The present disclosure aims to provide a novel surface modifier that can be introduced into a photosensitive resin composition to improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a surface modifier containing a fluororesin (A) having a structure represented by the following formula (1):
The present disclosure aims to provide a novel surface modifier that can be introduced into a photosensitive resin composition to improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a surface modifier containing a fluororesin (A) having a structure represented by the following formula (1):
The present disclosure aims to provide a novel surface modifier that can be introduced into a photosensitive resin composition to improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a surface modifier containing a fluororesin (A) having a structure represented by the following formula (1):
wherein each Ra independently represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group or a fluorine atom, and any number of hydrogen atoms in the alkyl group are replaced with fluorine atoms.
G03F 7/033 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Provided is a liquid-repellent agent which enables the production of partition walls that are less susceptible to reduction in liquid repellency even when subjected to oxygen plasma treatment or UV-ozone treatment. A liquid-repellent agent (A) of the present invention contains a polymer containing: a polymerization unit (a1) derived from a hydrocarbon having an alkyl group in which at least one hydrogen atom is replaced with a fluorine atom and which may contain an ether-oxygen atom; and one or two or more types of polymerization units (a2) other than the polymerization unit (a1), wherein the number of ethylenically unsaturated double bonds in the polymerization units (a1) and (a2) is 3 or greater.
The present disclosure aims to provide a photosensitive resin composition that can improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a photosensitive resin composition containing: a fluororesin having a fluorine atom content of 20 to 60 mass %; a fluorine-containing surface modifier including a fluorine compound having a weight average molecular weight (Mw) of 1,000 to 15,000; a base resin; a solvent; and a photopolymerization initiator.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
H10K 59/122 - Pixel-defining structures or layers, e.g. banks
4.
NONAQUEOUS ELECTROLYTIC SOLUTION, NONAQUEOUS ELECTROLYTIC SOLUTION BATTERY, AND COMPOUND
According to a nonaqueous electrolytic solution containing: (I) at least one selected from the group consisting of a compound represented by General Formula (1) described in the specification (for example, a compound represented by the following Formula (1a)) and a compound represented by General Formula (2) (for example, a compound represented by the following Formula (2a)); (II) a solute; and (III) a nonaqueous organic solvent, a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used in the above nonaqueous electrolytic solution can be provided;
According to a nonaqueous electrolytic solution containing: (I) at least one selected from the group consisting of a compound represented by General Formula (1) described in the specification (for example, a compound represented by the following Formula (1a)) and a compound represented by General Formula (2) (for example, a compound represented by the following Formula (2a)); (II) a solute; and (III) a nonaqueous organic solvent, a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used in the above nonaqueous electrolytic solution can be provided;
Provided is a method for producing a fluorine-containing polymer with little lot-to-lot variation in weight average molecular weight. The method for producing a fluorine-containing polymer of the present invention relates to a method for producing a fluorine-containing polymer containing a repeating unit of formula (1) and a repeating unit of formula (2), which includes: fluorine-containing monomer synthesis including reacting a diol of formula (3) with at least one selected from the group consisting of unsaturated carboxylic acids, esters of the unsaturated carboxylic acids, acid halides of the unsaturated carboxylic acids, and anhydrides of the unsaturated carboxylic acids, to obtain a composition containing a fluorine-containing monomer of formula (4) as a main reaction product and a fluorine-containing monomer of formula (5) as a minor reaction product; fluorine-containing monomer purification including removing the fluorine-containing monomer of formula (5) from the composition to adjust the amount of the fluorine-containing monomer of formula (5), expressed in parts per million based on the mass of the fluorine-containing monomer of formula (4), to 1500 ppm or less; and polymerization including performing a polymerization reaction of the composition obtained after the fluorine-containing monomer purification to give the fluorine-containing polymer containing the repeating unit of formula (1) and the repeating unit of formula (2),
C07C 67/08 - Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
C07C 67/54 - Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation by distillation
A selective film deposition method includes exposing a substrate having a structure on which a first surface region containing a metal element and a second surface region containing a nonmetal inorganic material are both exposed, to a solution containing an organic substance represented by formula (1) shown below and a solvent to deposit a film of the organic substance on the first surface region selectively over the second surface region: R1(X)m (1) wherein R1 is a C4-C100 hydrocarbon group optionally containing a heteroatom or a halogen atom, and m hydrogen atoms of the hydrocarbon group are replaced with X; X is —PO3(R2)2, —O—PO3(R2)2, —CO2R2, —SR2, or —SSR1; each R2 is a hydrogen atom or a C1-C6 alkyl group; and m is a positive integer, and m/r is 0.01 to 0.25 where r is the number of carbons of the hydrocarbon group.
B05D 1/32 - Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
B05D 3/10 - Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
7.
Nonaqueous Electrolytic Solution, Nonaqueous Electrolytic Solution Battery, and Compound
Please substitute the new Abstract submitted herewith for the original Abstract: According to a nonaqueous electrolytic solution containing: a compound represented by the General Formula (1); a solute; and a nonaqueous organic solvent, a nonaqueous electrolytic solution battery, and a compound represented by General Formula (1), a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used for the above nonaqueous electrolytic solution are provided,
Please substitute the new Abstract submitted herewith for the original Abstract: According to a nonaqueous electrolytic solution containing: a compound represented by the General Formula (1); a solute; and a nonaqueous organic solvent, a nonaqueous electrolytic solution battery, and a compound represented by General Formula (1), a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used for the above nonaqueous electrolytic solution are provided,
According to a nonaqueous electrolytic solution containing: a compound represented by General Formula (1); a solute; and a nonaqueous organic solvent, a nonaqueous electrolytic solution battery, and a compound represented by the General Formula (1), a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used for the above nonaqueous electrolytic solution are provided.
According to a nonaqueous electrolytic solution containing: a compound represented by General Formula (1); a solute; and a nonaqueous organic solvent, a nonaqueous electrolytic solution battery, and a compound represented by the General Formula (1), a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used for the above nonaqueous electrolytic solution are provided.
To provide a method and a composition for producing a geometric isomer (isomer 2) represented by a certain formula (1) by geometrically isomerizing a corresponding geometric isomer (isomer 1) represented by the certain formula (1), the method including, contacting the geometric isomer (isomer 1) represented by the certain formula (1) with a compound (A) which is at least one of a dichlorotrifluoropropane and hydrogen chloride in a gas phase.
C07C 17/358 - Preparation of halogenated hydrocarbons by reactions not affecting the number of carbon or halogen atoms in the molecules by isomerisation
A wet etching solution according to the present disclosure is an etching solution for selectively removing a second metal layer made of at least one of a cobalt-based material or a copper-based material from a semiconductor substrate while suppressing etching of a first metal layer made of a tungsten-based material, the first metal layer and the second metal layer being co-present on the semiconductor substrate, an oxide layer being formed on a surface layer of at least the at least one of a cobalt-based material or a copper-based material. The wet etching solution includes a solution in which a β-diketone containing a trifluoromethyl group and a carbonyl group bonded together is dissolved in an organic solvent.
Composition; Cleaning Agent, Aerosol Composition, Draining Agent, Foaming Agent, or Heat-Transfer Medium Containing the Composition; System Using the Heat-Transfer Medium; And Method of Cleaning Articles
A novel hydrochlorofluoroolefin-based composition contains Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water. In the composition, the proportions of Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water are 55.00 mass % to 99.98 mass %, 0.01 mass % to 44.99 mass %, and 0.01 mass % to 10.00 mass %, respectively, with respect to the total amount of Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water.
C09D 4/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
Provided is a fluorine-containing polymer for use in a film-forming solution capable of forming a film that is less likely to leave a residue when immersed in a developer. The fluorine-containing polymer of the present invention contains a repeating unit represented by the following formula (1), and a repeating unit represented by the following formula (2) in an amount, expressed in parts per million based on a mass of the repeating unit of formula (1), of 1500 ppm or less:
Provided is a fluorine-containing polymer for use in a film-forming solution capable of forming a film that is less likely to leave a residue when immersed in a developer. The fluorine-containing polymer of the present invention contains a repeating unit represented by the following formula (1), and a repeating unit represented by the following formula (2) in an amount, expressed in parts per million based on a mass of the repeating unit of formula (1), of 1500 ppm or less:
Provided is a fluorine-containing polymer for use in a film-forming solution capable of forming a film that is less likely to leave a residue when immersed in a developer. The fluorine-containing polymer of the present invention contains a repeating unit represented by the following formula (1), and a repeating unit represented by the following formula (2) in an amount, expressed in parts per million based on a mass of the repeating unit of formula (1), of 1500 ppm or less:
wherein R1 and R2 are each independently a hydrogen atom, a methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, sec-butyl, or t-butyl group; R3 and R4 are each independently a hydrogen atom, a methyl group, or an ethyl group; R5 is a hydrogen atom or a trifluoromethyl group; and R6 is a hydrogen atom, a chlorine atom, a methyl group, or a trifluoromethyl group.
A surface treatment composition of the present invention is a surface treatment composition that are supplied as a vapor to a surface of a wafer having an uneven pattern on the surface and used to form a water-repellent protective film on the surface, the surface treatment composition containing a silylating agent and a solvent, in which the silylating agent contains a trialkylsilylamine, the solvent contains at least one or more selected from the group consisting of glycol ether acetate and glycol acetate, and a total content of the glycol ether acetate and the glycol acetate is 50% by mass or more in 100% by mass of a total amount of the solvent.
H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
C23C 16/02 - Pretreatment of the material to be coated
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating
A rechargeable battery is disclosed. The rechargeable battery includes an anode, a cathode including a lithium-ion intercalation host, and an electrolyte including a solvent and a halogen-containing compounding that functions as an active cathode conversion material, wherein the electrolyte is in contact with the anode and the cathode.
H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
H01M 10/0567 - Liquid materials characterised by the additives
H01M 4/58 - Selection of substances as active materials, active masses, active liquids of polyanionic structures, e.g. phosphates, silicates or borates
H01M 10/0569 - Liquid materials characterised by the solvents
H01M 10/0568 - Liquid materials characterised by the solutes
H01M 4/1397 - Processes of manufacture of electrodes based on inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy
H01M 10/0585 - Construction or manufacture of accumulators having only flat construction elements, i.e. flat positive electrodes, flat negative electrodes and flat separators
15.
APPLICATION LIQUID FOR OPTICAL MEMBER, POLYMER, PHOTOSENSITIVE APPLICATION LIQUID, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM, AND METHOD FOR PRODUCING POLYMER
An application liquid for an optical member comprises a component (A) consisting of metal fine particles (A-1) and/or a metal compound (A-2) including a constituent unit represented by the following general formula (1-A), a stabilizer (B) consisting of a polysiloxane compound including a constituent unit represented by the following general formula (1); and a solvent (C),
An application liquid for an optical member comprises a component (A) consisting of metal fine particles (A-1) and/or a metal compound (A-2) including a constituent unit represented by the following general formula (1-A), a stabilizer (B) consisting of a polysiloxane compound including a constituent unit represented by the following general formula (1); and a solvent (C),
[(R1)bMOc/2] (1-A)
An application liquid for an optical member comprises a component (A) consisting of metal fine particles (A-1) and/or a metal compound (A-2) including a constituent unit represented by the following general formula (1-A), a stabilizer (B) consisting of a polysiloxane compound including a constituent unit represented by the following general formula (1); and a solvent (C),
[(R1)bMOc/2] (1-A)
[(R2)d(R3)e(OR4)fSiOg/2] (1)
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
The present disclosure provides a wet etching method including pretreating a metal-containing film on a substrate with a surface modification liquid and etching the metal-containing film with an etching liquid, wherein the etching liquid is a solution containing: a β-diketone with a trifluoromethyl group bonded to a carbonyl group; and an organic solvent, wherein the metal-containing film contains a metal element capable of forming a complex with the β-diketone, wherein the surface modification liquid contains an acidic substance against the metal element, and wherein the wet etching method is carried out through: a first step of bringing the surface modification liquid into contact with the metal-containing film, thereby forming an oxide layer of the metal element at a surface of the metal-containing film; and a second step of bringing the etching liquid into contact with the metal-containing film on which the oxide layer has been formed.
Provided is a lithium iodide nonaqueous solution containing: a nonaqueous solvent; and lithium iodide, the lithium iodide nonaqueous solution having a water content per unit of lithium iodide (Y/X) of 7 or lower and an acid-derived component content of 4000 ppm or lower, the water content per unit of lithium iodide (Y/X) being determined as a ratio of a water content Y (ppm) of the lithium iodide nonaqueous solution to a lithium iodide concentration X (% by weight) of the lithium iodide nonaqueous solution.
An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A),
An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A),
[(R2)d(R3)e(OR4)fSiOg/2] (1)
An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A),
[(R2)d(R3)e(OR4)fSiOg/2] (1)
[(R1)bMOc/2] (1-A)
An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A),
[(R2)d(R3)e(OR4)fSiOg/2] (1)
[(R1)bMOc/2] (1-A)
In the general formula (1), R2 is a group represented by a following general formula (1a).
An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A),
[(R2)d(R3)e(OR4)fSiOg/2] (1)
[(R1)bMOc/2] (1-A)
In the general formula (1), R2 is a group represented by a following general formula (1a).
Provided are a polyamide having a structural unit represented by General Formula [1], and the like. In General Formula [1], R1 is a divalent organic group represented by General Formula [2], and R2 is a divalent organic group. In General Formula [2], n1 and n2 are each independently an integer of 0 to 4, and in a case where a plurality of R3's are present, the plurality of R3's each independently represent a monovalent substituent.
C08G 69/32 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
C08J 3/09 - Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
There is provided a silicon compound represented by General Formula (x). There is also provided a reactive material containing a silicon compound represented by General Formula (x). In General Formula (x), in a case where a plurality of R1's are present, R1's are each independently a linear alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 3 to 10 carbon atoms, a cyclic alkyl group having 3 to 10 carbon atoms, a linear alkenyl group having 2 to 10 carbon atoms, a branched alkenyl group having 3 to 10 carbon atoms, or a cyclic alkenyl group having 3 to 10 carbon atoms, where all or part of hydrogen atoms in the alkyl group or the alkenyl group may be substituted with a fluorine atom, in a case where a plurality of R2's are present, R2's are each independently a linear alkyl group having 1 to 4 carbon atoms or a branched alkyl group having 3 or 4 carbon atoms, where all or part of hydrogen atoms in the alkyl group may be substituted with a fluorine atom, RA is an acid unstable group; a is an integer of 1 to 3, b is an integer of 0 to 2, and c is an integer of 1 to 3, where a+b+c=4 is satisfied; and n is an integer of 1 to 5.
There is provided a silicon compound represented by General Formula (x). There is also provided a reactive material containing a silicon compound represented by General Formula (x). In General Formula (x), in a case where a plurality of R1's are present, R1's are each independently a linear alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 3 to 10 carbon atoms, a cyclic alkyl group having 3 to 10 carbon atoms, a linear alkenyl group having 2 to 10 carbon atoms, a branched alkenyl group having 3 to 10 carbon atoms, or a cyclic alkenyl group having 3 to 10 carbon atoms, where all or part of hydrogen atoms in the alkyl group or the alkenyl group may be substituted with a fluorine atom, in a case where a plurality of R2's are present, R2's are each independently a linear alkyl group having 1 to 4 carbon atoms or a branched alkyl group having 3 or 4 carbon atoms, where all or part of hydrogen atoms in the alkyl group may be substituted with a fluorine atom, RA is an acid unstable group; a is an integer of 1 to 3, b is an integer of 0 to 2, and c is an integer of 1 to 3, where a+b+c=4 is satisfied; and n is an integer of 1 to 5.
C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
C08G 77/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
C08G 77/08 - Preparatory processes characterised by the catalysts used
Polybenzoxazole, Polyamide, Polyamide Solution, Insulating Material for High-Frequency Electronic Component, High-Frequency Electronic Component, High-Frequency Equipment, Insulating Material for Producing High-Frequency Electronic Component, Method for Producing Polyamide, Method for Producing Polybenzoxazole, Method for Producing Insulating Material for High-Frequency Electronic Component, and Diamine or Salt Thereof
Provided is a polybenzoxazole having a structural unit represented by General Formula [1]. In General Formula [1], R1 is a tetravalent organic group represented by General Formula [2], and R2 is a divalent organic group. In General Formula [2], two n’s are each independently an integer of 0 to 3, in a case where a plurality of R3′s are present, the plurality of R3′s each independently represent a monovalent substituent, and *1, *2, *3, and *4 each independently represent a bonding site, in which one of *1 and *2 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1], and one of *3 and *4 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1].
Provided is a polybenzoxazole having a structural unit represented by General Formula [1]. In General Formula [1], R1 is a tetravalent organic group represented by General Formula [2], and R2 is a divalent organic group. In General Formula [2], two n’s are each independently an integer of 0 to 3, in a case where a plurality of R3′s are present, the plurality of R3′s each independently represent a monovalent substituent, and *1, *2, *3, and *4 each independently represent a bonding site, in which one of *1 and *2 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1], and one of *3 and *4 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1].
Provided is a polybenzoxazole having a structural unit represented by General Formula [1]. In General Formula [1], R1 is a tetravalent organic group represented by General Formula [2], and R2 is a divalent organic group. In General Formula [2], two n’s are each independently an integer of 0 to 3, in a case where a plurality of R3′s are present, the plurality of R3′s each independently represent a monovalent substituent, and *1, *2, *3, and *4 each independently represent a bonding site, in which one of *1 and *2 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1], and one of *3 and *4 is bonded to an oxygen atom in General Formula [1] and the other is bonded to a nitrogen atom in General Formula [1].
C07C 215/80 - Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton of the same non-condensed six-membered aromatic ring containing at least two amino groups bound to the carbon skeleton
C08G 69/40 - Polyamides containing oxygen in the form of ether groups
C09D 177/06 - Polyamides derived from polyamines and polycarboxylic acids
C07C 213/02 - Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reactions involving the formation of amino groups from compounds containing hydroxy groups or etherified or esterified hydroxy groups
Fluorinated Diamine or Salt Thereof, Method for Producing Fluorinated Diamine or Salt Thereof, Polyamide, Method for Producing Polyamide, Polyamide Solution, Cyclized Polyamide, Method for Producing Cyclized Polyamide, Insulation for High-Frequency Electronic Component, Method for Producing Insulation for High-Frequency Electronic Component, High-Frequency Electronic Component, High-Frequency Appliance, and Insulating Material for Producing High-Frequency Electronic Component
Provided are a fluorinated diamine represented by General Formula [1A] or a salt of the fluorinated diamine; a polyamide including a structural unit derived from the diamine or the salt thereof; a cyclized polyamide; and the like. In General Formula [1A], in a case where a plurality of R1's are present, the plurality of R1's are each independently at least one selected from the group consisting of an alkyl group, an alkoxy group, a halogen atom, a haloalkyl group, and a haloalkoxy group, and two n's are each independently an integer of 0 to 3.
Provided are a fluorinated diamine represented by General Formula [1A] or a salt of the fluorinated diamine; a polyamide including a structural unit derived from the diamine or the salt thereof; a cyclized polyamide; and the like. In General Formula [1A], in a case where a plurality of R1's are present, the plurality of R1's are each independently at least one selected from the group consisting of an alkyl group, an alkoxy group, a halogen atom, a haloalkyl group, and a haloalkoxy group, and two n's are each independently an integer of 0 to 3.
C08G 69/32 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
C09D 177/06 - Polyamides derived from polyamines and polycarboxylic acids
23.
SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES AND SURFACE TREATMENT AGENT COMPOSITION
A surface treatment method for semiconductor substrates of the present invention is a treatment method of treating a main surface of a semiconductor substrate that has, on the main surface of the substrate, a pattern formation region in which a pattern having a concave-convex structure with a pattern dimension of 30 nm or less is formed and a bevel region which is formed on a periphery of the pattern formation region, the method including a surface treatment step of bringing a surface treatment agent composition including a silylating agent into contact with the pattern formation region and the bevel region on the main surface of the semiconductor substrate, in which, with respect to a surface of a silicon oxide substrate brought into contact with the surface treatment agent composition, an IPA receding contact angle is 3° or more at a room temperature of 25° C., and/or a water receding contact angle is 40° or more at the room temperature of 25° C.
A surface treatment method for a semiconductor substrate of the present invention is a treatment method of treating a main surface of a semiconductor substrate that has, on the main surface of the substrate, a pattern formation region in which a pattern having a concave-convex structure with a pattern dimension of 30 nm or less is formed and a pattern non-formation region in which no pattern is formed, the method including a surface treatment step of bringing a surface treatment agent composition including a silylating agent into contact with the pattern formation region and the pattern non-formation region on the main surface of the semiconductor substrate, in which, with respect to a surface of the pattern non-formation region after the surface treatment step, an IPA contact angle with 2-propanol is 2° or more at a room temperature of 25° C. and/or a water contact angle with pure water is 50° or more at the room temperature of 25° C.
The present disclosure is to provide a nonaqueous electrolytic solution for a nonaqueous electrolytic solution battery in which even if the nonaqueous electrolytic solution is applied to a positive electrode having a content of nickel of 30% by mass to 100% by mass in a metal contained in a positive electrode active material, an effect of improving output characteristics after cycle and an effect of reducing a deposition amount of a negative electrode current collector metal on a surface of a negative electrode after initial charging and discharging can be exerted in a well-balanced manner.
H01M 4/525 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy
The method of dry-etching silicon oxide of the present disclosure includes reacting silicon oxide with any one of the following (A) to (C): (A) a gaseous hydrogen fluoride and a gaseous organic amine compound, (B) a gaseous hydrogen fluoride salt of an organic amine compound, and (C) a gaseous hydrogen fluoride, a gaseous organic amine compound, and a gaseous hydrogen fluoride salt of an organic amine compound in a non-plasma state.
C09K 13/08 - Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
27.
ALKYLAMINE COMPOSITION AND METHOD FOR STORING SAID ALKYLAMINE COMPOSITION
The alkylamine composition of the present disclosure contains: an alkylamine represented by the following formula (1) in an amount of 99.5% by volume or more; and water in an amount of 10 ppm by mass or more and 100 ppm by mass or less:
The alkylamine composition of the present disclosure contains: an alkylamine represented by the following formula (1) in an amount of 99.5% by volume or more; and water in an amount of 10 ppm by mass or more and 100 ppm by mass or less:
The alkylamine composition of the present disclosure contains: an alkylamine represented by the following formula (1) in an amount of 99.5% by volume or more; and water in an amount of 10 ppm by mass or more and 100 ppm by mass or less:
wherein N is a nitrogen atom; R1 is a C1-C10 hydrocarbon group optionally having a ring, a heteroatom, or a halogen atom; R2 and R3 are each independently a hydrogen atom or a C1-C10 hydrocarbon group optionally having a ring, a heteroatom, or a halogen atom; provided that the hydrocarbon group, when it has a carbon number of 3 or more, may have a branched chain structure or a ring structure and that the heteroatom in the hydrocarbon group is a nitrogen atom, an oxygen atom, a sulfur atom, or a phosphorus atom; further, R1 and R2, when both of them are hydrocarbon groups having a carbon number of 1 or more, may be directly bonded to each other to form a ring structure; further, R1 or R2, which is directly bonded by a double bond to form a ring structure, may form an aromatic ring in the absence of R3; R1, R2, and R3 may be hydrocarbon groups which are the same as or different from one another; and R1 has at least one hydrogen atom at α carbon bonded to the nitrogen atom.
F17C 6/00 - Methods or apparatus for filling vessels not under pressure with liquefied or solidified gases
28.
SILICON-CONTAINING MONOMER MIXTURE, POLYSILOXANE, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PRODUCTION METHOD FOR CURED FILM, PATTERNED CURED FILM, AND PRODUCTION METHOD FOR PATTERNED CURED FILM
A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied.
A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied.
B
/
A + B
>
0
.04
A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied.
B
/
A + B
>
0
.04
A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied.
B
/
A + B
>
0
.04
Provided is a method of producing a light-emitting element, the method being capable of producing a light-emitting element including a first light emitting layer and banks on the first light emitting layer, without damaging the first light emitting layer. The method of producing a light-emitting element of the present disclosure includes: preparing a base element including a monochromatic first light emitting layer on a substrate; forming a patterned fluororesin film by disposing a photosensitive resin composition at least containing a fluororesin having a crosslinking site and a repeating unit derived from a hydrocarbon containing a fluorine atom, a solvent, and a photopolymerization initiator on the base element such that photosensitive resin composition partitions at least one region of the base element; and baking the patterned fluororesin film at a temperature of 200° C. or lower to cure the patterned fluororesin film.
H10K 71/20 - Changing the shape of the active layer in the devices, e.g. patterning
30.
Composition, Aerosol Composition, Cleaning Agent, Solvent, Silicone Solvent, Foaming Agent, Heat-Transfer Medium, Fire Extinguishing Agent, and Fumigant Containing the Composition, Heat-Transfer Device Containing the Heat-Transfer Medium, and System Containing the Heat-Transfer Device
An object is to provide a hydrofluoroolefin-based or hydrochlorofluoroolefin-based azeotropic or azeotropic-like composition. The azeotropic or azeotropic-like composition contains trans-1-chloro-3,3,3-trifluoropropene and 1-chloro-1,3,3,3-tetrafluoropropene. In the azeotropic or azeotropic-like composition, 1-chloro-1,3,3,3-tetrafluoropropene exists in an effective amount to form an azeotropic or azeotropic-like mixture with trans-1-chloro-3,3,3-trifluoropropene.
Provided is a method for stably supplying trimethylamine containing monomethylamine and/or dimethylamine as trace impurities at a constant makeup.
Provided is a method for stably supplying trimethylamine containing monomethylamine and/or dimethylamine as trace impurities at a constant makeup.
The present invention relates to a method for supplying a composition including keeping a storage container that encloses a composition therein at a constant temperature of 10° C. or higher to supply a gas of the composition to a predetermined device. The composition contains, in a gaseous phase, trimethylamine, dimethylethylamine, and at least one of dimethylamine or monomethylamine.
The sublimable film formation composition of the present invention includes a sublimable substance and a solvent in which a saturation solubility of the sublimable substance is more than 10% by mass.
C08J 3/09 - Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
A dry etching method including reacting silicon oxide with: gaseous hydrogen fluoride and a gaseous organic amine compound; a hydrogen fluoride salt of a gaseous organic amine compound; or gaseous hydrogen fluoride, a gaseous organic amine compound, and a hydrogen fluoride salt of a gaseous organic amine compound. The organic amine compound is an organic amine mixture containing at least two compounds represented by the following formula (1):
A dry etching method including reacting silicon oxide with: gaseous hydrogen fluoride and a gaseous organic amine compound; a hydrogen fluoride salt of a gaseous organic amine compound; or gaseous hydrogen fluoride, a gaseous organic amine compound, and a hydrogen fluoride salt of a gaseous organic amine compound. The organic amine compound is an organic amine mixture containing at least two compounds represented by the following formula (1):
R1—N═R2R3 (1)
A dry etching method including reacting silicon oxide with: gaseous hydrogen fluoride and a gaseous organic amine compound; a hydrogen fluoride salt of a gaseous organic amine compound; or gaseous hydrogen fluoride, a gaseous organic amine compound, and a hydrogen fluoride salt of a gaseous organic amine compound. The organic amine compound is an organic amine mixture containing at least two compounds represented by the following formula (1):
R1—N═R2R3 (1)
wherein N is a nitrogen atom; R1 is a C1-C10 hydrocarbon group optionally having a ring, a heteroatom, or a halogen atom; R2 and R3 are each a hydrogen atom or a C1-C10 hydrocarbon group optionally having a ring, a heteroatom, or a halogen atom; provided that the hydrocarbon group, when it has a carbon number of 3 or more, may have a branched chain structure or a ring structure.
Novolak Resin, Epoxy Resin, Photosensitive Resin Composition, Curable Resin Composition, Cured Substance, Electronic Device, Production Method for Novolak Resin, and Production Method for Epoxy Resin
A novolak resin including a partial structure represented by —C(CF3)H—. In addition, there are provided a photosensitive resin composition containing the above-described novolak resin and a photosensitizing agent. In addition, there is provided an epoxy resin having a partial structure represented by —C(CF3)H—. In addition, there is provided a curable resin composition containing the novolak resin or the epoxy resin. In addition, there is provided a cured substance obtained by curing the composition. In addition, there is provided a production method for a novolak resin, including reacting an aromatic compound with fluoral in a presence of an acid catalyst to produce a novolak resin having a partial structure represented by —C(CF3)H—. Further, there is provided a production method for an epoxy resin, including an epoxidation step of reacting a novolak resin having a partial structure represented by —C(CF3)H— with epihalohydrin in a presence of a base.
A curable composition including a first compound having a group represented by general formula (x) and an epoxy group and having a molecular weight of 1000 or less. In the general formula (x), Rf1 and Rf2 each independently represent a fluorine-containing alkyl group.
A curable composition including a first compound having a group represented by general formula (x) and an epoxy group and having a molecular weight of 1000 or less. In the general formula (x), Rf1 and Rf2 each independently represent a fluorine-containing alkyl group.
—C(Rf1)(Rf2)—OH (x)
A curable resin represented by General Formula (1). In General Formula (1), R1 each independently represent a monovalent substituent (an alkyl group, an alkoxy group, a fluorine atom, and the like), m is 0 to 4, n is 0 to 40, and R2's are each independently a monovalent group including a polymerizable functional group.
A curable resin represented by General Formula (1). In General Formula (1), R1 each independently represent a monovalent substituent (an alkyl group, an alkoxy group, a fluorine atom, and the like), m is 0 to 4, n is 0 to 40, and R2's are each independently a monovalent group including a polymerizable functional group.
C08G 59/06 - Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
According to an embodiment, a method for producing a (hydro)halocarbon includes a step of purifying the (hydro)halocarbon by reduced-pressure distillation of an azeotropic or azeotropic-like composition containing the (hydro)halocarbon and a compound different from the (hydro)halocarbon. According to another embodiment, a method for producing a (hydro)halocarbon includes a step purifying the (hydro)halocarbon by reduced-pressure distillation of an azeotropic or azeotropic-like composition containing the (hydro)halocarbon and a compound different from the (hydro)halocarbon, wherein standard boiling points of both the (hydro)halocarbon and the compound are 80° C. or lower.
C07C 17/386 - Separation; Purification; Stabilisation; Use of additives by distillation with auxiliary compounds
38.
COMPOSITION, COMPOSITION PRECURSOR SOLUTION, PRODUCTION METHOD FOR COMPOSITION, SUBSTRATE WITH MULTILAYER FILM, AND PRODUCTION METHOD FOR PATTERNED SUBSTRATE
A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B).
A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B).
[(R1)b(R2)m(OR3)lSiOn/2] (1)
A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B).
[(R1)b(R2)m(OR3)lSiOn/2] (1)
[In the formula, R1 is a group represented by following formula.]
A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B).
[(R1)b(R2)m(OR3)lSiOn/2] (1)
[In the formula, R1 is a group represented by following formula.]
A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B).
[(R1)b(R2)m(OR3)lSiOn/2] (1)
[In the formula, R1 is a group represented by following formula.]
[(R4)pSiOq/2] (2)
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
C09D 183/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
39.
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN STRUCTURE AND METHOD FOR PRODUCING PATTERNED CURED FILM
A new photosensitive resin composition based on a polysiloxane, that is, a negative photosensitive resin composition is provided. A negative photosensitive resin composition includes (A) a polysiloxane compound containing a first structural unit represented by the following general formula (1), (B) a photoinduced curing accelerator, and (C) a solvent.
A new photosensitive resin composition based on a polysiloxane, that is, a negative photosensitive resin composition is provided. A negative photosensitive resin composition includes (A) a polysiloxane compound containing a first structural unit represented by the following general formula (1), (B) a photoinduced curing accelerator, and (C) a solvent.
[(Rx)bR1mSiOn/2] (1)
G03F 7/32 - Liquid compositions therefor, e.g. developers
G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
40.
METAL MATERIAL, METHOD OF PRODUCING METAL MATERIAL, METHOD OF PASSIVATING SEMICONDUCTOR PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING FILLED CONTAINER
The metal material of the present disclosure includes: a metal base; and a film provided on a surface of the metal base and containing a fluorine-containing molybdenum compound, the fluorine-containing molybdenum compound being represented by the formula MoOxFy wherein x is a number from 0 to 2 and y is a number from 2 to 5.
An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.
C08L 27/12 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
C08F 2/54 - Polymerisation initiated by wave energy or particle radiation by X-rays or electrons
A dry etching method according to an embodiment of the present disclosure includes reacting an etching target film formed on a surface of a workpiece with a β-diketone and nitrogen dioxide to etch the etching target film in a non-plasma state, the etching target film containing a metal having an M-O bond energy of 5 eV or higher or an oxide of the metal.
H01L 21/3213 - Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
A bracket (3) is formed in the shape of a rectangular cross-section tube, and has a first opening portion (4) joined to a vehicle cabin interior-side surface (1a) of a windshield (1). A second opening portion (5) is formed in a stair-like shape and is opened toward the vehicle interior side. Guide rails (24A, 24B) are provided at height positions along front-back-direction edges (5f, 5g), and hold plate members (6A, 6B) thereon. Electronic devices (18A, 18B, 18C) such as a camera are disposed in device housing spaces (14, 15, 16) partitioned by plate members (6A, 6B). Accordingly, it is possible to gather and arrange a plurality of electronic devices (18) in the bracket (3).
B60R 11/00 - Arrangements for holding or mounting articles, not otherwise provided for
44.
Nonwoven Fabric Containing Silk Fibers, Wound Dressing, iPS Cell Scaffold Material, Nonwoven Fabric for Blood-Compatible Material, Blood-Compatible Material, Production Method of Nonwoven Fabric Containing Silk Fibers, Production Method of Wound Dressing, Production Method of iPS Cell Scaffold Material, Production Method of Non-Woven Fabric for Blood-Compatible Material, and Production Method of Blood-Compatible Material
One embodiment of the present invention provides a nonwoven fabric containing silk fibers in which an abs intensity ratio [abs (1650)/abs (1620)], which is a ratio of an intensity of a peak positioned in a vicinity of 1650 cm−1 [abs (1650)] in an infrared absorption spectrum to an intensity of a peak positioned in a vicinity of 1620 cm−1 [abs (1620)] in an infrared absorption spectrum, is larger than 0.65 and 1.90 or less, and a method for producing the nonwoven fabric containing silk fibers.
A61L 27/50 - Materials characterised by their function or physical properties
D04H 1/4266 - Natural fibres not provided for in group
D01F 4/02 - Monocomponent artificial filaments or the like of proteins; Manufacture thereof from fibroin
D01D 5/00 - Formation of filaments, threads, or the like
D04H 1/728 - Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres characterised by the method of forming fleeces or layers, e.g. reorientation of fibres the fibres being randomly arranged by electro-spinning
45.
METHOD FOR PRODUCING LITHIUM DIFLUOROPHOSPHATE, METHOD FOR PRODUCING DIFLUOROPHOSPHATE ESTER, LITHIUM DIFLUOROPHOSPHATE, METHOD FOR PRODUCING NONAQUEOUS ELECTROLYTIC SOLUTION, AND METHOD FOR PRODUCING NONAQUEOUS SECONDARY BATTERY
There is provided a method for producing lithium difluorophosphate in which difluorophosphate ester reacts with a lithium salt compound in a nonaqueous organic solvent without using water as a raw material, a method for producing a difluoro phosphate ester including a step of allowing a dihalophosphate ester to react with a fluorinating agent having a concentration of contained hydrogen fluoride of 15 mol % or less in a nonaqueous organic solvent; lithium difluorophosphate in which a value of a relational expression (d90-d10)/MV represented by d90 which is a particle size at which a volume cumulative distribution is 90%, d10 which is a particle size at which a volume cumulative distribution is 10%, and MV which is a volume average particle size is 10 or less; and methods for producing a nonaqueous electrolytic solution and a nonaqueous secondary battery using the production method described above.
1 is a group represented by the following formula:
3 fluoroalkyl group; b is an integer of 1 to 3; m is an integer of 0 to 2; n is an integer of 1 to 3; and a relationship of b+m+n=4 is satisfied.
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
A tungsten hexafluoride manufacturing method of the present invention includes a reaction step of reacting tungsten with a gas of a fluorine element-containing compound so as to obtain a mixture that contains tungsten hexafluoride and hydrogen fluoride-containing impurities, and a discharge step of performing distillation of the mixture while performing a discharge operation at least two or more times during the distillation so as to obtain tungsten hexafluoride, the discharge operation being an operation in which a storage operation and a purge operation are alternately performed.
Please substitute the new Abstract submitted herewith for the original Abstract: The present disclosure provides a surface treatment agent capable of not only being prepared by dissolving raw materials in a short time but also exerting a good water repellency imparting effect, and a method for manufacturing a surface treated body with the use of the surface treatment agent. The surface treatment agent according to the present disclosure includes the following components: (I) at least one kind selected from the group consisting of silicon compounds represented by the following formulas (1) and (2); (II) at least one kind selected from the group consisting of a nitrogen-containing heterocyclic compound represented by the following general formula (3), a nitrogen-containing heterocyclic compound represented by the following general formula (4) and imidazole; (III) an organic solvent; and (IV) at least one kind selected from the group consisting of silicon compounds represented by the following formulas (5) and (6).
Please substitute the new Abstract submitted herewith for the original Abstract: The present disclosure provides a surface treatment agent capable of not only being prepared by dissolving raw materials in a short time but also exerting a good water repellency imparting effect, and a method for manufacturing a surface treated body with the use of the surface treatment agent. The surface treatment agent according to the present disclosure includes the following components: (I) at least one kind selected from the group consisting of silicon compounds represented by the following formulas (1) and (2); (II) at least one kind selected from the group consisting of a nitrogen-containing heterocyclic compound represented by the following general formula (3), a nitrogen-containing heterocyclic compound represented by the following general formula (4) and imidazole; (III) an organic solvent; and (IV) at least one kind selected from the group consisting of silicon compounds represented by the following formulas (5) and (6).
C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
G03F 7/40 - Treatment after imagewise removal, e.g. baking
C09D 183/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
The vehicle rear information acquisition system of the disclosure includes: a back window at a rear of a vehicle; and an information acquisition device disposed inside the vehicle, opposing the back window, and configured to apply and/or receive light to acquire information from outside the vehicle, the back window including a glass plate and a coating film on at least a part of a surface of the glass plate, and having a privacy region for protecting privacy inside the vehicle and an information acquisition region opposing the information acquisition device and transmitting the light, the privacy region having the coating film on the surface of the glass plate, the privacy region having a visible light transmittance of 10% or less, the information acquisition region having a visible light transmittance of 25% or more.
A defogging structure of a windowpane of a movable body in which an information acquisition device configured to acquire information from an exterior of the movable body by at least one of emitting light or receiving light can be arranged in an interior of the movable body, the defogging structure including: a windowpane having an information acquisition area through which at least one of light emitted by the information acquisition device or light to be received by the information acquisition device passes; a defogging sheet including a resin film and a defogger, the defogging sheet being adhered to the information acquisition area of the windowpane; and a transparent resin adhesive layer that allows the resin film of the defogging sheet to be adhered to the windowpane, wherein a resin constituting the transparent resin adhesive layer has a Tg of −20° C. to −50° C., and a shear storage modulus of 0.5×105 Pa to 2.0×105 Pa.
H05B 3/84 - Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
B60S 1/08 - Wipers or the like, e.g. scrapers characterised by the drive electrically driven
The present invention provides a nonaqueous electrolyte battery which has a low internal resistance after the initial charge and discharge, while having excellent low-temperature output characteristics after storage at high temperatures. The present invention contains a compound represented by general formula (1) as a component of a nonaqueous electrolyte solution. In the formula, X1 represents a carbon atom or a sulfur atom; each of Y1 and Y2 represents an oxygen atom or a methylene group that may be substituted by a halogen atom; r represents 1 or 2; and R1 represents a group represented by general formula (2) or a group represented by general formula (3), provided that (i) in cases where X1 is a sulfur atom and Y1 and Y2 are methylene groups and (ii) in cases where X1 is a carbon atom and Y1 and Y2 are oxygen atoms, R1 is a group represented by general formula (2).
The present invention provides a nonaqueous electrolyte battery which has a low internal resistance after the initial charge and discharge, while having excellent low-temperature output characteristics after storage at high temperatures. The present invention contains a compound represented by general formula (1) as a component of a nonaqueous electrolyte solution. In the formula, X1 represents a carbon atom or a sulfur atom; each of Y1 and Y2 represents an oxygen atom or a methylene group that may be substituted by a halogen atom; r represents 1 or 2; and R1 represents a group represented by general formula (2) or a group represented by general formula (3), provided that (i) in cases where X1 is a sulfur atom and Y1 and Y2 are methylene groups and (ii) in cases where X1 is a carbon atom and Y1 and Y2 are oxygen atoms, R1 is a group represented by general formula (2).
Provided are a nonaqueous electrolyte solution which makes it possible to further improve low temperature characteristics and high temperature storage characteristics; and a nonaqueous electrolyte secondary battery comprising such a nonaqueous electrolyte solution. The present nonaqueous electrolyte solution comprises: (I) a first additive represented by the following formula [1], (II) at least one second additive selected from the group consisting of the compounds represented by the following formulae [2] to [5], difluoro(oxalato)borate, bis(oxalato)borate, tetrafluoro(oxalato)phosphate, difluorobis(oxalato)phosphate, tris(oxalato)phosphate, difluorophosphate, and fluorosulfonate, (III) a nonaqueous organic solvent, and (IV) a solute.
Provided are a nonaqueous electrolyte solution which makes it possible to further improve low temperature characteristics and high temperature storage characteristics; and a nonaqueous electrolyte secondary battery comprising such a nonaqueous electrolyte solution. The present nonaqueous electrolyte solution comprises: (I) a first additive represented by the following formula [1], (II) at least one second additive selected from the group consisting of the compounds represented by the following formulae [2] to [5], difluoro(oxalato)borate, bis(oxalato)borate, tetrafluoro(oxalato)phosphate, difluorobis(oxalato)phosphate, tris(oxalato)phosphate, difluorophosphate, and fluorosulfonate, (III) a nonaqueous organic solvent, and (IV) a solute.
The present invention provides: a nonaqueous electrolyte solution which is used in a nonaqueous electrolyte battery having a low initial resistance value; and a compound which is contained in this nonaqueous electrolyte solution. A nonaqueous electrolyte solution according to the present invention contains a compound represented by formula (1), a solute and a nonaqueous organic solvent. In general formula (1), each of R1 and R2 represents PO(Rf)2 or SO2Rf, and Rf represents, for example, a fluorine atom; each of R3 and R4 represents, for example, a lithium ion, or alternatively R3 and R4 may form a ring structure together with a nitrogen atom to which the moieties are bonded, and in this case, R3 and R4 form an alkylene group in combination with each other; an oxygen atom may be contained between carbon atom-carbon atom bonds in the alkylene group; a side chain thereof may have an alkyl group; and an arbitrary hydrogen atom in the alkyl group and the alkylene group may be substituted by a fluorine atom.
H01M 10/0568 - Liquid materials characterised by the solutes
H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
H01M 10/0569 - Liquid materials characterised by the solvents
55.
METHOD FOR SELECTIVELY KILLING PROTEIN AGGREGATE-CONTAINING CELLS, KIT THEREFOR, THERAPEUTIC DRUG FOR PROTEIN MISFOLDING DISEASES AND DRUG PRODUCT FOR REMOVING PROTEIN AGGREGATES FROM BLOOD PRODUCT
A method for selectively killing protein aggregate-containing cells, a kit thereof, a therapeutic agent for the protein misfolding disease, and an agent for removing a protein aggregate from a blood derivative are provided. The method for selectively killing cells according to one embodiment acts a fluorine-based alcohol or a compound represented by general formula (1) on cells as a compound for detecting a protein aggregate and selectively kills protein aggregate-containing cells.
A method for selectively killing protein aggregate-containing cells, a kit thereof, a therapeutic agent for the protein misfolding disease, and an agent for removing a protein aggregate from a blood derivative are provided. The method for selectively killing cells according to one embodiment acts a fluorine-based alcohol or a compound represented by general formula (1) on cells as a compound for detecting a protein aggregate and selectively kills protein aggregate-containing cells.
By fluorinating 1,2,3,3-tetrachloro-1-propene (1230xd) using hydrogen fluoride as a fluorinating agent, an efficient method for producing 1,2-dichloro-3,3-difluoro-1-propene (1232xd) is provided. Through this composition including 1232xd, there are also provided an environmentally friendly composition having excellent ability to dissolve various organic matters, a method for cleaning an article using the composition, a method for producing a lubricant solution using the composition, and a method for producing a component provided with a lubricant coating film.
C07C 17/20 - Preparation of halogenated hydrocarbons by replacement by halogens of halogen atoms by other halogen atoms
C09K 3/30 - Materials not provided for elsewhere for aerosols
C09K 5/04 - Materials undergoing a change of physical state when used the change of state being from liquid to vapour or vice-versa
C10M 131/04 - Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing halogen containing carbon, hydrogen and halogen only aliphatic
A nonaqueous electrolytic solution contains a salt compound represented by a specific general formula, a solute, and a nonaqueous organic solvent, in which the content of the salt compound with respect to the total amount of the nonaqueous electrolytic solution is 0.003% by mass to 0.1% by mass, and a nonaqueous electrolytic solution battery contains the nonaqueous electrolytic solution, so that there is provided a nonaqueous electrolytic solution that can exhibit an effect of improving a capacity retention rate after a long-term cycle at a high temperature and an effect of preventing an increase in resistance at a low temperature after high-temperature storage in a balanced manner, and a nonaqueous electrolytic solution battery containing the nonaqueous electrolytic solution.
The present disclosure provides a β-diketone storage container including: a metal storage container to which a liquid β-diketone is charged, the metal being an aluminum material; and an inorganic film on an inner surface of the storage container, the inorganic film containing at least one material selected from the group consisting of silicon dioxide, silicon carbonitride, silicon carbide, silicon nitride, diamond, and diamond-like carbon.
Provided is a nonaqueous electrolytic solution containing a nonaqueous organic solvent, a solute, a specific silicon compound (A), a specific borate (B), and a specific imide salt (C), in which WB/WA, which is a ratio of a content WB of the borate (B) based on mass to a content WA of the silicon compound (A) based on mass, is 1.5 or more and 3 or less, and WC/WA, which is a ratio of a content WC of the imide salt (C) based on mass to a content WA of the silicon compound (A) based on mass, is 1 or more and 5 or less, and the nonaqueous electrolytic solution can exhibit an effect of reducing an absolute value of internal resistance at a low temperature and an effect of improving a battery capacity after a cycle test in a well-balanced manner.
Provided is a nonaqueous electrolytic solution containing a nonaqueous organic solvent, a solute, a specific silicon compound (A), a specific borate (B), and a specific imide salt (C) and the nonaqueous electrolytic solution can exhibit an effect of reducing an absolute value of internal resistance at a low temperature and an effect of improving a battery capacity after a cycle test in a well-balanced manner.
A dry etching method according to the present invention includes etching silicon nitride by bringing a mixed gas containing hydrogen fluoride and a fluorine-containing carboxylic acid into contact with the silicon nitride in a plasma-less process at a temperature lower than 100° C. Preferably, the amount of the fluorine-containing carboxylic acid contained is 0.01 vol % or more based on the total amount of the hydrogen fluoride and the fluorine-containing carboxylic acid. Examples of the fluorine-containing carboxylic acid are monofluoroacetic acid, difluoroacetic acid, trifluoroacetic acid, difluoropropionic acid, pentafluoropropionic acid, pentafluorobutyric acid and the like. This dry etching method enables etching of the silicon nitride at a high etching rate and shows a high selectivity ratio of the silicon nitride to silicon oxide and polycrystalline silicon while preventing damage to the silicon oxide.
The present disclosure is directed to a dry etching method for a substrate having a silicon compound film, including: plasmatizing a dry etching agent; and etching the silicon compound film with the plasmatized dry etching agent through a mask formed with a predetermined opening pattern on the silicon compound film, wherein the dry etching agent contains the following first to fourth gases; the first gas is at least one compound selected from the group consisting of iodinated fluorocarbon compounds and brominated fluorocarbon compounds; the second gas is an unsaturated fluorocarbon represented by CnFm; the third gas is an unsaturated hydrofluorocarbon represented by CxHyFz; and the fourth gas is an oxidizing gas.
The composition for drying an uneven pattern of the present invention includes a sublimable substance, and a solvent whose boiling point at 1 atm is lower than a boiling point or a sublimation point of the sublimable substance by 5° C. or more and whose boiling point at 1 atm is 75° C. or lower.
A tungsten hexafluoride manufacturing method of the present invention includes a reaction step of reacting tungsten containing arsenic or an arsenic compound with a gas of a fluorine element-containing compound so as to obtain a mixture containing tungsten hexafluoride and a trivalent arsenic compound, and a distillation step of distilling and purifying the mixture so as to separate and remove a fraction containing the trivalent arsenic compound and to obtain tungsten hexafluoride.
A polyimide which is obtained by a reaction of an aromatic diamine having a 1,1,1-trifluoro-2,2-ethanediyl group (—C(CF3)H—), as a linkage skeleton, with a tetracarboxylic dianhydride is easily dissolved in an organic solvent and exhibits excellent film forming properties. In addition, the thus-obtained polyimide can be used for an optical film and a display device.
A dry etching method according to one embodiment of the present disclosure includes plasmatizing a dry etching agent and etching a silicon oxide or a silicon nitride with the plasmatized dry etching agent, wherein the dry etching agent comprises CF3I and a C2-C3 fluorine-containing linear nitrile compound, and wherein the concentration of the C2-C3 fluorine-containing linear nitrile compound relative to the CF3I is higher than or equal to 1 vol. ppm and lower than or equal to 1 vol %.
The present invention has the effect of making it possible to produce 1,1,1-trifluoro-2,2-bisarylethane efficiently by a simple procedure by condensing a mixture of fluoral and hydrogen fluoride with an aryl compound under anhydrous conditions. The purity of the 1,1, 1-trifluoro-2, 2-bisarylethane obtained can be raised by a simple purification method such as crystallization or distillation. The obtained 1,1,1-trifluoro-2,2-bisarylethane can be increased in purity by a simple purification method such as crystallization operation or distillation.
C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
C07C 17/32 - Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by introduction of halogenated alkyl groups into ring compounds
C07C 22/08 - Cyclic compounds containing halogen atoms bound to an acyclic carbon atom having unsaturation in the rings containing six-membered aromatic rings containing fluorine
C07C 37/62 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by substitution of halogen atoms by other halogen atoms
C07C 211/56 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to two or three six-membered aromatic rings the carbon skeleton being further substituted by halogen atoms or by nitro or nitroso groups
C07C 209/78 - Preparation of compounds containing amino groups bound to a carbon skeleton from amines, by reactions not involving amino groups, e.g. reduction of unsaturated amines, aromatisation, or substitution of the carbon skeleton from carbonyl compounds, e.g. from formaldehyde, and amines having amino groups bound to carbon atoms of six-membered aromatic rings, with formation of methylene-diarylamines
C07C 215/80 - Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton of the same non-condensed six-membered aromatic ring containing at least two amino groups bound to the carbon skeleton
C07C 213/08 - Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reactions not involving the formation of amino groups, hydroxy groups or etherified or esterified hydroxy groups
C07C 43/225 - Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing halogen
C07C 41/30 - Preparation of ethers by reactions not forming ether-oxygen bonds by increasing the number of carbon atoms, e.g. by oligomerisation
C07C 205/22 - Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by hydroxy groups having nitro groups and hydroxy groups bound to carbon atoms of six-membered aromatic rings having nitro groups and hydroxy groups bound to carbon atoms of the same non-condensed six-membered aromatic ring having one nitro group bound to the ring
C07C 201/12 - Preparation of nitro compounds by reactions not involving the formation of nitro groups
The selective film deposition method according to an embodiment of the present disclosure includes depositing a film of an organic matter represented by the following formula (1) on a substrate having a structure where a first surface region containing at least one of a metal or a metal oxide and a second surface region containing a nonmetallic inorganic material are both exposed, selectively in the first surface region than in the second surface region,
The selective film deposition method according to an embodiment of the present disclosure includes depositing a film of an organic matter represented by the following formula (1) on a substrate having a structure where a first surface region containing at least one of a metal or a metal oxide and a second surface region containing a nonmetallic inorganic material are both exposed, selectively in the first surface region than in the second surface region,
The selective film deposition method according to an embodiment of the present disclosure includes depositing a film of an organic matter represented by the following formula (1) on a substrate having a structure where a first surface region containing at least one of a metal or a metal oxide and a second surface region containing a nonmetallic inorganic material are both exposed, selectively in the first surface region than in the second surface region,
wherein N represents a nitrogen atom; and R1 represents a C1-C30 hydrocarbon group optionally containing a hetero atom or a halogen atom, R2, R3, R4, and R5 each independently represent a hydrogen atom or a C1-C10 hydrocarbon group optionally containing a hetero atom or a halogen atom, where the hydrocarbon group covers a branched or cyclic hydrocarbon group when containing 3 or more carbon atoms.
The dry etching method of the present invention etches a metal film formed on a surface of a workpiece by bringing etching gases each containing a β-diketone into contact with the metal film. The method includes: a first etching step of bringing a first etching gas containing a first β-diketone into contact with the metal film; and a second etching step of bringing a second etching gas containing a second β-diketone into contact with the metal film after the first etching step. The first β-diketone is a compound capable of forming a first complex through a reaction with the metal film. The second β-diketone is a compound capable of forming a second complex having a lower sublimation point than the first complex through a reaction with the metal film.
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
H01L 21/3213 - Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
A head-up display device that is to be mounted in a moving vehicle and enables an occupant in the moving vehicle to view a virtual image based on a reflected image of S-polarized light in a projection section, the head-up display device including: an image projector configured to apply projection light including S-polarized light; and the projection section on which the projection light is to be projected. The projection section includes laminated glass including a first glass plate defining a surface of the laminated glass on which the projection light is to be incident, a second glass plate defining a surface of the laminated glass from which the projection light is to be emitted, and a half-wave plate disposed between the first glass plate and the second glass plate. The first glass plate and the second glass plate each are formed from a glass composition containing silicon oxide, iron oxide, and an alkali metal oxide. At least one of the first glass plate or the second glass plate has a thickness of 0.3 mm to 3 mm, a total iron oxide content in terms of Fe2O3 in the glass composition of 0.2% by mass to 2.0% by mass, and a FeO content of 0.1% by mass to 0.5% by mass. The half-wave plate has visible light transmittivity and is configured to transmit light with an a* value of −2.5 to 4.5 and a b* value of −1.0 to 7.0 in a CIE color system. The reflected image is formed on a surface of the first glass plate which is to face an inside of the vehicle. The second glass plate is configured to emit from a surface thereof which is to face an outside of the vehicle the projection light converted to P-polarized light.
B60K 35/00 - Arrangement or adaptations of instruments
B32B 17/10 - Layered products essentially comprising sheet glass, or fibres of glass, slag or the like comprising glass as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
71.
Bevel portion treatment agent composition and method of manufacturing wafer
A bevel portion treatment agent composition of the present invention is a bevel portion treatment agent composition containing a silylating agent, which is used for treating a bevel portion of a wafer, in which a surface modification index Y and a surface modification index Z measured by a predetermined procedure have a characteristic of satisfying 0.5≤Y/Z≤1.0.
Provided is a polysiloxane composition containing a polysiloxane compound including a constitutional unit represented by Formula (1) and at least one of a constitutional unit of Formula (2) and a constitutional unit of Formula (3), and a solvent.
Provided is a polysiloxane composition containing a polysiloxane compound including a constitutional unit represented by Formula (1) and at least one of a constitutional unit of Formula (2) and a constitutional unit of Formula (3), and a solvent.
[(Rx)bR1mSiOn/2] (1)
Provided is a polysiloxane composition containing a polysiloxane compound including a constitutional unit represented by Formula (1) and at least one of a constitutional unit of Formula (2) and a constitutional unit of Formula (3), and a solvent.
[(Rx)bR1mSiOn/2] (1)
[(Ry)cR2pSiOq/2] (2)
Provided is a polysiloxane composition containing a polysiloxane compound including a constitutional unit represented by Formula (1) and at least one of a constitutional unit of Formula (2) and a constitutional unit of Formula (3), and a solvent.
[(Rx)bR1mSiOn/2] (1)
[(Ry)cR2pSiOq/2] (2)
[SiO4/2] (3)
Provided is a polysiloxane composition containing a polysiloxane compound including a constitutional unit represented by Formula (1) and at least one of a constitutional unit of Formula (2) and a constitutional unit of Formula (3), and a solvent.
[(Rx)bR1mSiOn/2] (1)
[(Ry)cR2pSiOq/2] (2)
[SiO4/2] (3)
Here, Rx is a monovalent group represented by Formula (1a) (X is a hydrogen atom or an acid-labile group, a is an integer of 1 to 5, and a broken line represents a bond), Ry is a monovalent organic group having 1 to 30 carbon atoms, which contains any one of an epoxy group, an oxetane group, an acryloyl group, and a methacryloyl group.
Provided is a polysiloxane composition containing a polysiloxane compound including a constitutional unit represented by Formula (1) and at least one of a constitutional unit of Formula (2) and a constitutional unit of Formula (3), and a solvent.
[(Rx)bR1mSiOn/2] (1)
[(Ry)cR2pSiOq/2] (2)
[SiO4/2] (3)
Here, Rx is a monovalent group represented by Formula (1a) (X is a hydrogen atom or an acid-labile group, a is an integer of 1 to 5, and a broken line represents a bond), Ry is a monovalent organic group having 1 to 30 carbon atoms, which contains any one of an epoxy group, an oxetane group, an acryloyl group, and a methacryloyl group.
A head-up display device that is to be mounted in a moving vehicle and enables an occupant in the moving vehicle to view a virtual image based on a reflected image of projection light in a projection section. The projection section includes an interlayer film, a first glass plate disposed closer to an outside of the moving vehicle, and a second glass plate disposed closer to an inside of the moving vehicle, the first glass plate and the second glass plate disposed opposite each other with the interlayer film therebetween. The first glass plate and the second glass plate each have a tin surface on which tin is detected and a non-tin surface whose tin concentration is lower than the tin concentration on the tin surface.
The method of dry-etching silicon oxide of the present disclosure includes reacting silicon oxide with any one of the following (A) to (C): (A) a gaseous hydrogen fluoride and a gaseous organic amine compound, (B) a gaseous hydrogen fluoride salt of an organic amine compound, and (C) a gaseous hydrogen fluoride, a gaseous organic amine compound, and a gaseous hydrogen fluoride salt of an organic amine compound in a non-plasma state.
C09K 13/08 - Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
The present disclosure provides a method for stably supplying a highly pure n-butylamine gas having a constant composition. The present disclosure is a composition supply method including: a filling step of filling a container with a composition containing n-butylamine in an amount of 99.5% by volume or more and isobutylamine in an amount of 0.001% by volume or more and 0.5% by volume or less; a warming step of warming the container filled with the composition to 50° C. or higher; and a gas supply step of supplying a gas containing n-butylamine and isobutylamine from the warmed container to a predetermined device.
B01B 1/00 - Boiling; Boiling apparatus for physical or chemical purposes
B67C 3/00 - Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus; Filling casks or barrels with liquids or semiliquids
C07C 211/08 - Monoamines containing alkyl groups having a different number of carbon atoms
F17C 7/04 - Discharging liquefied gases with change of state, e.g. vaporisation
A rechargeable metal halide battery with an optimized electrolyte formulation shows high capacity at fast charging rates. The optimized electrolyte includes a metal halide, an oxidizing gas, and a mixed-solvent solution that includes a glyme-based compound that is in a volume fraction of between 20-70 volume % of the mixed-solvent solution. The mixed-solvent solution may further include a nitrile compound and/or a heterocyclic compound.
A rechargeable metal halide battery with an optimized active cathode electrolyte solution has high energy density and does not require charging following fabrication. The optimized active cathode electrolyte solution includes (i) a mixture of a metal halide and its corresponding halogen dissolved in an organic solvent at a concentration ratio greater than 0.5 and (ii) an oxidizing gas. The organic solvent is a nitrile-based compound and/or a heterocyclic compound. Glyme may be added to the organic solvent to improve battery performance.
A head-up display device that is to be mounted in a moving vehicle and enables an occupant in the moving vehicle to view a virtual image based on a reflected image of projection light in a projection section, the projection section including an interlayer film, a first glass plate disposed closer to an outside of the moving vehicle, and a second glass plate disposed closer to an inside of the moving vehicle, the first glass plate and the second glass plate disposed opposite each other with the interlayer film therebetween, the first glass plate having a first main surface exposed to the outside and a second main surface opposite the first main surface, the second glass plate having a fourth main surface exposed to the inside and a third main surface opposite the fourth main surface, the first glass plate and the second glass plate each having a tin surface on which tin is detected and a non-tin surface whose tin concentration is lower than the tin concentration on the tin surface, the fourth main surface being defined by the non-tin surface, the virtual image being based on a reflected image formed on the fourth main surface, the projection light including S-polarized light and P-polarized light, wherein when the projection light is mixed light of S-polarized light and P-polarized light in equal proportions, the projection light has a first maximum peak intensity within a wavelength range of 400 nm to less than 500 nm of 1.25 to 2.5 times a second maximum peak intensity within a wavelength range of 500 nm to 700 nm, a reflectance on the fourth main surface at a wavelength of the first maximum peak intensity is higher than a reflectance on the fourth main surface at a wavelength of the second maximum peak intensity, and a difference between the reflectances is 0.15% or less.
A car window glass includes a glass plate having a conductor layer, a connection terminal, and a power line. The connection terminal includes metal-plate first and second join parts joined to the conductor layer via the first and second solder layers, a metal-plate bridge section connected to the first and second join parts and spaced apart from the conductor layer, and a fixing part for fixing the power line to a bridge section main surface. The power line extends from the fixing part along a glass plate main surface, and the side opposite of the side facing the glass plate main surface is free of the bridge section, and the starting point of the power line extending from the fixing part is positioned in the upper direction of a virtual line connecting the center portions of the first and second join parts with each other.
H01R 12/57 - Fixed connections for rigid printed circuits or like structures characterised by the terminals surface mounting terminals
B23K 35/26 - Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C
C22C 28/00 - Alloys based on a metal not provided for in groups
H01R 4/62 - Connections between conductors of different materials; Connections between or with aluminium or steel-core aluminium conductors
H01R 12/53 - Fixed connections for rigid printed circuits or like structures connecting to cables except for flat or ribbon cables
H05B 3/84 - Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
81.
Method for purifying polymerizable fluoromonomer by distillation
The present invention is directed to a purification method for purifying a fluorine-containing polymerizable monomer of the formula (1), in which the fluorine-containing polymerizable monomer is purified by distillation in the coexistence of a phenolic compound A such as 6-tert-butyl-2,4-xylenol and a phenolic compound B such as 2,2′-methylene-bis(4-methyl-6-tert-butylphenol).
By the combined use of the phenolic compound A and the phenolic compound B, it is possible to significantly suppress polymerization or oligomerization of the fluorine-containing polymerizable monomer even during industrial-production-scale distillation and efficiently purify the fluorine-containing polymerizable monomer by distillation.
The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.
H01L 33/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof
H01L 33/44 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
H01L 51/56 - Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
83.
NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY
The present invention provides: a nonaqueous electrolyte solution which is capable of improving the storage characteristics at high temperatures and the internal resistance characteristics after storage in a more balanced manner; and a nonaqueous electrolyte secondary battery which is provided with this nonaqueous electrolyte solution. A nonaqueous electrolyte solution according to the present invention contains (I) an imide anion of general formula [1] or [2], (II) a sulfonic acid salt of general formula [3], (III) a nonaqueous organic solvent or an ionic liquid; and (IV) a solute.
A vehicle window glass assembly according to one embodiment of the present disclosure includes: a vehicle window glass pane with a silver-containing conductor layer of predetermined pattern formed on a main surface of the glass pane; a solder layer made of an indium-containing lead-free solder; a connection terminal connected to the conductor layer via the solder layer, and a power line fixed to the connection terminal. The connection terminal includes: a metal plate having a first main surface joined to the solder layer and a second main surface located opposite to the first main surface; and a fixing part that fixes the power line to the second main surface. The power line extends from the fixing part. A starting point of the power line extending from the fixing part is situated above a region inside a joint region defined by the solder layer and the first main surface.
H05B 3/86 - Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields the heating conductors being embedded in the transparent or reflecting material
C22C 28/00 - Alloys based on a metal not provided for in groups
B23K 35/26 - Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C
The etching method of the present invention includes the step of supplying a first mixed gas containing a β-diketone-containing etching gas and a nitrogen oxide gas to a target having, on a surface, both a first metal film containing cobalt, iron, or manganese and a second metal film containing copper, thereby selectively etching the first metal film over the second metal film, or the step of supplying a second mixed gas containing a β-diketone-containing etching gas and oxygen gas to the target, thereby selectively etching the second metal film over the first metal film.
H01L 21/3213 - Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
86.
Laminated Glass for Automotive Windshields, and Method for Producing Same
A laminated glass for an automotive windshield according to one embodiment of the present invention includes: a resinous intermediate film layer; a curved first glass plate disposed on an exterior side; and a curved glass plate disposed on an interior side, the first and second glass plates being opposed to each other with the intermediate film layer interposed therebetween, wherein the first glass plate has a thickness ranging from 0.7 mm to 3 mm, wherein the second glass plate has a thickness ranging from 0.3 mm to 1.4 mm and being smaller than the thickness of the first glass plate, and wherein the second glass plate is made of a thermally-strengthened glass with a compressive stress of less than 5 MPa. With such a configuration, the laminated glass achieves improved safety to guard against the occurrence of an internal impact event.
B32B 17/10 - Layered products essentially comprising sheet glass, or fibres of glass, slag or the like comprising glass as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
A production method of tungsten hexafluoride according to one embodiment of the present invention includes: a first step of bringing tungsten having an oxide film into contact with a fluorine gas or inert gas containing 50 vol ppm to 50 vol % of hydrogen fluoride in a reactor, thereby removing the oxide film from the tungsten; and a second step of bringing the tungsten from which the oxide film has been removed by the first step into contact with a fluorine-containing gas to form tungsten hexafluoride.
One of the problems is to provide a solvent composition which has a little adverse effect on the global environment and has excellent stability when a compound having a perfluoropolyether (PFPE) group is in a solution state. In an embodiment, the problem is solved by providing a solvent composition for dissolving a compound having a perfluoropolyether (PFPE) group includes Z-1,2-dichloro-3,3,3-trifluoropropene (1223xd(Z)) as a main component.
C11D 11/00 - Special methods for preparing compositions containing mixtures of detergents
C09D 171/00 - Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
B05D 3/00 - Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
91.
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM
The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film including a substrate and a patterned film on the substrate, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, wherein the patterned film of the first substrate with a patterned film has a contact angle decreased in the cleaning step, and the patterned film of the second substrate with a patterned film has a contact angle recovered in the heating step.
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
C08F 236/16 - Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
92.
Electrolyte Solution for Nonaqueous Electrolyte Batteries, and Nonaqueous Electrolyte Battery Using Same
An electrolyte solution for a nonaqueous electrolyte battery according to the present invention includes the following components: (I) a nonaqueous organic solvent; (II) an ionic salt as a solute; (III) at least one additive compound represented by the general formula (1); and (IV) at least one additive compound represented by the general formula (2), wherein the concentration of the component (IV) is 0.05 to 25.0 mass % with respect to 100 mass % of the component (III)
An electrolyte solution for a nonaqueous electrolyte battery according to the present invention includes the following components: (I) a nonaqueous organic solvent; (II) an ionic salt as a solute; (III) at least one additive compound represented by the general formula (1); and (IV) at least one additive compound represented by the general formula (2), wherein the concentration of the component (IV) is 0.05 to 25.0 mass % with respect to 100 mass % of the component (III)
An electrolyte solution for a nonaqueous electrolyte battery according to the present invention includes the following components: (I) a nonaqueous organic solvent; (II) an ionic salt as a solute; (III) at least one additive compound represented by the general formula (1); and (IV) at least one additive compound represented by the general formula (2), wherein the concentration of the component (IV) is 0.05 to 25.0 mass % with respect to 100 mass % of the component (III)
where R1 are each independently a substituent group having at least one kind selected from unsaturated bond and aromatic ring.
6 (where M=W or Mo). This treatment method enables conversion of the metal oxyfluoride to the high vapor pressure compound without the use of a plasma generator and can be applied to cleaning of a metal fluoride production apparatus or cleaning of a film forming apparatus.
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating
B08B 5/00 - Cleaning by methods involving the use of air flow or gas flow
B08B 7/00 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass
B08B 7/04 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
According to the present disclosure, there are provided a surface treatment agent having the advantage that the raw material components can be dissolved in a short time during preparation of the surface treatment agent and capable of exerting a good water repellency imparting effect, and a method of manufacturing a surface-treated body with the use of the surface treatment agent. The surface treatment agent according to the present disclosure includes the following components: (I) at least one kind selected from the group consisting of silicon compounds represented by the following general formulas [1], [2] and [3]; (II) at least one kind selected from the group consisting of a nitrogen-containing heterocyclic compound represented by the following general formula [4], a nitrogen-containing heterocyclic compound represented by the following general formula [5], and imidazole; and (III) an organic solvent.
1 is a group represented by the following formula:
3 fluoroalkyl group; b is an integer of 1 to 3; m is an integer of 0 to 2; n is an integer of 1 to 3; and a relationship of b+m+n=4 is satisfied).
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
96.
Method for producing phosphoryl imide salt, method for producing nonaqueous electrolyte solution containing said salt, and method for producing nonaqueous secondary battery
It is provided a glass window for a vehicle, comprising: an antenna configured to receive a radio wave; and a noise rejecting pattern configured to absorb noise that reaches the antenna, wherein, an electronic device configured to acquire information outside the vehicle through the glass window is mounted on or close to the glass window, wherein the noise rejecting pattern includes a first conductor coupled to a vehicle body for giving an earth potential at a high frequency, and a second conductor extending from the first conductor to exist between the antenna and the electronic device, and wherein the second conductor is placed closer to the antenna than to the electronic device.
Provided is an electrolyte for a non-aqueous electrolyte battery, which can provide, when used in a non-aqueous electrolyte battery, in a good balance, an effect to suppress an increase in an internal resistance at a low temperature and an effect to suppress an increase in an amount of gas generated at a high temperature, as well as a non-aqueous electrolyte battery containing such an % electrolyte. The non-aqueous electrolyte comprises a non-aqueous solvent and at least a hexafluorophosphate and/or tetrafluoroborate as a solute, and further comprises at least one imide anion-containing salt represented by the following general formula [1] but does not contain a silane compound represented by the following general formula [2] or an ionic complex represented by, for example, the following general formula [3].
H01M 10/0569 - Liquid materials characterised by the solvents
H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
H01M 10/0567 - Liquid materials characterised by the additives
H01M 4/505 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
H01M 4/525 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy
H01M 4/36 - Selection of substances as active materials, active masses, active liquids
The present invention provides an electrolyte solution for a non-aqueous electrolyte solution battery capable of exhibiting excellent high-temperature cycle characteristics and excellent high-temperature storage characteristics at high temperature of 60° C. or above, and a non-aqueous electrolyte solution battery using the same. The electrolyte solution for a non-aqueous electrolyte solution battery of the present invention comprises at least: a non-aqueous solvent; a solute; at least one first compound represented by the following general formula (1); and at least one second compound represented by the following general formula (2).
patents
