Abstract

Provided is a method for producing a fluorine-containing polymer with little lot-to-lot variation in weight average molecular weight. The method for producing a fluorine-containing polymer of the present invention relates to a method for producing a fluorine-containing polymer containing a repeating unit of formula (1) and a repeating unit of formula (2), which includes: fluorine-containing monomer synthesis including reacting a diol of formula (3) with at least one selected from the group consisting of unsaturated carboxylic acids, esters of the unsaturated carboxylic acids, acid halides of the unsaturated carboxylic acids, and anhydrides of the unsaturated carboxylic acids, to obtain a composition containing a fluorine-containing monomer of formula (4) as a main reaction product and a fluorine-containing monomer of formula (5) as a minor reaction product; fluorine-containing monomer purification including removing the fluorine-containing monomer of formula (5) from the composition to adjust the amount of the fluorine-containing monomer of formula (5), expressed in parts per million based on the mass of the fluorine-containing monomer of formula (4), to 1500 ppm or less; and polymerization including performing a polymerization reaction of the composition obtained after the fluorine-containing monomer purification to give the fluorine-containing polymer containing the repeating unit of formula (1) and the repeating unit of formula (2),

IPC Classes  ?

• C08F 220/24 - Esters containing halogen containing perhaloalkyl radicals
• C07C 67/08 - Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
• C07C 67/54 - Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation by distillation
• C07C 69/653 - Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters

Abstract

A selective film deposition method includes exposing a substrate having a structure on which a first surface region containing a metal element and a second surface region containing a nonmetal inorganic material are both exposed, to a solution containing an organic substance represented by formula (1) shown below and a solvent to deposit a film of the organic substance on the first surface region selectively over the second surface region: R1(X)m (1) wherein R1 is a C4-C100 hydrocarbon group optionally containing a heteroatom or a halogen atom, and m hydrogen atoms of the hydrocarbon group are replaced with X; X is —PO3(R2)2, —O—PO3(R2)2, —CO2R2, —SR2, or —SSR1; each R2 is a hydrogen atom or a C1-C6 alkyl group; and m is a positive integer, and m/r is 0.01 to 0.25 where r is the number of carbons of the hydrocarbon group.

IPC Classes  ?

• B05D 1/32 - Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
• B05D 3/10 - Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means

Abstract

Provided is a new method for producing an imidic acid, or an imidic acid salt, having a phosphoryl group by a method for producing an imidic acid or an imidic acid salt represented by general formula [1] that has a reaction step that reacts a phosphoryl isocyanate represented by general formula [2] with a compound represented by general formula [3].

IPC Classes  ?

• C01B 21/097 - Compounds containing nitrogen and non-metals containing phosphorus atoms
• C01B 25/14 - Sulfur, selenium, or tellurium compounds of phosphorus
• C01B 25/455 - Phosphates containing halogen
• C07F 9/24 - Esteramides
• C07F 9/26 - Amides of acids of phosphorus containing P-halide groups
• C07F 9/58 - Pyridine rings

Abstract

Please substitute the new Abstract submitted herewith for the original Abstract: According to a nonaqueous electrolytic solution containing: a compound represented by the General Formula (1); a solute; and a nonaqueous organic solvent, a nonaqueous electrolytic solution battery, and a compound represented by General Formula (1), a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used for the above nonaqueous electrolytic solution are provided, Please substitute the new Abstract submitted herewith for the original Abstract: According to a nonaqueous electrolytic solution containing: a compound represented by the General Formula (1); a solute; and a nonaqueous organic solvent, a nonaqueous electrolytic solution battery, and a compound represented by General Formula (1), a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used for the above nonaqueous electrolytic solution are provided,

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 10/052 - Li-accumulators
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

According to a nonaqueous electrolytic solution containing: a compound represented by General Formula (1); a solute; and a nonaqueous organic solvent, a nonaqueous electrolytic solution battery, and a compound represented by the General Formula (1), a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used for the above nonaqueous electrolytic solution are provided. According to a nonaqueous electrolytic solution containing: a compound represented by General Formula (1); a solute; and a nonaqueous organic solvent, a nonaqueous electrolytic solution battery, and a compound represented by the General Formula (1), a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used for the above nonaqueous electrolytic solution are provided.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• C07D 233/34 - Ethylene-urea
• C07F 9/6506 - Five-membered rings having the nitrogen atoms in positions 1 and 3
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

The present disclosure provides a lithium-ion secondary battery: in which the surface roughness (Ra) of the surface of a positive electrode active substance layer containing a positive electrode active substance is less than １．０×１０４Å; and which contains a non-aqueous electrolytic solution containing at least one compound selected from the group consisting of compounds represented by general formulae (1)-(10) set forth in the description.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 4/131 - Electrodes based on mixed oxides or hydroxides, or on mixtures of oxides or hydroxides, e.g. LiCoOx
• H01M 4/505 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
• H01M 4/525 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy
• H01M 10/052 - Li-accumulators
• H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries

Abstract

To provide a method and a composition for producing a geometric isomer (isomer 2) represented by a certain formula (1) by geometrically isomerizing a corresponding geometric isomer (isomer 1) represented by the certain formula (1), the method including, contacting the geometric isomer (isomer 1) represented by the certain formula (1) with a compound (A) which is at least one of a dichlorotrifluoropropane and hydrogen chloride in a gas phase.

IPC Classes  ?

• C07C 17/358 - Preparation of halogenated hydrocarbons by reactions not affecting the number of carbon or halogen atoms in the molecules by isomerisation
• C07C 21/18 - Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine

Abstract

A wet etching solution according to the present disclosure is an etching solution for selectively removing a second metal layer made of at least one of a cobalt-based material or a copper-based material from a semiconductor substrate while suppressing etching of a first metal layer made of a tungsten-based material, the first metal layer and the second metal layer being co-present on the semiconductor substrate, an oxide layer being formed on a surface layer of at least the at least one of a cobalt-based material or a copper-based material. The wet etching solution includes a solution in which a β-diketone containing a trifluoromethyl group and a carbonyl group bonded together is dissolved in an organic solvent.

IPC Classes  ?

• H01L 21/3213 - Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
• C23F 1/44 - Compositions for etching metallic material from a metallic material substrate of different composition
• H01L 21/311 - Etching the insulating layers

Abstract

A novel hydrochlorofluoroolefin-based composition contains Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water. In the composition, the proportions of Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water are 55.00 mass % to 99.98 mass %, 0.01 mass % to 44.99 mass %, and 0.01 mass % to 10.00 mass %, respectively, with respect to the total amount of Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water.

IPC Classes  ?

• C11D 7/30 - Halogenated hydrocarbons
• C09D 4/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
• C11D 7/50 - Solvents
• C09K 3/30 - Materials not provided for elsewhere for aerosols

Abstract

Provided is a fluorine-containing polymer for use in a film-forming solution capable of forming a film that is less likely to leave a residue when immersed in a developer. The fluorine-containing polymer of the present invention contains a repeating unit represented by the following formula (1), and a repeating unit represented by the following formula (2) in an amount, expressed in parts per million based on a mass of the repeating unit of formula (1), of 1500 ppm or less: Provided is a fluorine-containing polymer for use in a film-forming solution capable of forming a film that is less likely to leave a residue when immersed in a developer. The fluorine-containing polymer of the present invention contains a repeating unit represented by the following formula (1), and a repeating unit represented by the following formula (2) in an amount, expressed in parts per million based on a mass of the repeating unit of formula (1), of 1500 ppm or less: Provided is a fluorine-containing polymer for use in a film-forming solution capable of forming a film that is less likely to leave a residue when immersed in a developer. The fluorine-containing polymer of the present invention contains a repeating unit represented by the following formula (1), and a repeating unit represented by the following formula (2) in an amount, expressed in parts per million based on a mass of the repeating unit of formula (1), of 1500 ppm or less: wherein R1 and R2 are each independently a hydrogen atom, a methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, sec-butyl, or t-butyl group; R3 and R4 are each independently a hydrogen atom, a methyl group, or an ethyl group; R5 is a hydrogen atom or a trifluoromethyl group; and R6 is a hydrogen atom, a chlorine atom, a methyl group, or a trifluoromethyl group.

IPC Classes  ?

• C08F 220/24 - Esters containing halogen containing perhaloalkyl radicals

Abstract

A surface treatment composition of the present invention is a surface treatment composition that are supplied as a vapor to a surface of a wafer having an uneven pattern on the surface and used to form a water-repellent protective film on the surface, the surface treatment composition containing a silylating agent and a solvent, in which the silylating agent contains a trialkylsilylamine, the solvent contains at least one or more selected from the group consisting of glycol ether acetate and glycol acetate, and a total content of the glycol ether acetate and the glycol acetate is 50% by mass or more in 100% by mass of a total amount of the solvent.

IPC Classes  ?

• H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
• C23C 16/02 - Pretreatment of the material to be coated
• C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating
• C23C 16/56 - After-treatment

Abstract

In a dry etching method according to the present disclosure, a film to be etched is formed on a surface of an object to be treated, contains a metal including at least one metal selected from the group consisting of In, Ga, Cu, Co, Fe, Sn, Zn, Al, Ta, and As, an oxide of the metal, or a nitride of the metal, and is etched by bringing a β-diketone into contact with a gas containing a halogen atom in the molecule.

IPC Classes  ?

• H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
• C23F 1/12 - Gaseous compositions
• H01L 21/3065 - Plasma etching; Reactive-ion etching

Abstract

The present invention provides: a nonaqueous electrolyte solution which comprises (I) at least one compound that is selected from the group consisting of compounds represented by general formula (1), compounds represented by general formula (2), compounds represented by general formula (3), compounds represented by general formula (4-1), compounds represented by general formula (4-2), compounds represented by general formula (4-3), compounds represented by general formula (5) and compounds represented by general formula (6), the compounds being set forth in the description, (II) a solute and (III) a nonaqueous organic solvent, and which thereby has a low initial resistance value; a nonaqueous electrolyte battery; and a compound which is suitable for use in the nonaqueous electrolyte solution.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• C07D 233/34 - Ethylene-urea
• C07D 239/10 - Oxygen or sulfur atoms
• C07D 239/52 - Two oxygen atoms
• C07D 243/04 - Heterocyclic compounds containing seven-membered rings having two nitrogen atoms as the only ring hetero atoms having the nitrogen atoms in positions 1 and 3
• C07D 249/12 - Oxygen or sulfur atoms
• C07D 251/08 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
• C07D 251/10 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
• C07D 251/22 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to two ring carbon atoms
• C07F 1/02 - Lithium compounds
• H01M 10/052 - Li-accumulators
• H01M 10/054 - Accumulators with insertion or intercalation of metals other than lithium, e.g. with magnesium or aluminium
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

A rechargeable battery is disclosed. The rechargeable battery includes an anode, a cathode including a lithium-ion intercalation host, and an electrolyte including a solvent and a halogen-containing compounding that functions as an active cathode conversion material, wherein the electrolyte is in contact with the anode and the cathode.

IPC Classes  ?

• H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 4/58 - Selection of substances as active materials, active masses, active liquids of polyanionic structures, e.g. phosphates, silicates or borates
• H01M 10/0569 - Liquid materials characterised by the solvents
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 4/04 - Processes of manufacture in general
• H01M 4/1397 - Processes of manufacture of electrodes based on inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy
• H01M 10/0585 - Construction or manufacture of accumulators having only flat construction elements, i.e. flat positive electrodes, flat negative electrodes and flat separators

Abstract

A rechargeable battery is disclosed. The rechargeable battery includes an anode, a cathode including a lithium-ion intercalation host, and an electrolyte including a solvent and a halogen-containing compounding that functions as an active cathode conversion material, wherein the electrolyte is in contact with the anode and the cathode.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives

Abstract

This electronic device manufacturing method comprises: a lamination step for providing a resist underlayer film, a resist film, and a top coat film in the stated order on a substrate to obtain a laminate; an exposure step for irradiating the top coat film side of the laminate with actinic rays; and a developing step for removing at least a portion of the resist film by using a developer. In the electronic device manufacturing method, the resist underlayer film contains at least one first sensitizing element selected from the group consisting of metal elements, metalloid elements, and iodine, and the top coat film contains at least one second sensitizing element selected from the group consisting of metal elements, metalloid elements, and iodine.

IPC Classes  ?

• G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
• G03F 7/20 - Exposure; Apparatus therefor
• H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or

Abstract

This resin composition comprises: a polymer having a structural unit represented by [(R2dd(R3ee(OR4fg/2g/2] and a structural unit represented by [(R1bc/2owow of 3 or less. When a plurality of R2are present, each independently represents an aryl group or an aralkyl group; when a plurality of R3are present, each independently represents a hydrogen atom, a straight chain or branched aliphatic hydrocarbon group, or an aromatic hydrocarbon group; when a plurality of R4are present, each independently represents a hydrogen atom, or a straight chain or branched aliphatic hydrocarbon group; d represents a number of 1 to 3 inclusive; e represents a number of 0 to 2 inclusive; f represents a number not less than 0 but less than 3; g represents a number more than 0 but not more than 3; and d+e+f+g=4. M represents at least one selected from the group consisting of Fe, Co, Ni, Cu, Zn, Ga, Ge, Мo, Pd, Ag, Sn, Cs, Ba, W and Hf; when a plurality of R1 are present, each independently represents a hydrogen atom, a hydroxy group, a halogen group, an alkoxy group, a straight chain or branched aliphatic hydrocarbon group, or an aromatic hydrocarbon group; b represents a number not less than 0 but less than 6; c represents a number more than 0 but not more than 6; and b+c=3 to 6.

IPC Classes  ?

• G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
• G03F 7/20 - Exposure; Apparatus therefor
• C08G 79/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon
• H01L 21/3065 - Plasma etching; Reactive-ion etching

Abstract

An application liquid for an optical member comprises a component (A) consisting of metal fine particles (A-1) and/or a metal compound (A-2) including a constituent unit represented by the following general formula (1-A), a stabilizer (B) consisting of a polysiloxane compound including a constituent unit represented by the following general formula (1); and a solvent (C), An application liquid for an optical member comprises a component (A) consisting of metal fine particles (A-1) and/or a metal compound (A-2) including a constituent unit represented by the following general formula (1-A), a stabilizer (B) consisting of a polysiloxane compound including a constituent unit represented by the following general formula (1); and a solvent (C), [(R1)bMOc/2]  (1-A) An application liquid for an optical member comprises a component (A) consisting of metal fine particles (A-1) and/or a metal compound (A-2) including a constituent unit represented by the following general formula (1-A), a stabilizer (B) consisting of a polysiloxane compound including a constituent unit represented by the following general formula (1); and a solvent (C), [(R1)bMOc/2]  (1-A) [(R2)d(R3)e(OR4)fSiOg/2]  (1)

IPC Classes  ?

• G03F 7/075 - Silicon-containing compounds
• C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
• C08K 3/22 - Oxides; Hydroxides of metals
• C08K 3/36 - Silica

Abstract

The purpose of the present disclosure is to provide a technology which is capable of etching a film that contains at least Si and N in a substrate that comprises a film that contains at least Si and O and the film that contains at least Si and N, while suppressing the etching of the film that contains at least Si and O. The present disclosure provides an etching method for etching a film that contains Si and N by bringing (I) an HF gas and (II) at least one compound that is selected from the group consisting of a sulfonyl compound, a carbonyl compound, a sulfonyl isocyanate compound and an isocyanate compound into contact with a substrate which comprises a film that contains at least Si and O and a film that contains at least Si and N.

IPC Classes  ?

• H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting

Abstract

Provided is a resin composition for forming a resist upper layer film, the resin composition comprising at least one sensitizing element selected from the group consisting of Ge, Mo, Hf, Zr, Ta, W, Cr, Co, Fe, Pt, Sn, and Sb, wherein the amount of sensitizing elements in nonvolatile components is at least 5 at%. Also provided is a pattern forming method comprising: a step for forming a photoresist film on a substrate; a step for forming a resist upper layer film on the photoresist film by using the resin composition for forming a resist upper layer film; an exposure step for exposing the photoresist film and the resist upper layer film; and a step for removing at least a portion of the photoresist film by using a developer.

IPC Classes  ?

• G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
• G03F 7/004 - Photosensitive materials
• G03F 7/075 - Silicon-containing compounds
• G03F 7/20 - Exposure; Apparatus therefor

Abstract

ROROO is the concentration of the sensitizing element or elements in the surface of the topcoat film that is on the opposite side from the resist film.

IPC Classes  ?

• G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
• G03F 7/004 - Photosensitive materials
• G03F 7/075 - Silicon-containing compounds
• G03F 7/20 - Exposure; Apparatus therefor
• H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or

Abstract

This substrate processing method comprises: a preparation step for preparing a substrate in which at least a first surface containing silicon oxide and a second surface containing silicon or a silicon compound other than silicone oxide are exposed; a surface modification step for forming an etching selectivity imparting film on at least part of the first surface and at least part of the second surface by means of a silylation process in which a silylation agent is contacted with the first surface and the second surface; and an etching step for selectively etching the second surface relative to the first surface using an etching agent after the surface modification step.

IPC Classes  ?

• H01L 21/312 - Organic layers, e.g. photoresist
• H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
• H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching

Abstract

A substrate processing method according to the present invention comprises: a preparation step for preparing a substrate that has, on a surface thereof, a first surface which contains Si and a second surface which has a different chemical composition from the first surface and which contains Si; a surface modification step for, after performing a silylation treatment in which a silylating agent is brought in contact with the first surface and the second surface, performing a water repellency adjustment treatment in which the water repellency of the second surface is selectively decreased, with respect to the first surface; and a processing step for selectively performing processing with respect to the second surface after the surface modification step.

IPC Classes  ?

• H01L 21/312 - Organic layers, e.g. photoresist
• H01L 21/316 - Inorganic layers composed of oxides or glassy oxides or oxide-based glass

Abstract

The present disclosure provides a wet etching method including pretreating a metal-containing film on a substrate with a surface modification liquid and etching the metal-containing film with an etching liquid, wherein the etching liquid is a solution containing: a β-diketone with a trifluoromethyl group bonded to a carbonyl group; and an organic solvent, wherein the metal-containing film contains a metal element capable of forming a complex with the β-diketone, wherein the surface modification liquid contains an acidic substance against the metal element, and wherein the wet etching method is carried out through: a first step of bringing the surface modification liquid into contact with the metal-containing film, thereby forming an oxide layer of the metal element at a surface of the metal-containing film; and a second step of bringing the etching liquid into contact with the metal-containing film on which the oxide layer has been formed.

IPC Classes  ?

• C23F 1/10 - Etching compositions
• H01L 21/311 - Etching the insulating layers

Abstract

The present disclosure provides: a trifluoromethane sulfonylation agent composition containing a compound represented by general formula (1) or (11) disclosed in the description; and a method for producing a trifluoromethanesulfonyloxy compound or a method for producing a trifluoromethane sulfonyl compound, said methods for causing the trifluoromethane sulfonylation agent composition to react with a specific substrate or a compound represented by general formula (2) disclosed in the description.

IPC Classes  ?

• C07C 303/28 - Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of esters of sulfonic acids by reaction of hydroxy compounds with sulfonic acids or derivatives thereof
• C07C 303/36 - Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids
• C07C 309/66 - Methanesulfonates
• C07C 311/08 - Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton having the nitrogen atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring

Abstract

Provided is a lithium iodide nonaqueous solution containing: a nonaqueous solvent; and lithium iodide, the lithium iodide nonaqueous solution having a water content per unit of lithium iodide (Y/X) of 7 or lower and an acid-derived component content of 4000 ppm or lower, the water content per unit of lithium iodide (Y/X) being determined as a ratio of a water content Y (ppm) of the lithium iodide nonaqueous solution to a lithium iodide concentration X (% by weight) of the lithium iodide nonaqueous solution.

IPC Classes  ?

• C01D 15/04 - Halides

Abstract

An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A), An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A), [(R2)d(R3)e(OR4)fSiOg/2]  (1) An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A), [(R2)d(R3)e(OR4)fSiOg/2]  (1) [(R1)bMOc/2]  (1-A) An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A), [(R2)d(R3)e(OR4)fSiOg/2]  (1) [(R1)bMOc/2]  (1-A) In the general formula (1), R2 is a group represented by a following general formula (1a). An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A), [(R2)d(R3)e(OR4)fSiOg/2]  (1) [(R1)bMOc/2]  (1-A) In the general formula (1), R2 is a group represented by a following general formula (1a).

IPC Classes  ?

• G03F 7/004 - Photosensitive materials
• G03F 7/075 - Silicon-containing compounds
• G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
• G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
• G03F 7/20 - Exposure; Apparatus therefor

Abstract

The present invention pertains to a surface treatment composition which is supplied as vapor to the surface of a wafer having a concave–convex pattern on the surface and is used to form a water-repellent protective film on the surface, the surface treatment composition containing a silylating agent and a solvent, wherein the silylating agent contains a silicon compound represented by (R133Si-X (R1's are each independently a group selected from the group consisting of a C1-10 hydrocarbon group and a C1-10 hydrocarbon group in which some or all of the hydrogen atoms are substituted with fluorine atoms, and X is an amino group), and the solvent contains at least 75 mass% of a hydrocarbon solvent per 100 mass% of the total amount of the solvent.

IPC Classes  ?

• H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting

Abstract

Provided are a polyamide having a structural unit represented by General Formula [1], and the like. In General Formula [1], R1 is a divalent organic group represented by General Formula [2], and R2 is a divalent organic group. In General Formula [2], n1 and n2 are each independently an integer of 0 to 4, and in a case where a plurality of R3's are present, the plurality of R3's each independently represent a monovalent substituent.

IPC Classes  ?

• C08G 69/32 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
• C08J 3/09 - Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
• C08J 7/04 - Coating
• C08J 7/18 - Chemical modification with polymerisable compounds using wave energy or particle radiation
• C08L 77/10 - Polyamides derived from aromatically bound amino and carboxyl groups of amino carboxylic acids or of polyamines and polycarboxylic acids

Abstract

There is provided a silicon compound represented by General Formula (x). There is also provided a reactive material containing a silicon compound represented by General Formula (x). In General Formula (x), in a case where a plurality of R1's are present, R1's are each independently a linear alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 3 to 10 carbon atoms, a cyclic alkyl group having 3 to 10 carbon atoms, a linear alkenyl group having 2 to 10 carbon atoms, a branched alkenyl group having 3 to 10 carbon atoms, or a cyclic alkenyl group having 3 to 10 carbon atoms, where all or part of hydrogen atoms in the alkyl group or the alkenyl group may be substituted with a fluorine atom, in a case where a plurality of R2's are present, R2's are each independently a linear alkyl group having 1 to 4 carbon atoms or a branched alkyl group having 3 or 4 carbon atoms, where all or part of hydrogen atoms in the alkyl group may be substituted with a fluorine atom, RA is an acid unstable group; a is an integer of 1 to 3, b is an integer of 0 to 2, and c is an integer of 1 to 3, where a+b+c=4 is satisfied; and n is an integer of 1 to 5. There is provided a silicon compound represented by General Formula (x). There is also provided a reactive material containing a silicon compound represented by General Formula (x). In General Formula (x), in a case where a plurality of R1's are present, R1's are each independently a linear alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 3 to 10 carbon atoms, a cyclic alkyl group having 3 to 10 carbon atoms, a linear alkenyl group having 2 to 10 carbon atoms, a branched alkenyl group having 3 to 10 carbon atoms, or a cyclic alkenyl group having 3 to 10 carbon atoms, where all or part of hydrogen atoms in the alkyl group or the alkenyl group may be substituted with a fluorine atom, in a case where a plurality of R2's are present, R2's are each independently a linear alkyl group having 1 to 4 carbon atoms or a branched alkyl group having 3 or 4 carbon atoms, where all or part of hydrogen atoms in the alkyl group may be substituted with a fluorine atom, RA is an acid unstable group; a is an integer of 1 to 3, b is an integer of 0 to 2, and c is an integer of 1 to 3, where a+b+c=4 is satisfied; and n is an integer of 1 to 5.

IPC Classes  ?

• C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
• C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
• C08G 77/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
• C08G 77/08 - Preparatory processes characterised by the catalysts used
• G03F 7/075 - Silicon-containing compounds
• G03F 7/20 - Exposure; Apparatus therefor

Abstract

333)-. Also provided is a curable compound comprising the maleimide compound or the maleamic acid compound. Also provided is a cured product of the curable compound. Also provided is an electronic device that is provided with the cured product.

IPC Classes  ?

• C07D 207/452 - Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide with hydrocarbon radicals, substituted by hetero atoms, directly attached to the ring nitrogen atom
• C07C 231/02 - Preparation of carboxylic acid amides from carboxylic acids or from esters, anhydrides, or halides thereof by reaction with ammonia or amines
• C07C 235/78 - Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups and doubly-bound oxygen atoms bound to the same carbon skeleton with the carbon atoms of the carboxamide groups bound to acyclic carbon atoms of an unsaturated carbon skeleton the carbon skeleton containing rings
• C08F 22/40 - Imides, e.g. cyclic imides

Abstract

Provided is a polybenzoxazole having a structural unit represented by General Formula [1]. In General Formula [1], R1 is a tetravalent organic group represented by General Formula [2], and R2 is a divalent organic group. In General Formula [2], two n’s are each independently an integer of 0 to 3, in a case where a plurality of R3′s are present, the plurality of R3′s each independently represent a monovalent substituent, and *1, *2, *3, and *4 each independently represent a bonding site, in which one of *1 and *2 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1], and one of *3 and *4 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1]. Provided is a polybenzoxazole having a structural unit represented by General Formula [1]. In General Formula [1], R1 is a tetravalent organic group represented by General Formula [2], and R2 is a divalent organic group. In General Formula [2], two n’s are each independently an integer of 0 to 3, in a case where a plurality of R3′s are present, the plurality of R3′s each independently represent a monovalent substituent, and *1, *2, *3, and *4 each independently represent a bonding site, in which one of *1 and *2 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1], and one of *3 and *4 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1]. Provided is a polybenzoxazole having a structural unit represented by General Formula [1]. In General Formula [1], R1 is a tetravalent organic group represented by General Formula [2], and R2 is a divalent organic group. In General Formula [2], two n’s are each independently an integer of 0 to 3, in a case where a plurality of R3′s are present, the plurality of R3′s each independently represent a monovalent substituent, and *1, *2, *3, and *4 each independently represent a bonding site, in which one of *1 and *2 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1], and one of *3 and *4 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1].

IPC Classes  ?

• C07C 215/80 - Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton of the same non-condensed six-membered aromatic ring containing at least two amino groups bound to the carbon skeleton
• C08G 73/22 - Polybenzoxazoles
• C08G 69/40 - Polyamides containing oxygen in the form of ether groups
• C09D 177/06 - Polyamides derived from polyamines and polycarboxylic acids
• C07C 213/02 - Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reactions involving the formation of amino groups from compounds containing hydroxy groups or etherified or esterified hydroxy groups
• H05K 1/03 - Use of materials for the substrate
• H05K 1/02 - Printed circuits - Details

Abstract

Provided is a glycidyl amine-type fluorine-containing epoxy compound. The present disclosure relates to a fluorine-containing epoxy compound represented by general formula (1). In general formula (1), n each independently represents an integer of 0 to 4, and R1 each independently represents a monovalent substituent and is one selected from the group consisting of a halogen atom, an alkyl group, an alkoxy group, a haloalkoxy group, and an aryl group.

IPC Classes  ?

• C08G 59/10 - Polycondensates containing more than one epoxy group per molecule of polyamines with epihalohydrins or precursors thereof
• C07D 301/27 - Condensation of epihalohydrins or halohydrins with compounds containing active hydrogen atoms
• C07D 303/36 - Compounds containing oxirane rings with hydrocarbon radicals, substituted by nitrogen atoms
• C08G 59/32 - Epoxy compounds containing three or more epoxy groups
• C08J 5/24 - Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
• C08K 7/02 - Fibres or whiskers
• C08L 63/00 - Compositions of epoxy resins; Compositions of derivatives of epoxy resins
• C09K 3/10 - Materials not provided for elsewhere for sealing or packing joints or covers
• H01L 23/29 - Encapsulation, e.g. encapsulating layers, coatings characterised by the material
• H01L 23/31 - Encapsulation, e.g. encapsulating layers, coatings characterised by the arrangement

Abstract

Provided are a fluorinated diamine represented by General Formula [1A] or a salt of the fluorinated diamine; a polyamide including a structural unit derived from the diamine or the salt thereof; a cyclized polyamide; and the like. In General Formula [1A], in a case where a plurality of R1's are present, the plurality of R1's are each independently at least one selected from the group consisting of an alkyl group, an alkoxy group, a halogen atom, a haloalkyl group, and a haloalkoxy group, and two n's are each independently an integer of 0 to 3. Provided are a fluorinated diamine represented by General Formula [1A] or a salt of the fluorinated diamine; a polyamide including a structural unit derived from the diamine or the salt thereof; a cyclized polyamide; and the like. In General Formula [1A], in a case where a plurality of R1's are present, the plurality of R1's are each independently at least one selected from the group consisting of an alkyl group, an alkoxy group, a halogen atom, a haloalkyl group, and a haloalkoxy group, and two n's are each independently an integer of 0 to 3.

IPC Classes  ?

• C08G 69/32 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
• C09D 177/06 - Polyamides derived from polyamines and polycarboxylic acids

Abstract

The present invention provides a method for producing phosphorus trifluoride and a method for producing phosphorus pentafluoride, which have high reaction efficiency, low reaction temperature and an excellent energy efficiency. The method for producing phosphorus trifluoride comprises: a step of introducing phosphorus trichloride and hydrogen fluoride into a first reactor; and a step of discharging phosphorus trifluoride from the first reactor, wherein the first reactor contains carbon material. The method for producing dichloro-phosphorus trifluoride comprises a step of introducing the phosphorus trifluoride obtained above and chlorine into a second reactor; and a step of discharging dichloro-phosphorus trifluoride from the second reactor. The method for producing phosphorus pentafluoride comprises: a step of introducing the dichloro-phosphorus trifluoride obtained above and hydrogen fluoride into a third reactor; and a step of discharging phosphorus pentafluoride from the third reactor. The method for producing lithium hexafluorophosphate comprises a step of introducing the phosphorus pentafluoride obtained above and lithium fluoride into a fourth reactor; and a step of discharging lithium hexafluorophosphate from the fourth reactor.

IPC Classes  ?

• C01B 25/10 - Halides or oxyhalides of phosphorus
• C01B 25/445 - Metaphosphates of alkali metals

Abstract

A surface treatment method for semiconductor substrates of the present invention is a treatment method of treating a main surface of a semiconductor substrate that has, on the main surface of the substrate, a pattern formation region in which a pattern having a concave-convex structure with a pattern dimension of 30 nm or less is formed and a bevel region which is formed on a periphery of the pattern formation region, the method including a surface treatment step of bringing a surface treatment agent composition including a silylating agent into contact with the pattern formation region and the bevel region on the main surface of the semiconductor substrate, in which, with respect to a surface of a silicon oxide substrate brought into contact with the surface treatment agent composition, an IPA receding contact angle is 3° or more at a room temperature of 25° C., and/or a water receding contact angle is 40° or more at the room temperature of 25° C.

IPC Classes  ?

• H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof

Abstract

A surface treatment method for a semiconductor substrate of the present invention is a treatment method of treating a main surface of a semiconductor substrate that has, on the main surface of the substrate, a pattern formation region in which a pattern having a concave-convex structure with a pattern dimension of 30 nm or less is formed and a pattern non-formation region in which no pattern is formed, the method including a surface treatment step of bringing a surface treatment agent composition including a silylating agent into contact with the pattern formation region and the pattern non-formation region on the main surface of the semiconductor substrate, in which, with respect to a surface of the pattern non-formation region after the surface treatment step, an IPA contact angle with 2-propanol is 2° or more at a room temperature of 25° C. and/or a water contact angle with pure water is 50° or more at the room temperature of 25° C.

IPC Classes  ?

• H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
• C09D 183/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
• C09D 7/20 - Diluents or solvents

Abstract

The present disclosure is to provide a nonaqueous electrolytic solution for a nonaqueous electrolytic solution battery in which even if the nonaqueous electrolytic solution is applied to a positive electrode having a content of nickel of 30% by mass to 100% by mass in a metal contained in a positive electrode active material, an effect of improving output characteristics after cycle and an effect of reducing a deposition amount of a negative electrode current collector metal on a surface of a negative electrode after initial charging and discharging can be exerted in a well-balanced manner.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 10/0569 - Liquid materials characterised by the solvents
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/052 - Li-accumulators
• H01M 4/525 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy

Abstract

The method of dry-etching silicon oxide of the present disclosure includes reacting silicon oxide with any one of the following (A) to (C): (A) a gaseous hydrogen fluoride and a gaseous organic amine compound, (B) a gaseous hydrogen fluoride salt of an organic amine compound, and (C) a gaseous hydrogen fluoride, a gaseous organic amine compound, and a gaseous hydrogen fluoride salt of an organic amine compound in a non-plasma state.

IPC Classes  ?

• H01L 21/311 - Etching the insulating layers
• C09K 13/08 - Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
• H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
• H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
• H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof

Abstract

The alkylamine composition of the present disclosure contains: an alkylamine represented by the following formula (1) in an amount of 99.5% by volume or more; and water in an amount of 10 ppm by mass or more and 100 ppm by mass or less: The alkylamine composition of the present disclosure contains: an alkylamine represented by the following formula (1) in an amount of 99.5% by volume or more; and water in an amount of 10 ppm by mass or more and 100 ppm by mass or less: The alkylamine composition of the present disclosure contains: an alkylamine represented by the following formula (1) in an amount of 99.5% by volume or more; and water in an amount of 10 ppm by mass or more and 100 ppm by mass or less: wherein N is a nitrogen atom; R1 is a C1-C10 hydrocarbon group optionally having a ring, a heteroatom, or a halogen atom; R2 and R3 are each independently a hydrogen atom or a C1-C10 hydrocarbon group optionally having a ring, a heteroatom, or a halogen atom; provided that the hydrocarbon group, when it has a carbon number of 3 or more, may have a branched chain structure or a ring structure and that the heteroatom in the hydrocarbon group is a nitrogen atom, an oxygen atom, a sulfur atom, or a phosphorus atom; further, R1 and R2, when both of them are hydrocarbon groups having a carbon number of 1 or more, may be directly bonded to each other to form a ring structure; further, R1 or R2, which is directly bonded by a double bond to form a ring structure, may form an aromatic ring in the absence of R3; R1, R2, and R3 may be hydrocarbon groups which are the same as or different from one another; and R1 has at least one hydrogen atom at α carbon bonded to the nitrogen atom.

IPC Classes  ?

• C07C 209/84 - Purification
• F17C 6/00 - Methods or apparatus for filling vessels not under pressure with liquefied or solidified gases

Abstract

The present disclosure provides a non-aqueous electrolyte containing at least one compound selected from the group consisting of (I) compounds represented by general formula (1) set forth in the specification and compounds represented by general formula (2) set forth in the specification. The present disclosure also provides: a non-aqueous electrolyte battery comprising at least a positive electrode, a negative electrode, and the non-aqueous electrolyte; and a production method for the non-aqueous electrolyte battery using the non-aqueous electrolyte.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• C07C 317/40 - Y being a hydrogen or a carbon atom
• C07F 9/40 - Esters thereof
• H01M 10/052 - Li-accumulators
• H01M 10/054 - Accumulators with insertion or intercalation of metals other than lithium, e.g. with magnesium or aluminium
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0569 - Liquid materials characterised by the solvents
• H01M 10/058 - Construction or manufacture

Abstract

A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied. A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied. B / A + B   >   0 .04 A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied. B / A + B   >   0 .04 A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied. B / A + B   >   0 .04

IPC Classes  ?

• G03F 7/075 - Silicon-containing compounds
• C08L 83/06 - Polysiloxanes containing silicon bound to oxygen-containing groups
• C08J 3/24 - Crosslinking, e.g. vulcanising, of macromolecules

Abstract

A composition for film formation according to the present disclosure is used for the purpose of forming a water repellent film on at least a part of the surface of a substrate by being supplied to the substrate, the surface of which is covered with a protic liquid. This composition for film formation contains a silylating agent which silylates the surface of the substrate, a catalytic compound which promotes the silylation reaction by the silylating agent, and an aprotic solvent; and the content of the catalytic compound is 1.0% by mass or more in 100% by mass of this composition for film formation.

IPC Classes  ?

• H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting
• C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

Abstract

Provided is a method of producing a light-emitting element, the method being capable of producing a light-emitting element including a first light emitting layer and banks on the first light emitting layer, without damaging the first light emitting layer. The method of producing a light-emitting element of the present disclosure includes: preparing a base element including a monochromatic first light emitting layer on a substrate; forming a patterned fluororesin film by disposing a photosensitive resin composition at least containing a fluororesin having a crosslinking site and a repeating unit derived from a hydrocarbon containing a fluorine atom, a solvent, and a photopolymerization initiator on the base element such that photosensitive resin composition partitions at least one region of the base element; and baking the patterned fluororesin film at a temperature of 200° C. or lower to cure the patterned fluororesin film.

IPC Classes  ?

• H10K 59/122 - Pixel-defining structures or layers, e.g. banks
• G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
• G03F 7/40 - Treatment after imagewise removal, e.g. baking
• H10K 59/12 - Active-matrix OLED [AMOLED] displays
• H10K 71/20 - Changing the shape of the active layer in the devices, e.g. patterning

Abstract

An object is to provide a hydrofluoroolefin-based or hydrochlorofluoroolefin-based azeotropic or azeotropic-like composition. The azeotropic or azeotropic-like composition contains trans-1-chloro-3,3,3-trifluoropropene and 1-chloro-1,3,3,3-tetrafluoropropene. In the azeotropic or azeotropic-like composition, 1-chloro-1,3,3,3-tetrafluoropropene exists in an effective amount to form an azeotropic or azeotropic-like mixture with trans-1-chloro-3,3,3-trifluoropropene.

IPC Classes  ?

• C11D 3/24 - Organic compounds containing halogen
• C11D 17/00 - Detergent materials or soaps characterised by their shape or physical properties
• C11D 7/50 - Solvents
• F03B 17/00 - Other machines or engines

Abstract

The present disclosure provides a platinum group element resource recovery device. This is a device for recovering a platinum group element resource and has: a recovery section that receives an input gas containing a platinum group element resource and that recovers the platinum group element resource contained in the input gas; and a treatment section that receives a pass-through gas that has passed through the recovery section. The recovery section has at least a trunk section, a gas inflow port that can feed the input gas to the trunk section, and a packed bed within the trunk section. The packed bed is not in contact with the gas inflow port and contains at least either one of a solid alkali agent and a reaction product of the solid alkali agent and the input gas. The height (L) of the packed bed and the area (S) of a cross section containing an inner diameter of the trunk section satisfy L/√S = 0.11 to 1.13.

IPC Classes  ?

• C22B 11/02 - Obtaining noble metals by dry processes
• B01D 53/64 - Heavy metals or compounds thereof, e.g. mercury
• C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating

Abstract

Provided is a method for stably supplying trimethylamine containing monomethylamine and/or dimethylamine as trace impurities at a constant makeup. Provided is a method for stably supplying trimethylamine containing monomethylamine and/or dimethylamine as trace impurities at a constant makeup. The present invention relates to a method for supplying a composition including keeping a storage container that encloses a composition therein at a constant temperature of 10° C. or higher to supply a gas of the composition to a predetermined device. The composition contains, in a gaseous phase, trimethylamine, dimethylethylamine, and at least one of dimethylamine or monomethylamine.

IPC Classes  ?

• C09K 13/08 - Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
• H01L 21/311 - Etching the insulating layers

Abstract

The sublimable film formation composition of the present invention includes a sublimable substance and a solvent in which a saturation solubility of the sublimable substance is more than 10% by mass.

IPC Classes  ?

• C08J 5/18 - Manufacture of films or sheets
• C08J 3/09 - Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
• B01D 7/00 - Sublimation
• H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof

Abstract

33)H-, and at least two aromatic ester partial structures, includes, at the end of a molecule, at least one or two partial structures selected from the group consisting of an aryloxycarbonyl structure, an arylcarbonyloxy structure, and a hydroxyaryl structure, and includes a specific partial structure; and a novolak resin including a specific partial structure.

IPC Classes  ?

• C08G 59/40 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the curing agents used
• C07C 67/14 - Preparation of carboxylic acid esters from carboxylic acid halides
• C07C 69/78 - Benzoic acid esters
• C07C 69/83 - Phthalic acid esters of unsaturated alcohols
• C08G 8/04 - Condensation polymers of aldehydes or ketones with phenols only of aldehydes
• C08G 8/28 - Chemically modified polycondensates

Abstract

Provided is an aralkyl resin having a structural unit represented by general formula (1) or (2). In general formulas (1) and (2), R1represents a monovalent substituent, excluding monovalent substituents in which an atom directly bonding to an aromatic ring is an oxygen atom, and may be identical or different when there are a plurality of R1. In general formula (1) n is an integer of 0-2, when n is 0, p is an integer of ≤4, when n is 1, p is an integer of ≤6, and when n is 2, p is an integer of ≤8. In general formula (2), m and k are each an integer of 0-2, when m+k is 0, p+q is an integer of ≤8, when m+k is 1, p+q is an integer of ≤10, when m+k is 2, p+q is an integer of ≤12, when m+k is 3, p+q is an integer of ≤14, when m+k is 4, p+q is an integer of ≤16, and X is a single bond or a divalent substituent other than an oxygen atom.

IPC Classes  ?

• C08G 10/02 - Condensation polymers of aldehydes or ketones with aromatic hydrocarbons or halogenated aromatic hydrocarbons only of aldehydes
• G03F 7/023 - Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Abstract

A dry etching method including reacting silicon oxide with: gaseous hydrogen fluoride and a gaseous organic amine compound; a hydrogen fluoride salt of a gaseous organic amine compound; or gaseous hydrogen fluoride, a gaseous organic amine compound, and a hydrogen fluoride salt of a gaseous organic amine compound. The organic amine compound is an organic amine mixture containing at least two compounds represented by the following formula (1): A dry etching method including reacting silicon oxide with: gaseous hydrogen fluoride and a gaseous organic amine compound; a hydrogen fluoride salt of a gaseous organic amine compound; or gaseous hydrogen fluoride, a gaseous organic amine compound, and a hydrogen fluoride salt of a gaseous organic amine compound. The organic amine compound is an organic amine mixture containing at least two compounds represented by the following formula (1): R1—N═R2R3  (1) A dry etching method including reacting silicon oxide with: gaseous hydrogen fluoride and a gaseous organic amine compound; a hydrogen fluoride salt of a gaseous organic amine compound; or gaseous hydrogen fluoride, a gaseous organic amine compound, and a hydrogen fluoride salt of a gaseous organic amine compound. The organic amine compound is an organic amine mixture containing at least two compounds represented by the following formula (1): R1—N═R2R3  (1) wherein N is a nitrogen atom; R1 is a C1-C10 hydrocarbon group optionally having a ring, a heteroatom, or a halogen atom; R2 and R3 are each a hydrogen atom or a C1-C10 hydrocarbon group optionally having a ring, a heteroatom, or a halogen atom; provided that the hydrocarbon group, when it has a carbon number of 3 or more, may have a branched chain structure or a ring structure.

IPC Classes  ?

• C09K 13/08 - Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
• H01L 21/311 - Etching the insulating layers

Abstract

A novolak resin including a partial structure represented by —C(CF3)H—. In addition, there are provided a photosensitive resin composition containing the above-described novolak resin and a photosensitizing agent. In addition, there is provided an epoxy resin having a partial structure represented by —C(CF3)H—. In addition, there is provided a curable resin composition containing the novolak resin or the epoxy resin. In addition, there is provided a cured substance obtained by curing the composition. In addition, there is provided a production method for a novolak resin, including reacting an aromatic compound with fluoral in a presence of an acid catalyst to produce a novolak resin having a partial structure represented by —C(CF3)H—. Further, there is provided a production method for an epoxy resin, including an epoxidation step of reacting a novolak resin having a partial structure represented by —C(CF3)H— with epihalohydrin in a presence of a base.

IPC Classes  ?

• C08L 63/04 - Epoxynovolacs
• C08G 59/24 - Di-epoxy compounds carbocyclic
• C08G 59/30 - Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen, and nitrogen

Abstract

A windowpane being mounted to a moving object and comprising an information acquisition region, wherein the windowpane is provided with a glass plate α and a functional film, the glass plate α is provided with a main surface A that is potentially exposed to the indoor side of the moving object and a main surface B on the opposite side of the main surface A, the functional film opposes the main surface A or the main surface B, the functional film is provided with a base material film and a functional layer provided on the base material film, the functional film is provided with a region in which the functional layer is formed and a region in which the functional layer is not formed, and the information acquisition region is located in the region in which the functional layer is not formed.

IPC Classes  ?

• C03C 27/12 - Laminated glass
• B60J 1/00 - Windows; Windscreens; Accessories therefor
• B60J 1/02 - Windows; Windscreens; Accessories therefor arranged at the vehicle front

Abstract

Provided is a terminal, to which a power line is connected, and which is connected to a substrate, the terminal including: a left-right pair of pedestal parts; two leg parts that rise from an inner side of the pedestal parts; a bridge part that connects the two leg parts; a neck part that extends from the bridge part in a direction orthogonal to an extending direction of the bridge part; and a connecting part that is provided on a tip of the neck part and to which a power line for supplying power is connected. The width of the leg parts and the width of the pedestal parts are the same at least at the boundary between the pedestal parts and the leg parts. The boundary between the neck part and the bridge part is located inward from a region within a distance that is half the width of the pedestal parts from an imaginary line that connects the centers of the two.

IPC Classes  ?

• B60J 1/00 - Windows; Windscreens; Accessories therefor
• H01R 4/02 - Soldered or welded connections
• H01R 4/18 - Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation effected solely by twisting, wrapping, bending, crimping, or other permanent deformation by crimping

Abstract

The present disclosure provides a non-aqueous electrolytic solution including at least one of compounds selected from the group consisting of (I) a compound represented by general formula (1) described in the description, a compound represented by general formula (2) described in the description, and a compound represented by general formula (3) described in the description, and a non-aqueous electrolyte battery comprising at least a positive electrode, a negative electrode, a separator, and the non-aqueous electrolytic solution.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• C07C 311/48 - Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom
• H01M 10/052 - Li-accumulators
• H01M 10/054 - Accumulators with insertion or intercalation of metals other than lithium, e.g. with magnesium or aluminium
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

A single-crystal silicon carbide wafer (31) according to the present invention includes boron in a concentration of at most 1.0×1016atoms/cm3, and has a central region (33) in which the basal plane dislocation density is at most 100/cm2 on the surface thereof. The central region (33) includes the center of the surface of the single-crystal silicon carbide wafer (31). The area of the central region (33) is at least one fourth of the area of the surface of the single-crystal silicon carbide wafer (31).

IPC Classes  ?

• C30B 29/36 - Carbides
• C30B 19/10 - Controlling or regulating

Abstract

This silicon carbide single crystal wafer includes boron at a concentration of 1.0 × 1016atoms/cm3 or less and has, on the surface thereof, a region in which the orientation difference within a crystal plane of the silicon carbide single crystal wafer (31) is 50 arcsec or less. The area of said region is at least one-quarter of the area of the silicon carbide single crystal wafer surface.

IPC Classes  ?

• C30B 29/36 - Carbides
• C30B 19/12 - Liquid-phase epitaxial-layer growth characterised by the substrate

Abstract

The present invention provides: a non-aqueous electrolytic solution including (I) a compound represented by general formula (1) described in the description (for example, a compound represented by the following formula (a-1)), (II) a solute, and (III) a non-aqueous organic solvent; a non-aqueous electrolytic solution and a non-aqueous electrolyte battery that are capable of improving a high-temperature cycle characteristic and suppressing the resistance increase of the battery because of the compound represented by general formula (1) and an additive for the non-aqueous electrolytic solution; and a compound and an additive for a non-aqueous electrolytic solution that can be suitably used for the non-aqueous electrolytic solution.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• C07C 301/00 - Esters of sulfurous acid
• H01M 10/052 - Li-accumulators
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

A curable composition including a first compound having a group represented by general formula (x) and an epoxy group and having a molecular weight of 1000 or less. In the general formula (x), Rf1 and Rf2 each independently represent a fluorine-containing alkyl group. A curable composition including a first compound having a group represented by general formula (x) and an epoxy group and having a molecular weight of 1000 or less. In the general formula (x), Rf1 and Rf2 each independently represent a fluorine-containing alkyl group. —C(Rf1)(Rf2)—OH  (x)

IPC Classes  ?

• C08G 65/22 - Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
• C08G 59/24 - Di-epoxy compounds carbocyclic
• C08L 63/04 - Epoxynovolacs
• C08J 3/28 - Treatment by wave energy or particle radiation

Abstract

A curable resin represented by General Formula (1). In General Formula (1), R1 each independently represent a monovalent substituent (an alkyl group, an alkoxy group, a fluorine atom, and the like), m is 0 to 4, n is 0 to 40, and R2's are each independently a monovalent group including a polymerizable functional group. A curable resin represented by General Formula (1). In General Formula (1), R1 each independently represent a monovalent substituent (an alkyl group, an alkoxy group, a fluorine atom, and the like), m is 0 to 4, n is 0 to 40, and R2's are each independently a monovalent group including a polymerizable functional group.

IPC Classes  ?

• C08G 59/06 - Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols

Abstract

Provided is polyimide having a structural unit represented by general formula (1). In general formula (1), R1is a divalent organic group represented by general formula (2) and R2is a tetravalent organic group including an alicyclic skeleton. In general formula (2), each of the two ns is independently an integer of 0-4, and each R3 is independently a monovalent substituent.

IPC Classes  ?

• C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Abstract

dpmindpminmindpdp.

IPC Classes  ?

• H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting

Abstract

The present disclosure provides a non-aqueous solution that comes into contact with an austenitic stainless steel. The non-aqueous solution contains a non-aqueous solvent or solvents and an imidic acid represented by a specified structure or a salt of the imidic acid, in which the content of a non-aqueous solvent having a relative permittivity of 10 or less (at 25°C) in the non-aqueous solvent or solvents is 50 to 100% by volume.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 10/052 - Li-accumulators
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

Provided is an aerosol composition for cleaning which is capable of stably ejecting a cleaning ingredient. Also provided is a noncombustible cleaner for components which is capable of stably ejecting a cleaning ingredient. The aerosol composition for cleaning according to one aspect of the present invention comprises a fluorinated detergent, a first propellant gas, and a second propellant gas, which has a higher molecular weight and a lower partial pressure than the first propellant gas. The cleaner for components according to another aspect of the present invention comprises the aerosol composition for cleaning and a spray can containing the aerosol composition for cleaning.

IPC Classes  ?

• C11D 7/50 - Solvents
• B65D 83/14 - Containers or packages with special means for dispensing contents for delivery of liquid or semi-liquid contents by internal gaseous pressure, i.e. aerosol containers comprising propellant
• C09K 3/30 - Materials not provided for elsewhere for aerosols
• C11D 7/24 - Hydrocarbons
• C11D 7/26 - Organic compounds containing oxygen
• C11D 7/30 - Halogenated hydrocarbons
• C11D 17/08 - Detergent materials or soaps characterised by their shape or physical properties capsuled

Abstract

According to an embodiment, a method for producing a (hydro)halocarbon includes a step of purifying the (hydro)halocarbon by reduced-pressure distillation of an azeotropic or azeotropic-like composition containing the (hydro)halocarbon and a compound different from the (hydro)halocarbon. According to another embodiment, a method for producing a (hydro)halocarbon includes a step purifying the (hydro)halocarbon by reduced-pressure distillation of an azeotropic or azeotropic-like composition containing the (hydro)halocarbon and a compound different from the (hydro)halocarbon, wherein standard boiling points of both the (hydro)halocarbon and the compound are 80° C. or lower.

IPC Classes  ?

• C07C 17/386 - Separation; Purification; Stabilisation; Use of additives by distillation with auxiliary compounds

Abstract

Provided are: a solvent composition that contains monochlorotrifluoropropene and a perfluoroolefin having a boiling point of 30-120°C at normal pressure; a cleaning agent that contains the solvent composition; a cleaning method in which the cleaning agent is used; a coating film-forming composition that contains the solvent composition; a method for producing a substrate having a coating film by using the coating film-forming composition; a solvent composition which has no adverse effect on the global environment when an aerosol containing the solvent composition is used, has little effect on resin materials, exhibits sufficient volatility and exhibits excellent solubility of oils and the like; and applications of these.

IPC Classes  ?

• C11D 7/30 - Halogenated hydrocarbons
• C11D 7/50 - Solvents
• C09D 7/63 - Additives non-macromolecular organic
• C09K 3/30 - Materials not provided for elsewhere for aerosols

Abstract

71471471471471414 are present at quantities effective for forming the azeotropic composition or the pseudoazeotropic composition. Also provided are a cleaning agent, a solvent, an aerosol and a heat transfer medium that contain the azeotropic composition, the pseudoazeotropic composition or the composition.

IPC Classes  ?

• C11D 7/30 - Halogenated hydrocarbons
• C11D 7/50 - Solvents
• C09K 5/04 - Materials undergoing a change of physical state when used the change of state being from liquid to vapour or vice-versa
• C09K 3/30 - Materials not provided for elsewhere for aerosols

Abstract

A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B). A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B). [(R1)b(R2)m(OR3)lSiOn/2]  (1) A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B). [(R1)b(R2)m(OR3)lSiOn/2]  (1) [In the formula, R1 is a group represented by following formula.] A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B). [(R1)b(R2)m(OR3)lSiOn/2]  (1) [In the formula, R1 is a group represented by following formula.] A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B). [(R1)b(R2)m(OR3)lSiOn/2]  (1) [In the formula, R1 is a group represented by following formula.] [(R4)pSiOq/2]  (2)

IPC Classes  ?

• G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
• C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
• C09D 183/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen

Abstract

A new photosensitive resin composition based on a polysiloxane, that is, a negative photosensitive resin composition is provided. A negative photosensitive resin composition includes (A) a polysiloxane compound containing a first structural unit represented by the following general formula (1), (B) a photoinduced curing accelerator, and (C) a solvent. A new photosensitive resin composition based on a polysiloxane, that is, a negative photosensitive resin composition is provided. A negative photosensitive resin composition includes (A) a polysiloxane compound containing a first structural unit represented by the following general formula (1), (B) a photoinduced curing accelerator, and (C) a solvent. [(Rx)bR1mSiOn/2]  (1)

IPC Classes  ?

• G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
• G03F 7/004 - Photosensitive materials
• G03F 7/32 - Liquid compositions therefor, e.g. developers
• G03F 7/38 - Treatment before imagewise removal, e.g. prebaking

Abstract

The metal material of the present disclosure includes: a metal base; and a film provided on a surface of the metal base and containing a fluorine-containing molybdenum compound, the fluorine-containing molybdenum compound being represented by the formula MoOxFy wherein x is a number from 0 to 2 and y is a number from 2 to 5.

IPC Classes  ?

• C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material

Abstract

An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.

IPC Classes  ?

• C08L 27/12 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
• C08F 2/54 - Polymerisation initiated by wave energy or particle radiation by X-rays or electrons
• C08F 14/18 - Monomers containing fluorine

Abstract

xxxxxxxxxxxx6xxxx are deposited or coated, wherein clogging or contamination of the manufacturing apparatus can be avoided.

IPC Classes  ?

• H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting

Abstract

A dry etching method according to an embodiment of the present disclosure includes reacting an etching target film formed on a surface of a workpiece with a β-diketone and nitrogen dioxide to etch the etching target film in a non-plasma state, the etching target film containing a metal having an M-O bond energy of 5 eV or higher or an oxide of the metal.

IPC Classes  ?

• H01L 21/311 - Etching the insulating layers
• H01L 21/3213 - Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
• H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

Abstract

22-Cl bond, sulfine compounds having a S(=O)-Cl bond, and silicon compounds having a Si-Cl bond; a non-aqueous sodium-ion battery and a non-aqueous potassium-ion battery using said non-aqueous electrolyte solution; and a method for manufacturing the non-aqueous sodium-ion battery and a method for manufacturing the non-aqueous potassium-ion battery.

IPC Classes  ?

• H01M 10/054 - Accumulators with insertion or intercalation of metals other than lithium, e.g. with magnesium or aluminium
• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

A bracket (3) is formed in the shape of a rectangular cross-section tube, and has a first opening portion (4) joined to a vehicle cabin interior-side surface (1a) of a windshield (1). A second opening portion (5) is formed in a stair-like shape and is opened toward the vehicle interior side. Guide rails (24A, 24B) are provided at height positions along front-back-direction edges (5f, 5g), and hold plate members (6A, 6B) thereon. Electronic devices (18A, 18B, 18C) such as a camera are disposed in device housing spaces (14, 15, 16) partitioned by plate members (6A, 6B). Accordingly, it is possible to gather and arrange a plurality of electronic devices (18) in the bracket (3).

IPC Classes  ?

• B60R 11/00 - Arrangements for holding or mounting articles, not otherwise provided for

Abstract

One embodiment of the present invention provides a nonwoven fabric containing silk fibers in which an abs intensity ratio [abs (1650)/abs (1620)], which is a ratio of an intensity of a peak positioned in a vicinity of 1650 cm−1 [abs (1650)] in an infrared absorption spectrum to an intensity of a peak positioned in a vicinity of 1620 cm−1 [abs (1620)] in an infrared absorption spectrum, is larger than 0.65 and 1.90 or less, and a method for producing the nonwoven fabric containing silk fibers.

IPC Classes  ?

• A61L 15/32 - Proteins, polypeptides; Degradation products or derivatives thereof, e.g. albumin, collagen, fibrin, gelatin
• C12N 5/074 - Adult stem cells
• A61L 27/22 - Polypeptides or derivatives thereof
• A61L 27/50 - Materials characterised by their function or physical properties
• D04H 1/4266 - Natural fibres not provided for in group  
• D01F 4/02 - Monocomponent artificial filaments or the like of proteins; Manufacture thereof from fibroin
• D01D 5/00 - Formation of filaments, threads, or the like
• D04H 1/728 - Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres characterised by the method of forming fleeces or layers, e.g. reorientation of fibres the fibres being randomly arranged by electro-spinning

Abstract

There is provided a method for producing lithium difluorophosphate in which difluorophosphate ester reacts with a lithium salt compound in a nonaqueous organic solvent without using water as a raw material, a method for producing a difluoro phosphate ester including a step of allowing a dihalophosphate ester to react with a fluorinating agent having a concentration of contained hydrogen fluoride of 15 mol % or less in a nonaqueous organic solvent; lithium difluorophosphate in which a value of a relational expression (d90-d10)/MV represented by d90 which is a particle size at which a volume cumulative distribution is 90%, d10 which is a particle size at which a volume cumulative distribution is 10%, and MV which is a volume average particle size is 10 or less; and methods for producing a nonaqueous electrolytic solution and a nonaqueous secondary battery using the production method described above.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• C01B 25/455 - Phosphates containing halogen
• C07F 9/146 - Esters of phosphorous acids containing P-halide groups

Abstract

1 is a group represented by the following formula: 3 fluoroalkyl group; b is an integer of 1 to 3; m is an integer of 0 to 2; n is an integer of 1 to 3; and a relationship of b+m+n=4 is satisfied.

IPC Classes  ?

• H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
• H01L 21/311 - Etching the insulating layers
• C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
• G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
• G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Abstract

Provided are a novel non-aqueous electrolyte capable of suppressing an increase in initial resistance, and a non-aqueous electrolyte secondary battery using the same. The non-aqueous electrolyte contains (I) a compound represented by general formula [1a], (II) a solute, and (III). The non-aqueous electrolyte secondary battery contains the non-aqueous electrolyte.　[1a]: M+22-N-C(=O)-R]-(In general formula [1a], X represents a halogen atom, R represents a -CN group or -OCN group, and M+ represents an alkali metal ion.)

IPC Classes  ?

• H01M 4/66 - Selection of materials
• H01M 10/052 - Li-accumulators
• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

The present disclosure provides: an electrolyte for a non-aqueous sodium ion battery, the electrolyte including (I) fluorosulfate, (II) at least one type selected from the group consisting of compounds represented by specific general formulae (1)-(9), vinylene carbonate, tris(trimethylsilyl)borate, and tris(trimethylsilyl)phosphate, (III) sodium, and (IV) a non-aqueous solvent; a non-aqueous sodium ion battery provided with at least a positive electrode, a negative electrode, and the electrolyte for the non-aqueous sodium ion battery; and a method for producing the non-aqueous sodium ion battery.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 10/054 - Accumulators with insertion or intercalation of metals other than lithium, e.g. with magnesium or aluminium
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0569 - Liquid materials characterised by the solvents
• H01M 10/058 - Construction or manufacture

Abstract

The present disclosure provides: an electrolyte for a non-aqueous sodium ion battery, the electrolyte including (I) a non-aqueous solvent, (II) sodium, and (III) fluorosulfate, the content of (III) being 0.05-10.00 wt% relative to the total amount of the electrolyte for the non-aqueous sodium ion battery, and the content of a chain carbonate relative to the total amount of (I) being 0-70 wt%; a non-aqueous sodium ion battery provided with at least a positive electrode, a negative electrode, and the electrolyte for the non-aqueous sodium ion battery; and a method for producing the non-aqueous sodium ion battery.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 10/054 - Accumulators with insertion or intercalation of metals other than lithium, e.g. with magnesium or aluminium
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0569 - Liquid materials characterised by the solvents
• H01M 10/058 - Construction or manufacture

Abstract

A method for producing a curved glass plate which exhibits little distortion when used as a glass laminate, and a glass laminate for use in a vehicle which exhibits little distortion, are provided by: a method for producing a curved glass plate provided with a step (A) for heating flat glass in a heating furnace, a step (B) for conveying the flat glass heated in step (A) to a press-forming device, and a step (C) for molding a curved glass plate which has a concave surface and a convex surface by bending the flat glass using the press-forming device, wherein the surface of the flat glass on the side thereof which will become the concave surface in step (C) is more forcefully cooled in step (B) than is the surface on the side thereof which will become the convex surface in step (C); and a glass laminate for use in a vehicle which has a sight-through distortion of 1.5 minutes or less in a test region A as stipulated by JISR3212 (2015).

IPC Classes  ?

• C03B 23/03 - Re-forming glass sheets by bending by press-bending between shaping moulds
• C03C 27/12 - Laminated glass

Abstract

222.

IPC Classes  ?

• H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting

Abstract

22 into contact with the surface of an object to be treated.

IPC Classes  ?

• H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting

Abstract

A tungsten hexafluoride manufacturing method of the present invention includes a reaction step of reacting tungsten with a gas of a fluorine element-containing compound so as to obtain a mixture that contains tungsten hexafluoride and hydrogen fluoride-containing impurities, and a discharge step of performing distillation of the mixture while performing a discharge operation at least two or more times during the distillation so as to obtain tungsten hexafluoride, the discharge operation being an operation in which a storage operation and a purge operation are alternately performed.

IPC Classes  ?

• C01G 41/04 - Halides

Abstract

Please substitute the new Abstract submitted herewith for the original Abstract: The present disclosure provides a surface treatment agent capable of not only being prepared by dissolving raw materials in a short time but also exerting a good water repellency imparting effect, and a method for manufacturing a surface treated body with the use of the surface treatment agent. The surface treatment agent according to the present disclosure includes the following components: (I) at least one kind selected from the group consisting of silicon compounds represented by the following formulas (1) and (2); (II) at least one kind selected from the group consisting of a nitrogen-containing heterocyclic compound represented by the following general formula (3), a nitrogen-containing heterocyclic compound represented by the following general formula (4) and imidazole; (III) an organic solvent; and (IV) at least one kind selected from the group consisting of silicon compounds represented by the following formulas (5) and (6). Please substitute the new Abstract submitted herewith for the original Abstract: The present disclosure provides a surface treatment agent capable of not only being prepared by dissolving raw materials in a short time but also exerting a good water repellency imparting effect, and a method for manufacturing a surface treated body with the use of the surface treatment agent. The surface treatment agent according to the present disclosure includes the following components: (I) at least one kind selected from the group consisting of silicon compounds represented by the following formulas (1) and (2); (II) at least one kind selected from the group consisting of a nitrogen-containing heterocyclic compound represented by the following general formula (3), a nitrogen-containing heterocyclic compound represented by the following general formula (4) and imidazole; (III) an organic solvent; and (IV) at least one kind selected from the group consisting of silicon compounds represented by the following formulas (5) and (6).

IPC Classes  ?

• C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
• G03F 7/40 - Treatment after imagewise removal, e.g. baking
• C09D 183/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen

Abstract

This hydrochlorofluoroolefin-based novel composition contains Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water. In this composition, the proportion of Z-1-chloro-3,3,3-trifluoropropene is 55.00-99.98 mass%, the proportion of 1-chloro-1,3,3,3-tetrafluoropropane is 0.01-44.99 mass%, and the proportion of water is 0.01-10.00 mass%, relative to the total amount of Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water.

IPC Classes  ?

• B08B 3/04 - Cleaning involving contact with liquid
• C07C 19/10 - Acyclic saturated compounds containing halogen atoms containing fluorine and chlorine
• C07C 21/18 - Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine
• C11D 17/08 - Detergent materials or soaps characterised by their shape or physical properties capsuled
• C11D 7/50 - Solvents
• F25B 1/00 - Compression machines, plants or systems with non-reversible cycle
• C09K 5/04 - Materials undergoing a change of physical state when used the change of state being from liquid to vapour or vice-versa

Abstract

The vehicle rear information acquisition system of the disclosure includes: a back window at a rear of a vehicle; and an information acquisition device disposed inside the vehicle, opposing the back window, and configured to apply and/or receive light to acquire information from outside the vehicle, the back window including a glass plate and a coating film on at least a part of a surface of the glass plate, and having a privacy region for protecting privacy inside the vehicle and an information acquisition region opposing the information acquisition device and transmitting the light, the privacy region having the coating film on the surface of the glass plate, the privacy region having a visible light transmittance of 10% or less, the information acquisition region having a visible light transmittance of 25% or more.

IPC Classes  ?

• B60J 3/00 - Antiglare equipment associated with windows or windscreens; Sun visors for vehicles
• B60J 1/18 - Windows; Windscreens; Accessories therefor arranged at the vehicle rear
• C03C 4/08 - Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
• C03C 17/00 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating

Abstract

The present disclosure provides: a nonaqueous electrolytic solution containing a specific compound represented by general formula (1), a solute, and a nonaqueous organic solvent; a nonaqueous electrolytic solution battery comprising a positive electrode, a negative electrode and the nonaqueous electrolytic solution; and a method for producing a nonaqueous electrolytic solution battery having a step for preparing the nonaqueous electrolytic solution and a step for filling an empty cell provided with at least a positive electrode and a negative electrode, with the nonaqueous electrolytic solution.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

A defogging structure of a windowpane of a movable body in which an information acquisition device configured to acquire information from an exterior of the movable body by at least one of emitting light or receiving light can be arranged in an interior of the movable body, the defogging structure including: a windowpane having an information acquisition area through which at least one of light emitted by the information acquisition device or light to be received by the information acquisition device passes; a defogging sheet including a resin film and a defogger, the defogging sheet being adhered to the information acquisition area of the windowpane; and a transparent resin adhesive layer that allows the resin film of the defogging sheet to be adhered to the windowpane, wherein a resin constituting the transparent resin adhesive layer has a Tg of −20° C. to −50° C., and a shear storage modulus of 0.5×105 Pa to 2.0×105 Pa.

IPC Classes  ?

• B60J 1/00 - Windows; Windscreens; Accessories therefor
• H05B 3/84 - Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
• B60S 1/08 - Wipers or the like, e.g. scrapers characterised by the drive electrically driven

Abstract

The present invention provides a nonaqueous electrolyte battery which has a low internal resistance after the initial charge and discharge, while having excellent low-temperature output characteristics after storage at high temperatures. The present invention contains a compound represented by general formula (1) as a component of a nonaqueous electrolyte solution. In the formula, X1 represents a carbon atom or a sulfur atom; each of Y1 and Y2 represents an oxygen atom or a methylene group that may be substituted by a halogen atom; r represents 1 or 2; and R1 represents a group represented by general formula (2) or a group represented by general formula (3), provided that (i) in cases where X1 is a sulfur atom and Y1 and Y2 are methylene groups and (ii) in cases where X1 is a carbon atom and Y1 and Y2 are oxygen atoms, R1 is a group represented by general formula (2). The present invention provides a nonaqueous electrolyte battery which has a low internal resistance after the initial charge and discharge, while having excellent low-temperature output characteristics after storage at high temperatures. The present invention contains a compound represented by general formula (1) as a component of a nonaqueous electrolyte solution. In the formula, X1 represents a carbon atom or a sulfur atom; each of Y1 and Y2 represents an oxygen atom or a methylene group that may be substituted by a halogen atom; r represents 1 or 2; and R1 represents a group represented by general formula (2) or a group represented by general formula (3), provided that (i) in cases where X1 is a sulfur atom and Y1 and Y2 are methylene groups and (ii) in cases where X1 is a carbon atom and Y1 and Y2 are oxygen atoms, R1 is a group represented by general formula (2).

IPC Classes  ?

• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0569 - Liquid materials characterised by the solvents
• H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
• H01M 4/38 - Selection of substances as active materials, active masses, active liquids of elements or alloys

Abstract

Provided are a nonaqueous electrolyte solution which makes it possible to further improve low temperature characteristics and high temperature storage characteristics; and a nonaqueous electrolyte secondary battery comprising such a nonaqueous electrolyte solution. The present nonaqueous electrolyte solution comprises: (I) a first additive represented by the following formula [1], (II) at least one second additive selected from the group consisting of the compounds represented by the following formulae [2] to [5], difluoro(oxalato)borate, bis(oxalato)borate, tetrafluoro(oxalato)phosphate, difluorobis(oxalato)phosphate, tris(oxalato)phosphate, difluorophosphate, and fluorosulfonate, (III) a nonaqueous organic solvent, and (IV) a solute. Provided are a nonaqueous electrolyte solution which makes it possible to further improve low temperature characteristics and high temperature storage characteristics; and a nonaqueous electrolyte secondary battery comprising such a nonaqueous electrolyte solution. The present nonaqueous electrolyte solution comprises: (I) a first additive represented by the following formula [1], (II) at least one second additive selected from the group consisting of the compounds represented by the following formulae [2] to [5], difluoro(oxalato)borate, bis(oxalato)borate, tetrafluoro(oxalato)phosphate, difluorobis(oxalato)phosphate, tris(oxalato)phosphate, difluorophosphate, and fluorosulfonate, (III) a nonaqueous organic solvent, and (IV) a solute.

IPC Classes  ?

• H01M 10/0567 - Liquid materials characterised by the additives
• H01M 10/0569 - Liquid materials characterised by the solvents
• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
• C07F 9/32 - Esters thereof

Abstract

The surface treatment composition of the present invention is a surface treatment composition including a silylating agent and a solvent that is supplied as a vapor to the surface of a wafer having an uneven pattern on the surface to form a water-repellent protective film on the surface, wherein the silylating agent includes a trialkylsilylamine, the solvent includes at least one or more selected from the group consisting of glycol ether acetate and glycol acetate, and the total content of glycol ether acetate and glycol acetate is 50 mass% or more in the total of 100 mass% of solvent.

IPC Classes  ?

• C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
• H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting

Abstract

The present invention provides: a nonaqueous electrolyte solution which is used in a nonaqueous electrolyte battery having a low initial resistance value; and a compound which is contained in this nonaqueous electrolyte solution. A nonaqueous electrolyte solution according to the present invention contains a compound represented by formula (1), a solute and a nonaqueous organic solvent. In general formula (1), each of R1 and R2 represents PO(Rf)2 or SO2Rf, and Rf represents, for example, a fluorine atom; each of R3 and R4 represents, for example, a lithium ion, or alternatively R3 and R4 may form a ring structure together with a nitrogen atom to which the moieties are bonded, and in this case, R3 and R4 form an alkylene group in combination with each other; an oxygen atom may be contained between carbon atom-carbon atom bonds in the alkylene group; a side chain thereof may have an alkyl group; and an arbitrary hydrogen atom in the alkyl group and the alkylene group may be substituted by a fluorine atom.

IPC Classes  ?

• H01M 10/0568 - Liquid materials characterised by the solutes
• H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

The purpose of the present disclosure is to provide a novel surface modifier which can improve the surface roughness of a fluorine-containing resin suitable for use as a partition wall material when introduced to a photosensitive resin composition. The present disclosure is a surface modifier containing a fluorine-containing resin (A) having a structure represented by general formula (1). (In general formula (1), Ra's each independently represent a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group, or a fluorine atom, and an arbitrary number of hydrogen atoms in the alkyl group are substituted with fluorine atoms.)

IPC Classes  ?

• C08F 20/26 - Esters containing oxygen in addition to the carboxy oxygen
• C08F 299/00 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
• C09K 3/00 - Materials not provided for elsewhere
• G03F 7/004 - Photosensitive materials
• G03F 7/033 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
• G09F 9/30 - Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
• H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
• H05B 33/12 - Light sources with substantially two-dimensional radiating surfaces
• H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
• H05B 33/14 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material
• H05B 33/22 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Abstract

The purpose of the present disclosure is to provide a photosensitive resin composition that can improve the surface roughness of a fluorine-containing resin suitable for use as a partition material. The present disclosure provides a photosensitive resin composition comprising: a fluorine-containing resin having a fluorine atom content rate of 20 to 60 mass%; a fluorine-containing surface conditioner containing a fluorine-based compound having a weight average molecular weight (Mw) of 1,000 to 15,000; a base resin; a solvent; and a photopolymerization initiator.

IPC Classes  ?

• G03F 7/004 - Photosensitive materials
• G03F 7/033 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
• G09F 9/30 - Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
• H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
• H05B 33/12 - Light sources with substantially two-dimensional radiating surfaces
• H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
• H05B 33/14 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material
• H05B 33/22 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Abstract

A solder bonded structure in which a glass plate and a metal component are bonded to each other, and which is sequentially provided with the glass plate, a conductive layer, a metal layer, a solder layer and the metal component in this order. With respect to this solder bonded structure, the conductive layer contains a metal component and a glass component.

IPC Classes  ?

• H01R 4/02 - Soldered or welded connections
• B23K 1/00 - Soldering, e.g. brazing, or unsoldering
• B23K 1/19 - Soldering, e.g. brazing, or unsoldering taking account of the properties of the materials to be soldered
• B60J 1/00 - Windows; Windscreens; Accessories therefor
• C03C 27/12 - Laminated glass
• H01Q 1/32 - Adaptation for use in or on road or rail vehicles
• H01R 43/02 - Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors for soldered or welded connections

Abstract

Provided is a resin composition comprising a polymer that has a structural unit derived from a polymerizable monomer represented by general formula (I). In general formula (I): R1is a group including at least one polymerizable group; R2and R3are each independently a hydrogen atom or a straight-chain or branched aliphatic hydrocarbon group; R4is a hydrogen atom or a straight-chain or branched aliphatic hydrocarbon group, where some or all of the hydrogen atoms in the aliphatic hydrocarbon group may be substituted by an acid group or a hydroxy group; R5is a bi-, tri-, or tetravalent straight-chain or branched aliphatic hydrocarbon group, where some or all of the hydrogen atoms in the aliphatic hydrocarbon group may be substituted by a fluorine atom or a hydroxy group; R6and R7each independently represent a fluorine-containing alkyl group; n is an integer of 1-5; when n is 2 or greater, a plurality of R2may be identical or different, and a plurality of R3may be identical or different; m is an integer of 1-3; and when m is 2 or 3, a plurality of R6may be identical or different, and a plurality of R7 may be identical or different.

IPC Classes  ?

• C08F 16/02 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical by an alcohol radical
• C08F 20/12 - Esters of monohydric alcohols or phenols
• C08L 29/02 - Homopolymers or copolymers of unsaturated alcohols
• C08L 33/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
• G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
• C07C 69/653 - Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters

Abstract

A method for selectively killing protein aggregate-containing cells, a kit thereof, a therapeutic agent for the protein misfolding disease, and an agent for removing a protein aggregate from a blood derivative are provided. The method for selectively killing cells according to one embodiment acts a fluorine-based alcohol or a compound represented by general formula (1) on cells as a compound for detecting a protein aggregate and selectively kills protein aggregate-containing cells. A method for selectively killing protein aggregate-containing cells, a kit thereof, a therapeutic agent for the protein misfolding disease, and an agent for removing a protein aggregate from a blood derivative are provided. The method for selectively killing cells according to one embodiment acts a fluorine-based alcohol or a compound represented by general formula (1) on cells as a compound for detecting a protein aggregate and selectively kills protein aggregate-containing cells.

IPC Classes  ?

• A61K 31/045 - Hydroxy compounds, e.g. alcohols; Salts thereof, e.g. alcoholates
• A61P 7/00 - Drugs for disorders of the blood or the extracellular fluid