SK Hynix Inc.

Republic of Korea

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IPC Class
G11C 11/15 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers 5
H01L 21/8246 - Read-only memory structures (ROM) 3
H01L 27/105 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components 3
C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the deposition of metallic material from metallo-organic compounds 2
C23C 16/40 - Oxides 2
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Found results for  patents

1.

WIRE BONDING METHOD AND DEVICE

      
Application Number KR2022009383
Publication Number 2023/149605
Status In Force
Filing Date 2022-06-30
Publication Date 2023-08-10
Owner
  • SK HYNIX INC. (Republic of Korea)
  • SHINKAWA LTD. (Japan)
Inventor
  • Kim, Seung Gyu
  • Ko, Han Gil
  • Son, Chang Jun
  • Lee, Kang Suk

Abstract

A wire bonding method and a wire bonding device are presented. The wire bonding method bonds a wire to form a bonding wire by using a bonding capillary which leads a wire, detects a defect occurring in a first tail of the wire, bonds the first tail of the wire to a discard lead, separates the first tail of the wire bonded to the discard lead from the wire, and guides a second tail to the separated wire. Wire bonding is performed again by using the wire to which the second tail is guided. A wire bonding device is configured to perform the wire bonding method.

IPC Classes  ?

  • H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices

2.

SEMICONDUCTOR THIN FILM-FORMING METAL PRECURSOR COMPOUND AND METAL-CONTAINING THIN FILM MANUFACTURED USING SAME

      
Application Number KR2022007297
Publication Number 2022/250400
Status In Force
Filing Date 2022-05-23
Publication Date 2022-12-01
Owner
  • SK TRICHEM (Republic of Korea)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Park, Yong Joo
  • Kim, Dong Su
  • Kim, Sang Ho
  • Song, Ki Chang
  • Oh, Han Sol
  • Hong, Chang Sung
  • Lee, Sang Kyung
  • Jang, Dong Hak
  • Moon, Ji Won
  • Lee, Jeong Yeop
  • Nam, Hae Won

Abstract

The present invention relates to a semiconductor thin film-forming metal precursor compound represented by chemical formula 1 and a metal-containing thin film formed using same.

IPC Classes  ?

  • C23C 16/40 - Oxides
  • C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
  • C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the deposition of metallic material from metallo-organic compounds
  • C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
  • C07F 5/00 - Compounds containing elements of Groups 3 or 13 of the Periodic System
  • C07F 17/00 - Metallocenes
  • H01L 49/02 - Thin-film or thick-film devices
  • H01L 29/51 - Insulating materials associated therewith

3.

NIOBIUM PRECURSOR COMPOUND, FILM-FORMING PRECURSOR COMPOSITION COMPRISING SAME, AND METHOD FOR FORMING NIOBIUM-CONTAINING FILM

      
Application Number KR2021009572
Publication Number 2022/019712
Status In Force
Filing Date 2021-07-23
Publication Date 2022-01-27
Owner
  • UP CHEMICAL CO., LTD. (Republic of Korea)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Kim, Jin Sik
  • Kim, Myeong Ho
  • Ahn, Sungwoo
  • Choi, Jun Hwan
  • Lee, Dong Kyun
  • Noh, Hyun Sik
  • Jang, Donghak
  • Jung, Eun Ae
  • Kim, Byungsoo

Abstract

The present application relates to a niobium precursor compound, a film-forming precursor composition comprising the niobium precursor compound, and a method for forming a niobium-containing film by using the film-forming precursor composition.

IPC Classes  ?

  • C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the deposition of metallic material from metallo-organic compounds
  • C23C 16/40 - Oxides
  • C23C 16/34 - Nitrides
  • C23C 16/32 - Carbides
  • C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
  • C07F 9/00 - Compounds containing elements of Groups 5 or 15 of the Periodic System

4.

METHOD FOR SUPPLYING OBJECT

      
Application Number KR2020002576
Publication Number 2020/256251
Status In Force
Filing Date 2020-02-21
Publication Date 2020-12-24
Owner
  • GENESEM INC. (Republic of Korea)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Han, Bok Woo
  • Cho, Yoon Ki
  • Go, Sang Nam

Abstract

A method for supplying an object is disclosed. The method for supplying an object may comprise: a step in which a first elevator structure supplies a new magazine, in which the object is accommodated, to one side of the X-axis of a second tray; a step in which a conveyor unit of the second tray moves the new magazine accommodating the object to the other side of the X-axis of the second tray; a step in which a second elevator structure supplies the object to an manufacturing apparatus by holding the new magazine accommodating the object that has been moved to the other side of the X-axis of the second tray by means of the conveyor unit of the second tray.

IPC Classes  ?

  • H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations

5.

AUTOMATIC PAD REPLACEMENT APPARATUS

      
Application Number KR2020002575
Publication Number 2020/251137
Status In Force
Filing Date 2020-02-21
Publication Date 2020-12-17
Owner
  • GENESEM INC. (Republic of Korea)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Han, Bok Woo
  • Cho, Yoon Ki
  • Go, Sang Nam

Abstract

An automatic pad replacement apparatus is disclosed. The automatic pad replacement apparatus comprises: a first pad carrier having a first loading part in which a pad detachably coupled to the lower end portion of a picker is loaded, and first through-hole parts which allow communication with the first loading part and which are formed through one side thereof in a Z-axis direction; and a gas applying part for suctioning, toward the first loading part, the pad loaded in the first loading part by applying vacuum pressure through the first through-hole parts.

IPC Classes  ?

  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
  • H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping

6.

TABLE MODULE AND APPARATUS FOR AUTOMATICALLY EXCHANGING CONVERSION KIT

      
Application Number KR2020002574
Publication Number 2020/175863
Status In Force
Filing Date 2020-02-21
Publication Date 2020-09-03
Owner
  • GENESEM INC. (Republic of Korea)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Han, Bok Woo
  • Cho, Yoon Ki
  • Go, Sang Nam

Abstract

Disclosed is a table module. The table module comprises: a conversion kit in which a plurality of vacuum holes are formed in a Z-axis direction; and a table negative pressure transfer plate structure which has the conversion kit disposed on the other surface in the Z-axis direction, and which allows a negative pressure generator and the vacuum holes to communicate with each other. The table negative pressure transfer plate structure can vacuum suction the conversion kit. While the table negative pressure transfer plate structure is vacuum suctioning the conversion kit, the conversion kit is fixed to the table negative pressure transfer plate structure. When the vacuum suctioning of the conversion kit by the table negative pressure transfer plate structure is stopped, the conversion kit can be removed from the table negative pressure transfer plate structure.

IPC Classes  ?

  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
  • H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
  • H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations

7.

FIELD-BIASED NONLINEAR OPTICAL METROLOGY USING CORONA DISCHARGE SOURCE

      
Application Number US2019029439
Publication Number 2019/210229
Status In Force
Filing Date 2019-04-26
Publication Date 2019-10-31
Owner
  • SK HYNIX INC. (Republic of Korea)
  • FEMTOMETRIX, INC. (USA)
Inventor
  • Ma, Seongmin
  • Kim, Sangmin
  • Cho, Jonghoi
  • Lei, Ming

Abstract

Various approaches can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation while other utilize four wave-mixing or multi-wave mixing. Corona discharge may be applied to the sample to provide additional information. Some approaches involve determining current flow from a sample illuminated with radiation.

IPC Classes  ?

  • G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined
  • G01N 21/63 - Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
  • H01L 21/66 - Testing or measuring during manufacture or treatment

8.

IMAGE SYNCHRONIZATION DEVICE AND IMAGE INFORMATION GENERATING DEVICE COMPRISING SAME

      
Application Number KR2018006691
Publication Number 2019/088389
Status In Force
Filing Date 2018-06-14
Publication Date 2019-05-09
Owner SK HYNIX INC. (Republic of Korea)
Inventor
  • Kim, Chang Hyun
  • Roh, Wan Jun
  • Lee, Doo Bock
  • Lee, Seung Hun
  • Lee, Jae Jin
  • Jeong, Chun Seok

Abstract

An image synchronization device according to one embodiment of the present invention comprises: a light-emitting source for emitting light at predetermined intervals; a sampling phase control unit for controlling sampling phases of a first image sensor and a second image sensor on the basis of light-emission timing of the light-emitting source; and a delay control unit for generating delay information on the basis of a result obtained by comparing first image information and second image information that the first image sensor and the second image sensor transmit by sensing and sampling a light-emitting signal of the light-emitting source.

IPC Classes  ?

  • H04N 5/341 - Extracting pixel data from an image sensor by controlling scanning circuits, e.g. by modifying the number of pixels having been sampled or to be sampled
  • H04N 5/225 - Television cameras

9.

SEMICONDUCTOR DEVICE AND SEMICONDUCTOR SYSTEM INCLUDING SAME

      
Application Number KR2018006692
Publication Number 2019/088390
Status In Force
Filing Date 2018-06-14
Publication Date 2019-05-09
Owner SK HYNIX INC. (Republic of Korea)
Inventor Jeong, Chun Seok

Abstract

A semiconductor system, according to an embodiment of the present invention, comprises: a first semiconductor device connected to a first transmission line, and for transmitting a first packet to a second transmission line on the basis of first destination information of the first packet received via the first transmission line; a second semiconductor device connected to the first semiconductor device via the second transmission line, and for transmitting a second packet to a third transmission line on the basis of second destination information of the second packet received via the second transmission line; and a third semiconductor device connected to the second semiconductor device via the third transmission line and connected to the first semiconductor device via the first transmission line, and for transmitting a third packet to the first transmission line on the basis of third destination information of the third packet received via the third transmission line.

IPC Classes  ?

10.

MAGNETORESISTIVE MEMORY APPARATUS CAPABLE OF RECOGNIZING STATE CHANGE DURING WRITING OPERATION, AND READING AND WRITING OPERATION METHOD THEREFOR

      
Application Number KR2017007187
Publication Number 2018/043903
Status In Force
Filing Date 2017-07-05
Publication Date 2018-03-08
Owner SK HYNIX INC. (Republic of Korea)
Inventor
  • Park, Sang Gyu
  • Lim, Il Young

Abstract

Disclosed are a transmitter which requires only a low cost and a small area and can eliminate switching noise, and a data transmission method therefor. The transmitter comprises: an encoder for converting two-level input data (1 and 0) into three-level data (+1, 0, and -1); and an output unit for outputting the data converted by the encoder. Here, the encoder adds one bit to the input data so that the number of bits corresponding to logic "1" is adjusted to an even number. Also, "+1" and "-1" corresponding to the logic "1" are alternately arranged, and a particular correlation is established between currents or voltages corresponding to at least two levels among the levels "+1", "0", and "-1" so as to allow a current flowing through a power line or a ground line to be constant regardless of the input data.

IPC Classes  ?

  • G11C 11/16 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect

11.

SEMICONDUCTOR MEMORY DEVICE

      
Application Number JP2016057482
Publication Number 2017/043111
Status In Force
Filing Date 2016-03-03
Publication Date 2017-03-16
Owner
  • TOSHIBA MEMORY CORPORATION (Japan)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Fujita, Katsuyuki
  • Yim, Hyuck Sang

Abstract

According to one embodiment, a semiconductor memory device comprises a first bank and a second bank. Each of the first bank and the second bank comprises a memory cell having a variable resistor element, a reference cell, a sense amplifier having a first input terminal electrically coupled to the memory cell and a second input terminal electrically coupled to the reference cell, and a first transistor electrically coupling the memory cell and the first input terminal of the sense amplifier. A gate of the first transistor of the first bank and a gate of the first transistor of the second bank are independently supplied with a voltage.

IPC Classes  ?

  • G11C 11/15 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers

12.

RESISTANCE CHANGE MEMORY

      
Application Number IB2016051435
Publication Number 2016/198965
Status In Force
Filing Date 2016-03-14
Publication Date 2016-12-15
Owner
  • TOSHIBA MEMORY CORPORATION (Japan)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Aikawa, Hisanori
  • Kishi, Tatsuya
  • Nakatsuka, Keisuke
  • Inaba, Satoshi
  • Toko, Masaru
  • Hosotani, Keiji
  • Yi, Jae Yun
  • Suh, Hong Ju
  • Kim, Se Dong

Abstract

According to an embodiment, a resistance change memory includes a semiconductor substrate, a transistor having a control terminal, a first terminal and a second terminal, the transistor provided on the semiconductor substrate, an insulating layer covering the transistor, a first conductive line connected to the first terminal and provided on the insulating layer, a second conductive line provided on the insulating layer, and a resistance change element connected between the second terminal and the second conductive line. The first conductive line has a width greater than a width of the second conductive line in a direction in which the first and second conductive lines are arranged.

IPC Classes  ?

  • G11C 13/00 - Digital stores characterised by the use of storage elements not covered by groups , , or
  • G11C 11/15 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
  • H01L 21/8246 - Read-only memory structures (ROM)
  • H01L 27/105 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components

13.

WAFER PROCESSING SYSTEM AND WAFER PROCESSING METHOD USING SAME

      
Application Number KR2014011369
Publication Number 2016/021778
Status In Force
Filing Date 2014-11-25
Publication Date 2016-02-11
Owner SK HYNIX INC. (Republic of Korea)
Inventor
  • Shin, Sang Hoon
  • Jang, Heyun Su
  • Lee, Chang Ho
  • Shin, Hee Young
  • Jung, Eun Jin

Abstract

A wafer processing system and a wafer processing method are disclosed. A semiconductor manufacturer is provided with a wafer comprising a wafer ID assigned by a wafer manufacturer. Next, the wafer ID is mapped as a wafer unique identification code of the semiconductor manufacturer, and then the wafer ID is identified as the wafer unique identification code without the need to form a separate laser mark.

IPC Classes  ?

  • H01L 23/544 - Marks applied to semiconductor devices, e.g. registration marks, test patterns
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or

14.

MAGNETIC MEMORY AND METHOD OF MANUFACTURING MAGNETIC MEMORY

      
Application Number JP2014067300
Publication Number 2015/136723
Status In Force
Filing Date 2014-06-24
Publication Date 2015-09-17
Owner
  • KABUSHIKI KAISHA TOSHIBA (Japan)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Sonoda, Yasuyuki
  • Nakayama, Masahiko
  • Lee, Min Suk
  • Yoshikawa, Masatoshi
  • Sugiura, Kuniaki
  • Hwang, Ji Hwan

Abstract

According to one embodiment, a magnetic memory includes a first metal layer including a first metal, a second metal layer on the first metal layer, the second metal layer including a second metal which is more easily oxidized than the first metal, the second metal layer having a first sidewall portion which contacts the first metal layer, and the second metal layer having a second sidewall portion above the first sidewall portion, the second sidewall portion which steps back from the first sidewall portion, a magnetoresistive element on the second metal layer, a third metal layer on the magnetoresistive element, and a first material which contacts a sidewall portion of the magnetoresistive element and the second sidewall portion of the second metal layer, the first material including an oxide of the second metal.

IPC Classes  ?

  • H01L 21/8246 - Read-only memory structures (ROM)
  • H01L 21/3065 - Plasma etching; Reactive-ion etching
  • H01L 27/105 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components
  • H01L 43/08 - Magnetic-field-controlled resistors
  • H01L 43/12 - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

15.

MAGNETORESISTIVE ELEMENT

      
Application Number JP2014069125
Publication Number 2015/136725
Status In Force
Filing Date 2014-07-14
Publication Date 2015-09-17
Owner
  • KABUSHIKI KAISHA TOSHIBA (Japan)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Watanabe, Daisuke
  • Kim, Yang Kon
  • Nagamine, Makoto
  • Eeh, Youngmin
  • Ueda, Koji
  • Nagase, Toshihiko
  • Sawada, Kazuya
  • Kim, Guk Cheon
  • Lee, Bo Mi
  • Choi, Won Joon

Abstract

According to one embodiment, there is provided a magnetoresistive element, including a first magnetic layer, a nonmagnetic layer on the first magnetic layer, and a second magnetic layer on the nonmagnetic layer, wherein one of the first and second magnetic layers include one of Co and Fe, and a material having a higher standard electrode potential than Co and Fe.

IPC Classes  ?

  • H01L 43/08 - Magnetic-field-controlled resistors
  • H01L 21/8246 - Read-only memory structures (ROM)
  • H01L 27/105 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components
  • H01L 29/82 - Types of semiconductor device controllable by variation of the magnetic field applied to the device
  • H01L 43/10 - Selection of materials

16.

SEMICONDUCTOR MEMORY DEVICE

      
Application Number JP2014070417
Publication Number 2015/033718
Status In Force
Filing Date 2014-07-29
Publication Date 2015-03-12
Owner
  • KABUSHIKI KAISHA TOSHIBA (Japan)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Shimizu, Naoki
  • Bae, Ji Hyae

Abstract

A semiconductor memory device is capable of executing a first mode having a first latency and a second mode having a second latency longer than the first latency. The semiconductor memory device includes: a pad unit configured to receive an address and a command from an outside; a first delay circuit configured to delay the address by a time corresponding to the first latency; a second delay circuit including shift registers connected in series and configured to delay the address by a time corresponding to a difference between the first latency and the second latency; and a controller configured to use the first delay circuit and the second delay circuit when executing the second mode.

IPC Classes  ?

  • G11C 11/15 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
  • G11C 7/00 - Arrangements for writing information into, or reading information out from, a digital store
  • G11C 8/00 - Arrangements for selecting an address in a digital store

17.

MISCORRECTION DETECTION FOR ERROR CORRECTING CODES

      
Application Number US2014036181
Publication Number 2014/197140
Status In Force
Filing Date 2014-04-30
Publication Date 2014-12-11
Owner SK HYNIX INC. (Republic of Korea)
Inventor
  • Marrow, Marcus
  • Bellorado, Jason
  • Wu, Zheng
  • Kumar, Naveen

Abstract

Miscorrection detection for error correction codes using bit reliabilities is disclosed, including: receiving a plurality of reliabilities corresponding to respective ones of a plurality of read values; receiving one or more proposed corrections corresponding to one or more of the plurality of read values; and determining a miscorrection metric based at least in part on one or more of the plurality of reliabilities corresponding to the one or more of the plurality of read values.

IPC Classes  ?

  • H03M 13/00 - Coding, decoding or code conversion, for error detection or error correction; Coding theory basic assumptions; Coding bounds; Error probability evaluation methods; Channel models; Simulation or testing of codes

18.

SYNDROME TABLES FOR DECODING TURBO-PRODUCT CODES

      
Application Number IB2014001381
Publication Number 2014/174370
Status In Force
Filing Date 2014-03-25
Publication Date 2014-10-30
Owner SK HYNIX INC. (Republic of Korea)
Inventor
  • Subramanian, Arunkumar
  • Kumar, Naveen
  • Wu, Zheng
  • Zeng, Lingqi
  • Bellorado, Jason

Abstract

A system comprises a component syndrome buffer, and a component decoder configured to obtain, from the component syndrome buffer, a set of one or more component syndromes associated with a turbo product code (TPC) codeword and perform component decoding on the set of one or more component syndromes.

IPC Classes  ?

  • H03M 13/03 - Error detection or forward error correction by redundancy in data representation, i.e. code words containing more digits than the source words

19.

NEIGHBOR BASED AND DYNAMIC HOT THRESHOLD BASED HOT DATA IDENTIFICATION

      
Application Number US2014014506
Publication Number 2014/163743
Status In Force
Filing Date 2014-02-03
Publication Date 2014-10-09
Owner SK HYNIX INC. (Republic of Korea)
Inventor
  • Tang, Xiangyu
  • Lee, Frederick, K.H.
  • Bellorado, Jason
  • Zeng, Lingqi
  • Wu, Zheng

Abstract

An address is received. One or more neighbors associated with the received address is/are determined. One or more neighboring hot metrics is/are determined for the one or more neighbors associated with the received address. A hot metric for the received address is determined based at least in part on the neighboring hot metrics.

IPC Classes  ?

  • G06F 12/00 - Accessing, addressing or allocating within memory systems or architectures

20.

NONVOLATILE RANDOM ACCESS MEMORY

      
Application Number JP2014057024
Publication Number 2014/148403
Status In Force
Filing Date 2014-03-11
Publication Date 2014-09-25
Owner
  • KABUSHIKI KAISHA TOSHIBA (Japan)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Shirai, Yutaka
  • Shimizu, Naoki
  • Tsuchida, Kenji
  • Watanabe, Yoji
  • Bae, Ji Hyae
  • Kim, Yong Ho

Abstract

According to one embodiment, a memory includes a memory cell array with banks, each bank including rows, a first word lines provided in corresponding to the rows, an address latch circuit which latches a first row address signal, a row decoder which activates one of the first word lines, and a control circuit which is configured to execute a first operation which activates one of the banks based on a bank address signal when a first command is loaded, and a second operation which latches the first row address signal in the address latch circuit, and execute a third operation which activates one of the first word lines by the row decoder based on a second row address signal and the first row address signal latched in the address latch circuit when a second command is loaded after the first command.

IPC Classes  ?

  • G11C 11/15 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers

21.

RESISTANCE CHANGE MEMORY

      
Application Number JP2014057026
Publication Number 2014/148405
Status In Force
Filing Date 2014-03-11
Publication Date 2014-09-25
Owner
  • KABUSHIKI KAISHA TOSHIBA (Japan)
  • SK HYNIX INC. (Republic of Korea)
Inventor
  • Takahashi, Masahiro
  • Katayama, Akira
  • Kim, Dong Keun
  • Oh, Byoung Chan

Abstract

According to one embodiment, a resistance change memory includes a memory cell, a sense amplifier and a global bit line. The memory cell is disposed at a location where a local bit line and a word line intersect each other. The memory cell is connected to both the local bit line and the word line. The sense amplifier reads data stored on the memory cell by supplying a read current to the memory cell. The global bit line is connected between the local bit line and the sense amplifier. The global bit line feeds the read current supplied by the sense amplifier to the local bit line. The sense amplifier charges the global bit line, before the local bit line and the global bit line are connected to each other.

IPC Classes  ?

  • G11C 11/15 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
  • G11C 13/00 - Digital stores characterised by the use of storage elements not covered by groups , , or

22.

GENERATION OF A COMPOSITE READ BASED ON NEIGHBORING DATA

      
Application Number US2013069004
Publication Number 2014/130104
Status In Force
Filing Date 2013-11-07
Publication Date 2014-08-28
Owner SK HYNIX INC. (Republic of Korea)
Inventor
  • Bellorado, Jason
  • Subramanian, Arunkumar
  • Marrow, Marcus
  • Wu, Zheng
  • Zeng, Lingqi

Abstract

A victim group of one or more cells is read using a first read threshold to obtain a first raw read which includes one or more values. The victim group of cells is read using a second read threshold to obtain a second raw read which includes one or more values. A neighboring read, corresponding to a neighboring group of one or more cells associated with the victim group of cells, is obtained. A composite read is generated, including by selecting from at least the first raw read and the second raw read based at least in part on the neighboring read.

IPC Classes  ?

  • G11C 11/34 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices

23.

COBALT (CO) AND PLATINUM (PT)-BASED MULTILAYER THIN FILM HAVING INVERTED STRUCTURE AND METHOD FOR MANUFACTURING SAME

      
Application Number KR2012005035
Publication Number 2013/176332
Status In Force
Filing Date 2012-06-26
Publication Date 2013-11-28
Owner SK HYNIX INC. (Republic of Korea)
Inventor
  • Lim, Sang Ho
  • Lee, Tae Young
  • Lee, Seong Rae
  • Son, Dong-Su

Abstract

The present invention relates to a cobalt (Co) and platinum (Pt)-based multilayer thin film having a novel structure with perpendicular magnetic anisotropy and to a method for manufacturing same. More particularly, the present invention relates to a perpendicular magnetic anisotropic multilayer thin film having an inverted structure, comprising cobalt thin film layers and platinum thin film layers alternately stacked on a substrate, wherein the thickness of the cobalt thin film layers is greater than that of the platinum thin film layers. The cobalt and platinum-based multilayer thin film having an inverted structure according to the present invention has a novel structure in that the thickness of a magnetic thin film layer is greater than that of a non-magnetic thin film layer, and the size of perpendicular magnetic anisotropic energy is adjusted according to the thickness of the thin film to thus enable the thin film to be applied as a free layer and a fixed layer in a magnetic tunnel junction structure. The thin film of the present invention provides superior thermal stability to thus maintain high perpendicular magnetic anisotropic energy density even after a subsequent heat treatment process, and promotes formation of in-plane magnetic anisotropy to provide the effects of reducing the density of critical current required for magnetization switching, and therefore, the thin film of the present invention can be used effectively in a high performance high density magnetic random access memory.

IPC Classes  ?

  • G01R 33/05 - Measuring direction or magnitude of magnetic fields or magnetic flux using the flux-gate principle in thin-film element