A stable isotope-labeled indole carboxylic acid compound represented by Formula (I) is provided. In Formula (I), X1 to X8 are each independently C or 13C; Y is N or 15N; M is H, Na, K, Li, CH3, or C2H5; R1 is H or D; R2 is H, CH3, 13CH3, C2H5, or 13C2H5; R3 is H, CH3, 13CH3, C2H5, or 13C2H5; R4 is H or D; and R5 is H or D.
A stable isotope-labeled indole carboxylic acid compound represented by Formula (I) is provided. In Formula (I), X1 to X8 are each independently C or 13C; Y is N or 15N; M is H, Na, K, Li, CH3, or C2H5; R1 is H or D; R2 is H, CH3, 13CH3, C2H5, or 13C2H5; R3 is H, CH3, 13CH3, C2H5, or 13C2H5; R4 is H or D; and R5 is H or D.
G01N 33/574 - Immunoassay; Biospecific binding assay; Materials therefor for cancer
C07D 209/42 - Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
G01N 33/96 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving blood or serum control standard
2.
Atom Beam Generation Device, Physical Package, Optical Lattice Clock Physical Package, Atomic Clock Physical Package, Atomic Interferometer Physical Package, Quantum Information Processing Device Physical Package, and Physical Package System
An atomic oven includes a cartridge and a main body. The cartridge includes a holder that accommodates an atom source; and a capillary nozzle. The main body includes: a housing in which the cartridge is installed; a button heater; an access opening for removing the cartridge from the main body and placing the cartridge into the main body, the access opening being provided on the atmosphere side, which is outside the main body; and a passage from the access opening to the housing. The cartridge is inserted into the main body through the access opening and is installed in the housing. The atom source is heated by the button heater, whereby atomic gas generated from the atom source is emitted as an atom beam to the vacuum side, which is outside the main body.
G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
3.
Slow Atomic Beam Generator, Physical Package, Physical Package for Optical Lattice Clock, Physical Package for Atomic Clock, Physical Package for Atomic Interferometer, Physical Package for Quantum Information Processing Device, and Physical Package System
By heating a high-temperature bath with a heater, atomic gas is generated in the high-temperature bath from an atomic source. A magneto-optical trap is realized by a laser beam reflected by a right-angled conical mirror and a magnetic field formed by a magnetic field generator, and the atomic gas is confined by using the magneto-optical trap and cooled. The cooled atoms are output from an opening to the outside of a slow atom beam generator by a laser beam, which is a push laser beam. A slow atomic beam is thereby formed.
An estrogen derivatization method uses a quaternary cation-containing 5-fluoro-2,4-dinitrophenyl compound represented by Formula (1):
An estrogen derivatization method uses a quaternary cation-containing 5-fluoro-2,4-dinitrophenyl compound represented by Formula (1):
where in Formula (1), X is a quaternary cation. A mass spectrometry method includes derivatizing estrogen by the above estrogen derivatization method. A derivatization reagent derivatizing estrogen includes a quaternary cation-containing 5-fluoro-2,4-dinitrophenyl compound represented by Formula (1), where in Formula (1), X is a quaternary cation.
A second polymer is prepared through derivatization of a first polymer. Kendrick Mass Defect (KMD) analysis is applied on a mass spectrum of the second polymer, to thereby produce a plot. Meanwhile, a plurality of mass candidates for a non-primary-chain segment are calculated based on a mass spectrum of the first polymer. The KMD analysis is applied on the plurality of mass candidates, to thereby produce reference images. A mass of the non-primary-chain segment is identified through matching of two KMD analysis results.
A laser beam illumination equipment has a laser beam generation section and a mirror unit. An image generation section has a camera and a camera controller. A laser beam illumination control section sets a pulse period of a laser beam to the same period as an exposure period of the camera. With this configuration, a state change of a specimen can be set uniform over exposure durations. A pulse train of the laser beam may be generated based on a synchronization signal which is output from the camera controller.
There is provided a sample milling apparatus capable of mitigating heat damage to a sample. The apparatus mills the sample by irradiating it with an ion beam and includes: an ion source for emitting the ion beam; and a shield plate placed on the sample and covering a part of the sample. The shield plate includes: a shield surface on which the ion beam impinges; and a bottom surface connected to the shield surface and forming a bottom edge. The bottom surface is smaller in area than the shield surface.
An electron microscope includes an irradiation optical system that irradiates a specimen with an electron beam, a specimen stage that supports the specimen, an image forming optical system that forms an image of electrons transmitted through the specimen, an imaging apparatus that captures an image formed by the image forming optical system, and a control unit that controls inclination of the specimen with respect to an incident direction of the electron beam. The irradiation optical system includes an aperture that cuts off a part of the electron beam to be irradiated to the specimen. The control unit acquires an image including Kikuchi bands that appear in a shadow region of the aperture, detects the Kikuchi bands in the shadow region of the aperture in the image, and controls inclination of the specimen with respect to the incident direction of the electron beam, based on the detected Kikuchi bands.
An electron beam accelerated using a first acceleration voltage is applied to respective positions on a sample to obtain spectra A at the respective positions, and an electron beam accelerated using a second acceleration voltage different from the first acceleration voltage is applied to the respective positions on the sample to obtain spectra B at the respective positions. Then, a spectral ratio A/B of the spectra is calculated at each of the positions to generate a waveform representing the spectral ratio A/B. The value of a spectral ratio A/B in an energy region of interest is extracted from each of the waveforms. The extracted values are mapped onto points corresponding to the respective positions on the sample, whereby a spectral map is generated. The spectral map is displayed.
In various embodiments of the invention, a solid sample magic angle spinning nuclear magnetic resonance (NMR) probe can utilize an appropriate inductance parent coil with a fixed capacitor and introducing an idler coil with a variable capacitor which can inductively couple to the parent coil by adjusting the variable capacitance of the idler coil. By coupling the idler coil to the parent coil in this manner a double resonance circuit can be provided without the disadvantages of prior art coils. In an alternative embodiment of the invention, a solid sample magic angle spinning nuclear magnetic resonance probe can utilize an appropriate inductance parent coil with a fixed capacitor, introducing an idler coil with a variable capacitor in a first region and two variable inductor coupling coils and two coupling coils in a second region, where the two variable inductors are connected to the parent coil to reduce the number of coils in the sample region of the NMR probe, where variable inductors can inductively couple to the parent coil by adjusting one or both the capacitance of the variable capacitor of the idler coil and/or adjusting the variable inductors to observe a tuned condition between the parent coil and the idler coil.
A load unit jets a load gas from a cone-shaped slit to a first position located in a pathway. As a result, a first gas stream for loading a sample tube is generated. An eject unit jets an eject gas from a cone-shaped slit to a second position in the pathway. As a result, a second gas stream for ejecting a sample tube is generated.
Provided is a focused ion beam apparatus that machines a cross section of a specimen by scanning the specimen with an ion beam. The focused ion beam apparatus includes an optical system that scans the specimen with the ion beam, a receiving unit that receives setting of a machining region of the specimen and setting of a plurality of machining conditions for the machining region, and a control unit that controls the optical system. The control unit causes the optical system to scan the machining region with the ion beam, based on the machining conditions that have been set for the machining region.
A three-dimensional powder bed fusion additive manufacturing (PBF-AM) apparatus includes: a build plate that holds a powder layer made of a metal powder; a beam irradiating device that irradiates the build plate or the powder layer with an electron beam; and a heat shield unit shields radiant heat emitted from a part heated by irradiation with the electron beam. The heat shield unit is configured of a plurality of heat shield members. Each of the plurality of heat shield members has a side wall surrounding a side of a beam passage region through which the electron beam passes, and the side walls are arranged to overlap each other on a side of the beam passage region.
B22F 12/90 - Means for process control, e.g. cameras or sensors
B33Y 50/00 - Data acquisition or data processing for additive manufacturing
B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
A first searcher executes a primary search with respect to a primary library based on a sample mass spectrum. The primary library includes a plurality of standard mass spectra. When a judging unit judges that a search range is to be enlarged, a second searcher executes a secondary search with respect to a secondary library based on the sample mass spectrum. The secondary library includes a plurality of predicted mass spectra produced from a plurality of molecular structures.
A holder includes a first sub holder configured to hold a primary specimen, and a second sub holder configured to hold a support member. The primary specimen is processed in a first state where the holder is disposed within a first specimen processing apparatus. Subsequently, in a second state where the holder is disposed within a second specimen processing apparatus, a secondary specimen is prepared from the primary specimen, the secondary specimen is moved onto the support member, and a thin film specimen is prepared from the secondary specimen.
A powder bed fusion additive manufacturing (PBF-AM) apparatus includes an electron gun chamber, a build chamber, a first vacuum pump, a second vacuum pump, and a beam path. In addition, the three-dimensional PBF-AM apparatus includes a differential evacuation aperture, a focusing lens, and an axis adjustment mechanism. The differential evacuation aperture divides an internal space of the beam path into two, and has a restriction hole through which an electron beam can pass. The focusing lens is configured to focus the electron beam by a restriction hole of the differential evacuation aperture. The axis adjustment mechanism is configured to adjust a trajectory of the electron beam or positions of the focusing lens and the differential evacuation aperture so that an optical axis of the electron beam passes through both the center of the restriction hole and the center of the focusing lens.
B22F 12/41 - Radiation means characterised by the type, e.g. laser or electron beam
B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
B22F 12/90 - Means for process control, e.g. cameras or sensors
17.
Three-Dimensional Powder Bed Fusion Additive Manufacturing Apparatus, Three-Dimensional Powder Bed Fusion Additive Manufacturing Method, and Method For Setting Moving Speed of Regulating Member in Three-Dimensional Powder Bed Fusion Additive Manufacturing
Provided is a three-dimensional powder bed fusion additive manufacturing (PBF-AM) apparatus including a base plate, a regulating member configured to level powder supplied onto the base plate by moving over the base plate at a height position keeping a predetermined interval from a surface of the base plate to form a powder layer, and a controller configured to control movement of the regulating member, in which an input unit for inputting manufacturing data is included, and the controller causes the regulating member to move at a moving speed based on the manufacturing data input from the input unit.
B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
An electron spectrometer is provided which can collect spectra in a reduced measurement time. The electron spectrometer includes an electron analyzer for providing energy dispersion of electrons emitted from a sample (S), a detector having a plurality of detection elements juxtaposed and arranged in the direction of energy dispersion of the dispersed electrons, and a processor. The processor operates (i) to sweep a measurement energy in first incremental energy steps (ΔE1) within the analyzer, to detect the dispersed electrons with the detection elements, and to obtain a plurality of resulting first spectra; (ii) to interpolate points of measurement in each of the first spectra; and (iii) to generate a spectral chart in second incremental energy steps (ΔE2) smaller than the first incremental energy steps (ΔE1) on the basis of the first spectra for which the points of measurement have been interpolated.
Provided is a sample container which is for use with an X-ray fluorescence analyzer and which permits measurement of light elements in a liquid. The sample container includes a sealable first receptacle, a pressure adjusting valve for adjusting the pressure in the first receptacle, a second receptacle receiving a liquid sample (S) and having both a first opening and a second opening located inside and outside, respectively, of the first receptacle, and an analytical film closing off the second opening and transmitting X-rays.
G01N 23/2204 - Specimen supports therefor; Sample conveying means therefor
G01N 23/223 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
20.
Charged Particle Beam Device and Image Acquisition Method
A charged particle beam device acquires an image by scanning a specimen with a probe formed from a charged particle beam and detects a signal emitted from the specimen. The charged particle beam device includes an optical system that forms the probe; a control unit that repeatedly performs correction processing and image acquisition processing for acquiring a frame image; and an image processing unit that generates an image of the specimen based on a plurality of the frame images. In the correction processing, the control unit acquires a reference image, and corrects the shifting of the irradiation position of the probe. The image processing unit acquires position shift information, corrects a position shift between the frame images based on the position shift information, and generates an image of the specimen based on the plurality of corrected frame images.
An electron microscope includes an electronic optical system that irradiates a specimen with an electron beam and forms an image; a camera that includes an image sensor and outputs a frame image; and a computation unit that generates an image based on the frame image. The computation unit sets a threshold; and binarizes the frame image using the threshold, and generates the image based on the binarized frame image. In setting the threshold, the computation unit repeatedly sets a tentative threshold, acquires a plurality of the frame images obtained on a condition that electrons entering the image sensor follow Poisson process, binarizes each of the plurality of acquired frame images using the tentative threshold, generates an integrated image by integrating the plurality of binarized frame images, and obtains a normalized constant based on a mean and variance of pixel values of pixels of the integrated image.
A pre-processor applies a pre-process to an original mass image produced through mass spectrometry of a sample, to produce a model input image. An image quality converter has an image quality conversion model produced through machine learning based on a group of images produced by a scanning electron microscope, and produces a model output image through image quality conversion of the model input image. A post-processor applies a post-process to the model output image, to produce a mass image after image quality conversion.
An electron microscope includes an irradiation optical system that focuses electron beams and scans a specimen with the focused electron beams; a deflector that deflects the electron beams transmitted through the specimen; a detector that detects the electron beams transmitted through the specimen; and a control unit that controls the irradiation optical system and the deflector The control unit causes the irradiation optical system to scan the specimen with the electron beams so that the electron beams have a plurality of irradiation positions on the specimen. The control unit causes the deflector to repeatedly deflect the electron beams transmitted through each of the irradiation positions, so that a plurality of electron beams which have the same irradiation position and different incident angle ranges with respect to the specimen are caused to sequentially enter the detector.
G01N 23/18 - Investigating the presence of defects or foreign matter
G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material
24.
Charged Particle Beam System and Control Method Therefor
Provided is a charged particle beam system capable of scanning a sample in a short time. The charged particle beam system is operative to scan the sample with a charged particle beam and to obtain a scanned image, and includes a magnetic deflector for producing a magnetic field to deflect the beam, an electrostatic deflector for producing an electric field to deflect the beam, and a controller for controlling both magnetic deflector and electrostatic deflector. The controller causes the magnetic deflector to deflect the beam in a first direction and to draw a first scan line, causes the magnetic deflector to deflect the beam in a second direction perpendicular to the first direction, causes the electrostatic deflector to deflect the beam in a third direction opposite to the first direction, and causes the magnetic deflector to deflect the beam in the first direction and to draw a second scan line.
Provided is a charged particle beam source having an emitter that can be replaced easily. The charged particle beam source includes an electron gun chamber; a first unit including both a supportive insulative member mechanically supporting a cable and a first set of terminals electrically connected to the cable; and a second unit including both the emitter that releases charged particles and a second set of terminals electrically connected to the emitter. The chamber has a side wall provided with a through-hole in which the first unit is secured. The second unit can be detachably mounted to the first unit. Within the chamber, the emitter is placed on an optical axis, so that the first and second sets of terminals are brought into contact with each other.
A charged particle beam apparatus that forms a probe with a charged particle beam and scans a specimen with the probe to acquire a scanning image. The charged particle beam apparatus includes an optical system for scanning the specimen with the probe; a detector that detects a signal generated from the specimen through the scanning of the specimen with the probe; and a control unit that controls the optical system. The control unit performs correction processing of acquiring a reference image obtained by the scanning of the specimen with the probe, comparing the reference image to a criterion image to determine a drift amount, and correcting a displacement of an irradiation position with the probe on the specimen based on the drift amount; and processing of setting a frequency with which the correction processing is to be performed based on the drift amount.
A charged particle beam apparatus for scanning a specimen with a charged particle beam and acquiring a scan image. The charged particle beam apparatus including: an optical system that includes a pulse mechanism for illuminating the specimen with pulses of the charged particle beam, and a deflector that deflects the charged particle beam and scans the specimen with the deflected charged particle beam; and a control unit that controls the optical system. The control unit controls the optical system so as to satisfy T = n × t (n is a natural number). T represents a dwell time of the charged particle beam in each pixel of the scan image, and t represents a cycle of pulses of the charged particle beam.
Light which is radiant energy is emitted from a sample which is heated, and is detected by a backscattered electron detector. A detection signal from the backscattered electron detector includes a radiant component. A radiant component removal section extracts the radiant component from the detection signal using a filter, and then removes the radiant component from the detection signal. An optical detector which detects the radiant component may be provided. A divided detector may be provided as the backscattered electron detector.
A partial structure estimation apparatus is configured to generate a first explanatory variable by performing composition estimation for each peak in a mass spectrum acquired from a sample, and to generate a second explanatory variable by performing composition estimation for each peak interval in the mass spectrum. The partial structure estimation apparatus is further configured to then estimate a partial structure as an objective variable based on the first explanatory variable and the second explanatory variable. In a partial structure estimation model generation apparatus, a partial structure estimation model is generated through machine learning using a training data set.
An aberration correcting device includes a first multipole which generates a hexapole field; a second multipole which generates a hexapole field with a polarity opposite to a polarity of the hexapole filed generated by the first multipole; a third multipole which is disposed between the first multipole and the second multipole and generates an octupole field; a first transfer lens system disposed between the first multipole and the third multipole; and a second transfer lens system disposed between the third multipole and the second multipole. The first transfer lens system includes a plurality of fourth multipoles which generate a field in which an electromagnetic-field superposed quadrupole field and an octupole field are superposed; and the second transfer lens system includes a plurality of fifth multipoles which generate a field in which an electromagnetic-field superposed quadrupole field and an octupole field are superposed.
A phase analyzer includes a data acquisition unit that acquires a plurality of pieces of spectrum imaging data in which positions on a sample are associated with spectra which are based on signals from the sample; a first acquisition unit that acquires a first representative spectrum group for each piece of spectrum imaging data by performing multivariate analysis on each of the plurality of pieces of spectrum imaging data; a second acquisition unit that acquires a second representative spectrum group by performing multivariate analysis on the plurality of first representative spectrum groups acquired by the first acquisition unit; and a phase analysis unit that performs phase analysis on each of the plurality of pieces of spectrum imaging data by using the second representative spectrum group.
In various embodiments of the invention, a solid sample magic angle spinning nuclear magnetic resonance (NMR) probe can utilize an appropriate inductance parent coil with a fixed capacitor and introducing an idler coil with a variable capacitor which can inductively couple to the parent coil by adjusting the variable capacitance of the idler coil. By coupling the idler coil to the parent coil in this manner a double resonance circuit can be provided without the disadvantages of prior art coils. In an alternative embodiment of the invention, a solid sample magic angle spinning nuclear magnetic resonance probe can utilize an appropriate inductance parent coil with a fixed capacitor, introducing an idler coil with a variable capacitor in a first region and two variable inductor coupling coils and two coupling coils in a second region, where the two variable inductors are connected to the parent coil to reduce the number of coils in the sample region of the NMR probe, where variable inductors can inductively couple to the parent coil by adjusting one or both the capacitance of the variable capacitor of the idler coil and/or adjusting the variable inductors to observe a tuned condition between the parent coil and the idler coil.
An aberration corrector includes a first multipole element for producing a hexapole field, a second multipole element for producing a hexapole field, and a transfer lens system disposed between the first and second multipole elements. The first and second multipole elements are arranged along an optical axis. At least one of the hexapole fields respectively produced by the first multipole element and the second multipole element varies in strength along the optical axis.
Tokyo University of Agriculture and Technology (Japan)
JEOL Ltd. (Japan)
Inventor
Nagata, Akiko
Mizumoto, Yuka
Sakamoto, Ryota
Nagasawa, Kazuo
Takiwaki, Masaki
Kikutani, Yoshikuni
Takahashi, Koji
Fukuzawa, Seketsu
Abstract
The present invention is intended to provide a compound useful to analyze a vitamin D compound. The present invention provides an alkyne compound represented by Formula (I):
The present invention is intended to provide a compound useful to analyze a vitamin D compound. The present invention provides an alkyne compound represented by Formula (I):
The present invention is intended to provide a compound useful to analyze a vitamin D compound. The present invention provides an alkyne compound represented by Formula (I):
where in Formula (I), A is a linear carbon chain having an alkynyl group at an end and having a vinyl group at another end; X1 is CH or 13CH; X2 is CHY, CDY, 13CHY, 13CDY, CO, 13CO, C18O, or 13C18O; m is an integer from 1 to 4; when m is 2 or more, X2s are identical or different; Y is H, D, NH2, 15NH2, OH, 18OH, SH, OR, O(CO)R, OSO3H, OSO3Na, or a sugar substituent; when Formula (I) contains two or more Ys, Ys are identical or different; R is an alcohol protective group, an alkyl group, an alkenyl group, or an aryl group; X3 is C or 13C; and at least one selected from the group consisting of X1, X2(s), and X3 is modified with a stable isotope D, 13C, 18O, or 15N.
C07C 401/00 - Irradiation products of cholesterol or its derivatives; Vitamin D derivatives, 9,10-seco cyclopenta[a]phenanthrene or analogues obtained by chemical preparation without irradiation
A sample cartridge has a sample stand and an inclining mechanism. A sample cartridge holding apparatus has a housing part which is inclined. When the sample cartridge is inserted into the housing part, a contact portion contacts a lever of the inclining mechanism, and the sample stand is inclined by a predetermined angle. With this process, an appropriate inclination angle is realized for the sample stand.
A physical package is provided with: a MOT device; an optical chamber which constitutes an optical lattice formation portion; and a vacuum chamber which surrounds these components and has a substantially cylindrical shape. The MOT device is arranged along the beam axis of an atomic beam and traps an atom cluster. The optical lattice formation portion uses optical lattice light that enters therein to form an optical lattice in a cavity, confines the atom cluster trapped by the MOT device in the optical lattice, and transfers, along the X-axis which is a movement axis perpendicular to the beam axis, the atom cluster to a clock transition space which facilitates clock transition. The central axis of the cylinder of the main body of the vacuum chamber passes through the clock transition space, and is set to be substantially parallel with the beam axis.
G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
H01S 1/06 - Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range gaseous
G02F 1/09 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect
An FIB system includes an ion source for producing the ion beam, a lens system which includes an objective lens and which is operative to focus the ion beam onto a sample such that secondary electrons are produced from the sample, a detector for detecting the secondary electrons, and a controller for controlling the lens system. The controller operates i) to provide control so that a focus of the ion beam is varied by directing the ion beam onto the sample, ii) to measure a signal intensity from the secondary electrons produced from the sample during the variation of the strength of the objective lens, iii) to adjust the focus of the ion beam, iv) to acquire a secondary electron image containing an image of a trace of a spot, and v) to correct the deviation of the field of view of the ion beam.
An optical lattice clock includes a clock transition space having disposed therein an atom group trapped in an optical lattice, and a triaxial magnetic field correction coil for correcting the magnetic field of the clock transition space. Additionally, in a correction space that includes the clock transition space and is larger than the clock transition space, a photoreceiver promotes the clock transition of the atom group trapped in the optical lattice and acquires a clock transition frequency distribution for the correction space. Further, a corrector corrects the magnetic field of the triaxial magnetic field correction coil on the basis of the frequency distribution measured by the photo receiver.
H03L 7/26 - Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference
G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
39.
Sample Cartridge Carrier Apparatus and Carrier Base
A sample cartridge carrier apparatus is coupled with a focused ion beam processing apparatus (FIB processing apparatus). A guide mechanism is configured to guide a series of movements of a sample cartridge holder to allow a sample cartridge to be held by a carrier base on a sub stage. Sub cooling equipment is configured to cool the sample cartridge via the sub stage. A carrier mechanism carries the carrier base between the sub stage and a main stage.
Provided is a sample milling apparatus capable of milling various samples efficiently. The sample milling apparatus includes an anode, a cathode for emitting electrons which are made to collide with gas molecules so that ions are generated, an extraction electrode for causing the generated ions to be extracted as an ion beam, and a focusing electrode disposed between the cathode and the extraction electrode and applied with a focusing voltage. The spatial profile of the ion beam is controlled by varying the focusing voltage applied to the focusing electrode.
An amplifier circuit includes a constant current circuit for outputting a constant current signal at its output terminal, an operational amplifier for outputting an amplified control signal based on the first voltage signal, and an amplified voltage output circuit for outputting a second voltage signal based on both the constant current signal and the amplified control signal. The constant current circuit has a light-emitting device having one end supplied with the constant voltage signal and another end supplied with ground potential, a light responsive electricity generating device for outputting a drive signal in response to light emitted by the light-emitting device, a first transistor generating the constant current signal based on the amplified voltage signal applied thereto and to output the constant current signal; and a current control circuit for detecting the value of the constant current signal and controlling the supply of the drive signal based on the detection.
H02M 3/158 - Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only with automatic control of output voltage or current, e.g. switching regulators including plural semiconductor devices as final control devices for a single load
H01J 37/248 - Components associated with high voltage supply
An angle adjuster for nuclear magnetic resonance (NMR) includes a linear motion member composed of a shaft and a support member, a rotary member, a conversion mechanism, and a spring. The linear motion member is a member that serves to change, in an NMR probe device, an angle of a sample tube by a linear motion. The rotary member is rotated by a motor. The conversion mechanism converts a rotary motion of the rotary member into a linear motion of the linear motion member. The spring provides, at a portion where the linear motion member and the rotary member are in engagement with each other, a force that urges the linear motion member in one direction toward the rotary member.
G01R 33/483 - NMR imaging systems with selection of signal or spectra from particular regions of the volume, e.g. in vivo spectroscopy
43.
Triaxial magnetic field correction coil, physics package, physics package for optical lattice clock, physics package for atomic clock, physics package for atom interferometer, physics package for quantum information processing device, and physics package system
There is a need to maintain or enhance the magnetic field correction accuracy of a physics package while making the physics package more compact and portable. A triaxial magnetic field correction coil is provided inside a vacuum chamber surrounding a clock transition space having atoms disposed therein. The triaxial magnetic field correction coil is formed into a shape such that it is possible to correct, for magnetic field components of three axial directions passing through the clock transition space, a constant term, a first order spatial derivative term, a second order spatial derivative term, a third or higher order spatial derivative term, or some given combination of these terms. The triaxial magnetic field correction coil can be used in, for example, a physics package for an optical lattice clock.
H03L 7/26 - Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference
G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
H01F 7/20 - Electromagnets; Actuators including electromagnets without armatures
In a frequency converter, a transmission signal having a first frequency component and a second frequency component is multiplied by a local signal, to thereby frequency-convert the transmission signal. In a power amplifier, the frequency-converted transmission signal is amplified. A demultiplexing circuit generates a first transmission signal and a second transmission signal from the amplified transmission signal. A controller is configured to set for a transmission section a frequency set suitable for two irradiation frequencies.
Ions ejected from a collision cell are detected by a detector. An evaluation unit generates a temporary calibration curve based on an intensity of a detection signal and evaluates an ion accumulation time of the collision cell based on the temporary calibration curve. When the evaluation unit determines signal saturation, the ion accumulation time of the collision cell is reduced. When the evaluation unit determines sensitivity insufficiency, the ion accumulation time of the collision cell is increased.
A phase analyzer includes a data acquisition unit that acquires spectrum imaging data in which a position on a sample is associated with a spectrum of a signal from the sample; a candidate determination unit that performs multivariate analysis on the spectrum imaging data to determine candidates for the number of phases; a phase analysis unit that creates, for each of the candidates, a phase map group including a number of phase maps corresponding to the number of phases; and a display control unit that causes a display unit to display, for each of the candidates, the phase map group.
G01N 23/2208 - Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement all measurements being of secondary emission, e.g. combination of SE measurement and characteristic X-ray measurement
G01N 23/2252 - Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
A phase analyzer includes a data acquisition unit that acquires spectrum imaging data in which a position on a sample is associated with a spectrum of a signal from the sample; a phase analysis unit that performs phase analysis based on the spectrum imaging data; a display control unit that displays results of the phase analysis on a first screen; and a condition reception unit that receives an operation for changing a condition for the phase analysis, when the condition reception unit has received the operation for changing the condition, the phase analysis unit performing phase analysis under the changed condition, the display control unit displaying on a second screen the results of the phase analysis performed under the changed condition and when a predetermined operation has been performed, the display control unit reflecting on the first screen the results of the phase analysis displayed on the second screen.
An electron microscope includes an electron source for emitting an electron beam, an illumination lens for focusing the beam, an aberration corrector for correcting aberrations, an illumination deflector assembly disposed between the illumination lens and the aberration corrector and operating to deflect the beam and to vary its tilt relative to a sample, a scanning deflector for scanning the sample with the beam, an objective lens, a detector for detecting electrons transmitted through the sample and producing an image signal, a control section for controlling the illumination deflector assembly, and an image generating section for receiving the image signal and generating a differential phase contrast (DPC) image. The tilt of the beam is varied by the illumination deflector assembly such that the image generating section generates a plurality of DPC images at different tilt angles of the beam and creates a final image based on the DPC images.
H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes
H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
49.
Tri-Axial Magnetic Field Correction Coil, Physical Package, Physical Package for Optical Lattice Clock, Physical Package for Atomic Clock, Physical Package for Atom Interferometer, Physical Package for Quantum Information Processing Device, and Physical Package System
A tri-axial magnetic field correction coil includes a first coil group and a second coil group with respect to an X-axis direction that passes through a clock transition space in which atoms are disposed. The first coil group is a Helmholtz-type coil composed in a point-symmetrical shape around the clock transition space. The second coil group is composed in a point-symmetrical shape around the clock transition space with respect to the X-axis direction, and is a non-Helmholtz-type coil that differs from the first coil group in terms of coil size, coil shape, or distance between coils.
H01F 7/20 - Electromagnets; Actuators including electromagnets without armatures
H03L 7/26 - Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference
G04F 5/14 - Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
50.
Radiation Detection Apparatus and Sample Analysis Apparatus
There is provided a radiation detection apparatus capable of effectively discriminating between noise and X-ray signal. The radiation detection apparatus includes a detector for detecting radiation and producing a detector output signal, a first differential filter having a time constant and operative to differentiate and convert the detector output signal into a first pulsed signal, a second differential filter having a time constant greater than that of the first differential filter and operative to differentiate and convert the detector output signal into a second pulsed signal, and a noise detection section for detecting noise based on the difference in timing between peaks of the first and second pulsed signals.
Provided is a charged particle beam system capable of preventing the data acquisition time from increasing. A control method for the system is also provided. The charged particle beam system includes: a beam blanker for blanking a charged particle beam; a sample stage on which a sample is tiltably held and thus can assume a tilt angle; a blanking controller for controlling the blanking of the charged particle beam and causing a pulsed beam having a duty ratio to be directed at the sample; and a tilt controller for controlling the tilt angle of the sample. The blanking controller sets the duty ratio of the pulsed beam based on the tilt angle of the sample.
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
H01J 37/26 - Electron or ion microscopes; Electron- or ion-diffraction tubes
H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
52.
Phosphonium Compound, Reagent Kit for Derivatization, Mass Spectrometric Method, and Method for Producing Phosphonium Compound
Provided is a phosphonium compound represented by Formula (I):
Provided is a phosphonium compound represented by Formula (I):
Provided is a phosphonium compound represented by Formula (I):
in Formula (I), R1, R2, and R3 are independently from each other, an alkyl group or an aryl group, the alkyl group is a substituted or unsubstituted, linear or branched alkyl group having 1 to 20 carbon atoms or a substituted or unsubstituted cyclic alkyl group having 5 to 20 carbon atoms, the aryl group is a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; X is a reactive group having a hydrazide group, a halide group, a pseudohalide group, or a thioester group; and Y− is an anion having a total charge of −1, or Y− is absence.
Provided is a charged particle beam apparatus that acquires an image by scanning a specimen with a charged particle beam, and includes a contrast adjustment circuit that adjusts contrast of the image; a brightness adjustment circuit that adjusts brightness of the image; and a control unit that controls the contrast adjustment circuit and the brightness adjustment circuit. The control unit acquires information on luminance of a reference image in a non-signal state, and information on an average value of luminance of each pixel of the reference image, controls the brightness adjustment circuit, based on the acquired information on luminance of the reference image in a non-signal state, acquires the image in a state where the brightness adjustment circuit is controlled, and adjusts the contrast of the acquired image by controlling the contrast adjustment circuit, based on the average value of luminance of each pixel of the reference image.
Provided is a scatter diagram display device that creates a plurality of scatter diagrams based on mapping data acquired by an analyzer and displays a scatter diagram matrix in which the created plurality of scatter diagrams are arranged in a matrix on a display section, the scatter diagram display device including: a display condition acceptance section that accepts a designation of a display range of an item in each of the plurality of scatter diagrams, and a display control section that extracts all scatter diagrams having the item whose display range has been designated from the plurality of scatter diagrams and changes the display range of the item in the extracted scatter diagrams based on the designation of the display range.
Provided is a charged particle beam drawing apparatus including a measurement unit that scans a reference mark disposed on a stage with a charged particle beam to detect a position of the reference mark, and measures a positional deviation amount of the charged particle beam, based on the detected position; and a positional correction unit that corrects a drawing position based on the measured positional deviation amount. A plurality of the reference marks is disposed on the stage, and the measurement unit switches from one of the reference marks used for the measurement of the positional deviation amount to another one of the reference marks that is not used yet, when a predetermined condition has been satisfied.
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
H01J 37/304 - Controlling tubes by information coming from the objects, e.g. correction signals
56.
Charged Particle Beam Device and Image Generation Method
A charged particle beam device scans a specimen with a charged particle beam and generates an image based on a detected signal from a detector that detects a signal generated from the specimen based on the scan performed by the charged particle beam. The charged particle beam device includes: a blanker that performs blanking of the charged particle beam; an image acquisition unit that acquires a plurality of images by controlling the blanking during the scan performed by the charged particle beam, the plurality of images including pixels corresponding to a region of the specimen that is irradiated with the charged particle beam and pixels corresponding to a region of the specimen that is not irradiated with the charged particle beam; and an integrated image generation unit that generates an integrated image by integrating the plurality of acquired images.
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material
57.
NMR Measurement Apparatus, and Method of Identifying Solvent
An NMR spectrum is acquired from a nucleus of interest in a solvent included in a sample solution. A spectrum analyzer analyzes a number of splits, a splitting interval, a number of signals, and a signal interval based on the NMR spectrum. Based on these characteristic quantities, an identifier identifies the solvent. In another configuration, a plurality of NMR spectra acquired from a plurality of nuclei of interest included in the solvent may be analyzed.
G01N 24/08 - Investigating or analysing materials by the use of nuclear magnetic resonance, electron paramagnetic resonance or other spin effects by using nuclear magnetic resonance
58.
NMR apparatus and gas replacement method for replacing gas in NMR probe
An NMR apparatus includes a depressurizing device for depressurizing an NMR probe, a gas supply device for supplying gas into the NMR probe to thereby pressurize the NMR probe, and a control device. The control device alternately repeats depressurization of the NMR probe, using the depressurizing device, and pressurization of the NMR probe, using the gas supply device. This replaces the gas in the NMR probe.
A vacuum pump that evacuates an inside of a vacuum chamber and powder capturing devices disposed on an intake side of the vacuum pump are included. The powder capturing devices include a plurality of flow path forming units that form a continuous gas flow path from an intake unit located on the vacuum chamber side to an exhaust unit located on the vacuum pump side. The plurality of flow path forming units include a first flow path forming unit having a first catching unit that causes the powder sucked from the intake unit to collide and then catch the powder, and a second flow path forming unit having a second catching unit that causes the powder passing through the first flow path forming unit to collide and then catch the powder.
B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
B33Y 40/00 - Auxiliary operations or equipment, e.g. for material handling
60.
Three-dimensional powder bed fusion additive manufacturing apparatus
A three-dimensional PBF-AM apparatus includes a stage on which a powder material is spread, and a tubular build box disposed in a state of surrounding the stage. The build box includes a side wall portion having a first tubular member surrounding the stage and a second tubular member surrounding the stage with the first tubular member interposed therebetween and forming a space with the first tubular member, and moreover, a vacuum heat insulating layer can be formed inside the side wall portion by vacuuming the space.
B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
61.
Electron Microscope and Method of Correcting Aberration
Prior to execution of primary correction, a first centering process, an in-advance correction of a particular aberration, and a second centering process are executed stepwise. In the first centering process and the second centering process, a ronchigram center is identified based on a ronchigram variation image, and is matched with an imaging center. In the in-advance correction and the post correction of the particular aberration, a particular aberration value is estimated based on a ronchigram, and the particular aberration is corrected based on the particular aberration value.
There is provided an analyzer apparatus capable of generating crisp scanned images. In the analyzer apparatus, a sample is scanned with a probe such that a first signal and a second signal are emitted from the sample. The analyzer apparatus comprises: a first detector for detecting the first signal and producing a first detector signal; a second detector for detecting the second signal and producing a second detector signal; and an image processing unit operating (i) to produce a first scanned image and a second scanned image from the first detector signal and the second detector signal, respectively, (ii) to create a filter based on the second scanned image having a higher signal-to-noise ratio than that of the first scanned image, and (iii) to apply the filter to the first scanned image.
Provided is an electron microscope for generating a montage image by acquiring images of a plurality of regions in a montage image capturing region set on a specimen, and by connecting the acquired images. The electron microscope includes a specimen surface height calculating unit that calculates a distribution of specimen surface heights in the montage image capturing region by performing curved surface approximation based on the specimen surface heights determined by performing focus adjustment at a plurality of points set in a region including the montage image capturing region, and an image acquiring unit that acquires the images of the plurality of regions based on the calculated distribution of the specimen surface heights.
There is provided a scanning electron microscope which has a sample chamber capable of being evacuated to a low vacuum. The scanning electron microscope includes an electron gun for emitting an electron beam, an objective lens for focusing the emitted beam onto a sample, and a sample chamber in which the sample is housed. The objective lens includes an inner polepiece, an outer polepiece disposed outside the inner polepiece and facing the sample chamber, at least one through-hole extending through the inner and outer polepieces, and at least one cover member that closes off the through-hole. An opening is formed between the inner polepiece and the outer polepiece. The objective lens causes leakage of magnetic field from the opening toward the sample. The sample chamber has a degree of vacuum lower than that in an inner space that forms an electron beam path inside the inner polepiece.
An apparatus includes a build plate, a powder application apparatus that applies metal powder onto the build plate to form a powder layer, a beam irradiation apparatus that irradiates the powder layer with an electron beam, and a control unit that controls the powder application apparatus and the beam irradiation apparatus. When the powder layer is preheated by irradiation with the electron beam, the control unit sets a beam size and an irradiation position of the electron beam such that lines of the electron beam do not overlap each other at least at a start of preheating, and controls the beam irradiation apparatus to gradually increase at least one of a beam current and the beam size of the electron beam from the start of preheating to an end of preheating.
B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
66.
Specimen Machining Device and Specimen Machining Method
A specimen machining device includes an illumination system that illuminates a specimen; a camera that photographs the specimen; and a processing unit that controls the illumination system and the camera, and acquires a machining control image which is used for controlling an ion source and a display image which is displayed on a display unit. The processing unit controls the illumination system to illuminate the specimen under a machining illumination condition; acquires the machining control image by controlling the camera to photograph the specimen illuminated under the machining control illumination condition; controls the ion source based on the machining control image; controls the illumination system to illuminate the specimen under a display illumination condition which is different from the machining control illumination condition; acquires the display image by controlling the camera to photograph the specimen illuminated under the display illumination condition; and displays the display image on the display unit.
G01B 21/06 - Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness specially adapted for measuring length or width of objects while moving
G02B 21/18 - Arrangements with more than one light-path, e.g. for comparing two specimens
A stage apparatus includes a surface plate as well as a guide shaft fixedly secured to the surface plate, a drive member moving along the guide shaft, and a hydrostatic fluid bearing that forms fluid films in the gap portion between the guide shaft and the drive member. The apparatus further includes: a positional deviation detection section—for detecting a relative positional deviation which occurs between the guide shaft and the drive member and which affects the thickness dimensions of the fluid films; and a state decision section for making a decision on the condition of the apparatus itself based on the positional deviation detected by the detection section and outputting information responsive to the decision.
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
68.
Mass Spectrum Processing Device and Mass Spectrum Processing Method
Peak determination is executed with respect to the mass spectrum of a sample to generate a peak list. For each of the plurality of peaks contained in the peak list, a Kendrick mass (KM) of a designated monomer is calculated. An RKM is calculated, the RKM being a fractional part of a value obtained by dividing the KM by the integer mass of the monomer, or a remainder of dividing a nominal Kendrick mass (NKM) by the integer mass of the monomer. A plurality of peaks contained in the peak list and satisfying a grouping condition, including the permissible range of the RKM of the starting point peak, are grouped.
There is provided an electron beam inspection system which can enhance the safety of the whole system if servo valves are deactivated in the event of a power failure or an emergency stop. The electron beam inspection system has a beam source, a stage mechanism, and a pump. The stage mechanism has a guide shaft, a slider, a first servo valve, a second servo valve, a first exhaust pipe, a second exhaust pipe, and an exhaust valve. The slider is movably supported to the guide shaft via a hydrostatic bearing and has a first pressure subchamber and a second pressure subchamber. The exhaust valve is mounted in the first exhaust pipe. When the servo valves are in operation, the exhaust valve is opened. When supply of electric power to the servo valves is ceased, the exhaust valve is closed.
An electron beam is irradiated on a specimen in a state where a negative voltage is applied to the specimen. The specimen is rotated to establish an optimum orientation of a specimen surface shape relative to an orientation of a detector having two detection surfaces disposed at rotational symmetric positions with respect to an optical axis of the electron beam taken as an axis of rotation, and an image is generated based on a quantity of a signal from reflected electrons detected by the detector.
A charged particle beam apparatus acquires a scanned image by scanning a specimen with a charged particle beam, and detecting charged particles emitted from the specimen. The apparatus includes a charged particle beam source that emits the charged particle beam; an irradiation optical system that scans the specimen with the charged particle beam; a plurality of detection units that detects the charged particles emitted from the specimen; and an image processing unit that reconstructs a profile of a specimen surface of the specimen, based on a plurality of detection signals outputted from the plurality of detection units. The image processing unit: determines an inclination angle of the specimen surface, based on the plurality of detection signals; processing to determine a height of the specimen surface, based on the scanned image; and reconstructs the profile of the specimen surface, based on the inclination angle and the height.
A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, an information provision unit for providing information indicating an expected machining completion time, and a storage unit for storing past machining information. The information provision unit performs processing for calculating the expected machining completion time based on the past machining information, processing for acquiring an image photographed by the camera, processing for calculating a machining speed based on the acquired image, and processing for updating the expected machining completion time based on the machining speed.
A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a shielding member disposed on the specimen to block the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, a coaxial illumination device for irradiating the specimen with illumination light along an optical axis of the camera, and a processing unit for determining whether to terminate the machining based on an image photographed by the camera. The processing unit performs processing for acquiring information indicating a target machined width, processing for acquiring the image, processing for measuring a machined width on the acquired image, and processing for terminating the machining when the measured machined width equals or exceeds the target machined width.
A composition estimation target peak is selected from a mass spectrum of a sample, and a group of measured isotope peaks related to the composition estimation target peak is selected. A composition candidate for the sample is estimated based on the composition estimation target peak. A distribution of a theoretical isotope peak corresponding to the composition candidate is calculated. Presence or absence of an adduct ion or a desorbed ion in the sample is determined based on a first mass difference between isotopes in a distribution of the measured isotope peaks and a second mass difference between isotopes in the distribution of the theoretical isotope peak.
A contamination prevention irradiation device includes a generation unit and a mirror unit. The generation unit generates a laser beam. The mirror unit has a mirror surface for reflecting a laser beam. The laser beam reflected on the mirror surface is applied to a specimen disposed inside an objective lens. The laser beam is composed of a pulse train. Once a laser beam is applied to the specimen before observation of the specimen, deposition of contaminants on the specimen can be prevented for a predetermined subsequent period.
A plurality of records are registered in a database. Each record includes emission information and a peak energy sequence. A fitting unit fits, for each peak energy sequence, a calculated spectrum which is based on the peak energy sequence with respect to an actual spectrum which is acquired from a sample. An analyzer analyzes the sample based on the emission information correlated to the calculated spectrum satisfying a fitting condition.
A direction shifting mechanism for changing a direction of a sample tube is installed on a path of the sample tube between a sample tube supporting unit for supporting, during an NMR measurement, the sample tube used for the NMR measurement and an insertion port through which the sample tube is inserted in and extracted from the sample tube supporting unit. The direction shifting mechanism has a shape which partially includes a form of an arc, and the shape is designed to cause the sample tube to change its direction in such a manner that the sample tube is turned toward the insertion port along the arc while being maintained in contact with at least two points on an inner wall of the direction shifting mechanism.
A three-dimensional PBF-AM apparatus includes: a build plate on which a powder material is spread in layers; and a beam irradiation device which irradiates the powder material spread on the build plate with a beam. The beam irradiation device divides a build region of the powder material spread on the build plate into a plurality of lines and performs beam scanning to melt the powder material in the build region line by line, and performs dummy scanning to scan the beam in a state that does not cause melting of the powder material between an end of beam scanning of an M-th (M is a natural number) line and a start of beam scanning of an (M+1)th line.
B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
A soft X-ray measurement device detects a characteristic X-ray emitted from a sample including a primary element and a secondary element. An X-ray spectrum generated by a spectrum generator includes a waveform of interest which is an intrinsic waveform of the primary element, caused by transition of electrons from a valence band to an inner shell in the primary element. A secondary element analyzer calculates quantitative information of the secondary element through analysis of the waveform of interest.
Provided is a solid phase mixture including an oxidizing agent and/or a salt of the oxidizing agent and solid phase particles. The oxidizing agent is a compound capable of selectively oxidizing 1,2-diol compounds. In addition, a packing material containing the solid phase mixture is provided. Further, a column packed with the packing material is provided.
B01J 20/06 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising oxides or hydroxides of metals not provided for in group
B01J 20/28 - Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
B01D 15/20 - Selective adsorption, e.g. chromatography characterised by constructional or operational features relating to the conditioning of the sorbent material
81.
Three-dimensional powder bed fusion additive manufacturing apparatus and three-dimensional powder bed fusion additive manufacturing method
A three-dimensional powder bed fusion additive manufacturing apparatus includes a powder application device that includes a squeegee and applies a powder material to a build plate to form a powder layer, a camera that photographs a manufactured surface of the powder layer, and a determination unit that determines whether powder application failure of the powder material has occurred using an image photographed by the camera while or immediately after the squeegee passes through the manufactured surface.
B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
A three-dimensional powder bed fusion additive manufacturing apparatus includes a determination unit that determines presence or absence of powder scattering in a second preheating step using at least a third image that is an image of a powder layer photographed by a camera after the second preheating step among a first image that is an image of the powder layer photographed by the camera after a first preheating step, a second image that is an image of the powder layer photographed by the camera after the powder application step, and the third image.
B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
83.
Sample Milling Apparatus and Method of Adjustment Therefor
A sample milling apparatus includes an ion source, a swinging mechanism for swinging a sample, a positioning camera for bringing a target milling position on the sample into coincidence with the impact point of an ion beam, and a display section for displaying an image captured by the positioning camera. The adjustment method starts with observing the trace of the impinging ion beam left on the sample with the positioning camera while the position of the positioning camera is held relative to the swing axis of the swinging mechanism and capturing an observation image. Then, a display image to be displayed on the display section is extracted from the observation image based on the position of the trace, thus bringing the beam impact point and the position of the field of view of the display image into coincidence.
A specimen machining device includes an ion source which irradiates a specimen with an ion beam, a first rotating body (specimen holder) that holds the specimen and is rotatable about a first axis serving as a rotation axis, and a second rotating body on which the first rotating body is disposed and which is rotatable about a second axis serving as a rotation axis different from the first axis. The specimen machining device irradiates the specimen with the ion beam while moving the specimen by the rotation of the first rotating body and the rotation of the second rotating body.
A method of measuring a relative rotational angle includes: shifting an electron beam on a specimen plane by using a deflector; tilting the electron beam with respect to the specimen plane by using the deflector; acquiring a first STEM image including information of a scattering azimuth angle and a second STEM image not including the information of the scattering azimuth angle, before the shifting and the tilting; acquiring a third STEM image including the information of the scattering azimuth angle and a fourth STEM image not including the information of the scattering azimuth angle, after the shifting and the tilting; and obtaining the relative rotational angle based on the first STEM image, the second STEM image, the third STEM image and the fourth STEM image.
An aberration value estimator has a learned estimation model for estimating an aberration value set based on a Ronchigram. In a machine learning sub-system, a simulation is repeatedly executed while changing a simulation condition, and calculated Ronchigrams are generated in a wide variety and in a large number. By machine learning using the calculated Ronchigrams, the learned estimation model is generated.
In an analyzer, an image processing unit performs processing of: dividing a measurement image into a plurality of partial measurement images, and dividing a reference image into a plurality of partial reference images; calculating a positional deviation amount of each of the partial measurement images relative to a corresponding partial reference image among the partial reference images; determining whether the positional deviation amount is a threshold or less; and correcting positional deviation of the measurement image based on the positional deviation amounts of the plurality of partial measurement images when the image processing unit has determined that the positional deviation amount is not the threshold or less.
At timing t0, a brake gas (raw material gas) starts to be supplied to an ion beam generator, and the brake gas is fed into a turbo molecular pump. After timing t1, a vent valve is opened intermittently to feed atmospheric air into the turbo molecular pump. The brake gas may be different from the raw material gas. The brake gas is supplied using a gas supply system.
A method of measuring an aberration in an electron microscope includes: acquiring an image for measuring the aberration in the electron microscope; and measuring the aberration by using the image. In measuring the aberration, a direction of defocusing is specified based on a residual aberration that is uniquely determined by a configuration of an optical system of the electron microscope and an optical condition of the optical system.
There is provided a sample holder capable of reducing positional deviation of a cartridge in the heightwise direction of a sample. The sample holder includes the cartridge and a holder base having a mounting portion for the cartridge. The mounting portion includes a placement surface, a first tilted surface, and a rotary drive mechanism for imparting a rotary force to the cartridge. The cartridge includes an opposing first tilted surface opposite to the first tilted surface of the mounting portion. As the rotary drive mechanism imparts the rotary force to the cartridge, the first tilted surface of the cartridge is pressed against the first tilted surface of the mounting portion, whereby the cartridge is pressed against the placement surface.
Provided is a charged particle beam system capable of reducing the force applied to a sample when a chuck device grips the sample. The charged particle beam system is typified by an electron microscope including a sample chamber, a sample exchange chamber connected to the sample chamber, a sample container capable of being removably attached in the sample exchange chamber, and a transport device for transporting the sample between the sample container and the sample exchange chamber. The transport device includes the chuck device for gripping the sample, a drive mechanism for moving the chuck device in a given direction, a mechanical driver for actuating the chuck device, and a power transmission mechanism for transmitting power of the mechanical driver to the chuck device. The power transmission mechanism includes a shaft and a resilient member that elastically deforms when a force in the given direction is applied to the shaft.
There is provided a transport device capable of reducing drifting of a sample. The transport device delivers a cartridge to a sample holder in a charged particle beam system. The transport device has a mounting portion to which the cartridge can be detachably mounted, a shaft portion providing support of the mounting portion, a resilient member connecting together the shaft portion and the mounting portion, and a drive mechanism for moving the mounting portion.
There is provided a sample holder which is for use in a charged particle beam system and which can prevent damage to a sample stage during transportation of a cartridge. The sample holder includes: the cartridge having the sample stage for holding a sample therein; and a holder base having a mounting portion to which the cartridge can be mounted. The cartridge has: a tilt mechanism for tilting the sample stage; and a lock lever which, when the cartridge has been taken out from the mounting portion, makes contact with the sample stage and limits tilt of the stage.
A specimen pretreatment method for transferring a specimen supported by a first specimen supporting tool to a second specimen supporting tool, the specimen pretreatment method including: transferring a specimen supported by the first specimen supporting tool to a film; immersing the film and the specimen on the film in a liquid to dissolve the film; and recovering the specimen from the liquid and supporting the specimen with the second specimen supporting tool.
Provided is a three-dimensional powder bed fusion additive manufacturing apparatus which includes a chamber provided inside with a stage for forming a three-dimensional build object, a window provided in the chamber for observation of the inside of the chamber, and a shutter arranged inside the chamber to open and close the window.
B22F 12/00 - Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
B33Y 50/00 - Data acquisition or data processing for additive manufacturing
A charged particle beam apparatus includes a tilt mechanism that tilts a specimen, a detector that detects an electromagnetic wave emitted from the specimen, a table storage unit that stores a table in which tilt angle information on a tilt angle of the specimen and detection solid-angle information on the detection solid angle of the detector are associated with each other, a tilt control unit that controls the tilt mechanism, and a detection-solid-angle information acquisition unit that acquires the tilt angle information from the tilt control unit and acquires the detection solid-angle information with reference to the table.
Provided is a sample loading method of loading a cooled sample into a sample exchange chamber of a charged particle beam apparatus includes: attaching the sample container in which a sample and liquid nitrogen are accommodated to the sample exchange chamber via a gate valve; evacuating a space between a liquid surface of the liquid nitrogen and the gate valve in a state in which the gate valve is closed; discharging the liquid nitrogen in the sample container after the space between the liquid surface of the liquid nitrogen and the gate valve has been evacuated; evacuating a space in the sample container after the liquid nitrogen in the sample container has been discharged; and opening the gate valve after the space in the sample container has been evacuated.
A compound represented by Chemical formula 1:
wherein n is an integer of 2 or more, is provided. Also provided is a derivatization reagent for derivatizing a diene-containing compound, including a compound represented by Chemical formula 1. Further provided is a synthesis method for a compound, including a nucleophilic substitution reaction between an aryl halide and a heterocyclic amine compound being saturated, the compound being represented by Chemical formula 1.
A charged particle beam apparatus includes: a specimen chamber; a specimen holder that is disposed in the specimen chamber; a specimen exchange chamber that is connected to the specimen chamber; a transporting mechanism that transports a specimen between the specimen chamber and the specimen exchange chamber; a first temperature sensor that measures a temperature of the specimen holder; a second temperature sensor that measures a temperature of the transporting mechanism; and a control unit. The control unit: calculates a temperature difference between the specimen holder and the transporting mechanism based on the temperature of the specimen holder and the temperature of the transporting mechanism when the control unit has received an instruction to transport a specimen; determining whether the temperature difference is a threshold or more; and stopping transportation of a specimen when the control unit has determined that the temperature difference is the threshold or more.
A mask member is provided at an entrance opening of a mirror unit. Of a first diffraction grating and a second diffraction grating, when the second diffraction grating is used, the mask member masks preceding mirrors. With this process, aberration caused by reflective X-ray is suppressed. When the first diffraction grating is used, the mask member does not function. Alternatively, the mask member and another mask member may be selectively used.
patents
