ASML Netherlands B.V.

Pays‑Bas


 
Quantité totale PI 6 799
Quantité totale incluant filiales 6 799 (+ 0 pour les filiales)
Rang # Quantité totale PI 139
Note d'activité PI 4,2/5.0    4 446
Rang # Activité PI 131
Parent ASML Holding N.V.
Classe Nice dominante Appareils et instruments scienti...

Brevets

Marques

3 903 42
51 7
2 720 39
37
 
Dernier brevet 2024 - Metrology target simulation
Premier brevet 1990 - Two-step positioning device usin...
Dernière marque 2023 - ASML PAS
Première marque 1999 - TWINSCAN

Filiales

1 subsidiaries with IP (0 patents, 0 trademarks)

 S'inscrire grtuitement pour accéder à la liste des filiales

Industrie (Classification de Nice)

Derniers inventions, produits et services

2023 Invention Method of compensating for an effect of electrode distortion, assessment system. Assessment syst...
Invention Apparatus for and method of reducing contamination from source material in an euv light source. ...
Invention Charged particle device and method. The present disclosure provides a charged particle optical d...
Invention Charged particle optical device, objective lens assembly, detector, detector array, and methods. ...
Invention Target delivery system. A target delivery system for an extreme ultraviolet (EUV) light source i...
Invention Hollow-core photonic crystal fiber based broadband radiation generator. A broadband radiation so...
Invention A method for characterizing a manufacturing process of semiconductor devices. A method of determ...
Invention Method for generating patterning device pattern at patch boundary. A method for generating a mas...
Invention Guiding device and associated system. An extreme ultraviolet radiation (EUV) source, including: ...
Invention Apparatus and method for determining a condition associated with a pellicle. An apparatus for de...
Invention Adc calibration for microscopy. A method of calibrating analog-to-digital converters, ADCs, of a ...
Invention Scanning electron microscopy (sem) back-scattering electron (bse) focused target and method. A me...
Invention Electron-optical module. A charged particle-optical module (41) for directing charged particles a...
Invention Tunable optical system. Systems and methods for providing variable spot size and variable focus a...
Invention Systems for path compensation with a moving objective. Disclosed is a mirror set having a first m...
Invention Methods and system for determining aberrations of a projection system. Methods, and corresponding...
Invention Positioning system for an optical element of a metrology apparatus. A positioning system for an o...
Invention Parameterized inspection image simulation. An improved method, apparatus, and system for generati...
Invention Charged particle apparatus. The present invention provides a charged particle apparatus for proje...
Invention Pellicle and methods for forming pellicle for use in a lithographic apparatus. A pellicle for use...
Invention A patterning device voltage biasing system for use in euv lithography. A patterning device voltag...
Invention Method and apparatus for controlling a lithographic apparatus, and a lithographic apparatus. A co...
Invention System and method for image resolution characterization. Systems, apparatuses, and methods includ...
Invention System and method for image disturbance compensation. Systems, apparatuses, and methods include a...
Invention Method of forming a patterned layer of material, apparatus for forming a patterned layer of mater...
Invention Optical alignment system and method. An optical alignment system comprising an illumination syste...
Invention Readout design for charged particle counting detectors. A charged particle beam detector may incl...
Invention Method and apparatus for bonding substrates. A device for aligning and placing electrical compone...
Invention Mixed energy control in an euv lithography system. A system for and method of controlling extreme...
Invention Cooling device for cooling a position-sensitive component of a lithography system. A cooling devi...
Invention Illumination adjustment apparatuses and lithographic apparatuses. An illumination adjustment appa...
Invention Metrology method and associated metrology device. Disclosed is a dark-field metrology method. A f...
Invention Measuring contrast and critical dimension using an alignment sensor. A method can include directi...
Invention Euv radiation beam power reduction. A method of providing an additional EUV radiation exposure of...
Invention A multi-pass radiation device. A radiation device for generating broadband output radiation upon ...
Invention Holographic metrology apparatus and method. A method of determining a parameter of interest of a ...
P/S Machines for micro lithography and machines for use in the manufacture, fabrication and treatment...
P/S Machines for micro lithography and machines for use in the fields of integrated circuits, semico...
P/S Registered software, namely, recorded software for the storage, processing and generation of data...
P/S Software, especially software for the storage, processing and generation of data and graphics.
2022 P/S Software, especially software for the storage, processing and generation of data and graphics.
P/S Micro-lithography apparatus and instruments for use in the electronics, micro-lithography, semi-c...
Invention Configuration of patterning process. Methods for configuring a patterning process based on resul...
Invention A machine learning model using target pattern and reference layer pattern to determine optical pr...
Invention Method to predict metrology offset of a semiconductor manufacturing process. A method for determ...
Invention A method of determining a measurement recipe and associated metrology methods and apparatuses. A...
2021 Invention Novel interface definition for lithographic apparatus. A method for representing control paramet...
Invention Metrology method and system and lithographic system. A method for measuring a parameter of inter...
Invention Methods and apparatus for acoustic metrology. A metrology apparatus for determining one or more ...
Invention Metrology target simulation. A method of simulating an electromagnetic response of a metrology t...
Invention Intensity order difference based metrology system, lithographic apparatus, and methods thereof. ...
Invention Feature based cell extraction for pattern regions. Systems and methods of feature-based cell ext...
P/S Recorded software, in particular software for the storage, processing, and generation of data and...
Invention Semiconductor charged particle detector for microscopy. A detector may be provided for a charged...
2020 P/S Maintenance and repair services in connection with machines for use in microlithography and in th...
P/S Maintenance and repair services in connection with machines for use in the electronics, micro-lit...
Invention Methods of fitting measurement data to a model and modeling a performance parameter distribution ...
Invention Patterning device conditioning system and method. A reticle conditioning system includes: a supp...
P/S Maintenance and repair services in connection with machines for use in the electronics, micro-li...
2018 P/S Computer hardware and software for the design and manufacture of semiconductor wafers and masks; ...
P/S Computer hardware and software for the design and manufacture of semiconductor wafers and masks;...
2017 P/S Semiconductor lithographic machines, namely, lithographic machines used to manufacture semiconduc...
P/S Computer hardware for improving lithography manufacturing processes; computer software for impro...
P/S Computer hardware for improving lithography manufacturing processes; computer software for improv...
P/S Micro-lithography machines, namely, machines for manufacturing electronic components, integrated ...
2016 P/S Micro-lithography equipment; machines for use in the manufacture by micro-lithography, especially...
2015 P/S Exposure units being optical instruments and their parts, for use in lithographic machines, namel...
P/S Exposure units [optical instruments] and their parts, for use in lithographic machines.
P/S Machine tool for mounting, demounting and remounting a pellicle to a reticle in lithographic equ...
P/S Electronic inspection devices, data processors, computer hardware and software for defect inspect...
P/S [ Electronic inspection devices and ] computer software for inspection of semiconductor materials...
P/S Inspection tool using particle beam for inspection of semiconductor materials, devices and products
2014 P/S Process control equipment for semiconductor wafer production, namely particle beam emitter in the...
P/S Optical measuring apparatus and instruments for measuring test wafers for the manufacture of elec...
P/S Optical measuring apparatus and instruments for measuring test wafers for the manufacture of ele...
2013 P/S Electronic imaging platforms in the field of inspection of semiconductor materials, namely, semic...
P/S Machinery maintenance and repair in the field of semiconductor industry; installation of semicond...
P/S Technology supervision and inspection in the field of quality control of semiconductor wafers and...
2012 P/S testing and inspection in the field of quality control of semiconductor wafers and reticles
P/S Micro-lithography machines; machines for use in the electronics, integrated circuit, semi-conduc...
2011 P/S Machines for micro-lithography, namely, machines for manufacturing semiconductors; machines not i...
P/S Micro-lithography equipment; machines for use in industry in the field of electronics, integrated...
P/S Machines for micro-lithography; machines not included in other classes, for use in the field of ...