JEOL Ltd.

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        Patent 500
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New (last 4 weeks) 6
2023 September (MTD) 4
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IPC Class
H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams 84
H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes 76
H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support 57
H01J 37/22 - Optical or photographic arrangements associated with the tube 57
H01J 37/244 - Detectors; Associated components or circuits therefor 52
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NICE Class
09 - Scientific and electric apparatus and instruments 38
10 - Medical apparatus and instruments 11
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37 - Construction and mining; installation and repair services 2
42 - Scientific, technological and industrial services, research and design 2
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1.

Charged Particle Beam Apparatus

      
Application Number 18121289
Status Pending
Filing Date 2023-03-14
First Publication Date 2023-09-28
Owner JEOL Ltd. (Japan)
Inventor
  • Tsutsumi, Kenichi
  • Uchida, Tatsuya
  • Yokouchi, Kazushiro
  • Ikeo, Nobuyuki
  • Ikita, Konomi

Abstract

A charged particle beam apparatus that forms a probe with a charged particle beam and scans a specimen with the probe to acquire a scanning image. The charged particle beam apparatus includes an optical system for scanning the specimen with the probe; a detector that detects a signal generated from the specimen through the scanning of the specimen with the probe; and a control unit that controls the optical system. The control unit performs correction processing of acquiring a reference image obtained by the scanning of the specimen with the probe, comparing the reference image to a criterion image to determine a drift amount, and correcting a displacement of an irradiation position with the probe on the specimen based on the drift amount; and processing of setting a frequency with which the correction processing is to be performed based on the drift amount.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes
  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path

2.

DERIVATIZING COMPOSITION FOR MASS SPECTROMETRY, DERIVATIZATION KIT FOR MASS SPECTROMETRY, MASS SPECTROMETRIC METHOD FOR BIOLOGICAL COMPONENT, AND METHOD FOR PREPARING SAMPLE FOR USE IN MASS SPECTROMETRY

      
Application Number JP2022048588
Publication Number 2023/181581
Status In Force
Filing Date 2022-12-28
Publication Date 2023-09-28
Owner
  • TOKUYAMA CORPORATION (Japan)
  • JEOL LTD. (Japan)
Inventor
  • Kikuchi, Shigetoshi
  • Matsushige, Misao
  • Fukuzawa, Seketsu
  • Takiwaki, Masaki
  • Takahashi, Koji

Abstract

11's each independently represent an alkyl group having 1 to 4 carbon atoms and X represents an N-alkyl-N-morpholinium group or a halogen atom (provided that, when X represents an N-alkyl-N-morpholinium group, X further has a counter ion).

IPC Classes  ?

  • G01N 27/62 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electric discharges, e.g. emission of cathode
  • C07D 251/46 - One nitrogen atom with oxygen or sulfur atoms attached to the two other ring carbon atoms

3.

Charged Particle Beam Apparatus and Control Method for Charged Particle Beam Apparatus

      
Application Number 18120617
Status Pending
Filing Date 2023-03-13
First Publication Date 2023-09-14
Owner JEOL Ltd. (Japan)
Inventor
  • Sasaki, Takeo
  • Noguchi, Kanako
  • Yagi, Kazuki

Abstract

A charged particle beam apparatus for scanning a specimen with a charged particle beam and acquiring a scan image. The charged particle beam apparatus including: an optical system that includes a pulse mechanism for illuminating the specimen with pulses of the charged particle beam, and a deflector that deflects the charged particle beam and scans the specimen with the deflected charged particle beam; and a control unit that controls the optical system. The control unit controls the optical system so as to satisfy T = n × t (n is a natural number). T represents a dwell time of the charged particle beam in each pixel of the scan image, and t represents a cycle of pulses of the charged particle beam.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/244 - Detectors; Associated components or circuits therefor
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes

4.

SAMPLE ANALYSIS DEVICE AND SAMPLE ANALYSIS METHOD

      
Application Number JP2023006513
Publication Number 2023/167078
Status In Force
Filing Date 2023-02-22
Publication Date 2023-09-07
Owner
  • FUJIREBIO INC. (Japan)
  • JEOL LTD. (Japan)
Inventor
  • Kawada Hidenobu
  • Yamashita Isao
  • Yamashita Mine

Abstract

In S14, stirring of a sample is performed by means of a nozzle. In S16, when it has been determined that an elapsed time after the stirring by means of the nozzle does not exceed a predetermined time, sample dispensing is performed using the nozzle in S18. In S16, when it has been determined that an elapsed time after the stirring by means of the nozzle exceeds a predetermined time, steps of S50-S60 are performed. In S56, re-stirring of the sample is performed by a manual operation of an inspector. Instead of re-stirring of the sample by a manual operation, re-stirring of the sample by means of the nozzle may be performed.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 1/38 - Diluting, dispersing or mixing samples

5.

Charged Particle Beam Apparatus

      
Application Number 18112687
Status Pending
Filing Date 2023-02-22
First Publication Date 2023-08-31
Owner JEOL Ltd. (Japan)
Inventor
  • Otsuka, Takeshi
  • Mochizuki, Sadahiko

Abstract

Light which is radiant energy is emitted from a sample which is heated, and is detected by a backscattered electron detector. A detection signal from the backscattered electron detector includes a radiant component. A radiant component removal section extracts the radiant component from the detection signal using a filter, and then removes the radiant component from the detection signal. An optical detector which detects the radiant component may be provided. A divided detector may be provided as the backscattered electron detector.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/244 - Detectors; Associated components or circuits therefor
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes

6.

Partial Structure Estimation Apparatus and Method of Generating Partial Structure Estimation Model

      
Application Number 18113153
Status Pending
Filing Date 2023-02-23
First Publication Date 2023-08-31
Owner JEOL Ltd. (Japan)
Inventor
  • Kubo, Ayumi
  • Ubukata, Masaaki
  • Nagatomo, Kenji

Abstract

A partial structure estimation apparatus is configured to generate a first explanatory variable by performing composition estimation for each peak in a mass spectrum acquired from a sample, and to generate a second explanatory variable by performing composition estimation for each peak interval in the mass spectrum. The partial structure estimation apparatus is further configured to then estimate a partial structure as an objective variable based on the first explanatory variable and the second explanatory variable. In a partial structure estimation model generation apparatus, a partial structure estimation model is generated through machine learning using a training data set.

IPC Classes  ?

  • H01J 49/00 - Particle spectrometers or separator tubes
  • G16C 20/20 - Identification of molecular entities, parts thereof or of chemical compositions

7.

Aberration Correcting Device and Electron Microscope

      
Application Number 18169270
Status Pending
Filing Date 2023-02-15
First Publication Date 2023-08-24
Owner JEOL Ltd. (Japan)
Inventor
  • Morishita, Shigeyuki
  • Sawada, Hidetaka

Abstract

An aberration correcting device includes a first multipole which generates a hexapole field; a second multipole which generates a hexapole field with a polarity opposite to a polarity of the hexapole filed generated by the first multipole; a third multipole which is disposed between the first multipole and the second multipole and generates an octupole field; a first transfer lens system disposed between the first multipole and the third multipole; and a second transfer lens system disposed between the third multipole and the second multipole. The first transfer lens system includes a plurality of fourth multipoles which generate a field in which an electromagnetic-field superposed quadrupole field and an octupole field are superposed; and the second transfer lens system includes a plurality of fifth multipoles which generate a field in which an electromagnetic-field superposed quadrupole field and an octupole field are superposed.

IPC Classes  ?

  • H01J 37/153 - Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams

8.

Phase Analyzer, Sample Analyzer, and Analysis Method

      
Application Number 18108209
Status Pending
Filing Date 2023-02-10
First Publication Date 2023-08-17
Owner JEOL Ltd. (Japan)
Inventor
  • Fujii, Atsuhiro
  • Itoh, Kouta
  • Otake, Yuka

Abstract

A phase analyzer includes a data acquisition unit that acquires a plurality of pieces of spectrum imaging data in which positions on a sample are associated with spectra which are based on signals from the sample; a first acquisition unit that acquires a first representative spectrum group for each piece of spectrum imaging data by performing multivariate analysis on each of the plurality of pieces of spectrum imaging data; a second acquisition unit that acquires a second representative spectrum group by performing multivariate analysis on the plurality of first representative spectrum groups acquired by the first acquisition unit; and a phase analysis unit that performs phase analysis on each of the plurality of pieces of spectrum imaging data by using the second representative spectrum group.

IPC Classes  ?

  • G01J 3/28 - Investigating the spectrum
  • G01J 3/02 - Spectrometry; Spectrophotometry; Monochromators; Measuring colours - Details

9.

Solid sample magnetic coupling high resolution nuclear magnetic resolution probe and method of use

      
Application Number 17896416
Grant Number 11726152
Status In Force
Filing Date 2022-08-26
First Publication Date 2023-08-15
Grant Date 2023-08-15
Owner JEOL LTD. (Japan)
Inventor Zens, Albert

Abstract

In various embodiments of the invention, a solid sample magic angle spinning nuclear magnetic resonance (NMR) probe can utilize an appropriate inductance parent coil with a fixed capacitor and introducing an idler coil with a variable capacitor which can inductively couple to the parent coil by adjusting the variable capacitance of the idler coil. By coupling the idler coil to the parent coil in this manner a double resonance circuit can be provided without the disadvantages of prior art coils. In an alternative embodiment of the invention, a solid sample magic angle spinning nuclear magnetic resonance probe can utilize an appropriate inductance parent coil with a fixed capacitor, introducing an idler coil with a variable capacitor in a first region and two variable inductor coupling coils and two coupling coils in a second region, where the two variable inductors are connected to the parent coil to reduce the number of coils in the sample region of the NMR probe, where variable inductors can inductively couple to the parent coil by adjusting one or both the capacitance of the variable capacitor of the idler coil and/or adjusting the variable inductors to observe a tuned condition between the parent coil and the idler coil.

IPC Classes  ?

  • G01R 33/36 - Electrical details, e.g. matching or coupling of the coil to the receiver
  • G01R 33/34 - Constructional details, e.g. resonators
  • G01R 33/30 - Sample handling arrangements, e.g. sample cells, spinning mechanisms
  • G01R 33/343 - Constructional details, e.g. resonators of slotted-tube or loop-gap type

10.

Aberration Corrector and Electron Microscope

      
Application Number 18107042
Status Pending
Filing Date 2023-02-08
First Publication Date 2023-08-10
Owner JEOL Ltd. (Japan)
Inventor Morishita, Shigeyuki

Abstract

An aberration corrector includes a first multipole element for producing a hexapole field, a second multipole element for producing a hexapole field, and a transfer lens system disposed between the first and second multipole elements. The first and second multipole elements are arranged along an optical axis. At least one of the hexapole fields respectively produced by the first multipole element and the second multipole element varies in strength along the optical axis.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/153 - Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

11.

MAGNETO-OPTICAL TRAP DEVICE, PHYSICAL PACKAGE, PHYSICAL PACKAGE FOR OPTICAL GRID CLOCK, PHYSICAL PACKAGE FOR ATOMIC CLOCK, PHYSICAL PACKAGE FOR ATOMIC INTERFEROMETER, PHYSICAL PACKAGE FOR QUANTUM INFORMATION PROCESSING DEVICE, AND PHYSICAL PACKAGE SYSTEM

      
Application Number JP2023000305
Publication Number 2023/149159
Status In Force
Filing Date 2023-01-10
Publication Date 2023-08-10
Owner
  • RIKEN (Japan)
  • JEOL LTD. (Japan)
Inventor
  • Katori Hidetoshi
  • Yang Hiu Tat Antony
  • Takamoto Masao
  • Tsuji Shigenori

Abstract

1234511 is used together as a laser beam b for Zeeman slowing.

IPC Classes  ?

  • H01S 1/06 - Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range gaseous
  • G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks

12.

Alkyne Compound, Vitamin D Compound, Analytical Method, and Production Method

      
Application Number 18087881
Status Pending
Filing Date 2022-12-23
First Publication Date 2023-08-03
Owner
  • Tokyo University of Agriculture and Technology (Japan)
  • JEOL Ltd. (Japan)
Inventor
  • Nagata, Akiko
  • Mizumoto, Yuka
  • Sakamoto, Ryota
  • Nagasawa, Kazuo
  • Takiwaki, Masaki
  • Kikutani, Yoshikuni
  • Takahashi, Koji
  • Fukuzawa, Seketsu

Abstract

The present invention is intended to provide a compound useful to analyze a vitamin D compound. The present invention provides an alkyne compound represented by Formula (I): The present invention is intended to provide a compound useful to analyze a vitamin D compound. The present invention provides an alkyne compound represented by Formula (I): The present invention is intended to provide a compound useful to analyze a vitamin D compound. The present invention provides an alkyne compound represented by Formula (I): where in Formula (I), A is a linear carbon chain having an alkynyl group at an end and having a vinyl group at another end; X1 is CH or 13CH; X2 is CHY, CDY, 13CHY, 13CDY, CO, 13CO, C18O, or 13C18O; m is an integer from 1 to 4; when m is 2 or more, X2s are identical or different; Y is H, D, NH2, 15NH2, OH, 18OH, SH, OR, O(CO)R, OSO3H, OSO3Na, or a sugar substituent; when Formula (I) contains two or more Ys, Ys are identical or different; R is an alcohol protective group, an alkyl group, an alkenyl group, or an aryl group; X3 is C or 13C; and at least one selected from the group consisting of X1, X2(s), and X3 is modified with a stable isotope D, 13C, 18O, or 15N.

IPC Classes  ?

  • C07C 401/00 - Irradiation products of cholesterol or its derivatives; Vitamin D derivatives, 9,10-seco cyclopenta[a]phenanthrene or analogues obtained by chemical preparation without irradiation
  • G01N 30/72 - Mass spectrometers
  • C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages

13.

Sample Cartridge Holding Apparatus

      
Application Number 18101182
Status Pending
Filing Date 2023-01-25
First Publication Date 2023-07-27
Owner JEOL Ltd. (Japan)
Inventor
  • Sakuta, Norimasa
  • Fukuda, Tomohisa
  • Suzuki, Osamu
  • Shibata, Masateru

Abstract

A sample cartridge has a sample stand and an inclining mechanism. A sample cartridge holding apparatus has a housing part which is inclined. When the sample cartridge is inserted into the housing part, a contact portion contacts a lever of the inclining mechanism, and the sample stand is inclined by a predetermined angle. With this process, an appropriate inclination angle is realized for the sample stand.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

14.

ATOM BEAM GENERATION DEVICE, PHYSICS PACKAGE, PHYSICS PACKAGE FOR OPTICAL LATTICE CLOCK, PHYSICS PACKAGE FOR ATOMIC CLOCK, PHYSICS PACKAGE FOR ATOMIC INTERFEREROMETER, PHYSICS PACKAGE FOR QUANTUM INFORMATION PROCESSING DEVICE, AND PHYSICS PACKAGE SYSTEM

      
Application Number JP2022041615
Publication Number 2023/139895
Status In Force
Filing Date 2022-11-08
Publication Date 2023-07-27
Owner
  • RIKEN (Japan)
  • JEOL LTD. (Japan)
Inventor
  • Katori Hidetoshi
  • Takamoto Masao
  • Tsuji Shigenori

Abstract

An atom beam generation device (100) comprises an atomic oven (102) including a sample chamber (106) in which a sample (114) is contained, a deceleration unit (104), and coil units (110, 124). The deceleration unit (104) includes a bore (122) through which an atom gas and a laser light (128) pass, and decelerates an atom gas emitted from the atomic oven (102) by means of light and a magnetic field. The coil units (110, 124) supply Joule heat to the atomic oven (102), and generates a magnetic field in the deceleration unit (104).

IPC Classes  ?

  • H01S 1/06 - Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range gaseous
  • G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks

15.

Physical Package for Optical Lattice Clock

      
Application Number 17915797
Status Pending
Filing Date 2021-03-30
First Publication Date 2023-07-20
Owner
  • JEOL Ltd. (Japan)
  • RIKEN (Japan)
Inventor
  • Tsuji, Shigenori
  • Takamoto, Masao
  • Katori, Hidetoshi

Abstract

A physical package is provided with: a MOT device; an optical chamber which constitutes an optical lattice formation portion; and a vacuum chamber which surrounds these components and has a substantially cylindrical shape. The MOT device is arranged along the beam axis of an atomic beam and traps an atom cluster. The optical lattice formation portion uses optical lattice light that enters therein to form an optical lattice in a cavity, confines the atom cluster trapped by the MOT device in the optical lattice, and transfers, along the X-axis which is a movement axis perpendicular to the beam axis, the atom cluster to a clock transition space which facilitates clock transition. The central axis of the cylinder of the main body of the vacuum chamber passes through the clock transition space, and is set to be substantially parallel with the beam axis.

IPC Classes  ?

  • G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
  • H01S 1/06 - Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range gaseous
  • G02F 1/09 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect
  • H01J 37/16 - Vessels; Containers

16.

Focused Ion Beam System and Method of Correcting Deviation of Field of View of Ion Beam

      
Application Number 18099127
Status Pending
Filing Date 2023-01-19
First Publication Date 2023-07-20
Owner JEOL Ltd. (Japan)
Inventor
  • Ohori, Yuichiro
  • Tajima, Keiji

Abstract

An FIB system includes an ion source for producing the ion beam, a lens system which includes an objective lens and which is operative to focus the ion beam onto a sample such that secondary electrons are produced from the sample, a detector for detecting the secondary electrons, and a controller for controlling the lens system. The controller operates i) to provide control so that a focus of the ion beam is varied by directing the ion beam onto the sample, ii) to measure a signal intensity from the secondary electrons produced from the sample during the variation of the strength of the objective lens, iii) to adjust the focus of the ion beam, iv) to acquire a secondary electron image containing an image of a trace of a spot, and v) to correct the deviation of the field of view of the ion beam.

IPC Classes  ?

  • H01J 37/304 - Controlling tubes by information coming from the objects, e.g. correction signals
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • H01J 37/10 - Lenses
  • H01J 37/21 - Means for adjusting the focus

17.

Optical Lattice Clock and Magnetic Field Correction Method for Optical Lattice Clock

      
Application Number 17915776
Status Pending
Filing Date 2021-03-30
First Publication Date 2023-07-06
Owner
  • JEOL Ltd. (Japan)
  • RIKEN (Japan)
Inventor
  • Tsuji, Shigenori
  • Takamoto, Masao
  • Katori, Hidetoshi

Abstract

An optical lattice clock includes a clock transition space having disposed therein an atom group trapped in an optical lattice, and a triaxial magnetic field correction coil for correcting the magnetic field of the clock transition space. Additionally, in a correction space that includes the clock transition space and is larger than the clock transition space, a photoreceiver promotes the clock transition of the atom group trapped in the optical lattice and acquires a clock transition frequency distribution for the correction space. Further, a corrector corrects the magnetic field of the triaxial magnetic field correction coil on the basis of the frequency distribution measured by the photo receiver.

IPC Classes  ?

  • H03L 7/26 - Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference
  • G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks

18.

Sample Cartridge Carrier Apparatus and Carrier Base

      
Application Number 18085310
Status Pending
Filing Date 2022-12-20
First Publication Date 2023-06-29
Owner JEOL Ltd. (Japan)
Inventor Shimizu, Masashi

Abstract

A sample cartridge carrier apparatus is coupled with a focused ion beam processing apparatus (FIB processing apparatus). A guide mechanism is configured to guide a series of movements of a sample cartridge holder to allow a sample cartridge to be held by a carrier base on a sub stage. Sub cooling equipment is configured to cool the sample cartridge via the sub stage. A carrier mechanism carries the carrier base between the sub stage and a main stage.

IPC Classes  ?

  • H01J 37/32 - Gas-filled discharge tubes
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

19.

Apparatus and Method for Milling Sample

      
Application Number 18083630
Status Pending
Filing Date 2022-12-19
First Publication Date 2023-06-22
Owner JEOL Ltd. (Japan)
Inventor Kozuka, Munehiro

Abstract

Provided is a sample milling apparatus capable of milling various samples efficiently. The sample milling apparatus includes an anode, a cathode for emitting electrons which are made to collide with gas molecules so that ions are generated, an extraction electrode for causing the generated ions to be extracted as an ion beam, and a focusing electrode disposed between the cathode and the extraction electrode and applied with a focusing voltage. The spatial profile of the ion beam is controlled by varying the focusing voltage applied to the focusing electrode.

IPC Classes  ?

  • H01J 37/21 - Means for adjusting the focus
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

20.

High Voltage Amplifier Circuit and Analyzer Apparatus

      
Application Number 17980653
Status Pending
Filing Date 2022-11-04
First Publication Date 2023-05-11
Owner JEOL Ltd. (Japan)
Inventor Arimitsu, Masahiro

Abstract

An amplifier circuit includes a constant current circuit for outputting a constant current signal at its output terminal, an operational amplifier for outputting an amplified control signal based on the first voltage signal, and an amplified voltage output circuit for outputting a second voltage signal based on both the constant current signal and the amplified control signal. The constant current circuit has a light-emitting device having one end supplied with the constant voltage signal and another end supplied with ground potential, a light responsive electricity generating device for outputting a drive signal in response to light emitted by the light-emitting device, a first transistor generating the constant current signal based on the amplified voltage signal applied thereto and to output the constant current signal; and a current control circuit for detecting the value of the constant current signal and controlling the supply of the drive signal based on the detection.

IPC Classes  ?

  • H02M 3/158 - Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only with automatic control of output voltage or current, e.g. switching regulators including plural semiconductor devices as final control devices for a single load
  • H01J 37/248 - Components associated with high voltage supply

21.

Angle Adjuster for NMR

      
Application Number 17984650
Status Pending
Filing Date 2022-11-10
First Publication Date 2023-05-11
Owner JEOL Ltd. (Japan)
Inventor Endo, Yuki

Abstract

An angle adjuster for nuclear magnetic resonance (NMR) includes a linear motion member composed of a shaft and a support member, a rotary member, a conversion mechanism, and a spring. The linear motion member is a member that serves to change, in an NMR probe device, an angle of a sample tube by a linear motion. The rotary member is rotated by a motor. The conversion mechanism converts a rotary motion of the rotary member into a linear motion of the linear motion member. The spring provides, at a portion where the linear motion member and the rotary member are in engagement with each other, a force that urges the linear motion member in one direction toward the rotary member.

IPC Classes  ?

  • G01R 33/30 - Sample handling arrangements, e.g. sample cells, spinning mechanisms
  • G01R 33/483 - NMR imaging systems with selection of signal or spectra from particular regions of the volume, e.g. in vivo spectroscopy

22.

Triaxial Magnetic Field Correction Coil, Physics Package, Physics Package for Optical Lattice Clock, Physics Package for Atomic Clock, Physics Package for Atom Interferometer, Physics Package for Quantum Information Processing Device, and Physics Package System

      
Application Number 17915720
Status Pending
Filing Date 2021-03-30
First Publication Date 2023-05-04
Owner
  • JEOL Ltd. (Japan)
  • RIKEN (Japan)
Inventor
  • Tsuji, Shigenori
  • Takamoto, Masao
  • Katori, Hidetoshi

Abstract

There is a need to maintain or enhance the magnetic field correction accuracy of a physics package while making the physics package more compact and portable. A triaxial magnetic field correction coil provided inside a vacuum chamber surrounding a clock transition space having atoms disposed therein. The triaxial magnetic field correction coil formed into a shape such that it is possible to correct, for magnetic field components of three axial directions passing through the clock transition space, a constant term, a first order spatial derivative term, a second order spatial derivative term, a third or higher order spatial derivative term, or some given combination of these terms. The triaxial magnetic field correction coil can be used in, for example, a physics package for an optical lattice clock.

IPC Classes  ?

  • H03L 7/26 - Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference
  • G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
  • H01F 7/20 - Electromagnets; Actuators including electromagnets without armatures

23.

NMR Measurement Apparatus

      
Application Number 17974678
Status Pending
Filing Date 2022-10-27
First Publication Date 2023-05-04
Owner JEOL Ltd. (Japan)
Inventor
  • Hachitani, Kenichi
  • Nemoto, Nobuaki
  • Hamatsu, Junpei
  • Yamazaki, Fumihiro
  • Suzuki, Takayuki

Abstract

In a frequency converter, a transmission signal having a first frequency component and a second frequency component is multiplied by a local signal, to thereby frequency-convert the transmission signal. In a power amplifier, the frequency-converted transmission signal is amplified. A demultiplexing circuit generates a first transmission signal and a second transmission signal from the amplified transmission signal. A controller is configured to set for a transmission section a frequency set suitable for two irradiation frequencies.

IPC Classes  ?

24.

Mass Spectrometry Apparatus and Mass Spectrometry Method

      
Application Number 17974836
Status Pending
Filing Date 2022-10-27
First Publication Date 2023-05-04
Owner JEOL Ltd. (Japan)
Inventor
  • Mukousaka, Shinichi
  • Kou, Junkei
  • Konuma, Kiyotaka

Abstract

Ions ejected from a collision cell are detected by a detector. An evaluation unit generates a temporary calibration curve based on an intensity of a detection signal and evaluates an ion accumulation time of the collision cell based on the temporary calibration curve. When the evaluation unit determines signal saturation, the ion accumulation time of the collision cell is reduced. When the evaluation unit determines sensitivity insufficiency, the ion accumulation time of the collision cell is increased.

IPC Classes  ?

  • H01J 49/10 - Ion sources; Ion guns
  • H01J 49/42 - Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons
  • H01J 49/00 - Particle spectrometers or separator tubes

25.

Phase Analyzer, Sample Analyzer, and Analysis Method

      
Application Number 17978466
Status Pending
Filing Date 2022-11-01
First Publication Date 2023-05-04
Owner JEOL Ltd. (Japan)
Inventor
  • Itoh, Kouta
  • Fujii, Atsuhiro
  • Otake, Yuka

Abstract

A phase analyzer includes a data acquisition unit that acquires spectrum imaging data in which a position on a sample is associated with a spectrum of a signal from the sample; a candidate determination unit that performs multivariate analysis on the spectrum imaging data to determine candidates for the number of phases; a phase analysis unit that creates, for each of the candidates, a phase map group including a number of phase maps corresponding to the number of phases; and a display control unit that causes a display unit to display, for each of the candidates, the phase map group.

IPC Classes  ?

  • G01N 23/2208 - Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement all measurements being of secondary emission, e.g. combination of SE measurement and characteristic X-ray measurement
  • G01N 23/2252 - Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
  • G16C 20/80 - Data visualisation
  • G06T 7/00 - Image analysis

26.

Phase Analyzer, Sample Analyzer, and Analysis Method

      
Application Number 17978518
Status Pending
Filing Date 2022-11-01
First Publication Date 2023-05-04
Owner JEOL Ltd. (Japan)
Inventor
  • Otake, Yuka
  • Fujii, Atsuhiro

Abstract

A phase analyzer includes a data acquisition unit that acquires spectrum imaging data in which a position on a sample is associated with a spectrum of a signal from the sample; a phase analysis unit that performs phase analysis based on the spectrum imaging data; a display control unit that displays results of the phase analysis on a first screen; and a condition reception unit that receives an operation for changing a condition for the phase analysis, when the condition reception unit has received the operation for changing the condition, the phase analysis unit performing phase analysis under the changed condition, the display control unit displaying on a second screen the results of the phase analysis performed under the changed condition and when a predetermined operation has been performed, the display control unit reflecting on the first screen the results of the phase analysis displayed on the second screen.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes

27.

Electron Microscope and Image Acquisition Method

      
Application Number 17973993
Status Pending
Filing Date 2022-10-26
First Publication Date 2023-04-27
Owner JEOL Ltd. (Japan)
Inventor
  • Somehara, Kazunori
  • Kohno, Yuji

Abstract

An electron microscope includes an electron source for emitting an electron beam, an illumination lens for focusing the beam, an aberration corrector for correcting aberrations, an illumination deflector assembly disposed between the illumination lens and the aberration corrector and operating to deflect the beam and to vary its tilt relative to a sample, a scanning deflector for scanning the sample with the beam, an objective lens, a detector for detecting electrons transmitted through the sample and producing an image signal, a control section for controlling the illumination deflector assembly, and an image generating section for receiving the image signal and generating a differential phase contrast (DPC) image. The tilt of the beam is varied by the illumination deflector assembly such that the image generating section generates a plurality of DPC images at different tilt angles of the beam and creates a final image based on the DPC images.

IPC Classes  ?

  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path
  • H01J 37/10 - Lenses
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams

28.

Tri-Axial Magnetic Field Correction Coil, Physical Package, Physical Package for Optical Lattice Clock, Physical Package for Atomic Clock, Physical Package for Atom Interferometer, Physical Package for Quantum Information Processing Device, and Physical Package System

      
Application Number 17915745
Status Pending
Filing Date 2021-03-30
First Publication Date 2023-04-20
Owner
  • JEOL Ltd. (Japan)
  • RIKEN (Japan)
Inventor
  • Tsuji, Shigenori
  • Takamoto, Masao
  • Katori, Hidetoshi

Abstract

A tri-axial magnetic field correction coil includes a first coil group and a second coil group with respect to an X-axis direction that passes through a clock transition space in which atoms are disposed. The first coil group is a Helmholtz-type coil composed in a point-symmetrical shape around the clock transition space. The second coil group is composed in a point-symmetrical shape around the clock transition space with respect to the X-axis direction, and is a non-Helmholtz-type coil that differs from the first coil group in terms of coil size, coil shape, or distance between coils.

IPC Classes  ?

  • H01F 7/20 - Electromagnets; Actuators including electromagnets without armatures
  • H03L 7/26 - Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference
  • G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks

29.

Radiation Detection Apparatus and Sample Analysis Apparatus

      
Application Number 17964340
Status Pending
Filing Date 2022-10-12
First Publication Date 2023-04-13
Owner JEOL Ltd. (Japan)
Inventor
  • Kinugasa, Genki
  • Miyatake, Kouji
  • Yanagihara, Kota
  • Isobe, Ryuichi

Abstract

There is provided a radiation detection apparatus capable of effectively discriminating between noise and X-ray signal. The radiation detection apparatus includes a detector for detecting radiation and producing a detector output signal, a first differential filter having a time constant and operative to differentiate and convert the detector output signal into a first pulsed signal, a second differential filter having a time constant greater than that of the first differential filter and operative to differentiate and convert the detector output signal into a second pulsed signal, and a noise detection section for detecting noise based on the difference in timing between peaks of the first and second pulsed signals.

IPC Classes  ?

  • G01T 1/17 - Circuit arrangements not adapted to a particular type of detector
  • G01T 1/36 - Measuring spectral distribution of X-rays or of nuclear radiation
  • G01T 1/24 - Measuring radiation intensity with semiconductor detectors

30.

Phosphonium Compound, Reagent Kit for Derivatization, Mass Spectrometric Method, and Method for Producing Phosphonium Compound

      
Application Number 17961020
Status Pending
Filing Date 2022-10-06
First Publication Date 2023-04-13
Owner JEOL Ltd. (Japan)
Inventor
  • Fukuzawa, Seketsu
  • Takahashi, Koji
  • Itoh, Yoshiyuki
  • Takiwaki, Masaki
  • Tsuda, Shugo
  • Mochizuki, Masayoshi
  • Yoshiya, Taku

Abstract

Provided is a phosphonium compound represented by Formula (I): Provided is a phosphonium compound represented by Formula (I): Provided is a phosphonium compound represented by Formula (I): in Formula (I), R1, R2, and R3 are independently from each other, an alkyl group or an aryl group, the alkyl group is a substituted or unsubstituted, linear or branched alkyl group having 1 to 20 carbon atoms or a substituted or unsubstituted cyclic alkyl group having 5 to 20 carbon atoms, the aryl group is a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; X is a reactive group having a hydrazide group, a halide group, a pseudohalide group, or a thioester group; and Y− is an anion having a total charge of −1, or Y− is absence.

IPC Classes  ?

  • C07F 9/54 - Quaternary phosphonium compounds

31.

Charged Particle Beam System and Control Method Therefor

      
Application Number 17964516
Status Pending
Filing Date 2022-10-12
First Publication Date 2023-04-13
Owner JEOL Ltd. (Japan)
Inventor
  • Kaneko, Takeshi
  • Ishikawa, Isamu
  • Okunishi, Eiji

Abstract

Provided is a charged particle beam system capable of preventing the data acquisition time from increasing. A control method for the system is also provided. The charged particle beam system includes: a beam blanker for blanking a charged particle beam; a sample stage on which a sample is tiltably held and thus can assume a tilt angle; a blanking controller for controlling the blanking of the charged particle beam and causing a pulsed beam having a duty ratio to be directed at the sample; and a tilt controller for controlling the tilt angle of the sample. The blanking controller sets the duty ratio of the pulsed beam based on the tilt angle of the sample.

IPC Classes  ?

  • H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

32.

Charged Particle Beam Apparatus and Image Adjustment Method

      
Application Number 17951951
Status Pending
Filing Date 2022-09-23
First Publication Date 2023-03-30
Owner JEOL Ltd. (Japan)
Inventor Mihira, Tomohiro

Abstract

Provided is a charged particle beam apparatus that acquires an image by scanning a specimen with a charged particle beam, and includes a contrast adjustment circuit that adjusts contrast of the image; a brightness adjustment circuit that adjusts brightness of the image; and a control unit that controls the contrast adjustment circuit and the brightness adjustment circuit. The control unit acquires information on luminance of a reference image in a non-signal state, and information on an average value of luminance of each pixel of the reference image, controls the brightness adjustment circuit, based on the acquired information on luminance of the reference image in a non-signal state, acquires the image in a state where the brightness adjustment circuit is controlled, and adjusts the contrast of the acquired image by controlling the contrast adjustment circuit, based on the average value of luminance of each pixel of the reference image.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01J 37/244 - Detectors; Associated components or circuits therefor

33.

Scatter Diagram Display Device, Scatter Diagram Display Method, and Analyzer

      
Application Number 17941540
Status Pending
Filing Date 2022-09-09
First Publication Date 2023-03-16
Owner JEOL Ltd. (Japan)
Inventor
  • Kato, Naoki
  • Kimura, Takashi
  • Tsukamoto, Kazunori

Abstract

Provided is a scatter diagram display device that creates a plurality of scatter diagrams based on mapping data acquired by an analyzer and displays a scatter diagram matrix in which the created plurality of scatter diagrams are arranged in a matrix on a display section, the scatter diagram display device including: a display condition acceptance section that accepts a designation of a display range of an item in each of the plurality of scatter diagrams, and a display control section that extracts all scatter diagrams having the item whose display range has been designated from the plurality of scatter diagrams and changes the display range of the item in the extracted scatter diagrams based on the designation of the display range.

IPC Classes  ?

  • G01N 23/2252 - Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]

34.

Charged Particle Beam Drawing Apparatus and Control Method for Charged Particle Beam Drawing Apparatus

      
Application Number 17939425
Status Pending
Filing Date 2022-09-07
First Publication Date 2023-03-09
Owner JEOL Ltd. (Japan)
Inventor Aida, Yukinori

Abstract

Provided is a charged particle beam drawing apparatus including a measurement unit that scans a reference mark disposed on a stage with a charged particle beam to detect a position of the reference mark, and measures a positional deviation amount of the charged particle beam, based on the detected position; and a positional correction unit that corrects a drawing position based on the measured positional deviation amount. A plurality of the reference marks is disposed on the stage, and the measurement unit switches from one of the reference marks used for the measurement of the positional deviation amount to another one of the reference marks that is not used yet, when a predetermined condition has been satisfied.

IPC Classes  ?

  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • H01J 37/304 - Controlling tubes by information coming from the objects, e.g. correction signals

35.

Charged Particle Beam Device and Image Generation Method

      
Application Number 17939309
Status Pending
Filing Date 2022-09-07
First Publication Date 2023-03-09
Owner JEOL Ltd. (Japan)
Inventor
  • Hashiguchi, Hiroki
  • Yagi, Kazuki
  • Bloom, Ruth Shewmon
  • Reed, Bryan W.

Abstract

A charged particle beam device scans a specimen with a charged particle beam and generates an image based on a detected signal from a detector that detects a signal generated from the specimen based on the scan performed by the charged particle beam. The charged particle beam device includes: a blanker that performs blanking of the charged particle beam; an image acquisition unit that acquires a plurality of images by controlling the blanking during the scan performed by the charged particle beam, the plurality of images including pixels corresponding to a region of the specimen that is irradiated with the charged particle beam and pixels corresponding to a region of the specimen that is not irradiated with the charged particle beam; and an integrated image generation unit that generates an integrated image by integrating the plurality of acquired images.

IPC Classes  ?

  • H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material

36.

NMR Measurement Apparatus, and Method of Identifying Solvent

      
Application Number 17884745
Status Pending
Filing Date 2022-08-10
First Publication Date 2023-02-16
Owner JEOL Ltd. (Japan)
Inventor
  • Sasakawa, Hiroaki
  • Asakura, Katsuo
  • Izumi, Kenya

Abstract

An NMR spectrum is acquired from a nucleus of interest in a solvent included in a sample solution. A spectrum analyzer analyzes a number of splits, a splitting interval, a number of signals, and a signal interval based on the NMR spectrum. Based on these characteristic quantities, an identifier identifies the solvent. In another configuration, a plurality of NMR spectra acquired from a plurality of nuclei of interest included in the solvent may be analyzed.

IPC Classes  ?

  • G01N 24/08 - Investigating or analysing materials by the use of nuclear magnetic resonance, electron paramagnetic resonance or other spin effects by using nuclear magnetic resonance

37.

NMR Apparatus and Gas Replacement Method for Replacing Gas in NMR Probe

      
Application Number 17885894
Status Pending
Filing Date 2022-08-11
First Publication Date 2023-02-16
Owner
  • JEOL Ltd. (Japan)
  • OSAKA UNIVERSITY (Japan)
Inventor
  • Takahashi, Hiroki
  • Endo, Yuki
  • Fujiwara, Toshimichi
  • Matsuki, Yoh

Abstract

An NMR apparatus includes a depressurizing device for depressurizing an NMR probe, a gas supply device for supplying gas into the NMR probe to thereby pressurize the NMR probe, and a control device. The control device alternately repeats depressurization of the NMR probe, using the depressurizing device, and pressurization of the NMR probe, using the gas supply device. This replaces the gas in the NMR probe.

IPC Classes  ?

  • G01R 33/30 - Sample handling arrangements, e.g. sample cells, spinning mechanisms

38.

Three-Dimensional Powder Bed Fusion Additive Manufacturing Apparatus

      
Application Number 17886841
Status Pending
Filing Date 2022-08-12
First Publication Date 2023-02-16
Owner JEOL Ltd. (Japan)
Inventor
  • Naruse, Tatsuo
  • Shimizu, Takayuki

Abstract

A vacuum pump that evacuates an inside of a vacuum chamber and powder capturing devices disposed on an intake side of the vacuum pump are included. The powder capturing devices include a plurality of flow path forming units that form a continuous gas flow path from an intake unit located on the vacuum chamber side to an exhaust unit located on the vacuum pump side. The plurality of flow path forming units include a first flow path forming unit having a first catching unit that causes the powder sucked from the intake unit to collide and then catch the powder, and a second flow path forming unit having a second catching unit that causes the powder passing through the first flow path forming unit to collide and then catch the powder.

IPC Classes  ?

  • B22F 12/70 - Gas flow means
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 40/00 - Auxiliary operations or equipment, e.g. for material handling

39.

Three-Dimensional Powder Bed Fusion Additive Manufacturing Apparatus

      
Application Number 17886781
Status Pending
Filing Date 2022-08-12
First Publication Date 2023-02-16
Owner JEOL Ltd. (Japan)
Inventor
  • Naruse, Tatsuo
  • Miyakita, Ayumu
  • Daino, Yohei

Abstract

A three-dimensional PBF-AM apparatus includes a stage on which a powder material is spread, and a tubular build box disposed in a state of surrounding the stage. The build box includes a side wall portion having a first tubular member surrounding the stage and a second tubular member surrounding the stage with the first tubular member interposed therebetween and forming a space with the first tubular member, and moreover, a vacuum heat insulating layer can be formed inside the side wall portion by vacuuming the space.

IPC Classes  ?

  • B22F 10/322 - Process control of the atmosphere, e.g. composition or pressure in a building chamber of the gas flow, e.g. rate or direction
  • B22F 12/30 - Platforms or substrates
  • B22F 10/47 - Structures for supporting workpieces or articles during manufacture and removed afterwards characterised by structural features
  • B22F 12/20 - Cooling means

40.

Electron Microscope and Method of Correcting Aberration

      
Application Number 17869117
Status Pending
Filing Date 2022-07-20
First Publication Date 2023-01-26
Owner JEOL Ltd. (Japan)
Inventor
  • Aibara, Keito
  • Nakamichi, Tomohiro
  • Morishita, Shigeyuki
  • Saito, Motofumi
  • Sagawa, Ryusuke
  • Uematsu, Fuminori

Abstract

Prior to execution of primary correction, a first centering process, an in-advance correction of a particular aberration, and a second centering process are executed stepwise. In the first centering process and the second centering process, a ronchigram center is identified based on a ronchigram variation image, and is matched with an imaging center. In the in-advance correction and the post correction of the particular aberration, a particular aberration value is estimated based on a ronchigram, and the particular aberration is corrected based on the particular aberration value.

IPC Classes  ?

  • H01J 37/153 - Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
  • H01J 37/244 - Detectors; Associated components or circuits therefor
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams

41.

Analyzer Apparatus and Method of Image Processing

      
Application Number 17825272
Status Pending
Filing Date 2022-05-26
First Publication Date 2023-01-26
Owner JEOL Ltd. (Japan)
Inventor
  • Morita, Masaki
  • Tanaka, Naoya

Abstract

There is provided an analyzer apparatus capable of generating crisp scanned images. In the analyzer apparatus, a sample is scanned with a probe such that a first signal and a second signal are emitted from the sample. The analyzer apparatus comprises: a first detector for detecting the first signal and producing a first detector signal; a second detector for detecting the second signal and producing a second detector signal; and an image processing unit operating (i) to produce a first scanned image and a second scanned image from the first detector signal and the second detector signal, respectively, (ii) to create a filter based on the second scanned image having a higher signal-to-noise ratio than that of the first scanned image, and (iii) to apply the filter to the first scanned image.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 5/20 - Image enhancement or restoration by the use of local operators

42.

Electron Microscope and Image Generation Method

      
Application Number 17858436
Status Pending
Filing Date 2022-07-06
First Publication Date 2023-01-19
Owner JEOL Ltd. (Japan)
Inventor Nakamura, Motohiro

Abstract

Provided is an electron microscope for generating a montage image by acquiring images of a plurality of regions in a montage image capturing region set on a specimen, and by connecting the acquired images. The electron microscope includes a specimen surface height calculating unit that calculates a distribution of specimen surface heights in the montage image capturing region by performing curved surface approximation based on the specimen surface heights determined by performing focus adjustment at a plurality of points set in a region including the montage image capturing region, and an image acquiring unit that acquires the images of the plurality of regions based on the calculated distribution of the specimen surface heights.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01J 37/21 - Means for adjusting the focus

43.

Scanning Electron Microscope and Objective Lens

      
Application Number 17859399
Status Pending
Filing Date 2022-07-07
First Publication Date 2023-01-19
Owner JEOL Ltd. (Japan)
Inventor
  • Nakamura, Motohiro
  • Kobayashi, Takeyuki

Abstract

There is provided a scanning electron microscope which has a sample chamber capable of being evacuated to a low vacuum. The scanning electron microscope includes an electron gun for emitting an electron beam, an objective lens for focusing the emitted beam onto a sample, and a sample chamber in which the sample is housed. The objective lens includes an inner polepiece, an outer polepiece disposed outside the inner polepiece and facing the sample chamber, at least one through-hole extending through the inner and outer polepieces, and at least one cover member that closes off the through-hole. An opening is formed between the inner polepiece and the outer polepiece. The objective lens causes leakage of magnetic field from the opening toward the sample. The sample chamber has a degree of vacuum lower than that in an inner space that forms an electron beam path inside the inner polepiece.

IPC Classes  ?

  • H01J 37/14 - Lenses magnetic
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams

44.

Three-Dimensional Powder Bed Fusion Additive Manufacturing Apparatus and Three-Dimensional Powder Bed Fusion Additive Manufacturing Method

      
Application Number 17865632
Status Pending
Filing Date 2022-07-15
First Publication Date 2023-01-19
Owner JEOL Ltd. (Japan)
Inventor
  • Tsutagawa, Nari
  • Sato, Takashi
  • Daino, Yohei
  • Koiwa, Kozo
  • Kaneko, Yuhei
  • Kawakami, Masahiko

Abstract

An apparatus includes a build plate, a powder application apparatus that applies metal powder onto the build plate to form a powder layer, a beam irradiation apparatus that irradiates the powder layer with an electron beam, and a control unit that controls the powder application apparatus and the beam irradiation apparatus. When the powder layer is preheated by irradiation with the electron beam, the control unit sets a beam size and an irradiation position of the electron beam such that lines of the electron beam do not overlap each other at least at a start of preheating, and controls the beam irradiation apparatus to gradually increase at least one of a beam current and the beam size of the electron beam from the start of preheating to an end of preheating.

IPC Classes  ?

  • B22F 10/362 - Process control of energy beam parameters for preheating
  • B22F 12/41 - Radiation means characterised by the type, e.g. laser or electron beam
  • B22F 12/49 - Scanners
  • B22F 12/50 - Means for feeding of material, e.g. heads
  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
  • B22F 10/366 - Scanning parameters, e.g. hatch distance or scanning strategy
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor

45.

Specimen Machining Device and Specimen Machining Method

      
Application Number 17865850
Status Pending
Filing Date 2022-07-15
First Publication Date 2023-01-19
Owner JEOL Ltd. (Japan)
Inventor
  • Kimura, Tatsuhito
  • Kozuka, Munehiro
  • Sugano, Naoki

Abstract

A specimen machining device includes an illumination system that illuminates a specimen; a camera that photographs the specimen; and a processing unit that controls the illumination system and the camera, and acquires a machining control image which is used for controlling an ion source and a display image which is displayed on a display unit. The processing unit controls the illumination system to illuminate the specimen under a machining illumination condition; acquires the machining control image by controlling the camera to photograph the specimen illuminated under the machining control illumination condition; controls the ion source based on the machining control image; controls the illumination system to illuminate the specimen under a display illumination condition which is different from the machining control illumination condition; acquires the display image by controlling the camera to photograph the specimen illuminated under the display illumination condition; and displays the display image on the display unit.

IPC Classes  ?

  • G01B 21/06 - Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness specially adapted for measuring length or width of objects while moving
  • G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens
  • G02B 21/26 - Stages; Adjusting means therefor

46.

Stage Apparatus and Electron Beam Lithography System

      
Application Number 17849776
Status Pending
Filing Date 2022-06-27
First Publication Date 2022-12-29
Owner JEOL Ltd. (Japan)
Inventor
  • Miyao, Hirofumi
  • Kobayashi, Noriyuki

Abstract

A stage apparatus includes a surface plate as well as a guide shaft fixedly secured to the surface plate, a drive member moving along the guide shaft, and a hydrostatic fluid bearing that forms fluid films in the gap portion between the guide shaft and the drive member. The apparatus further includes: a positional deviation detection section—for detecting a relative positional deviation which occurs between the guide shaft and the drive member and which affects the thickness dimensions of the fluid films; and a state decision section for making a decision on the condition of the apparatus itself based on the positional deviation detected by the detection section and outputting information responsive to the decision.

IPC Classes  ?

  • G03F 7/20 - Exposure; Apparatus therefor
  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

47.

Mass Spectrum Processing Device and Mass Spectrum Processing Method

      
Application Number 17843221
Status Pending
Filing Date 2022-06-17
First Publication Date 2022-12-22
Owner JEOL Ltd. (Japan)
Inventor Satoh, Takaya

Abstract

Peak determination is executed with respect to the mass spectrum of a sample to generate a peak list. For each of the plurality of peaks contained in the peak list, a Kendrick mass (KM) of a designated monomer is calculated. An RKM is calculated, the RKM being a fractional part of a value obtained by dividing the KM by the integer mass of the monomer, or a remainder of dividing a nominal Kendrick mass (NKM) by the integer mass of the monomer. A plurality of peaks contained in the peak list and satisfying a grouping condition, including the permissible range of the RKM of the starting point peak, are grouped.

IPC Classes  ?

  • H01J 49/00 - Particle spectrometers or separator tubes

48.

Electron Beam Inspection System

      
Application Number 17844120
Status Pending
Filing Date 2022-06-20
First Publication Date 2022-12-22
Owner JEOL Ltd. (Japan)
Inventor
  • Kusakabe, Ryuichi
  • Kobayashi, Noriyuki

Abstract

There is provided an electron beam inspection system which can enhance the safety of the whole system if servo valves are deactivated in the event of a power failure or an emergency stop. The electron beam inspection system has a beam source, a stage mechanism, and a pump. The stage mechanism has a guide shaft, a slider, a first servo valve, a second servo valve, a first exhaust pipe, a second exhaust pipe, and an exhaust valve. The slider is movably supported to the guide shaft via a hydrostatic bearing and has a first pressure subchamber and a second pressure subchamber. The exhaust valve is mounted in the first exhaust pipe. When the servo valves are in operation, the exhaust valve is opened. When supply of electric power to the servo valves is ceased, the exhaust valve is closed.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

49.

Scanning Electron Microscope and Image Generation Method Using Scanning Electron Microscope

      
Application Number 17830873
Status Pending
Filing Date 2022-06-02
First Publication Date 2022-12-08
Owner JEOL Ltd. (Japan)
Inventor Otsuka, Takeshi

Abstract

An electron beam is irradiated on a specimen in a state where a negative voltage is applied to the specimen. The specimen is rotated to establish an optimum orientation of a specimen surface shape relative to an orientation of a detector having two detection surfaces disposed at rotational symmetric positions with respect to an optical axis of the electron beam taken as an axis of rotation, and an image is generated based on a quantity of a signal from reflected electrons detected by the detector.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/244 - Detectors; Associated components or circuits therefor

50.

Charged Particle Beam Apparatus and Image Acquiring Method

      
Application Number 17831144
Status Pending
Filing Date 2022-06-02
First Publication Date 2022-12-08
Owner JEOL Ltd. (Japan)
Inventor Otsuka, Takeshi

Abstract

A charged particle beam apparatus acquires a scanned image by scanning a specimen with a charged particle beam, and detecting charged particles emitted from the specimen. The apparatus includes a charged particle beam source that emits the charged particle beam; an irradiation optical system that scans the specimen with the charged particle beam; a plurality of detection units that detects the charged particles emitted from the specimen; and an image processing unit that reconstructs a profile of a specimen surface of the specimen, based on a plurality of detection signals outputted from the plurality of detection units. The image processing unit: determines an inclination angle of the specimen surface, based on the plurality of detection signals; processing to determine a height of the specimen surface, based on the scanned image; and reconstructs the profile of the specimen surface, based on the inclination angle and the height.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/244 - Detectors; Associated components or circuits therefor

51.

Specimen Machining Device and Information Provision Method

      
Application Number 17832001
Status Pending
Filing Date 2022-06-03
First Publication Date 2022-12-08
Owner JEOL Ltd. (Japan)
Inventor
  • Kimura, Tatsuhito
  • Kozuka, Munehiro
  • Negishi, Tsutomu
  • Kawahara, Hisashi

Abstract

A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, an information provision unit for providing information indicating an expected machining completion time, and a storage unit for storing past machining information. The information provision unit performs processing for calculating the expected machining completion time based on the past machining information, processing for acquiring an image photographed by the camera, processing for calculating a machining speed based on the acquired image, and processing for updating the expected machining completion time based on the machining speed.

IPC Classes  ?

  • H01J 37/304 - Controlling tubes by information coming from the objects, e.g. correction signals
  • H01J 37/08 - Ion sources; Ion guns
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/22 - Optical or photographic arrangements associated with the tube

52.

Specimen Machining Device and Specimen Machining Method

      
Application Number 17832054
Status Pending
Filing Date 2022-06-03
First Publication Date 2022-12-08
Owner JEOL Ltd. (Japan)
Inventor
  • Kozuka, Munehiro
  • Negishi, Tsutomu
  • Kimura, Tatsuhito
  • Ishikawa, Yoshikazu
  • Kawahara, Hisashi

Abstract

A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a shielding member disposed on the specimen to block the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, a coaxial illumination device for irradiating the specimen with illumination light along an optical axis of the camera, and a processing unit for determining whether to terminate the machining based on an image photographed by the camera. The processing unit performs processing for acquiring information indicating a target machined width, processing for acquiring the image, processing for measuring a machined width on the acquired image, and processing for terminating the machining when the measured machined width equals or exceeds the target machined width.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01J 37/08 - Ion sources; Ion guns
  • H01J 37/09 - Diaphragms; Shields associated with electron- or ion-optical arrangements; Compensation of disturbing fields
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/244 - Detectors; Associated components or circuits therefor
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • H01L 21/66 - Testing or measuring during manufacture or treatment

53.

Mass Spectrometry Method and Information Processing Device

      
Application Number 17746064
Status Pending
Filing Date 2022-05-17
First Publication Date 2022-11-24
Owner JEOL Ltd. (Japan)
Inventor
  • Nagatomo, Kenji
  • Ubukata, Masaaki
  • Kubo, Ayumi

Abstract

A composition estimation target peak is selected from a mass spectrum of a sample, and a group of measured isotope peaks related to the composition estimation target peak is selected. A composition candidate for the sample is estimated based on the composition estimation target peak. A distribution of a theoretical isotope peak corresponding to the composition candidate is calculated. Presence or absence of an adduct ion or a desorbed ion in the sample is determined based on a first mass difference between isotopes in a distribution of the measured isotope peaks and a second mass difference between isotopes in the distribution of the theoretical isotope peak.

IPC Classes  ?

54.

NON-EVAPORABLE-GETTER COATING DEVICE, METHOD FOR MANUFACTURING NON-EVAPORABLE-GETTER-COATED CONTAINER/PIPE, AND NON-EVAPORABLE-GETTER-COATED CONTAINER/PIPE

      
Application Number JP2022020595
Publication Number 2022/244788
Status In Force
Filing Date 2022-05-17
Publication Date 2022-11-24
Owner
  • INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION (Japan)
  • JEOL LTD. (Japan)
Inventor
  • Tanimoto Yasunori
  • Okano Makoto

Abstract

The purpose of the present invention is to provide a non-evaporable-getter coating device capable of coating a non-evaporable getter on an inner surface of a vacuum container or a vacuum pipe of various shapes and standards when used by being attached thereto. Provided are: a non-evaporable-getter coating device characterized by including a sputtering target having an internal space, a permanent magnet column disposed in the internal space area of the sputtering target and formed from multiple permanent magnets disposed in series, with the directions of the magnetic fields thereof being alternately arranged, and a flange to which the sputtering target and the permanent magnet column are fixed, wherein the ratio (LM/EDM) of the length LM of the permanent magnet to the external diameter EDM of the permanent magnet is 1.0 to 4.0, and the ratio (EDM/EDN) of the external diameter EDM of the permanent magnet to the external diameter EDN of the sputtering target is 0.3 to 0.8; a method for manufacturing a non-evaporable-getter-coated container and/or a non-evaporable-getter-coated pipe; and the non-evaporable-getter-coated container and/or the non-evaporable-getter-coated pipe.

IPC Classes  ?

  • C23C 14/34 - Sputtering
  • F04B 37/02 - Pumps specially adapted for elastic fluids and having pertinent characteristics not provided for in, or of interest apart from, groups for evacuating by absorption or adsorption
  • F04B 37/16 - Means for nullifying unswept space

55.

Electron Microscope and Specimen Contamination Prevention Method

      
Application Number 17718976
Status Pending
Filing Date 2022-04-12
First Publication Date 2022-10-13
Owner JEOL Ltd. (Japan)
Inventor
  • Kaneko, Takeshi
  • Okoshi, Norihiro
  • Jimbo, Yu
  • Park, Sang Tae

Abstract

A contamination prevention irradiation device includes a generation unit and a mirror unit. The generation unit generates a laser beam. The mirror unit has a mirror surface for reflecting a laser beam. The laser beam reflected on the mirror surface is applied to a specimen disposed inside an objective lens. The laser beam is composed of a pulse train. Once a laser beam is applied to the specimen before observation of the specimen, deposition of contaminants on the specimen can be prevented for a predetermined subsequent period.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/244 - Detectors; Associated components or circuits therefor

56.

SLOW ATOMIC BEAM GENERATOR, PHYSICAL PACKAGE, PHYSICAL PACKAGE FOR OPTICAL GRID CLOCK, PHYSICAL PACKAGE FOR ATOMIC CLOCK, PHYSICAL PACKAGE FOR ATOMIC INTERFEROMETER, PHYSICAL PACKAGE FOR QUANTUM INFORMATION PROCESSING DEVICE, AND PHYSICAL PACKAGE SYSTEM

      
Application Number JP2022010404
Publication Number 2022/215424
Status In Force
Filing Date 2022-03-09
Publication Date 2022-10-13
Owner
  • JEOL LTD. (Japan)
  • RIKEN (Japan)
Inventor
  • Tsuji Shigenori
  • Takamoto Masao
  • Katori Hidetoshi

Abstract

A high-temperature tank (116) includes an optical window which transmits a laser (132) and is provided at one end, and a right-angle conical mirror (102) which is provided at the other end, has an opening (106) at the apex and which reflects laser light (132) incident from the optical window towards the one end in an area other than the opening (106). A magnetic field generator (112) generates a magnetic field in the region of intersection of the laser reflected by the right-angle conical mirror (102). A magnetic field gradient relaxation module (130) generates a relaxation magnetic field which relaxes the gradient of the magnetic field generated by the magnetic field generator (112).

IPC Classes  ?

  • H01S 1/06 - Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range gaseous
  • G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
  • H03L 7/26 - Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference

57.

Spectrum Analysis Apparatus and Database Creation Method

      
Application Number 17697236
Status Pending
Filing Date 2022-03-17
First Publication Date 2022-09-29
Owner JEOL Ltd. (Japan)
Inventor
  • Koshiya, Shogo
  • Murano, Takanori

Abstract

A plurality of records are registered in a database. Each record includes emission information and a peak energy sequence. A fitting unit fits, for each peak energy sequence, a calculated spectrum which is based on the peak energy sequence with respect to an actual spectrum which is acquired from a sample. An analyzer analyzes the sample based on the emission information correlated to the calculated spectrum satisfying a fitting condition.

IPC Classes  ?

  • G01N 23/2252 - Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]

58.

NMR Probe

      
Application Number 17693841
Status Pending
Filing Date 2022-03-14
First Publication Date 2022-09-22
Owner JEOL Ltd. (Japan)
Inventor
  • Nishiyama, Masahide
  • Endo, Yuki
  • Takahashi, Hiroki

Abstract

A direction shifting mechanism for changing a direction of a sample tube is installed on a path of the sample tube between a sample tube supporting unit for supporting, during an NMR measurement, the sample tube used for the NMR measurement and an insertion port through which the sample tube is inserted in and extracted from the sample tube supporting unit. The direction shifting mechanism has a shape which partially includes a form of an arc, and the shape is designed to cause the sample tube to change its direction in such a manner that the sample tube is turned toward the insertion port along the arc while being maintained in contact with at least two points on an inner wall of the direction shifting mechanism.

IPC Classes  ?

  • G01R 33/30 - Sample handling arrangements, e.g. sample cells, spinning mechanisms

59.

Three-Dimensional Powder Bed Fusion Additive Manufacturing Apparatus and Three-Dimensional Powder Bed Fusion Additive Manufacturing Method

      
Application Number 17693878
Status Pending
Filing Date 2022-03-14
First Publication Date 2022-09-22
Owner JEOL Ltd. (Japan)
Inventor
  • Kawakami, Masahiko
  • En, Shio
  • Miyakita, Ayumu
  • Kaneko, Yuhei

Abstract

A three-dimensional PBF-AM apparatus includes: a build plate on which a powder material is spread in layers; and a beam irradiation device which irradiates the powder material spread on the build plate with a beam. The beam irradiation device divides a build region of the powder material spread on the build plate into a plurality of lines and performs beam scanning to melt the powder material in the build region line by line, and performs dummy scanning to scan the beam in a state that does not cause melting of the powder material between an end of beam scanning of an M-th (M is a natural number) line and a start of beam scanning of an (M+1)th line.

IPC Classes  ?

  • B22F 12/49 - Scanners
  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
  • B22F 12/41 - Radiation means characterised by the type, e.g. laser or electron beam
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B23K 26/342 - Build-up welding
  • B23K 26/60 - Preliminary treatment

60.

X-Ray Spectrum Analysis Apparatus and Method

      
Application Number 17697202
Status Pending
Filing Date 2022-03-17
First Publication Date 2022-09-22
Owner
  • JEOL Ltd. (Japan)
  • TOHOKU UNIVERSITY (Japan)
Inventor
  • Murano, Takanori
  • Koshiya, Shogo
  • Terauchi, Masami

Abstract

A soft X-ray measurement device detects a characteristic X-ray emitted from a sample including a primary element and a secondary element. An X-ray spectrum generated by a spectrum generator includes a waveform of interest which is an intrinsic waveform of the primary element, caused by transition of electrons from a valence band to an inner shell in the primary element. A secondary element analyzer calculates quantitative information of the secondary element through analysis of the waveform of interest.

IPC Classes  ?

  • G01N 23/2252 - Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]

61.

Solid Phase Mixture, Packing Material, and Column

      
Application Number 17689389
Status Pending
Filing Date 2022-03-08
First Publication Date 2022-09-15
Owner JEOL Ltd. (Japan)
Inventor
  • Fukuzawa, Seketsu
  • Takahashi, Koji

Abstract

Provided is a solid phase mixture including an oxidizing agent and/or a salt of the oxidizing agent and solid phase particles. The oxidizing agent is a compound capable of selectively oxidizing 1,2-diol compounds. In addition, a packing material containing the solid phase mixture is provided. Further, a column packed with the packing material is provided.

IPC Classes  ?

  • B01J 20/14 - Diatomaceous earth
  • G01N 33/82 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving vitamins
  • B01J 20/285 - Porous sorbents based on polymers
  • B01J 20/283 - Porous sorbents based on silica
  • B01J 20/26 - Synthetic macromolecular compounds
  • B01J 20/06 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising oxides or hydroxides of metals not provided for in group
  • B01J 20/28 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
  • B01D 15/20 - Selective adsorption, e.g. chromatography characterised by constructional or operational features relating to the conditioning of the sorbent material

62.

Three-Dimensional Powder Bed Fusion Additive Manufacturing Apparatus and Three-Dimensional Powder Bed Fusion Additive Manufacturing Method

      
Application Number 17690298
Status Pending
Filing Date 2022-03-09
First Publication Date 2022-09-15
Owner JEOL Ltd. (Japan)
Inventor
  • Hisaki, Taku
  • Kitamura, Shinichi
  • Sato, Takashi
  • Miyakita, Ayumu
  • Koiwa, Kozo
  • Daino, Yohei
  • Kawakami, Masahiko
  • Tsutagawa, Nari

Abstract

A three-dimensional powder bed fusion additive manufacturing apparatus includes a powder application device that includes a squeegee and applies a powder material to a build plate to form a powder layer, a camera that photographs a manufactured surface of the powder layer, and a determination unit that determines whether powder application failure of the powder material has occurred using an image photographed by the camera while or immediately after the squeegee passes through the manufactured surface.

IPC Classes  ?

  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B22F 12/67 - Blades

63.

Three-Dimensional Powder Bed Fusion Additive Manufacturing Apparatus and Three-Dimensional Powder Bed Fusion Additive Manufacturing Method

      
Application Number 17690314
Status Pending
Filing Date 2022-03-09
First Publication Date 2022-09-15
Owner JEOL Ltd. (Japan)
Inventor
  • Hisaki, Taku
  • Kitamura, Shinichi
  • Sato, Takashi
  • Miyakita, Ayumu
  • Koiwa, Kozo
  • Daino, Yohei
  • Kawakami, Masahiko
  • Tsutagawa, Nari

Abstract

A three-dimensional powder bed fusion additive manufacturing apparatus includes a determination unit that determines presence or absence of powder scattering in a second preheating step using at least a third image that is an image of a powder layer photographed by a camera after the second preheating step among a first image that is an image of the powder layer photographed by the camera after a first preheating step, a second image that is an image of the powder layer photographed by the camera after the powder application step, and the third image.

IPC Classes  ?

  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
  • B22F 10/37 - Process control of powder bed aspects, e.g. density
  • B22F 12/30 - Platforms or substrates
  • B22F 12/13 - Auxiliary heating means to preheat the material
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

64.

Sample Milling Apparatus and Method of Adjustment Therefor

      
Application Number 17683538
Status Pending
Filing Date 2022-03-01
First Publication Date 2022-09-08
Owner JEOL Ltd. (Japan)
Inventor Kozuka, Munehiro

Abstract

A sample milling apparatus includes an ion source, a swinging mechanism for swinging a sample, a positioning camera for bringing a target milling position on the sample into coincidence with the impact point of an ion beam, and a display section for displaying an image captured by the positioning camera. The adjustment method starts with observing the trace of the impinging ion beam left on the sample with the positioning camera while the position of the positioning camera is held relative to the swing axis of the swinging mechanism and capturing an observation image. Then, a display image to be displayed on the display section is extracted from the observation image based on the position of the trace, thus bringing the beam impact point and the position of the field of view of the display image into coincidence.

IPC Classes  ?

  • H01J 37/304 - Controlling tubes by information coming from the objects, e.g. correction signals
  • H01J 37/31 - Electron-beam or ion-beam tubes for localised treatment of objects for cutting or drilling
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

65.

Specimen Machining Device and Specimen Machining Method

      
Application Number 17679303
Status Pending
Filing Date 2022-02-24
First Publication Date 2022-09-01
Owner JEOL Ltd. (Japan)
Inventor
  • Kataoka, Shogo
  • Todoroki, Koji

Abstract

A specimen machining device includes an ion source which irradiates a specimen with an ion beam, a first rotating body (specimen holder) that holds the specimen and is rotatable about a first axis serving as a rotation axis, and a second rotating body on which the first rotating body is disposed and which is rotatable about a second axis serving as a rotation axis different from the first axis. The specimen machining device irradiates the specimen with the ion beam while moving the specimen by the rotation of the first rotating body and the rotation of the second rotating body.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/30 - Electron-beam or ion-beam tubes for localised treatment of objects

66.

ATOM BEAM GENERATION DEVICE, PHYSICAL PACKAGE, OPTICAL LATTICE CLOCK PHYSICAL PACKAGE, ATOMIC CLOCK PHYSICAL PACKAGE, ATOMIC INTERFEROMETER PHYSICAL PACKAGE, QUANTUM INFORMATION PROCESSING DEVICE PHYSICAL PACKAGE, AND PHYSICAL PACKAGE SYSTEM

      
Application Number JP2022005302
Publication Number 2022/176765
Status In Force
Filing Date 2022-02-10
Publication Date 2022-08-25
Owner
  • JEOL LTD. (Japan)
  • RIKEN (Japan)
Inventor
  • Tsuji Shigenori
  • Takamoto Masao
  • Katori Hidetoshi

Abstract

An atomic oven (40) includes a cartridge (200) and a main body (220). The cartridge (200) includes: a holder (202) that accommodates an atom source; and a capillary nozzle (204). The main body (220) includes: a housing (226) in which the cartridge (200) is installed; a button heater (228); an access opening (222a) for removing the cartridge (200) from the main body (220) and placing the cartridge into the main body (220), the access opening (222a) being provided on the atmosphere side, which is outside the main body (220); and a passage from the access opening (222a) to the housing (226). The cartridge (200) is inserted into the main body (220) through the access opening (222a) and is installed in the housing (226). The atom source is heated by the button heater (228), whereby atomic gas generated from the atom source is emitted as an atom beam to the vacuum side, which is outside the main body (220).

IPC Classes  ?

  • G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
  • H01S 1/06 - Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range gaseous

67.

Method of Measuring Relative Rotational Angle and Scanning Transmission Electron Microscope

      
Application Number 17669503
Status Pending
Filing Date 2022-02-11
First Publication Date 2022-08-18
Owner JEOL Ltd. (Japan)
Inventor Nakamura, Akiho

Abstract

A method of measuring a relative rotational angle includes: shifting an electron beam on a specimen plane by using a deflector; tilting the electron beam with respect to the specimen plane by using the deflector; acquiring a first STEM image including information of a scattering azimuth angle and a second STEM image not including the information of the scattering azimuth angle, before the shifting and the tilting; acquiring a third STEM image including the information of the scattering azimuth angle and a fourth STEM image not including the information of the scattering azimuth angle, after the shifting and the tilting; and obtaining the relative rotational angle based on the first STEM image, the second STEM image, the third STEM image and the fourth STEM image.

IPC Classes  ?

  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path

68.

Estimation Model Generation Method and Electron Microscope

      
Application Number 17671896
Status Pending
Filing Date 2022-02-15
First Publication Date 2022-08-18
Owner JEOL Ltd. (Japan)
Inventor
  • Sagawa, Ryusuke
  • Morishita, Shigeyuki
  • Uematsu, Fuminori
  • Nakamichi, Tomohiro
  • Aibara, Keito

Abstract

An aberration value estimator has a learned estimation model for estimating an aberration value set based on a Ronchigram. In a machine learning sub-system, a simulation is repeatedly executed while changing a simulation condition, and calculated Ronchigrams are generated in a wide variety and in a large number. By machine learning using the calculated Ronchigrams, the learned estimation model is generated.

IPC Classes  ?

  • H01J 37/153 - Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes

69.

ECZ Luminous

      
Application Number 1677561
Status Registered
Filing Date 2022-06-15
Registration Date 2022-06-15
Owner JEOL Ltd. (Japan)
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Measuring and testing machines and instruments; spectrometers; nuclear magnetic resonance spectrometers not for medical use.

70.

Analyzer and image processing method

      
Application Number 17591803
Grant Number 11733188
Status In Force
Filing Date 2022-02-03
First Publication Date 2022-08-04
Grant Date 2023-08-22
Owner JEOL Ltd. (Japan)
Inventor
  • Tsukamoto, Kazunori
  • Honda, Shigeru

Abstract

In an analyzer, an image processing unit performs processing of: dividing a measurement image into a plurality of partial measurement images, and dividing a reference image into a plurality of partial reference images; calculating a positional deviation amount of each of the partial measurement images relative to a corresponding partial reference image among the partial reference images; determining whether the positional deviation amount is a threshold or less; and correcting positional deviation of the measurement image based on the positional deviation amounts of the plurality of partial measurement images when the image processing unit has determined that the positional deviation amount is not the threshold or less.

IPC Classes  ?

  • G01N 23/2252 - Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
  • H01J 37/22 - Optical or photographic arrangements associated with the tube

71.

Ion Beam Processing Apparatus and Method for Controlling Operation Thereof

      
Application Number 17583464
Status Pending
Filing Date 2022-01-25
First Publication Date 2022-07-28
Owner JEOL Ltd. (Japan)
Inventor
  • Kimura, Tatsuhito
  • Kozuka, Munehiro

Abstract

At timing t0, a brake gas (raw material gas) starts to be supplied to an ion beam generator, and the brake gas is fed into a turbo molecular pump. After timing t1, a vent valve is opened intermittently to feed atmospheric air into the turbo molecular pump. The brake gas may be different from the raw material gas. The brake gas is supplied using a gas supply system.

IPC Classes  ?

72.

Method of measuring aberration and electron microscope

      
Application Number 17576016
Grant Number 11764029
Status In Force
Filing Date 2022-01-14
First Publication Date 2022-07-21
Grant Date 2023-09-19
Owner JEOL Ltd. (Japan)
Inventor
  • Morishita, Shigeyuki
  • Sagawa, Ryusuke
  • Uematsu, Fuminori
  • Nakamichi, Tomohiro
  • Aibara, Keito

Abstract

A method of measuring an aberration in an electron microscope includes: acquiring an image for measuring the aberration in the electron microscope; and measuring the aberration by using the image. In measuring the aberration, a direction of defocusing is specified based on a residual aberration that is uniquely determined by a configuration of an optical system of the electron microscope and an optical condition of the optical system.

IPC Classes  ?

  • H01J 37/153 - Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
  • H01J 37/10 - Lenses
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes

73.

Sample holder and charged particle beam system

      
Application Number 17570719
Grant Number 11640895
Status In Force
Filing Date 2022-01-07
First Publication Date 2022-07-14
Grant Date 2023-05-02
Owner JEOL Ltd. (Japan)
Inventor
  • Yuasa, Shuichi
  • Kawamura, Takahisa

Abstract

There is provided a sample holder capable of reducing positional deviation of a cartridge in the heightwise direction of a sample. The sample holder includes the cartridge and a holder base having a mounting portion for the cartridge. The mounting portion includes a placement surface, a first tilted surface, and a rotary drive mechanism for imparting a rotary force to the cartridge. The cartridge includes an opposing first tilted surface opposite to the first tilted surface of the mounting portion. As the rotary drive mechanism imparts the rotary force to the cartridge, the first tilted surface of the cartridge is pressed against the first tilted surface of the mounting portion, whereby the cartridge is pressed against the placement surface.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/18 - Vacuum locks

74.

Charged particle beam system

      
Application Number 17570749
Grant Number 11631569
Status In Force
Filing Date 2022-01-07
First Publication Date 2022-07-14
Grant Date 2023-04-18
Owner JEOL Ltd. (Japan)
Inventor Yuasa, Shuichi

Abstract

Provided is a charged particle beam system capable of reducing the force applied to a sample when a chuck device grips the sample. The charged particle beam system is typified by an electron microscope including a sample chamber, a sample exchange chamber connected to the sample chamber, a sample container capable of being removably attached in the sample exchange chamber, and a transport device for transporting the sample between the sample container and the sample exchange chamber. The transport device includes the chuck device for gripping the sample, a drive mechanism for moving the chuck device in a given direction, a mechanical driver for actuating the chuck device, and a power transmission mechanism for transmitting power of the mechanical driver to the chuck device. The power transmission mechanism includes a shaft and a resilient member that elastically deforms when a force in the given direction is applied to the shaft.

IPC Classes  ?

  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes
  • H01J 37/18 - Vacuum locks
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

75.

Transport Device and Charged Particle Beam System

      
Application Number 17570775
Status Pending
Filing Date 2022-01-07
First Publication Date 2022-07-14
Owner JEOL Ltd. (Japan)
Inventor Yuasa, Shuichi

Abstract

There is provided a transport device capable of reducing drifting of a sample. The transport device delivers a cartridge to a sample holder in a charged particle beam system. The transport device has a mounting portion to which the cartridge can be detachably mounted, a shaft portion providing support of the mounting portion, a resilient member connecting together the shaft portion and the mounting portion, and a drive mechanism for moving the mounting portion.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

76.

Sample Holder and Charged Particle Beam System

      
Application Number 17570802
Status Pending
Filing Date 2022-01-07
First Publication Date 2022-07-14
Owner JEOL Ltd. (Japan)
Inventor Yuasa, Shuichi

Abstract

There is provided a sample holder which is for use in a charged particle beam system and which can prevent damage to a sample stage during transportation of a cartridge. The sample holder includes: the cartridge having the sample stage for holding a sample therein; and a holder base having a mounting portion to which the cartridge can be mounted. The cartridge has: a tilt mechanism for tilting the sample stage; and a lock lever which, when the cartridge has been taken out from the mounting portion, makes contact with the sample stage and limits tilt of the stage.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

77.

Specimen Pretreatment Method

      
Application Number 17550002
Status Pending
Filing Date 2021-12-14
First Publication Date 2022-07-07
Owner JEOL Ltd. (Japan)
Inventor
  • Konyuba, Yuji
  • Haruta, Tomohiro
  • Ikeda, Yuta
  • Fukuda, Tomohisa

Abstract

A specimen pretreatment method for transferring a specimen supported by a first specimen supporting tool to a second specimen supporting tool, the specimen pretreatment method including: transferring a specimen supported by the first specimen supporting tool to a film; immersing the film and the specimen on the film in a liquid to dissolve the film; and recovering the specimen from the liquid and supporting the specimen with the second specimen supporting tool.

IPC Classes  ?

  • G01N 1/28 - Preparing specimens for investigation

78.

Three-Dimensional Powder Bed Fusion Additive Manufacturing Apparatus

      
Application Number 17570015
Status Pending
Filing Date 2022-01-06
First Publication Date 2022-07-07
Owner JEOL Ltd. (Japan)
Inventor Shimizu, Takayuki

Abstract

Provided is a three-dimensional powder bed fusion additive manufacturing apparatus which includes a chamber provided inside with a stage for forming a three-dimensional build object, a window provided in the chamber for observation of the inside of the chamber, and a shutter arranged inside the chamber to open and close the window.

IPC Classes  ?

  • B22F 12/00 - Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/00 - Data acquisition or data processing for additive manufacturing
  • B22F 10/80 - Data acquisition or data processing

79.

Charged Particle Beam Apparatus

      
Application Number 17570043
Status Pending
Filing Date 2022-01-06
First Publication Date 2022-07-07
Owner JEOL Ltd. (Japan)
Inventor
  • Yagi, Kazuki
  • Toriumi, Yusuke

Abstract

A charged particle beam apparatus includes a tilt mechanism that tilts a specimen, a detector that detects an electromagnetic wave emitted from the specimen, a table storage unit that stores a table in which tilt angle information on a tilt angle of the specimen and detection solid-angle information on the detection solid angle of the detector are associated with each other, a tilt control unit that controls the tilt mechanism, and a detection-solid-angle information acquisition unit that acquires the tilt angle information from the tilt control unit and acquires the detection solid-angle information with reference to the table.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/244 - Detectors; Associated components or circuits therefor
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes

80.

Sample loading method and charged particle beam apparatus

      
Application Number 17570077
Grant Number 11705303
Status In Force
Filing Date 2022-01-06
First Publication Date 2022-07-07
Grant Date 2023-07-18
Owner JEOL Ltd. (Japan)
Inventor
  • Naganuma, Tomoyuki
  • Fujimoto, Naoki
  • Kaneko, Takeshi

Abstract

Provided is a sample loading method of loading a cooled sample into a sample exchange chamber of a charged particle beam apparatus includes: attaching the sample container in which a sample and liquid nitrogen are accommodated to the sample exchange chamber via a gate valve; evacuating a space between a liquid surface of the liquid nitrogen and the gate valve in a state in which the gate valve is closed; discharging the liquid nitrogen in the sample container after the space between the liquid surface of the liquid nitrogen and the gate valve has been evacuated; evacuating a space in the sample container after the liquid nitrogen in the sample container has been discharged; and opening the gate valve after the space in the sample container has been evacuated.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes

81.

Compound, derivatization reagent, and method for synthesizing compound

      
Application Number 17557751
Grant Number 11718590
Status In Force
Filing Date 2021-12-21
First Publication Date 2022-06-30
Grant Date 2023-08-08
Owner
  • TOKYO UNIVERSITY OF SCIENCE FOUNDATION (Japan)
  • JEOL Ltd. (Japan)
Inventor
  • Higashi, Tatsuya
  • Ogawa, Shoujiro
  • Takiwaki, Masaki
  • Fukuzawa, Seketsu

Abstract

A compound represented by Chemical formula 1: wherein n is an integer of 2 or more, is provided. Also provided is a derivatization reagent for derivatizing a diene-containing compound, including a compound represented by Chemical formula 1. Further provided is a synthesis method for a compound, including a nucleophilic substitution reaction between an aryl halide and a heterocyclic amine compound being saturated, the compound being represented by Chemical formula 1.

IPC Classes  ?

82.

Charged particle beam apparatus

      
Application Number 17551384
Grant Number 11651936
Status In Force
Filing Date 2021-12-15
First Publication Date 2022-06-16
Grant Date 2023-05-16
Owner JEOL Ltd. (Japan)
Inventor
  • Fujimoto, Naoki
  • Chiyo, Izuru

Abstract

A charged particle beam apparatus includes: a specimen chamber; a specimen holder that is disposed in the specimen chamber; a specimen exchange chamber that is connected to the specimen chamber; a transporting mechanism that transports a specimen between the specimen chamber and the specimen exchange chamber; a first temperature sensor that measures a temperature of the specimen holder; a second temperature sensor that measures a temperature of the transporting mechanism; and a control unit. The control unit: calculates a temperature difference between the specimen holder and the transporting mechanism based on the temperature of the specimen holder and the temperature of the transporting mechanism when the control unit has received an instruction to transport a specimen; determining whether the temperature difference is a threshold or more; and stopping transportation of a specimen when the control unit has determined that the temperature difference is the threshold or more.

IPC Classes  ?

  • H01J 37/244 - Detectors; Associated components or circuits therefor
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

83.

ECZ LUMINOUS

      
Serial Number 79347257
Status Pending
Filing Date 2022-06-15
Owner JEOL Ltd. (Japan)
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Measuring and testing equipment for analysis of molecular structure and dynamics; Scientific apparatus, namely, spectrometers; Scientific apparatus, namely, nuclear magnetic resonance spectrometers not for medical use

84.

X-ray detection apparatus and method

      
Application Number 17534865
Grant Number 11699567
Status In Force
Filing Date 2021-11-24
First Publication Date 2022-06-02
Grant Date 2023-07-11
Owner JEOL Ltd. (Japan)
Inventor Murano, Takanori

Abstract

A mask member is provided at an entrance opening of a mirror unit. Of a first diffraction grating and a second diffraction grating, when the second diffraction grating is used, the mask member masks preceding mirrors. With this process, aberration caused by reflective X-ray is suppressed. When the first diffraction grating is used, the mask member does not function. Alternatively, the mask member and another mask member may be selectively used.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/244 - Detectors; Associated components or circuits therefor

85.

Transmission electron microscope and method of adjusting optical system

      
Application Number 17536288
Grant Number 11742176
Status In Force
Filing Date 2021-11-29
First Publication Date 2022-06-02
Grant Date 2023-08-29
Owner JEOL Ltd. (Japan)
Inventor
  • Yagi, Kazuki
  • Oyama, Yoshiki

Abstract

A transmission electron microscope includes a control unit that: determines an excitation amount of a second illumination system lens based on an excitation amount of first illumination system lens such that the second illumination system lens satisfies a first optical condition; and determines a control amount of a first deflector and a control amount of a second deflector based on the excitation amount of the second illumination system lens such that the first deflector and the second deflector satisfy a second optical condition. The first optical condition is for a convergence angle of the electron beam to be constant even if the excitation amount of the first illumination system lens has changed, and the second optical condition is for an illuminating position of the electron beam and an illuminating angle of the electron beam to be constant even if the excitation amount of the first illumination system lens has changed.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/10 - Lenses
  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes
  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path

86.

SLOW ATOMIC BEAM GENERATOR, PHYSICAL PACKAGE, PHYSICAL PACKAGE FOR OPTICAL GRID CLOCK, PHYSICAL PACKAGE FOR ATOMIC CLOCK, PHYSICAL PACKAGE FOR ATOMIC INTERFEROMETER, PHYSICAL PACKAGE FOR QUANTUM INFORMATION PROCESSING DEVICE, AND PHYSICAL PACKAGE SYSTEM

      
Application Number JP2021041036
Publication Number 2022/113717
Status In Force
Filing Date 2021-11-08
Publication Date 2022-06-02
Owner
  • JEOL LTD. (Japan)
  • RIKEN (Japan)
Inventor
  • Tsuji Shigenori
  • Takamoto Masao
  • Katori Hidetoshi

Abstract

By heating a high-temperature tank (116) with a heater (108), atomic gas is generated in the high-temperature tank (116) from an atomic source. A magneto-optical trap is realized by a laser beam (130) reflected by a right-angled conical mirror (102) and a magnetic field formed by a magnetic field generator (112), and the atomic gas is captured by using the magneto-optical trap and cooled. The captured and cooled atoms are output from an opening (106) to the outside of a slow atom beam generator (100) by a laser beam (132), which is a push laser beam. A slow atomic beam is thereby formed.

IPC Classes  ?

  • G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
  • H01S 1/06 - Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range gaseous
  • H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range

87.

Charged particle beam device and analysis method

      
Application Number 17586949
Grant Number 11710615
Status In Force
Filing Date 2022-01-28
First Publication Date 2022-05-19
Grant Date 2023-07-25
Owner JEOL Ltd. (Japan)
Inventor
  • Tsutsumi, Kenichi
  • Uchida, Tatsuya

Abstract

A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

IPC Classes  ?

  • H01J 37/244 - Detectors; Associated components or circuits therefor
  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path
  • H01J 37/24 - Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams

88.

X-Ray Measurement Apparatus and X-Ray Measurement Method

      
Application Number 17518612
Status Pending
Filing Date 2021-11-04
First Publication Date 2022-05-12
Owner JEOL Ltd. (Japan)
Inventor
  • Murano, Takanori
  • Uematsu, Fuminori

Abstract

In a preliminary measurement, spectrums obtained by detecting characteristic X-rays emitted from preliminary measurement points are transmitted to a spectrum processing unit via a noise filter unit. In a main measurement, a spectrum obtained by detecting characteristic X-rays emitted from a main measurement point is transmitted to the spectrum processing unit by bypassing the noise filter unit. The noise filter unit includes a machine learning type filter constituted of a CNN or the like. In a learning process, teacher data are generated using artificially-generated noise.

IPC Classes  ?

  • G01N 23/223 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
  • G06N 3/08 - Learning methods

89.

Apparatus and method for processing mass spectrum

      
Application Number 17509381
Grant Number 11721535
Status In Force
Filing Date 2021-10-25
First Publication Date 2022-04-28
Grant Date 2023-08-08
Owner JEOL Ltd. (Japan)
Inventor Kubo, Ayumi

Abstract

An extraction section extracts a basic pattern of chemical noise included in a mass spectrum. A generation section generates pseudo chemical noise as a connected body of a plurality of pseudo fragments generated by intensity correction of the basic pattern. A removal section removes the pseudo chemical noise from the mass spectrum.

IPC Classes  ?

  • H01J 49/00 - Particle spectrometers or separator tubes
  • H01J 49/16 - Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission

90.

Coordinate Linking System and Coordinate Linking Method

      
Application Number 17500038
Status Pending
Filing Date 2021-10-13
First Publication Date 2022-04-21
Owner JEOL Ltd. (Japan)
Inventor
  • Oohori, Yuichiro
  • Mizuno, Noriaki
  • Suzuki, Osamu

Abstract

An observation coordinate in the device coordinate system of an observation device is converted into an observation coordinate in a virtual coordinate system, using a conversion formula. Subsequently, the observation coordinate in the virtual coordinate system is converted into an observation coordinate in the device coordinate system of another observation device, using a reverse conversion formula. The virtual coordinate system is a logical coordinate system that does not depend on any device coordinate system.

IPC Classes  ?

  • G06T 7/33 - Determination of transform parameters for the alignment of images, i.e. image registration using feature-based methods
  • G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods
  • G06T 1/00 - General purpose image data processing
  • G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]

91.

Mass Spectrum Processing Apparatus and Method

      
Application Number 17503682
Status Pending
Filing Date 2021-10-18
First Publication Date 2022-04-21
Owner JEOL Ltd. (Japan)
Inventor Satoh, Takaya

Abstract

A first peak list is generated based on a mass spectrum of a first polymer sample, and a second peak list is generated based on a mass spectrum of a second polymer sample. Based on the first peak list and the second peak list, a numerical value array (a differential value array, a ratio array) showing a difference between the peak lists is calculated. Based on the numerical value array and a correlated m/z array corresponding to the numerical value array, a KMD plot and an RKM plot are generated as a difference plot.

IPC Classes  ?

  • H01J 49/00 - Particle spectrometers or separator tubes

92.

Mass Spectrum Processing Apparatus and Method

      
Application Number 17488434
Status Pending
Filing Date 2021-09-29
First Publication Date 2022-04-14
Owner JEOL Ltd. (Japan)
Inventor Tanaka, Hirokazu

Abstract

A first trend chart and a second trend chart are displayed along with a chromatogram. The first trend chart is generated based on a plurality of first representative value arrays obtained from a plurality of mass spectra. The second trend chart is generated based on a plurality of second representative value arrays obtained from the plurality of mass spectra. A mass spectrum stable period is determined based on the first trend chart and the second trend chart.

IPC Classes  ?

93.

Apparatus and Method for Processing Mass Spectrum

      
Application Number 17472791
Status Pending
Filing Date 2021-09-13
First Publication Date 2022-03-17
Owner JEOL Ltd. (Japan)
Inventor
  • Kubo, Ayumi
  • Ubukata, Masaaki

Abstract

An evaluation section identifies, in a list of candidate compounds, a group of candidate compounds having the degree of reverse similarity greater than or equal to a threshold s1. When all candidates in the group of candidate compounds have differences between the degrees of similarity that are greater than or equal to a threshold s2, the evaluation section judges that there is a composite state. The difference between the degrees of similarity is computed by subtracting the degree of forward similarity from the degree of reverse similarity. The similarity ratio may be used in place of the difference between the degrees of similarity.

IPC Classes  ?

94.

Charged particle beam device

      
Application Number 17472816
Grant Number 11676796
Status In Force
Filing Date 2021-09-13
First Publication Date 2022-03-17
Grant Date 2023-06-13
Owner JEOL Ltd. (Japan)
Inventor
  • Yagi, Kazuki
  • Jimbo, Yu
  • Reed, Bryan W.
  • Bloom, Ruth Shewmon

Abstract

A charged particle beam device including: a charged particle beam source which emits a charged particle beam; a blanking device which has an electrostatic deflector that deflects and blocks the charged particle beam; an irradiation optical system which irradiates a specimen with the charged particle beam; and a control unit which controls the electrostatic deflector, the control unit performing processing of: acquiring a target value of a dose of the charged particle beam for the specimen; setting a ratio A/B of a time A during which the charged particle beam is not blocked to a unit time B (where A≠B, A≠0), based on the target value; and operating the electrostatic deflector based on the ratio.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path
  • H01J 37/244 - Detectors; Associated components or circuits therefor

95.

Three-Dimensional Powder Bed Fusion Additive Manufacturing Apparatus and Three-Dimensional Powder Bed Fusion Additive Manufacturing Method

      
Application Number 17476790
Status Pending
Filing Date 2021-09-16
First Publication Date 2022-03-17
Owner JEOL Ltd. (Japan)
Inventor
  • Kitamura, Shinichi
  • Tsutagawa, Nari

Abstract

A three-dimensional powder bed fusion additive manufacturing apparatus includes a storage unit that stores first correspondence information that is correspondence information between an amount of thermal electrons emitted from a build surface and temperature of the build surface, a beam generating unit that irradiates the build surface with a beam, a thermal electron detecting unit that detects thermal electrons emitted from the build surface during irradiation of the beam, and a build surface temperature calculating unit that calculates the temperature of the build surface with reference to the first correspondence information on the basis of the thermal electrons detected by the thermal electron detecting unit.

IPC Classes  ?

  • B22F 10/368 - Temperature or temperature gradient, e.g. temperature of the melt pool
  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B22F 12/41 - Radiation means characterised by the type, e.g. laser or electron beam
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

96.

Charged particle beam drawing device and method of controlling charged particle beam drawing device

      
Application Number 17400580
Grant Number 11694875
Status In Force
Filing Date 2021-08-12
First Publication Date 2022-02-17
Grant Date 2023-07-04
Owner JEOL Ltd. (Japan)
Inventor Iwanaga, Masakazu

Abstract

A charged particle beam drawing device includes: a storage unit that stores a pattern generation program for generating pattern data, the pattern generation program being a program in which an instruction for specifying a type of a figure and an instruction for specifying a regular arrangement of the figure are described; an execution unit that executes the pattern generation program stored in the storage unit; and a control unit that performs drawing control based on the pattern data generated by the executed pattern generation program.

IPC Classes  ?

  • H01J 37/302 - Controlling tubes by external information, e.g. programme control
  • G06F 3/0482 - Interaction with lists of selectable items, e.g. menus
  • G06F 3/04847 - Interaction techniques to control parameter settings, e.g. interaction with sliders or dials

97.

Ion milling apparatus and sample holder

      
Application Number 17400550
Grant Number 11562886
Status In Force
Filing Date 2021-08-12
First Publication Date 2022-02-17
Grant Date 2023-01-24
Owner JEOL Ltd. (Japan)
Inventor
  • Kataoka, Shogo
  • Mino, Tatsuro
  • Todoroki, Koji

Abstract

An ion milling apparatus has: a sample holder including a shield member for shielding the sample except for a portion to be milled; and a sample locking member cooperating with the shield member such that the sample is sandwiched and held therebetween. The shield member has an edge portion that determines a milling position on or in the sample. The sample locking member is disposed downstream of the edge portion in the direction of irradiation by the ion beam and has a support portion cooperating with the edge portion to support the milled portion therebetween. The support portion has a first surface making contact with the sample and a second surface making a given angle to the first surface. The given angle is equal to or less than 90°.

IPC Classes  ?

  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • G01N 1/32 - Polishing; Etching

98.

Automatic Analyzer, Cool Box, and Pouch

      
Application Number 17389653
Status Pending
Filing Date 2021-07-30
First Publication Date 2022-02-10
Owner JEOL Ltd. (Japan)
Inventor
  • Yaginuma, Takashi
  • Ishikawa, Kiyohiro
  • Yamanaka, Yusuke

Abstract

There is provided a cool box for use in an automatic analyzer. The cool box has a box body and an air circulator. The box body has a receiving space capable of accommodating therein receptacles for analytes or reagents. The circulator has an intake portion, a fan, and an exhaust portion and operates to circulate air in the receiving space by rotation of the fan. The circulator further includes an inhibitor removing agent retaining portion on which a pouch is set. The pouch contains an analysis inhibitor removing agent for removing components (analysis inhibitor) which adversely affect or inhibit analysis of the analytes.

IPC Classes  ?

  • G01N 1/42 - Low-temperature sample treatment, e.g. cryofixation
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 1/34 - Purifying; Cleaning
  • B01L 3/00 - Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
  • B01L 7/00 - Heating or cooling apparatus; Heat insulating devices

99.

Charged particle beam device and method for controlling sample stage

      
Application Number 17381598
Grant Number 11495432
Status In Force
Filing Date 2021-07-21
First Publication Date 2022-02-03
Grant Date 2022-11-08
Owner JEOL Ltd. (Japan)
Inventor
  • Maekawa, Daichi
  • Sakurai, Hitoshi

Abstract

In a charged particle beam device, a control unit performs processing for: operating a deflector based on movement information to move a visual field of a deflector from a first visual field to a second visual field; capturing the sample image with the second visual field to obtain a reference image; operating the deflector to move the visual field from the second visual field to the first visual field; operating the sample stage based on the movement information to move the visual field from the first visual field to a third visual field; capturing the sample image with the third visual field to obtain a comparison image; calculating a positional deviation amount between the reference image and the comparison image; determining whether the positional deviation amount is equal to or less than a designated positional deviation amount; and operating the sample stage based on the positional deviation amount.

IPC Classes  ?

  • H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes
  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01J 37/244 - Detectors; Associated components or circuits therefor

100.

Charged particle beam apparatus and setting assisting method

      
Application Number 17380113
Grant Number 11682539
Status In Force
Filing Date 2021-07-20
First Publication Date 2022-01-27
Grant Date 2023-06-20
Owner JEOL Ltd. (Japan)
Inventor
  • Watakabe, Kazutaka
  • Kuwahara, Hirofumi
  • Miyahara, Takenori
  • Sakata, Takahide
  • Timischl, Felix

Abstract

An average mass, an average density, and an average atomic number for a plurality of elements which form a specimen are calculated. A characteristic X-ray generation depth is calculated based on the average values and a minimum excitation energy of an element of interest. When an illumination condition is set, a reference image including a figure indicating a characteristic X-ray generation range, a numerical value indicating the characteristic X-ray generation depth, or the like, is displayed.

IPC Classes  ?

  • H01J 37/244 - Detectors; Associated components or circuits therefor
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