Nikon Corporation

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[Owner] Nikon Corporation 7,160
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2024 April (MTD) 18
2024 March 27
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G03F 7/20 - Exposure; Apparatus therefor 1,270
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or 617
H04N 5/232 - Devices for controlling television cameras, e.g. remote control 525
H04N 5/225 - Television cameras 426
G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration 306
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09 - Scientific and electric apparatus and instruments 356
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1.

VISUAL FIELD TESTING METHOD, VISUAL FIELD TESTING DEVICE, AND VISUAL FIELD TESTING PROGRAM

      
Application Number 18538297
Status Pending
Filing Date 2023-12-13
First Publication Date 2024-04-18
Owner NIKON CORPORATION (Japan)
Inventor
  • Nakamura, Chikara
  • Aoki, Taishi
  • Horikawa, Teruo
  • Osawa, Hisao

Abstract

A visual field testing method is a visual field testing method of testing a visual field range divided into at least a first partial area and a second partial area, the method including: a step of measuring sensitivities of a plural first test points that are included in the first partial area: and a step of performing a process of estimating sensitivities of a plural second test points that are included in the first partial area and are test points other than the first test points, by using the sensitivities of the plural first test points.

IPC Classes  ?

  • A61B 3/024 - Subjective types, i.e. testing apparatus requiring the active assistance of the patient for determining the visual field, e.g. perimeter types

2.

SPATIAL LIGHT MODULATION UNIT AND EXPOSURE APPARATUS

      
Application Number 18394369
Status Pending
Filing Date 2023-12-22
First Publication Date 2024-04-18
Owner NIKON CORPORATION (Japan)
Inventor
  • Kubota, Yasuhito
  • Mizuno, Yasushi
  • Kato, Masaki
  • Nishimura, Masaki
  • Mizuno, Hitoshi

Abstract

A spatial light modulation unit is used in an exposure apparatus that exposes an exposure pattern onto a photosensitive substrate while moving the photosensitive substrate in a scan direction. The spatial light modulation unit includes: a spatial light modulator having a plurality of elements; a controller that controls the plurality of elements in accordance with the exposure pattern; and a SLM substrate on which the spatial light modulator and the controller are provided. The controller is arranged side by side in the scan direction with respect to the spatial light modulator.

IPC Classes  ?

  • G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

3.

IMAGE PROCESSING METHOD, IMAGE PROCESSING DEVICE, AND PROGRAM

      
Application Number 17769318
Status Pending
Filing Date 2019-10-15
First Publication Date 2024-04-18
Owner Nikon Corporation (Japan)
Inventor
  • Hirokawa, Mariko
  • Tanabe, Yasushi

Abstract

A processor identifies a first position of a vortex vein from a first fundus image, identifies a second position of the vortex vein from a second fundus image, and generates data of a screen to display the first position and the second position.

IPC Classes  ?

  • G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods
  • G06T 7/00 - Image analysis
  • G16H 30/40 - ICT specially adapted for the handling or processing of medical images for processing medical images, e.g. editing
  • G16H 50/50 - ICT specially adapted for medical diagnosis, medical simulation or medical data mining; ICT specially adapted for detecting, monitoring or modelling epidemics or pandemics for simulation or modelling of medical disorders

4.

EXPOSURE APPARATUS, CONTROL METHOD, AND DEVICE MANUFACTURING METHOD

      
Application Number 18542169
Status Pending
Filing Date 2023-12-15
First Publication Date 2024-04-18
Owner NIKON CORPORATION (Japan)
Inventor
  • Kato, Masaki
  • Mizuno, Yasushi
  • Nakashima, Toshiharu
  • Fujimura, Yoshihiko

Abstract

An exposure apparatus includes a substrate holder configured to hold a substrate and move, a module including a spatial light modulator having light modulation elements that are two-dimensionally arranged, an illumination unit irradiating the spatial light modulator with illumination lights, and a projection unit guiding the illumination light from the light modulation elements to respective light irradiation areas that are two-dimensionally arranged on the substrate in first and second directions, and a control unit configured to drive the substrate holder in a scanning direction, wherein the light modulation elements are two-dimensionally arranged to be inclined at a predetermined angle θ (0°<θ<90°) with respect to the scanning direction and a non-scanning direction orthogonal to the scanning direction, and when a predetermined region of the substrate is exposed, the control unit scans the substrate holder at such a speed that spot positions are arranged in a staggered arrangement.

IPC Classes  ?

  • G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

5.

PROCESSING SYSTEM

      
Application Number 18274836
Status Pending
Filing Date 2021-12-08
First Publication Date 2024-04-18
Owner NIKON CORPORATION (Japan)
Inventor Ueno, Kazuki

Abstract

A processing system includes: a processing apparatus configured to perform an additive processing on a plurality of objects; and a control apparatus configured to control the processing apparatus, the control apparatus generates, based on a result of a first measurement operation for measuring a shape of a first object of the plurality of objects, first processing control information for controlling the processing apparatus to perform the additive processing on the first object, the processing apparatus performs, based on the first processing control information, the additive processing on the first object and the additive processing on a second object of the plurality of objects that is different from the first object.

IPC Classes  ?

  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
  • B22F 10/31 - Calibration of process steps or apparatus settings, e.g. before or during manufacturing
  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes
  • B22F 12/53 - Nozzles
  • B22F 12/55 - Two or more means for feeding material
  • B22F 12/70 - Gas flow means
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 40/00 - Auxiliary operations or equipment, e.g. for material handling
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

6.

Solid state imaging device

      
Application Number 16689233
Grant Number RE049928
Status In Force
Filing Date 2019-11-20
First Publication Date 2024-04-16
Grant Date 2024-04-16
Owner NIKON CORPORATION (Japan)
Inventor Shima, Toru

Abstract

A plurality of pixels PX include effective pixels and optical black pixels. Signal lines VL are provided corresponding to each column of the pixels PX and supplied with output signals of the pixels PX of the corresponding column. Clip transistors CL are provided corresponding to the respective signal lines VL and limit a potential of the corresponding vertical signal lines VL based on a gate potential. At least in a predetermined operating mode, a potential Vclip_dark is supplied to a gate of one of the clip transistors CL corresponding to at least one pixel column formed of the optical black pixels when reading a noise level from the pixels PX corresponding to the clip transistors CL and when reading a data level from the pixels PX corresponding to the clip transistors CL.

IPC Classes  ?

  • H01L 27/146 - Imager structures
  • H04N 25/627 - Detection or reduction of inverted contrast or eclipsing effects
  • H04N 25/63 - Noise processing, e.g. detecting, correcting, reducing or removing noise applied to dark current
  • H04N 25/673 - Noise processing, e.g. detecting, correcting, reducing or removing noise applied to fixed-pattern noise, e.g. non-uniformity of response for non-uniformity detection or correction by using reference sources
  • H04N 25/76 - Addressed sensors, e.g. MOS or CMOS sensors
  • H04N 25/767 - Horizontal readout lines, multiplexers or registers

7.

ZOOM OPTICAL SYSTEM, OPTICAL APPARATUS AND METHOD FOR MANUFACTURING THE ZOOM OPTICAL SYSTEM

      
Application Number 18276028
Status Pending
Filing Date 2022-02-17
First Publication Date 2024-04-11
Owner Nikon Corporation (Japan)
Inventor
  • Sashima, Tomoyuki
  • Ishikawa, Takahiro
  • Ohtake, Fumiaki

Abstract

A variable magnification optical system (ZL) comprises a first lens group (G1) having negative refractive power, and a rear group (GR) having at least one lens group, the distance between lens groups adjacent to each other changes when the magnification is changed, and the following conditional expression is satisfied. 0.90

IPC Classes  ?

  • G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
  • G02B 13/02 - Telephoto objectives, i.e. systems of the type + – in which the distance from the front vertex to the image plane is less than the equivalent focal length

8.

EXPOSURE APPARATUS AND WIRING PATTERN FORMING METHOD

      
Application Number 18543635
Status Pending
Filing Date 2023-12-18
First Publication Date 2024-04-11
Owner Nikon Corporation (Japan)
Inventor
  • Kato, Masaki
  • Mezuno, Yasushi

Abstract

An exposure apparatus includes a spatial light modulator, a calculation unit configured to calculate positions of first connection portions of a first semiconductor chip provided on a substrate and positions of second connection portions of a second semiconductor chip provided on the substrate, based on a first position measurement result, a second position measurement result, and design information of the first connection portions and the second connection portions, the first position measurement result being a measurement result of positions of measurement points on the first semiconductor chip, the second position measurement result being a measurement result of positions of measurement points on the second semiconductor chip, and an exposure processing unit configured to control the spatial light modulator based on a calculation result by the calculation unit so as to expose wiring patterns connecting the first connection portions and the second connection portions.

IPC Classes  ?

9.

EXPOSURE METHOD AND EXPOSURE DEVICE

      
Application Number JP2023029125
Publication Number 2024/075396
Status In Force
Filing Date 2023-08-09
Publication Date 2024-04-11
Owner NIKON CORPORATION (Japan)
Inventor Murakami, Koichi

Abstract

This exposure method uses an exposure device comprising a spatial light modulator having two-dimensionally arranged multiple light modulation elements and an illumination unit for illuminating the spatial light modulator with illumination light, said method including: driving a substrate stage, which moves with a substrate being held thereon, in a scanning direction; and, when multiple first light modulation elements continuously disposed in the scanning direction among the multiple light modulation elements illuminate a predetermined region on the substrate with the illumination light as the substrate stage moves, adjusting a spot position indicating the center of the illumination light emitted from the multiple first light modulation elements to one of multiple predetermined positions within the predetermined region.

IPC Classes  ?

10.

DEVICE FOR PRODUCING GLASS, GLASS, OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR PRODUCING GLASS

      
Application Number JP2023034928
Publication Number 2024/075593
Status In Force
Filing Date 2023-09-26
Publication Date 2024-04-11
Owner NIKON CORPORATION (Japan)
Inventor
  • Yoshimoto Kohei
  • Shibata Norio
  • Takasu Shuhei
  • Kawashima Tatsunori
  • Ozeki Ayumi

Abstract

A device for producing a glass through a step in which the temperature of a melt of a raw glass material is lowered, the device comprising a heating part for heating the raw glass material supported in a non-contact manner, a heating control unit which controls the heating amount in which the raw glass material is heated by the heating part, and a forming part in which the raw glass material in a molten state that has changed in temperature on the basis of the control of the heating amount by the heating control unit is formed.

IPC Classes  ?

11.

OPTICAL GLASS, OPTICAL ELEMENT, OPTICAL SYSTEM, CEMENTED LENS, INTERCHANGEABLE CAMERA LENS, MICROSCOPE OBJECTIVE LENS, AND OPTICAL DEVICE

      
Application Number 18538353
Status Pending
Filing Date 2023-12-13
First Publication Date 2024-04-11
Owner NIKON CORPORATION (Japan)
Inventor
  • Takasu, Shuhei
  • Yoshimoto, Kohei

Abstract

An optical glass comprising: by cation %, more than 0% and up to 40% of a content rate of La3+; 15% to 65% of a content rate of Ti4+; and more than 0% and up to 20% of a content rate of Zr4+; wherein a refractive index (nd) with respect to a d-line is from 2.00 to 2.35.

IPC Classes  ?

  • C03C 3/068 - Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
  • G02B 1/02 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semiconductors

12.

LIGHT AMPLIFICATION APPARATUS AND LIGHT AMPLIFICATION METHOD

      
Application Number 18197771
Status Pending
Filing Date 2023-05-16
First Publication Date 2024-04-04
Owner NIKON CORPORATION (Japan)
Inventor Tokuhisa, Akira

Abstract

A light amplification apparatus includes: an optical fiber amplification unit that amplifies two pulse laser light having at least a first wavelength λ1 and a second wavelength λ2 that are different from each other while propagating the two pulse laser light with a time difference and outputs first amplified light and second amplified light that are amplified light of the pulse laser light; and an optical distance adjustment unit that differentiates optical distances at which the first amplified light and the second amplified light that are emitted from the optical fiber amplification unit propagate and superimposes the first amplified light and the second amplified light on each other.

IPC Classes  ?

  • H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
  • H01S 3/067 - Fibre lasers

13.

IMAGE SENSOR

      
Application Number 18387150
Status Pending
Filing Date 2023-11-06
First Publication Date 2024-04-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Ando, Ryoji
  • Watanabe, Yoshiyuki

Abstract

An image sensor includes: a photoelectric conversion unit that photoelectrically converts light to generate an electric charge; a holding unit that holds the electric charge generated by the photoelectric conversion unit; an accumulation unit that accumulates the electric charge generated by the photoelectric conversion unit; a first transfer path that transfers the electric charge generated by the photoelectric conversion unit to the accumulation unit; and a second transfer path that transfers the electric charge generated by the photoelectric conversion unit to the accumulation unit via the holding unit.

IPC Classes  ?

  • H04N 25/75 - Circuitry for providing, modifying or processing image signals from the pixel array
  • H01L 27/146 - Imager structures
  • H04N 25/59 - Control of the dynamic range by controlling the amount of charge storable in the pixel, e.g. modification of the charge conversion ratio of the floating node capacitance
  • H04N 25/77 - Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
  • H04N 25/771 - Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising storage means other than floating diffusion

14.

EXPOSURE APPARATUS AND INSPECTION METHOD

      
Application Number 18528108
Status Pending
Filing Date 2023-12-04
First Publication Date 2024-04-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Kato, Masaki
  • Mizuno, Hitoshi
  • Mizuno, Yasushi

Abstract

An exposure apparatus exposes an object to pattern light generated by a spatial light modulator having a plurality of elements in accordance with drawing data. The exposure apparatus includes a data output unit configured to output the drawing data to the spatial light modulator, an illumination optical system configured to irradiate the spatial light modulator with illumination light, a first movable body configured to hold the object, a projection optical system configured to project an image of the pattern light generated by the spatial light modulator onto the object, a detection unit configured to detect the image of the pattern light that has been projected, and a determination unit configured to determine whether the spatial light modulator is capable of generating pattern light in accordance with the drawing data output from the data output unit, based on a detection result of the detection unit.

IPC Classes  ?

  • G01M 11/02 - Testing optical properties
  • G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

15.

CALCULATION DEVICE, CALCULATION SYSTEM, ROBOT SYSTEM, CALCULATION METHOD AND COMPUTER PROGRAM

      
Application Number JP2022036535
Publication Number 2024/069886
Status In Force
Filing Date 2022-09-29
Publication Date 2024-04-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Koyanagi, Daisuke
  • Kinoshita, Shinichiro

Abstract

This calculation device is equipped with: a control unit for outputting a control signal for controlling an imaging unit and a robot to which the imaging unit is provided; and a learning unit for generating a model for determining a parameter for calculation processing in the control unit by learning using imaging results of a learning target object from the imaging unit. The control unit drives the robot in a manner such that the imaging unit has a prescribed positional relationship relative to the learning target object, and outputs a first control signal for causing the imaging unit to image the learning target object while in the prescribed positional relationship. The learning unit generates a model by learning using learning image data generated by imaging the learning target object using the imaging unit while in the prescribed positional relationship according to a control based on the first control signal. The control unit calculates the position and/or orientation of a processing target object by performing calculation processing by using the parameter determined using the model, and the processing target image data generated as a result of the imaging unit imaging a processing target object, the shape of which is substantially identical to that of the learning target object.

IPC Classes  ?

  • B25J 19/04 - Viewing devices
  • B25J 13/00 - Controls for manipulators
  • B25J 13/08 - Controls for manipulators by means of sensing devices, e.g. viewing or touching devices
  • G06T 1/00 - General purpose image data processing
  • G06T 7/00 - Image analysis

16.

OPTICAL GLASS, OPTICAL ELEMENT, OPTICAL SYSTEM, CEMENTED LENS, OBJECTIVE LENS FOR MICROSCOPE, INTERCHANGEABLE LENS FOR CAMERA, AND OPTICAL DEVICE

      
Application Number JP2023032958
Publication Number 2024/070613
Status In Force
Filing Date 2023-09-11
Publication Date 2024-04-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Takasu Shuhei
  • Yoshimoto Kohei

Abstract

An optical glass in which La3+content: 5 to 35%, Si4+content: 5 to 25%, Nb5+content: 5 to 35%, Al3+content: 5 to 35%, and total content of Ti4+, Zr4+, Nb5+, Ta5+, and Al3+(Ti4++Zr4++Nb5++Ta5++al3+): 45 to 80%, expressed in mol% of cation.

IPC Classes  ?

  • C03C 3/097 - Glass compositions containing silica with 40% to 90% silica by weight containing phosphorus, niobium or tantalum
  • G02B 1/00 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements

17.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023035060
Publication Number 2024/071161
Status In Force
Filing Date 2023-09-27
Publication Date 2024-04-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Ono, Takuro
  • Machida, Kosuke

Abstract

This optical system (OL) comprises, sequentially along the optical axis from the object side: a first lens group having a positive refractive power; a second lens group having a negative refractive power; a third lens group having a positive refractive power; a fourth lens group having a positive refractive power; and a fifth lens group having a negative refractive power. When focusing is performed, the second lens group and the fourth lens group move along the optical axis and the following conditional expression is satisfied. Conditional expression:0.50 < f1/f3 < 2.00 (Therein, f1 is the focal distance of the first lens group, and f3 is the focal distance of the third lens group.).

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

18.

EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE

      
Application Number 18538032
Status Pending
Filing Date 2023-12-13
First Publication Date 2024-04-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Kato, Masaki
  • Mizuno, Hitoshi
  • Mizuno, Yasushi

Abstract

An exposure apparatus includes an illumination optical system, a spatial light modulator illuminated by light from the illumination optical system, a projection optical system that irradiates an exposure target with light emitted from the spatial light modulator, a stage on which the exposure target is placed to perform a relative movement between the exposure target and the projection optical system relative to each other in a predetermined scanning direction, and a controller that has a storage in which information relating to exposure pattern is stored and controls exposure for the exposure target. The controller controls the exposure for the exposure target so that a first step of performing a first exposure based on the information relating to the exposure pattern and a second step of performing a second exposure based on at least a portion of the information relating to the exposure pattern used in the first step are executed.

IPC Classes  ?

  • G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

19.

LENS BARREL AND IMAGING DEVICE

      
Application Number 18266509
Status Pending
Filing Date 2021-12-20
First Publication Date 2024-03-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Muto, Azusa
  • Ashizawa, Takatoshi

Abstract

A lens barrel includes first and second yokes each having a length in an optical axis direction, a third yoke that has a length in the optical axis direction and is disposed between the first and second yokes, first and second magnets disposed on the first and second yokes, respectively, a coil that is penetrated by the third yoke and is movable in the optical axis direction by magnetic forces of the first and second magnets, and a lens holding frame that holds a lens and is movable together with the coil in the optical axis direction, wherein a first plane including a first side surface, which is farther from the third yoke, of the first yoke intersects with a second plane including a second side surface, which is farther from the third yoke, of the second yoke.

IPC Classes  ?

  • G02B 7/04 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification

20.

IMAGE CAPTURING ELEMENT AND IMAGE CAPTURING APPARATUS

      
Application Number 18375148
Status Pending
Filing Date 2023-09-29
First Publication Date 2024-03-28
Owner NIKON CORPORATION (Japan)
Inventor Nakanishi, Sota

Abstract

An image capturing element includes a first substrate having a plurality of pixel blocks including at least one pixel, the plurality of pixel blocks being arranged to be aligned in a row direction and a column direction, and a second substrate having a plurality of control blocks including a conversion unit which converts a signal output from the pixel into a digital signal and a through electrode unit configured to output the signal converted into the digital signal by the conversion unit, the plurality of control blocks being arranged to be aligned in the row direction and the column direction.

IPC Classes  ?

  • H04N 25/772 - Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising A/D, V/T, V/F, I/T or I/F converters

21.

ENCODER DEVICE, DRIVE DEVICE, STAGE DEVICE, AND ROBOT DEVICE

      
Application Number 18519883
Status Pending
Filing Date 2023-11-27
First Publication Date 2024-03-28
Owner NIKON CORPORATION (Japan)
Inventor Watanabe, Akihiro

Abstract

An encoder device including a position detection unit for detecting position information of a moving part; a magnet having a plurality of polarities along a moving direction of the moving part; and an electric signal generation unit for generating an electric signal, based on a magnetic characteristic of a magnetosensitive part, the electric signal generation unit having the magnetosensitive part whose magnetic characteristic is changed by a change in magnetic field associated with relative movement to the magnet, wherein the magnetosensitive part is disposed so that the magnetosensitive part is spaced apart from a side surface of the magnet in a direction orthogonal to the moving direction and a length direction of the magnetosensitive part is orthogonal to tangential directions of at least some of magnetic field lines of the magnet.

IPC Classes  ?

  • B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
  • B25J 19/02 - Sensing devices
  • G01D 5/245 - Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means generating pulses or pulse trains using a variable number of pulses in a train

22.

ZOOM LENS AND IMAGING DEVICE

      
Application Number JP2023032963
Publication Number 2024/062958
Status In Force
Filing Date 2023-09-11
Publication Date 2024-03-28
Owner
  • TAMRON CO., LTD. (Japan)
  • NIKON CORPORATION (Japan)
Inventor
  • Yamanaka, Hisayuki
  • Takahashi, Jun
  • Take, Toshinori
  • Koida, Keigo

Abstract

Provided are a zooming lens and an imaging device that are small and light-weight, and have high optical performance. The zooming lens (30) comprises, in order from the object side, a negative front group and a positive rear group. The front group includes, in order from the object side, a positive lens group G1 (G1) and a negative composite lens group Gn (G2). The rear group includes a positive composite lens group Gp (G3), a negative lens group Gf (G4), and a negative lens group Gr (G5). The zooming lens (30) have specific optical characteristics expressed by two specific expressions.

IPC Classes  ?

  • G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

23.

BLADE MEMBER AND STRUCTURAL MEMBER

      
Application Number 18275367
Status Pending
Filing Date 2021-02-05
First Publication Date 2024-03-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Shiraishi, Masayuki
  • Kurashima, Takahiro
  • Ogasawara, Baku

Abstract

A blade member on a surface of which a groove structure is formed, wherein the groove structure includes a plurality of first groove structures, a plurality of second groove structures, and a third groove structure, the plurality of first groove structures are formed to extend in a first direction, the plurality of second groove structures are formed to extend in a second direction that is different from the first direction, the third groove structure extends along a third direction that is different from the first and second directions, and is formed between one first groove structure and one second groove structure.

IPC Classes  ?

24.

SHAPING APPARATUS AND SHAPING METHOD

      
Application Number 18527642
Status Pending
Filing Date 2023-12-04
First Publication Date 2024-03-28
Owner NIKON CORPORATION (Japan)
Inventor Shibazaki, Yuichi

Abstract

A shaping apparatus is equipped with: a beam shaping system having a beam irradiation section that includes a condensing optical system which emits a beam and a material processing section which supplies a shaping material irradiated by the beam from the beam irradiation section; and a controller which, on the basis of 3D data of a three-dimensional shaped object to be formed on a target surface, controls a workpiece movement system and the beam shaping system such that a target portion on the target surface is shaped by supplying the shaping material from the material processing section while moving the beam from the beam irradiation section and the target surface on a workpiece (or a table) relative to each other. Further the intensity distribution of the beam in the shaping plane facing the emitting surface of the condensing optical system can be modified.

IPC Classes  ?

  • B23K 26/06 - Shaping the laser beam, e.g. by masks or multi-focusing
  • B22F 12/00 - Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
  • B22F 12/44 - Radiation means characterised by the configuration of the radiation means
  • B22F 12/45 - Two or more
  • B22F 12/53 - Nozzles
  • B23K 26/08 - Devices involving relative movement between laser beam and workpiece
  • B23K 26/144 - Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor the fluid stream containing particles, e.g. powder
  • B23K 26/342 - Build-up welding
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

25.

EXPOSURE APPARATUS

      
Application Number 18528903
Status Pending
Filing Date 2023-12-05
First Publication Date 2024-03-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Kato, Masaki
  • Mizuno, Yasushi

Abstract

An exposure apparatus includes an exposure module that includes a spatial light modulator and projects and exposes pattern light generated by the spatial light modulator onto a substrate, and a determination unit configured to, when a plurality of substrates scheduled to be arranged on a substrate holder include a first substrate having a defect, determine a plurality of substrates to be arranged on the substrate holder from the plurality of substrates scheduled to be arranged on the substrate holder, based on a predetermined handling method for the first substrate.

IPC Classes  ?

26.

EXPOSURE APPARATUS, EXPOSURE METHOD, AND FLAT PANEL DISPLAY MANUFACTURING METHOD

      
Application Number 18535470
Status Pending
Filing Date 2023-12-11
First Publication Date 2024-03-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Kato, Masaki
  • Mizuno, Hitoshi
  • Mizuno, Yasushi

Abstract

An exposure apparatus includes: an illumination optical system; a spatial light modulator; a projection optical system that illuminates an exposure target with light emitted from the spatial light modulator; and a stage where the exposure target is placed, wherein by the stage moving the exposure target in a predetermined scan direction, the light illuminates the exposure target by the projection optical system scans on the exposure target, the spatial light modulator includes a plurality of mirrors that rotates around a tilt axis extending in a direction orthogonal to both the scan and an optical axis directions of the projection optical system, the mirrors become an ON state by adjusting a tilt of each mirror relative to the scan direction and thereby emit light to the system, and the exposure apparatus includes an angle adjustment mechanism that adjusts a tilt angle of the spatial light modulator relative to the scan direction.

IPC Classes  ?

  • G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light

27.

CONVERSION METHOD, OPTICAL DEVICE, AND OPTICAL MICROSCOPE

      
Application Number JP2022035205
Publication Number 2024/062564
Status In Force
Filing Date 2022-09-21
Publication Date 2024-03-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Dake, Fumihiro
  • Kawai, Hitoshi

Abstract

[Problem] To improve practicality. [Solution] This conversion method includes the feature of converting, by means of a conversion unit, the repetition frequency of pulsed light emitted from a light source, and the feature wherein the repetition frequency converted by the conversion unit is variable.

IPC Classes  ?

28.

IMAGE DISPLAY METHOD, STORAGE MEDIUM, AND IMAGE DISPLAY DEVICE

      
Application Number 18523655
Status Pending
Filing Date 2023-11-29
First Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor Hirokawa, Mariko

Abstract

An image display method executed by a processor comprises displaying a screen including a two-dimensional fundus image of an examined eye and a three-dimensional eyeball image of the examined eye, finding a second region in the three-dimensional eyeball image that corresponds to a first region specified in the two-dimensional fundus image, and displaying a mark indicating the second region in the three-dimensional eyeball image.

IPC Classes  ?

  • A61B 5/00 - Measuring for diagnostic purposes ; Identification of persons
  • A61B 3/00 - Apparatus for testing the eyes; Instruments for examining the eyes
  • G06T 7/00 - Image analysis

29.

PROCESSING SYSTEM, DATA STRUCTURE, AND PROCESSING METHOD

      
Application Number JP2022034586
Publication Number 2024/057496
Status In Force
Filing Date 2022-09-15
Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor
  • Funatsu Takayuki
  • Kitsuda Shin
  • Ichijo Tsukasa

Abstract

Provided is a processing system comprising a processing device which includes an emission optical system and a material supply unit and shapes a shaped object, a measurement device which acquires information relating to the size of a melt pool formed by emission of a processing beam, a recording device which records the information relating to the size of the melt pool in association with information relating to the position of the melt pool, and a control device. The control device controls the processing device such that the size of the melt pool formed by the emission of the processing beam matches the size of the melt pool read from the recording device.

IPC Classes  ?

  • B23K 26/34 - Laser welding for purposes other than joining

30.

LENS BARREL AND IMAGING DEVICE

      
Application Number JP2023033206
Publication Number 2024/058175
Status In Force
Filing Date 2023-09-12
Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor
  • Imaei, Ichiro
  • Shimizu, Kunihiko

Abstract

To improve usability of a lens barrel, this lens barrel comprises a lens, a rotatable ring that is rotatable around the optical axis of the lens and has an uneven surface and flat surface on the inner periphery thereof, an operation part to be operated by a user, and a movable member that has a first protrusion that comes into contact with the uneven surface or the flat surface and is capable of moving between a first position, at which the first protrusion comes into contact with the uneven surface, and a second position, at which the first protrusion comes into contact with the flat surface, according to an operation of the operation part. When the movable member is at the first position, rotation of the rotatable ring causes the first protrusion to slide against the uneven surface to generate click sensation.

IPC Classes  ?

  • G02B 7/02 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses
  • G03B 17/02 - Bodies
  • G05G 1/10 - Controlling members for hand-actuation by rotary movement, e.g. hand wheels - Details, e.g. of discs, knobs, wheels or handles
  • G05G 5/03 - Means for enhancing the operator's awareness of the arrival of the controlling member at a command or datum position; Providing feel, e.g. means for creating a counterforce

31.

OPTICAL DEVICE, OPTICAL MACHINING DEVICE, MICROSCOPE DEVICE, AND SCANNING METHOD

      
Application Number JP2023033478
Publication Number 2024/058237
Status In Force
Filing Date 2023-09-14
Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor Tokuhisa, Akira

Abstract

An optical device (10) of an optical machining device (1) includes: an optical fiber amplifier that amplifies pulsed light; a diffraction grating (12) that disperses, by a diffraction phenomenon, pulsed light (PL) output from the optical fiber amplifier; a collimator lens (13) that collimates the pulsed light (PL) scattered at the diffraction grating (12); and an objective lens (17) that condenses the pulsed light (PL) transmitted through the collimator lens (13). By changing the amplification rate of the optical fiber amplifier, the position at which time focus occurs is changed in the optical axis direction of the objective lens (17).

IPC Classes  ?

  • G02B 21/06 - Means for illuminating specimen
  • B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
  • G02B 26/10 - Scanning systems
  • G02F 1/365 - Non-linear optics in an optical waveguide structure
  • H01S 3/067 - Fibre lasers
  • H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

32.

GLASS COMPOSITION AND REFERENCE GLASS SAMPLE

      
Application Number JP2022034568
Publication Number 2024/057484
Status In Force
Filing Date 2022-09-15
Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor
  • Yoshimoto Kohei
  • Fujiwara Miki
  • Shinohara Kiyoaki

Abstract

This glass composition includes: a main component; and at least any one of the following additional components introduced into the glass composition at a ratio of more than 0 to 1500 mg/kg per each additional component: Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Zr, Nb, Mo, Hf, Ta, W, Sc, Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Rb, Cs, Ba, Ga, Ge, In, Sn, Sb, Pb, Bi, Au, Pt, Ag, Ir, Pd, Rh, Ru, Re, F, Cl, Br, I, and S.

IPC Classes  ?

  • C03C 3/12 - Silica-free oxide glass compositions

33.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023021326
Publication Number 2024/057640
Status In Force
Filing Date 2023-06-08
Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor Komatsubara Yoko

Abstract

Provided are an optical system capable of obtaining bright and good optical performance while achieving size reduction, an optical device, and a method for manufacturing an optical system. An optical system OL used in an optical device such as a camera 1 comprises, in order from the object side, a front group Gf having positive refractive power, an intermediate group Gi, and a rear group Gr having negative refractive power. The intermediate group Gi comprises a first focusing group GF1 and a second focusing group GF2 that move along different trajectories at the time of focusing. The front group Gf has, in order from the side closest to the object, a negative lens component Ln1, a negative lens component Ln2, and a positive lens component Lp, and the rear group G4 has a negative lens component LnL on the side closest to an image surface. The optical system satisfies conditions expressed by predetermined conditional expressions.

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

34.

ENCODER, DECODER, ENCODING METHOD, DECODING METHOD, AND RECORDING MEDIUM

      
Application Number 18515575
Status Pending
Filing Date 2023-11-21
First Publication Date 2024-03-14
Owner NIKON CORPORATION (Japan)
Inventor
  • Ando, Ichiro
  • Takahashi, Masaya

Abstract

An encoder includes: a correction unit configured to execute gradation correction on RAW image data from an image capture element having optical black on the basis of a gamma coefficient and an optical black value of the optical black; and an encoding unit configured to encode gradation correction RAW image data that has undergone gradation correction by the correction unit.

IPC Classes  ?

  • H04N 9/64 - Circuits for processing colour signals
  • H04N 1/407 - Control or modification of tonal gradation or of extreme levels, e.g. background level
  • H04N 1/60 - Colour correction or control
  • H04N 19/85 - Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using pre-processing or post-processing specially adapted for video compression
  • H04N 23/76 - Circuitry for compensating brightness variation in the scene by influencing the image signals

35.

IMAGE PROCESSING DEVICE, ANALYSIS DEVICE, IMAGE PROCESSING METHOD, IMAGE PROCESSING PROGRAM, AND DISPLAY DEVICE

      
Application Number 18517416
Status Pending
Filing Date 2023-11-22
First Publication Date 2024-03-14
Owner
  • NIKON CORPORATION (Japan)
  • THE UNIVERSITY OF TOKYO (Japan)
Inventor
  • Imai, Kenta
  • Masutani, Mamiko
  • Murata, Masayuki
  • Kano, Fumi
  • Noguchi, Yoshiyuki

Abstract

An image processing device includes a determination unit configured to determine a type of autophagy induced in a cell, based on information indicative of autophagic activity in the cell present in a cell image in which the cell is image captured and based on information indicative of congestion of molecules in the cell present in the cell image.

IPC Classes  ?

  • G01N 33/50 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing

36.

INFORMATION PROCESSING DEVICE

      
Application Number 18517797
Status Pending
Filing Date 2023-11-22
First Publication Date 2024-03-14
Owner NIKON CORPORATION (Japan)
Inventor
  • Hoshuyama, Hideo
  • Akiya, Hiroyuki
  • Umeyama, Kazuya
  • Nitta, Keiichi
  • Uwai, Hiroki
  • Sekiguchi, Masakazu

Abstract

To take security into account and increase user friendliness, an information processing device includes: an input unit to which information is input; an extracting unit extracting predetermined words from the information input to the input unit; a classifying unit classifying the words extracted by the extracting unit into first words and second words; and a converting unit converting the first words by a first conversion method and converting the second words by a second conversion method, the second conversion method being different from the first conversion method.

IPC Classes  ?

  • G10L 15/22 - Procedures used during a speech recognition process, e.g. man-machine dialog
  • G06F 3/16 - Sound input; Sound output
  • G06F 16/25 - Integrating or interfacing systems involving database management systems
  • G06F 21/32 - User authentication using biometric data, e.g. fingerprints, iris scans or voiceprints
  • G06F 21/62 - Protecting access to data via a platform, e.g. using keys or access control rules
  • G10L 15/26 - Speech to text systems
  • G10L 15/30 - Distributed recognition, e.g. in client-server systems, for mobile phones or network applications

37.

ELECTRONIC APPARATUS, REPRODUCTION DEVICE, REPRODUCTION METHOD, RECORDING MEDIUM, AND RECORDING METHOD

      
Application Number 18518815
Status Pending
Filing Date 2023-11-24
First Publication Date 2024-03-14
Owner NIKON CORPORATION (Japan)
Inventor
  • Miyakawa, Yoshiaki
  • Yamagata, Naoki

Abstract

An electronic apparatus includes: an input unit that inputs data for imaging conditions for each of a plurality of imaging regions included in an image capturing unit, different imaging conditions being set for each of the imaging regions; and a recording control unit that correlates the data for imaging conditions inputted from the input unit with the imaging regions and records correlated data in a recording unit.

IPC Classes  ?

  • H04N 5/77 - Interface circuits between an apparatus for recording and another apparatus between a recording apparatus and a television camera
  • H04N 5/91 - Television signal processing therefor
  • H04N 5/92 - Transformation of the television signal for recording, e.g. modulation, frequency changing; Inverse transformation for playback
  • H04N 23/62 - Control of parameters via user interfaces
  • H04N 23/71 - Circuitry for evaluating the brightness variation
  • H04N 23/73 - Circuitry for compensating brightness variation in the scene by influencing the exposure time
  • H04N 23/76 - Circuitry for compensating brightness variation in the scene by influencing the image signals
  • H04N 25/40 - Extracting pixel data from image sensors by controlling scanning circuits, e.g. by modifying the number of pixels sampled or to be sampled

38.

ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY

      
Application Number 18383525
Status Pending
Filing Date 2023-10-25
First Publication Date 2024-03-14
Owner NIKON CORPORATION (Japan)
Inventor
  • Kato, Masaki
  • Mizuno, Yasushi
  • Kawado, Satoshi

Abstract

An illumination optical system configured to illuminate a mask on which a predetermined pattern is formed, includes a plurality of light sources configured to emit pulse lights, an optical system including a division part configured to divide the pulse lights emitted from the plurality of light sources into first pulse light and second pulse light, a delay optical system configured to guide the second pulse light to a second optical path longer than a first optical path through which the first pulse light passes, and a synthesis/division part configured to synthesize the first pulse light and the second pulse light passing through the delay optical system and divide and emit the synthesized pulse light, and an illumination system configured to guide the pulse lights emitted from the optical system to the mask and illuminate the mask.

IPC Classes  ?

39.

IMAGE SENSOR AND IMAGING DEVICE

      
Application Number 18388387
Status Pending
Filing Date 2023-11-09
First Publication Date 2024-03-14
Owner NIKON CORPORATION (Japan)
Inventor
  • Ogura, Daiki
  • Juen, Masahiro
  • Hirata, Tomoki
  • Matsumoto, Shigeru

Abstract

An image sensor, includes: a first pixel and a second pixel, in a first direction, each including a first photoelectric conversion unit and a light-shielding unit and outputting a signal; a third pixel and a fourth pixel, in the first direction, each including a second photoelectric conversion unit and outputting a signal; a first signal line and a second signal line, in the first direction, each of which can be connected to the first pixel, the second pixel, the third pixel and the fourth pixel; and a control unit that performs a first control in which a signal of the first pixel is output to the first signal line and a signal of the second pixel is output to the second signal line, and a second control in which a signal of the third pixel and a signal of the fourth pixel are output to the first signal line.

IPC Classes  ?

  • H04N 25/75 - Circuitry for providing, modifying or processing image signals from the pixel array
  • H01L 27/146 - Imager structures
  • H04N 25/704 - Pixels specially adapted for focusing, e.g. phase difference pixel sets
  • H04N 25/772 - Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising A/D, V/T, V/F, I/T or I/F converters

40.

ORGANIC SEMICONDUCTOR THIN FILM, TRANSISTOR, METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR THIN FILM, METHOD FOR PRODUCING TRANSISTOR, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

      
Application Number 18510867
Status Pending
Filing Date 2023-11-16
First Publication Date 2024-03-14
Owner
  • TOKYO INSTITUTE OF TECHNOLOGY (Japan)
  • NIKON CORPORATION (Japan)
Inventor
  • Hanna, Jun-Ichi
  • Wu, Hao
  • Iino, Hiroaki

Abstract

An organic semiconductor thin film including a liquid crystalline organic semiconductor, in which Qp and Qt to be measured using a predetermined measurement method satisfy a predetermined requirement (1) and a rocking scan pattern has a ratio Ipeak/Ibas, that is a ratio of Ipeak which is a peak intensity of a maximum peak with respect to Ibas which is a base line value, of less than 10: 0.06≤Qp/Qt≤0.5 . . . (1).

IPC Classes  ?

  • H10K 10/46 - Field-effect transistors, e.g. organic thin-film transistors [OTFT]
  • H10K 71/12 - Deposition of organic active material using liquid deposition, e.g. spin coating

41.

ZOOM OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING ZOOM OPTICAL SYSTEM

      
Application Number JP2023026980
Publication Number 2024/053269
Status In Force
Filing Date 2023-07-24
Publication Date 2024-03-14
Owner NIKON CORPORATION (Japan)
Inventor Uehara, Takeru

Abstract

A zoom optical system (ZL) includes, sequentially along an optical axis from an object side, a first lens group (G1) having negative refractive power, a second lens group (G2) having positive refractive power, a third lens group (G3) having negative refractive power, and a fourth lens group (G4) having positive refractive power, wherein, upon zooming, the first lens group (G1) is fixed with respect to the image surface and the intervals each between the neighboring lens groups change to satisfy the following conditional expressions. 0.70 < (-f1) / f2 < 1.30 0.55 < f2 / (-f3) < 1.20 where f1: focal length of the first lens group f2: focal length of the second lens group f3: focal length of the third lens group

IPC Classes  ?

  • G02B 15/167 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group having an additional fixed front lens or group of lenses
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

42.

VARIABLE MAGNIFICATION OPTICAL SYSTEM, OPTICAL APPARATUS, AND METHOD FOR PRODUCING VARIABLE MAGNIFICATION OPTICAL SYSTEM

      
Application Number 18367995
Status Pending
Filing Date 2023-09-13
First Publication Date 2024-03-07
Owner Nikon Corporation (Japan)
Inventor Umeda, Takeshi

Abstract

A variable magnification optical system comprising, in order from an object side, a first lens group having positive refractive power, a second lens group having negative refractive power, a third lens group having positive refractive power, and a rear lens group having negative refractive power; upon varying a magnification from a wide angle end state to a tele photo end state, a distance between the first lens group and the second lens group being varied, a distance between the second lens group and the third lens group being varied, and a distance between the third lens group and the rear lens group being varied; the third lens group or the rear lens group comprising a focusing lens group which is moved upon carrying out focusing from an infinitely distant object to a closely distant object; and predetermined conditional expression(s) being satisfied, thereby various aberrations being corrected superbly.

IPC Classes  ?

  • G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective

43.

BUILD SYSTEM

      
Application Number 18272380
Status Pending
Filing Date 2021-01-22
First Publication Date 2024-03-07
Owner NIKON CORPORATION (Japan)
Inventor
  • Ueno, Kazuki
  • Ishikawa, Motofusa
  • Yasuba, Koichi
  • Sekiguchi, Kei
  • Masuda, Atsuko
  • Shiki, Fumika

Abstract

A build system includes: a build apparatus including an energy beam irradiation unit, a material supply unit, and a control apparatus. The build system builds a second object above a first object including a first space. The second object includes: a first inclination part connected to the first object; a second inclination part connected to the first object; and a connection part that connects a tip of the first inclination part and a tip of the second inclination part. The build system builds the first inclination part and the second inclination part by alternately performing a building of a part of the first inclination part and a building of a part of the second inclination part. A second space below the first inclination part and the second inclination part is connected to the first space, and an upper part of the second space is closed by the connection part.

IPC Classes  ?

  • B23K 26/342 - Build-up welding
  • B23K 26/08 - Devices involving relative movement between laser beam and workpiece
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B33Y 80/00 - Products made by additive manufacturing

44.

AN IMAGE DETERMINING DEVICE TO DETERMINE THE STATE OF A SUBJECT

      
Application Number 18388375
Status Pending
Filing Date 2023-11-09
First Publication Date 2024-03-07
Owner NIKON CORPORATION (Japan)
Inventor
  • Yamamoto, Tetsuya
  • Nei, Masahiro
  • Totsuka, Isao
  • Matsuyama, Tomoyuki
  • Yanagihara, Masamitsu
  • Hagiwara, Satoshi
  • Sekiguchi, Masakazu

Abstract

To determine the state of a subject person with a simple structure, an image determining device includes: an imaging unit that captures an image from a first direction, the image including the subject person; a first detector that detects size information from the image, the size information being about the subject person in the first direction; a second detector that detects position-related information, the position-related information being different from the information detected by the first detector; and a determining unit that determines the state of the subject person, based on a result of the detection performed by the first detector and a result of the detection performed by the second detector.

IPC Classes  ?

  • G06V 40/10 - Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
  • G06T 7/30 - Determination of transform parameters for the alignment of images, i.e. image registration
  • G06T 7/70 - Determining position or orientation of objects or cameras
  • G08B 21/04 - Alarms for ensuring the safety of persons responsive to non-activity, e.g. of elderly persons
  • H04N 7/18 - Closed-circuit television [CCTV] systems, i.e. systems in which the video signal is not broadcast

45.

PROCESSING SYSTEM

      
Application Number JP2022032592
Publication Number 2024/047750
Status In Force
Filing Date 2022-08-30
Publication Date 2024-03-07
Owner NIKON CORPORATION (Japan)
Inventor Matsuda, Takeshi

Abstract

A processing system equipped with a partition device for demarcating a processing space, a first device for performing a first operation for changing the shape of an object by processing the object, which is housed in the processing space, and a second device for performing a second operation inside the processing space, wherein: the partition device is equipped with a movable opening member in which an opening is formed; the first device is inserted through the opening and positioned inside the processing space while the second device is positioned in an external space during a first interval during which the first device performs the first operation; and the second device is inserted through the opening and positioned inside the processing space while the first device is positioned in the external space during a second interval during which the second device performs a second operation.

IPC Classes  ?

  • B23K 26/12 - Working by laser beam, e.g. welding, cutting or boring in a special environment or atmosphere, e.g. in an enclosure
  • B23K 26/08 - Devices involving relative movement between laser beam and workpiece

46.

MACHINING SYSTEM

      
Application Number JP2022032062
Publication Number 2024/042681
Status In Force
Filing Date 2022-08-25
Publication Date 2024-02-29
Owner NIKON CORPORATION (Japan)
Inventor Matsuda, Takeshi

Abstract

A machining system SYS is capable of machining an object W by irradiating the object with an energy beam EL, and comprises: an emission optical system 130 that can emit the energy beam; a plurality of irradiation optical systems 135 that can irradiate the object with the energy beam emitted from the emission optical system, and that can be attached to the emission optical system; a plurality of hoods 136 that can be attached to the irradiation optical systems; and an attachment apparatus 17 that can attach one irradiation optical system from among the plurality of irradiation optical systems to the emission optical system, and that can attach one hood from among the plurality of hoods to said irradiation optical system.

IPC Classes  ?

  • B23K 26/00 - Working by laser beam, e.g. welding, cutting or boring

47.

PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, SUBSTRATE FOR PATTERN FORMATION, TRANSISTOR, PATTERN FORMATION METHOD, AND TRANSISTOR MANUFACTURING METHOD

      
Application Number JP2023030088
Publication Number 2024/043222
Status In Force
Filing Date 2023-08-22
Publication Date 2024-02-29
Owner NIKON CORPORATION (Japan)
Inventor
  • Kawakami Yusuke
  • Yamaguchi Kazuo
  • Itou Michiko

Abstract

This photosensitive surface treatment agent contains a compound represented by formula (M1). In formula (M1), R1represents a linear, branched, or cyclic alkyl group having 1-6 carbon atoms, and Y1represents a single bond or a linear or branched alkylene group having 1-4 carbon atoms. A carbon atom at the end of the alkyl group represented by R1may be bound to a carbon atom forming the alkylene group represented by Y1, to cause formation of a ring by R1and Y1. R2represents a hydrogen atom or an alkyl group having 1-6 carbon atoms, R3and R4 each independently represent an alkyl group having 1-3 carbon atoms, n0 represents an integer of 0 or more, and X represents a halogen atom or an alkoxy group.

IPC Classes  ?

  • G03C 1/72 - Photosensitive compositions not covered by groups
  • C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
  • H05K 1/03 - Use of materials for the substrate

48.

MEASUREMENT SYSTEM

      
Application Number JP2022032236
Publication Number 2024/042712
Status In Force
Filing Date 2022-08-26
Publication Date 2024-02-29
Owner NIKON CORPORATION (Japan)
Inventor
  • Miyakawa, Tomoki
  • Iwata, Hiroshi

Abstract

Provided is a measurement system comprising: an irradiation optical system capable of outputting measurement light; a mirror that reflects the measurement light; a first support mechanism that supports the mirror so that the mirror is rotatable around a first rotation axis; and a second support mechanism that supports the first support mechanism so that the first support mechanism is rotatable around a second rotation axis. The second support mechanism has: a movable portion that supports the first support mechanism at opposite ends in a direction along the first rotation axis and allows the first support mechanism to rotate around the second rotation axis; and a fixed portion that supports the movable portion at one side and an opposite side of the first support mechanism in a direction along the second rotation axis so that the movable portion is rotatable around the second rotation axis. The optical path of the measurement light is disposed at one side of the mirror in the direction along the second rotation axis. Wiring connected to an electrical component of the first support mechanism is disposed at an opposite side of the mirror in the direction along the second rotation axis. The measurement system changes the attitude of the mirror using the first support mechanism and the second support mechanism, so that the mirror reflects the measurement light toward an object being measured.

IPC Classes  ?

  • G01C 3/06 - Use of electric means to obtain final indication
  • G01C 15/00 - Surveying instruments or accessories not provided for in groups
  • G01S 7/481 - Constructional features, e.g. arrangements of optical elements
  • G01S 17/42 - Simultaneous measurement of distance and other coordinates

49.

PHOTOSENSITIVE SURFACE TREATMENT AGENT, PATTERN FORMATION SUBSTRATE, LAMINATE, TRANSISTOR, PATTERN FORMATION METHOD, AND TRANSISTOR MANUFACTURING METHOD

      
Application Number JP2023030083
Publication Number 2024/043221
Status In Force
Filing Date 2023-08-22
Publication Date 2024-02-29
Owner NIKON CORPORATION (Japan)
Inventor
  • Kawakami Yusuke
  • Yamaguchi Kazuo
  • Itou Michiko

Abstract

This photosensitive surface treatment agent contains a compound represented by formula (M1). (In formula (M1), R1represents a hydrogen atom, a tert-butoxycarbonyl group, or an ester-based protecting group, R2 represents a hydrogen atom or an alkyl group having 1-6 carbon atoms, m represents an integer equal to or greater than 1, and X represents a halogen atom or an alkoxy group.

IPC Classes  ?

  • G03C 1/72 - Photosensitive compositions not covered by groups
  • C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
  • H01L 21/288 - Deposition of conductive or insulating materials for electrodes from a liquid, e.g. electrolytic deposition
  • H01L 21/336 - Field-effect transistors with an insulated gate
  • H01L 29/786 - Thin-film transistors

50.

SYSTEMS AND METHODS FOR REDUCING VIBRATIONAL DISTURBANCES

      
Application Number 18383856
Status Pending
Filing Date 2023-10-25
First Publication Date 2024-02-22
Owner Nikon Corporation (Japan)
Inventor Bjork, Matthew Parker-Mccormick

Abstract

The problem of addressing vibrational disturbances in mechanical positioning systems is addressed by systems and methods that use a combination of active vibration dampening and passive vibration dampening. A system described herein generally comprises a mechanical positioning system; a payload; and a vibration dampening module coupled to the mechanical position system and to the payload. The vibration dampening module generally comprises an active vibration dampener and/or a passive vibration dampener.

IPC Classes  ?

  • G05B 19/404 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for compensation, e.g. for backlash, overshoot, tool offset, tool wear, temperature, machine construction errors, load, inertia

51.

ZOOM LENS, OPTICAL APPARATUS, AND A MANUFACTURING METHOD OF THE ZOOM LENS

      
Application Number 18385337
Status Pending
Filing Date 2023-10-30
First Publication Date 2024-02-22
Owner Nikon Corporation (Japan)
Inventor Koida, Keigo

Abstract

A zoom lens includes, in order from an object, a first lens group having a negative refractive power, a second lens group having a positive refractive power, a third lens group having a negative refractive power, and a fourth lens group. Zooming is performed by changing respective distances between the first and second lens groups, the second and third lens groups, and the third and fourth lens groups. The first lens group includes a negative lens disposed closest to the object, and a negative lens. Specified conditional expressions are satisfied.

IPC Classes  ?

  • G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
  • G02B 27/64 - Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
  • G02B 15/177 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a negative front lens or group of lenses
  • G02B 5/00 - Optical elements other than lenses

52.

ELECTRONIC DEVICE, IMAGING DEVICE, IMAGE REPRODUCTION METHOD, IMAGE REPRODUCTION PROGRAM, RECORDING MEDIUM WITH IMAGE REPRODUCTION PROGRAM RECORDED THEREUPON, AND IMAGE REPRODUCTION DEVICE

      
Application Number 18386928
Status Pending
Filing Date 2023-11-03
First Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Fujinawa, Nobuhiro
  • Mitsuhashi, Setsu
  • Sekiguchi, Masakazu
  • Kuriyama, Takashi
  • Nagamine, Hiroto
  • Takemoto, Masami
  • Toyama, Motoki

Abstract

An electronic device includes: a communication unit that performs communication with an external device; and a control unit that issues a command to the external device via the communication unit, on the basis of at least one of capacity of the external device, and capacity of the electronic device.

IPC Classes  ?

  • H04N 1/00 - PICTORIAL COMMUNICATION, e.g. TELEVISION - Details thereof
  • G06F 16/583 - Retrieval characterised by using metadata, e.g. metadata not derived from the content or metadata generated manually using metadata automatically derived from the content
  • H04N 5/77 - Interface circuits between an apparatus for recording and another apparatus between a recording apparatus and a television camera
  • H04N 5/907 - Television signal recording using static stores, e.g. storage tubes or semiconductor memories
  • H04N 9/804 - Transformation of the television signal for recording, e.g. modulation, frequency changing; Inverse transformation for playback involving pulse code modulation of the colour picture signal components
  • H04N 9/82 - Transformation of the television signal for recording, e.g. modulation, frequency changing; Inverse transformation for playback the individual colour picture signal components being recorded simultaneously only
  • H04N 23/61 - Control of cameras or camera modules based on recognised objects
  • H04N 23/62 - Control of parameters via user interfaces
  • H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums
  • H04N 23/611 - Control of cameras or camera modules based on recognised objects where the recognised objects include parts of the human body
  • H04N 23/63 - Control of cameras or camera modules by using electronic viewfinders
  • H04N 23/661 - Transmitting camera control signals through networks, e.g. control via the Internet
  • H04N 23/667 - Camera operation mode switching, e.g. between still and video, sport and normal or high and low resolution modes

53.

LIGHT SOURCE UNIT, ILLUMINATION UNIT, EXPOSURE DEVICE, AND EXPOSURE METHOD

      
Application Number JP2022031191
Publication Number 2024/038533
Status In Force
Filing Date 2022-08-18
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Iwanaga, Masaya
  • Kawado, Satoshi

Abstract

This light source unit comprises: a light source array in which a plurality of light source elements each having a light emitting unit that emits light are arrayed on a two-dimensional plane; and a magnification optical system that forms a magnified image of the light emitting units of each of the light source elements, wherein: the magnification optical system is a double telecentric optical system that magnifies and projects at magnification M; and when the array pitch of the light source elements is defined as p, the length of one side of a light emitting surface of the light source unit as a, the maximum emission angle of light having a radiation intensity greater than Lambertian radiation among the light emitted from the light emitting unit as α, and the maximum emission angle of light emitted from the magnification optical system as θ, the magnification M satisfies the condition of p/a

IPC Classes  ?

54.

LIGHTING UNIT, EXPOSURE DEVICE, AND EXPOSURE METHOD

      
Application Number JP2022031205
Publication Number 2024/038535
Status In Force
Filing Date 2022-08-18
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Iwanaga, Masaya
  • Kawado, Satoshi
  • Ohkawa, Tomoyuki
  • Nakatomi, Satoshi

Abstract

This lighting unit comprises: a first light source array (20A) in which a plurality of first light source elements each having a first light emitting section that emits light having a first wavelength characteristic is arranged; a first enlarging optical system (30A) that forms an enlarged image of the first light emitting section of each of the first light source elements; a first optical system (81A) into which light from the first enlarging optical system enters; a second light source array (20B) in which a plurality of second light source elements each having a second light emitting section that emits light having a second wavelength characteristic, which is different from the first wavelength characteristic, is arranged; a second enlarging optical system (30B) that forms an enlarged image of the second light emitting section of each of the second light source elements; a second optical system (81B) into which light from the second enlarging optical system enters; and a combining optical element (DM2) that combines the light from the first optical system with the light from the second optical system, wherein the combining optical element is located at the back focal position of the first optical system or a position close thereto and at the back focal position of the second optical system or a position close thereto.

IPC Classes  ?

55.

VARIABLE MAGNIFICATION OPTICAL SYSTEM, OPTICAL APPARATUS, AND METHOD FOR PRODUCING VARIABLE MAGNIFICATION OPTICAL SYSTEM

      
Application Number 18375375
Status Pending
Filing Date 2023-09-29
First Publication Date 2024-02-22
Owner Nikon Corporation (Japan)
Inventor Machida, Kosuke

Abstract

A variable magnification optical system comprising, in order from an object side, a first lens group having negative refractive power, a first intermediate lens group having positive refractive power, a second intermediate lens group and a rear lens group; upon varying a magnification from a wide angle end state to a telephoto end state, the first lens group being moved along the optical axis, a distance between the first lens group and the first intermediate lens group being varied, a distance between the first intermediate lens group and the second intermediate lens group being varied, and a distance between the second intermediate lens group and the rear lens group being varied; the rear lens group comprising at least one focusing lens group which is moved upon carrying out focusing from an infinitely distant object to a closely distant object; and predetermined conditional expressions being satisfied, thereby the focusing lens group(s) being reduced in weight.

IPC Classes  ?

  • G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
  • G02B 15/163 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group
  • G02B 15/177 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a negative front lens or group of lenses

56.

LIGHT SOURCE UNIT, ILLUMINATION UNIT, EXPOSURE DEVICE, AND EXPOSURE METHOD

      
Application Number JP2022031212
Publication Number 2024/038537
Status In Force
Filing Date 2022-08-18
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Yoshida, Ryohei
  • Suzuki, Tomonari
  • Sakurai, Yukiya
  • Indo, Masanari

Abstract

The purpose of the present invention is to, by inhibiting warpage or bending of a substrate on which light source elements are arranged, improve adhesion between the substrate and a heat sink and increase cooling efficiency. This light source unit comprises: a substrate (21A) that has a first surface and a second surface that are opposite each other; a plurality of light source elements (20A) that are two-dimensionally arranged on the first surface of the substrate (21A); and a heat sink (40). The substrate (21A) has at least one recess formed in a portion of the second surface opposing a range in which the plurality of light source elements (20A) are arranged in a plan view. The heat sink (40) has a through hole (401). The substrate (21A) and the heat sink (40) are fixed together by a fixing member (61) that is inserted through the through hole (401) and is fitted into the recess.

IPC Classes  ?

57.

LIGHT SOURCE UNIT, ILLUMINATION UNIT, EXPOSURE DEVICE, AND EXPOSURE METHOD

      
Application Number JP2022031214
Publication Number 2024/038538
Status In Force
Filing Date 2022-08-18
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Yoshida, Ryohei
  • Suzuki, Tomonari
  • Sakurai, Yukiya
  • Indo, Masanari
  • Iwanaga, Masaya

Abstract

This light source unit comprises: a plurality of light source elements that are two-dimensionally arranged on a surface of a fixation target; and protruding portions that protrude from the fixation target and that are each provided between one of the plurality of light source elements and at least one of the other light source elements adjacent to said one light source element. The ends of the protruding portions are located at a position higher than the lower surfaces of the light source elements. 

IPC Classes  ?

58.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023025978
Publication Number 2024/038719
Status In Force
Filing Date 2023-07-14
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor Ito Tomoki

Abstract

Provided are an optical system whereby good optical performance can be obtained, an optical device that comprises the optical system, and a method for manufacturing the optical system.  An optical system OL1 used in an optical device such as a camera 1 comprises an objective optical system GO and an image-forming optical system GI that forms an image from an intermediate image IM formed by the objective optical system GO, and is configured so as to satisfy the condition in the following expression: 0.40 < fo/f < 0.80 (where fo is the focal length of the objective optical system GO, and f is the whole-system focal length of the optical system OL).

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
  • G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length

59.

LENS BARREL AND IMAGING DEVICE

      
Application Number JP2023029413
Publication Number 2024/038840
Status In Force
Filing Date 2023-08-14
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Fukushima, Takehisa
  • Kinouchi, Yuki
  • Goda, Yokichi

Abstract

To increase the optical performance of this lens barrel, the lens barrel is made to comprise a diaphragm unit (30) that adjusts the light amount of a light flux passing through the lens barrel, and a first frame (F4) having at least one lens and provided with a first engagement portion (51) which engages with a first guide bar (25) extending in the optical axis direction. The diaphragm unit (30), the lens (L3), and the first frame (F4) integrally move in the optical axis direction.

IPC Classes  ?

  • G02B 7/04 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
  • G02B 7/02 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses
  • G02B 7/08 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification adapted to co-operate with a remote control mechanism
  • G03B 5/00 - Adjustment of optical system relative to image or object surface other than for focusing of general interest for cameras, projectors or printers
  • G03B 9/02 - Diaphragms
  • H04N 23/55 - Optical parts specially adapted for electronic image sensors; Mounting thereof

60.

DETECTION DEVICE

      
Application Number JP2023029501
Publication Number 2024/038856
Status In Force
Filing Date 2023-08-15
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor Tsunai Shiro

Abstract

In order to detect a subject without having a lens, this detection device comprises: a light guide part that has a light incidence port and an emission port having an opening smaller than that of the incidence port, and emits light incident from the incidence port from the emission port; and a detection part that detects the light emitted from the emission port.

IPC Classes  ?

  • G02B 6/42 - Coupling light guides with opto-electronic elements
  • H04N 23/55 - Optical parts specially adapted for electronic image sensors; Mounting thereof

61.

VOICE COIL MOTOR AND LENS BARREL

      
Application Number 18259170
Status Pending
Filing Date 2021-12-20
First Publication Date 2024-02-15
Owner NIKON CORPORATION (Japan)
Inventor
  • Muto, Azusa
  • Usui, Kazutoshi

Abstract

To provide a small-sized voice coil motor, the voice coil motor includes a first yoke and a second yoke each having a length in a first direction, a third yoke that has a length in the first direction and is disposed between the first yoke and the second yoke, a first magnet disposed on the first yoke, a second magnet disposed on the second yoke, and a coil that is penetrated by the third yoke and is movable in the first direction by magnetic forces of the first magnet and the second magnet, wherein the coil includes a first section in which a winding wire is linearly wound and a second section in which the wiring wire is wound in an arc shape.

IPC Classes  ?

  • G02B 7/04 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
  • H02K 41/035 - DC motors; Unipolar motors

62.

OPTICAL SYSTEM, OPTICAL APPARATUS AND METHOD FOR MANUFACTURING THE OPTICAL SYSTEM

      
Application Number 18271465
Status Pending
Filing Date 2022-01-21
First Publication Date 2024-02-15
Owner Nikon Corporation (Japan)
Inventor Machida, Kosuke

Abstract

An optical system (OL) has a first lens group (G1), a first focusing lens group (GF1) having a negative refractive power, and a second focusing lens group (GF2) having a positive refractive power, arranged in the stated order from the object side along the optical axis, the first focusing lens group (GF1) and the second focusing lens group (GF2) moving along the optical axis in mutually different trajectories during focusing, and the optical system (OL) furthermore having an aperture diaphragm (S) disposed further toward the object side than the first focusing lens group (GF1), and satisfying the following conditional expression: 0.68<(−fF1)/fF2<3.60, where fF1 is the focal length of the first focusing lens group (GF1), and fF2 is the focal length of the second focusing lens group (GF2).

IPC Classes  ?

  • G02B 9/34 - Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or – having four components only

63.

VARIABLE MAGNIFICATION OPTICAL SYSTEM, OPTICAL APPARATUS, AND VARIABLE MAGNIFICATION OPTICAL SYSTEM MANUFACTURING METHOD

      
Application Number JP2023025401
Publication Number 2024/034309
Status In Force
Filing Date 2023-07-10
Publication Date 2024-02-15
Owner NIKON CORPORATION (Japan)
Inventor
  • Ono, Takuro
  • Tachi, Hideyuki

Abstract

A variable magnification optical system (ZL) comprises, arranged in order from the object side and along the optical axis: an object-side lens group (GA) having a positive refractive power; an intermediate group (GM) having a positive refractive power; and a rear group (GR). The intermediate group (GM) includes at least one lens group. The rear group (GR) includes, arranged in order from the object side and along the optical axis: a first succeeding lens group (GR1) having a negative refractive power; a second succeeding lens group (GR2) having a positive refractive power; and a third succeeding lens group (GR3) having a negative refractive power. When varying magnification, the interval between the adjacent lens groups changes, and the second succeeding lens group (GR2) moves along the optical axis when focusing, and as a result thereof, the following formula is satisfied. Formula: 1.05<f1/TLw<2.0, wherein f1 is the focal distance of the object-side lens group (GA), and TLw is the total length of the variable magnification optical system (ZL) when the same is in the wide-angle state.

IPC Classes  ?

  • G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

64.

CAMERA BODY FOR RECEIVING FIRST AND SECOND IMAGE PLANE TRANSFER COEFFICIENTS

      
Application Number 18384143
Status Pending
Filing Date 2023-10-26
First Publication Date 2024-02-15
Owner NIKON CORPORATION (Japan)
Inventor Tomita, Hiroyuki

Abstract

A lens barrel of the invention includes: an imaging optical system including a focus adjustment lens; a driver that drives the focus adjustment lens in a direction of an optical axis; a transceiver that transmits and receives a signal to and from a camera body; and a controller that controls the transceiver to repeatedly transmit a first image plane transfer coefficient which is determined in correspondence with a position of the focus adjustment lens included in the imaging optical system and a second image plane transfer coefficient which does not depend on the position of the focus adjustment lens to the camera body at a predetermined interval, and, when the controller repeatedly transmits the second image plane transfer coefficient to the camera body, the controller varies the second image plane transfer coefficient over time.

IPC Classes  ?

  • H04N 23/663 - Remote control of cameras or camera parts, e.g. by remote control devices for controlling interchangeable camera parts based on electronic image sensor signals
  • G03B 13/36 - Autofocus systems
  • G02B 7/36 - Systems for automatic generation of focusing signals using image sharpness techniques
  • G03B 17/14 - Bodies with means for supporting objectives, supplementary lenses, filters, masks, or turrets interchangeably
  • H04N 23/67 - Focus control based on electronic image sensor signals
  • H04N 23/69 - Control of means for changing angle of the field of view, e.g. optical zoom objectives or electronic zooming
  • G02B 7/08 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification adapted to co-operate with a remote control mechanism
  • G02B 7/38 - Systems for automatic generation of focusing signals using image sharpness techniques measured at different points on the optical axis

65.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023027689
Publication Number 2024/034428
Status In Force
Filing Date 2023-07-28
Publication Date 2024-02-15
Owner NIKON CORPORATION (Japan)
Inventor Miwa Satoshi

Abstract

Provided are an optical system that achieves reductions in size and weight and can obtain satisfactory optical performance, an optical device, and a method for manufacturing the optical system. An optical system OL used in an optical device such as a camera 1 comprises, in order from the object side, a first lens group G1 having positive refractive power, a second lens group G2 having negative refractive power, a third lens group G3 having positive refractive power, a fourth lens group G4 having negative refractive power, and a fifth lens group G5 having positive refractive power, the distance between the lens groups adjacent to each other changing when the magnification is changed, and the second lens group G2 being fixed with respect to an image surface when the magnification is changed, and the optical system satisfies a condition based on a predetermined conditional expression.

IPC Classes  ?

  • G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

66.

MICROSCOPE OBJECTIVE LENS, MICROSCOPE OPTICAL SYSTEM, AND MICROSCOPE DEVICE

      
Application Number 18269166
Status Pending
Filing Date 2021-12-15
First Publication Date 2024-02-08
Owner NIKON CORPORATION (Japan)
Inventor
  • Takagi, Hidetsugu
  • Hatada, Hitoshi

Abstract

This microscope objective lens (OL) is constituted by a first lens group (G1), a second lens group (G2) having a positive refractive power, a third lens group (G3) having a concave surface facing the image side, and a fourth lens group (G4) having a concave surface facing the object side. The first lens group (G1) is constituted by a plano-convex positive lens (L101) having a flat surface facing the object side, and a negative lens (L102). The first lens group satisfies the following conditional expressions. This microscope objective lens (OL) is constituted by a first lens group (G1), a second lens group (G2) having a positive refractive power, a third lens group (G3) having a concave surface facing the image side, and a fourth lens group (G4) having a concave surface facing the object side. The first lens group (G1) is constituted by a plano-convex positive lens (L101) having a flat surface facing the object side, and a negative lens (L102). The first lens group satisfies the following conditional expressions. Conditional expressions 1.8

IPC Classes  ?

  • G02B 21/02 - Objectives
  • G02B 9/34 - Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or – having four components only

67.

SYSTEMS AND METHODS FOR POWDER MIXING IN ADDITIVE MANUFACTURING PROCESSES

      
Application Number US2023029436
Publication Number 2024/030579
Status In Force
Filing Date 2023-08-03
Publication Date 2024-02-08
Owner NIKON CORPORATION (Japan)
Inventor
  • Lin, Zhi-Wei
  • Jeong, Yoon Jung
  • Goodwin, Eric Peter
  • Goldstein, Goldie Lynne

Abstract

The problem of determining the composition or homogeneity of powder mixtures, or of determining the response time required to alter the powder mixtures, is addressed by systems and methods for monitoring or altering the composition of powder mixtures in 3D printing processes. The systems and methods generally utilize a sensing module to detect a signal indicative of a composition of a powder mixture that is prepared and dispensed by a powder dispensing module. A controller then receives the signal from the sensing module and monitors the composition of the powder mixture based upon the signal. In some cases, the controller alters the composition of the powder mixture based upon the signal.

IPC Classes  ?

  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
  • B22F 10/34 - Process control of powder characteristics, e.g. density, oxidation or flowability
  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes
  • B22F 12/58 - Means for feeding of material, e.g. heads for changing the material composition, e.g. by mixing
  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B22F 10/37 - Process control of powder bed aspects, e.g. density

68.

ROBOT SYSTEM, ROBOT ARM, END EFFECTOR, AND ADAPTER

      
Application Number 18034452
Status Pending
Filing Date 2020-10-30
First Publication Date 2024-02-08
Owner NIKON CORPORATION (Japan)
Inventor Miyakawa, Tomoki

Abstract

A robot system including a robot arm with a movable portion includes a first imaging device and a second imaging device attached to the robot arm, a control unit that controls the robot system, a distance information acquisition unit that acquires information on a distance to a target object, the control unit is capable of changing a baseline length that is a distance between the first imaging device and the second imaging device, and the distance information acquisition unit acquires the information on the distance to the target object on the basis of the baseline length.

IPC Classes  ?

  • G06T 1/00 - General purpose image data processing

69.

ANALYZING METHOD, ANALYSIS APPARATUS, MEASURING METHOD, MEASUREMENT APPARATUS, EXPOSING METHOD, AND EXPOSURE APPARATUS

      
Application Number 18382256
Status Pending
Filing Date 2023-10-20
First Publication Date 2024-02-08
Owner NIKON CORPORATION (Japan)
Inventor
  • Sugimoto, Ayako
  • Iida, Ryugo
  • Wakamoto, Shinji

Abstract

An analyzing method includes preparing measured position information that is position information of a plurality of measured-parts formed on a substrate, and fitting a reference function, which is a sum of at least one function obtained by multiplying a criterion function expressed using a first type Bessel function by a proportional coefficient, to the measured position information and calculating an optimum value of at least one of the proportional coefficient.

IPC Classes  ?

  • G03F 9/00 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
  • G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

70.

MOBILE INFORMATION DEVICE, IMAGE PICKUP DEVICE, AND INFORMATION ACQUISITION SYSTEM

      
Application Number 18379356
Status Pending
Filing Date 2023-10-12
First Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor
  • Inoue, Hideya
  • Iwaoka, Toru
  • Noborisaka, Michiko
  • Hatori, Masayuki
  • Hamada, Tomohide

Abstract

A portable information device includes: an image sensor used to pick up an image of a subject; a locator configured to acquire position information about an image pickup position for the subject; an orientation sensor configured to acquire an orientation information corresponding to an imaging direction at the image pickup position; a display configured to, while the subject is being imaged via the image sensor, display (a) an imaging data of the subject obtained via the image sensor and (b) related information on the subject obtained based on acquired data from the locator and from the orientation sensor; an input portion with which a user posts comment, while the subject is being imaged via the image sensor; and a controller configured to, while the subject is being imaged via the image sensor, control the display to display the posted comment and the related information.

IPC Classes  ?

  • G06F 16/951 - Indexing; Web crawling techniques
  • G06F 16/9535 - Search customisation based on user profiles and personalisation
  • G06F 16/9537 - Spatial or temporal dependent retrieval, e.g. spatiotemporal queries
  • G01C 21/36 - Input/output arrangements for on-board computers
  • G06Q 10/02 - Reservations, e.g. for tickets, services or events
  • G06Q 30/02 - Marketing; Price estimation or determination; Fundraising
  • G08G 1/005 - Traffic control systems for road vehicles including pedestrian guidance indicator
  • G08G 1/0968 - Systems involving transmission of navigation instructions to the vehicle
  • G08G 1/127 - Traffic control systems for road vehicles indicating the position of vehicles, e.g. scheduled vehicles to a central station
  • G01C 21/34 - Route searching; Route guidance
  • G06F 16/9538 - Presentation of query results

71.

PATTERN EXPOSURE APPARATUS AND DEVICE PRODUCTION METHOD

      
Application Number JP2022028619
Publication Number 2024/023885
Status In Force
Filing Date 2022-07-25
Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor Kato Masaki

Abstract

An exposure apparatus according to the present invention causes reflection light from a selected on-state micromirror in a spatial light modulation element to enter a projection unit and projects and exposes a pattern corresponding to drawing data onto a substrate. The apparatus comprises an illumination unit that emits first illumination light having a wavelength λ1 and second illumination light having a wavelength λ2 (λ2≠λ1), which are allowable in terms of chromatic aberration characteristics of the projection unit, to the spatial light modulation element at an entry angle corresponding to a multiple of the inclination angle of the on-state micromirror. When the diffraction angle of j1-th order main diffraction light that is based on the the wavelength λ1, that is generated from the on-state micromirror, and that enters the projection unit is denoted by θj1, and the diffraction angle of j2-th order main diffraction light that is based on the wavelength λ2, that is generated from the on-state micromirror, and that enters the projection unit is denoted by θj2, the difference between the wavelength λ1 and the wavelength λ2 or the entry angles are set such that the diffraction angle θj1 and the diffraction angle θj2 distribute with the optical axis of the projection unit therebetween.

IPC Classes  ?

72.

VIBRATION CONTROL OF STRUCTURAL ELEMENTS OF EXPOSURE APPARATUS

      
Application Number US2023070966
Publication Number 2024/026320
Status In Force
Filing Date 2023-07-25
Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor
  • Yang, Pai-Hsueh
  • Asaumi, Hiroyoshi
  • Sakata, Koichi
  • Tokumi, Kensuke
  • Kitabatake, Shigeki
  • Margeson, Christopher Sean
  • Lee, Hwan
  • Yuan, Bausan

Abstract

A method of controlling vibration of a structural element of an exposure apparatus includes receiving data of a position of the structural element, determining a position error signal based at least in part on the position data and a specified position of the structural element, determining a force command to damp a specified vibration mode frequency of the structural element based at least in part on the position error signal and the specified vibration mode frequency, and transmitting the force command to an actuator such that the actuator applies force to the structural element and damps vibration of the structural element at least at the specified vibration mode frequency of the structural element.

IPC Classes  ?

  • F16F 15/00 - Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
  • F16F 15/02 - Suppression of vibrations of non-rotating, e.g. reciprocating, systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating system
  • B25J 9/12 - Programme-controlled manipulators characterised by positioning means for manipulator elements electric
  • B25J 9/14 - Programme-controlled manipulators characterised by positioning means for manipulator elements fluid

73.

SHAPING APPARATUS AND SHAPING METHOD

      
Application Number 18376012
Status Pending
Filing Date 2023-10-03
First Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor Shibazaki, Yuichi

Abstract

This shaping apparatus is equipped with: a movement system which moves a target surface; a measurement system for acquiring position information of the target surface in a state movable by the movement system, a beam shaping system that has a beam irradiation section and a material processing section which supplies a shaping material irradiated by a beam from beam irradiation section; and a controller. On the basis of 3D data of a three-dimensional shaped object to be formed on a target surface and position information of the target surface acquired using the measurement system, the controller controls the movement system and the beam shaping system such that a target portion on the target surface is shaped by supplying the shaping material while moving the target surface and the beam from beam irradiation section relative to each other.

IPC Classes  ?

  • B23K 26/342 - Build-up welding
  • B29C 64/153 - Processes of additive manufacturing using only solid materials using layers of powder being selectively joined, e.g. by selective laser sintering or melting
  • B23K 26/70 - Auxiliary operations or equipment
  • B23K 26/144 - Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor the fluid stream containing particles, e.g. powder
  • B23K 26/14 - Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
  • B23K 26/06 - Shaping the laser beam, e.g. by masks or multi-focusing
  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B23K 26/073 - Shaping the laser spot
  • B29C 64/268 - Arrangements for irradiation using electron beams [EB]
  • B23K 26/03 - Observing, e.g. monitoring, the workpiece
  • B22F 10/25 - Direct deposition of metal particles, e.g. direct metal deposition [DMD] or laser engineered net shaping [LENS]
  • B22F 12/33 - Platforms or substrates translatory in the deposition plane
  • B22F 12/37 - Rotatable
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B23K 26/08 - Devices involving relative movement between laser beam and workpiece

74.

SETTING METHOD, INSPECTION METHOD, DEFECT EVALUATION DEVICE AND STRUCTURE MANUFACTURING METHOD

      
Application Number 18481790
Status Pending
Filing Date 2023-10-05
First Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor
  • Hayano, Fuminori
  • Miyashita, Kazuyuki
  • Machii, Nobukatsu
  • Ohkuma, Hiroya

Abstract

A setting method for setting at least a part of a region in which a structure of a specimen exists as a target region, for an evaluation of an internal structure of the specimen includes setting an arbitrary position from the region in which the structure of the specimen exists, and setting the target region based on the set position.

IPC Classes  ?

  • G01T 1/29 - Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
  • G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material
  • G01T 1/20 - Measuring radiation intensity with scintillation detectors

75.

ANTIBODY SELECTION SYSTEM AND OPERATION METHOD THEREFOR

      
Application Number JP2022029403
Publication Number 2024/024118
Status In Force
Filing Date 2022-07-29
Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor
  • Takatsuka, Kenji
  • Morozumi, Akihiko

Abstract

One form of the present invention is an operation method for an antibody selection system connected so as to be able to communicate with an antibody information server. The system has a control device and a display device. The operation method includes: a first step in which the control device causes the display device to display a microscopy image of biological tissue or cells, the base sequence of a nucleic acid of the biological tissue or cells, data indicating nucleic acid features or base sequence features, and the name of one or two or more genes obtained on the basis of the data; a second step in which the control device transmits the ID of a gene selected from among the one or two or more genes to the antibody information server; a third step in which the control device receives, from the antibody information server, antibody information for a protein encoded by the selected gene; and a fourth step in which the control device causes the display device to display the antibody information.

IPC Classes  ?

  • G16B 50/00 - ICT programming tools or database systems specially adapted for bioinformatics

76.

MICROFLUIDIC DEVICE, OBSERVATION APPARATUS FOR MICROFLUIDIC DEVICE, AND OBSERVATION METHOD FOR MICROFLUIDIC DEVICE

      
Application Number JP2023026894
Publication Number 2024/024697
Status In Force
Filing Date 2023-07-21
Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor Matsui Kumiko

Abstract

Provided is a microfluidic device having a top surface, a bottom surface, and a plurality of side surfaces, at least one side surface of the plurality of side surfaces having an optically transparent portion that transmits illumination light from the outside. Provided is an observation apparatus for a microfluidic device, the observation apparatus having an illumination optical system that illuminates a microfluidic device having a top surface, a bottom surface, and a plurality of side surfaces, at least one side surface of the plurality of side surfaces having an optically transparent portion that transmits illumination light from the outside, with the illumination light through the optically transparent portion, and an observation optical system that receives output light from the top surface and/or bottom surface.

IPC Classes  ?

77.

VIDEO COMPRESSION APPARATUS, ELECTRONIC APPARATUS, AND VIDEO COMPRESSION PROGRAM

      
Application Number 18376029
Status Pending
Filing Date 2023-10-03
First Publication Date 2024-01-25
Owner NIKON CORPORATION (Japan)
Inventor Takahashi, Masaya

Abstract

A video compression apparatus is configured to compress a plurality of frames outputted from an imaging element having a plurality of imaging regions in which a subject is captured and that can set imaging conditions for each of the imaging regions, the video compression apparatus comprising: an acquisition unit configured to acquire data outputted from a first imaging region in which a first frame rate is set and data outputted from a second imaging region in which a second frame rate is set; a generation unit configured to generate a plurality of first frames on the basis of the data outputted from the first imaging region acquired and generate a plurality of second frames on the basis of the data outputted from the second imaging region; and a compression unit configured to compress the plurality of first frames generated and compress the plurality of second frames.

IPC Classes  ?

  • H04N 19/167 - Position within a video image, e.g. region of interest [ROI]
  • H04N 19/172 - Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the coding unit, i.e. the structural portion or semantic portion of the video signal being the object or the subject of the adaptive coding the unit being an image region, e.g. an object the region being a picture, frame or field
  • H04N 19/186 - Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the coding unit, i.e. the structural portion or semantic portion of the video signal being the object or the subject of the adaptive coding the unit being a colour or a chrominance component
  • H04N 19/513 - Processing of motion vectors
  • H04N 7/01 - Conversion of standards

78.

EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, METHOD FOR MANUFACTURING FLAT PANEL DISPLAY, AND EXPOSURE METHOD

      
Application Number 18377006
Status Pending
Filing Date 2023-10-05
First Publication Date 2024-01-25
Owner NIKON CORPORATION (Japan)
Inventor
  • Kato, Masaki
  • Mizuno, Yasushi
  • Mizuno, Hitoshi

Abstract

An exposure apparatus that scans and exposes a substrate via an optical modulator in which a plurality of elements are controlled according to an image pattern, the exposure apparatus includes a first stage that supports a first substrate, a second stage that supports a second substrate different from the first substrate, a measurement part that measures information about the second substrate, and a generation part that generates control data, which controls the plurality of elements during scanning and exposing the second substrate, based on the information during an exposure process of the first substrate, wherein the measurement part measures the information about the second substrate during the exposure process of the first substrate.

IPC Classes  ?

  • G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

79.

EXPOSURE APPARATUS, MEASURING DEVICE, MEASURING METHOD, AND DEVICE MANUFACTURING METHOD

      
Application Number 18021401
Status Pending
Filing Date 2020-08-18
First Publication Date 2024-01-25
Owner NIKON CORPORATION (Japan)
Inventor Watanabe, Yoji

Abstract

An exposure apparatus includes: an exposure illumination optical system illuminating a spatial light modulator which has a plurality of spatial light modulation elements having a reflecting surface disposed on a disposition plane; a projection optical system projecting light from the spatial light modulator to an exposed substrate; a first detection unit detecting light from the reflecting surface; a second detection unit which is a detection unit detecting light from the reflecting surface and has a detection field of view larger than that of the first detection unit; and a position changing mechanism changing a positional relationship among the first detection unit, the second detection unit, and the spatial light modulator to either a first positional relationship in which the spatial light modulator faces the first detection unit and a second positional relationship in which the spatial light modulator faces the second detection unit.

IPC Classes  ?

  • G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G01B 11/00 - Measuring arrangements characterised by the use of optical techniques

80.

IMAGING DEVICE

      
Application Number 18373355
Status Pending
Filing Date 2023-09-27
First Publication Date 2024-01-25
Owner NIKON CORPORATION (Japan)
Inventor
  • Kuriyama, Takashi
  • Murata, Hironobu
  • Tsunai, Shiro
  • Konishi, Tetsuya
  • Suzuki, Masahiro

Abstract

An imaging element comprising: an imaging unit that has: a plurality of groups each including at least one pixel; and a plurality of signal readout units that are each provided to each of the groups and read out a signal from the pixel; and a control unit that controls the signal readout unit in at least one group among the plurality of groups is provided. Each of the plurality of groups may include a plurality of the pixels. The control unit may select at least one group among the plurality of groups and control the signal readout unit by using a control parameter that is different from a control parameter that is used for another group among the plurality of groups.

IPC Classes  ?

  • H04N 25/75 - Circuitry for providing, modifying or processing image signals from the pixel array
  • H01L 27/146 - Imager structures
  • H04N 23/73 - Circuitry for compensating brightness variation in the scene by influencing the exposure time
  • H04N 25/77 - Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
  • H04N 25/79 - Arrangements of circuitry being divided between different or multiple substrates, chips or circuit boards, e.g. stacked image sensors
  • H04N 25/443 - Extracting pixel data from image sensors by controlling scanning circuits, e.g. by modifying the number of pixels sampled or to be sampled by partially reading an SSIS array by reading pixels from selected 2D regions of the array, e.g. for windowing or digital zooming
  • H04N 25/533 - Control of the integration time by using differing integration times for different sensor regions
  • H04N 25/583 - Control of the dynamic range involving two or more exposures acquired simultaneously with different integration times
  • H04N 25/771 - Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising storage means other than floating diffusion
  • H04N 25/772 - Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising A/D, V/T, V/F, I/T or I/F converters

81.

STACKED SUBSTRATE MANUFACTURING METHOD, STACKED SUBSTRATE MANUFACTURING APPARATUS, STACKED SUBSTRATE MANUFACTURING SYSTEM, AND SUBSTRATE PROCESSING APPARATUS

      
Application Number 18475895
Status Pending
Filing Date 2023-09-27
First Publication Date 2024-01-18
Owner NIKON CORPORATION (Japan)
Inventor
  • Sugaya, Isao
  • Mitsuishi, Hajime

Abstract

A method of manufacturing a stacked substrate by bonding a first substrate and a second substrate, including a step of determining, based on information about curving of each of the first substrate and the second substrate, whether or not the first substrate and the second substrate satisfy a predetermined condition, and, a step of bonding the first substrate and the second substrate if the predetermined condition is satisfied. The stacked substrate manufacturing method described above includes a step of estimating, based on the information, an amount of misalignment which occurs after the first substrate is bonded to the second substrate and the predetermined condition may include that the amount of misalignment is equal to or less than a threshold.

IPC Classes  ?

  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
  • H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment
  • H01L 21/66 - Testing or measuring during manufacture or treatment
  • H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
  • H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches

82.

MODELING SYSTEM

      
Application Number JP2022027701
Publication Number 2024/013931
Status In Force
Filing Date 2022-07-14
Publication Date 2024-01-18
Owner NIKON CORPORATION (Japan)
Inventor
  • Funatsu, Takayuki
  • Momose, Atsumi
  • Murata, Hiromichi
  • Nakata, Kei

Abstract

A modeling system according to the present invention comprises: a modeling apparatus which is capable of modeling a model by supplying a modeling material to a weld pool that is formed by irradiating the surface of an object with a modeling beam; and a control device which is capable of controlling the modeling apparatus. The control device controls the modeling apparatus such that: the irradiation position of the modeling beam periodically moves within a modeling unit region that is set on the surface of the object; and the modeling unit region moves on the surface of the object on the basis of path information that shows the movement locus of the modeling unit region. The control device changes, on the basis of the path information, the amount of rotation of the modeling unit region around the rotation axis that intersects with the surface of the object.

IPC Classes  ?

  • B23K 26/342 - Build-up welding
  • B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
  • B23K 26/34 - Laser welding for purposes other than joining

83.

MICROSCOPE, OBSERVATION METHOD, AND PROGRAM

      
Application Number 18371512
Status Pending
Filing Date 2023-09-22
First Publication Date 2024-01-18
Owner NIKON CORPORATION (Japan)
Inventor Niitani, Yamato

Abstract

A microscope includes light-transmitting-optical-system that irradiates specimen with illumination-light, light-receiving-optical-system that receives signal-light emitted from the specimen, phase-modulation-element that adds predetermined phase distribution to the illumination-light or the signal-light, phase-distribution-measuring-unit that measures first phase distribution, which corresponds to specimen-induced aberration at sampling point of the specimen, at each of a plurality of the sampling points, phase-distribution-calculation-unit that creates phase-data-model showing an amount of phase change which the illumination-light or the signal-light receives when the illumination-light or the signal-light passes through predetermined position in the specimen based on the plurality of first phase distributions, and calculates a second phase distribution which is added to the illumination-light or the signal-light in order to detect detection point of the specimen in a state in which specimen-induced aberration is reduced based on the phase-data-model, and phase-distribution-setting-unit that sets the second phase distribution to the phase-modulation-element.

IPC Classes  ?

  • G02B 21/00 - Microscopes
  • G01N 21/41 - Refractivity; Phase-affecting properties, e.g. optical path length

84.

MICROSCOPE OBJECTIVE LENS, MICROSCOPE OPTICAL SYSTEM, AND MICROSCOPE DEVICE

      
Application Number 18552361
Status Pending
Filing Date 2022-02-25
First Publication Date 2024-01-18
Owner NIKON CORPORATION (Japan)
Inventor Takagi, Hidetsugu

Abstract

A microscope objective lens (OL) comprises a first lens group (G1) having positive refractive power, a second lens group (G2) having a concave surface facing the image side, and a third lens group (G3) having a concave surface facing the object side, which are arranged in order from the object side along an optical axis. The first lens group (G1) comprises one lens component having positive refractive power, the third lens group (G3) comprises three or more lenses including two negative lenses and one positive lens, and at least one predetermined negative lens in the two negative lenses satisfies the conditional expression “νdA<40”.

IPC Classes  ?

85.

MODELING SYSTEM, PROCESSING SYSTEM, MODELING METHOD, AND PROCESSING METHOD

      
Application Number JP2022027700
Publication Number 2024/013930
Status In Force
Filing Date 2022-07-14
Publication Date 2024-01-18
Owner NIKON CORPORATION (Japan)
Inventor
  • Funatsu, Takayuki
  • Doi, Ryosuke
  • Murata, Hiromichi

Abstract

This modeling system comprises a modeling device that is capable of modeling a modeled article using an irradiation optical system with which the surface of an object can be irradiated with a modeling beam, a measurement device that is capable of measuring an emitted beam including at least one of the modeling beam and a guide beam, a movement device that causes the irradiation optical system and the measurement device to move relatively along a direction intersecting the optical axis of the irradiation optical system within a modeling period, and a control device that is capable of controlling the modeling device on the basis of the result of measurement of the emitted beam by the measurement device. The irradiation optical system includes a movement member that causes the emitted beam to move along a direction intersecting the optical axis of the irradiation optical system within the modeling period. The measurement device measures the emitted beam within a measurement period. The control device controls the movement member within the modeling period on the basis of the result of measuring the emitted beam within the measurement period.

IPC Classes  ?

  • B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
  • B23K 26/00 - Working by laser beam, e.g. welding, cutting or boring
  • B23K 26/08 - Devices involving relative movement between laser beam and workpiece
  • B23K 26/34 - Laser welding for purposes other than joining

86.

IMAGE SENSOR AND IMAGING DEVICE

      
Application Number 18370950
Status Pending
Filing Date 2023-09-21
First Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor Seo, Takashi

Abstract

An image sensor includes: a first and a second pixel, each of which includes a first photoelectric conversion unit that photoelectrically converts light that has passed through a micro lens and generates a first charge, a second photoelectric conversion unit that photoelectrically converts light that has passed through the micro lens and generates a second charge, an accumulation unit that accumulates at least one of the first charge and the second charge, a first transfer unit that transfers the first charge to the accumulation unit, and a second transfer unit that transfers the second charge to the accumulation unit; and a control unit that outputs, to the first transfer unit of the first pixel and to the second transfer unit of the second pixel, a signal that causes the first charge of the first pixel and the second charge of the second pixel to be transferred to their accumulation units.

IPC Classes  ?

  • H04N 23/75 - Circuitry for compensating brightness variation in the scene by influencing optical camera components

87.

SUBSTRATE BONDING APPARATUS AND SUBSTRATE BONDING METHOD

      
Application Number 18474731
Status Pending
Filing Date 2023-09-26
First Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor
  • Sugaya, Isao
  • Ariizumi, Eiji
  • Kito, Yoshiaki
  • Ushijima, Mikio
  • Aramata, Masanori
  • Kiribe, Naoto
  • Shirasu, Hiroshi
  • Mitsuishi, Hajime
  • Fukuda, Minoru
  • Tsunoda, Masaki

Abstract

To improve the throughput of substrate bonding. A substrate bonding apparatus that bonds first and second substrates so that contact regions in which the first and second substrates contact are formed in parts of the first and second substrates and the contact regions enlarge from the parts, the apparatus including: a detecting unit detecting information about the contact regions; and a determining unit determining that the first and second substrates can be carried out based on the information detected at the detecting unit. In the substrate bonding apparatus, the information may be information, a value of which changes according to progress of enlargement of the contact regions, and the determining unit may determine that the first and second substrates can be carried out if the value becomes constant or if a rate of changes in the value becomes lower than a predetermined value.

IPC Classes  ?

  • H01L 21/66 - Testing or measuring during manufacture or treatment
  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
  • H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
  • H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
  • H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices

88.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023025109
Publication Number 2024/010062
Status In Force
Filing Date 2023-07-06
Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor Kurashige, Takamichi

Abstract

This optical system is configured so as to satisfy the conditional expression below, and comprises: a first optical system that has a front-side lens group, an optical path branching member having a branching surface for branching incident light, and a first rear-side lens group on which one branched light is incident; and a second optical system that has a front-side lens group, an optical path branching member, and a second rear-side lens group on which the other branched light is incident. The total optical length of the first optical system is equal to the total optical length of the second optical system, or greater than the total optical length of the second optical system. 0.50 < T(gr1)/(-f(gr1)) < 4.50, where T(gr1) is the distance on the optical axis from a lens surface closest to an object side of the front-side lens group to a lens surface closest to an image side of the front-side lens group, and f(gr1) is the composite focal length of the front-side lens group.

IPC Classes  ?

89.

Nikon Sport Optics Ambassador

      
Application Number 1770901
Status Registered
Filing Date 2023-09-11
Registration Date 2023-09-11
Owner NIKON CORPORATION (Japan)
NICE Classes  ?
  • 14 - Precious metals and their alloys; jewelry; time-keeping instruments
  • 16 - Paper, cardboard and goods made from these materials
  • 24 - Textiles and textile goods
  • 25 - Clothing; footwear; headgear
  • 41 - Education, entertainment, sporting and cultural services

Goods & Services

Brooches [jewellery]; personal ornaments in the nature of jewellery; earrings; insignias of precious metal; badges of precious metal; bonnet pins of precious metal [jewellery]; tie clips; tie pins; necklaces; bracelets; pendants; gem brooches; medals; rings [trinket]; lockets; cuff links; jewellery; key rings; charms for key chains; charms for key rings; split rings of precious metal for keys; lanyards for keys; key chains [split rings with trinket or decorative fob]; key rings [split rings with trinket or decorative fob]; retractable key chains; retractable key rings; precious metals; precious metals, unwrought or semi-wrought; trophies [prize cups] of precious metal; commemorative shields of precious metal. Seals [stationery]; sticker [stationery]; stationery; writing instruments; note books; pads [stationery]; desk mats; painting sets; file folders; plastic file folders; photographs [printed]; photograph stands; paper and cardboard; tissue paper; hygienic hand towels of paper; towels of paper; table napkins of paper; hand towels of paper; handkerchiefs of paper; printed matter; printed publications; printers' reglets [interline leads]; printing type; packaging containers of paper; bags [pouches] of plastics, for packaging; pastes and other adhesives for stationery or household purposes; shopping bags of plastic; shopping bags of paper; banners of paper; flags of paper; assorted pieces of colored paper [paper toy]; transfer-pictures [paper toy]; origami folding paper; cutout pictures of paper; Chiyogami [assorted pieces of Japanese paper with colorful patterns printed thereon]; coloring pictures. Towels, not of paper; face towels of textile; towels of textile; handkerchiefs of textile; yoga towels; bath linen, except clothing; blankets; woven textile goods for personal use; Japanese cotton towels [Tenugui]; handkerchiefs; Japanese ceremonial wrapping cloth [Fukusa]; Japanese general wrapping cloth [Furoshiki]; household linen; table napkins of textile; banners and flags, not of paper. Clothing; T-shirts; sweat jackets; sweat shirts; sweatsuits; sweatpants; sweatsocks; hooded sweatshirts; hooded clothing; polo shirts; blousons; headgear; sports caps and hats; coats; sweaters; shirts; sleep masks; socks and stockings other than special sportswear; fur stoles; gloves and mittens [clothing]; neckties; mufflers [clothing]; ear muffs [clothing]; footwear [other than special footwear for sports]; footwear for sports; golf shoes; clothes for sports. Teaching; educational and instruction services relating to arts, crafts, sports or general knowledge; tutoring; educational services; instruction services; correspondence courses; arranging, conducting and organization of seminars; arranging, conducting and organization of workshops; entertainment; arranging, conducting and organization of photo contest; organization of educational, entertainment, sporting and cultural events; organization of educational, entertainment, cultural and sporting competitions; organization, arranging and conducting of professional golf tournaments or competitions; organization of entertainment events excluding movies, shows, plays, musical performances, sports, horse races, bicycle races, boat races and auto races; providing videos from the internet, not downloadable; movie theatre presentations or movie film production and distribution; providing online videos, not downloadable; providing online images, not downloadable; digital imaging services [editing of images]; digital imaging services [photography]; on-line digital imaging services [editing of images]; on-line digital imaging services [photography]; providing digital music from the internet, not downloadable; presentation of live show performances; direction or presentation of plays; presentation of musical performances; providing online music, not downloadable; production of videotape film in the field of education, culture, entertainment or sports [not for movies or television programs and not for advertising or publicity]; organization, arranging and conducting of sports competitions; providing sports facilities; providing amusement facilities; rental of cinematographic machines and apparatus; rental of movie projectors and their accessories; rental of overhead projectors; rental of cine-films; rental of sports equipment; rental of golf equipment; photography; providing information and consultancy services related to photography; video imaging services by drone; photographic imaging services by drone; videotaping; microfilming; services of reference libraries for literature and documentary records; book rental; providing electronic publications, not downloadable; rental of cameras; rental of camera parts and accessories; rental of video cameras; rental of video camera parts and accessories; rental of cameras with liquid crystal display projector; rental of remote controllers for cameras; rental of cases for cameras; rental of straps for cameras; rental of lens filters for cameras; rental of flashbulbs for cameras; rental of flashlights for cameras; rental of shutter releases for cameras; rental of shutters for cameras; rental of film spools for cameras; rental of viewfinders for cameras; rental of tripods for cameras; rental of digital cameras with liquid crystal display projector; rental of ccd cameras; rental of remote controllers for digital cameras; rental of cases for digital cameras; rental of straps for digital cameras; rental of lens filters for digital cameras; rental of flashbulbs for digital cameras; rental of flashlights for digital cameras; rental of shutter releases for digital cameras; rental of shutters for digital cameras; rental of film spools for digital cameras; rental of viewfinders for digital cameras; rental of tripods for digital cameras; rental of video cameras; rental of video camera parts and accessories; rental of binoculars; rental of microscopes; rental of rangefinders for cameras.

90.

IMAGE DISPLAY DEVICE

      
Application Number 18372264
Status Pending
Filing Date 2023-09-25
First Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor Iwane, Toru

Abstract

An image display device includes: an input unit into which image signals are inputted, the image signals being outputted from image capturing pixels disposed in correspondence to image capturing micro-lenses, each of the image capturing pixels receiving light that has passed through a corresponding one of the image capturing micro-lenses; display micro-lenses; display pixels that emit light for forming a three-dimensional image to each of the display micro-lenses, the display pixels being disposed in correspondence to the display micro-lenses; and a generator that generates display image data that includes three-dimensional information, based upon the image signals inputted into the input unit. The generator allocates the image signals outputted from the image capturing pixels to the display pixels arranged at symmetrical positions in a predetermined direction, using a pseudo-optical axis of each of the display micro-lenses as a reference.

IPC Classes  ?

  • G02B 30/27 - Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer’s left and right eyes of the autostereoscopic type involving lenticular arrays
  • G03B 35/24 - Stereoscopic photography by simultaneous viewing using apertured or refractive resolving means on screen or between screen and eye
  • H04N 13/232 - Image signal generators using stereoscopic image cameras using a single 2D image sensor using fly-eye lenses, e.g. arrangements of circular lenses
  • H04N 13/307 - Image reproducers for viewing without the aid of special glasses, i.e. using autostereoscopic displays using fly-eye lenses, e.g. arrangements of circular lenses

91.

MEASURING METHOD, AND METHOD FOR CONSTRUCTING STRUCTURE

      
Application Number JP2023024880
Publication Number 2024/010024
Status In Force
Filing Date 2023-07-05
Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor Miyawaki Takashi

Abstract

This measuring method, with which it is possible to reduce the time and effort involved in installing three-dimensional surveying equipment, includes (step S104 and step S106): using a sensor device and the three-dimensional surveying equipment to measure position information at a predetermined measuring point of a built-in pillar (construction material); and acquiring calibration information of position information to be measured using the sensor device on the basis of measurement results from both the sensor device and the three-dimensional surveying equipment.

IPC Classes  ?

  • G01C 15/00 - Surveying instruments or accessories not provided for in groups
  • E04G 21/18 - Adjusting tools; Templates
  • G01B 21/22 - Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for testing the alignment of axes
  • G01C 9/06 - Electric or photoelectric indication or reading means

92.

OPTICAL MODULE, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL MODULE

      
Application Number JP2023025318
Publication Number 2024/010089
Status In Force
Filing Date 2023-07-07
Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor
  • Masada, Takahiro
  • Kurashige, Takamichi
  • Fukumoto, Satoshi
  • Hirayama, Toru

Abstract

This optical module includes a splitting surface that transmits part of incident light and reflects at least part of the incident light different from the part of the incident light that is transmitted, the optical module imaging each of the light transmitted through the splitting surface and the light reflected by the splitting surface. The optical module comprises a first optical system and a second optical system. The first optical system comprises, in order from the object side, a forward lens group, an optical path-splitting member having a splitting surface, and a first backward lens group that has a positive refracting power and on which the light transmitted through the splitting surface is incident. The second optical system comprises, in order from the object side, a forward lens group, an optical path-splitting member, and a second backward lens group that has a positive refracting power and on which the light reflected by the splitting surface is incident. One of the first optical system and the second optical system is configured to have an aperture stop on the splitting surface or on the image side of the splitting surface.

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 5/00 - Optical elements other than lenses
  • G03B 13/14 - Viewfinders adjusting viewfinder field to compensate for parallax due to short range

93.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023025321
Publication Number 2024/010090
Status In Force
Filing Date 2023-07-07
Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor Kurashige, Takamichi

Abstract

This optical system comprises: a first optical system having a front lens group, a prism having a branching surface that branches incident light, and a first rear lens group on which the light having a longer optical path length when passing through the prism from among the branched lights is incident; and a second optical system having a front lens group, a prism, and a second rear lens group on which the light having a shorter optical path length when passing through the prism from among the branched lights is incident. The optical system is configured so as to satisfy the following conditional expression. 0.80 < -f(gr1n)/f(L) < 4.30 Here, f(gr1n) is the combined focal length of the negative lenses, from among the negative lenses included in the front lens group, that are disposed continuously to an image surface side from the negative lens disposed closest to the object side, and f(L) is the focal length of the first optical system.

IPC Classes  ?

  • G02B 13/04 - Reversed telephoto objectives
  • G02B 13/14 - Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

94.

QUANTITATIVE PHASE IMAGE GENERATING METHOD, QUANTITATIVE PHASE IMAGE GENERATING DEVICE, AND PROGRAM

      
Application Number 18368621
Status Pending
Filing Date 2023-09-15
First Publication Date 2024-01-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Tsuchida, Shota
  • Ikeda, Satoshi

Abstract

A quantitative phase image generating method for a microscope, includes: irradiating an object with illumination light; disposing a focal point of an objective lens at each of a plurality of positions that are mutually separated by gaps Δz along an optical axis of the objective lens, and detecting light from the object; generating sets of light intensity distribution data corresponding to each of the plurality of positions based upon the detected light; and generating a quantitative phase image based upon the light intensity distribution data; wherein the gap Δz is set based upon setting information of the microscope.

IPC Classes  ?

  • G02B 21/00 - Microscopes
  • G01J 9/00 - Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
  • G01J 9/02 - Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods

95.

MICROSCOPE

      
Application Number 18369447
Status Pending
Filing Date 2023-09-18
First Publication Date 2024-01-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Tsuchida, Shota
  • Morishita, Yasunori
  • Oshidari, Yuta

Abstract

A microscope includes: an illumination optical system which irradiates a specimen with excitation light; a detector which detects fluorescence emitted from the specimen; and an observation optical system which guides fluorescence to the detector and includes: a first optical filter having wavelength reflection and transmission characteristics that vary depending on where light enters; a second optical filter disposed in an optical path of light reflected by the first optical filter, having a boundary wavelength of transmission changing with respect to a position along a first direction, and transmitting light having a wavelength longer than a first boundary wavelength at where the reflected light enters; and a third optical filter disposed in the optical path and having a boundary wavelength of transmission changing with respect to a position along the first direction, and transmitting light having a wavelength shorter than a second boundary wavelength at where the reflected light enters.

IPC Classes  ?

96.

CAMERA BODY, CAMERA ACCESSORY, AND SHARING RATIO TRANSMISSION METHOD

      
Application Number 18367712
Status Pending
Filing Date 2023-09-13
First Publication Date 2024-01-04
Owner NIKON CORPORATION (Japan)
Inventor Ohishi, Sueyuki

Abstract

A camera body with which it is possible to improve the effect of shake correction, a camera accessory, and an information transmission method wherein the camera body to which a camera accessory can be detachably mounted, and includes: a movable section which is movable to correct shaking of the camera body; a detection unit which detects the shake and outputs a detection signal; a calculation unit which, on the basis of the detection signal, calculates an amount of movement of the movable section; and a transmission unit which transmits, to the camera accessory, body-side information the calculation unit uses to calculate the amount of movement.

IPC Classes  ?

  • H04N 23/68 - Control of cameras or camera modules for stable pick-up of the scene, e.g. compensating for camera body vibrations
  • G03B 5/04 - Vertical adjustment of lens; Rising fronts
  • G03B 17/14 - Bodies with means for supporting objectives, supplementary lenses, filters, masks, or turrets interchangeably

97.

ZOOMING OPTICAL SYSTEM, OPTICAL APPARATUS AND METHOD FOR MANUFACTURING ZOOMING OPTICAL SYSTEM

      
Application Number 18242425
Status Pending
Filing Date 2023-09-05
First Publication Date 2023-12-28
Owner Nikon Corporation (Japan)
Inventor Yamashita, Masashi

Abstract

A compact zooming optical system, an optical apparatus and a method for manufacturing the zooming optical system having a vibration reduction function, a high zooming ratio, a wide-angle view and superb optical performance are provided, the system including, in order from an object side: a first lens group G1 having positive refractive power; a second lens group G2 having negative refractive power; a third lens group G3 having positive refractive power; and a fourth lens group G4 having negative refractive power; upon zooming from a wide-angle end state to a telephoto end state, a distance between the first lens group G1 and the second lens group G2, a distance between the second lens group G2 and the third lens group G3 and a distance between the third lens group G3 and the fourth lens group G4 being respectively varied; the third lens group G3 having, in order from the object side, a first segment group G31 having positive refractive power and a second segment group G32; the second segment group G32 being moved to have a component in a direction perpendicular to the optical axis; and predetermined conditional expressions being satisfied.

IPC Classes  ?

  • G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
  • G02B 27/64 - Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 15/16 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group

98.

ELECTRONIC DEVICE, IMAGING DEVICE, AND IMAGING ELEMENT

      
Application Number 18244539
Status Pending
Filing Date 2023-09-11
First Publication Date 2023-12-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Gohara, Koichi
  • Tsuchiya, Satoshi

Abstract

An electronic device includes: an imaging unit including a region having a pixel group that has a plurality of first pixels, and second pixels that are fewer than the first pixels in the pixel group; and a control unit that reads out the signals based upon exposure of the second pixels during exposure of the plurality of first pixels.

IPC Classes  ?

  • H04N 23/73 - Circuitry for compensating brightness variation in the scene by influencing the exposure time
  • H01L 27/146 - Imager structures
  • H04N 23/12 - Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from different wavelengths with one sensor only
  • H04N 23/63 - Control of cameras or camera modules by using electronic viewfinders
  • H04N 23/84 - Camera processing pipelines; Components thereof for processing colour signals
  • H04N 23/67 - Focus control based on electronic image sensor signals
  • H04N 25/44 - Extracting pixel data from image sensors by controlling scanning circuits, e.g. by modifying the number of pixels sampled or to be sampled by partially reading an SSIS array
  • H04N 25/79 - Arrangements of circuitry being divided between different or multiple substrates, chips or circuit boards, e.g. stacked image sensors
  • H04N 25/13 - Arrangement of colour filter arrays [CFA]; Filter mosaics characterised by the spectral characteristics of the filter elements

99.

MICROSCOPE DEVICE AND DATA GENERATION METHOD

      
Application Number JP2022025272
Publication Number 2023/248459
Status In Force
Filing Date 2022-06-24
Publication Date 2023-12-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Ikeda, Satoshi
  • Fukutake, Naoki

Abstract

A microscope device (1) comprises: a first microscope unit (10) that irradiates a sample (SA) with first illumination light in a first direction to detect light emitted from the sample (SA) in response to the irradiation with the first illumination light; a second microscope unit (50) that irradiates the sample (SA) with second illumination light in a second direction orthogonal to the first direction to detect light emitted from the sample (SA) in response to the irradiation with the second illumination light; and a data processing unit that, on the basis of a detection signal of the light detected by the first microscope unit (10) and a detection signal of the light detected by the second microscope unit (50), generates a three-dimensional refractive index distribution of the sample (SA).

IPC Classes  ?

100.

SHAPING METHOD AND SHAPING DEVICE

      
Application Number JP2022025269
Publication Number 2023/248458
Status In Force
Filing Date 2022-06-24
Publication Date 2023-12-28
Owner NIKON CORPORATION (Japan)
Inventor Shibazaki Yuichi

Abstract

This shaping method for shaping a structure by forming a plurality of structural layers in a superimposed manner involves controlling the thickness distribution of a shaping material of a second structural layer formed by being superimposed on the first structural layer, by using, in combination: a first method for controlling the thickness of a shaping material in accordance with height information about a surface of a first structural layer; and a second method for controlling the thickness of the shaping material for a spatial frequency component differing from a spatial frequency component corresponding to the first method. The present invention makes it possible to improve the accuracy of the surface of the structure shaped by an additive manufacturing (AM) method.

IPC Classes  ?

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