A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):
A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):
A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):
wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08G 12/26 - Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
C09D 161/26 - Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
A compound of Formula (5-1) or Formula (5-3):
A compound of Formula (5-1) or Formula (5-3):
A compound of Formula (5-1) or Formula (5-3):
where R17 and R21 are each an ethyl group; R22 and R23 are each a methyl group; and R16 and R20 are each a methoxy group.
C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
C08G 77/50 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
C08G 77/14 - Polysiloxanes containing silicon bound to oxygen-containing groups
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):
2.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
G03F 7/40 - Treatment after imagewise removal, e.g. baking
C08G 12/26 - Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
C08G 16/02 - Condensation polymers of aldehydes or ketones with monomers not provided for in the groups of aldehydes
C09D 161/26 - Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
4.
Amorphous metal oxide semiconductor layer and semiconductor device
Methods for producing the amorphous metal oxide semiconductor layer where amorphous metal oxide semiconductor layer is formed by use of a precursor composition containing a metal salt, a primary amide, and a water-based solution. The methodology for producing the amorphous metal oxide semiconductor layer includes applying the precursor composition onto a substrate to form a precursor film, and firing the film at a temperature of 150° C. or higher and lower than 300° C.
H01L 29/24 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only inorganic semiconductor materials not provided for in groups , , or
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
C04B 35/626 - Preparing or treating the powders individually or as batches
C04B 35/01 - Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides
C04B 35/453 - Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides based on zinc, tin or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
5.
METHOD FOR PREPARING LIQUID MEDIUM COMPOSITION, AND PREPARATION DEVICE AND KIT THEREFOR
The present invention provides a method capable of easily mixing any liquid containing a linking substance such as a divalent metal cation and the like with a liquid containing a particular compound at a high concentration, and capable of producing a liquid medium composition comprising fine structures dispersed therein, and a production device therefor and a kit therefor. The first liquid containing a particular compound is passed through a through-hole having a given cross-sectional area formed in a nozzle part at a given flow rate and injected into the second liquid at a given flow rate. By this simple operation, a structure in which the particular compound is bonded via the linking substance is formed, and the structure is preferably dispersed in a mixture of the both liquids.
A substrate is coated with a transparent coating film using a coating liquid for forming a transparent coating film including metal oxide particles and a matrix formation component. The metal oxide particles each include a metal oxide particle containing titanium oxide coated with silicon dioxide-stannic oxide complex oxide, including a titanium oxide-containing core particle; and a coating layer with which the titanium oxide-containing core particle is coated and that is made of silicon dioxide-stannic oxide complex oxide colloidal particles having a mass ratio of silicon dioxide/stannic oxide of 0.1 to 5.0, where one or more intermediate thin film layers that are made of any one of an oxide; a complex oxide of at least one element selected from Si, Al, Sn, Zr, Zn, Sb, Nb, Ta, and W; and a mixture of the oxide and the complex oxide are interposed between the core particle and the coating layer.
A transdermally absorbable base material including: a lipid peptide compound including at least one of compound of Formula (1) below and the similar compounds or pharmaceutically usable salts thereof; a surfactant; a specific polyhydric alcohol; a fatty acid; and water,
2 group, or a 5-membered cyclic group optionally having 1 to 3 nitrogen atoms, a 6-membered cyclic group optionally having 1 to 3 nitrogen atoms, or a condensed heterocyclic group constituted by a 5-membered cyclic group and a 6-membered cyclic group which optionally have 1 to 3 nitrogen atoms.
3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure may further include an alkyl partial structure. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further includes a coating film resin, the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acrylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08L 33/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
A method includes applying a composition for forming a resist underlayer film to a substrate having a recess in a surface, and baking the composition for forming a resist underlayer film to form a resist underlayer film for filling at least the recess. The composition for forming a resist underlayer film has a copolymer having a structural unit of following formula (1), a cross-linkable compound, a cross-linking catalyst, and a solvent:
1-3 alkylene group or a single bond, Z is an —O— group, a —S— group, or a —S—S— group, and Ar is an arylene group.
A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2):
A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2):
A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2):
wherein the crosslinkable compound of Formula (1) or Formula (2) is a compound obtained by reacting a compound of Formula (3) or Formula (4):
A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2):
wherein the crosslinkable compound of Formula (1) or Formula (2) is a compound obtained by reacting a compound of Formula (3) or Formula (4):
A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2):
wherein the crosslinkable compound of Formula (1) or Formula (2) is a compound obtained by reacting a compound of Formula (3) or Formula (4):
with an ether compound comprising a hydroxy group or a C2-10 alcohol.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C09D 161/22 - Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with acyclic or carbocyclic compounds
C09D 161/06 - Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
Photoreactive liquid crystal composition, display element, optical element, method for manufacturing display element, and method for manufacturing optical element
A photoreactive liquid crystal composition containing (A) a photoreactive polymer liquid crystal which includes a photoreactive side chain in which at least one type of reaction selected from (A-1) photocrosslinking and (A-2) photoisomerization occurs, and (B) a low molecular weight liquid crystal. An optical element or display element is formed having a liquid crystal cell including the photoreactive liquid crystal composition.
C09K 19/20 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters
C09K 19/14 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a carbon chain
C09K 19/30 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing saturated or unsaturated non-aromatic rings, e.g. cyclohexane rings
C09K 19/12 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings at least two benzene rings directly linked, e.g. biphenyls
C09K 19/44 - Mixtures of liquid crystal compounds covered by two or more of the preceding groups containing compounds with benzene rings directly linked
C09K 19/04 - Liquid crystal materials characterised by the chemical structure of the liquid crystal components
A method for manufacturing an electroconductive pattern 40, provided with: a lamination step for laminating an acid generation film 10 containing an acid proliferation agent and a photoacid generator on a polymer film 20 containing an electroconductive polymer formed on a substrate 21; a masking step for masking the top of the acid generation film 10; a light irradiation step for irradiating the laminate from the acid-generation-film 10 side; a doping step for doping the electroconductive polymer with an acid generated and proliferated in the acid generation film 10 by the light irradiation; and a releasing step for releasing the acid generation film 10 from the polymer film 20. This method makes it possible to provide an electroconductive film and a method for manufacturing an electroconductive pattern in which photoacid generation and acid proliferation effects are utilized.
G03F 7/34 - Imagewise removal by selective transfer, e.g. peeling away
H01B 1/12 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
H01B 13/00 - Apparatus or processes specially adapted for manufacturing conductors or cables
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
C03C 17/28 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with organic material
H01B 5/14 - Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
13.
Culture medium composition and method of culturing cell or tissue using thereof
The present invention provides a culture method of cells and/or tissues including culturing cells and/or tissues in a suspended state by using a medium composition wherein indeterminate structures are formed in a liquid medium, the structures are uniformly dispersed in the solution and substantially retain the cells and/or tissues without substantially increasing the viscosity of the solution, thus affording an effect of preventing sedimentation thereof, and the like.
1 is an organic group of Formula (2):
3 is an alkoxy group, an acyloxy group, or a halogen group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3], and a ratio of sulfur atoms to silicon atoms is 7% by mole or more in the whole of the silane. A resist underlayer film obtained by applying the resist underlayer film-forming composition onto a semiconductor substrate and baking it.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08G 77/28 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen sulfur-containing groups
Provided is a method for manufacturing a carbonaceous luminescent material in which a polycarboxylic-acid-containing starting material, an acid catalyst, and a solvent are mixed together and heated.
A transdermally absorbable base material including: a lipid peptide compound including at least one of compound of Formula (1) below and the similar compounds or pharmaceutically usable salts thereof; a surfactant; a specific polyhydric alcohol; a fatty acid; and water,
2 group, or a 5-membered cyclic group optionally having 1 to 3 nitrogen atoms, a 6-membered cyclic group optionally having 1 to 3 nitrogen atoms, or a condensed heterocyclic group constituted by a 5-membered cyclic group and a 6-membered cyclic group which optionally have 1 to 3 nitrogen atoms.
A production method for an optical waveguide including: a first step of inserting a needle-like portion at a tip end of an ejection unit into uncured cladding; a second step of moving the needle-like portion in the uncured cladding while ejecting an uncured material from the needle-like portion to form an uncured core surrounded and covered with the uncured cladding; a third step of removing the needle-like portion from the uncured cladding; and a fourth step of curing the uncured cladding and core, wherein the uncured cladding is composed of a composition including a reactive silicone compound composed of a polycondensate of a diarylsilicic acid compound of Formula [1]
and a di(meth)acrylate compound of Formula [3]
and the uncured core is composed of a composition including a reactive silicone compound and an aromatic vinyl compound of Formula [4]
G02B 6/13 - Integrated optical circuits characterised by the manufacturing method
B29K 83/00 - Use of polymers having silicon, with or without sulfur, nitrogen, oxygen or carbon only, in the main chain, as moulding material
G02B 6/12 - Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
18.
Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same
An additive for a resist underlayer film-forming composition, including a copolymer having structural units of the following Formulae (1) to (3):
4 is a linear, branched, or cyclic organic group having a carbon atom number of 1 to 12, wherein at least one hydrogen atom is substituted with a fluoro group and that optionally has at least one hydroxy group as a substituent. A resist underlayer film-forming composition for lithography including additive, a resin that is different from copolymer, organic acid, crosslinker, and solvent, wherein the copolymer's content is 3 parts by mass to 40 parts by mass relative to 100 parts by mass of the resin.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08F 220/36 - Esters containing nitrogen containing oxygen in addition to the carboxy oxygen
G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
A saccharification reaction mixture, a saccharification enzyme composition, and a saccharide production method are aimed to enhance saccharization rate by use of an enzyme in a simple step as well as a method for producing ethanol from a saccharide. The saccharification reaction mixture can saccharify at least one of cellulose and hemicellulose and contains at least one of cellulose and hemicellulose, a saccharification enzyme, silica or a silica-containing substance, and at least one compound (A) selected from the group made of thiourea, a thiourea derivative, an isothiourea derivative, and a salt of any of these.
A polymerizable composition suitable for producing a molded article that can maintain a high refractive index and a low Abbe's number and can be restrained from dimensional changes due to a high-temperature thermal history has (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of a specific fluorene compound and (c) 1 to 100 parts by mass of a specific aromatic vinyl compound. A cured product can be obtained by curing the polymerizable composition.
C08F 220/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
C08F 230/08 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing a metal containing silicon
B29D 11/00 - Producing optical elements, e.g. lenses or prisms
G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
B29K 83/00 - Use of polymers having silicon, with or without sulfur, nitrogen, oxygen or carbon only, in the main chain, as moulding material
C08G 77/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
21.
DNA aptamers binding to molecular targeted agents and detection method of molecular targeted medicine using the same
The objective of the present invention is to provide a DNA aptamer that can specifically binding to a molecular targeted medicine, a composition comprising the DNA aptamer, and a method for detecting a molecular targeted medicine using the DNA aptamer.
A DNA aptamer comprising specifically binding to a molecular targeted medicine, a composition for detecting a molecular targeted medicine comprising the DNA aptamer, a kid for detecting a molecular targeted medicine, and a method for detecting a molecular targeted medicine comprising using the DNA aptamer.
A61K 48/00 - Medicinal preparations containing genetic material which is inserted into cells of the living body to treat genetic diseases; Gene therapy
C07H 21/04 - Compounds containing two or more mononucleotide units having separate phosphate or polyphosphate groups linked by saccharide radicals of nucleoside groups, e.g. nucleic acids with deoxyribosyl as saccharide radical
C12N 15/115 - Aptamers, i.e. nucleic acids binding a target molecule specifically and with high affinity without hybridising therewith
B82Y 5/00 - Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery
B82Y 15/00 - Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
B82Y 25/00 - Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
C07K 16/22 - Immunoglobulins, e.g. monoclonal or polyclonal antibodies against material from animals or humans against growth factors
G01N 33/52 - Use of compounds or compositions for colorimetric, spectrophotometric or fluorometric investigation, e.g. use of reagent paper
Provided is an agent for dispersing an electrically conductive carbon material, in which the agent consists of a polymer which has an oxazoline group in a side chain and which is obtained by using an oxazoline group-containing monomer such as that represented by formula (1) for example, and in which the agent exhibits excellent dispersion of an electrically conductive carbon material and produces a thin film that exhibits excellent adhesion to a current collection substrate when formed into a thin film together with the electrically conductive carbon material.
4 each independently denote a hydrogen atom, a halogen atom, an alkyl group optionally having a branched structure having 1-5 carbon atoms, an aryl group having 6-20 carbon atoms, or an aralkyl group having 7-20 carbon atoms.)
C08F 226/06 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
C08K 7/24 - Expanded, porous or hollow particles inorganic
C08L 33/02 - Homopolymers or copolymers of acids; Metal or ammonium salts thereof
C08L 101/02 - Compositions of unspecified macromolecular compounds characterised by the presence of specified groups
C08L 101/06 - Compositions of unspecified macromolecular compounds characterised by the presence of specified groups containing oxygen atoms
C08L 101/14 - Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity the macromolecular compounds being water soluble or water swellable, e.g. aqueous gels
C09D 133/02 - Homopolymers or copolymers of acids; Metal or ammonium salts thereof
C09D 139/04 - Homopolymers or copolymers of monomers containing heterocyclic rings having nitrogen as ring member
H01B 1/24 - Conductive material dispersed in non-conductive organic material the conductive material comprising carbon-silicon compounds, carbon, or silicon
Inorganic oxide microparticles having amphiphilic organic silane compound bonded thereto, organic solvent dispersion thereof, and composition for film formation
1-18 alkylene group or a vinylene group as a hydrophobic group bonded to a surface of modified metal oxide colloidal particles (C) having a primary particle diameter of 2 to 100 nm, the modified metal oxide colloidal particles wherein a surface of metal oxide colloidal particles (A) having a primary particle diameter of 2 to 60 nm as a nucleus is coated with a coating material (B) including metal oxide colloidal particles having a primary particle diameter of 1 to 4 nm.
A composition for forming a resist underlayer film that has a high dry etching rate, functions as an anti-reflective coating during exposure, and fills a recess having a narrow space and a high aspect ratio. A composition for forming a resist underlayer film has a copolymer having a structural unit of following formula (1), a cross-linkable compound, a cross-linking catalyst, and a solvent:
1-3 alkylene group or a single bond, Z is an —O— group, a —S— group, or a —S—S— group, and Ar is an arylene group. The copolymer is synthesized by a reaction of a carboxyl group of a dicarboxylic acid compound having an —O— group, a —S— group, or a —S—S— group with an epoxy group of a diglycidyl ether compound having an arylene group.
A coating-forming composition for an electrical steel sheet that maintains excellent insulating properties, corrosion resistance, adhesion, and the like required in a coating for an electrical steel sheet, and exhibits excellent viscosity stability, with an increase in viscosity over time being kept gradual. A coating-forming composition for an electrical steel sheet comprises colloidal silica, a phosphate, phenylphosphonic acid or a salt thereof, and an aqueous medium.
C23C 22/00 - Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
26.
Coating film-forming composition and process for producing the same
A coating film-forming composition includes a hydrolysis-condensation product of a hydrolyzable silane and fine inorganic particles subjected to a special dispersion treatment, that can be formed into a highly heat-resistant, highly transparent coating film capable of exhibiting a high refractive index and having a large thickness and excellent storage stability as a coating composition; and a process for producing the coating film-forming composition.
G02B 1/10 - Optical coatings produced by application to, or surface treatment of, optical elements
C09D 185/00 - Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
A method for roughening a surface of a substrate, including: applying a composition containing inorganic particles and organic resin to the surface of the substrate and drying and curing the composition to form an organic resin layer; and etching the substrate by a solution containing hydrogen fluoride, hydrogen peroxide, or an acid, to roughen the surface. Preferably, the solution contains hydrogen fluoride and ammonium fluoride or hydrogen peroxide and ammonia, the resin layer contains a ratio of the particles to the resin of 5 to 50 parts by mass to 100 parts by mass, and the composition is a mixture of silica sol wherein silica is dispersed as the inorganic particles in organic solvent or titanium oxide sol wherein titanium oxide is dispersed, with a solution of the organic resin.
H01L 51/52 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED) - Details of devices
C09D 161/34 - Condensation polymers of aldehydes or ketones with monomers covered by at least two of the groups , and
C03C 17/34 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
C09K 13/06 - Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
C08F 212/32 - Monomers containing only one unsaturated aliphatic radical containing two or more rings
C09K 13/08 - Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
C03C 17/00 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating
C08G 14/06 - Condensation polymers of aldehydes or ketones with two or more other monomers covered by at least two of the groups of aldehydes with phenols and monomers containing hydrogen attached to nitrogen
C03C 15/00 - Surface treatment of glass, not in the form of fibres or filaments, by etching
A nonlinear optically active copolymer having satisfactory orientation characteristics and able to allow for reduction in heat-induced orientation relaxation of a nonlinear optical material, and a nonlinear optical material obtained using the copolymer. The copolymer including at least a repeating unit A having adamantyl group and a repeating unit B having a nonlinear optically active moiety in one molecule, and an organic nonlinear optical material including the copolymer as a component.
An epoxy resin composition in a liquid or solid state having excellent solubility and having high preservation stability. A modified epoxy resin composition including: Compound A containing tris-(2,3-epoxypropyl)-isocyanurate having 1 to 3 glycidyl group(s) in a molecule substituted with a functional group(s) of Formula (1):
2 are each independently an alkyl group, an alkenyl group, an alkynyl group, an aryl group, an aralkyl group, a heterocyclic group; or a halogenated derivative, an aminated derivative, or a nitrated derivative of these groups; and Compound B containing tris-(2,3-epoxypropyl)-isocyanurate, wherein tris-(2,3-epoxypropyl)-isocyanurate of Compound A before the substitution and tris-(2,3-epoxypropyl)-isocyanurate of Compound B comprise 2% by mass to 15% by mass of β-type tris-(2,3-epoxypropyl)-isocyanurate and a remaining percentage of α-type tris-(2,3-epoxypropyl)-isocyanurate based on a total mass of Compound A before the substitution and Compound B.
C08G 59/32 - Epoxy compounds containing three or more epoxy groups
C08G 59/16 - Polycondensates modified by chemical after-treatment by monocarboxylic acids or by anhydrides, halides or low-molecular-weight esters thereof
A resin composition capable of forming a cured film having a high refractive index, high transparency and high heat resistance, and a polymer which is used for the resin composition. A polymer having a structural unit of Formula (1):
2 are each independently an —O— group or a —C(═O)O— group; X is a divalent organic group having at least one aromatic ring or heterocyclic ring, wherein, when the X has two or more aromatic rings or heterocyclic rings, the rings are optionally bonded to each other via a single bond, are optionally bonded to each other via a heteroatom, or optionally form a condensed ring; and Y is a divalent organic group having at least one aromatic ring or condensed ring. A resin composition, includes: the polymer; a cross-linking agent; and a solvent.
G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
31.
Production method for carbon-based light-emitting material
Provided is a production method for a carbon-based light-emitting material that generates light having a wavelength of 500 to 700 nm when exposed to excitation light having a wavelength of 300 to 600 nm. The production method comprises a step for mixing and heating a starting material containing ascorbic acid, an acid catalyst containing an inorganic acid, and a solvent.
A polyester resin composition containing 100 parts by mass of a polyester resin and 0.01 to 10 parts by mass of a 2-amino-1,3,5-triazine derivative of Formula [1]:
a polyester resin molded body obtained by the composition, and a crystal nucleating agent including the triazine derivative. A polyester resin composition containing a crystal nucleating agent that makes it possible to produce, with high productivity, a polyester resin molded product that promotes polyester resin crystallization and maintains high transparency after crystallization and is applicable for a wide variety of uses can be provided.
C08L 67/00 - Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
C01B 33/143 - Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
B01D 15/38 - Selective adsorption, e.g. chromatography characterised by the separation mechanism involving specific interaction not covered by one or more of groups , e.g. affinity, ligand exchange or chiral chromatography
B01J 39/07 - Processes using organic exchangers in the weakly acidic form
B01D 15/36 - Selective adsorption, e.g. chromatography characterised by the separation mechanism involving ionic interaction, e.g. ion-exchange, ion-pair, ion-suppression or ion-exclusion
B01J 45/00 - Ion-exchange in which a complex or a chelate is formed; Use of material as complex or chelate forming ion-exchangers; Treatment of material for improving the complex or chelate forming ion-exchange properties
B01J 47/026 - Column or bed processes using columns or beds of different ion exchange materials in series
A composition applied over a resist pattern includes a modified polysiloxane in which some of silanol groups of a polysiloxane containing a hydrolysis condensate of a hydrolyzable silane are capped, and a solvent, wherein a ratio of silanol groups to all Si atoms contained in the modified polysiloxane is 40 mol % or less. The modified polysiloxane ratio of the silanol groups is adjusted to a desired ratio by reacting the silanol groups of the polysiloxane with an alcohol. A method for producing a semiconductor device having the steps of forming a resist film on a substrate, forming a resist pattern by exposing and developing the resist film, applying the composition over the resist pattern during or after development, and reversing a pattern by removing the resist pattern by etching.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Provided is an electrode for energy storage devices, which is provided with a collector substrate, an undercoat layer that is formed on at least one surface of the collector substrate and contains carbon nanotubes, and an active material layer that is formed on the surface of the undercoat layer, and wherein the active material layer does not contain a conductive assistant.
H01M 4/36 - Selection of substances as active materials, active masses, active liquids
H01G 11/28 - Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features arranged or disposed on a current collector; Layers or phases between electrodes and current collectors, e.g. adhesives
H01G 11/36 - Nanostructures, e.g. nanofibres, nanotubes or fullerenes
H01M 4/505 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
H01M 4/13 - Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
H01M 4/58 - Selection of substances as active materials, active masses, active liquids of polyanionic structures, e.g. phosphates, silicates or borates
H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
H01M 4/48 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
Described herein are non-aqueous ink compositions containing a polythiophene having a repeating unit complying with formula (I) described herein, a transition metal complex having at least one β-diketonate ligand, and a liquid carrier having one or more organic solvents. The present disclosure also concerns the uses of such non-aqueous ink compositions, for example, in organic electronic devices.
C09D 11/102 - Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
C09D 11/033 - Printing inks characterised by features other than the chemical nature of the binder characterised by the solvent
C09D 11/36 - Inkjet printing inks based on non-aqueous solvents
C09D 11/38 - Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
C07F 11/00 - Compounds containing elements of Groups 6 or 16 of the Periodic System
37.
Liquid crystal aligning agent containing crosslinking agent and polymer that has site having isocyanate group and/or blocked isocyanate group and site having photoreactivity, liquid crystal alignment film, and liquid crystal display element
Provided is a liquid crystal display element that can be baked at a low temperature when forming a liquid crystal alignment film capable of imparting an alignment regulating property and a pretilt angle developing property via a photoalignment method. Further provided is a liquid crystal display element in which the liquid crystal pretilt angles are highly stable, and display burn-in hardly occurs even due to long usage. Further provided are a vertical liquid crystal alignment film to be used in the liquid crystal display element, and a liquid crystal aligning agent with which it is possible to provide the vertical liquid crystal alignment film. A liquid crystal aligning agent of the present invention contains: component (A), which is a polymer including (A-1) a site having an isocyanate group and/or a blocked isocyanate group and (A-2) a site having photoreactivity; component (B), which is a compound having, in a molecule, at least two functional groups of at least one type selected from the group consisting of an amino group and a hydroxyl group; and an organic solvent.
The present invention relates to a liquid crystal aligning agent which contains a polymer that has a site having an isocyanate group and/or a blocked isocyanate group, a site having a photoreactive group having photoalignment, and a site having at least one functional group selected from an amino group and a hydroxyl group in each molecule. The present invention provides a liquid crystal display element which enables baking at low temperatures during the formation of a liquid crystal alignment film by a photoalignment method, the liquid crystal alignment film being able to be imparted with alignment regulating property and pretilt angle developing property.
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
C08G 18/81 - Unsaturated isocyanates or isothiocyanates
C09K 19/20 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters
C08F 220/36 - Esters containing nitrogen containing oxygen in addition to the carboxy oxygen
C08F 220/20 - Esters of polyhydric alcohols or phenols
C09K 19/54 - Additives having no specific mesophase
C09K 19/30 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing saturated or unsaturated non-aromatic rings, e.g. cyclohexane rings
C09K 19/04 - Liquid crystal materials characterised by the chemical structure of the liquid crystal components
Provided is an electrode for energy storage devices, which is provided with: a collector substrate; an undercoat layer that is formed on at least one surface of the collector substrate and contains carbon nanotubes; and an active material layer that is formed on the surface of the undercoat layer and contains an active material which contains a titanium-containing oxide.
H01G 11/28 - Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features arranged or disposed on a current collector; Layers or phases between electrodes and current collectors, e.g. adhesives
H01G 11/36 - Nanostructures, e.g. nanofibres, nanotubes or fullerenes
G03F 7/031 - Organic compounds not covered by group
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
C08L 67/07 - Unsaturated polyesters having terminal carbon-to-carbon unsaturated bonds
C08J 3/24 - Crosslinking, e.g. vulcanising, of macromolecules
C08F 299/00 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
C09D 4/06 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
C08F 290/04 - Polymers provided for in subclasses or
C09D 151/08 - Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
C09J 151/08 - Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
(B) component: a compound of Formula (3) below
6 is a single bond or an alkylene group, Y is a single bond or an ester bond, A is a mono- to tetra-valent organic group which optionally contain at least one hetero atom, or a hetero atom, and h is an integer of 1 to 4.
B05D 1/38 - Successively applying liquids or other fluent materials, e.g. without intermediate treatment with intermediate treatment
B05D 3/02 - Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
C08L 33/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
C08L 63/00 - Compositions of epoxy resins; Compositions of derivatives of epoxy resins
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
C08F 220/32 - Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
C09D 133/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
C08F 220/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
C08G 59/18 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
G03F 7/40 - Treatment after imagewise removal, e.g. baking
G02B 1/18 - Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
C08J 3/24 - Crosslinking, e.g. vulcanising, of macromolecules
A method for adjusting hardness of a stick-shaped base material including a lipid peptide compound. A method for adjusting hardness of a gelled solid base material for skin external application including a surfactant, water, and lipid peptide compound including compounds of formulae (1) or similar,
2)n-X group, n is a number from 1 to 4, and X is amino group, the method including adding a pH adjuster to a solution in which the material is dissolved, or a solution including a surfactant, water, and lipid peptide compound including at least one of compounds of formulae (1) to (3) or pharmaceutically usable salts thereof, to adjust the pH of the solution to a weak acidic to neutral range, causing gelation of the solution to form a solid base material for skin external application.
3-bO— and, as a dispersion medium, a mixed solvent formed of a polar solvent S1 having a dielectric constant at 20° C. of 15 or higher and lower than 60 and a non-polar solvent S2 having a dielectric constant at 20° C. of 1 or higher and lower than 15, at a mass ratio (S1/S2) of 0.3 to 6.
C01B 33/14 - Colloidal silica, e.g. dispersions, gels, sols
C08G 81/02 - Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
C01B 33/145 - Preparation of hydroorganosols, organosols or dispersions in an organic medium
C08F 292/00 - Macromolecular compounds obtained by polymerising monomers on to inorganic materials
A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.
C08L 33/08 - Homopolymers or copolymers of acrylic acid esters
C08F 220/64 - Acids; Metal salts or ammonium salts thereof
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
C08F 2/38 - Polymerisation using regulators, e.g. chain terminating agents
C08F 220/20 - Esters of polyhydric alcohols or phenols
G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
There is provided an epoxy resin composition containing an epoxy compound, which has a low viscosity and a low dielectric constant, and when added to a general-purpose epoxy resin composition, can lower a viscosity of the composition and can sufficiently lower a dielectric constant of an epoxy resin cured product obtained from the composition. An epoxy resin composition comprising: (a) an epoxy component containing at least an epoxy compound of formula [1]; and (b) a curing agent:
3 each independently are pentamethylene group, hexamethylene group or heptamethylene group.
C08G 59/02 - Polycondensates containing more than one epoxy group per molecule
C08G 59/40 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the curing agents used
1 is organic group of Formula (2) and is bonded to silicon atom through Si—C bond:
Resist underlayer film, obtained by applying the resist underlayer film-forming composition on semiconductor substrate and baking.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
C09D 183/00 - Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
C08G 77/14 - Polysiloxanes containing silicon bound to oxygen-containing groups
C08G 77/18 - Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
C09D 183/06 - Polysiloxanes containing silicon bound to oxygen-containing groups
A nonaqueous secondary cell provided with: a positive electrode provided with a positive-electrode current-collecting substrate and a positive-electrode active material layer formed thereon, the positive-electrode active material layer being able to absorb or discharge lithium; a negative electrode provided with a negative-electrode current-collecting substrate and a negative-electrode active material layer formed thereon, the negative-electrode active material layer being able to absorb or discharge lithium; a separator interposed between the positive and negative electrodes; and a nonaqueous electrolyte solution. The nonaqueous electrolyte solution contains a sulfonyl imide electrolyte and a nonaqueous organic solvent. An electroconductive protective layer obtained by dispersing an electroconductive carbon material in a binder resin is formed on one or both surfaces of the positive-electrode current-collecting substrate and/or the negative-electrode current-collecting substrate. Regardless of whether the nonaqueous electrolyte solution including the sulfonyl imide electrolyte is used, the nonaqueous secondary cell has good cycle characteristics and high output characteristics.
H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
H01M 4/136 - Electrodes based on inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy
H01M 10/0568 - Liquid materials characterised by the solutes
H01M 10/0569 - Liquid materials characterised by the solvents
H01M 4/58 - Selection of substances as active materials, active masses, active liquids of polyanionic structures, e.g. phosphates, silicates or borates
H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
H01M 4/36 - Selection of substances as active materials, active masses, active liquids
H01B 1/24 - Conductive material dispersed in non-conductive organic material the conductive material comprising carbon-silicon compounds, carbon, or silicon
H01M 4/02 - Electrodes composed of, or comprising, active material
49.
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LONG CHAIN ALKYL GROUP-CONTAINING NOVOLAC
A resist underlayer film-forming composition comprising a novolac resin obtained by reacting an aromatic compound (A) with an aldehyde (B) having formyl group bonded to a secondary carbon atom or tertiary carbon atom of a C2-26 alkyl group. A resist underlayer film-forming composition according to the first aspect, in which the novolac resin comprises a unit structure of Formula (1):
A resist underlayer film-forming composition comprising a novolac resin obtained by reacting an aromatic compound (A) with an aldehyde (B) having formyl group bonded to a secondary carbon atom or tertiary carbon atom of a C2-26 alkyl group. A resist underlayer film-forming composition according to the first aspect, in which the novolac resin comprises a unit structure of Formula (1):
A resist underlayer film-forming composition comprising a novolac resin obtained by reacting an aromatic compound (A) with an aldehyde (B) having formyl group bonded to a secondary carbon atom or tertiary carbon atom of a C2-26 alkyl group. A resist underlayer film-forming composition according to the first aspect, in which the novolac resin comprises a unit structure of Formula (1):
(in Formula (1), A is a bivalence group derived from a C6-40 aromatic compound; b1 is a C1-16 alkyl group; and b2 is a hydrogen atom or a C1-9 alkyl group). A is the bivalent group derived from an aromatic compound comprising an amino group, a hydroxy group, or both an amino group and a hydroxy group.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C09D 161/22 - Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with acyclic or carbocyclic compounds
C08G 8/10 - Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
C09D 161/06 - Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks
50.
Composition for hole trapping layer of organic photoelectric conversion element
Provided is a composition for a hole trapping layer of an organic photoelectric conversion element, such composition: containing a solvent and a charge-transporting substance comprising a polyaniline derivative represented by formula (1); and providing a thin film that is suitable as a hole trapping layer of an organic photoelectric conversion element and can also be used to produce an inverse lamination type organic photoelectric conversion element.
4 groups is an alkoxy group having 1-20 carbon atoms, a thioalkoxy group having 1-20 carbon atoms, an alkyl group having 1-20 carbon atoms, an alkenyl group having 2-20 carbon atoms, an alkynyl group having 2-20 carbon atoms, a haloalkyl group having 1-20 carbon atoms, an aryl group having 6-20 carbon atoms or an aralkyl group having 7-20 carbon atoms, and m and n are numbers that satisfy the relationships 0≤m≤1, 0≤n≤1 and m+n=1.}
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
H01L 51/42 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
H01L 51/44 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Details of devices
H01B 1/12 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
A thermosetting resin composition, a thermosetting resin composition for protective films, a thermosetting resin composition for planarizing films, and a method for producing a cured film, a protective film, or a planarizing film by using the resin composition. A thermosetting resin composition has a polymer having a structural unit of Formula (1) below, a curing agent in an amount of 0% by mass to 30% by mass with respect to the polymer, and a solvent. When the thermosetting resin composition includes the curing agent, the curing agent is at least one compound selected from polyfunctional (meth)acrylate compounds and polyfunctional blocked isocyanate compounds:
2 alkenylene group or alkynylene group).
C09D 167/06 - Unsaturated polyesters having carbon-to-carbon unsaturation
C08F 120/36 - Esters containing nitrogen containing oxygen in addition to the carboxy oxygen
C08G 59/14 - Polycondensates modified by chemical after-treatment
C08F 299/04 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
C08G 63/685 - Polyesters containing atoms other than carbon, hydrogen, and oxygen containing nitrogen
B05D 3/02 - Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
C08G 59/17 - Polycondensates modified by chemical after-treatment by monocarboxylic acids or by anhydrides, halides or low-molecular-weight esters thereof by acrylic or methacrylic acid
An optical waveguide-forming composition: 100 parts by mass of a reactive silicone compound (a) composed of a polycondensate of a diarylsilicic acid compound A of Formula [1]
2 is methyl, ethyl, or vinylphenyl group, and a is 2 or 3, and 1 part by mass to 200 parts by mass of a di(meth)acrylate compound (b) of Formula [3].
2 are an alkylene group, and m and n are 0 or a positive integer, wherein m+n is 0 to 20.
C08F 230/08 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing a metal containing silicon
G02B 6/12 - Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
53.
Saccharification reaction mixture, saccharification enzyme composition, sugar production method, and ethanol production method
A saccharification reaction mixture wherein the reaction mixture can saccharify at least one of cellulose and hemicellulose and contains at least one of cellulose and hemicellulose, a saccharification enzyme, silica or a silica-containing substance, and at least one compound (A) selected from the group including a polyhydric alcohol compound represented by the following formula (1) or a derivative thereof and an acetylene glycol represented by formula (2) or an alkylene oxide adduct thereof. The symbols in the chemical formulas are defined in the specification.
A liquid crystal display device, which includes a first substrate and a second substrate disposed to face each other with a liquid crystal sandwiched therebetween. The first substrate is an electrode-provided substrate having a first electrode and a plurality of second electrodes overlaid on the first electrode via an insulating film, formed on a pixel region on a surface on the liquid crystal side, where one of the first electrode and the second electrodes is a pixel electrode and the other is a counter electrode, having a first liquid crystal alignment film formed on the surface on the liquid crystal side of the first substrate covered with the second electrodes. The second substrate is a substrate having a second liquid crystal alignment film formed on a surface on the liquid crystal side, the second liquid crystal alignment film containing a photosensitive side chain type polymer which develops liquid crystallinity.
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
C08F 20/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
C09D 179/08 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
C08F 283/04 - Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass on to polycarbonamides, polyesteramides or polyimides
2 or less. Since this undercoat foil can be effectively welded by ultrasound, the use thereof allows a low-resistance energy storage device and a simple and effective production method therefor to be provided.
H01G 11/68 - Current collectors characterised by their material
H01G 11/28 - Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features arranged or disposed on a current collector; Layers or phases between electrodes and current collectors, e.g. adhesives
H01G 11/36 - Nanostructures, e.g. nanofibres, nanotubes or fullerenes
H01G 11/70 - Current collectors characterised by their structure
H01G 11/74 - Terminals, e.g. extensions of current collectors
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
C09K 19/20 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters
C09K 19/14 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a carbon chain
C09K 19/04 - Liquid crystal materials characterised by the chemical structure of the liquid crystal components
C09K 19/54 - Additives having no specific mesophase
57.
Water absorbing and releasing body for engine oil, automotive parts including water absorbing and releasing body, and method for producing water absorbing and releasing body for engine oil
A water absorbing and releasing body that absorbs water in engine oil and releases water when the temperature of the engine oil is high in order to maintain the performance of the engine oil, automotive parts including the water absorbing and releasing body, and a method for producing the water absorbing and releasing body for engine oil.
C02F 1/68 - Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
B01D 35/00 - Filtering devices having features not specifically covered by groups , or for applications not specifically covered by groups ; Auxiliary devices for filtration; Filter housing constructions
B01J 20/22 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
C08L 101/14 - Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity the macromolecular compounds being water soluble or water swellable, e.g. aqueous gels
B01J 20/10 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
B01J 20/12 - Naturally occurring clays or bleaching earth
C08L 33/02 - Homopolymers or copolymers of acids; Metal or ammonium salts thereof
58.
Polymerizable composition comprising silsesquioxane compound having acrylic group
There is provided a polymerizable composition suitable to produce a molded product in which high refractive index is maintained, and dimensional change and a transmittance change further caused by a high-temperature heat history can be suppressed. A polymerizable composition comprising (a) 100 parts by mass of a specific reactive silsesquioxane compound and (b) 10 to 2,000 parts by mass of a specific fluorene compound, and a cured product obtained by curing the polymerizable composition, and a resin lens manufactured from the polymerizable composition.
C08G 77/20 - Polysiloxanes containing silicon bound to unsaturated aliphatic groups
C08F 230/08 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing a metal containing silicon
G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
C08G 77/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
B29D 11/00 - Producing optical elements, e.g. lenses or prisms
A method for producing forsterite microparticles having a primary particle size of 1, to 50 nm, as determined through electron microscopy. The method includes spray-drying, in an atmosphere of 50° C. or higher and lower than 300° C., a solution containing a water-soluble magnesium salt and colloidal silica at a mole ratio of magnesium atoms to silicon atoms (Mg/Si) of 2; and subsequently, firing the spray-dried product in air at 800 to 1,000° C.
C04B 35/20 - Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides based on silicates other than clay rich in magnesium oxide
The present invention relates to a polymer composition which contains (A) a photosensitive side-chain polymer that exhibits liquid crystallinity in a predetermined temperature range and has a repeating unit comprising a vertically aligning group, and (B) an organic solvent. The present invention provides: a liquid crystal alignment film which has excellent tilt angle characteristics, while being provided with alignment controllability with high efficiency; a polymer composition which enables the achievement of this liquid crystal alignment film; a twisted nematic liquid crystal display element; and a vertical field switching mode liquid crystal display element.
C08L 101/02 - Compositions of unspecified macromolecular compounds characterised by the presence of specified groups
C08F 238/00 - Copolymers of compounds having one or more carbon-to-carbon triple bonds
C08F 232/08 - Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
C09K 19/02 - Liquid crystal materials characterised by optical, electrical or physical properties of the components, in general
C08F 220/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
C08F 20/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
C08F 216/36 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical by a ketonic radical
C08L 101/12 - Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
An object is to provide a method of manufacturing luminescent nanocarbon with which the luminescent nanocarbon can be efficiently manufactured in large amounts. This method is to manufacture luminescent nanocarbon (Product) from a raw material aqueous solution that contains a carbon source compound and a nitrogen source compound. This method includes a reaction step of heating the raw material aqueous solution from a storage container (Reservoir) in a heating section (Furnace) to react the raw material aqueous solution at a reaction temperature of 100° C. or higher and 500° C. or lower and a cooling step of cooling a reaction solution that contains a reaction product generated in the reaction step. The cooling step is carried out in a bath (Ice bath).
A resist underlayer film forming composition for lithography for forming a resist underlayer film that can be used as a hard mask, including: a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane includes at least one hydrolyzable silane selected from the group made of hydrolyzable silanes of Formula (1), Formula (2), and Formula (3):
A method for producing a semiconductor device including: forming an organic underlayer film on a semiconductor substrate; applying the resist underlayer film forming composition onto the organic underlayer film and baking the composition to form a resist underlayer film; applying a resist film forming composition onto the resist underlayer film to form a resist film; exposing the resist film to light; developing the resist film after exposure to obtain a resist pattern; and etching in this order.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
G03F 7/40 - Treatment after imagewise removal, e.g. baking
C08G 77/18 - Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
C08G 77/28 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen sulfur-containing groups
G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
C08G 77/14 - Polysiloxanes containing silicon bound to oxygen-containing groups
H01L 21/033 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or comprising inorganic layers
C08G 77/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
C09D 183/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
C08G 77/44 - Block- or graft-polymers containing polysiloxane sequences containing only polysiloxane sequences
C08G 77/08 - Preparatory processes characterised by the catalysts used
To provide a novel pesticidal composition, particularly a composition for a fungicide. A fungicidal or bactericidal composition comprising one or more compounds selected from oxime-substituted amide compounds represented by the formula (I), or their N-oxides or salts, and one or more compounds selected from known fungicidal or bactericidal compounds:
5 represents methyl, etc.
A01N 43/36 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom five-membered rings
A01N 37/18 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having three bonds to hetero atoms with at the most two bonds to halogen, e.g. carboxylic acids containing the group —CO—N, e.g. carboxylic acid amides or imides; Thio-analogues thereof
A01N 43/74 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms, as ring hetero atoms five-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,3
A01N 43/40 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
64.
Polymer containing triazine ring and composition containing same
It is possible to obtain a thin film that can form a minute pattern and that has a high index of refraction by using a polymer containing a triazine ring and containing a repeating unit structure represented for example by formula (22) or (26).
C08G 73/06 - Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule; Polyhydrazides; Polyamide acids or similar polyimide precursors
G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C07C 233/03 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having nitrogen atoms of carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals with carbon atoms of carboxamide groups bound to hydrogen atoms
66.
RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING EPOXY ADDUCT HAVING LONG-CHAIN ALKYL GROUP
A resist underlayer film-forming composition in which a coating film having high flattening properties is formed on a substrate. A resist underlayer film-forming composition including an epoxy adduct (C) obtained by reacting an epoxy group-containing compound (A) with an epoxy adduct-forming compound (B), wherein one or both of the epoxy group-containing compound (A) and the epoxy adduct-forming compound (B) contain an optionally branched alkyl group having a carbon atom number of three or more. The epoxy adduct-forming compound (B) is at least one compound selected from the group consisting of carboxylic acid (B1), carboxylic anhydride (B2), a phenol compound (B3), a hydroxyl group-containing compound (B4), a thiol compound (B5), an amino compound (B6), and an imide compound (B7). The optionally branched alkyl group having a carbon atom number of three or more is contained in the epoxy adduct-forming compound (B). The optionally branched alkyl group has a C3-19 alkyl group.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C09D 163/00 - Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
C09D 5/00 - Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
G03F 7/36 - Imagewise removal not covered by groups , e.g. using gas streams, using plasma
C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
C08G 77/50 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
C08G 77/14 - Polysiloxanes containing silicon bound to oxygen-containing groups
A solvent-free light-curable adhesive composition includes: for example, a triazine ring-containing polymer including a repeating unit structure represented by formula [3] and having a weight-average molecular weight of 500-5000; and a reactive diluent such as N-vinylformamide, the composition not including a solvent. The solvent-free light-curable adhesive composition has good compatibility with acrylic materials and the like, which are adhesive components, even without including a solvent.
C09J 179/04 - Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
G02B 1/04 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
C08F 226/02 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a single or double bond to nitrogen
C09J 7/10 - Adhesives in the form of films or foils without carriers
C09J 133/04 - Homopolymers or copolymers of esters
C09J 133/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
C09J 7/30 - Adhesives in the form of films or foils characterised by the adhesive composition
C08G 69/00 - Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
C08G 73/06 - Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule; Polyhydrazides; Polyamide acids or similar polyimide precursors
C09J 133/08 - Homopolymers or copolymers of acrylic acid esters
C09J 133/10 - Homopolymers or copolymers of methacrylic acid esters
G02B 1/111 - Anti-reflection coatings using layers comprising organic materials
Provided is a charge-transporting varnish which comprises an amide compound containing fluorine atoms and represented by formula (1) and a charge-transporting substance.
3 each represent a given fluorinated aryl or aralkyl group.]
C07C 233/75 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring
C07D 209/88 - Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
C07C 233/80 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H01B 1/12 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
C07B 43/06 - Formation or introduction of functional groups containing nitrogen of amide groups
C07C 13/567 - Fluorenes; Completely or partially hydrogenated fluorenes
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japan)
NISSAN CHEMICAL INDUSTRIES, LTD. (Japan)
Inventor
Kawanami, Hajime
Ishizaka, Takayuki
Fujiyama, Hitomi
Kakiuchi, Nobuyuki
Shiga, Norihito
Abstract
A method for preparing a branched alcohol by dimerizing an aliphatic monoalcohol having three or more carbon atoms in the presence of a base and a catalyst. The dimerization reaction is performed under atmospheric pressure while injecting a hydrogen gas. With this method, it is possible to obtain a dimerized alcohol with excellent yield even when using a branched aliphatic monoalcohol as the starting material.
C07C 29/34 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring increasing the number of carbon atoms by reactions without formation of hydroxy groups by condensation involving hydroxy groups or the mineral ester groups derived therefrom, e.g. Guerbet reaction
C07C 31/125 - Monohydroxylic acyclic alcohols containing five to twenty-two carbon atoms
B01J 31/02 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
There are provided a coating composition being possible to form a cured film which has excellent transparency and weather resistance, and especially hardness. A coating composition obtained by which a silicon-containing substance as a component (M) and a silica colloidal particle having a primary particle diameter of 2 to 80 nm as a component (S) are mixed, and then the component (M) is hydrolyzed, and the resulting aqueous solution is subsequently mixed with a colloidal particle (C) wherein a component (F) is a modified metal oxide colloidal particle (C) having a primary particle diameter of 2 to 100 nm, which includes a metal oxide colloidal particle (A) having a primary particle diameter of 2 to 60 nm as a core, whose surface is coated with a coating (B) formed of an acidic oxide colloidal particle.
B05D 1/18 - Processes for applying liquids or other fluent materials performed by dipping
B05D 3/02 - Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
Provided are: a charge-transporting varnish that contains a charge-transporting substance comprising an oligoaniline derivative represented by formula (1), a charge transporting substance that does not contain fluorine atoms, and an organic solvent; and an organic electroluminescent element including a thin film obtained from the varnish.
10 each independently represent a hydrogen atom, a halogen atom, a nitro group, a cyano group, or an alkyl group, alkenyl group, alkynyl group, aryl group or heteroaryl group that may be substituted; A represents a prescribed fluorine atom-containing substituent; and k represents an integer from 1 to 20.)
H01B 1/12 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
C07C 231/12 - Preparation of carboxylic acid amides by reactions not involving the formation of carboxamide groups
C07C 233/80 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring
C07C 209/10 - Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups by substitution of halogen atoms with formation of amino groups bound to carbon atoms of six-membered aromatic rings or from amines having nitrogen atoms bound to carbon atoms of six-membered aromatic rings
C07C 231/02 - Preparation of carboxylic acid amides from carboxylic acids or from esters, anhydrides, or halides thereof by reaction with ammonia or amines
C07C 231/14 - Preparation of carboxylic acid amides by formation of carboxamide groups together with reactions not involving the carboxamide groups
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
73.
PHOTOSENSITIVE FIBERS AND METHOD FOR FORMING FIBER PATTERN
The invention provides a method capable of conveniently producing an intricate and fine resist pattern. The invention also provides a fiber containing a positive-type or negative-type photosensitive material.
D01F 6/50 - Monocomponent man-made filaments or the like of synthetic polymers; Manufacture thereof from mixtures of polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds as major constituent with other polymers or low-molecular-weight compounds of polyalcohols, polyacetals or polyketals
The invention provides a composition for coating a resist pattern and reversing the pattern by utilizing a difference in etching rates. A composition for applying to a resist pattern includes a component (A) which is at least one compound selected from the group consisting of a metal oxide (a1), a polyacid (a2), a polyacid salt (a3), a hydrolyzable silane (a4), a hydrolysis product (a5) of the hydrolyzable silane, and a hydrolysis condensate (a6) of the hydrolyzable silane; and a component (B), which is an aqueous solvent, in which the hydrolyzable silane (a4) is (i) a hydrolyzable silane containing an organic group having an amino group, (ii) a hydrolyzable silane containing an organic group having an ionic functional group, (iii) a hydrolyzable silane containing an organic group having hydroxy group, or (iv) a hydrolyzable silane containing an organic group having a functional group convertible to hydroxy group.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
G03F 7/32 - Liquid compositions therefor, e.g. developers
C08G 77/26 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen nitrogen-containing groups
C09D 183/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
G03F 7/40 - Treatment after imagewise removal, e.g. baking
C08G 77/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
75.
Triazine ring-containing polymer, and composition for film formation use containing same
A triazine ring-containing polymer which contains a repeating unit structure represented by, for example, formula [4] has a high refractive index and also has excellent solubility in various organic solvents including low-polarity solvents, hydrophobic solvents and low-boiling point solvents. A thin film having a high refractive index and excellent transparency can be formed using a composition for film formation use which contains the polymer.
C08G 73/06 - Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule; Polyhydrazides; Polyamide acids or similar polyimide precursors
C09D 179/04 - Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
The invention provides a medium additive, medium composition and a culture method and the like, capable of efficiently culturing cells or tissues in a well dispersed state, and further, permitting cell image analysis of the cells or tissues. The medium additive or medium composition contains agar, which preferably is a low molecular weight agar having a weight average molecular weight of 10,000-60,000. Using same, cells or tissues can be cultured in a well-dispersed state in a medium, and a proliferation promoting effect for the cells or tissues can also be obtained. In addition, the cells can be cultured in any of a floating state and a precipitated state by adjusting the concentration of the aforementioned agar.
A film-forming composition for ink-jet coating which comprises: a triazine-ring-containing polymer including, for example, the repeating unit structure represented by the following formula [3]; and an organic solvent comprising more than 50 mass % solvent based on a glycol dialkyl ether. The composition is less apt to corrode the heads of ink-jet coating devices, and droplets thereof are satisfactorily ejected in ink-jet coating. Therefore, with the composition, it is possible to easily produce a high-refractive-index film according to a desired pattern through pattern printing by an ink-jet coating device.
C09D 179/04 - Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
C08G 73/06 - Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule; Polyhydrazides; Polyamide acids or similar polyimide precursors
C08L 33/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
C08F 20/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
G02F 1/13363 - Birefringent elements, e.g. for optical compensation
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
C08F 220/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
C08F 267/06 - Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated polycarboxylic acids or derivatives thereof as defined in group on to polymers of esters
G02B 27/26 - Other optical systems; Other optical apparatus for producing stereoscopic or other three-dimensional effects involving polarising means
79.
Cured film formation composition, orientation material, and retardation material
A cured-film formation composition that forms a cured film exhibiting excellent liquid-crystal orientation properties and excellent light transmission properties when the cured-film formation composition is used as an orientation material and a layer of a polymerizable liquid crystal is arranged thereon. A cured-film formation composition including a component (A) that is a compound obtained by reacting a cinnamic acid compound of Formula (1) below with a compound having at least one epoxy group in one molecule,
1-6 haloalkoxy, cyano, and nitro; and a component (B) that is a cross-linking agent, an orientation material which is obtained from the composition, and a retardation material which is obtained from the composition.
C08G 59/16 - Polycondensates modified by chemical after-treatment by monocarboxylic acids or by anhydrides, halides or low-molecular-weight esters thereof
C09D 163/10 - Epoxy resins modified by unsaturated compounds
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
C08G 59/40 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the curing agents used
C09D 201/00 - Coating compositions based on unspecified macromolecular compounds
C08G 81/02 - Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
C09D 163/00 - Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
C09D 187/00 - Coating compositions based on unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
C07C 67/26 - Preparation of carboxylic acid esters by reacting carboxylic acids or derivatives thereof with a carbon-to-oxygen ether bond, e.g. acetal, tetrahydrofuran with an oxirane ring
C07C 69/65 - Halogen-containing esters of unsaturated acids
C07C 69/618 - Esters of carboxylic acids having a carboxyl group bound to an acyclic carbon atom and having a six-membered aromatic ring in the acid moiety having unsaturation outside the six-membered aromatic ring
A photosensor element that is capable of achieving a good balance between high photoelectric conversion efficiency and low dark current is able to be obtained by using a composition for forming a hole collecting layer of a photosensor element, which contains an organic solvent and a charge-transporting material that is composed, for example, of an aniline derivative or thiophene derivative represented by one of formulae (AA)-(DD) and having a molecular weight of 200-2,000.
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
C08G 73/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen or carbon, not provided for in groups
C08G 61/12 - Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
H01L 51/42 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
81.
Method for preparing liquid medium composition, and preparation device and kit therefor
The present invention provides a method capable of easily mixing any liquid containing a linking substance such as a divalent metal cation and the like with a liquid containing a particular compound at a high concentration, and capable of producing a liquid medium composition comprising fine structures dispersed therein, and a production device therefor and a kit therefor. The first liquid containing a particular compound is passed through a through-hole having a given cross-sectional area formed in a nozzle part at a given flow rate and injected into the second liquid at a given flow rate. By this simple operation, a structure in which the particular compound is bonded via the linking substance is formed, and the structure is preferably dispersed in a mixture of the both liquids.
A coating solution has a polymer having a formula (1) structural unit, a formula (2) primary, secondary, or tertiary amine, and a formula (3) ester capable of dissolving the polymer and amine:
6 are each independently a linear or branched organic group having a 1-16 carbon atom number.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
G03F 7/40 - Treatment after imagewise removal, e.g. baking
C09D 133/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
G03F 7/32 - Liquid compositions therefor, e.g. developers
There is provided a composition for coating a stepped substrate that has high filling properties of a pattern, and is capable of forming a coating film that does not cause degassing and heat shrinkage, and is used to form a coating film having flattening properties on the substrate. The composition for coating a stepped substrate includes a compound (C) having in the molecule a partial structure of Formula (1) (where R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group, or a C6-40 aryl group; five R3s are each independently a hydrogen atom, a hydroxy group, a C1-10 alkoxy group, a C1-10 alkyl group, a nitro group, or a halogen atom; and * is a bond site to the compound); and a solvent.
C08F 299/02 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
There are provided a hydrogel having a highly strengthened self-supporting property, which can be prepared by simply mixing at room temperature, and a method for producing the hydrogel. A hydrogel-formable composition capable of forming a hydrogel having a self-supporting property characterized by comprising: a water-soluble organic polymer having an organic acid structure, an organic acid salt structure, or an organic acid anion structure; a silicate; a compound having a diphosphonic acid structure of Formula (I):
2 each are independently a single bond or a linking group, and n is an integer of 1 to 5; or a salt thereof; and a compound having or generating a positive charge of divalent or more, a hydrogel which is formed from the composition, and a method for producing the hydrogel.
C08K 5/5317 - Phosphonic compounds, e.g. R—P(:O)(OR')2
C08L 33/02 - Homopolymers or copolymers of acids; Metal or ammonium salts thereof
C08L 101/14 - Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity the macromolecular compounds being water soluble or water swellable, e.g. aqueous gels
1 is a divalent organic group containing at least one arylene group having at least one substituent, wherein the substituent is a substituent of the following formula (2); and wherein Z is a divalent, aliphatic, aromatic, or alicyclic group optionally having a substituent.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08G 65/40 - Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols and other compounds
C09D 171/00 - Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F 7/40 - Treatment after imagewise removal, e.g. baking
G03F 7/023 - Macromolecular quinonediazides; Macromolecular additives, e.g. binders
There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08G 59/20 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the epoxy compounds used
C09D 163/00 - Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
A method forms a resist underlayer film that has high resistance to dry etching using a gas containing a fluorocarbon. A method for forming a resist underlayer film includes the steps of: applying to a substrate a resist underlayer film-forming composition containing a fullerene derivative in which one to six molecules of malonic acid diester of the following Formula (1):
1-10 alkyl group, are added to one molecule of fullerene, a compound having at least two epoxy groups, and a solvent; and baking the substrate applied with the resist underlayer film-forming composition at least one time at a temperature of 240° C. or higher under an atmosphere of nitrogen, argon, or a mixture thereof.
C07C 67/347 - Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by change of size of the carbon skeleton by increase in the number of carbon atoms by addition to unsaturated carbon-to-carbon bonds
C07C 69/753 - Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring of polycyclic acids
C08F 20/36 - Esters containing nitrogen containing oxygen in addition to the carboxy oxygen
C09D 133/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
Provided is a method for manufacturing a carbonaceous luminescent material in which a polycarboxylic-acid-containing starting material, an acid catalyst, and a solvent are mixed together and heated.
There is provided an aqueous suspension agrochemical composition including (Z)-4-[5-(3,5-dichlorophenyl)-5-trifluoromethyl-4,5-dihydroisoxazol-3-yl]-N-(methoxyiminomethyl)-2-methylbenzamide, a thickener, a surfactant, and water, which is excellent in homogeneity stability during storage, and simultaneously excellent in ease of discharge from a storage container. An aqueous suspension agrochemical composition comprising (a) (Z)-4-[5-(3,5-dichlorophenyl)-5-trifluoromethyl-4,5-dihydroisoxazol-3-yl]-N-(methoxyiminomethyl)-2-methylbenzamide, (b) xanthan gum, (c) a surfactant, and (d) water, wherein the xanthan gum is contained in an amount of 0.15 to 0.65% by mass in the aqueous suspension agrochemical composition. The surfactant is preferably one selected from the group consisting of polyoxyethylene styryl phenyl ethers, polyoxyethylene polyoxypropylene block polymers, and mixtures thereof.
A01N 43/80 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms, as ring hetero atoms five-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,2
A01N 25/30 - Biocides, pest repellants or attractants, or plant growth regulators, characterised by their forms, or by their non-active ingredients or by their methods of application; Substances for reducing the noxious effect of the active ingredients to organisms other than pests characterised by the surfactants
90.
Ligand-binding fiber and cell culture substrate using said fiber
The invention provides a ligand-bonded fiber in which a ligand having affinity for a cell membrane receptor is immobilized on a fiber precursor, and a cell culture substrate capable of repeating ex vivo amplification of a cell expressing a cell membrane receptor by using the ligand-bonded fiber.
C07K 17/08 - Peptides being immobilised on, or in, an organic carrier the carrier being a synthetic polymer
C12M 1/00 - Apparatus for enzymology or microbiology
C12N 1/00 - Microorganisms, e.g. protozoa; Compositions thereof; Processes of propagating, maintaining or preserving microorganisms or compositions thereof; Processes of preparing or isolating a composition containing a microorganism; Culture media therefor
1 is organic group of Formula (2):
3 is an alkoxy group, acyloxy group, or halogen group; is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3), and the component (B) is cross-linkable compound having ring structure having alkoxymethyl group or hydroxymethyl group, cross-linkable compound having epoxy group or blocked isocyanate group.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
G03F 7/40 - Treatment after imagewise removal, e.g. baking
G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
C09D 4/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
C08G 77/14 - Polysiloxanes containing silicon bound to oxygen-containing groups
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
H01L 21/31 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After-treatment of these layers; Selection of materials for these layers
− and m are as defined in Specification and Claims, and so on. The copolymer of the present invention can be utilized as an ion complex material excellent in a function of inhibiting adhesion of a biological substance.
C09D 143/02 - Homopolymers or copolymers of monomers containing phosphorus
C09D 133/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
C08F 230/02 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing phosphorus
C09D 5/00 - Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
A radiation dosimetry gel is excellent in heat resistance, and a radiation dosimeter includes the radiation dosimetry gel as a material for measuring a radiation dose. A radiation dosimetry gel includes a water-soluble organic polymer (A) having an organic acid salt structure or an organic acid anion structure, a silicate (B), and a dispersant (C) for the silicate, and a radiation dosimeter includes the radiation dosimetry gel as a material for measuring a radiation dose.
G03G 5/10 - Bases for charge-receiving or other layers
G01T 1/167 - Measuring radioactive content of objects, e.g. contamination
C08L 33/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
10-24 aliphatic group; dissolution accelerator having, in molecules thereof, hydrophilic portion and hydrophobic portion, the hydrophilic portion having betaine structure; and water; and method for producing hydrogel by use of the dispersion.
B01J 13/00 - Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
A61K 8/64 - Proteins; Peptides; Derivatives or degradation products thereof
A61K 47/14 - Esters of carboxylic acids, e.g. fatty acid monoglycerides, medium-chain triglycerides, parabens or PEG fatty acid esters
A61K 47/18 - Amines; Amides; Ureas; Quaternary ammonium compounds; Amino acids; Oligopeptides having up to five amino acids
A61K 47/24 - Organic compounds, e.g. natural or synthetic hydrocarbons, polyolefins, mineral oil, petrolatum or ozokerite containing atoms other than carbon, hydrogen, oxygen, halogen, nitrogen or sulfur, e.g. cyclomethicone or phospholipids
A61K 47/36 - Polysaccharides; Derivatives thereof, e.g. gums, starch, alginate, dextrin, hyaluronic acid, chitosan, inulin, agar or pectin
A liquid crystal display device, whereby transparency when no voltage is applied and scattering properties when a voltage is applied, are good, adhesion between a liquid crystal layer and a vertical liquid crystal alignment film is high, and its lifespan is long even in a severe environment. The liquid crystal display device has a liquid crystal layer formed by disposing a liquid crystal composition containing a liquid crystal and a polymerizable compound between a pair of substrates provided with electrodes, and irradiating and curing the composition with ultraviolet rays by an ultraviolet irradiation apparatus, and at least one substrate is provided with a liquid crystal alignment film to vertically align a liquid crystal, wherein the ultraviolet irradiation apparatus is an ultraviolet irradiation apparatus capable of controlling the irradiation light intensity and wavelength of the ultraviolet rays to be irradiated and the surface temperature of the pair of the substrates.
C09K 19/20 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters
C09K 19/30 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing saturated or unsaturated non-aromatic rings, e.g. cyclohexane rings
C09K 19/04 - Liquid crystal materials characterised by the chemical structure of the liquid crystal components
C09K 19/54 - Additives having no specific mesophase
96.
Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group
A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C09D 165/00 - Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
C09D 183/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C08G 16/00 - Condensation polymers of aldehydes or ketones with monomers not provided for in the groups
C09D 161/00 - Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
C09D 183/06 - Polysiloxanes containing silicon bound to oxygen-containing groups
C08G 77/26 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen nitrogen-containing groups
C08G 73/06 - Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule; Polyhydrazides; Polyamide acids or similar polyimide precursors
C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
97.
Resist underlayer film-forming composition containing polymer having arylene group
A resist underlayer film-forming composition for lithography process having characteristics of enabling wafer surface planarization after film formation, excellent planarization performance on substrate with level difference, and good embeddability in fine hole pattern. The resist underlayer film-forming composition including polymer having unit structure of Formula (1) and solvent,
1 in Formula (1) is organic group of Formula (2),
2 is phenylene group, naphthylene group, or organic group of Formula (3), and dotted line is bond, and
4 is independently phenylene group or naphthylene group, and dotted line is bond.
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
A method for manufacturing an electroconductive pattern 40, provided with: a lamination step for laminating an acid generation film 10 containing an acid proliferation agent and a photoacid generator on a polymer film 20 containing an electroconductive polymer formed on a substrate 21; a masking step for masking the top of the acid generation film 10; a light irradiation step for irradiating the laminate from the acid-generation-film 10 side; a doping step for doping the electroconductive polymer with an acid generated and proliferated in the acid generation film 10 by the light irradiation; and a releasing step for releasing the acid generation film 10 from the polymer film 20. This method makes it possible to provide an electroconductive film and a method for manufacturing an electroconductive pattern in which photoacid generation and acid proliferation effects are utilized.
G03F 7/34 - Imagewise removal by selective transfer, e.g. peeling away
G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
H01B 5/14 - Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
H01B 1/12 - Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
H01B 13/00 - Apparatus or processes specially adapted for manufacturing conductors or cables
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
C03C 17/28 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with organic material
99.
Wafer/support arrangement, method for producing the arrangement, and use of the arrangement in the processing of the wafer
A wafer/support arrangement, including a wafer, a support system, which includes a support and an elastomer layer, and a connecting layer, wherein the connecting layer is a sol-gel layer. The invention further relates to a coated wafer for a wafer/support arrangement according to the invention, wherein a sol-gel layer is used as a connecting layer for a corresponding wafer/support assembly, and to a method for processing the back side of a wafer.
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
B01J 19/00 - Chemical, physical or physico-chemical processes in general; Their relevant apparatus
2 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16), a method of forming a resist pattern using the coating liquid, and a method for forming a reverse pattern using the coating liquid.
C08G 8/04 - Condensation polymers of aldehydes or ketones with phenols only of aldehydes
C08G 77/14 - Polysiloxanes containing silicon bound to oxygen-containing groups
C09D 125/16 - Homopolymers or copolymers of alkyl- substituted styrenes
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
G03F 7/11 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
patents
