Tokyo Electron Limited

Japon


 
Quantité totale PI 11 550
Quantité totale incluant filiales 11 629 (+ 176 pour les filiales)
Rang # Quantité totale PI 70
Note d'activité PI 4,4/5.0    7 654
Rang # Activité PI 68
Activité incl filiales 4,2/5.0    7 657
Symbole boursier
ISIN JP3571400005
Capitalisation 8668609632540.0  (JPY)
Industrie Semiconductor Equipment & Materials
Secteur Technology
Classe Nice dominante Machines et machines-outils

Brevets

Marques

7 235 88
0 2
4 130 88
7
 
Dernier brevet 2024 - Methods to prevent surface charg...
Premier brevet 1978 - Magnetron sputtering target and ...
Dernière marque 2024 - UCVD
Première marque 1989 - TEL

Filiales

6 subsidiaries with IP (174 patents, 2 trademarks)

2 subsidiaries without IP

 S'inscrire grtuitement pour accéder à la liste des filiales

Industrie (Classification de Nice)

Derniers inventions, produits et services

2024 P/S Semiconductor manufacturing machines and their component parts and fittings; flat panel display ...
2023 Invention Substrate processing apparatus. A heat treatment unit U2 includes a heat plate 20 configured to ...
Invention Film deposition apparatus for fine pattern forming. In a mask pattern forming method, a resist f...
Invention Substrate processing method and substrate processing apparatus. A substrate processing method in...
P/S Semiconductor manufacturing machines and their component parts and fittings; flat panel display m...
Invention Substrate processing method. A substrate processing apparatus includes: a mixer configured to mi...
Invention Solution treatment apparatus and cleaning method. A cleaning method of cleaning a solution treat...
Invention Plasma monitoring system, plasma monitoring method, and monitoring device. A plasma monitoring s...
Invention Plasma processing apparatus and rf system. A plasma processing apparatus includes: a chamber; a ...
Invention Plasma processing apparatus, calculation method, and calculation program. In a plasma processing...
Invention Substrate processing control method, substrate processing apparatus and storage medium. A substr...
Invention Vacuum processing apparatus and oxidizing gas removal method. A vacuum processing apparatus incl...
P/S Semiconductor manufacturing machines; component parts and fittings for semiconductor manufacturin...
Invention Etching control device, etching control method, and etching control system. An etching control d...
Invention Etching control system and etching control method. An etching control system includes a predicti...
Invention Bonding apparatus and bonding method. A bonding apparatus includes a first holder, a second hold...
Invention Substrate treatment apparatus and treatment solution supply method. A substrate treatment appara...
Invention Liquid raw material supplying method and gas supply apparatus. Provided is a method of supplying...
Invention Substrate processing method and substrate processing system. Provided is a technology for reducin...
Invention Information processing apparatus and parameter control method. An information processing apparat...
Invention Substrate processing apparatus, substrate processing method, and storage medium thereof. A subst...
Invention Film forming method and film forming system. Provided is a film forming method for forming a grap...
Invention Electrostatic chuck and substrate processing device. The present invention provides an electrosta...
Invention Plasma processing apparatus. A plasma processing apparatus includes: a chamber providing a proce...
Invention Substrate processing apparatus and substrate processing method. This substrate processing apparat...
Invention Patterning a semiconductor workpiece. In certain embodiments, a method includes depositing a phot...
Invention Plasma processing device. Provided is a plasma processing device comprising: a processing vessel ...
Invention Substrate treatment system. Provided is a substrate treatment system comprising: a treatment devi...
Invention Surface modification to achieve selective isotropic etch. A surface of a substrate is modified, w...
Invention Wet etch process and methods to form air gaps between metal interconnects. Embodiments of improve...
Invention Wet etch process and method to provide uniform etching of material formed within features having ...
Invention Substrate bombardment with ions having targeted mass using pulsed bias phase control. A method of...
Invention Method of forming a moisture barrier on photosensitive organometallic oxides. Various embodiment...
P/S Machines and instruments used for measuring and testing semiconductor manufacturing machines; com...
P/S Machines and instruments used for measuring and testing semiconductor manufacturing machines; co...
2022 P/S Downloadable computer software for controlling semiconductor manufacturing processes; downloadabl...
P/S Downloadable computer software for controlling semiconductor manufacturing processes; downloadab...
P/S Semiconductor manufacturing machines and their component parts and fittings
Invention Method and apparatus for in-situ dry development. An embodiment etching tool includes an etch ch...
P/S Semiconductor manufacturing machines and their component parts and fittings.
Invention High aspect ratio contact (harc) etch. A method of processing a substrate that includes: flowing...
Invention Optical emission spectroscopy for advanced process characterization. A method of characterizing ...
Invention Methods to prevent surface charge induced cd-dependent etching of material formed within features...
Invention High performance 3d compact transistor architecture. Semiconductor devices and corresponding met...
Invention Surface modification to achieve selective isotropic etch. A surface of a substrate is modified, ...
Invention Substrate bombardment with ions having targeted mass using pulsed bias phase control. A method o...
Invention Method for processing a substrate. A method of patterning a substrate includes forming a first l...
Invention Patterning a semiconductor workpiece. In certain embodiments, a method includes depositing a pho...
Invention Wet etch process and method to control fin height and channel area in a fin field effect transist...
Invention Substrate processing system and condition monitoring method. A substrate processing system is pr...
Invention Method for forming silicon-containing film and film forming apparatus. A method for forming a si...
Invention Method of forming silicon nitride film and film forming apparatus. A method of forming a silicon...
2021 Invention Substrate processing apparatus and substrate processing method. A substrate processing apparatus...
Invention Substrate processing method and substrate processing apparatus. A processing method of a combine...
P/S Semiconductor manufacturing machines and their component parts and fittings; machines for mainten...
P/S Semiconductor manufacturing machines and their component parts and fittings; machines for mainte...
2020 P/S Semiconductor manufacturing machines and their structural parts; flat panel display manufacturing...
P/S Semiconductor manufacturing machines