Femtometrix, Inc.

États‑Unis d’Amérique

 
Quantité totale PI 40
Rang # Quantité totale PI 34 096
Note d'activité PI 2,5/5.0    45
Rang # Activité PI 16 493
Classe Nice dominante Appareils et instruments scienti...

Brevets

Marques

25 1
1 0
13 0
0
 
Dernier brevet 2024 - Apparatus and method of increasi...
Premier brevet 1999 - Chemical sensor array
Dernière marque 2022 - HARMONIC F3X
Première marque 2022 - HARMONIC F3X

Industrie (Classification de Nice)

Derniers inventions, produits et services

2023 Invention Surface sensing systems and methods for imaging a scanned surface of a sample via sum-frequency v...
Invention Method and apparatus for main detector synchronization of optically based second harmonic generat...
Invention Method and apparatus for separation of the second harmonic generation components, through variati...
Invention Apparatus and method of increasing precision control of charge deposition onto a semiconductor wa...
Invention Method and apparatus for non-invasive, non-intrusive, and un-grounded, simultaneous corona deposi...
Invention Method and apparatus for non-invasive semiconductor technique for measuring dielectric/semiconduc...
Invention Method and apparatus for non-invasive, non-intrusive, and ungrounded, simultaneous corona deposit...
Invention Dimensional metrology using non-linear optics. Systems and methods are disclosed for using secon...
Invention Dimensional metrology using non-linear optics. Systems and methods are disclosed for using second...
2022 Invention Second-harmonic generation for critical dimensional metrology. Systems and methods are disclosed...
Invention Second-harmonic generation for critical dimensional metrology. Systems and methods are disclosed ...
P/S Optical frequency metrology devices
Invention Wafer metrology technologies. Various approaches can be used to interrogate a surface such as a ...
2021 Invention Systems for parsing material properties from within shg signals. Semiconductor metrology systems...
Invention Pump and probe type second harmonic generation metrology. Various approaches to can be used to in...
2020 Invention Wafer metrology technologies. Various approaches can be used to interrogate a surface such as a s...
2019 Invention Systems for parsing material properties from within shg signals. Semiconductor metrology systems ...
Invention Field-biased second harmonic generation metrology. Various approaches can be used to interrogate ...
Invention Second harmonic generation (shg) optical inspection system designs. Second Harmonic Generation (S...
Invention Systems and methods for determining characteristics of semiconductor devices. Second Harmonic Ge...
Invention Field-biased nonlinear optical metrology using corona discharge source. Various approaches can b...
Invention Field-biased nonlinear optical metrology using corona discharge source. Various approaches can be...
Invention Systems and methods for determining characteristics of semiconductor devices. Second Harmonic Gen...
2018 Invention Charge decay measurement systems and methods. Various approaches to can be used to interrogate a...
2015 Invention Field-biased second harmonic generation metrology. Various approaches can be used to interrogate...
Invention Pump and probe type second harmonic generation metrology. Various approaches to can be used to i...
Invention Wafer metrology techonologies. Various approaches can be used to interrogate a surface such as a...
Invention Wafer metrology technologies. Various approached to can be used to interrogate a surface such as ...
2000 Invention Apparatus and method for collecting and detecting chemicals. An apparatus (10) for detecting chem...
1999 Invention Chemical sensor array. A device for detecting chemical substances includes a plurality of sensors...
Invention Pulsed air sampler. A device samples chemicals adsorbed to a surface by applying a pulse of fluid...