (isomer 1) represented by formula (1) into contact with a compound (A), which is at least one of dichlorotrifluoropropane and hydrogen chloride, in the gas phase, and a composition.
C07C 17/358 - Preparation of halogenated hydrocarbons by reactions not affecting the number of carbon or halogen atoms in the molecules by isomerisation
A head-up display device (1) is installed in a mobile body and causes a viewer (35) to view a virtual image based on a reflected image of projection light at a projection unit (31). The projection unit (31) comprises laminated glass (10) provided with: a second glass plate (12) that is arranged on an interior side of the mobile body and is provided with a fourth principal surface (124) exposed to the interior side and a third principal surface (123) on the opposite side of the fourth principal surface; a first glass plate (11) that is arranged on an exterior side of the mobile body and is provided with a first principal surface (111) exposed to the exterior side and a second principal surface (112) on the opposite side of the first principal surface; and an intermediate film (20) for adhering the second principal surface (112) and the third principal surface (123) together. At least one wiper (41, 42) for wiping over the first principal surface in a wiping region is arranged on the first principal surface side (111) of the first glass plate (11). Reflected image formation regions (51, 52, 53), where the reflected image is formed on the first principal surface (111), are located inside the wiping region (71, 72) of the at least one wiper (41, 42), and do not include margins (81, 82) of the wiping regions of any wipers.
B60J 1/02 - Windows; Windscreens; Accessories therefor arranged at the vehicle front
B60K 35/00 - Arrangement or adaptations of instruments
B60R 11/02 - Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof
62.
RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE HAVING MULTILAYER FILM, METHOD FOR MANUFACTURING PATTERNED SUBSTRATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERN CURED FILM, METHOD FOR MANUFACTURING POLYMER, AND METHOD FOR MANUFACTURING RESIN COMPOSITION
The present invention addresses the problem of providing a resin composition that is a homogeneous liquid containing a polymer obtained by hydrolysis and polycondensation without precipitation during a sol-gel reaction, even with the introduction of a metal species having high EUV absorbance. The resin composition contains a polymer comprising (A) a constituent unit represented by general formula (1) and (B) a constituent unit represented by general formula (1-A). General Formula 1: [(R2dd(R3ee(OR4fg/2g/2] General Formula (1-A):[(R1bc/2c/2] In general formula (1), R2 is a group represented by general formula (1a).
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08G 79/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon
63.
COATING FLUID FOR OPTICAL MEMBER, POLYMER, CURED FILM, PHOTOSENSITIVE COATING FLUID, PATTERNED CURED FILM, OPTICAL MEMBER, SOLID IMAGING ELEMENT, DISPLAY DEVICE, POLYSILOXANE COMPOUND, STABILIZER FOR USE IN COATING FLUID, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM, AND METHOD FOR PRODUCING POLYMER
The present invention addresses the problem of providing a coating fluid for optical members which contains fine metal particles or a metal compound stably dispersed therein, a photosensitive coating fluid, a polymer usable in the coating fluid for optical members, a cured film formed from the coating fluid for optical members, a photosensitive coating fluid, a patterned cured film, an optical member, a solid imaging element, a display device, a polysiloxane compound, and a stabilizer for use in the coating fluid. The present invention further addresses the problem of providing a method for producing the stabilizer for use in the coating fluid or providing a method for producing a cured film, patterned cured film, or polymer each having excellent optical properties. The coating fluid for optical members comprises a component (A) comprising fine metal particles (A-1) and/or a metal compound (A-2) including a constituent unit represented by general formula (1-A), a stabilizer (B) comprising a polysiloxane compound including a constituent unit represented by general formula (1), and a solvent (C). Formula (1-A): [(R1bc/2c/2] Formula (1): [(R2dd(R3ee(OR4fg/2g/2]
The present invention provides a method for producing a fluorine-containing polymer, said method being suppressed in variation in the weight average molecular weight among production lots. A method for producing a fluorine-containing polymer according to the present invention produces a fluorine-containing polymer that comprises a repeating unit represented by formula (1) and a repeating unit represented by formula (2), and is characterized by comprising: a fluorine-containing monomer synthesis step wherein a composition, which contains a fluorine-containing monomer that is a main reaction product and is represented by formula (4) and a fluorine-containing monomer that is a side reaction product and is represented by formula (5), is obtained by reacting a diol represented by formula (3) with at least one substance that is selected from the group consisting of unsaturated carboxylic acids, esters of the unsaturated carboxylic acids, acid halides of the unsaturated carboxylic acids and anhydrides of the unsaturated carboxylic acids; a fluorine-containing monomer purification step wherein the fluorine-containing monomer represented by formula (5) is removed from the composition so that the content of the fluorine-containing monomer represented by formula (5) is 1,500 ppm or less in terms of parts per million by mass based on the fluorine-containing monomer represented by formula (4); and a polymerization step wherein a polymerization reaction is carried out using the composition after the fluorine-containing monomer purification step, thereby obtaining a fluorine-containing polymer that comprises the repeating unit represented by formula (1) and the repeating unit represented by formula (2). Chemical formula 1 (In formula (1), formula (2), formula (3), formula (4) and formula (5), each of R1and R2independently represents a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, an n-butyl group, an iso-butyl group, a sec-butyl group or a t-butyl group; each of R3and R4independently represents a hydrogen atom, a methyl group or an ethyl group; R5represents a hydrogen atom or a trifluoromethyl group; and R6 represents a hydrogen atom, a chlorine atom, a methyl group or a trifluoromethyl group.)
Provided is a fluorine-containing polymer used for a film-forming solution with which it is possible to form a film that is less likely to produce a residue when immersed in a developer solution. This fluorine-containing polymer includes repeating units represented by formula (1) and repeating units represented by formula (2), the fluorine-containing polymer being characterized in that the contained amount of the repeating units represented by formula (2) is 1500 ppm or below by parts per million by mass based on the repeating units represented by formula (1). [Chemical 1] (In formulas (1) and (2): R1and R2independently represent a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, an n-butyl group, an iso-butyl group, a sec-butyl group, or a t-butyl group; R3and R4independently represent a hydrogen atom, a methyl group, or an ethyl group; R5is a hydrogen atom or a trifluoromethyl group; and R6 is a hydrogen atom, a chlorine atom, a methyl group, or a trifluoromethyl group).
The present invention pertains to a silicon-containing monomer represented by formula (1). Furthermore, a mixture according to the present invention includes: (I) at least one silicon-containing monomer represented by formula (1); and (II) at least one monomer selected from the group consisting of silicon-containing monomers represented by formula (2-1) and silicon-containing monomers represented by formula (2-2).
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
67.
FLUOROELASTOMER COMPOSITION, FLUORORUBBER MOLDED BODY, CROSSLINKING AGENT FOR MANUFACTURING FLUORORUBBER MOLDED BODY, CROSSLINKING PROMOTER FOR MANUFACTURING FLUORORUBBER MOLDED BODY, SALT MIXTURE, AND ONIUM SALT
C07C 22/08 - Cyclic compounds containing halogen atoms bound to an acyclic carbon atom having unsaturation in the rings containing six-membered aromatic rings containing fluorine
C08G 65/38 - Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
C07C 37/00 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
C08L 27/12 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
The present invention provides a fluorine-containing resin which is capable of forming a bank (a partition wall) that is not susceptible to a decrease in the liquid repellency even if subjected to an UV ozone treatment or an oxygen plasma treatment. A fluorine-containing resin according to the present invention is characterized by comprising a repeating unit (U) which contains, as a monomer unit, a monomer (A) that has a triple bond in a side chain.
The present disclosure provides a wet etching method wherein a metal-containing film on a substrate is pretreated with a surface modification liquid, and subsequently etched with use of an etching liquid. With respect to this wet etching method, the etching liquid is a solution that contains an organic solvent and a β-diketone wherein a trifluoromethyl group and a carbonyl group are bonded to each other; the metal-containing film contains a metal element which is capable of forming a complex together with the β-diketone; the surface modification liquid contains an oxidizing substance which is oxidizing with respect to the metal element. This wet etching method comprises: a first step wherein an oxide film of the metal element is formed on the surface of the metal-containing film by bringing the surface modification liquid into contact with the metal-containing film; and a second step wherein the etching liquid is brought into contact with the metal-containing film, on which the oxide film has been formed.
H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks
70.
SILICON-CONTAINING MONOMER MIXTURE, POLYSILOXANE, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PRODUCTION METHOD FOR CURED FILM, PATTERNED CURED FILM, AND PRODUCTION METHOD FOR PATTERNED CURED FILM
The present invention provides a polysiloxane having a fast polymerization reaction speed and favorable storage stability properties. The present invention also provides a mixture, a resin composition, a photosensitive resin composition, a cured film, and a patterned cured film which include said polysiloxane. The present invention also provides production methods for the mixture, the resin composition, the photosensitive resin composition, the cured film, and the patterned cured film which include said polysiloxane. Provided is a mixture that includes a first silicon-containing monomer represented by general formula (X) and a second silicon-containing monomer represented by general formula (Y). The relationship B/(A+B)>0.04 is satisfied, where A is defined as the first silicon-containing monomer content and B is defined as the second silicon-containing monomer content.
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
71.
METHOD FOR PRODUCING A LAMINATED GLAZING HAVING A FUNCTIONAL LAYER
A method for producing a laminated glazing includes the step of preparing a precursor film having a functional layer on an adhesive layer with a carrier film layer for holding the functional layer, adhering the precursor film by contacting the adhesive layer to an interior side of a second glass sheet or smooth side of a precursor interlayer, arranging the precursor film on or in the precursor interlayer between the first and second glass sheets after removing the carrier film layer from the precursor film, and laminating the first and second glass sheets, sandwiching the interlayer, while removing air existing around the functional layer.
B32B 17/10 - Layered products essentially comprising sheet glass, or fibres of glass, slag or the like comprising glass as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
2mm [1] [R is a univalent to tetravalent group containing at least one carbon atom. This group may contain at least one substance selected from the group consisting of a hydrogen atom, a halogen atom, an unsaturated bond, an aromatic ring, an oxygen atom, and an ester bond. X is a halogen atom, or a straight-chain or branched perfluoroalkyl group having a carbon number of 1 to 10. m is an integer between 1 and 4. When m is an integer between 2 and 4, the plurality of Xs present may be the same or may differ from each other.
H01M 10/0567 - Liquid materials characterised by the additives
H01M 4/525 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy
H01M 10/0568 - Liquid materials characterised by the solutes
73.
COMPOSITION; AEROSOL COMPOSITION, CLEANING AGENT, SOLVENT, SILICONE SOLVENT, FOAMING AGENT, HEAT TRANSFER MEDIUM, FIRE EXTINGUISHING AGENT, AND FUMIGANT CONTAINING SAID COMPOSITION; HEAT TRANSFER DEVICE CONTAINING SAID HEAT TRANSFER MEDIUM; AND SYSTEM CONTAINING SAID HEAT TRANSFER DEVICE
One problem addressed by the present invention is to provide a hydrofluoroolefin-based or a hydrochlorofluoroolefin-based azeotropic or azeotrope-like composition. This azeotropic or azeotrope-like composition contains trans-1-chloro-3,3,3-trifluoropropene and 1-chloro-1,3,3,3-tetrafluoropropene. In the azeotropic or azeotrope-like composition, 1-chloro-1,3,3,3-tetrafluoropropene is present in an amount effective for forming an azeotropic mixture or an azeotrope-like mixture with trans-1-chloro-3,3,3-trifluoropropene.
A purpose of the present disclosure is to provide a novel method for lowering the concentration of dimethylamine, diethylamine, ethylpropylamine, and ethylisopropylamine in crude trialkylamine. The present disclosure is a method for purifying trialkylamine characterized by bringing crude trialkylamine including at least one selected from the group consisting of dimethylamine, diethylamine, ethylpropylamine, and ethylisopropylamine into contact with a zeolite and lowering the concentration of at least one selected from the group consisting of dimethylamine, diethylamine, ethylpropylamine, and ethylisopropylamine in the crude trialkylamine from that before the zeolite contact.
This photosensitive resin composition contains a photosensitizer and a polyamide having a structural unit represented by general formula [1]. In general formula [1], R1is a tetravalent organic group represented by general formula [2], and R2is a divalent organic group. In general formula [2], the two numbers denoted by n are each independently an integer between 0 and 3, and R3is a monovalent substituent group. In a case where multiple R3groups are present, these groups may be the same as, or different from, each other. Of the two OH groups bonded to R1, one bonds to ＊1 or ＊2 and one bonds to ＊3 or ＊4.
C08G 69/26 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
FLUORINATED DIAMINE OR SALT THEREOF, METHOD FOR PRODUCING FLUORINATED DIAMINE OR SALT THEREOF, POLYAMIDE, METHOD FOR PRODUCING POLYAMIDE, POLYAMIDE SOLUTION, CYCLIZED POLYAMIDE, METHOD FOR PRODUCING CYCLIZED POLYAMIDE, INSULATING MATERIAL FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, METHOD FOR PRODUCING INSULATING MATERIAL FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY APPLIANCE, AND INSULATING MATERIAL FOR PRODUCING HIGH-FREQUENCY ELECTRONIC COMPONENT
A fluorinated diamine represented by general formula [1A] or a salt thereof; a polyamide including a structural unit derived from the diamine or salt; and a cyclized polyamide. In general formula [1A], R1 represents, or the multiple moieties thereof, when present, each independently represent, any group or atom selected from the group consisting of alkyl groups, alkoxy groups, halogen atoms, haloalkyl groups, and haloalkoxy groups, and two n's are each independently an integer of 0-3.
C07C 215/68 - Compounds containing amino and hydroxy groups bound to the same carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings and hydroxy groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings of the same carbon skeleton
C07C 213/00 - Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton
C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
H01B 3/30 - Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances waxes
77.
POLYAMIDE, POLYAMIDE-IMIDE, DERIVATIVES OF THESE, OPTICAL FILM, DISPLAY DEVICE, AND PRODUCTION METHODS THEREFOR
A polyamide having a structural unit represented by general formula [1]. In general formula [1], R1is a divalent organic group represented by general formula [2] and R2122 are each independently an integer of 0-4, and R3 represents a monovalent substituent and. when there are multiple moieties thereof, the moieties each independently represent a monovalent substituent.
C08G 69/32 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
Provided is a lithium iodide nonaqueous solution containing a nonaqueous solvent and lithium iodide. This lithium iodide nonaqueous solution is characterized in that the water content per lithium iodide unit (Y/X), determined by the water content Y (ppm) in the lithium iodide nonaqueous solution relative to the lithium iodide concentration X (wt.%) in the lithium iodide nonaqueous solution, is 7 or less, and the content of an acid-derived component is 4,000 ppm or less.
POLYBENZOXAZOLE, POLYAMIDE, POLYAMIDE SOLUTION, INSULATION FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY EQUIPMENT, INSULATION MATERIAL FOR PRODUCING HIGH-FREQUENCY ELECTRONIC COMPONENT, METHOD FOR PRODUCING POLYAMIDE, METHOD FOR PRODUCING POLYBENZOXAZOLE, METHOD FOR PRODUCING INSULATION FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, AND DIAMINE OR SALT THEREOF
Polybenzoxazole having a structural unit represented by general formula [1]. In general formula [1], R1is a tetravalent organic group represented by general formula [2], and R2is a divalent organic group. In general formula [2]: the two n are each independently an integer of 0-3; R3, when more than one is present, each independently represent a monovalent substituent; *1, *2, *3, and *4 each independently represent a bonding partner; one of *1 and *2 bonds with an oxygen atom in general formula [1], and the other bonds with a nitrogen atom in general formula [1]; and one of *3 and *4 bonds with an oxygen atom in general formula [1], and the other bonds with a nitrogen atom in general formula [1].
C07C 215/80 - Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton of the same non-condensed six-membered aromatic ring containing at least two amino groups bound to the carbon skeleton
H01B 3/30 - Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances waxes
The alkylamine composition of the present disclosure is characterized by containing 99.5 vol% or more of alkylamines represented by general formula (1) and having a water content of 10-100 mass ppm (inclusive). (In general formula (1), N is a nitrogen atom. R1is a C1-10 hydrocarbon group optionally having a ring, a heteroatom, or a halogen atom. R2and R3each independently are a hydrogen atom or a C1-10 hydrocarbon group optionally having a ring, a heteroatom, or a halogen atom. However, in cases where the hydrocarbon group has 3 or more carbon atoms, the hydrocarbon group may have a branched chain structure or a cyclic structure. The heteroatom in the hydrocarbon group is a nitrogen atom, an oxygen atom, a sulfur atom, or a phosphorus atom. Furthermore, in cases where R1and R2are both hydrocarbon groups having one or more carbon atoms, R1and R2may bond directly to each other to form a cyclic structure. Furthermore, in cases where R1or R2forms a cyclic structure through direct bonding by a double bond, an aromatic ring may be formed without R3being present. In addition, R1, R2, and R3may be the same hydrocarbon group or different hydrocarbon groups. In addition, R1 has one or more hydrogen atoms on the carbon at the α position bonded with nitrogen atoms.)
Provided is a method for producing light-emitting elements, said method being capable of producing a light-emitting element provided with a first light-emitting layer and a bank formed on the first light-emitting layer without damaging the first light-emitting layer. The method for producing light-emitting elements according to the present invention comprises: a base element preparation step for preparing a base element in which a monochrome first light-emitting layer is disposed on a substrate; a patterned fluororesin film-formation step for forming a patterned fluororesin film by disposing a photosensitive resin composition that contains at least a photopolymerization initiator, a solvent, and a fluororesin that has a crosslinking site and contains a repeat unit comprising fluorine atom-containing hydrocarbon on the base element so as to partition at least a portion of the region of the base element; and a baking step for curing the patterned fluororesin film by baking at a temperature not greater than 200°C.
A surface treatment method for a semiconductor substrate according to the present invention is a treatment method for treating a main surface of a semiconductor substrate that has, on the main surface of the substrate, a pattern-formed region in which a pattern having a protrusion-and-recess structure having a pattern dimension of at most 30 nm is formed, and a pattern non-formed region in which no pattern is formed. The surface treatment method includes a surface treatment step for bringing a silylating agent-containing surface treatment agent composition into contact with the pattern-formed region and the pattern non-formed region on the main surface of the semiconductor substrate, wherein, on the surface of the pattern non-formed region after the surface treatment step, the IPA contact angle with respect to 2-propanol is at least 2° at a room temperature of 25 °C, and/or the water contact angle with respect to pure water is at least 50° at a room temperature of 25 °C.
This surface treatment method for semiconductor substrates treats a main surface of a semiconductor substrate which has, on the main surface, a pattern formation region where a pattern having a relief structure with a pattern size of 30 nm or less is formed, and a bevel region that is formed on the periphery of the pattern formation region; and this surface treatment method for semiconductor substrates comprises a surface treatment step wherein a surface treatment agent composition that contains a silylating agent is brought into contact with the pattern formation region and the bevel region on the main surface of the semiconductor substrate. With respect to the surface of the silicon oxide substrate, which has been surface treated by being brought into contact with the surface treatment agent composition, the IPA receding angle is 3° or more at the room temperature of 25°C and/or the water receding angle is 40° or more at the room temperature of 25°C.
The present invention provides a method for stably supplying trimethyl amine at a constant composition, said trimethyl amine containing monomethyl amine or dimethyl amine as trace impurities. The present invention is a method for supplying a composition, said method being characterized in that a storage container, in which a composition that contains trimethyl amine, dimethyl ethyl amine, and dimethyl amine and/or monomethyl amine in a gas phase is sealed, is maintained at a constant temperature of 10° or higher and a gas of the composition is supplied to a predetermined device.
C07C 211/08 - Monoamines containing alkyl groups having a different number of carbon atoms
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
85.
ELECTROLYTE COMPOSITIONS FOR RECHARGEABLE METAL HALIDE BATTERY
A rechargeable metal halide battery with an optimized electrolyte formulation shows high capacity at fast charging rates. The optimized electrolyte includes a metal halide, an oxidizing gas, and a mixed-solvent solution that includes a glyme-based compound that is in a volume fraction of between 20-70 volume % of the mixed-solvent solution. The mixed-solvent solution may further include a nitrile compound and/or a heterocyclic compound.
A rechargeable metal halide battery with an optimized active cathode electrolyte solution has high energy density and does not require charging following fabrication. The optimized active cathode electrolyte solution includes (i) a mixture of a metal halide and its corresponding halogen dissolved in an organic solvent at a concentration ratio greater than 0.5 and (ii) an oxidizing gas. The organic solvent is a nitrile-based compound and/or a heterocyclic compound. Glyme may be added to the organic solvent to improve battery performance.
C08F 299/02 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
C08G 8/04 - Condensation polymers of aldehydes or ketones with phenols only of aldehydes
This vehicle window glass is characterized in comprising a first glass plate having an S1 surface facing the outside of the vehicle and an S2 surface on the reverse side to the S1 surface, a second glass plate having an S4 surface facing the interior of the vehicle and an S3 surface on the reverse side to the S4 surface, and an interlayer positioned between the first glass plate and the second glass plate, said interlayer being constituted from at least one layer and facing the S2 and S3 surfaces, the mass of the vehicle window glass per 1 m2 being from 5 to 9 kg, the Young's modulus of all layers constituting the interlayer being from 2.5 to 200 MPa at 23°C, and the first glass plate and/or the second glass plate being a chemically strengthened glass.
C03C 3/078 - Glass compositions containing silica with 40% to 90% silica by weight containing an oxide of a divalent metal, e.g. an oxide of zinc
C03C 3/083 - Glass compositions containing silica with 40% to 90% silica by weight containing aluminium oxide or an iron compound
C03C 3/085 - Glass compositions containing silica with 40% to 90% silica by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
C03C 3/087 - Glass compositions containing silica with 40% to 90% silica by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
C03C 3/091 - Glass compositions containing silica with 40% to 90% silica by weight containing boron containing aluminium
C03C 21/00 - Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals into the surface
89.
SUBLIMABLE FILM FORMATION COMPOSITION AND METHOD FOR PRODUCING SUBSTRATE
This sublimable film formation composition includes a sublimable substance and a solvent in which the saturation solubility of the sublimable substance is greater than 10 mass%.
A method for producing a (hydro)halocarbon according to one embodiment of the present invention comprises a step wherein an azeotropic or azeotrope-like composition which contains a (hydro)halocarbon and a compound that is different from the (hydro)halocarbon is subjected to distillation under reduced pressure, thereby purifying the (hydro)halocarbon. A method for producing a (hydro)halocarbon according to another embodiment of the present invention comprises a step wherein an azeotropic or azeotrope-like composition which contains a (hydro)halocarbon and a compound that is different from the (hydro)halocarbon is subjected to distillation under reduced pressure, thereby purifying the (hydro)halocarbon; and both of the normal boiling points of the (hydro)halocarbon and the compound are 80°C or less.
Provided is a composition including: a polysiloxane compound (A) which includes the structural unit represented by formula (1) and the structural unit represented by formula (2), and in which the ratio of siloxane structural units in all Si structural units, represented by Q units/(Q units + T units), is at least 0.60 and less than 1.00; and a solvent (B). Formula (1): [(R1bb(R2mm(OR3ln/2n/2] In the formula, R1is a group represented by the formula shown here. Formula (2): [(R4pq/2q/2]
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Infrared-reflective glass according to the present disclosure comprises a glass sheet and an infrared-reflective coating provided on the glass sheet. The infrared-reflective coating is constituted by a multi-layer film having at least one unit comprising a first dielectric layer and a metal layer directly above the first dielectric layer, where the glass-sheet-facing side of the multi-layer film is defined as down and the opposite side is defined as up. The multi-layer film has a second dielectric layer as an uppermost layer, and a third dielectric layer directly below the second dielectric layer. The second dielectric layer is formed from any one substance from the group consisting of titanium oxide, zinc tin oxide, aluminum zinc oxide, and aluminum silicon oxide. The third dielectric layer is formed from any one substance from the group consisting of aluminum silicon nitride, silicon aluminum oxynitride, and aluminum silicon oxide. The thickness of the third dielectric layer is greater than 10 nm.
C03C 17/36 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
The present invention provides a novel photosensitive resin composition, specifically a negative photosensitive resin composition which is based on a polysiloxane. This negative photosensitive resin composition contains (A) a polysiloxane compound which contains a first constituent unit represented by general formula (1), (B) a photo-inducible curing accelerator and (C) a solvent. (1): ((RxbbRlmn/2n/2) (In general formula (1), Rxrepresents a monovalent group represented by general formula (1a); Rlrepresents a substituent that is selected from the group consisting of a hydrogen atom, an alkyl group having from 1 to 3 carbon atoms, a phenyl group, a hydroxy group, an alkoxy group having from 1 to 3 carbon atoms, and a fluoroalkyl group having from 1 to 3 carbon atoms; b represents a number from 1 to 3; m represents a number that is not less than 0 but less than 3; n represents a number that is more than 0 but not more than 3; (b + m + n) = 4; and in cases where there are a plurality of Rxmoieties and a plurality of Rl moieties, each of those moieties independently represents one of the constituents. In general formula (1a), X represents a hydrogen atom; a represents a number from 1 to 5; and the broken line represents a bonding hand.)
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
The present invention is a method for dry etching a silicon oxide by reacting a silicon oxide with hydrogen fluoride gas and a gaseous organic amine compound, a gaseous hydrofluoride of an organic amine compound, or hydrogen fluoride gas, a gaseous organic amine compound, and a gaseous hydrofluoride of an organic amine compound, and is characterized in that the organic amine compound is an organic amine mixture containing at least two types of compound represented by general formula (1). Formula (1): R1-N=R2R3(In general formula (1), N is a nitrogen atom. R1is a hydrocarbon group which has 1-10 carbon atoms and which may include a ring, a heteroatom or a halogen atom. R2and R3are each a hydrogen atom or a hydrocarbon group which has 1-10 carbon atoms and which may include a ring, a heteroatom or a halogen atom. However, in cases where a hydrocarbon group has 3 or more carbon atoms, the hydrocarbon group may have a branched chain structure or a cyclic structure. A heteroatom in a hydrocarbon group is a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom. Furthermore, in cases where R1and R2are both hydrocarbon groups having one or more carbon atoms, R1and R2may bond directly to each other to form a cyclic structure. Furthermore, in cases where R1or R2forms a cyclic structure through direct bonding with a double bond, an aromatic ring may be formed without R3being present. In addition, R1, R2and R3 may be the same hydrocarbon group or different hydrocarbon groups.)
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
95.
PENETRANT SOLUTION USED IN PENETRANT TESTING, CLEANING AGENT, AND DEVELOPING AGENT
A penetrant solution being one embodiment of the present invention has, as essential components thereof, a dye and a volatile organic solvent and includes at least one type selected from the group consisting of hydrofluoro olefin, hydrofluoro ketone, and perfluoro ketone, as the volatile organic solvent. A penetrant solution being one embodiment of the present invention has a volatile organic solvent as an essential component thereof and includes, as the volatile organic solvent, at least one type selected from the group consisting of hydrofluoro olefin, hydrofluoro ketone, and perfluoro ketone. A developing agent as one embodiment of the present invention has as essential components thereof a powder and a volatile organic solvent and includes at least one type selected from the group consisting of hydrofluoro olefin, hydrofluoro ketone, and perfluoro ketone, as the volatile organic solvent.
11 each independently represent a monovalent substituent (alkyl group, alkoxy group, fluorine atom, etc.), m is 0-4, n is 0-40, and R2 each independently are a monovalent group including a polymerizable functional group.
C08G 59/06 - Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
C08G 59/17 - Polycondensates modified by chemical after-treatment by monocarboxylic acids or by anhydrides, halides or low-molecular-weight esters thereof by acrylic or methacrylic acid
H01L 23/29 - Encapsulation, e.g. encapsulating layers, coatings characterised by the material
H01L 23/31 - Encapsulation, e.g. encapsulating layers, coatings characterised by the arrangement
97.
HEAD-UP DISPLAY DEVICE, HEAD-UP DISPLAY SYSTEM, PHASE DIFFERENCE FILM, AND LAMINATED GLASS FOR VEHICLE
A polarizing part (81) is provided between a video unit (31) for radiating projection light (60) and a projection part (laminated glass 10 for a vehicle) on which projection light (61) is projected. The polarizing part (81) transmits light that oscillates in a specific direction and that is included in the projection light (60), and the projection light (61) transmitted through the polarizing part (81) is projected to the projection part. The specific direction in which the projection light (60) is transmitted in the polarizing part (81) is parallel to an incidence plane. In this case, the present invention can be used as a P-HUD-type head-up display device. By adjusting the oscillation direction of the light transmitted by the polarizing part, the occurrence of a double image can be suppressed when an observer views an image displayed in a region near the outer periphery of a windshield surface or the central region of the windshield surface from an angle.
B60J 1/02 - Windows; Windscreens; Accessories therefor arranged at the vehicle front
B60K 35/00 - Arrangement or adaptations of instruments
B60R 11/02 - Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof
C08G 65/22 - Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
C07D 301/14 - Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with organic peracids, or salts, anhydrides or esters thereof
C07D 303/14 - Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by free hydroxyl radicals
C07D 303/48 - Compounds containing oxirane rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms, e.g. ester or nitrile radicals
C08F 299/02 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
C08G 59/00 - Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by reaction of epoxy polycondensates with monofunctional low-molecular-weight compounds; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
C08L 63/00 - Compositions of epoxy resins; Compositions of derivatives of epoxy resins
METAL MATERIAL, METHOD OF PRODUCING METAL MATERIAL, METHOD OF PASSIVATING SEMICONDUCTOR PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING FILLED CONTAINER
B08B 3/02 - Cleaning by the force of jets or sprays
B08B 3/08 - Cleaning involving contact with liquid the liquid having chemical or dissolving effect
B08B 3/10 - Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
patents
