Agc, Inc.

Japan

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B60J 1/00 - Windows; Windscreens; Accessories therefor 156
C03C 27/12 - Laminated glass 136
B32B 27/30 - Layered products essentially comprising synthetic resin comprising acrylic resin 115
C03C 21/00 - Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals into the surface 110
C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces 95
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1.

METHOD FOR EXTRACTING FLUORINE-CONTAINING ETHER COMPOUND

      
Application Number JP2023036912
Publication Number 2024/080314
Status In Force
Filing Date 2023-10-11
Publication Date 2024-04-18
Owner AGC INC. (Japan)
Inventor Iwase Takuya

Abstract

The present invention provides a method for extracting a fluorine-containing ether compound, the method being capable of efficiently extracting a desired fluorine-containing ether compound. This method for extracting a fluorine-containing ether compound extracts a first component from a composition with use of an organic solvent that does not contain a fluorine atom, the composition containing the first component, which is composed of at least one fluorine-containing ether compound that is selected from the group consisting of a compound represented by formula (A1), a compound represented by formula (A2) and a compound represented by formula (A3), and a second component which is composed of at least one fluorine-containing ether compound that is selected from the group consisting of a compound represented by formula (B1) and a compound represented by formula (B2).

IPC Classes  ?

  • C08G 65/46 - Post-polymerisation treatment, e.g. recovery, purification, drying

2.

COMPOSITION, BASE MATERIAL WITH SURFACE LAYER, AND METHOD FOR PRODUCING BASE MATERIAL WITH SURFACE LAYER

      
Application Number JP2023036909
Publication Number 2024/080313
Status In Force
Filing Date 2023-10-11
Publication Date 2024-04-18
Owner AGC INC. (Japan)
Inventor
  • Iwase Takuya
  • Ono Hikaru
  • Aoyama Motoshi

Abstract

The present invention provides: a composition which is capable of forming a surface layer that has excellent wear resistance; a base material with a surface layer; and a method for producing a base material with a surface layer. This composition contains: a first component which is composed of at least one fluorine-containing ether compound that is selected from the group consisting of a compound represented by formula (A1), a compound represented by formula (A2) and a compound represented by formula (A3); and a second component which is composed of at least one fluorine-containing ether compound that is selected from the group consisting of a compound represented by formula (B1) and a compound represented by formula (B2).

IPC Classes  ?

  • C08L 71/00 - Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
  • C08G 65/336 - Polymers modified by chemical after-treatment with organic compounds containing silicon
  • C09D 171/02 - Polyalkylene oxides
  • C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

3.

SURFACE TREATMENT AGENT, ARTICLE, AND PRODUCTION METHOD FOR ARTICLE

      
Application Number JP2023036908
Publication Number 2024/080312
Status In Force
Filing Date 2023-10-11
Publication Date 2024-04-18
Owner AGC INC. (Japan)
Inventor
  • Watanabe Koki
  • Aoyama Motoshi

Abstract

Provided are a surface treatment agent that makes it possible to form a surface layer that has excellent frictional durability, an article that has a surface layer that has excellent frictional durability, and a production method for the article. This surface treatment agent includes: at least one fluorine-containing ether compound selected from the group that consists of compounds represented by formula (A1), compounds represented by formula (A2), and compounds represented by formula (A3); and an organic solvent that does not include fluorine atoms.

IPC Classes  ?

  • C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
  • C08L 71/00 - Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
  • C09D 171/02 - Polyalkylene oxides
  • C23C 14/24 - Vacuum evaporation

4.

WATER-BASED COMPOSITION, AND METHOD FOR PRODUCING LAMINATE USING WATER-BASED COMPOSITION

      
Application Number JP2023035174
Publication Number 2024/075610
Status In Force
Filing Date 2023-09-27
Publication Date 2024-04-11
Owner AGC INC. (Japan)
Inventor Fujioka Osamu

Abstract

Provided is a water-based composition which contains a tetrafluoroethylene-based polymer, is capable of forming a shaped article having excellent properties including heat resistance and electrical properties (low coefficient of linear expansion, low permittivity, low dielectric loss tangent, and low transmission loss), also having uniformity in film thickness and chemical composition, and also having excellent laser processability, and has excellent handling properties and re-dispersibility after long-term storage. The water-based composition comprises particles of a tetrafluoroethylene-based polymer, a polyamic acid, a water-soluble polyol and water, in which the content of the particles of the tetrafluoroethylene-based polymer is 30% by mass or more.

IPC Classes  ?

  • C08L 27/18 - Homopolymers or copolymers of tetrafluoroethene
  • B32B 15/04 - Layered products essentially comprising metal comprising metal as the main or only constituent of a layer, next to another layer of a specific substance
  • C08L 1/26 - Cellulose ethers
  • C08L 29/04 - Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08L 83/06 - Polysiloxanes containing silicon bound to oxygen-containing groups

5.

LAMINATE

      
Application Number JP2023035192
Publication Number 2024/075611
Status In Force
Filing Date 2023-09-27
Publication Date 2024-04-11
Owner AGC INC. (Japan)
Inventor
  • Urano Seiya
  • Ochi Shuhei

Abstract

Provided is a laminate which has excellent water resistance, the top layer of which also has excellent adhesiveness. A laminate according to the present invention has a concrete substrate, a primer layer, a reinforcement layer, and a fluorine atom-containing top layer in the stated order, wherein: the primer layer contains a component selected from the group consisting of urethane resins and epoxy-resin cured products; the reinforcement layer contains a resin selected from the group consisting of urea resins, urethane resins, and urethane urea resins; and the fluorine atom content in the top layer is more than 5 mass% but not more than 55 mass%.

IPC Classes  ?

  • B32B 13/12 - Layered products essentially comprising a water-setting substance, e.g. concrete, plaster, asbestos cement, or like builders' material comprising such substances as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
  • B32B 27/30 - Layered products essentially comprising synthetic resin comprising acrylic resin
  • B32B 27/38 - Layered products essentially comprising synthetic resin comprising epoxy resins
  • B32B 27/40 - Layered products essentially comprising synthetic resin comprising polyurethanes

6.

POLISHING AGENT, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR COMPONENT

      
Application Number JP2023034460
Publication Number 2024/075546
Status In Force
Filing Date 2023-09-22
Publication Date 2024-04-11
Owner AGC INC. (Japan)
Inventor
  • Nozawa Yasuhisa
  • Otsuka Yuya
  • Kato Tomoo

Abstract

Provided is a polishing agent, a polishing method, and a method for manufacturing a semiconductor component that exhibit a good polishing speed in CMP of a surface to be polished, said surface including boron-doped silicon. The polishing agent according to the present invention is for polishing a surface to be polished, said surface including boron-doped silicon, the polishing agent including abrasive grain, an oxidant, and water, the oxidant including at least one type that is selected from a peroxide oxidant, a metal ion oxidant, and a halogen oxo acid ion oxidant.

IPC Classes  ?

  • H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting
  • B24B 37/00 - Lapping machines or devices; Accessories
  • C09G 1/02 - Polishing compositions containing abrasives or grinding agents
  • C09K 3/14 - Anti-slip materials; Abrasives

7.

AQUEOUS DISPERSION

      
Application Number JP2023035169
Publication Number 2024/075609
Status In Force
Filing Date 2023-09-27
Publication Date 2024-04-11
Owner AGC INC. (Japan)
Inventor
  • Fujioka Osamu
  • Ito Aya
  • Yuki Sota

Abstract

Provided is a tetrafluoroethylene polymer-containing aqueous dispersion that exhibits an excellent dispersion stability and handling properties and that enables the formation of molded products having an excellent surface appearance and excellent physical properties, e.g., heat resistance and electrical characteristics (low linear expansion coefficient, low dielectric constant, and low dielectric loss tangent). This aqueous dispersion contains: particles of a tetrafluoroethylene polymer; at least one water-soluble polymer having a polar functional group and selected from the group consisting of vinyl alcohol polymers, acrylic polymers, polyvinylpyrrolidones, polypyrroles, polythiophenes, polyethylene oxides, polyethyleneimines, and cellulose ethers; and water. The cation concentration in the aqueous dispersion of at least one selected from the group consisting of alkali metal ions and alkaline-earth metal ions is 0.1-1,000 ppm.

IPC Classes  ?

  • C08L 27/18 - Homopolymers or copolymers of tetrafluoroethene
  • B32B 27/30 - Layered products essentially comprising synthetic resin comprising acrylic resin
  • C08L 1/26 - Cellulose ethers
  • C08L 29/04 - Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids

8.

COATING COMPOSITION AND COATED ARTICLE

      
Application Number JP2023035198
Publication Number 2024/075612
Status In Force
Filing Date 2023-09-27
Publication Date 2024-04-11
Owner AGC INC. (Japan)
Inventor
  • Urano Seiya
  • Ochi Shuhei

Abstract

Provided are a coating composition that has an excellent film-forming property in a low-temperature environment and can form a coating film having excellent adhesiveness to concrete materials, and a coated article. The coating composition of the present invention contains a fluoropolymer, a (meth)acrylic polymer, and water, wherein the particle size of the (meth)acrylic polymer in the coating composition is 150 nm or more, the glass transition temperature of the (meth)acrylic polymer is 40°C or less, the minimum film formation temperature of both the fluoropolymer and the (meth)acrylic polymer is 50°C or less, the absolute value of the difference between the minimum film formation temperature of the fluoropolymer and the minimum film formation temperature of the (meth)acrylic polymer is 20°C or less, and the absolute value of the difference between the particle size of the fluoropolymer and the particle size of the (meth)acrylic polymer is 35 nm or less. Furthermore, the minimum film formation temperature of the fluoropolymer may be 60°C or less.

IPC Classes  ?

  • C09D 127/12 - Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
  • C09D 5/00 - Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
  • C09D 133/00 - Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, a; Coating compositions based on derivatives of such polymers

9.

VIRUS VECTOR PRODUCTION METHOD EMPLOYING CELL

      
Application Number JP2023036412
Publication Number 2024/075819
Status In Force
Filing Date 2023-10-05
Publication Date 2024-04-11
Owner AGC INC. (Japan)
Inventor
  • Shiina, Shunsuke
  • Hasegawa, Junichi
  • Sugimoto, Tori
  • Kawano, Yasuhiro
  • Shimizu, Keita

Abstract

The purpose of the present invention is to provide, in virus vector production, a method for efficiently producing a virus vector having a high infectious titer. Provided is a virus vector production method including a step for culturing virus vector-producing cells at 30.0-35.9ºC, and, here, with the method according to the present invention that is characterized in that said virus vector-producing cells are cultured at a temperature of 36.0-38.0ºC before starting a virus vector production step, it is possible to very efficiently produce a virus vector having a high infectious titer.

IPC Classes  ?

  • C12N 15/86 - Viral vectors
  • C12N 7/00 - Viruses, e.g. bacteriophages; Compositions thereof; Preparation or purification thereof
  • C12N 15/864 - Parvoviral vectors

10.

FLUORINATED POLYMER COMPOSITION FOR PAINTING MATERIALS

      
Application Number JP2023031824
Publication Number 2024/070475
Status In Force
Filing Date 2023-08-31
Publication Date 2024-04-04
Owner AGC INC. (Japan)
Inventor
  • Hara Yuji
  • Otsugu Satoshi
  • Ebata Shiro
  • Matsumoto Mitsuhisa
  • Masuda Sho

Abstract

Provided is a fluorinated polymer composition for painting materials, which is prevented from discoloration after the bearing of water and storage, and, when a painting material is produced by mixing the fluorinated polymer composition with a solvent for painting materials, a coating film formed using the painting material has excellent levering properties. The fluorinated polymer composition for painting materials according to the present invention comprises a fluorinated polymer containing a unit derived from a fluoroolefin and a unit derived from a monomer having no fluorine atom, cyclohexanone, and a solvent that is different from cyclohexanone, in which the total amount of cyclohexanone and the solvent is 10% by mass or more relative to the whole mass of the fluorinated polymer composition for painting materials and the content of cyclohexanone is 0.5 to 2.0% by mass relative to the whole mass of the fluorinated polymer composition for painting materials.

IPC Classes  ?

  • C09D 127/14 - Homopolymers or copolymers of vinyl fluoride

11.

GLASS DIAPHRAGM MODULE

      
Application Number JP2023032824
Publication Number 2024/070584
Status In Force
Filing Date 2023-09-08
Publication Date 2024-04-04
Owner AGC INC. (Japan)
Inventor
  • Sakurai, Kento
  • Akiyama, Jun

Abstract

12211 ≥ 10.

IPC Classes  ?

  • B60R 11/02 - Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof
  • H04R 7/02 - Diaphragms for electromechanical transducers; Cones characterised by the construction
  • H04R 7/04 - Plane diaphragms
  • H04R 7/22 - Clamping rim of diaphragm or cone against seating
  • E06B 7/28 - Other arrangements on doors or windows, e.g. door-plates, windows adapted to carry plants, hooks for window cleaners
  • B60J 1/00 - Windows; Windscreens; Accessories therefor
  • B60J 5/10 - Doors arranged at the vehicle rear

12.

GLASS DIAPHRAGM EQUIPPED WITH VIBRATOR, CONTROL SYSTEM FOR GLASS DIAPHRAGM EQUIPPED WITH VIBRATOR, AND CONTROL PROGRAM FOR GLASS DIAPHRAGM EQUIPPED WITH VIBRATOR

      
Application Number JP2023033157
Publication Number 2024/070656
Status In Force
Filing Date 2023-09-12
Publication Date 2024-04-04
Owner AGC INC. (Japan)
Inventor
  • Sakurai, Kento
  • Akiyama, Jun

Abstract

This glass diaphragm equipped with a vibrator has a glass plate structure, and first and second vibrators that are attached to the glass plate structure, the glass diaphragm satisfying the expression 3≤|F1(0)−F2(0)|≤100 [Hz], where F1(0) [Hz] is the lowest resonance frequency of the first vibrator, and F2(0) [Hz] is the lowest resonance frequency of the second vibrator.

IPC Classes  ?

  • H04R 7/04 - Plane diaphragms
  • B06B 1/04 - Processes or apparatus for generating mechanical vibrations of infrasonic, sonic or ultrasonic frequency making use of electrical energy operating with electromagnetism
  • B60R 11/02 - Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof
  • H04R 1/00 - LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS - Details of transducers
  • H04R 1/02 - Casings; Cabinets; Mountings therein
  • H04R 3/00 - Circuits for transducers
  • H04R 7/02 - Diaphragms for electromechanical transducers; Cones characterised by the construction

13.

REFLECTING PANEL, ELECTROMAGNETIC WAVE REFLECTING DEVICE USING SAME, ELECTROMAGNETIC WAVE REFLECTING FENCE, AND PRODUCTION METHOD FOR REFLECTING PANEL

      
Application Number JP2023031165
Publication Number 2024/070407
Status In Force
Filing Date 2023-08-29
Publication Date 2024-04-04
Owner AGC INC. (Japan)
Inventor
  • Ueki, Shinji
  • Kambara, Kumiko

Abstract

Provided is a reflecting panel in which at least one of reflection efficiency and reflection direction accuracy is improved. The reflecting panel comprises a first substrate, a second substrate, and an intermediate layer that is provided between the first substrate and the second substrate and is obtained by laminating a first intermediate film, a second intermediate film, and a third intermediate film in the stated order. An interface between the first intermediate film and the second intermediate film, or an interface between the second intermediate film and the third intermediate film is a reflecting surface that reflects electromagnetic waves of 1-300 GHz. When the average thickness of the first intermediate film is d1, and the average thickness of the third intermediate film is d2, the reflecting panel satisfies the expression 0.5 < d1/d2 < 1.5.

IPC Classes  ?

  • H01Q 15/14 - Reflecting surfaces; Equivalent structures

14.

REFLECTIVE PANEL, ELECTROMAGNETIC-WAVE REFLECTION DEVICE USING SAME, ELECTROMAGNETIC-WAVE REFLECTION FENCE, AND METHOD FOR MANUFACTURING REFLECTIVE PANEL

      
Application Number JP2023031572
Publication Number 2024/070455
Status In Force
Filing Date 2023-08-30
Publication Date 2024-04-04
Owner AGC INC. (Japan)
Inventor
  • Ueki, Shinji
  • Kambara, Kumiko

Abstract

Provided is a reflective panel in which at least one of the reflection efficiency and the reflection direction accuracy is improved while maintaining transparency. The reflective panel has a first substrate, a second substrate, and a reflective layer disposed between the first substrate and the second substrate. The first substrate and the second substrate are insulating substrates that are transparent to visible light and electromagnetic waves in a range of 1-300 GHz. The interface between the first substrate and the reflective layer or the interface between the second substrate and the reflective layer is a reflective surface that reflects electromagnetic waves in a prescribed frequency band included in the abovementioned range, and the reflective layer is a resin layer that contains a prescribed amount of a metal nanostructure.

IPC Classes  ?

  • H01Q 15/14 - Reflecting surfaces; Equivalent structures

15.

METHOD FOR PRODUCING CHLOROTRIFLUOROETHYLENE AND TRIFLUOROETHYLENE

      
Application Number JP2023030282
Publication Number 2024/062827
Status In Force
Filing Date 2023-08-23
Publication Date 2024-03-28
Owner AGC INC. (Japan)
Inventor Kasuga, Kenya

Abstract

A production method that reacts 1,1,2-trichloro-1,2,2-trifluoroethane with hydrogen in the gas phase in the presence of a diluent and produces chlorotrifluoroethylene and trifluoroethylene, wherein the volume of the diluent supplied to the reactor where the reaction is carried out is 0.4-6 times the volume of the 1,1,2-trichloro-1,2,2-trifluoroethane.

IPC Classes  ?

  • C07C 17/23 - Preparation of halogenated hydrocarbons by dehalogenation
  • C07C 21/18 - Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine

16.

GLASS FRIT, AND METHOD FOR MANUFACTURING GLASS FRIT

      
Application Number JP2023032809
Publication Number 2024/062944
Status In Force
Filing Date 2023-09-08
Publication Date 2024-03-28
Owner AGC INC. (Japan)
Inventor
  • Suzuki, Miyuri
  • Yamada, Kohta
  • Teratani, Takuya
  • Ito, Kazuhiro

Abstract

Provided is a glass frit having: lithium (Li), element M, phosphorus (P) and oxygen (O); and at least one among boron (B) and silicon (Si), wherein the element M comprises at least one selected from the group consisting of zirconium (Zr), hafnium (Hf), tin (Sn), samarium (Sm), niobium (Nb), tantalum (Ta), tungsten (W), and molybdenum (Mo), and the glass frit includes a seed crystal.

IPC Classes  ?

  • C03C 8/08 - Frit compositions, i.e. in a powdered or comminuted form containing phosphorus

17.

CRYSTALLIZED GLASS AND METHOD FOR MANUFACTURING CRYSTALLIZED GLASS

      
Application Number JP2023032810
Publication Number 2024/062945
Status In Force
Filing Date 2023-09-08
Publication Date 2024-03-28
Owner AGC INC. (Japan)
Inventor
  • Suzuki, Miyuri
  • Yamada, Kohta
  • Ito, Kazuhiro
  • Teratani, Takuya

Abstract

A crystallized glass comprising: lithium (Li), element M, phosphorus (P), and oxygen (O); and at least one selected from boron (B) and silicon (Si), wherein the element M includes at least one selected from the group consisting of zirconium (Zr), hafnium (Hf), tin (Sn), samarium (Sm), niobium (Nb), tantalum (Ta), tungsten (W), and molybdenum (Mo), the maximum peak, in an X-ray diffraction pattern of the crystallized glass, appearing in a range of 2θ=20° to 30° is derived from a monoclinic crystal structure, and the half width of the maximum peak is 0.10° or more.

IPC Classes  ?

  • C03C 10/04 - Silicate or polysilicate crystalline phase, e.g. mullite, diopside, sphene, plagioclase
  • H01B 1/06 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
  • H01M 10/052 - Li-accumulators
  • H01M 10/0562 - Solid materials
  • H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers

18.

FLUOROOLEFIN PRODUCTION METHOD

      
Application Number JP2023023430
Publication Number 2024/057657
Status In Force
Filing Date 2023-06-23
Publication Date 2024-03-21
Owner AGC INC. (Japan)
Inventor
  • Yamada, Taku
  • Iwasaki, Hikaru
  • Okamoto, Hidekazu
  • Otsuka, Tetsuo

Abstract

This fluoroolefin production method involves a step of producing a fluoroolefin given by formula (2) by bringing a fluorocarbon given by formula (1) into contact with a catalyst, wherein the catalyst contains α-alumina and the average pore diameter of the catalyst is 5 nm or more. (1) CX1X2F-CX3X4H (2) CX1X2=CX3X4In formulae (1) and (2), each of X1, X2, X3, and X4independently represents the hydrogen atom or the fluorine atom, and at least one of X1, X2, X3, and X4 is the fluorine atom.

IPC Classes  ?

  • C07C 17/25 - Preparation of halogenated hydrocarbons by splitting-off hydrogen halides from halogenated hydrocarbons
  • B01J 21/04 - Alumina
  • B01J 35/10 - Solids characterised by their surface properties or porosity
  • C07C 21/18 - Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine
  • C07B 61/00 - Other general methods

19.

VEHICLE WINDOW GLASS

      
Application Number JP2023031127
Publication Number 2024/057908
Status In Force
Filing Date 2023-08-29
Publication Date 2024-03-21
Owner AGC INC. (Japan)
Inventor
  • Kaneko, Satoshi
  • Shoji, Hideaki
  • Takeuchi, Shoichi
  • Nobuoka, Kiyoshi

Abstract

Provided is a vehicle window glass with which it is possible to achieve both good transmittance of radio waves and uniform heat distribution. A vehicle window glass includes: a laminated glass that has a first glass plate, a second glass plate, and an interlayer film, and that is provided in an opening of a vehicle body; an upper-side bus bar that is provided along the upper side of the laminated glass between a second main surface and a third main surface; a lower-side bus bar that is provided along the lower side of the laminated glass between the second main surface and the third main surface; and a heating unit that is provided between the second main surface and the third main surface and is connected between the upper-side bus bar and the lower-side bus bar. The laminated glass has a first region where a communication unit is located in the width direction of the vehicle body, and a second region other than the first region. The heating unit has a first hot wire that is provided in the first region and is connected between the upper-side bus bar and the lower-side bus bar, and a second hot wire that is provided in the second region and is connected between the upper-side bus bar and the lower-side bus bar. A first pitch of the first hot wire in the width direction of the vehicle body is wider than a second pitch of the second hot wire in the width direction of the vehicle body.

IPC Classes  ?

  • B60S 1/02 - Cleaning windscreens, windows, or optical devices
  • B32B 17/10 - Layered products essentially comprising sheet glass, or fibres of glass, slag or the like comprising glass as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
  • B60J 1/00 - Windows; Windscreens; Accessories therefor
  • C03C 27/12 - Laminated glass
  • H05B 3/86 - Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields the heating conductors being embedded in the transparent or reflecting material

20.

SOLID POLYMER ELECTROLYTE MEMBRANE, MEMBRANE ELECTRODE ASSEMBLY, METHOD FOR PRODUCING MEMBRANE ELECTRODE ASSEMBLY, AND WATER ELECTROLYSIS DEVICE

      
Application Number JP2023033211
Publication Number 2024/058177
Status In Force
Filing Date 2023-09-12
Publication Date 2024-03-21
Owner AGC INC. (Japan)
Inventor
  • Hayabe Shintaro
  • Okuyama Takumi
  • Sumikura Kosuke

Abstract

The problem addressed by the present invention is to provide a solid polymer electrolyte membrane having low gas permeability and excellent chemical durability, a membrane electrode assembly, a method for producing a membrane electrode assembly, and a water electrolysis device. The solid polymer electrolyte membrane of the present invention comprises a fluorine-containing polymer having ion-exchange groups, a platinum-containing material, cerium oxide, and a woven fabric.

IPC Classes  ?

  • C25B 13/08 - Diaphragms; Spacing elements characterised by the material based on organic materials
  • C25B 1/04 - Hydrogen or oxygen by electrolysis of water
  • C25B 9/00 - Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
  • C25B 9/23 - Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms comprising ion-exchange membranes in or on which electrode material is embedded
  • C25B 9/65 - Means for supplying current; Electrode connections; Electric inter-cell connections
  • C25B 11/052 - Electrodes comprising one or more electrocatalytic coatings on a substrate
  • C25B 11/056 - Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of textile or non-woven fabric
  • C25B 11/065 - Carbon
  • C25B 13/04 - Diaphragms; Spacing elements characterised by the material
  • H01B 1/06 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances

21.

GLASS VIBRATION PLATE AND EXCITER-EQUIPPED GLASS VIBRATION PLATE

      
Application Number JP2023030933
Publication Number 2024/057893
Status In Force
Filing Date 2023-08-28
Publication Date 2024-03-21
Owner AGC INC. (Japan)
Inventor
  • Sakurai, Kento
  • Akiyama, Jun

Abstract

MM of which is equal to or greater than 1 × 107 [Pa]; and a connection part 24 that is provided on the opposite side of the mount part 22 to the glass plate structure 12 and on which an exciter 26 for vibrating the glass plate structure 12 is installed. A curvature-shaped excitation area 30 opposed to the mount part 22 is provided in the main surface on the one side of the glass plate structure 12. The surface of the mount part 22 on the adhesive layer 20 side is fixed to the glass plate structure 12 via the adhesive layer 20.

IPC Classes  ?

  • H04R 1/00 - LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS - Details of transducers
  • B60J 1/00 - Windows; Windscreens; Accessories therefor
  • H04R 1/02 - Casings; Cabinets; Mountings therein
  • H04R 7/04 - Plane diaphragms

22.

METHOD FOR PRODUCING POLYETHER POLYOL, METHOD FOR PRODUCING POLYETHER POLYOL HAVING REACTIVE SILICON GROUP, AND POLYETHER POLYOL

      
Application Number JP2023032165
Publication Number 2024/057984
Status In Force
Filing Date 2023-09-04
Publication Date 2024-03-21
Owner AGC INC. (Japan)
Inventor
  • Takeda Hajime
  • Liu Xuhui
  • Ito Takashi
  • Sunayama Yoshitaka
  • Arai Takeaki

Abstract

This method for producing a polyether polyol produces a polyether polyol by reacting a cyclic ether with an initiator which has a melting point of 150°C or less, while comprising 8 or more functional groups in the presence of a catalyst.

IPC Classes  ?

  • C08G 65/26 - Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds
  • C08G 65/336 - Polymers modified by chemical after-treatment with organic compounds containing silicon

23.

ANTENNA DEVICE AND ANTENNA UNIT

      
Application Number JP2023033117
Publication Number 2024/058152
Status In Force
Filing Date 2023-09-12
Publication Date 2024-03-21
Owner AGC INC. (Japan)
Inventor
  • Ikuma Yoshiyuki
  • Sonoda Ryuta
  • Higashida Yasushi

Abstract

The purpose of the present invention is to enable usage in a quasi-millimeter wave band or a millimeter wave band, and to make window glass less susceptible to breaking even when an antenna device is installed facing the window glass.  This antenna device is connected to a digital control unit with a plurality of wirings including first wirings and second wirings interposed, and comprises an array antenna, an analog beamformer, a frequency upconverter, and a frequency downconverter. The intermediate frequency signal that is inputted to the frequency upconverter is inputted from the digital control unit to the antenna device via the first wiring, the intermediate frequency signal that is outputted from the frequency down converter is outputted to the digital control unit via the second wiring, and a control signal that controls the analog beamformer is inputted from the digital control unit to the antenna device.

IPC Classes  ?

  • H01Q 1/24 - Supports; Mounting means by structural association with other equipment or articles with receiving set
  • H01Q 1/12 - Supports; Mounting means
  • H01Q 21/06 - Arrays of individually energised antenna units similarly polarised and spaced apart
  • H04B 7/06 - Diversity systems; Multi-antenna systems, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station
  • H04B 7/08 - Diversity systems; Multi-antenna systems, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the receiving station

24.

SOLID POLYMER ELECTROLYTE MEMBRANE, MEMBRANE ELECTRODE ASSEMBLY, MEMBRANE ELECTRODE ASSEMBLY PRODUCTION METHOD, AND WATER ELECTROLYSIS APPARATUS

      
Application Number JP2023033198
Publication Number 2024/058172
Status In Force
Filing Date 2023-09-12
Publication Date 2024-03-21
Owner AGC INC. (Japan)
Inventor
  • Hayabe Shintaro
  • Okuyama Takumi
  • Sumikura Kosuke

Abstract

The present invention addresses the problem of providing: a solid polymer electrolyte membrane that has excellent low gas permeability and excellent chemical durability; a membrane electrode assembly; a membrane electrode assembly production method; and a water electrolysis apparatus. The solid polymer electrolyte membrane according to the present invention includes a fluorine-containing polymer with an ion exchange group, a platinum containing material, cerium, and a woven fabric, wherein cerium is present in the form of ions and/or salts in the solid polymer electrolyte membrane.

IPC Classes  ?

  • H01B 1/06 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
  • C25B 11/052 - Electrodes comprising one or more electrocatalytic coatings on a substrate
  • C25B 11/056 - Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of textile or non-woven fabric
  • C25B 13/08 - Diaphragms; Spacing elements characterised by the material based on organic materials
  • C25B 9/00 - Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
  • C25B 9/23 - Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms comprising ion-exchange membranes in or on which electrode material is embedded
  • C25B 1/04 - Hydrogen or oxygen by electrolysis of water

25.

AQUEOUS DISPERSION AND METHOD FOR PRODUCING LAYERED PRODUCT USING AQUEOUS DISPERSION

      
Application Number JP2023031807
Publication Number 2024/053553
Status In Force
Filing Date 2023-08-31
Publication Date 2024-03-14
Owner AGC INC. (Japan)
Inventor
  • Kasai Wataru
  • Sekikawa Kenta
  • Ito Aya
  • Yuki Sota
  • Fujioka Osamu

Abstract

Provided is an aqueous dispersion containing a tetrafluoroethylene-based polymer, the aqueous dispersion being capable of giving shaped objects excellent in terms of properties such as heat resistance and electrical properties (low coefficient of linear expansion, low permittivity, and low dielectric loss tangent) and of evenness in film thickness and composition, and being excellent in terms of dispersion stability and handleability and having reduced unevenness in composition. The aqueous dispersion comprises particles of a tetrafluoroethylene-based polymer, an alkaline electrolyte, a surfactant, an acidic resin, and water and has a pH in the range of 6-10, a zeta potential less than -30 mV, and an electron conductivity of 0.01-0.2 mS/cm.

IPC Classes  ?

  • C08L 27/18 - Homopolymers or copolymers of tetrafluoroethene
  • B32B 27/30 - Layered products essentially comprising synthetic resin comprising acrylic resin
  • C08K 3/28 - Nitrogen-containing compounds
  • C08K 5/17 - Amines; Quaternary ammonium compounds
  • C08L 1/26 - Cellulose ethers
  • C08L 29/04 - Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
  • C08L 77/00 - Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
  • C08L 79/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08L 101/02 - Compositions of unspecified macromolecular compounds characterised by the presence of specified groups

26.

REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, AND REFLECTIVE MASK MANUFACTURING METHOD

      
Application Number JP2023032335
Publication Number 2024/053634
Status In Force
Filing Date 2023-09-05
Publication Date 2024-03-14
Owner AGC INC. (Japan)
Inventor
  • Akagi, Daijiro
  • Okato, Takeshi
  • Iwaoka, Hiroaki

Abstract

This reflective mask blank comprises a substrate, a multilayer reflective film that reflects EUV light, a protective film that protects the multilayer reflective film, and a phase shift film that shifts the phase of the EUV light in this order, wherein the phase shift film comprises an Os-based material containing 35 atom% or more of Os, a refractive index n with respect to the EUV light is 0.940 or less, and an extinction coefficient k is 0.025 or more.

IPC Classes  ?

  • G03F 1/24 - Reflection masks; Preparation thereof
  • G03F 1/32 - Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

27.

WALL SURFACE STRUCTURE

      
Application Number JP2023032521
Publication Number 2024/053670
Status In Force
Filing Date 2023-09-06
Publication Date 2024-03-14
Owner AGC INC. (Japan)
Inventor
  • Yamamoto Kohei
  • Sato Hiroshi
  • Moriki Shinya
  • Nagae Haruka

Abstract

Provided is a technique for preventing damage or loss of a panel, and preventing displacement of the panel. This wall surface structure comprises a panel provided vertically, an upper frame that supports the upper edge of the panel, a lower frame that supports the lower edge of the panel, a rail that supports the upper frame and/or the lower frame so as to be slidable in the horizontal direction, and an attachment tool for attaching the rail to a wall surface material. When the wall surface material is viewed from the front thereof, a plurality of the wall surface materials are disposed in a matrix shape in the vertical direction and the horizontal direction, and attached to the skeleton so as to be swingable individually. A plurality of the rails are provided at intervals in the vertical direction, and each support the upper frame and/or the lower frame so as to be slidable in the horizontal direction. The wall surface structure further comprises a stopper that restricts only one of the upper edge and the lower edge of the panel from sliding with respect to the rail.

IPC Classes  ?

  • E04F 13/08 - Coverings or linings, e.g. for walls or ceilings composed of covering or lining elements; Sub-structures therefor; Fastening means therefor composed of a plurality of similar covering or lining elements
  • H02S 20/22 - Supporting structures directly fixed to an immovable object specially adapted for buildings
  • H02S 20/30 - Supporting structures being movable or adjustable, e.g. for angle adjustment

28.

NUCLEIC ACID FOR TRANSFECTION

      
Application Number JP2023032763
Publication Number 2024/053720
Status In Force
Filing Date 2023-09-07
Publication Date 2024-03-14
Owner
  • AGC INC. (Japan)
  • THE UNIVERSITY OF TOKYO (Japan)
Inventor
  • Okazoe Takashi
  • Okamoto Akimitsu
  • Morihiro Kunihiko
  • Kohata Ai

Abstract

The present invention provides: a nucleic acid for transfection, the nucleic acid having excellent cell membrane permeability; and a method for producing the same. The present invention relates to a nucleic acid for transfection, in which: a nucleic acid, which is to be introduced into a cell, and a cell membrane permeable group are joined; and the cell membrane permeable group has a structure represented by any one of general formulas (A1) to (A4). (In the formulas: R0is a C1-30 alkyl group which may have an ether-binding oxygen atom between carbon atoms and which may be substituted by one or more fluorine atoms; n11, n12, n13, and n14 are, each independently, integers of 1 or more; B is a nucleic acid base; RFE is a C1-10 perfluoroalkyl group which may have an ether-binding oxygen atom between carbon atoms; na is an integer of 1-10; and black dots indicate bonds.)

IPC Classes  ?

  • C12N 15/11 - DNA or RNA fragments; Modified forms thereof
  • A61K 31/713 - Double-stranded nucleic acids or oligonucleotides
  • A61K 47/54 - Medicinal preparations characterised by the non-active ingredients used, e.g. carriers or inert additives; Targeting or modifying agents chemically bound to the active ingredient the non-active ingredient being chemically bound to the active ingredient, e.g. polymer-drug conjugates the non-active ingredient being a modifying agent the modifying agent being an organic compound
  • A61K 48/00 - Medicinal preparations containing genetic material which is inserted into cells of the living body to treat genetic diseases; Gene therapy
  • A61P 35/00 - Antineoplastic agents
  • C07H 21/02 - Compounds containing two or more mononucleotide units having separate phosphate or polyphosphate groups linked by saccharide radicals of nucleoside groups, e.g. nucleic acids with ribosyl as saccharide radical
  • C07H 21/04 - Compounds containing two or more mononucleotide units having separate phosphate or polyphosphate groups linked by saccharide radicals of nucleoside groups, e.g. nucleic acids with deoxyribosyl as saccharide radical
  • C12N 15/113 - Non-coding nucleic acids modulating the expression of genes, e.g. antisense oligonucleotides
  • C12N 15/87 - Introduction of foreign genetic material using processes not otherwise provided for, e.g. co-transformation

29.

POLISHING AGENT, ADDITIVE SOLUTION FOR POLISHING AGENTS AND POLISHING METHOD

      
Application Number JP2023030140
Publication Number 2024/053390
Status In Force
Filing Date 2023-08-22
Publication Date 2024-03-14
Owner AGC INC. (Japan)
Inventor
  • Nakashima Hideki
  • Kato Tomoo
  • Akaji Masatoshi
  • Okamura Yuzo
  • Iwamoto Hiroaki

Abstract

The present invention provides: a polishing agent which is capable of polishing a surface to be polished, the surface containing a resin, highly flat at a high rate; an additive solution for polishing agents; and a polishing method. This polishing agent is used for the purpose of polishing a surface to be polished, the surface containing a resin, and contains abrasive grains, a water-soluble nitrogen-containing compound and water; and the water-soluble nitrogen-containing compound contains a compound represented by one of formulae (1) to (3) or a salt thereof. (The symbols are as defined in the description.)

IPC Classes  ?

  • C09K 3/14 - Anti-slip materials; Abrasives
  • B24B 37/00 - Lapping machines or devices; Accessories
  • B24B 37/015 - Temperature control
  • B24B 53/017 - Devices or means for dressing, cleaning or otherwise conditioning lapping tools
  • C09G 1/02 - Polishing compositions containing abrasives or grinding agents
  • H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting

30.

LIQUID COMPOSITION AND METHOD FOR PRODUCING LAMINATE USING LIQUID COMPOSITION

      
Application Number JP2023031818
Publication Number 2024/053554
Status In Force
Filing Date 2023-08-31
Publication Date 2024-03-14
Owner AGC INC. (Japan)
Inventor
  • Nakamitsu Minami
  • Fujioka Osamu

Abstract

Provided is a liquid composition comprising: tetrafluoroethylene polymer particles; at least one compound selected from among compounds (1)-(3) and having no fluorine atom; and a non-aqueous solvent. Compound (1) is a silicone-modified (meth)acrylate polymer having a polyorganosiloxane group and a C6-40 monovalent hydrocarbon group. Compound (2) is a (meth)acrylate polymer having a C6-40 monovalent hydrocarbon group and at least one nitrogen atom-containing group selected from the group consisting of amino groups, ammonium groups, amide groups, and carbamate groups. Compound (3) is a carboxylic acid ester having a hydroxy group, with an amine value of 20-120 mg/KOH.

IPC Classes  ?

  • C08L 27/18 - Homopolymers or copolymers of tetrafluoroethene
  • B32B 27/00 - Layered products essentially comprising synthetic resin
  • B32B 27/20 - Layered products essentially comprising synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
  • B32B 27/30 - Layered products essentially comprising synthetic resin comprising acrylic resin
  • C08K 5/10 - Esters; Ether-esters
  • C08L 33/04 - Homopolymers or copolymers of esters
  • C08L 33/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
  • C08L 79/02 - Polyamines

31.

MULTIPLE GLAZING, PRODUCTION METHOD THEREFOR, AND SEALING MATERIAL FOR MULTIPLE GLAZING

      
Application Number JP2023029580
Publication Number 2024/048279
Status In Force
Filing Date 2023-08-16
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor Shibuya Takashi

Abstract

The present invention improves molding speed and the precision of corner-portion molding and improve production efficiency and production stability. A multiple glazing of the present invention comprises two or more glass plates disposed opposite each other and separated by a spacer so as to form a space layer therebetween. The spacer comprises a thermoplastic resin composition having a 25°C JIS A hardness of 10-90. The thermoplastic resin composition comprises butyl-based rubbers, a crystalline polyolefin, a desiccant, and an inorganic filler, wherein the proportion of the crystalline polyolefin to the sum of the butyl-based rubbers and the crystalline polyolefin is 2-12 wt% and the proportion of the crystalline polyolefin to the whole thermoplastic resin composition is 1-5 wt%. The butyl-based rubbers comprise two or more butyl-based rubbers differing in molecular weight. The butyl-based rubbers have a number-average molecular weight of 45,000-60,000. The butyl-based rubbers have a weight-average molecular weight of 200,000-225,000. The butyl-based rubbers have a ratio of the weight-average molecular weight to the number-average molecular weight of 4.0-5.0.

IPC Classes  ?

  • C03C 27/06 - Joining glass to glass by processes other than fusing
  • C09K 3/10 - Materials not provided for elsewhere for sealing or packing joints or covers
  • E06B 3/663 - Elements for spacing panes

32.

ADHESIVE LAYER-EQUIPPED FUNCTIONAL FILM FOR LAMINATED GLASS AND LAMINATED GLASS

      
Application Number JP2023029972
Publication Number 2024/048344
Status In Force
Filing Date 2023-08-21
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor
  • Yokote Tatsuo
  • Kawakami Remi
  • Mitsui Yoko
  • Komori Atsushi

Abstract

Provided is an adhesive layer-equipped functional film for laminated glass that makes possible the production of laminated glass configured to suppress the generation of wrinkles and interference fringe. The adhesive layer-equipped functional film for laminated glass comprises a functional film, a first adhesive layer provided on one surface of the functional film and a second adhesive layer provided on the other surface of the functional film. When the adhesive layer-equipped functional film for laminated glass is used in a laminated glass, T1, which is the thickness of the first adhesive layer, is at least 2 μm but less than 380 μm, and T2, which is the thickness of the second adhesive layer, is at least 380 μm but no more than 760 μm, and the total of T1 and T2 is 760 μm or more. The functional film has a resin layer. The phase difference of the resin layer in the thickness direction measured at a wavelength of 543 nm is 100 nm or less.

IPC Classes  ?

  • C03C 27/12 - Laminated glass
  • B32B 17/04 - Layered products essentially comprising sheet glass, or fibres of glass, slag or the like in the form of fibres or filaments bonded with or embedded in a plastic substance
  • B32B 27/00 - Layered products essentially comprising synthetic resin
  • B60J 1/00 - Windows; Windscreens; Accessories therefor
  • C09J 7/30 - Adhesives in the form of films or foils characterised by the adhesive composition

33.

OPTICAL FILTER

      
Application Number JP2023030936
Publication Number 2024/048507
Status In Force
Filing Date 2023-08-28
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor
  • Shiono Kazuhiko
  • Shimada Takuro
  • Orita Yuichiro
  • Endo Kiyokazu
  • Sakagami Takahiro
  • Nagata Takashi
  • Kamijyo Katsushi

Abstract

222222 layer and the phosphoric acid glass. The optical filter satisfies all of prescribed spectroscopic characteristics (i−1) through (i−4).

IPC Classes  ?

  • G02B 5/28 - Interference filters
  • G02B 5/22 - Absorbing filters
  • G03B 11/00 - Filters or other obturators specially adapted for photographic purposes

34.

OPTICAL FILTER

      
Application Number JP2023030941
Publication Number 2024/048510
Status In Force
Filing Date 2023-08-28
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor
  • Orita Yuichiro
  • Shiono Kazuhiko
  • Nagata Takashi
  • Sakagami Takahiro

Abstract

The present invention relates to an optical filter which is provided with a base material, an antireflection layer 1 that is formed of a dielectric multilayer film, and an antireflection layer 2 that is formed of a dielectric multilayer film, wherein: the base material comprises a near-infrared absorbing glass and a resin film that is superposed on at least one main surface of the near-infrared absorbing glass; the resin film contains a resin, a UV dye that has a maximum absorption wavelength of 350 to 410 nm in the resin, and an IR dye that has a maximum absorption wavelength of 700 to 850 nm in the resin; and the optical filter satisfies all of the specific spectral characteristics (i-1) to (i-7).

IPC Classes  ?

  • G02B 5/22 - Absorbing filters
  • C09B 23/04 - Methine or polymethine dyes, e.g. cyanine dyes characterised by the methine chain containing an odd number of CH groups one CH group, e.g. cyanines, isocyanines, pseudocyanines
  • C09B 23/10 - Methine or polymethine dyes, e.g. cyanine dyes characterised by the methine chain containing an even number of CH groups
  • C09B 23/14 - Styryl dyes
  • C09B 57/00 - Other synthetic dyes of known constitution
  • G02B 1/113 - Anti-reflection coatings using inorganic layer materials only

35.

OPTICAL FILTER

      
Application Number JP2023030943
Publication Number 2024/048511
Status In Force
Filing Date 2023-08-28
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor
  • Nagata Takashi
  • Sakagami Takahiro
  • Shiono Kazuhiko
  • Orita Yuichiro

Abstract

The present invention relates to an optical filter which is sequentially provided with a dielectric multilayer film 1, a resin film, a phosphate glass and a dielectric multilayer film 2 in this order, wherein: the resin film contains a resin and a near-infrared absorbing dye that has a maximum absorption wavelength of 690 nm to 800 nm in the resin; the resin film has a thickness of 10 µm or less; and the optical filter satisfies all of the specific spectral characteristics (i-1) to (i-5).

IPC Classes  ?

  • G02B 5/28 - Interference filters
  • C09B 23/10 - Methine or polymethine dyes, e.g. cyanine dyes characterised by the methine chain containing an even number of CH groups
  • C09B 23/14 - Styryl dyes
  • C09B 57/00 - Other synthetic dyes of known constitution
  • G02B 5/22 - Absorbing filters

36.

OPTICAL FILTER

      
Application Number JP2023030945
Publication Number 2024/048512
Status In Force
Filing Date 2023-08-28
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor
  • Sakagami Takahiro
  • Nagata Takashi
  • Shiono Kazuhiko
  • Orita Yuichiro

Abstract

The present invention relates to an optical filter comprising a dielectric multilayer film 1, a resin film, a phosphate glass, and a dielectric multilayer film 2 in the stated order, wherein the resin film includes a resin and a near-infrared-absorbing pigment that has a maximum absorption wavelength of 690-800 nm in the resin, the resin film has a thickness of 10 µm or less, and the optical filter satisfies all of specific spectral characteristics (i-1) through (i-8).

IPC Classes  ?

37.

FILM AND METHOD FOR PRODUCING SEMICONDUCTOR PACKAGE

      
Application Number JP2023031094
Publication Number 2024/048545
Status In Force
Filing Date 2023-08-29
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor
  • Abe Tetsuo
  • Koguchi Ryohei
  • Kotera Seigo

Abstract

This film comprises a substrate, an antistatic layer that is provided on a surface of the substrate, and a release layer provided on the surface of the antistatic layer opposite the substrate. The elongation rate, measured by tensile testing at a speed of 100 mm/minute and a temperature of 25°C and calculated using the formula below, is more than 90% and less than 255%. Elongation rate (%) = (elongation at breaking (mm) x 100) / (distance between grips before stretching (mm))

IPC Classes  ?

  • H01L 21/56 - Encapsulations, e.g. encapsulating layers, coatings
  • B29C 33/68 - Release sheets
  • B29C 45/14 - Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
  • B32B 7/022 - Mechanical properties
  • B32B 27/00 - Layered products essentially comprising synthetic resin

38.

LAMINATE, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR PACKAGE

      
Application Number JP2023031100
Publication Number 2024/048548
Status In Force
Filing Date 2023-08-29
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor
  • Kotera Seigo
  • Takenaka Satoshi
  • Nakamura Junetsu

Abstract

This laminate comprises a film-shaped base material and an antistatic layer provided on one surface of the base material. The surface energy of the surface of the base material that is in contact with the antistatic layer is 35-70 mN/m, and the thickness deviation of the antistatic layer is less than 30%.

IPC Classes  ?

  • B32B 27/18 - Layered products essentially comprising synthetic resin characterised by the use of special additives
  • B32B 7/025 - Electric or magnetic properties
  • B32B 27/00 - Layered products essentially comprising synthetic resin
  • H01L 21/56 - Encapsulations, e.g. encapsulating layers, coatings

39.

ELECTROMAGNETIC WAVE REFLECTION DEVICE AND ELECTROMAGNETIC WAVE REFLECTION FENCE

      
Application Number JP2023030700
Publication Number 2024/048443
Status In Force
Filing Date 2023-08-25
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor Kambara, Kumiko

Abstract

Provided is an electromagnetic wave reflection device in which adjustment of the position or the angle of a reflection panel relative to incident electromagnetic waves is easy. This electromagnetic wave reflection device includes: a reflection panel provided with a reflection surface that reflects electromagnetic waves of a predetermined frequency band from 1 GHz to 300 GHz; a frame that holds the reflection panel; leg parts that support the frame; and a movable part that enables adjustment of the position or the angle of the reflection panel relative to incident electromagnetic waves. The legs part extends in a direction crossing the reflection surface of the reflection panel.

IPC Classes  ?

40.

OPTICAL FILTER

      
Application Number JP2023030951
Publication Number 2024/048513
Status In Force
Filing Date 2023-08-28
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor
  • Sakagami Takahiro
  • Nagata Takashi
  • Shiono Kazuhiko
  • Orita Yuichiro

Abstract

80(0deg)20(0deg)1200-12700(0deg)AVE1200-12700(0deg)AVE at an incident angle of 0 degrees is 50% or less

IPC Classes  ?

41.

METHOD FOR PRODUCING MOLDED ARTICLE, MOLDED ARTICLE, AND RECTANGULAR WIRE

      
Application Number JP2023031830
Publication Number 2024/048726
Status In Force
Filing Date 2023-08-31
Publication Date 2024-03-07
Owner AGC INC. (Japan)
Inventor
  • Abe, Masatoshi
  • Hosoda, Tomoya

Abstract

Provided is a method for producing a molded article, the method comprising: obtaining a melt by melting a composition, which comprises a polyimide-type thermoplastic resin P and a thermoplastic fluororesin F having a glass transition temperature lower than that of the resin P and in which the difference ΔTg between the glass transition temperature Tg-p of the resin P and the glass transition temperature Tg-f of the resin F is 75°C to 175°C, at a temperature equal to or greater than the higher of the melting point of the resin P and the melting point of the resin F; and obtaining a molded article by initiating cooling of the melt at a cooling rate of at least 10°C/min, wherein the resin F is dispersed in the resin P in the molded article.

IPC Classes  ?

42.

DIELECTRIC MULTILAYER FILM-EQUIPPED SUBSTRATE AND METHOD FOR MANUFACTURING SAME

      
Application Number JP2023029281
Publication Number 2024/043120
Status In Force
Filing Date 2023-08-10
Publication Date 2024-02-29
Owner AGC INC. (Japan)
Inventor
  • Takahoshi Hideaki
  • Arae Tomoyuki
  • Nishikawa Yasuhisa
  • Fujiwara Teruo

Abstract

2222252522 in the stated order from the substrate (S) side, and the thickness of the first low-refractive-index film layer (1022) that is positioned farthest from the substrate (S) in the first dielectric layered film (10) being 30 nm or greater.

IPC Classes  ?

  • G02B 1/115 - Multilayers
  • B32B 7/023 - Optical properties
  • B32B 9/00 - Layered products essentially comprising a particular substance not covered by groups
  • C03C 17/34 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • G02B 5/28 - Interference filters

43.

SILICON NITRIDE SINTERED BODY AND METHOD FOR PRODUCING SILICON NITRIDE SINTERED BODY

      
Application Number JP2023030121
Publication Number 2024/043230
Status In Force
Filing Date 2023-08-22
Publication Date 2024-02-29
Owner AGC INC. (Japan)
Inventor
  • Yano, Takaya
  • Ogawa, Shuhei
  • Miyakawa, Naomichi

Abstract

Provided is a silicon nitride sintered body which has a low content of rare earth elements and exhibits good mechanical characteristics. In a silicon nitride sintered body (1), the total content of Si and N is 90 wt% or more relative to the silicon nitride sintered body (1) as a whole, the content of Mg is 0.45-1.20 wt% relative to the silicon nitride sintered body (1) as a whole, the content of Al is 0.80-3.70 wt% relative to the silicon nitride sintered body (1) as a whole, the content of rare earth elements is 1000 ppm or less in terms of weight ratio relative to the silicon nitride sintered body (1) as a whole, the bending strength is 900 MPa or more, and the fracture toughness value Kc is 6.5 MPa·m1/2 or more.

IPC Classes  ?

44.

WIRELESS TRANSMISSION SYSTEM

      
Application Number JP2023023717
Publication Number 2024/038682
Status In Force
Filing Date 2023-06-27
Publication Date 2024-02-22
Owner AGC INC. (Japan)
Inventor Kambara, Kumiko

Abstract

Provided is a wireless transmission system that attains both improvement of radio wave propagation environments and suppression of leakage of radio waves to the outside of a requisite space. The wireless transmission system comprises: a base station that is disposed outdoors or in an environment similar to an outdoor environment, and performs wireless communication in a prescribed frequency band that is 1 GHz to 300 GHz; and an electromagnetic wave reflection apparatus that has a reflection panel for reflecting electromagnetic waves having the abovementioned frequency, and is provided along a prescribed region in the communication area of the base station. A transmission antenna of the base station forms a transmission beam toward the prescribed region such that output electromagnetic waves are incident onto a position on the electromagnetic wave reflection apparatus that is lower than the height of the top of the electromagnetic wave reflection apparatus. The reflection panel is positioned such that the minimum distance from the transmission antenna is within the range of 5.0 m to 300.0 m, and reflects the electromagnetic waves having the abovementioned frequency into the prescribed region. The received power outside the prescribed region is lower than the average or median of the received power in the prescribed region.

IPC Classes  ?

  • H01Q 15/14 - Reflecting surfaces; Equivalent structures
  • H01Q 15/16 - Reflecting surfaces; Equivalent structures curved in two dimensions, e.g. paraboloidal
  • H01Q 17/00 - Devices for absorbing waves radiated from an antenna; Combinations of such devices with active antenna elements or systems
  • H05K 9/00 - Screening of apparatus or components against electric or magnetic fields

45.

REFLECTIVE PANEL, ELECTROMAGNETIC WAVE REFLECTION DEVICE, AND ELECTROMAGNETIC WAVE REFLECTION FENCE

      
Application Number JP2023028560
Publication Number 2024/038775
Status In Force
Filing Date 2023-08-04
Publication Date 2024-02-22
Owner AGC INC. (Japan)
Inventor Kambara, Kumiko

Abstract

Provided are a reflective panel that has improved weather resistance, and an electromagnetic wave reflection device and an electromagnetic wave reflection fence in which said reflective panel is used. The reflective panel comprises: an electrically conductive layer that has an electrically conductive pattern that reflects electromagnetic waves in a predetermined frequency band of 1–300 GHz; a dielectric layer that is bonded to at least one surface of the electrically conductive layer with an adhesive layer interposed therebetween; and a protective layer that includes an ultraviolet absorber, said protective layer being provided on the surface of the dielectric layer that is on the opposite side from the adhesive layer, wherein the ratio of the thickness of the dielectric layer to the thickness of the protective layer is 66–1600.

IPC Classes  ?

  • H01Q 15/14 - Reflecting surfaces; Equivalent structures

46.

FLUOROALKENE COPOLYMER

      
Application Number JP2023029498
Publication Number 2024/038854
Status In Force
Filing Date 2023-08-15
Publication Date 2024-02-22
Owner
  • AGC INC. (Japan)
  • THE UNIVERSITY OF TOKYO (Japan)
Inventor
  • Kashiwagi Kimiaki
  • Okazoe Takashi
  • Sugiyama Norihide
  • Akiyama Midori
  • Kohata Ai
  • Masuda Junki
  • Okuda Mizuki

Abstract

The present invention is a copolymer having a structure represented by general formula (1) (in the formula, R1is a fluorine atom or a C1-10 perfluoroalkyl group or perfluoroalkoxy group optionally having -O- between carbon atoms; R2and R3each independently are a hydrogen atom, a halogen atom, an optionally substituted C1-30 aliphatic hydrocarbon group, or an optionally substituted aryl group; the R2and R3322-, -CO-, and -NH- between carbon atoms; x and y are positive numbers that satisfy x + y = 1; and black circles show bonds).

IPC Classes  ?

  • C08G 61/04 - Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms

47.

COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, COATING LIQUID, ARTICLE, AND ARTICLE MANUFACTURING METHOD

      
Application Number JP2023029571
Publication Number 2024/038865
Status In Force
Filing Date 2023-08-16
Publication Date 2024-02-22
Owner AGC INC. (Japan)
Inventor
  • Anraku Eiichiro
  • Kawakami Takafumi
  • Kouda Kazumi
  • Ochiai Shiori
  • Matsuura Keigo

Abstract

Provided are a compound, composition, surface treatment agent, coating liquid, article, and article manufacturing method that can improve the coefficient of dynamic friction while maintaining water repellency and oil repellency. The present invention provides a compound represented by formula (1). (1): A1-(ORfa1a2a2-A2 The symbols in the formula are as defined in the specification.

IPC Classes  ?

  • C08G 65/336 - Polymers modified by chemical after-treatment with organic compounds containing silicon
  • C09D 5/16 - Anti-fouling paints; Underwater paints
  • C09D 201/02 - Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups
  • C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

48.

COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, COATING LIQUID, ARTICLE, AND METHOD FOR PRODUCING ARTICLE

      
Application Number JP2023029585
Publication Number 2024/038870
Status In Force
Filing Date 2023-08-16
Publication Date 2024-02-22
Owner AGC INC. (Japan)
Inventor
  • Kouda Kazumi
  • Ochiai Shiori
  • Matsuura Keigo

Abstract

Provided are: a compound having excellent abrasion resistance and slip resistance; a composition; a surface treatment agent; a coating liquid; an article; and a method for producing said article. The compound according to the present disclosure is represented by formula (1). Formula (1): Rf1-Rf2-(ORf3y1y1-R1-L1(-R2-T1x1x1. Here, Rf1is an aliphatic ring which may have a hetero atom and may have a substituent group, Rf2is a fluoroalkylene group having 1-6 carbon atoms or a fluoroalkylene group which has 1-6 carbon atoms and which may have -NR11-, -C(=O)-, -C(=O)NR11- or C(=O)-O- in a carbon-carbon bond, Rf3is a fluoroalkylene group having 1-6 carbon atoms, and T1 is a reactive group. Moreover, symbols in the formula other than those mentioned above are as defined in the description.

IPC Classes  ?

  • C07F 7/12 - Organo silicon halides
  • C08G 65/336 - Polymers modified by chemical after-treatment with organic compounds containing silicon
  • C09D 5/16 - Anti-fouling paints; Underwater paints
  • C09D 201/02 - Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups
  • C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
  • C07C 23/20 - Polycyclic halogenated hydrocarbons with condensed rings none of which is aromatic

49.

COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, COATING LIQUID, ARTICLE, AND METHOD FOR PRODUCING ARTICLE

      
Application Number JP2023029592
Publication Number 2024/038873
Status In Force
Filing Date 2023-08-16
Publication Date 2024-02-22
Owner AGC INC. (Japan)
Inventor
  • Anraku Eiichiro
  • Kawakami Takafumi
  • Kouda Kazumi
  • Ochiai Shiori
  • Matsuura Keigo

Abstract

Provided are: a compound, a composition, a surface treatment agent and a coating liquid able to form a surface layer in which drop-off is suppressed while anti-friction properties and fingerprint dirt removal properties are maintained; an article which is provided with a surface layer formed from said compound or the like and which is excellent in terms of anti-friction properties, fingerprint dirt removal properties and a drop-off suppression effect; and a method for producing said article. The compound has: a group (Rf) that includes an optionally substituted fluoroether ring; and a reactive group (T1).

IPC Classes  ?

  • C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
  • C08G 65/336 - Polymers modified by chemical after-treatment with organic compounds containing silicon
  • C09D 5/16 - Anti-fouling paints; Underwater paints
  • C09D 201/02 - Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups
  • C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

50.

YTTRIUM-BASED PROTECTIVE FILM, METHOD FOR PRODUCING SAME, AND MEMBER

      
Application Number JP2023022986
Publication Number 2024/038674
Status In Force
Filing Date 2023-06-21
Publication Date 2024-02-22
Owner
  • AGC INC. (Japan)
  • TSUBASA SCIENCE CORPORATION (Japan)
Inventor
  • Ogawa Shuhei
  • Ogawa Tomonori
  • Ishikawa Michio
  • Tanimura Michio
  • Okada Hidekazu

Abstract

233 (222) plane orientation of at least 50%, a hydrogen atom number of at most 5.0×1021/cm3, and a compressive stress of 100-1,700 MPa.

IPC Classes  ?

  • C23C 14/08 - Oxides
  • C01F 17/218 - Yttrium oxides or hydroxides
  • C23C 14/22 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C 14/48 - Ion implantation
  • C25D 11/18 - After-treatment, e.g. pore-sealing
  • H01L 21/3065 - Plasma etching; Reactive-ion etching
  • H01L 21/31 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After-treatment of these layers; Selection of materials for these layers

51.

NUCLEIC ACID FOR TRANSFECTION

      
Application Number JP2023028633
Publication Number 2024/038781
Status In Force
Filing Date 2023-08-04
Publication Date 2024-02-22
Owner
  • AGC INC. (Japan)
  • THE UNIVERSITY OF TOKYO (Japan)
Inventor
  • Okazoe Takashi
  • Okamoto Akimitsu
  • Morihiro Kunihiko

Abstract

The present invention provides: a nucleic acid, for transfection, having excellent cell membrane permeability; a manufacturing method thereof; and a transfection method. The present invention pertains to a nucleic acid for transfection and a transfection method for the nucleic acid. In the nucleic acid for transfection, a nucleic acid to be introduced into a cell and a cell-membrane-permeable group are bonded, the cell-membrane-permeable group contains a perfluoroalkyl group having 2 to 10 carbons, and the perfluoroalkyl group may have one to five ether-bonded oxygen atoms between the carbon atoms. The transfection method of the nucleic acid involves bringing the nucleic acid for transfection into contact with a cell and introducing the nucleic acid into the cell.

IPC Classes  ?

  • C12N 15/11 - DNA or RNA fragments; Modified forms thereof
  • A61K 31/712 - Nucleic acids or oligonucleotides having modified sugars, i.e. other than ribose or 2'-deoxyribose
  • A61K 48/00 - Medicinal preparations containing genetic material which is inserted into cells of the living body to treat genetic diseases; Gene therapy
  • C07H 21/00 - Compounds containing two or more mononucleotide units having separate phosphate or polyphosphate groups linked by saccharide radicals of nucleoside groups, e.g. nucleic acids

52.

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, AND OPTICAL ELEMENT

      
Application Number JP2023029118
Publication Number 2024/038814
Status In Force
Filing Date 2023-08-09
Publication Date 2024-02-22
Owner AGC INC. (Japan)
Inventor
  • Kawashima Masayuki
  • Takahashi Hideyuki

Abstract

The present invention pertains to a positive-type photosensitive resin composition which contains an alkali-soluble resin (A), a photosensitizer (B), and an ink repellent agent (C), and in which the ink repellent agent (C) has a monovalent group that is represented by formula (c) and that has 2-40 carbon atoms. (c): Rf1-O-Rf2- [Rf1represents a polyfluoro alkyl group having 1-6 carbon atoms, and Rf2represents a polyfluoro alkylene group optionally having an etheric oxygen atom between carbon-carbon atoms (however, Rf1-O-Rf222-group).]

IPC Classes  ?

  • G03F 7/023 - Macromolecular quinonediazides; Macromolecular additives, e.g. binders
  • G02B 5/20 - Filters
  • G03F 7/004 - Photosensitive materials
  • H05B 33/12 - Light sources with substantially two-dimensional radiating surfaces
  • H05B 33/22 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
  • H10K 50/10 - OLEDs or polymer light-emitting diodes [PLED]

53.

COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, COATING LIQUID, ARTICLE, AND METHOD FOR PRODUCING ARTICLE

      
Application Number JP2023029572
Publication Number 2024/038866
Status In Force
Filing Date 2023-08-16
Publication Date 2024-02-22
Owner AGC INC. (Japan)
Inventor
  • Ochiai Shiori
  • Anraku Eiichiro
  • Kawakami Takafumi
  • Kouda Kazumi
  • Matsuura Keigo

Abstract

Provided are: a compound, a composition, a surface treatment agent and a coating liquid able to form a surface layer in which drop-off is suppressed while anti-friction properties and fingerprint soilage removal properties are maintained; an article which is provided with a surface layer formed from said compound or the like and which is excellent in terms of anti-friction properties, fingerprint soilage removal properties and a drop-off suppression effect; and a method for producing said article. The present invention provides a compound which is represented by formula (1). Formula (1): [Rf1-(ORf2y1y1-R1a1a1Rf3a2a2C[-R2-(ORf4y2y2-R3-L1(-R4-T1x1a3a3. Symbols in the formula are as defined in the description.

IPC Classes  ?

  • C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
  • C08G 65/336 - Polymers modified by chemical after-treatment with organic compounds containing silicon
  • C09D 5/16 - Anti-fouling paints; Underwater paints
  • C09D 201/02 - Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups
  • C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

54.

GLASS SUBSTRATE

      
Application Number JP2023026793
Publication Number 2024/034360
Status In Force
Filing Date 2023-07-21
Publication Date 2024-02-15
Owner AGC INC. (Japan)
Inventor
  • Sawamura, Shigeki
  • Kanno, Naoki

Abstract

d707070, and the ratio (g/r) of the deviation (mm) of the center of gravity G of the glass substrate relative to the center P of the glass substrate in top view and the radius r is in the range of 0.05-1.2%.

IPC Classes  ?

  • C03C 19/00 - Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
  • C03C 3/12 - Silica-free oxide glass compositions
  • C03C 3/15 - Silica-free oxide glass compositions containing boron containing rare earths
  • G02B 1/00 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements
  • G02B 5/00 - Optical elements other than lenses

55.

WIRELESS COMMUNICATION DEVICE

      
Application Number JP2023027573
Publication Number 2024/034421
Status In Force
Filing Date 2023-07-27
Publication Date 2024-02-15
Owner AGC INC. (Japan)
Inventor
  • Okuda, Ryota
  • Enomoto, Kotaro
  • Morimoto, Yasuo
  • Iwakami, Kenichi
  • Kumagai, Akira

Abstract

Provided is a wireless communication device that is capable of relaying radio waves and is attachable to window glass which can be opened and closed. The wireless communication device comprises: an antenna that has an antenna element and a phase shifter connected to the antenna element, and is disposed overlapping a dielectric plate of window glass having the dielectric plate; a relay part that is arranged on the window glass and relays radio waves received by the antenna; a control unit that is arranged on the window glass and controls an amount of phase change of the radio waves in the phase shifter; a power-receiving unit that is arranged on the window glass and supplies received power to the phase shifter, the relay part, and the control unit; and a wireless power-feeding unit that is arranged to a structure surrounding the window glass and wirelessly supplies power to the power-receiving unit.

IPC Classes  ?

  • H04B 7/155 - Ground-based stations
  • H01Q 1/22 - Supports; Mounting means by structural association with other equipment or articles

56.

METHOD FOR PURIFYING HYDROGEN SULFIDE AND METHOD FOR PRODUCING LITHIUM SULFIDE

      
Application Number JP2023028573
Publication Number 2024/034534
Status In Force
Filing Date 2023-08-04
Publication Date 2024-02-15
Owner AGC INC. (Japan)
Inventor
  • Ando Ryota
  • Hatano Hiroshi

Abstract

The present invention is a method for purifying hydrogen sulfide that removes the lithium raw material from a mixed gas (101) containing unreacted hydrogen sulfide and lithium raw material, generated during the process of producing lithium sulfide by reacting hydrogen sulfide and lithium raw material, using a cyclone.

IPC Classes  ?

57.

ADHESIVE BASE MATERIAL WITH WIRING LINE, MULTILAYER DEVICE, GLASS LAMINATE, AND METHOD FOR PRODUCING ADHESIVE BASE MATERIAL WITH WIRING LINE

      
Application Number JP2023021103
Publication Number 2024/034246
Status In Force
Filing Date 2023-06-07
Publication Date 2024-02-15
Owner AGC INC. (Japan)
Inventor Fujita Kenji

Abstract

The present invention provides an adhesive base material with a wiring line, the adhesive base material being capable of suppressing the occurrence of a crack or buckling in a wiring pattern that is formed on an adhesive layer. An adhesive base material (1) with a wiring line according to one embodiment of the present disclosure is provided with: a base material (10); an adhesive layer (11) that is formed on the base material (10); and a wiring pattern (12) that is formed on the adhesive layer (11). The adhesive layer (11) has an adhesive force of 0.01 N/25 mm or more with respect to a PET film; if the adhesive layer is immersed in isopropyl alcohol for one minute, the amount of layer thickness change is 20% or less; and if the adhesive layer is immersed in toluene for one minute, the amount of layer thickness change is 18% or less.

IPC Classes  ?

  • H05K 1/03 - Use of materials for the substrate
  • B32B 7/025 - Electric or magnetic properties
  • C03C 27/12 - Laminated glass
  • C09J 7/00 - Adhesives in the form of films or foils
  • C09J 9/00 - Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
  • H01B 5/14 - Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
  • H01B 13/00 - Apparatus or processes specially adapted for manufacturing conductors or cables
  • H05K 3/38 - Improvement of the adhesion between the insulating substrate and the metal

58.

GLASS SUBSTRATE

      
Application Number JP2023026840
Publication Number 2024/034361
Status In Force
Filing Date 2023-07-21
Publication Date 2024-02-15
Owner AGC INC. (Japan)
Inventor
  • Sawamura, Shigeki
  • Kanno, Naoki

Abstract

d707070, and the ratio (g/r) of the deviation g (mm) of the center of gravity G of the glass substrate to the center P of the glass substrate in top view and the radius r is in the range of 0.05-1.2%.

IPC Classes  ?

  • C03C 19/00 - Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
  • C03C 3/12 - Silica-free oxide glass compositions
  • C03C 3/15 - Silica-free oxide glass compositions containing boron containing rare earths
  • G02B 1/00 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements

59.

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD FOR MANUFACTURING SAME, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SAME

      
Application Number JP2023027892
Publication Number 2024/034439
Status In Force
Filing Date 2023-07-31
Publication Date 2024-02-15
Owner AGC INC. (Japan)
Inventor
  • Sei Ryosuke
  • Tsukiyama Keishi

Abstract

Provided is a reflective mask blank for EUV lithography in which a multilayer reflective film that reflects EUV light and an absorption film that absorbs EUV light are laminated on a substrate in the stated order from the substrate side, wherein the absorption film contains a metal element X as a main component, the crystal structure of the absorption film has a first crystal structure that serves as a stable crystal structure in the bulk state of the metal element X at normal pressure (1 atm) and 25°C and a second crystal structure that is different from the first crystal structure, and the peak area ratio of the second crystal structure is 9% or greater.

IPC Classes  ?

  • G03F 1/24 - Reflection masks; Preparation thereof

60.

HYDROGEN SULFIDE PURIFICATION METHOD AND LITHIUM SULFIDE PRODUCTION METHOD

      
Application Number JP2023028571
Publication Number 2024/034533
Status In Force
Filing Date 2023-08-04
Publication Date 2024-02-15
Owner AGC INC. (Japan)
Inventor
  • Ando Ryota
  • Hatano Hiroshi

Abstract

Provided is a hydrogen sulfide purification method in which, in a process for producing lithium sulfate by the reaction of hydrogen sulfate with a lithium raw material, the lithium raw material is removed from a mixed gas (101) containing an unreacted portion of hydrogen sulfide and an unreacted portion of the lithium raw material which is generated in the process by using an ejector that utilizes a washing solution as a driving fluid.

IPC Classes  ?

61.

METHOD FOR PRODUCING PROLIFERATIVE MACROPHAGE-LIKE CELLS (pMAC)

      
Application Number JP2023029198
Publication Number 2024/034656
Status In Force
Filing Date 2023-08-09
Publication Date 2024-02-15
Owner
  • AGC INC. (Japan)
  • NATIONAL CANCER CENTER (Japan)
Inventor
  • Fukuda, Kyoko
  • Uemura, Yasushi
  • Hagiya, Yuichiro
  • Ide, Masamichi
  • Kariya, Masahiro

Abstract

The present invention provides: proliferative macrophage-like cells (pMAC), characterized by proliferating in a cytokine-dependent manner; a method for producing the same; and a method for producing chimeric antigen receptor (CAR)-proliferative macrophage-like cells (pMAC) that includes (1) a step (step 1) that deletes or suppresses the expression of a gene that inhibits macrophage-like function in pluripotent stem cells, then induces differentiation into myeloid cells to obtain macrophage-like cells (MAC), (2) a step (step 2) that brings about expression of a gene that adds a proliferative property to the MAC obtained in step 1 and obtains proliferative macrophage-like cells (pMAC), and (3) a step (step 3) that introduces a CAR. The present invention also provides the pharmaceutical use of CAR-pMAC. The present invention makes it possible to provide a novel CAR-loaded cell platform, especially a CAR-loaded cell platform having excellent quality stability, stable supply, and economy, and especially to provide a CAR-loaded cell platform that is excellent as a pharmaceutical.

IPC Classes  ?

  • C12N 5/10 - Cells modified by introduction of foreign genetic material, e.g. virus-transformed cells
  • C12N 5/02 - Propagation of single cells or cells in suspension; Maintenance thereof; Culture media therefor

62.

REFLECTIVE PANEL, ELECTROMAGNETIC WAVE REFLECTIVE DEVICE, AND ELECTROMAGNETIC WAVE REFLECTIVE FENCE

      
Application Number JP2023026269
Publication Number 2024/029325
Status In Force
Filing Date 2023-07-18
Publication Date 2024-02-08
Owner AGC INC. (Japan)
Inventor Kambara, Kumiko

Abstract

The present invention provides a reflective panel that can expand the beam width of a reflected wave with a simple design. The reflective panel includes a dielectric layer and a cyclic conductive pattern provided on one surface of the dielectric layer The cyclic conductive pattern includes at least a first unit pattern in which a plurality of metal elements having a long axis in a first direction in the plane of the dielectric layer are arranged in a second direction orthogonal to the first direction and a second unit pattern different from the first unit pattern. The first unit pattern is arranged repeatedly in the second direction to form a first pattern row. The second unit pattern is arranged repeatedly in the second direction to form a second pattern row. The first pattern row and the second pattern row are arranged repeatedly in the first direction.

IPC Classes  ?

  • H01Q 15/14 - Reflecting surfaces; Equivalent structures

63.

REFLECTING PANEL, ELECTROMAGNETIC WAVE REFLECTING DEVICE USING SAME, AND ELECTROMAGNETIC WAVE REFLECTING FENCE

      
Application Number JP2023026671
Publication Number 2024/029365
Status In Force
Filing Date 2023-07-20
Publication Date 2024-02-08
Owner AGC INC. (Japan)
Inventor Kambara, Kumiko

Abstract

Provided is a reflecting panel that is of simple design and has a higher sensitivity to at least one of two orthogonal polarized waves. The reflective panel comprises a dielectric layer and a periodic conductive pattern provided on a surface of the dielectric layer. The periodic conductive pattern includes a repetition of a unit pattern in which metal elements having a longer axis in a first direction in the plane of the dielectric layer are arrayed at a predetermined interval in a second direction orthogonal to the first direction. The metal elements are each divided into two or more first segments extending in the first direction.

IPC Classes  ?

  • H01Q 15/22 - Reflecting surfaces; Equivalent structures functioning also as polarisation filter
  • H01Q 15/14 - Reflecting surfaces; Equivalent structures

64.

RADIO WAVE TRANSMISSION SYSTEM AND REFLECTOR

      
Application Number JP2023027565
Publication Number 2024/029448
Status In Force
Filing Date 2023-07-27
Publication Date 2024-02-08
Owner AGC INC. (Japan)
Inventor
  • Kumagai, Akira
  • Kagaya, Osamu
  • Kataoka, Mizuki
  • Ui, Yutaka

Abstract

Provided are a radio wave transmission system and a reflector capable of achieving both miniaturization and beam intensity adjustment.  The radio wave transmission system includes: a first reflection plate, the reflection angle of which is fixed; a second reflection plate which can be scanned for a reflection angle; and a control unit which scans the second reflection plate for the reflection angle. The control unit performs scanning using a second beam, of a radio wave reflected by the second reflection plate, which is directed in a reflection direction of a first beam of a radio wave reflected by the first reflection plate.

IPC Classes  ?

  • H01Q 15/14 - Reflecting surfaces; Equivalent structures

65.

GLASS ARTICLE, DISPLAY DEVICE, METHOD FOR MANUFACTURING GLASS ARTICLE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE

      
Application Number JP2023027972
Publication Number 2024/029495
Status In Force
Filing Date 2023-07-31
Publication Date 2024-02-08
Owner AGC INC. (Japan)
Inventor
  • Watanabe Toshinari
  • Inoue Yasuhiro
  • Inoue Atsushi

Abstract

The present invention inhibits cover glass from deviating from a desired shape. A glass article (10) according to the present invention has: heat-molded cover glass (12) including a curved part (20); a frame (14) provided to a main surface (12B) of the cover glass (12); and an adhesive layer (16) which is provided between the main surface (12B) of the cover glass (12) and the frame (14) and adhesively joins the cover glass (12) and the frame (14), wherein the parameter A stated in the specification is greater than 0 and equal to or less than 0.5.

IPC Classes  ?

  • C03B 23/023 - Re-forming glass sheets by bending
  • C03C 21/00 - Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals into the surface
  • C03C 27/04 - Joining glass to metal by means of an interlayer
  • G09F 9/00 - Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
  • G09F 9/30 - Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements

66.

SUBSTRATE WITH SILICA FILM

      
Application Number JP2023028164
Publication Number 2024/029537
Status In Force
Filing Date 2023-08-01
Publication Date 2024-02-08
Owner AGC INC. (Japan)
Inventor Abe Sayaka

Abstract

The present invention provides a substrate with a silica film, which has excellent initial oil repellency, while having improved oil repellency after being heated to 300°C. A substrate with a silica film according to the present invention comprises a substrate and a silica film that is arranged on the substrate; the silica film contains an antioxidant and a hydrolysis condensation product of a hydrolyzable compound that contains a compound represented by Si(-R1nn(-OR24-n4-n; the content of the antioxidant is 25% by mass or less relative to the total mass of the silica film; and the ratio of the carbon atom content to the silicon atom content in the silica film is 0.90 or more; and the thickness of the silica film is 15 nm or more. In the formula, R1represents an alkyl group having 1 to 3 carbon atoms; R2 represents a methyl group or an ethyl group; and n represents an integer of 1 to 3.

IPC Classes  ?

  • B32B 9/00 - Layered products essentially comprising a particular substance not covered by groups
  • C09D 1/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
  • C09D 7/61 - Additives non-macromolecular inorganic
  • C09D 183/00 - Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers

67.

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

      
Application Number JP2023027271
Publication Number 2024/029409
Status In Force
Filing Date 2023-07-25
Publication Date 2024-02-08
Owner AGC INC. (Japan)
Inventor Okato Takeshi

Abstract

Provided are: a reflective mask for EUV lithography that can form a transfer pattern having high dimensional accuracy with respect to a fine line-shaped pattern; and a reflective mask blank used for the reflective mask. A reflective mask blank 10 for EUV lithography includes, on a substrate 1 and stacked in the given order from the substrate 1 side, the following: a multilayer reflective film 2 for reflecting EUV light; and an absorption layer 3 for absorbing EUV light. The absorption layer 3 has, for EUV light having a wavelength of 13.5 nm, a refractive index of 0.930 or less and an extinction coefficient of 0.025 or greater, and is configured such that the phase difference between reflected light from the surface of the multilayer reflective film and reflected light from the surface of the absorption layer with respect to incident light of the EUV light having a wavelength of 13.5 nm is 220°-280°. The reflective mask includes a mask pattern formed in the absorption layer 3.

IPC Classes  ?

  • G03F 1/24 - Reflection masks; Preparation thereof
  • G03F 1/32 - Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

68.

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

      
Application Number JP2023027272
Publication Number 2024/029410
Status In Force
Filing Date 2023-07-25
Publication Date 2024-02-08
Owner AGC INC. (Japan)
Inventor Okato Takeshi

Abstract

Provided are a reflective mask for EUV lithography that can form transfer patterns with high dimensional accuracy in fine hole-like patterns, and a reflective mask blank used for said reflective mask. A reflective mask blank 10 for EUV lithography in which a multilayer reflective film 2 that reflects EUV light and an absorption layer 3 that absorbs EUV light are layered on a substrate 1 in the stated order from the substrate 1 side, wherein: the absorption layer 3 has a refractive index of less than 0.94 and an extinction coefficient of 0.060 or less for EUV light having a wavelength of 13.5 nm; and the phase difference between light reflected from the surface of the multilayer reflective film and the light reflected from the surface of the absorption layer, with respect to incident light of EUV light having a wavelength of 13.5 nm, is 220-320°. Additionally, a reflective mask obtained by forming a mask pattern on the absorption layer 3.

IPC Classes  ?

  • G03F 1/24 - Reflection masks; Preparation thereof
  • G03F 1/32 - Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

69.

GLASS ARTICLE

      
Application Number JP2023027748
Publication Number 2024/029459
Status In Force
Filing Date 2023-07-28
Publication Date 2024-02-08
Owner AGC INC. (Japan)
Inventor
  • Fujimoto Hiroki
  • Kawamoto Yasushi
  • Minamiya Yuukou

Abstract

Provided is a glass article which, even after having been shaped with heating at a high temperature and thereafter used over a long period, can be inhibited from suffering the peeling or blushing of layers disposed on the glass base and is excellent in terms of the adhesion of the layers and appearance. The glass article comprises a glass base (1) and, disposed thereover in the following order, a coating film (2) and a shielding layer (3), wherein an interfacial portion (5) between the coating film (2) and the shielding layer (3) has a porosity of 24% or less. The shielding layer (3) has a Bi/Si ratio of preferably 3.9 or higher. The coating film (2) is preferably a dry-process coating film. The glass article can be used as automotive window glasses.

IPC Classes  ?

  • C03C 17/34 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions

70.

PANEL HOLDING DEVICE AND PANEL HOLDING METHOD

      
Application Number JP2023028030
Publication Number 2024/029509
Status In Force
Filing Date 2023-07-31
Publication Date 2024-02-08
Owner AGC INC. (Japan)
Inventor
  • Kikuchi Satoshi
  • Ibaraki Shunsuke
  • Miyake Yurika

Abstract

This panel holding device comprises a first support member (1B) and a second support member (1A) that are disposed spaced apart from each other on an existing transparent member (30). Each of the first support member (1B) and the second support member (1A) comprises an adhesive layer (2) that adheres to the existing transparent member (30), and a first groove portion (7) that is formed between the first support member (1B) and second support member (1A) and the existing transparent member (30), and is capable of storing ends (41, 43) of a panel (40). At least one of the first support member (1B) and the second support member (1A) includes a storage space (12) capable of storing a wiring cord (45).

IPC Classes  ?

  • H02S 30/10 - Frame structures
  • H02S 20/22 - Supporting structures directly fixed to an immovable object specially adapted for buildings

71.

LAMINATE AND OPTICAL ELEMENT

      
Application Number JP2023024638
Publication Number 2024/024409
Status In Force
Filing Date 2023-07-03
Publication Date 2024-02-01
Owner AGC INC. (Japan)
Inventor Hino, Yuichi

Abstract

This laminate comprises: a phase difference plate including a transparent substrate and a liquid crystal layer formed on the transparent substrate; and an adhesive layer for adhering the phase difference plate to a curved surface of a three-dimensional structure. If the storage modulus of the adhesive layer is E (MPa) and the thickness of the adhesive layer is T (μm), α as defined by the following equation (1) is 0.26-0.55 MPa, and T is 22-110 μm. (1): α=E×exp(E/T)

IPC Classes  ?

  • G02B 5/30 - Polarising elements
  • B32B 7/022 - Mechanical properties
  • B32B 7/023 - Optical properties
  • B32B 27/00 - Layered products essentially comprising synthetic resin
  • C09J 7/30 - Adhesives in the form of films or foils characterised by the adhesive composition
  • C09J 201/00 - Adhesives based on unspecified macromolecular compounds
  • G02B 7/00 - Mountings, adjusting means, or light-tight connections, for optical elements

72.

WATER-REPELLENT STRUCTURE AND COMPOSITION FOR FORMING WATER-REPELLENT LAYER

      
Application Number JP2023025352
Publication Number 2024/024461
Status In Force
Filing Date 2023-07-07
Publication Date 2024-02-01
Owner AGC INC. (Japan)
Inventor
  • Yamaguchi Ryohei
  • Morita Shimpei
  • Oki Satoshi
  • Ushio Tomoya

Abstract

The present invention provides a water-repellent structure including a non-fluorinated water-repellent layer which, in an initial state, has satisfactory water repellency and which has such wear resistance that, even when the surface thereof is repeatedly rubbed, the water repellency decreases little. The water-repellent structure (1) comprises a base (10) and a water-repellent film (20) formed on a surface of the base (10), wherein the water-repellent film (20) includes a water-repellent layer (21) which contains siloxane bonds and one or more kinds of organic groups bonded to Si atoms and contains no fluorine atoms, the water-repellent layer (21) having a surface (21S) which is the uppermost surface (20S) of the water-repellent film (20). The surface (21S) of the water-repellent layer (21) has a modulus distribution and has, in an arbitrarily selected 1-μm square micron area, a high-modulus portion having a modulus of 6.0 GPa or greater and a low-modulus portion having a modulus of 4.0 GPa or less, the surface moduli of the micron area having a root-mean-square slope of 3.5 GPa or greater.

IPC Classes  ?

  • B32B 27/00 - Layered products essentially comprising synthetic resin
  • B32B 17/10 - Layered products essentially comprising sheet glass, or fibres of glass, slag or the like comprising glass as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
  • C03C 17/30 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
  • C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

73.

LIQUID CRYSTAL COMPOSITION, OPTICAL ANISOTROPIC FILM, NEAR INFRARED RAY-ABSORBING DYE

      
Application Number JP2023026898
Publication Number 2024/024700
Status In Force
Filing Date 2023-07-21
Publication Date 2024-02-01
Owner AGC INC. (Japan)
Inventor
  • Saibe Yuki
  • Okada Satoshi
  • Takada Naomi

Abstract

The present invention relates to a liquid crystal composition comprising a liquid crystal compound and a near infrared ray absorbing dye having a mesogenic group, in which the molar extinction coefficient of the near infrared ray absorbing dye in dichloromethane at a maximum absorption wavelength is 200000 L/(mol·cm) or more, and the near infrared ray absorbing dye satisfies formula (1) shown below wherein A1 represents an absorbance of a molecule in the longer axis direction and A2 represents an absorbance of the molecule in the shorter axis direction both at a wavelength of 650 to 1100 nm when measured under a specific measurement condition (A). A1 < A2 (1)

IPC Classes  ?

74.

OPTICALLY ANISOTROPIC FILM AND PHASE DIFFERENCE PLATE

      
Application Number JP2023026899
Publication Number 2024/024701
Status In Force
Filing Date 2023-07-21
Publication Date 2024-02-01
Owner AGC INC. (Japan)
Inventor
  • Takada Naomi
  • Saibe Yuki
  • Okada Satoshi

Abstract

The present invention addresses the problem of providing an optically anisotropic film that is a single layer and has sufficient anti-reflection performance throughout the entire wavelength range of 430-680 nm in the visible light range, and a phase difference plate comprising the optically anisotropic film. The present invention relates to an optically anisotropic film that is a single layer and has an ellipticity of 0.9 or more throughout the entire wavelength range of 430-680 nm. The present invention also relates to a phase difference plate or an optical filter comprising the optically anisotropic film.

IPC Classes  ?

75.

REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, REFLECTION-TYPE MASK BLANK PRODUCTION METHOD, AND REFLECTION-TYPE MASK PRODUCTION METHOD

      
Application Number JP2023025748
Publication Number 2024/024513
Status In Force
Filing Date 2023-07-12
Publication Date 2024-02-01
Owner AGC INC. (Japan)
Inventor
  • Akagi, Daijiro
  • Kato, Takuma
  • Tsukiyama, Keishi
  • Uno, Toshiyuki
  • Hanekawa, Hiroshi
  • Oishi, Ryusuke
  • Ikeda, Sadatatsu
  • Iwata, Yukihiro
  • Hanzawa, Chikako

Abstract

Provided is a reflection-type mask blank comprising a substrate, a multi-layer reflective film that reflects EUV light, a protective film that protects the multi-layer reflective film, and an absorption film that absorbs the EUV light, in the given order. The protective film contains rhodium as the main component. The multi-layer reflective film comprises an uppermost layer that has silicon and nitrogen and is the uppermost layer closest to the protective film. The uppermost layer has a nitrogen to silicon element ratio (N/Si) of more than 0.00 and less than 1.50, and an oxygen to silicon element ratio (O/Si) of 0.00 or more and less than 0.44.

IPC Classes  ?

  • G03F 1/24 - Reflection masks; Preparation thereof

76.

COVER GLASS WITH OUTER FRAME, SEMICONDUCTOR LIGHT EMITTING DEVICE, AND SEMICONDUCTOR LIGHT RECEIVING DEVICE

      
Application Number JP2023025953
Publication Number 2024/024530
Status In Force
Filing Date 2023-07-13
Publication Date 2024-02-01
Owner AGC INC. (Japan)
Inventor
  • Nishimoto Nanako
  • Murakami Ryota

Abstract

The present invention relates to a cover glass with an outer frame, the cover glass including a flat glass and an outer frame bonded on a first main surface thereof via a glass adhesive layer. Borosilicate glass and a filler in a glass-ceramic forming the outer frame both contain aluminum oxide. The volume fraction of the filler and the volume fraction of the aluminum oxide in the glass-ceramic are 40%-65% and 10%-65%, respectively. The absolute value of a difference in average thermal expansion coefficient between the flat glass and the outer frame at 50-350°C is not more than 20×10-7/°C.

IPC Classes  ?

  • H01L 23/08 - Containers; Seals characterised by the material of the container or its electrical properties the material being an electrical insulator, e.g. glass
  • C03C 14/00 - Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
  • C03C 27/10 - Joining glass to glass by processes other than fusing with the aid of adhesive specially adapted for that purpose
  • H01L 23/02 - Containers; Seals
  • H01L 33/52 - Encapsulations

77.

GLASS VIBRATION PLATE AND VIBRATOR-EQUIPPED GLASS VIBRATION PLATE

      
Application Number JP2023026481
Publication Number 2024/024599
Status In Force
Filing Date 2023-07-19
Publication Date 2024-02-01
Owner AGC INC. (Japan)
Inventor
  • Sakurai, Kento
  • Akiyama, Jun

Abstract

A glass vibration plate (10) comprises: a glass plate constituent (12); a mount (14) fixed to the main surface on one side of the glass plate constituent (12); and a connection part (16) which is provided on a side of the mount (14) opposite to the glass plate constituent (12) side and to which a vibrator (24) for vibrating the glass plate constituent (12) is attached. The mount (14) and the connection part (16) are provided with non-overlapped parts (32, 36) not overlapping the vibrator (24) in the plate thickness direction of the glass plate constituent (12), and are fixed to each other by the non-overlapped parts (32, 36).

IPC Classes  ?

  • H04R 1/02 - Casings; Cabinets; Mountings therein
  • H04R 7/02 - Diaphragms for electromechanical transducers; Cones characterised by the construction
  • H04R 7/06 - Plane diaphragms comprising a plurality of sections or layers
  • H04R 7/18 - Mounting or tensioning of diaphragms or cones at the periphery

78.

RESIN COMPOSITION AND MOLDED ARTICLE OF SAME

      
Application Number JP2023026606
Publication Number 2024/024632
Status In Force
Filing Date 2023-07-20
Publication Date 2024-02-01
Owner AGC INC. (Japan)
Inventor
  • Ochi Yousuke
  • Abe Masatoshi
  • Aruga Hiroshi
  • Sasaki Toru
  • Kawai Tsuyoshi

Abstract

Provided is a resin composition which can be easily molded through injection molding and from which a molded article having excellent discoloration resistance, mechanical strength, and surface smoothness can be obtained. This resin composition contains a partially fluorinated fluororesin (A), particles (B) in which titanium oxide is the main component, a phosphorus compound (C), and a potassium titanate whisker (D). The partially fluorinated fluororesin (A) has a melting point of 150-300°C. The potassium titanate whisker (D) has a fiber diameter of less than 9 μm and a Mohs' hardness of 6 or less. With respect to the total mass of the partially fluorinated fluororesin (A), the particles (B), the phosphorus compound (C), and the potassium titanate whisker (D), the contained amounts of the particles (B), the phosphorus compound (C), and the potassium titanate whisker (D) are 1.0-20.0 mass%, 0.1-1.0 mass%, and 5-30 mass%, respectively. The resin composition has a melt flow rate of 11 g/10 min or more and a tensile elastic modulus of 2.0 GPa or more.

IPC Classes  ?

  • C08L 27/12 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
  • C08K 3/22 - Oxides; Hydroxides of metals
  • C08K 5/521 - Esters of phosphoric acids, e.g. of H3PO4
  • C08K 5/527 - Cyclic esters
  • C08K 5/5317 - Phosphonic compounds, e.g. R—P(:O)(OR')2
  • C08K 5/5393 - Phosphonous compounds, e.g. R—P(OR')2
  • C08K 7/08 - Oxygen-containing compounds

79.

LAMINATE AND ROLL BODY

      
Application Number JP2023025700
Publication Number 2024/018962
Status In Force
Filing Date 2023-07-12
Publication Date 2024-01-25
Owner AGC INC. (Japan)
Inventor
  • Okuya Tamao
  • Hayabe Shintaro

Abstract

Provided is a laminate which has excellent adhesion between a release layer and a solid polymer electrolyte membrane, and has excellent properties of being unwound from a roll body obtained through winding. The laminate comprises: a peelable substrate including a support and a release layer; and a solid polymer electrolyte membrane disposed on the release layer of the peelable substrate, wherein the solid polymer electrolyte membrane includes a fluorine-containing polymer having an ion exchange group, and a woven fabric.

IPC Classes  ?

  • H01M 8/1062 - Polymeric electrolyte materials characterised by a porous support having no ion-conducting properties characterised by the physical properties of the porous support, e.g. its porosity or thickness
  • H01M 8/10 - Fuel cells with solid electrolytes
  • H01M 8/1025 - Polymeric electrolyte materials characterised by the chemical structure of the main chain of the ion-conducting polymer having only carbon and oxygen, e.g. polyethers, sulfonated polyetheretherketones [S-PEEK], sulfonated polysaccharides, sulfonated celluloses or sulfonated polyesters
  • H01M 8/1039 - Polymeric electrolyte materials halogenated, e.g. sulfonated polyvinylidene fluorides
  • H01M 8/1041 - Polymer electrolyte composites, mixtures or blends
  • H01M 8/106 - Polymeric electrolyte materials characterised by a porous support having no ion-conducting properties characterised by the chemical composition of the porous support
  • B32B 5/02 - Layered products characterised by the non-homogeneity or physical structure of a layer characterised by structural features of a layer comprising fibres or filaments
  • B32B 5/28 - Layered products characterised by the non-homogeneity or physical structure of a layer characterised by the presence of two or more layers which comprise fibres, filaments, granules, or powder, or are foamed or specifically porous one layer being a fibrous or filamentary layer impregnated with or embedded in a plastic substance
  • B32B 7/022 - Mechanical properties
  • B32B 7/06 - Interconnection of layers permitting easy separation
  • B32B 27/00 - Layered products essentially comprising synthetic resin
  • B32B 27/30 - Layered products essentially comprising synthetic resin comprising acrylic resin

80.

SULFIDE SOLID ELECTROLYTE, AND METHOD FOR PRODUCING SAME

      
Application Number JP2023025802
Publication Number 2024/018976
Status In Force
Filing Date 2023-07-12
Publication Date 2024-01-25
Owner AGC INC. (Japan)
Inventor
  • Fujii Naoki
  • Fukutomi Yuki
  • Yusa Tetsuhito

Abstract

427427(P2S7)(PS4)(PS4)} < 1.00, and the sulfide solid electrolyte contains Li, P, S and Ha as constituent elements, and the contents of the constituent elements are as follows, 30-50 at% of Li, 5-15 at% of P, and 30-60 at% of S.

IPC Classes  ?

  • C03C 3/32 - Non-oxide glass compositions, e.g. binary or ternary halides, sulfides, or nitrides of germanium, selenium or tellurium
  • C01B 25/14 - Sulfur, selenium, or tellurium compounds of phosphorus
  • H01B 1/06 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
  • H01B 1/10 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances sulfides
  • H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
  • H01M 10/0562 - Solid materials

81.

MODIFIED POLYTETRAFLUOROETHYLENE, MOLDED ARTICLE, AND STRETCHED POROUS BODY PRODUCTION METHOD

      
Application Number JP2023026055
Publication Number 2024/019010
Status In Force
Filing Date 2023-07-14
Publication Date 2024-01-25
Owner AGC INC. (Japan)
Inventor
  • Ebata Shiro
  • Higuchi Shinya
  • Abe Kaori
  • Taguchi Daisuke
  • Kose Takehiro

Abstract

Provided are: a modified polytetrafluoroethylene from which it is possible to produce a stretched porous body that is superior in terms of breaking strength; a molded article; and a stretched porous body production method. A modified polytetrafluoroethylene according to the present invention includes a unit based on tetrafluoroethylene and a unit based on at least one monomer selected from perfluoro(alkylvinylether), hexafluoropropylene, and fluoroalkylethylene. The modified polytetrafluoroethylene has a thermal instability index of 0-15 and an area ratio S of 0.70 or less as calculated by a predefined method.

IPC Classes  ?

  • C08F 214/26 - Tetrafluoroethene
  • C08J 9/00 - Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
  • B29C 67/20 - Shaping techniques not covered by groups , or for porous or cellular articles, e.g. of foam plastics, coarse-pored

82.

GLASS DIAPHRAGM AND VIBRATOR-EQUIPPED GLASS DIAPHRAGM

      
Application Number JP2023026480
Publication Number 2024/019100
Status In Force
Filing Date 2023-07-19
Publication Date 2024-01-25
Owner AGC INC. (Japan)
Inventor
  • Sakurai, Kento
  • Akiyama, Jun

Abstract

A glass diaphragm (10) comprises a glass sheet structure (12), a mounting unit (14), and a conductive layer (22). The mounting unit (14) includes a base part (16) fixed to the glass sheet structure (12) through an electric releasable adhesive layer (20). Further, a vibrator (24) for vibrating the glass sheet structure (12) is to be attached to the mounting unit (14), and a conductive part (18) is provided to at least a portion of the mounting unit (14). The conductive layer (22) is disposed between the glass sheet structure (12) and the electric releasable adhesive layer (20).

IPC Classes  ?

  • H04R 7/02 - Diaphragms for electromechanical transducers; Cones characterised by the construction
  • H04R 7/06 - Plane diaphragms comprising a plurality of sections or layers

83.

SILICON NITRIDE SINTERED BODY AND METHOD FOR PRODUCING SILICON NITRIDE SINTERED BODY

      
Application Number JP2023026759
Publication Number 2024/019143
Status In Force
Filing Date 2023-07-21
Publication Date 2024-01-25
Owner AGC INC. (Japan)
Inventor
  • Ohkoshi, Kazuto
  • Sato, Hironori
  • Miyakawa, Naomichi
  • Saijo, Yoshitaka
  • Yoshino, Haruhiko
  • Tsukiyama, Keishi

Abstract

The purpose of the present invention is to improve mechanical properties. This silicon nitride sintered body (1) comprises silicon nitride particles (2) and a grain boundary phase (3) positioned around the silicon nitride particles (2). The content value for the silicon nitride particles (2) is 95 wt% or more relative to the entire silicon nitride sintered body (1). The grain boundary phase (3) contains Al, Mg, and Si. The content value for Al in terms of oxide is 6-50 mol% relative to the entire grain boundary phase (3). The content value for Mg in terms of oxide is 20-60 mol% relative to the entire grain boundary phase (3). The content value for Si in terms of oxide is 33-60 mol% relative to the entire grain boundary phase (3).

IPC Classes  ?

84.

REFLECTION-TYPE MASK BLANK, METHOD FOR PRODUCING REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, AND METHOD FOR PRODUCING REFLECTION-TYPE MASK

      
Application Number JP2023021774
Publication Number 2024/014207
Status In Force
Filing Date 2023-06-12
Publication Date 2024-01-18
Owner AGC INC. (Japan)
Inventor
  • Ito Hiroaki
  • Akagi Daijiro
  • Fudetani Taiga

Abstract

The present invention addresses the problem of providing a reflection-type mask blank for which machining error is small when machining by charged particle radiation is carried out. A reflection-type mask blank (10a) includes, in the given order, a substrate (11), a multilayer reflection film (12) that reflects EUV light, a protective film (13), and an absorptive body film (14) having a monolayer structure or a multilayer structure. The reflection-type mask blank is configured: so that any one of layers located between the protective layer and the outermost surface layer which is of the reflection-type mask blank (10a) and which is on the outermost side and on the side opposite the substrate (11), is an insulation layer having a sheet resistance of 1.0×103 Ω/sq. or greater; and so that the inter-layer electrical resistance between the protective layer (13) and the surface of the outermost surface layer, the surface being on the side opposite the substrate (11) is 100 kΩ or less.

IPC Classes  ?

  • G03F 1/40 - Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate
  • C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • G03F 1/24 - Reflection masks; Preparation thereof
  • G03F 1/54 - Absorbers, e.g. opaque materials

85.

METHOD FOR PRODUCING FLUORINE-CONTAINING COPOLYMER

      
Application Number JP2023025196
Publication Number 2024/014400
Status In Force
Filing Date 2023-07-06
Publication Date 2024-01-18
Owner AGC INC. (Japan)
Inventor
  • Orito, Yuki
  • Watanuki, Shun

Abstract

A method for producing a fluorine-containing polymer, the method including conducting polymerization using a monomer that contains vinylidene fluoride in a polymerization medium that contains at least one polymerization solvent A selected from the group consisting of compounds represented by formula (1) and formula (2). The description of formula (1) and formula (2) is omitted.

IPC Classes  ?

86.

ANTIREFLECTION FILM-EQUIPPED TRANSPARENT SUBSTRATE AND IMAGE DISPLAY DEVICE

      
Application Number JP2023025511
Publication Number 2024/014442
Status In Force
Filing Date 2023-07-10
Publication Date 2024-01-18
Owner AGC INC. (Japan)
Inventor
  • Takemoto Kazuya
  • Suzuki Katsumi
  • Takahoshi Hideaki
  • Arae Tomoyuki

Abstract

The present invention pertains to an antireflection film-equipped transparent substrate which has a transparent substrate that has two principal surfaces, and a diffusion layer and an antireflection film that are disposed on one principal surface of the transparent substrate in this order from the transparent substrate side, wherein when reflection on the other principal surface of the transparent substrate is eliminated, and light from a light source is incident on the one principal surface side at an incidence angle of 45°, at a D 65 light source, a*and b*of diffused reflected light at respective angles of -15°, 15°, and 25°with respect to specularly reflected light satisfy expressions (1) and (2). (1): -5 ≤ a*≤ -1, (2): 0 ≤ b* ≤ 9

IPC Classes  ?

  • G02B 1/115 - Multilayers
  • G02B 1/18 - Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
  • G02B 5/02 - Diffusing elements; Afocal elements
  • G02F 1/1335 - Structural association of cells with optical devices, e.g. polarisers or reflectors

87.

SULFIDE-BASED SOLID ELECTROLYTE AND METHOD FOR PRODUCING SAME, ELECTRODE MIXTURE, SOLID ELECTROLYTE LAYER, AND ALL-SOLID-STATE LITHIUM ION SECONDARY BATTERY

      
Application Number JP2023025046
Publication Number 2024/014382
Status In Force
Filing Date 2023-07-05
Publication Date 2024-01-18
Owner AGC INC. (Japan)
Inventor
  • Inaba Makiko
  • Fukumine Mayumi
  • Akatsuka Kosho
  • Fujii Naoki

Abstract

121222, the Li atom is substituted by a Z atom (Si, Al, Sn, Ge, Zn, Sb, In, Cu).

IPC Classes  ?

  • H01B 1/10 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances sulfides
  • C01B 33/20 - Silicates
  • H01B 1/06 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
  • H01B 13/00 - Apparatus or processes specially adapted for manufacturing conductors or cables
  • H01M 4/139 - Processes of manufacture
  • H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
  • H01M 10/052 - Li-accumulators
  • H01M 10/0562 - Solid materials

88.

METHOD FOR PRODUCING FLUORINE-CONTAINING COPOLYMER

      
Application Number JP2023025195
Publication Number 2024/014399
Status In Force
Filing Date 2023-07-06
Publication Date 2024-01-18
Owner AGC INC. (Japan)
Inventor
  • Orito, Yuki
  • Watanuki, Shun

Abstract

The present invention provides a method for producing a fluorine-containing copolymer, wherein polymerization is carried out with use of monomers that include tetrafluoroethylene in a polymerization medium that contains at least one polymerization solvent A which is selected from the group consisting of compounds represented by formula (1) to formula (3). Description of formula (1) to formula (3) is omitted.

IPC Classes  ?

89.

HEAT REFLECTIVE SUBSTRATE, MANUFACTURING METHOD THEREFOR, AND WINDOW GLASS

      
Application Number JP2023025362
Publication Number 2024/014417
Status In Force
Filing Date 2023-07-07
Publication Date 2024-01-18
Owner AGC INC. (Japan)
Inventor
  • Umeda Kenichi
  • Arai Keisuke
  • Kishi Masahiro

Abstract

011) in a region including the slit portion satisfy a specific relationship.

IPC Classes  ?

  • G02B 5/26 - Reflecting filters
  • B32B 3/14 - Layered products essentially comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products essentially having particular features of form characterised by a discontinuous layer, i.e. apertured or formed of separate pieces of material characterised by a face layer formed of separate pieces of material
  • B32B 7/027 - Thermal properties
  • B60J 1/00 - Windows; Windscreens; Accessories therefor
  • C03C 17/09 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
  • C03C 17/245 - Oxides by deposition from the vapour phase
  • H01Q 15/14 - Reflecting surfaces; Equivalent structures

90.

SOLID OXIDE ELECTROLYSIS CELL AND SOLID OXIDE ELECTROLYSIS CELL SYSTEM

      
Application Number JP2023025575
Publication Number 2024/014454
Status In Force
Filing Date 2023-07-11
Publication Date 2024-01-18
Owner AGC INC. (Japan)
Inventor
  • Kurita, Hardiyanto
  • Kaga, Hiroshi
  • Toda, Yoshitake
  • Uesugi, Hideo
  • Tomeno, Satoru

Abstract

Provided is a solid oxide electrolysis cell (SOEC) comprising a fuel electrode, an oxygen electrode, and a solid electrolyte layer between the fuel electrode and the oxygen electrode, the SOEC further comprising an intermediate layer between the solid electrolyte layer and the fuel electrode. The intermediate layer comprises cerium oxide, and the fuel electrode comprises a metal or metal oxide, and a compound A. The proportion of the metal or metal oxide in relation to the entire fuel electrode as a volume ratio in terms of metal is in the range of 40-80 vol%, and the metal includes at least one metal selected from the group consisting of nickel (Ni), copper (Cu), silver (Ag), tungsten (W), platinum (Pt), iron (Fe), and tin (Sn). The compound A includes a mayenite-type compound and/or a perovskite-type compound containing an alkaline earth metal element.

IPC Classes  ?

  • C25B 1/042 - Hydrogen or oxygen by electrolysis of water by electrolysis of steam
  • C04B 35/44 - Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides based on aluminates
  • C04B 35/465 - Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates
  • C25B 1/23 - Carbon monoxide or syngas
  • C25B 11/04 - Electrodes; Manufacture thereof not otherwise provided for characterised by the material

91.

VEHICLE GLASS

      
Application Number JP2023025877
Publication Number 2024/014506
Status In Force
Filing Date 2023-07-13
Publication Date 2024-01-18
Owner AGC INC. (Japan)
Inventor
  • Kobayashi, Yusuke
  • Kitaoka, Kenji

Abstract

Provided is a vehicle glass that properly transmits far-infrared rays and has impact resistance. This vehicle glass (1) has a glass member (10) in which is formed an opening (19) that penetrates from a vehicle-exterior-side surface to a vehicle-interior-side surface, and a transmission member (20) that is disposed within the opening (19) and has an average internal transmittance with respect to light having a wavelength of 8-13 μm of 50% or greater. The ratio Sa/Sb of the destruction speed Sa [km/h] measured on the vehicle-exterior-side surface of the transmission member (20) through a chert stone gravelometer test and the destruction speed Sb [km/h] measured on the vehicle-exterior-side surface of the glass member (10) is 0.7 or greater.

IPC Classes  ?

  • C03C 27/12 - Laminated glass
  • B32B 17/10 - Layered products essentially comprising sheet glass, or fibres of glass, slag or the like comprising glass as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
  • B60J 1/00 - Windows; Windscreens; Accessories therefor
  • C03C 17/34 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions

92.

FLUORINE-CONTAINING COPOLYMER, COMPOSITION, POWDER COATING MATERIAL, COATED ARTICLE, AND METHOD FOR PRODUCING FLUORINE-CONTAINING COPOLYMER

      
Application Number JP2023021768
Publication Number 2024/009696
Status In Force
Filing Date 2023-06-12
Publication Date 2024-01-11
Owner AGC INC. (Japan)
Inventor
  • Hara Yuji
  • Otsugu Satoshi
  • Matsumoto Mitsuhisa
  • Sahashi Yusuke
  • Ochi Shuhei

Abstract

Provided are: a fluorine-containing copolymer capable of obtaining a powder coating material having excellent blocking resistance; a method for producing the fluorine-containing copolymer; a composition; a powder coating material; and a coated article. A fluorine-containing copolymer according to the present invention comprises: a unit based on chlorotrifluoroethylene; and a unit based on vinyl ether, wherein the proportion of components having a molecular weight of at most 1,100, as obtained from an integral molecular weight distribution curve, is at most 0.6%, and the molecular weight distribution is 2.0-3.2.

IPC Classes  ?

  • C08F 216/14 - Monomers containing only one unsaturated aliphatic radical
  • C08F 214/24 - Trifluorochloroethene
  • C08K 5/5435 - Silicon-containing compounds containing oxygen containing oxygen in a ring
  • C08L 27/12 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
  • C08L 29/10 - Homopolymers or copolymers of unsaturated ethers
  • C09D 5/03 - Powdery paints
  • C09D 127/12 - Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms

93.

METHOD FOR PRODUCING FLUORINE-CONTAINING COPOLYMER, METHOD FOR PRODUCING POWDER COATING MATERIAL, METHOD FOR PRODUCING COATED ARTICLE

      
Application Number JP2023021769
Publication Number 2024/009697
Status In Force
Filing Date 2023-06-12
Publication Date 2024-01-11
Owner AGC INC. (Japan)
Inventor
  • Hara Yuji
  • Otsugu Satoshi
  • Matsumoto Mitsuhisa
  • Sahashi Yusuke
  • Ochi Shuhei

Abstract

Provided are: a method for producing a fluorine-containing copolymer having excellent heat stability, imparting excellent glossiness to a coating film when used to form the coating film, and further suppressing the coloring of the coating film; a method for producing a powder coating material; and a method for producing a coated article. This method for producing a fluorine-containing copolymer containing a unit based on chlorotrifluoroethylene and a unit based on vinyl ether involves using a radical polymerization initiator, a piperidyl group-containing compound, and a hydrotalcite to polymerize a monomer that includes chlorotrifluoroethylene and vinyl ether, wherein: the ratio of the molar amount of the piperidyl group in the piperidyl group-containing compound to the molar amount of the total amount of monomers used is 0.0032-0.010; the mass ratio of the amount of the hydrotalcite used to the amount of the piperidyl group-containing compound used is 0.3 to 4.6 (exclusive of 4.6); and the chlorotrifluoroethylene and the vinyl ether are continuously or intermittently supplied to a reaction system, after the polymerization initiation.

IPC Classes  ?

  • C08F 2/38 - Polymerisation using regulators, e.g. chain terminating agents
  • C08F 2/44 - Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
  • C08F 214/24 - Trifluorochloroethene
  • C08F 216/14 - Monomers containing only one unsaturated aliphatic radical
  • C09D 5/03 - Powdery paints
  • C09D 127/12 - Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms

94.

FLUORINE-CONTAINING POLYMER, COMPOSITION, SURFACE TREATMENT AGENT, AND ARTICLE

      
Application Number JP2023021850
Publication Number 2024/009701
Status In Force
Filing Date 2023-06-13
Publication Date 2024-01-11
Owner AGC INC. (Japan)
Inventor
  • Yasu Yusuke
  • Tajima Shinya

Abstract

The present invention provides a fluorine-containing polymer that is capable of forming a coating film having excellent liquid repellency and liquid slippability. Provided is a fluorine-containing polymer comprising a unit A which has a fluorine-containing aliphatic ring structure that constitutes a main chain and a unit B which is based on a fluorine-containing monomer b that has at least one type of heteroatom selected from the group consisting of an oxygen atom and a sulfur atom and that does not have a fluorine-containing aliphatic ring structure constituting a main chain, wherein the residual rate of a polymerizable double bond is not more than 0.5 mol%.

IPC Classes  ?

  • C08F 216/12 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical by an ether radical
  • C08F 214/18 - Monomers containing fluorine
  • C08F 232/00 - Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
  • C08F 234/02 - Copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring in a ring containing oxygen
  • C09D 129/10 - Homopolymers or copolymers of unsaturated ethers
  • C09K 3/18 - Materials not provided for elsewhere for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

95.

CROSSLINKED PRODUCT OF FLUORINE-CONTAINING COPOLYMER AND FLUORINE-CONTAINING COPOLYMER COMPOSITION

      
Application Number JP2023022854
Publication Number 2024/009764
Status In Force
Filing Date 2023-06-21
Publication Date 2024-01-11
Owner AGC INC. (Japan)
Inventor
  • Usuda Tsukasa
  • Watanuki Shun
  • Tajima Shinya

Abstract

22- group, and a compound (D) that has a specific structure.

IPC Classes  ?

  • C08F 214/18 - Monomers containing fluorine
  • C08K 5/24 - Derivatives of hydrazine
  • C08L 27/12 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms

96.

REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, AND REFLECTIVE MASK MANUFACTURING METHOD

      
Application Number JP2023023537
Publication Number 2024/009819
Status In Force
Filing Date 2023-06-26
Publication Date 2024-01-11
Owner AGC INC. (Japan)
Inventor
  • Nagata, Yuya
  • Akagi, Daijiro
  • Sasaki, Kenichi
  • Iwaoka, Hiroaki

Abstract

This reflective mask blank comprises, in the stated order, a substrate, a multi-layered reflective film that reflects EUV light, a protective film that protects the multi-layered reflective film, and a phase shift film that shifts the phase of the EUV light. The phase shift film is formed from an Ir-based material mainly containing Ir. The protective film is formed from a Rh-based material mainly containing Rh.

IPC Classes  ?

  • G03F 1/24 - Reflection masks; Preparation thereof

97.

METHOD FOR PRODUCING SLURRY CONTAINING SPHERICAL INORGANIC PARTICLES

      
Application Number JP2023024298
Publication Number 2024/009896
Status In Force
Filing Date 2023-06-29
Publication Date 2024-01-11
Owner AGC INC. (Japan)
Inventor
  • Nakahara Katsumasa
  • Katayama Hajime

Abstract

The present invention provides a method which is for producing, by wet classification, a slurry containing spherical inorganic particles and in which spherical inorganic particles having a narrow particle-size distribution are continuously obtained. This production method comprises passing a crude slurry containing spherical inorganic particles through a separation membrane to produce a slurry, wherein the separation membrane has pores that are approximately even in size, and a flow along the surface of the separation membrane is formed on the primary side of the separation membrane and ultrasonic waves are applied to the separation membrane.

IPC Classes  ?

  • B01D 61/14 - Ultrafiltration; Microfiltration
  • B01D 61/58 - Multistep processes
  • B01D 65/08 - Prevention of membrane fouling or of concentration polarisation
  • B07B 1/28 - Moving screens not otherwise provided for, e.g. swinging, reciprocating, rocking, tilting, or wobbling screens
  • C01B 33/18 - Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
  • B03B 5/00 - Washing granular, powdered or lumpy materials; Wet separating

98.

FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING COPOLYMER AND FLUORINE-CONTAINING COPOLYMER COMPOSITION

      
Application Number JP2023022853
Publication Number 2024/009763
Status In Force
Filing Date 2023-06-21
Publication Date 2024-01-11
Owner AGC INC. (Japan)
Inventor
  • Usuda Tsukasa
  • Watanuki Shun
  • Tajima Shinya

Abstract

The present invention provides: a fluorine-containing compound which is suitable for the achievement of a rubber that has both excellent short-term heat resistance and excellent long-term heat resistance; a fluorine-containing copolymer which uses this fluorine-containing compound; and a fluorine-containing copolymer composition. The present invention provides a fluorine-containing compound which is represented by formula (1), a fluorine-containing copolymer which uses this fluorine-containing compound, and a fluorine-containing copolymer composition. In formula (1), each of R1to R3independently represents a hydrogen atom or a fluorine atom; R4represents a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 8 carbon atoms, while having no carbonyl group; Z represents an oxygen atom, a sulfur atom or -N(R5)-; R5represents a hydrogen atom or a monovalent organic group having 1 to 4 carbon atoms; X represents a single bond or a difluoromethylene group; each of Y1to Y4 independently represents a fluorine atom or a trifluoromethyl group; and Q represents a perfluoroalkylene group having 1 to 8 carbon atoms, the perfluoroalkylene group optionally containing an ether oxygen atom.

IPC Classes  ?

  • C07C 49/255 - Unsaturated compounds containing keto groups bound to acyclic carbon atoms containing ether groups, groups, groups, or groups
  • C08F 214/18 - Monomers containing fluorine
  • C08K 5/24 - Derivatives of hydrazine
  • C08L 27/12 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms

99.

REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, AND REFLECTIVE MASK MANUFACTURING METHOD

      
Application Number JP2023023323
Publication Number 2024/009809
Status In Force
Filing Date 2023-06-23
Publication Date 2024-01-11
Owner AGC INC. (Japan)
Inventor
  • Nagata, Yuya
  • Akagi, Daijiro
  • Sasaki, Kenichi
  • Iwaoka, Hiroaki

Abstract

This reflective mask blank has, in the following order, a substrate, a multilayer reflective film that reflects EUV light, a protective film that protects the multilayer reflective film, and a phase shift film that shifts the phase of the EUV light. The phase shift film includes Ir as the main material component, has a ratio (Ip/Ia) of the peak intensity maximum value Ip in the 2θ range from 35° to 45° to the average intensity value Ia in the 2θ range from 55° to 60° of 1.0 to 30 as determined by XRD with CuKα rays, has a refractive index n for the EUV light of 0.925 or less, and has an extinction coefficient k for the EUV light of 0.030 or more.

IPC Classes  ?

  • G03F 1/24 - Reflection masks; Preparation thereof
  • C23C 14/04 - Coating on selected surface areas, e.g. using masks
  • C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C 14/34 - Sputtering

100.

ANTENNA

      
Application Number JP2023023924
Publication Number 2024/009865
Status In Force
Filing Date 2023-06-28
Publication Date 2024-01-11
Owner AGC INC. (Japan)
Inventor
  • Hao Yang
  • Giddens Henry
  • Kagaya Osamu
  • Nagae Shimpei

Abstract

The purpose of the present invention is to provide a compact directional antenna. This radio wave deflection element (1) is configured as a plate-shaped member which comprises a plurality of layered dielectric layers (L1-L6), has a main plane which is perpendicular to a first direction, and is oriented in a manner such that the lengthwise direction thereof is a second direction which is perpendicular to the first direction. A radio wave source (2) is separated from the radio wave deflection element (1) in the first direction, is positioned so as to be offset only by a prescribed distance in the first direction from the center of the radio wave deflection element (1), and emits a radio wave toward the radio wave deflection element (1). The dielectric constant of the plurality of dielectric layers (L1-L6) incrementally decreases in a direction which is farther from the center of the radio wave deflection element (1) in the first direction.

IPC Classes  ?

  • H01Q 15/02 - Refracting or diffracting devices, e.g. lens, prism
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