Nanotronics Imaging, Inc.

United States of America

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G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes 34
G06T 7/00 - Image analysis 14
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1.

FLUORESCENCE MICROSCOPY INSPECTION SYSTEMS, APPARATUS AND METHODS

      
Application Number 18398955
Status Pending
Filing Date 2023-12-28
First Publication Date 2024-04-18
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Lee, Jonathan
  • Bordelanne, Valerie

Abstract

A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.

IPC Classes  ?

  • G02B 21/16 - Microscopes adapted for ultraviolet illumination
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums

2.

THRESHOLD DETERMINATION FOR PREDICTIVE PROCESS CONTROL OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number 18240891
Status Pending
Filing Date 2023-08-31
First Publication Date 2024-03-14
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Constantin, Sarah
  • Bordelanne, Valerie
  • Limoge, Damas
  • Lee, Jonathan

Abstract

A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 13/04 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators

3.

Artificial Intelligence Process Control for Assembly Processes

      
Application Number 18354357
Status Pending
Filing Date 2023-07-18
First Publication Date 2024-01-25
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Lee, Jonathan
  • Doshi, Anuj

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes a monitoring platform and an analytics platform. The monitoring platform is configured to capture data of an operator during assembly of an article of manufacture. The monitoring platform includes one or more cameras and one or more microphones. The analytics platform is in communication with the monitoring platform. The analytics platform is configured to analyze the data captured by the monitoring platform.

IPC Classes  ?

4.

AUTOFOCUS SYSTEM AND METHOD

      
Application Number 18045007
Status Pending
Filing Date 2022-10-07
First Publication Date 2024-01-18
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Schmidt, Patrick
  • Sharoukhov, Denis
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

A microscopy system and method of focusing the same are disclosed herein. The microscopy system may include an objective, and imaging device, an illumination source, an epi-illumination module, and a controller. The imaging device is configured to capture a single image of a specimen positioned on a stage of the microscopy system. The illumination source is configured to illuminate the specimen positioned on the stage. The epi-illumination module includes a focusing mechanism in a first primary optical path of a light generated by the illumination source. The focusing mechanism is tilted in relation to a plane perpendicular to the first primary optical path. The controller is in communication with the illumination source. The controller is configured to focus the microscopy system based on a pattern produced by the focusing mechanism on the single image captured by the imaging device.

IPC Classes  ?

  • G02B 21/24 - Base structure
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

5.

Dynamic monitoring and securing of factory processes, equipment and automated systems

      
Application Number 18329295
Grant Number 11953863
Status In Force
Filing Date 2023-06-05
First Publication Date 2024-01-18
Grant Date 2024-04-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Lee, Jonathan
  • Limoge, Damas

Abstract

A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric

6.

Systems, devices, and methods for providing feedback on and improving the accuracy of super-resolution imaging

      
Application Number 18240910
Grant Number 11948270
Status In Force
Filing Date 2023-08-31
First Publication Date 2023-12-28
Grant Date 2024-04-02
Owner Nanotronics Imaging , Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Succar, Joseph R.

Abstract

Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.

IPC Classes  ?

  • G06K 9/32 - Aligning or centering of the image pick-up or image-field
  • G06F 18/2411 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on the proximity to a decision surface, e.g. support vector machines
  • G06F 18/2413 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on distances to training or reference patterns
  • G06T 3/4038 - Image mosaicing, e.g. composing plane images from plane sub-images
  • G06T 3/4053 - based on super-resolution, i.e. the output image resolution being higher than the sensor resolution
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06V 10/764 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects
  • G06V 10/98 - Detection or correction of errors, e.g. by rescanning the pattern or by human intervention; Evaluation of the quality of the acquired patterns
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts

7.

SYSTEMS, METHODS, AND MEDIA FOR ARTIFICIAL INTELLIGENCE PROCESS CONTROL IN ADDITIVE MANUFACTURING

      
Application Number 18452914
Status Pending
Filing Date 2023-08-21
First Publication Date 2023-12-07
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Pinskiy, Vadim
  • Putman, Matthew C.
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav

Abstract

Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/209 - Heads; Nozzles
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B22F 10/30 - Process control
  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes
  • G06F 18/20 - Analysing
  • G06F 18/2411 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on the proximity to a decision surface, e.g. support vector machines
  • G06V 10/764 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects
  • G06V 10/82 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using neural networks
  • G06V 10/98 - Detection or correction of errors, e.g. by rescanning the pattern or by human intervention; Evaluation of the quality of the acquired patterns

8.

System and Method for Generating Training Data Sets for Specimen Defect Detection

      
Application Number 18449320
Status Pending
Filing Date 2023-08-14
First Publication Date 2023-12-07
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Doshi, Anuj
  • Lee, Jonathan
  • Putman, John B.

Abstract

A system and method for generating a training data set for training a machine learning model to detect defects in specimens is described herein. A computing system cause presentation of an image on a device of a user. The image includes at least one defect on an example specimen. The computing system receives an annotated image from the user. The user annotated the image using an input via the device. The input includes a first indication of a location of the defect and a second indication of a class corresponding to the defect. The computing system adjusts the annotated image to standardize the input based on an error profile of the user and the class corresponding to the defect. The computing system uploads the annotated image for training the machine learning model.

IPC Classes  ?

  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06T 7/00 - Image analysis
  • G06V 10/22 - Image preprocessing by selection of a specific region containing or referencing a pattern; Locating or processing of specific regions to guide the detection or recognition

9.

Fault protected signal splitter apparatus

      
Application Number 18366534
Grant Number 11894596
Status In Force
Filing Date 2023-08-07
First Publication Date 2023-11-30
Grant Date 2024-02-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Limoge, Damas
  • Moskie, Michael
  • Lee, Jonathan

Abstract

A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.

IPC Classes  ?

  • H01P 5/16 - Conjugate devices, i.e. devices having at least one port decoupled from one other port
  • H03M 1/10 - Calibration or testing
  • H02H 7/20 - Emergency protective circuit arrangements specially adapted for specific types of electric machines or apparatus or for sectionalised protection of cable or line systems, and effecting automatic switching in the event of an undesired change from norm for electronic equipment
  • G01R 31/3177 - Testing of logic operation, e.g. by logic analysers

10.

PREDICTIVE PROCESS CONTROL FOR A MANUFACTURING PROCESS

      
Application Number 18357560
Status Pending
Filing Date 2023-07-24
First Publication Date 2023-11-16
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric

11.

DYNAMIC MONITORING AND SECURING OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number 18343421
Status Pending
Filing Date 2023-06-28
First Publication Date 2023-11-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.

IPC Classes  ?

  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G06N 3/063 - Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • G06N 3/08 - Learning methods
  • G05B 23/02 - Electric testing or monitoring

12.

ASSEMBLY ERROR CORRECTION FOR ASSEMBLY LINES

      
Application Number 18353648
Status Pending
Filing Date 2023-07-17
First Publication Date 2023-11-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path

13.

Fault protected signal splitter apparatus

      
Application Number 18343407
Grant Number 11955686
Status In Force
Filing Date 2023-06-28
First Publication Date 2023-10-26
Grant Date 2024-04-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Limoge, Damas
  • Moskie, Michael
  • Lee, Jonathan

Abstract

A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.

IPC Classes  ?

  • H01P 5/16 - Conjugate devices, i.e. devices having at least one port decoupled from one other port
  • G01R 31/3177 - Testing of logic operation, e.g. by logic analysers
  • H02H 7/20 - Emergency protective circuit arrangements specially adapted for specific types of electric machines or apparatus or for sectionalised protection of cable or line systems, and effecting automatic switching in the event of an undesired change from norm for electronic equipment
  • H03M 1/10 - Calibration or testing

14.

SYSTEM AND METHOD FOR IMPROVING ASSEMBLY LINE PROCESSES

      
Application Number 18333016
Status Pending
Filing Date 2023-06-12
First Publication Date 2023-10-12
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path

15.

SYSTEM, METHOD AND APPARATUS FOR MACROSCOPIC INSPECTION OF REFLECTIVE SPECIMENS

      
Application Number 18324334
Status Pending
Filing Date 2023-05-26
First Publication Date 2023-10-05
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.

IPC Classes  ?

  • H04N 23/695 - Control of camera direction for changing a field of view, e.g. pan, tilt or based on tracking of objects
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • H04N 23/56 - Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums
  • G06T 5/00 - Image enhancement or restoration
  • G06T 7/00 - Image analysis

16.

Predictive process control for a manufacturing process

      
Application Number 18329265
Grant Number 11953893
Status In Force
Filing Date 2023-06-05
First Publication Date 2023-10-05
Grant Date 2024-04-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)

17.

Method, systems and apparatus for intelligently emulating factory control systems and simulating response data

      
Application Number 18329283
Grant Number 11947671
Status In Force
Filing Date 2023-06-05
First Publication Date 2023-10-05
Grant Date 2024-04-02
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Lee, Jonathan
  • Putman, Matthew C.

Abstract

A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.

IPC Classes  ?

  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures

18.

FLUORESCENCE MICROSCOPY INSPECTION SYSTEMS, APPARATUS AND METHODS WITH DARKFIELD CHANNEL

      
Application Number 18324317
Status Pending
Filing Date 2023-05-26
First Publication Date 2023-09-21
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sharoukhov, Denis

Abstract

A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.

IPC Classes  ?

  • G02B 21/16 - Microscopes adapted for ultraviolet illumination
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums

19.

METHOD, SYSTEMS AND APPARATUS FOR INTELLIGENTLY EMULATING FACTORY CONTROL SYSTEMS AND SIMULATING RESPONSE DATA

      
Application Number 18324370
Status Pending
Filing Date 2023-05-26
First Publication Date 2023-09-21
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.

IPC Classes  ?

  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06N 20/00 - Machine learning
  • G06F 30/20 - Design optimisation, verification or simulation
  • G06F 9/455 - Emulation; Interpretation; Software simulation, e.g. virtualisation or emulation of application or operating system execution engines

20.

Threshold determination for predictive process control of factory processes, equipment and automated systems

      
Application Number 17931442
Grant Number 11747772
Status In Force
Filing Date 2022-09-12
First Publication Date 2023-09-05
Grant Date 2023-09-05
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Constantin, Sarah
  • Bordelanne, Valerie
  • Limoge, Damas
  • Lee, Jonathan

Abstract

A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 13/04 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators

21.

System and method for generating training data sets for specimen defect detection

      
Application Number 17938885
Grant Number 11727672
Status In Force
Filing Date 2022-10-07
First Publication Date 2023-08-15
Grant Date 2023-08-15
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Doshi, Anuj
  • Lee, Jonathan
  • Putman, John B.

Abstract

A system and method for generating a training data set for training a machine learning model to detect defects in specimens is described herein. A computing system cause presentation of an image on a device of a user. The image includes at least one defect on an example specimen. The computing system receives an annotated image from the user. The user annotated the image using an input via the device. The input includes a first indication of a location of the defect and a second indication of a class corresponding to the defect. The computing system adjusts the annotated image to standardize the input based on an error profile of the user and the class corresponding to the defect. The computing system uploads the annotated image for training the machine learning model.

IPC Classes  ?

  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06T 7/00 - Image analysis
  • G06V 10/22 - Image preprocessing by selection of a specific region containing or referencing a pattern; Locating or processing of specific regions to guide the detection or recognition

22.

System, method and apparatus for macroscopic inspection of reflective specimens

      
Application Number 18175216
Grant Number 11961210
Status In Force
Filing Date 2023-02-27
First Publication Date 2023-06-29
Grant Date 2024-04-16
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Lee, Jonathan
  • Limoge, Damas
  • Putman, Matthew C.
  • Putman, John B.
  • Moskie, Michael

Abstract

An inspection apparatus includes a specimen stage configured to retain a specimen, at least three imaging devices arranged in a triangular array positioned above the specimen stage, each of the at least three imaging devices configured to capture an image of the specimen, one or more sets of lights positioned between the specimen stage and the at least three imaging devices, and a control system in communication with the at least three imaging devices.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06T 7/00 - Image analysis
  • H04N 23/56 - Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means
  • H04N 23/695 - Control of camera direction for changing a field of view, e.g. pan, tilt or based on tracking of objects
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums

23.

Deep Photometric Learning (DPL) Systems, Apparatus and Methods

      
Application Number 18164940
Status Pending
Filing Date 2023-02-06
First Publication Date 2023-06-15
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Narong, Tanaporn Na
  • Sharoukhov, Denis
  • Ivanov, Tonislav

Abstract

An imaging system is disclosed herein. The imaging system includes an imaging apparatus and a computing system. The imaging apparatus includes a plurality of light sources positioned at a plurality of positions and a plurality of angles relative to a stage configured to support a specimen. The imaging apparatus is configured to capture a plurality of images of a surface of the specimen. The computing system in communication with the imaging apparatus. The computing system configured to generate a 3D-reconstruction of the surface of the specimen by receiving, from the imaging apparatus, the plurality of images of the surface of the specimen, generating, by the imaging apparatus via a deep learning model, a height map of the surface of the specimen based on the plurality of images, and outputting a 3D-reconstruction of the surface of the specimen based on the height map generated by the deep learning model.

IPC Classes  ?

  • G06T 7/586 - Depth or shape recovery from multiple images from multiple light sources, e.g. photometric stereo
  • G06N 3/08 - Learning methods
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • H04N 23/56 - Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means

24.

Dynamic monitoring and securing of factory processes, equipment and automated systems

      
Application Number 17812879
Grant Number 11669058
Status In Force
Filing Date 2022-07-15
First Publication Date 2023-06-06
Grant Date 2023-06-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Lee, Jonathan
  • Limoge, Damas

Abstract

A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric

25.

Unique oblique lighting technique using a brightfield darkfield objective and imaging method relating thereto

      
Application Number 18158277
Grant Number 11846765
Status In Force
Filing Date 2023-01-23
First Publication Date 2023-05-25
Grant Date 2023-12-19
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Orlando, Julie A.
  • Bulman, Jospeh G.

Abstract

A process is provided for imaging a surface of a specimen with an imaging system that employs a BD objective having a darkfield channel and a bright field channel, the BD objective having a circumference. The specimen is obliquely illuminated through the darkfield channel with a first arced illuminating light that obliquely illuminates the specimen through a first arc of the circumference. The first arced illuminating light reflecting off of the surface of the specimen is recorded as a first image of the specimen from the first arced illuminating light reflecting off the surface of the specimen, and a processor generates a 3D topography of the specimen by processing the first image through a topographical imaging technique. Imaging apparatus is also provided as are further process steps for other embodiments.

IPC Classes  ?

  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 5/00 - Optical elements other than lenses
  • G02B 21/08 - Condensers
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

26.

Apparatus and method for manipulating objects with gesture controls

      
Application Number 17817499
Grant Number 11747911
Status In Force
Filing Date 2022-08-04
First Publication Date 2023-04-20
Grant Date 2023-09-05
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Roossin, Paul

Abstract

An apparatus for manipulating an object includes first and second gesture controllers, each operatively connected to the object and structured and programmed such that, in a first-action active state, each can causes a first action to be carried out on the object by an appropriate first-action gesture made in the gesture controller. Only one of the first and second gesture controllers at any given time is capable of being in the first-action active state, and the first-action active state is transferable between the first and second gesture controllers upon the detecting of a first-action transfer gesture by one of said first gesture controller and said second gesture controller. Specific gesture control apparatus and methods for manipulating an object are also disclosed.

IPC Classes  ?

  • G06F 3/01 - Input arrangements or combined input and output arrangements for interaction between user and computer

27.

Systems, devices and methods for automatic microscope focus

      
Application Number 18061807
Grant Number 11796785
Status In Force
Filing Date 2022-12-05
First Publication Date 2023-04-13
Grant Date 2023-10-24
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Sharoukhov, Denis Y.

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two offset focusing cameras. Each offset focusing camera can be positioned on a different side of an image forming conjugate plane so that their sharpness curves intersect at the image forming conjugate plane. Focus of a specimen can be adjusted by using sharpness values determined from images taken by the offset focusing cameras.

IPC Classes  ?

  • G02B 21/24 - Base structure
  • G02B 21/00 - Microscopes
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 7/38 - Systems for automatic generation of focusing signals using image sharpness techniques measured at different points on the optical axis
  • G01N 15/14 - Electro-optical investigation
  • H04N 23/67 - Focus control based on electronic image sensor signals
  • H04N 23/45 - Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from two or more image sensors being of different type or operating in different modes, e.g. with a CMOS sensor for moving images in combination with a charge-coupled device [CCD] for still images

28.

Method, systems and apparatus for intelligently emulating factory control systems and simulating response data

      
Application Number 17447767
Grant Number 11669617
Status In Force
Filing Date 2021-09-15
First Publication Date 2023-03-16
Grant Date 2023-06-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Lee, Jonathan
  • Putman, Matthew C.

Abstract

A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.

IPC Classes  ?

  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures

29.

Fault protected signal splitter apparatus

      
Application Number 17817840
Grant Number 11784386
Status In Force
Filing Date 2022-08-05
First Publication Date 2023-03-16
Grant Date 2023-10-10
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Limoge, Damas
  • Moskie, Michael
  • Lee, Jonathan

Abstract

A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.

IPC Classes  ?

  • H01P 5/16 - Conjugate devices, i.e. devices having at least one port decoupled from one other port
  • H03M 1/10 - Calibration or testing
  • G01R 31/3177 - Testing of logic operation, e.g. by logic analysers
  • H02H 7/20 - Emergency protective circuit arrangements specially adapted for specific types of electric machines or apparatus or for sectionalised protection of cable or line systems, and effecting automatic switching in the event of an undesired change from norm for electronic equipment

30.

Defect Detection System

      
Application Number 17819806
Status Pending
Filing Date 2022-08-15
First Publication Date 2022-12-08
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Ivanov, Tonislav
  • Babeshko, Denis
  • Pinskiy, Vadim
  • Putman, Matthew C.
  • Sundstrom, Andrew

Abstract

A computing system generates a training data set for training the prediction model to detect defects present in a target surface of a target specimen and training the prediction model to detect defects present in the target surface of the target specimen based on the training data set. The computing system generates the training data set by identifying a set of images for training the prediction model, the set of images comprising a first subset of images. A deep learning network generates a second subset of images for subsequent labelling based on the set of images comprising the first subset of images. The deep learning network generates a third subset of images for labelling based on the set of images comprising the first subset of images and the labeled second subset of images. The computing system continues the process until a threshold number of labeled images is generated.

IPC Classes  ?

  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06V 10/82 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using neural networks
  • G06N 3/08 - Learning methods
  • G06N 20/20 - Ensemble learning
  • G06V 30/19 - Recognition using electronic means
  • G06V 10/70 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning
  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06V 10/778 - Active pattern-learning, e.g. online learning of image or video features
  • G06V 10/94 - Hardware or software architectures specially adapted for image or video understanding

31.

Macro inspection systems, apparatus and methods

      
Application Number 17817826
Grant Number 11656184
Status In Force
Filing Date 2022-08-05
First Publication Date 2022-12-01
Grant Date 2023-05-23
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

The disclosed technology relates to an inspection apparatus that includes a stage configured to retain a specimen for inspection, an imaging device having a field of view encompassing at least a portion of the stage to view a specimen retained on the stage, and a plurality of lights disposed on a moveable platform. The inspection apparatus can further include a control module coupled to the imaging device, each of the lights and the moveable platform. The control module is configured to perform operations including: receiving image data from the imaging device, where the image data indicates an illumination landscape of light incident on the specimen; and automatically modifying, based on the image data, an elevation of the moveable platform or an intensity of one or more of the lights to adjust the illumination landscape. Methods and machine-readable media are also contemplated.

IPC Classes  ?

  • G01N 21/88 - Investigating the presence of flaws, defects or contamination
  • G01N 21/00 - Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
  • G02B 21/26 - Stages; Adjusting means therefor
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/06 - Means for illuminating specimen
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06T 7/00 - Image analysis
  • H04N 5/235 - Circuitry for compensating for variation in the brightness of the object

32.

System, method and apparatus for macroscopic inspection of reflective specimens

      
Application Number 17664535
Grant Number 11663703
Status In Force
Filing Date 2022-05-23
First Publication Date 2022-09-08
Grant Date 2023-05-30
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 7/00 - Image analysis
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • H04N 23/56 - Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums
  • H04N 23/695 - Control of camera direction for changing a field of view, e.g. pan, tilt or based on tracking of objects

33.

Method and system for mapping objects on unknown specimens

      
Application Number 17663599
Grant Number 11815673
Status In Force
Filing Date 2022-05-16
First Publication Date 2022-09-01
Grant Date 2023-11-14
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Cruickshank, John
  • Orlando, Julie
  • Frankel, Adele
  • Scott, Brandon

Abstract

A method and system for mapping fluid objects on a substrate using a microscope inspection system that includes a light source, imaging device, stage for moving a substrate disposed on the stage, and a control module. A computer analysis system includes an object identification module that identifies for each of the objects on the substrate, an object position on the substrate including a set of X, Y, and θ coordinates using algorithms, networks, machines and systems including artificial intelligence and image processing algorithms. At least one of the objects is fluid and has shifted from a prior position or deformed from a prior size.

IPC Classes  ?

  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/00 - Microscopes
  • G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts

34.

Imitation Learning in a Manufacturing Environment

      
Application Number 17652607
Status Pending
Filing Date 2022-02-25
First Publication Date 2022-08-25
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Sundstrom, Andrew
  • Limoge, Damas
  • Pinskiy, Vadim
  • Nirmaleswaran, Aswin Raghav
  • Kim, Eun-Sol

Abstract

A computing system identifies a trajectory example generated by a human operator. The trajectory example includes trajectory information of the human operator while performing a task to be learned by a control system of the computing system. Based on the trajectory example, the computing system trains the control system to perform the task exemplified in the trajectory example. Training the control system includes generating an output trajectory of a robot performing the task. The computing system identifies an updated trajectory example generated by the human operator based on the trajectory example and the output trajectory of the robot performing the task. Based on the updated trajectory example, the computing system continues to train the control system to perform the task exemplified in the updated trajectory example.

IPC Classes  ?

  • G05B 19/423 - Teaching successive positions by walk-through, i.e. the tool head or end effector being grasped and guided directly, with or without servo-assistance, to follow a path

35.

Fault protected signal splitter apparatus

      
Application Number 17646247
Grant Number 11411293
Status In Force
Filing Date 2021-12-28
First Publication Date 2022-08-09
Grant Date 2022-08-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Limoge, Damas
  • Moskie, Michael
  • Lee, Jonathan

Abstract

A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.

IPC Classes  ?

  • H01P 5/16 - Conjugate devices, i.e. devices having at least one port decoupled from one other port
  • H03M 1/10 - Calibration or testing
  • G01R 31/3177 - Testing of logic operation, e.g. by logic analysers

36.

Systems, devices, and methods for automatic microscopic focus

      
Application Number 17657815
Grant Number 11656429
Status In Force
Filing Date 2022-04-04
First Publication Date 2022-07-21
Grant Date 2023-05-23
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Orlando, Julie
  • Fashbaugh, Dylan

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two cameras. The first camera can be positioned in a first image forming conjugate plane and receives light from a first illumination source that transmits light in a first wavelength range. The second camera can be positioned at an offset distance from the first image forming conjugate plane and receives light from a second illumination source that transmits light in a second wavelength range.

IPC Classes  ?

  • G02B 7/28 - Systems for automatic generation of focusing signals
  • G02B 21/06 - Means for illuminating specimen
  • G06T 7/80 - Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
  • G02B 21/02 - Objectives
  • G02B 21/24 - Base structure
  • G02B 21/26 - Stages; Adjusting means therefor
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

37.

Fluorescence microscopy inspection systems, apparatus and methods with darkfield channel

      
Application Number 17657818
Grant Number 11662563
Status In Force
Filing Date 2022-04-04
First Publication Date 2022-07-14
Grant Date 2023-05-30
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sharoukhov, Denis

Abstract

A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.

IPC Classes  ?

  • G02B 21/16 - Microscopes adapted for ultraviolet illumination
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums

38.

Assembly error correction for assembly lines

      
Application Number 17646063
Grant Number 11703824
Status In Force
Filing Date 2021-12-27
First Publication Date 2022-04-21
Grant Date 2023-07-18
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
  • G06N 20/20 - Ensemble learning

39.

System and method for improving assembly line processes

      
Application Number 17452169
Grant Number 11675330
Status In Force
Filing Date 2021-10-25
First Publication Date 2022-02-10
Grant Date 2023-06-13
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
  • G06N 20/20 - Ensemble learning

40.

Deep Learning Model for Noise Reduction in Low SNR Imaging Conditions

      
Application Number 17444499
Status Pending
Filing Date 2021-08-05
First Publication Date 2022-02-10
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Sharoukhov, Denis
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

Embodiments disclosed herein are generally related to a system for noise reduction in low signal to noise ratio imaging conditions. A computing system obtains a set of images of a specimen. The set of images includes at least two images of the specimen. The computing system inputs the set of images of the specimen into a trained denoising model. The trained denoising model is configured to output a single denoised image of the specimen. The computing system receives, as output from the trained denoising model, a single denoised image of the specimen.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06T 3/40 - Scaling of a whole image or part thereof

41.

Deep Learning Model for Auto-Focusing Microscope Systems

      
Application Number 17444603
Status Pending
Filing Date 2021-08-06
First Publication Date 2022-02-10
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Sharoukhov, Denis
  • Ivanov, Tonislav
  • Lee, Jonathan

Abstract

A computing system receives, from an image sensor, at least two images of a specimen positioned on a specimen stage of a microscope system. The computing system provides the at least two images to an autofocus model for detecting at least one distances to a focal plane of the specimen. The computing system identifies, via the autofocus model, the at least one distance to the focal plane of the specimen. Based on the identifying, the computing system automatically adjusts a position of the specimen stage with respect to an objective lens of the microscope system.

IPC Classes  ?

  • H04N 5/232 - Devices for controlling television cameras, e.g. remote control
  • G06T 7/00 - Image analysis

42.

Systems, methods, and media for artificial intelligence process control in additive manufacturing

      
Application Number 17444619
Grant Number 11731368
Status In Force
Filing Date 2021-08-06
First Publication Date 2022-01-27
Grant Date 2023-08-22
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Pinskiy, Vadim
  • Putman, Matthew C.
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav

Abstract

Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.

IPC Classes  ?

  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/209 - Heads; Nozzles
  • B33Y 10/00 - Processes of additive manufacturing
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B22F 10/30 - Process control
  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes
  • G06F 18/20 - Analysing
  • G06F 18/2411 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on the proximity to a decision surface, e.g. support vector machines
  • G06V 10/764 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects
  • G06V 10/82 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using neural networks
  • G06V 10/98 - Detection or correction of errors, e.g. by rescanning the pattern or by human intervention; Evaluation of the quality of the acquired patterns
  • B22F 10/12 - Formation of a green body by photopolymerisation, e.g. stereolithography [SLA] or digital light processing [DLP]
  • B22F 10/18 - Formation of a green body by mixing binder with metal in filament form, e.g. fused filament fabrication [FFF]
  • B22F 10/25 - Direct deposition of metal particles, e.g. direct metal deposition [DMD] or laser engineered net shaping [LENS]
  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]

43.

Systems, Methods, and Media for Manufacturing Processes

      
Application Number 17447144
Status Pending
Filing Date 2021-09-08
First Publication Date 2021-12-23
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Hough, Fabian
  • Putman, John B.
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav
  • Nouri Gooshki, Sadegh

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a computing system. The computing system receives an image of the product at a step of the multi-step manufacturing process. The computing system determines a current state of the product based on the image of the product. The computing system determines, via a deep learning model, that the product is not within specification based on the current state of the product and the image of the product. Based on the determining, the computing system adjusts a control logic for at least a following station. The adjusting includes generating, by the deep learning model, a corrective action to be performed by the following station.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • G05B 19/4099 - Surface or curve machining, making 3D objects, e.g. desktop manufacturing
  • G06N 3/08 - Learning methods
  • B33Y 10/00 - Processes of additive manufacturing

44.

SYSTEMS, METHODS, AND MEDIA FOR ARTIFICIAL INTELLIGENCE FEEDBACK CONTROL IN MANUFACTURING

      
Application Number 17445660
Status Pending
Filing Date 2021-08-23
First Publication Date 2021-12-16
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Williams, Iii, James
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav
  • Chris, Mario

Abstract

Additive manufacturing systems using artificial intelligence can identify an anomaly in a printed layer of an object from a generated topographical image of the printed layer. The additive manufacturing systems can also use artificial intelligence to determine a correlation between the identified anomaly and one or more print parameters, and adaptively adjust one or more print parameters. The additive manufacturing systems can also use artificial intelligence to optimize one or more printing parameters to achieve desired mechanical, optical and/or electrical properties.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/209 - Heads; Nozzles
  • B33Y 10/00 - Processes of additive manufacturing
  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

45.

Controlled growth system for biologicals

      
Application Number 17303620
Grant Number 11889797
Status In Force
Filing Date 2021-06-03
First Publication Date 2021-12-09
Grant Date 2024-02-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Limoge, Damas
  • Pinskiy, Vadim
  • Musselman, Parker

Abstract

A controlled growth system is provided herein. The controlled growth system includes a controlled growth environment, a controller, a sensor, and a computing system. The controlled growth environment is configured to grow a biologic. The controller is in communication with the controlled growth environment. The controller is configured to manage process parameters of the controlled growth environment. The sensor is configured to monitor the biologic during a growth process. The computing system is in communication with the sensor and the controller. The computing system is programmed to perform operations for achieving a desired final quality metric for the biologic.

IPC Classes  ?

  • A01G 18/00 - Cultivation of mushrooms
  • A01G 9/24 - Devices for heating, ventilating, regulating temperature, or watering, in greenhouses, forcing-frames, or the like
  • A01G 31/04 - Hydroponic culture on conveyors
  • A01G 2/00 - Vegetative propagation
  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • A01G 31/06 - Hydroponic culture on racks or in stacked containers
  • A01G 31/00 - Soilless cultivation, e.g. hydroponics

46.

Dynamic monitoring and securing of factory processes, equipment and automated systems

      
Application Number 17445657
Grant Number 11693956
Status In Force
Filing Date 2021-08-23
First Publication Date 2021-12-09
Grant Date 2023-07-04
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.

IPC Classes  ?

  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G06N 3/063 - Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
  • G06N 3/08 - Learning methods
  • G05B 23/02 - Electric testing or monitoring

47.

Method, systems and apparatus for intelligently emulating factory control systems and simulating response data

      
Application Number 17444621
Grant Number 11663327
Status In Force
Filing Date 2021-08-06
First Publication Date 2021-11-25
Grant Date 2023-05-30
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.

IPC Classes  ?

  • G06F 21/00 - Security arrangements for protecting computers, components thereof, programs or data against unauthorised activity
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06N 20/00 - Machine learning
  • G06F 30/20 - Design optimisation, verification or simulation
  • G06F 9/455 - Emulation; Interpretation; Software simulation, e.g. virtualisation or emulation of application or operating system execution engines

48.

System, method and apparatus for macroscopic inspection of reflective specimens

      
Application Number 17375229
Grant Number 11593919
Status In Force
Filing Date 2021-07-14
First Publication Date 2021-11-04
Grant Date 2023-02-28
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Lee, Jonathan
  • Limoge, Damas
  • Putman, Matthew C.
  • Putman, John B.
  • Moskie, Michael

Abstract

An inspection apparatus includes a specimen stage configured to retain a specimen, at least three imaging devices arranged in a triangular array positioned above the specimen stage, each of the at least three imaging devices configured to capture an image of the specimen, one or more sets of lights positioned between the specimen stage and the at least three imaging devices, and a control system in communication with the at least three imaging devices.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 7/00 - Image analysis
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • H04N 5/247 - Arrangement of television cameras
  • H04N 5/225 - Television cameras
  • H04N 5/232 - Devices for controlling television cameras, e.g. remote control

49.

Predictive process control for a manufacturing process

      
Application Number 17304611
Grant Number 11709483
Status In Force
Filing Date 2021-06-23
First Publication Date 2021-10-14
Grant Date 2023-07-25
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)

50.

DYNAMIC MONITORING AND SECURING OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS

      
Application Number 17304614
Status Pending
Filing Date 2021-06-23
First Publication Date 2021-10-14
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.

IPC Classes  ?

  • H04L 29/06 - Communication control; Communication processing characterised by a protocol
  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • G06N 3/08 - Learning methods

51.

Systems, Methods, and Media for Manufacturing Processes

      
Application Number 17304349
Status Pending
Filing Date 2021-06-18
First Publication Date 2021-10-07
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Sundstrom, Andrew
  • Kim, Eun-Sol
  • Limoge, Damas
  • Pinskiy, Vadim
  • Putman, Matthew C.

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
  • G06T 7/33 - Determination of transform parameters for the alignment of images, i.e. image registration using feature-based methods
  • G06T 7/00 - Image analysis
  • G06T 1/00 - General purpose image data processing
  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints

52.

Predictive process control for a manufacturing process

      
Application Number 17304613
Grant Number 11669078
Status In Force
Filing Date 2021-06-23
First Publication Date 2021-10-07
Grant Date 2023-06-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)

53.

Defect detection system

      
Application Number 17195760
Grant Number 11416711
Status In Force
Filing Date 2021-03-09
First Publication Date 2021-09-09
Grant Date 2022-08-16
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Ivanov, Tonislav
  • Babeshko, Denis
  • Pinskiy, Vadim
  • Putman, Matthew C.
  • Sundstrom, Andrew

Abstract

A computing system generates a training data set for training the prediction model to detect defects present in a target surface of a target specimen and training the prediction model to detect defects present in the target surface of the target specimen based on the training data set. The computing system generates the training data set by identifying a set of images for training the prediction model, the set of images comprising a first subset of images. A deep learning network generates a second subset of images for subsequent labelling based on the set of images comprising the first subset of images. The deep learning network generates a third subset of images for labelling based on the set of images comprising the first subset of images and the labeled second subset of images. The computing system continues the process until a threshold number of labeled images is generated.

IPC Classes  ?

  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06V 10/82 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using neural networks
  • G06N 3/08 - Learning methods
  • G06N 20/20 - Ensemble learning
  • G06V 30/19 - Recognition using electronic means
  • G06V 10/70 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning
  • G06V 10/774 - Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
  • G06V 10/778 - Active pattern-learning, e.g. online learning of image or video features
  • G06V 10/94 - Hardware or software architectures specially adapted for image or video understanding

54.

Systems, Methods, and Media for Manufacturing Processes

      
Application Number 17180422
Status Pending
Filing Date 2021-02-19
First Publication Date 2021-08-26
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Nouri Gooshki, Sadegh
  • Nirmaleswaran, Aswin Raghav
  • Hough, Fabian

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G06N 3/08 - Learning methods
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

55.

SECURING INDUSTRIAL PRODUCTION FROM SOPHISTICATED ATTACKS

      
Application Number 16953550
Status Pending
Filing Date 2020-11-20
First Publication Date 2021-08-19
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to detect a cyberattack to the manufacturing system. The control module is configured to perform operations. The operations include receiving control values for a first station of the one or more stations. The operations further include determining that there is a cyberattack based on the control values for the first station using one or more machine learning algorithms. The operations further include generating an alert to cease processing of the component. In some embodiments, the operations further include correcting errors caused by the cyberattack.

IPC Classes  ?

  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06N 20/00 - Machine learning

56.

Method, systems and apparatus for intelligently emulating factory control systems and simulating response data

      
Application Number 16900124
Grant Number 11086988
Status In Force
Filing Date 2020-06-12
First Publication Date 2021-08-10
Grant Date 2021-08-10
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.

IPC Classes  ?

  • G06F 21/00 - Security arrangements for protecting computers, components thereof, programs or data against unauthorised activity
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06N 20/00 - Machine learning
  • G06F 30/20 - Design optimisation, verification or simulation
  • G06F 9/455 - Emulation; Interpretation; Software simulation, e.g. virtualisation or emulation of application or operating system execution engines

57.

Deep photometric learning (DPL) systems, apparatus and methods

      
Application Number 17166976
Grant Number 11574413
Status In Force
Filing Date 2021-02-03
First Publication Date 2021-08-05
Grant Date 2023-02-07
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Narong, Tanaporn Na
  • Sharoukhov, Denis
  • Ivanov, Tonislav

Abstract

An imaging system is disclosed herein. The imaging system includes an imaging apparatus and a computing system. The imaging apparatus includes a plurality of light sources positioned at a plurality of positions and a plurality of angles relative to a stage configured to support a specimen. The imaging apparatus is configured to capture a plurality of images of a surface of the specimen. The computing system in communication with the imaging apparatus. The computing system configured to generate a 3D-reconstruction of the surface of the specimen by receiving, from the imaging apparatus, the plurality of images of the surface of the specimen, generating, by the imaging apparatus via a deep learning model, a height map of the surface of the specimen based on the plurality of images, and outputting a 3D-reconstruction of the surface of the specimen based on the height map generated by the deep learning model.

IPC Classes  ?

  • G06T 7/586 - Depth or shape recovery from multiple images from multiple light sources, e.g. photometric stereo
  • H04N 5/225 - Television cameras
  • G06N 3/08 - Learning methods
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

58.

Systems, devices, and methods for providing feedback on and improving the accuracy of super-resolution imaging

      
Application Number 17222425
Grant Number 11748846
Status In Force
Filing Date 2021-04-05
First Publication Date 2021-07-22
Grant Date 2023-09-05
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Succar, Joseph

Abstract

Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.

IPC Classes  ?

  • G03H 1/00 - HOLOGRAPHIC PROCESSES OR APPARATUS - Details peculiar thereto
  • G06T 3/40 - Scaling of a whole image or part thereof
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06V 10/98 - Detection or correction of errors, e.g. by rescanning the pattern or by human intervention; Evaluation of the quality of the acquired patterns
  • G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
  • G06F 18/2411 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on the proximity to a decision surface, e.g. support vector machines
  • G06F 18/2413 - Classification techniques relating to the classification model, e.g. parametric or non-parametric approaches based on distances to training or reference patterns
  • G06V 10/764 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects

59.

Unique oblique lighting technique using a brightfield darkfield objective and imaging method relating thereto

      
Application Number 17208222
Grant Number 11561383
Status In Force
Filing Date 2021-03-22
First Publication Date 2021-07-08
Grant Date 2023-01-24
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Orlando, Julie A.
  • Bulman, Jospeh G.

Abstract

A process is provided for imaging a surface of a specimen with an imaging system that employs a BD objective having a darkfield channel and a bright field channel, the BD objective having a circumference. The specimen is obliquely illuminated through the darkfield channel with a first arced illuminating light that obliquely illuminates the specimen through a first arc of the circumference. The first arced illuminating light reflecting off of the surface of the specimen is recorded as a first image of the specimen from the first arced illuminating light reflecting off the surface of the specimen, and a processor generates a 3D topography of the specimen by processing the first image through a topographical imaging technique. Imaging apparatus is also provided as are further process steps for other embodiments.

IPC Classes  ?

  • G02B 5/00 - Optical elements other than lenses
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/08 - Condensers

60.

Dynamic monitoring and securing of factory processes, equipment and automated systems

      
Application Number 16781193
Grant Number 11063965
Status In Force
Filing Date 2020-02-04
First Publication Date 2021-06-24
Grant Date 2021-07-13
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.

IPC Classes  ?

  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • H04L 29/06 - Communication control; Communication processing characterised by a protocol
  • G06N 3/08 - Learning methods

61.

Systems, Methods, and Media for Manufacturing Processes

      
Application Number 17195746
Status Pending
Filing Date 2021-03-09
First Publication Date 2021-06-24
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Sundstrom, Andrew
  • Nirmaleswaran, Aswin Raghav
  • Kim, Eun-Sol

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods
  • G06N 20/00 - Machine learning
  • G05B 19/402 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for positioning, e.g. centring a tool relative to a hole in the workpiece, additional detection means to correct position
  • G05B 19/4093 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by part programming, e.g. entry of geometrical information as taken from a technical drawing, combining this with machining and material information to obtain control information, named part programme, for the NC machine

62.

Macro inspection systems, apparatus and methods

      
Application Number 17170467
Grant Number 11408829
Status In Force
Filing Date 2021-02-08
First Publication Date 2021-06-17
Grant Date 2022-08-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

The disclosed technology relates to an inspection apparatus that includes a stage configured to retain a specimen for inspection, an imaging device having a field of view encompassing at least a portion of the stage to view a specimen retained on the stage, and a plurality of lights disposed on a moveable platform. The inspection apparatus can further include a control module coupled to the imaging device, each of the lights and the moveable platform. The control module is configured to perform operations including: receiving image data from the imaging device, where the image data indicates an illumination landscape of light incident on the specimen; and automatically modifying, based on the image data, an elevation of the moveable platform or an intensity of one or more of the lights to adjust the illumination landscape. Methods and machine-readable media are also contemplated.

IPC Classes  ?

  • G01N 21/88 - Investigating the presence of flaws, defects or contamination
  • G02B 21/26 - Stages; Adjusting means therefor
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/06 - Means for illuminating specimen

63.

System, method and apparatus for macroscopic inspection of reflective specimens

      
Application Number 17170260
Grant Number 11341617
Status In Force
Filing Date 2021-02-08
First Publication Date 2021-06-03
Grant Date 2022-05-24
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 7/00 - Image analysis
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • H04N 5/247 - Arrangement of television cameras
  • H04N 5/225 - Television cameras
  • H04N 5/232 - Devices for controlling television cameras, e.g. remote control

64.

Apparatus and method for manipulating objects with gesture controls

      
Application Number 17155645
Grant Number 11409367
Status In Force
Filing Date 2021-01-22
First Publication Date 2021-05-13
Grant Date 2022-08-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Roossin, Paul

Abstract

An apparatus for manipulating an object includes first and second gesture controllers, each operatively connected to the object and structured and programmed such that, in a first-action active state, each can causes a first action to be carried out on the object by an appropriate first-action gesture made in the gesture controller. Only one of the first and second gesture controllers at any given time is capable of being in the first-action active state, and the first-action active state is transferable between the first and second gesture controllers upon the detecting of a first-action transfer gesture by one of said first gesture controller and said second gesture controller. Specific gesture control apparatus and methods for manipulating an object are also disclosed.

IPC Classes  ?

  • G06F 3/01 - Input arrangements or combined input and output arrangements for interaction between user and computer

65.

Systems, Methods, and Media for Manufacturing Processes

      
Application Number 17091209
Status Pending
Filing Date 2020-11-06
First Publication Date 2021-05-13
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Limoge, Damas
  • Hough, Fabian
  • Nouri Gooshki, Sadegh
  • Nirmaleswaran, Aswin Raghav
  • Pinskiy, Vadim

Abstract

A manufacturing system is disclosed herein. The manufacturing system may include one or more station, a monitoring platform, and a control module. Each station is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • G06T 7/00 - Image analysis

66.

Systems, Methods, and Media for Manufacturing Processes

      
Application Number 17091393
Status Pending
Filing Date 2020-11-06
First Publication Date 2021-05-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Sundstrom, Andrew
  • Limoge, Damas
  • Kim, Eun-Sol
  • Pinskiy, Vadim
  • Putman, Matthew C.

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.

IPC Classes  ?

  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • G06T 7/00 - Image analysis
  • G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods

67.

Dynamic monitoring and securing of factory processes, equipment and automated systems

      
Application Number 16904984
Grant Number 11100221
Status In Force
Filing Date 2020-06-18
First Publication Date 2021-04-08
Grant Date 2021-08-24
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Sundstrom, Andrew
  • Williams, Iii, James

Abstract

A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.

IPC Classes  ?

  • G05B 23/02 - Electric testing or monitoring
  • G06F 21/55 - Detecting local intrusion or implementing counter-measures
  • G06F 21/56 - Computer malware detection or handling, e.g. anti-virus arrangements
  • G06N 3/063 - Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
  • G05B 19/4155 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
  • G06N 3/08 - Learning methods

68.

Systems, methods, and media for manufacturing processes

      
Application Number 17015674
Grant Number 11117328
Status In Force
Filing Date 2020-09-09
First Publication Date 2021-03-11
Grant Date 2021-09-14
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Hough, Fabian
  • Putman, John B.
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav
  • Nouri Gooshki, Sadegh

Abstract

A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a product. The monitoring platform is configured to monitor progression of the product throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the product.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • G05B 19/4099 - Surface or curve machining, making 3D objects, e.g. desktop manufacturing
  • G06N 3/08 - Learning methods
  • B33Y 10/00 - Processes of additive manufacturing

69.

System, method and apparatus for macroscopic inspection of reflective specimens

      
Application Number 16705674
Grant Number 10915992
Status In Force
Filing Date 2019-12-06
First Publication Date 2021-02-09
Grant Date 2021-02-09
Owner Nanotronics Imaging,Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.

IPC Classes  ?

  • G06T 5/00 - Image enhancement or restoration
  • G06T 7/00 - Image analysis
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • H04N 5/247 - Arrangement of television cameras
  • H04N 5/232 - Devices for controlling television cameras, e.g. remote control
  • H04N 5/225 - Television cameras

70.

Method and system for mapping objects on unknown specimens

      
Application Number 17066012
Grant Number 11333876
Status In Force
Filing Date 2020-10-08
First Publication Date 2021-01-28
Grant Date 2022-05-17
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Cruickshank, John
  • Orlando, Julie
  • Frankel, Adele
  • Scott, Brandon

Abstract

A method and system for mapping fluid objects on a substrate using a microscope inspection system that includes a light source, imaging device, stage for moving a substrate disposed on the stage, and a control module. A computer analysis system includes an object identification module that identifies for each of the objects on the substrate, an object position on the substrate including a set of X, Y, and θ coordinates using algorithms, networks, machines and systems including artificial intelligence and image processing algorithms. At least one of the objects is fluid and has shifted from a prior position or deformed from a prior size.

IPC Classes  ?

  • H04N 7/18 - Closed-circuit television [CCTV] systems, i.e. systems in which the video signal is not broadcast
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/00 - Microscopes
  • G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods
  • G06K 9/32 - Aligning or centering of the image pick-up or image-field

71.

Systems, devices and methods for automatic microscope focus

      
Application Number 16887947
Grant Number 11520133
Status In Force
Filing Date 2020-05-29
First Publication Date 2021-01-14
Grant Date 2022-12-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Sharoukhov, Denis Y.

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two offset focusing cameras. Each offset focusing camera can be positioned on a different side of an image forming conjugate plane so that their sharpness curves intersect at the image forming conjugate plane. Focus of a specimen can be adjusted by using sharpness values determined from images taken by the offset focusing cameras.

IPC Classes  ?

  • G02B 21/24 - Base structure
  • G01N 15/14 - Electro-optical investigation
  • G02B 7/38 - Systems for automatic generation of focusing signals using image sharpness techniques measured at different points on the optical axis
  • G02B 21/00 - Microscopes
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • H04N 5/232 - Devices for controlling television cameras, e.g. remote control
  • H04N 5/225 - Television cameras

72.

Systems, devices, and methods for providing feedback on and improving the accuracy of super-resolution imaging

      
Application Number 17029703
Grant Number 10970831
Status In Force
Filing Date 2020-09-23
First Publication Date 2021-01-14
Grant Date 2021-04-06
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Succar, Joseph

Abstract

Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.

IPC Classes  ?

  • G06K 9/32 - Aligning or centering of the image pick-up or image-field
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints
  • G06K 9/03 - Detection or correction of errors, e.g. by rescanning the pattern
  • G06T 3/40 - Scaling of a whole image or part thereof
  • G06K 9/62 - Methods or arrangements for recognition using electronic means

73.

Predictive process control for a manufacturing process

      
Application Number 16519102
Grant Number 11156991
Status In Force
Filing Date 2019-07-23
First Publication Date 2020-12-24
Grant Date 2021-10-26
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)

74.

Predictive process control for a manufacturing process

      
Application Number 16663245
Grant Number 11156992
Status In Force
Filing Date 2019-10-24
First Publication Date 2020-12-24
Grant Date 2021-10-26
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Limoge, Damas

Abstract

Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.

IPC Classes  ?

  • G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
  • G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)

75.

Apparatus and method for manipulating objects with gesture controls

      
Application Number 16904830
Grant Number 10901521
Status In Force
Filing Date 2020-06-18
First Publication Date 2020-10-15
Grant Date 2021-01-26
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Roossin, Paul

Abstract

An apparatus for manipulating an object includes first and second gesture controllers, each operatively connected to the object and structured and programmed such that, in a first-action active state, each can causes a first action to be carried out on the object by an appropriate first-action gesture made in the gesture controller. Only one of the first and second gesture controllers at any given time is capable of being in the first-action active state, and the first-action active state is transferable between the first and second gesture controllers upon the detecting of a first-action transfer gesture by one of said first gesture controller and said second gesture controller. Specific gesture control apparatus and methods for manipulating an object are also disclosed.

IPC Classes  ?

  • G06F 3/01 - Input arrangements or combined input and output arrangements for interaction between user and computer

76.

Camera and specimen alignment to facilitate large area imaging in microscopy

      
Application Number 16915057
Grant Number 11099368
Status In Force
Filing Date 2020-06-29
First Publication Date 2020-10-15
Grant Date 2021-08-24
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Scott, Brandon
  • Fashbaugh, Dylan

Abstract

A microscope system and method allow for a desired x′-direction scanning along a specimen to be angularly offset from an x-direction of the XY translation stage, and rotates an image sensor associated with the microscope to place the pixel rows of the image sensor substantially parallel to the desired x′-direction. The angle of offset of the x′-direction relative to the x-direction is determined and the XY translation stage is employed to move the specimen relative to the image sensor to different positions along the desired x′-direction without a substantial shift of the image sensor relative to the specimen in a y′-direction, the y′-direction being orthogonal to the x′ direction of the specimen. The movement is based on the angle of offset.

IPC Classes  ?

  • G02B 21/00 - Microscopes
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints
  • H04N 1/387 - Composing, repositioning or otherwise modifying originals
  • G02B 21/26 - Stages; Adjusting means therefor
  • G06K 9/20 - Image acquisition

77.

Assembly error correction for assembly lines

      
Application Number 16853620
Grant Number 11209795
Status In Force
Filing Date 2020-04-20
First Publication Date 2020-09-17
Grant Date 2021-12-28
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
  • G06N 20/20 - Ensemble learning

78.

Dynamic training for assembly lines

      
Application Number 16587366
Grant Number 11156982
Status In Force
Filing Date 2019-09-30
First Publication Date 2020-09-03
Grant Date 2021-10-26
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G06N 20/20 - Ensemble learning
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path

79.

Systems, devices, and methods for automatic microscopic focus

      
Application Number 16715571
Grant Number 11294146
Status In Force
Filing Date 2019-12-16
First Publication Date 2020-08-20
Grant Date 2022-04-05
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Orlando, Julie
  • Fashbaugh, Dylan

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two cameras. The first camera can be positioned in a first image forming conjugate plane and receives light from a first illumination source that transmits light in a first wavelength range. The second camera can be positioned at an offset distance from the first image forming conjugate plane and receives light from a second illumination source that transmits light in a second wavelength range.

IPC Classes  ?

  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 7/28 - Systems for automatic generation of focusing signals
  • G02B 21/06 - Means for illuminating specimen
  • G06T 7/80 - Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
  • G02B 21/02 - Objectives
  • G02B 21/24 - Base structure
  • G02B 21/26 - Stages; Adjusting means therefor

80.

Fluorescence microscopy inspection systems, apparatus and methods with darkfield channel

      
Application Number 16751303
Grant Number 11294162
Status In Force
Filing Date 2020-01-24
First Publication Date 2020-08-13
Grant Date 2022-04-05
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sharoukhov, Denis

Abstract

A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.

IPC Classes  ?

  • G02B 21/16 - Microscopes adapted for ultraviolet illumination
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints
  • H04N 5/247 - Arrangement of television cameras
  • G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens

81.

Systems, methods, and media for artificial intelligence feedback control in additive manufacturing

      
Application Number 16723212
Grant Number 11097490
Status In Force
Filing Date 2019-12-20
First Publication Date 2020-08-06
Grant Date 2021-08-24
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Williams, Iii, James
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav
  • Chris, Mario

Abstract

Additive manufacturing systems using artificial intelligence can identify an anomaly in a printed layer of an object from a generated topographical image of the printed layer. The additive manufacturing systems can also use artificial intelligence to determine a correlation between the identified anomaly and one or more print parameters, and adaptively adjust one or more print parameters. The additive manufacturing systems can also use artificial intelligence to optimize one or more printing parameters to achieve desired mechanical, optical and/or electrical properties.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/209 - Heads; Nozzles
  • B33Y 10/00 - Processes of additive manufacturing
  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

82.

Systems, methods, and media for artificial intelligence process control in additive manufacturing

      
Application Number 16853640
Grant Number 11084225
Status In Force
Filing Date 2020-04-20
First Publication Date 2020-08-06
Grant Date 2021-08-10
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Pinskiy, Vadim
  • Putman, Matthew C.
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav

Abstract

Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/209 - Heads; Nozzles
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • G06K 9/62 - Methods or arrangements for recognition using electronic means

83.

Macro inspection systems, apparatus and methods

      
Application Number 16738022
Grant Number 10914686
Status In Force
Filing Date 2020-01-09
First Publication Date 2020-07-30
Grant Date 2021-02-09
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

The disclosed technology relates to an inspection apparatus that includes a stage configured to retain a specimen for inspection, an imaging device having a field of view encompassing at least a portion of the stage to view a specimen retained on the stage, and a plurality of lights disposed on a moveable platform. The inspection apparatus can further include a control module coupled to the imaging device, each of the lights and the moveable platform. The control module is configured to perform operations including: receiving image data from the imaging device, where the image data indicates an illumination landscape of light incident on the speciment; and automatically modifying, based on the image data, an elevation of the moveable platform or an intensity of one or more of the lights to adjust the illumination landscape. Methods and machine-readable media are also contemplated.

IPC Classes  ?

  • G01N 21/88 - Investigating the presence of flaws, defects or contamination
  • G02B 21/06 - Means for illuminating specimen
  • G02B 21/26 - Stages; Adjusting means therefor
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

84.

Method and system for automatically mapping fluid objects on a substrate

      
Application Number 16583925
Grant Number 10809516
Status In Force
Filing Date 2019-09-26
First Publication Date 2020-04-23
Grant Date 2020-10-20
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Cruickshank, John
  • Orlando, Julie
  • Frankel, Adele
  • Scott, Brandon

Abstract

A method and system for mapping fluid objects on a substrate using a microscope inspection system that includes a light source, imaging device, stage for moving a substrate disposed on the stage, and a control module. A computer analysis system includes an object identification module that identifies for each of the objects on the substrate, an object position on the substrate including a set of X, Y, and θ coordinates using algorithms, networks, machines and systems including artificial intelligence and image processing algorithms. At least one of the objects is fluid and has shifted from a prior position or deformed from a prior size.

IPC Classes  ?

  • G06K 9/32 - Aligning or centering of the image pick-up or image-field
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/00 - Microscopes
  • G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods

85.

Apparatus and method to reduce vignetting in microscopic imaging

      
Application Number 16679433
Grant Number 11880028
Status In Force
Filing Date 2019-11-11
First Publication Date 2020-03-05
Grant Date 2024-01-23
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Fashbaugh, Dylan
  • Horstmeyer, Roarke

Abstract

A method for altering the intensity of light across the field of view of an image sensor in a microscope apparatus having a light source, an image sensor having pixels, and a specimen stage, wherein light from the light source travels along a light path to the specimen stage and then to the image sensor includes interposing a programmable spatial light modulator, pSLM, in the light path between the light source and the image sensor, the pSLM having a plurality of pixels; and modulating the intensity of light passing through one or more pixels of the plurality of pixels of the pSLM to produce an altered illumination landscape at the field of view of the image sensor that differs from an unaltered illumination landscape that would otherwise be produced at the image sensor. Vignetting can be specifically addressed.

IPC Classes  ?

  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/06 - Means for illuminating specimen
  • G02B 21/26 - Stages; Adjusting means therefor
  • H04N 25/61 - Noise processing, e.g. detecting, correcting, reducing or removing noise the noise originating only from the lens unit, e.g. flare, shading, vignetting or "cos4"

86.

Fluorescence microscopy inspection systems, apparatus and methods

      
Application Number 16399058
Grant Number 10578850
Status In Force
Filing Date 2019-04-30
First Publication Date 2020-03-03
Grant Date 2020-03-03
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Sharoukhov, Denis

Abstract

A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.

IPC Classes  ?

  • H04N 7/18 - Closed-circuit television [CCTV] systems, i.e. systems in which the video signal is not broadcast
  • G02B 21/16 - Microscopes adapted for ultraviolet illumination
  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints
  • H04N 5/247 - Arrangement of television cameras
  • G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens

87.

Marco inspection systems, apparatus and methods

      
Application Number 16262017
Grant Number 10545096
Status In Force
Filing Date 2019-01-30
First Publication Date 2020-01-28
Grant Date 2020-01-28
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Moffitt, John
  • Moskie, Michael
  • Andresen, Jeffrey
  • Pozzi-Loyola, Scott
  • Orlando, Julie

Abstract

The disclosed technology relates to an inspection apparatus that includes a stage configured to retain a specimen for inspection, an imaging device having a field of view encompassing at least a portion of the stage to view a specimen retained on the stage, a lens having a view encompassing the specimen retained on the stage, and a plurality of lights disposed on a moveable platform. The inspection apparatus can further include a control module configured to control a position of the stage, an elevation of the moveable platform, and a focus of the lens. In some implementations, the inspection apparatus includes an image processing system configured for receiving image data from the imaging device, analyzing the image data to determine a specimen classification, and automatically selecting an illumination profile based on the specimen classification. Methods and machine-readable media are also contemplated.

IPC Classes  ?

  • G01N 21/88 - Investigating the presence of flaws, defects or contamination
  • G01N 21/00 - Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
  • G02B 21/06 - Means for illuminating specimen
  • G02B 21/26 - Stages; Adjusting means therefor
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

88.

Unique oblique lighting technique using a brightfield darkfield objective and imaging method relating thereto

      
Application Number 16561541
Grant Number 10955651
Status In Force
Filing Date 2019-09-05
First Publication Date 2020-01-23
Grant Date 2021-03-23
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Orlando, Julie A.
  • Bulman, Jospeh G.

Abstract

A process is provided for imaging a surface of a specimen with an imaging system that employs a BD objective having a darkfield channel and a bright field channel, the BD objective having a circumference. The specimen is obliquely illuminated through the darkfield channel with a first arced illuminating light that obliquely illuminates the specimen through a first arc of the circumference. The first arced illuminating light reflecting off of the surface of the specimen is recorded as a first image of the specimen from the first arced illuminating light reflecting off the surface of the specimen, and a processor generates a 3D topography of the specimen by processing the first image through a topographical imaging technique. Imaging apparatus is also provided as are further process steps for other embodiments.

IPC Classes  ?

  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 5/00 - Optical elements other than lenses
  • G02B 21/08 - Condensers
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

89.

Systems, devices, and methods for providing feedback on and improving the accuracy of super-resolution imaging

      
Application Number 16576732
Grant Number 10789695
Status In Force
Filing Date 2019-09-19
First Publication Date 2020-01-09
Grant Date 2020-09-29
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Succar, Joseph

Abstract

Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.

IPC Classes  ?

  • G06K 9/32 - Aligning or centering of the image pick-up or image-field
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints
  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06T 3/40 - Scaling of a whole image or part thereof
  • G06K 9/03 - Detection or correction of errors, e.g. by rescanning the pattern

90.

Method and system for automatically mapping fluid objects on a substrate

      
Application Number 16164990
Grant Number 10481379
Status In Force
Filing Date 2018-10-19
First Publication Date 2019-11-19
Grant Date 2019-11-19
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Cruickshank, John
  • Orlando, Julie
  • Frankel, Adele
  • Scott, Brandon

Abstract

A method and system for mapping fluid objects on a substrate using a microscope inspection system that includes a light source, imaging device, stage for moving a substrate disposed on the stage, and a control module. A computer analysis system includes an object identification module that identifies for each of the objects on the substrate, an object position on the substrate including a set of X, Y, and θ coordinates using algorithms, networks, machines and systems including artificial intelligence and image processing algorithms. At least one of the objects is fluid and has shifted from a prior position or deformed from a prior size.

IPC Classes  ?

  • G06K 9/32 - Aligning or centering of the image pick-up or image-field
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/00 - Microscopes
  • G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods

91.

Dynamic training for assembly lines

      
Application Number 16289422
Grant Number 10481579
Status In Force
Filing Date 2019-02-28
First Publication Date 2019-11-19
Grant Date 2019-11-19
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Kim, Eun-Sol
  • Sundstrom, Andrew

Abstract

Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.

IPC Classes  ?

  • G05B 19/406 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by monitoring or safety
  • G06N 20/20 - Ensemble learning
  • G05B 19/19 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path

92.

Systems, devices and methods for automatic microscope focus

      
Application Number 16207727
Grant Number 10670850
Status In Force
Filing Date 2018-12-03
First Publication Date 2019-11-07
Grant Date 2020-06-02
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Sharoukhov, Denis Y.

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two offset focusing cameras. Each offset focusing camera can be positioned on a different side of an image forming conjugate plane so that their sharpness curves intersect at the image forming conjugate plane. Focus of a specimen can be adjusted by using sharpness values determined from images taken by the offset focusing cameras.

IPC Classes  ?

  • G02B 21/24 - Base structure
  • G02B 21/00 - Microscopes
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • H04N 5/232 - Devices for controlling television cameras, e.g. remote control
  • G02B 7/38 - Systems for automatic generation of focusing signals using image sharpness techniques measured at different points on the optical axis
  • G01N 15/14 - Electro-optical investigation
  • H04N 5/225 - Television cameras

93.

Systems, devices, and methods for providing feedback on and improving the accuracy of super-resolution imaging

      
Application Number 16233258
Grant Number 10467740
Status In Force
Filing Date 2018-12-27
First Publication Date 2019-11-05
Grant Date 2019-11-05
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Pinskiy, Vadim
  • Succar, Joseph

Abstract

Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.

IPC Classes  ?

  • G06K 9/32 - Aligning or centering of the image pick-up or image-field
  • G06T 5/50 - Image enhancement or restoration by the use of more than one image, e.g. averaging, subtraction
  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints
  • G06T 3/40 - Scaling of a whole image or part thereof

94.

Systems, methods, and media for artificial intelligence feedback control in additive manufacturing

      
Application Number 15943442
Grant Number 10518480
Status In Force
Filing Date 2018-04-02
First Publication Date 2019-10-03
Grant Date 2019-12-31
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Pinskiy, Vadim
  • Williams, Iii, James
  • Limoge, Damas
  • Nirmaleswaran, Aswin Raghav
  • Chris, Mario

Abstract

Additive manufacturing systems using artificial intelligence can identify an anomaly in a printed layer of an object from a generated topographical image of the printed layer. The additive manufacturing systems can also use artificial intelligence to determine a correlation between the identified anomaly and one or more print parameters, and adaptively adjust one or more print parameters. The additive manufacturing systems can also use artificial intelligence to optimize one or more printing parameters to achieve desired mechanical, optical and/or electrical properties.

IPC Classes  ?

  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B29C 64/209 - Heads; Nozzles
  • B33Y 10/00 - Processes of additive manufacturing
  • G06K 9/62 - Methods or arrangements for recognition using electronic means
  • G06N 3/04 - Architecture, e.g. interconnection topology
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

95.

Systems, devices and methods for automatic microscopic focus

      
Application Number 16275177
Grant Number 10509199
Status In Force
Filing Date 2019-02-13
First Publication Date 2019-09-19
Grant Date 2019-12-17
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Orlando, Julie
  • Fashbaugh, Dylan

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two cameras. The first camera can be positioned in a first image forming conjugate plane and receives light from a first illumination source that transmits light in a first wavelength range. The second camera can be positioned at an offset distance from the first image forming conjugate plane and receives light from a second illumination source that transmits light in a second wavelength range.

IPC Classes  ?

  • G02B 23/00 - Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
  • G02B 7/28 - Systems for automatic generation of focusing signals
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/02 - Objectives
  • G02B 21/06 - Means for illuminating specimen
  • G06T 7/80 - Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
  • G02B 21/26 - Stages; Adjusting means therefor

96.

Systems, devices, and methods for combined wafer and photomask inspection

      
Application Number 16378049
Grant Number 11125677
Status In Force
Filing Date 2019-04-08
First Publication Date 2019-08-22
Grant Date 2021-09-21
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Griffith, Randolph E.
  • Andresen, Jeff
  • Pozzi-Loyola, Scott
  • Moskie, Michael
  • Scranton, Steve
  • Jaime, Alejandro S.
  • Putman, John B.

Abstract

Systems, devices, and methods for combined wafer and photomask inspection are provided. In some embodiments, chucks are provided, the chucks comprising: a removable insert, wherein the removable insert is configured to support a wafer so that an examination surface of the wafer lies within a focal range when the chuck is in a first configuration, wherein the removable insert is inserted into the chuck in the first configuration; and a first structure forming a recess that has a depth sufficient to support a photomask so that an examination surface of the photomask lies within the focal range when the chuck is in a second configuration, wherein the removable insert is not inserted into the chuck in the second configuration.

IPC Classes  ?

  • G01N 21/01 - Arrangements or apparatus for facilitating the optical investigation
  • G01N 21/88 - Investigating the presence of flaws, defects or contamination
  • G01N 21/956 - Inspecting patterns on the surface of objects
  • G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined
  • G01N 21/03 - Cuvette constructions

97.

Systems, devices, and methods for combined wafer and photomask inspection

      
Application Number 15899456
Grant Number 10254214
Status In Force
Filing Date 2018-02-20
First Publication Date 2019-04-09
Grant Date 2019-04-09
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Griffith, Randolph E.
  • Andresen, Jeff
  • Pozzi-Loyola, Scott
  • Moskie, Michael
  • Scranton, Steve
  • Jaime, Alejandro S.
  • Putman, John B.

Abstract

Systems, devices, and methods for combined wafer and photomask inspection are provided. In some embodiments, chucks are provided, the chucks comprising: a removable insert, wherein the removable insert is configured to support a wafer so that an examination surface of the wafer lies within a focal range when the chuck is in a first configuration, wherein the removable insert is inserted into the chuck in the first configuration; and a first structure forming a recess that has a depth sufficient to support a photomask so that an examination surface of the photomask lies within the focal range when the chuck is in a second configuration, wherein the removable insert is not inserted into the chuck in the second configuration.

IPC Classes  ?

  • G01N 21/01 - Arrangements or apparatus for facilitating the optical investigation
  • G01N 21/88 - Investigating the presence of flaws, defects or contamination
  • G01N 21/956 - Inspecting patterns on the surface of objects
  • G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined

98.

Apparatus and method to reduce vignetting in microscopic imaging

      
Application Number 15752778
Grant Number 10502944
Status In Force
Filing Date 2017-10-02
First Publication Date 2019-04-04
Grant Date 2019-12-10
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, Matthew C.
  • Putman, John B.
  • Fashbaugh, Dylan
  • Horstmeyer, Roarke

Abstract

A method for altering the intensity of light across the field of view of an image sensor in a microscope apparatus having a light source, an image sensor having pixels, and a specimen stage, wherein light from the light source travels along a light path to the specimen stage and then to the image sensor includes interposing a programmable spatial light modulator, pSLM, in the light path between the light source and the image sensor, the pSLM having a plurality of pixels; and modulating the intensity of light passing through one or more pixels of the plurality of pixels of the pSLM to produce an altered illumination landscape at the field of view of the image sensor that differs from an unaltered illumination landscape that would otherwise be produced at the image sensor. Vignetting can be specifically addressed.

IPC Classes  ?

  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • G02B 21/06 - Means for illuminating specimen
  • G02B 21/26 - Stages; Adjusting means therefor
  • H04N 5/357 - Noise processing, e.g. detecting, correcting, reducing or removing noise

99.

Systems, devices and methods for automatic microscopic focus

      
Application Number 15920850
Grant Number 10247910
Status In Force
Filing Date 2018-03-14
First Publication Date 2019-04-02
Grant Date 2019-04-02
Owner Nanotronics Imaging, Inc. (USA)
Inventor
  • Putman, John B.
  • Putman, Matthew C.
  • Orlando, Julie
  • Fashbaugh, Dylan

Abstract

An automatic focus system for an optical microscope that facilitates faster focusing by using at least two cameras. The first camera can be positioned in a first image forming conjugate plane and receives light from a first illumination source that transmits light in a first wavelength range. The second camera can be positioned at an offset distance from the first image forming conjugate plane and receives light from a second illumination source that transmits light in a second wavelength range.

IPC Classes  ?

  • G02B 23/00 - Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
  • G02B 7/28 - Systems for automatic generation of focusing signals
  • G02B 21/06 - Means for illuminating specimen
  • G06T 7/80 - Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
  • G02B 21/02 - Objectives
  • G02B 21/26 - Stages; Adjusting means therefor
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

100.

Systems, apparatus, and methods for sorting components using illumination

      
Application Number 15992985
Grant Number 10173246
Status In Force
Filing Date 2018-05-30
First Publication Date 2019-01-08
Grant Date 2019-01-08
Owner NANOTRONICS IMAGING, INC. (USA)
Inventor
  • Putman, John B.
  • Yancey, Jonathan
  • Stanwix, Justin

Abstract

An illumination apparatus, method and system to facilitate manual sorting of components. The illumination apparatus can include an array of lights and a component holder receptacle configured to receive a component holder retaining components. The illumination apparatus can further include a control module configured to receive information identifying components for sorting and location information for locating the one or more components on the component holder, and to selectively control activation of individual lights of the array of lights to illuminate the one or more components.

IPC Classes  ?

  • G01R 31/28 - Testing of electronic circuits, e.g. by signal tracer
  • B07C 7/04 - Apparatus or accessories for hand picking
  • B07C 7/00 - Sorting by hand only
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