Hitachi High-Tech Corporation

Japan

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IPC Class
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor 202
H01L 21/3065 - Plasma etching; Reactive-ion etching 93
G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices 91
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations 86
H01J 37/22 - Optical or photographic arrangements associated with the tube 73
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1.

PLASMA PROCESSING METHOD

      
Application Number JP2022037800
Publication Number 2024/079776
Status In Force
Filing Date 2022-10-11
Publication Date 2024-04-18
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Satake Makoto
  • Shiota Takashi
  • Iwase Taku
  • Sonoda Yasushi
  • Morimoto Michikazu

Abstract

The present invention is a plasma processing method that provides a method that can build a self-limited process with excellent mass producibility in a cycle etching method that repeats an adsorption step for forming a reaction layer on the surface of a wafer to be etched and a desorption step for removing the formed reaction layer using a noble gas in a metastable state, characterized by having the adsorption step for forming the reaction layer on the film to be etched using plasma generated using reactive gas, and the desorption step for removing the reaction layer using the noble gas in a metastable state generated using plasma, the adsorption step and the desorption step being repeated, and the pressure in the adsorption step being higher than the pressure in the desorption step.

IPC Classes  ?

2.

SURFACE INSPECTING DEVICE

      
Application Number JP2022037920
Publication Number 2024/079791
Status In Force
Filing Date 2022-10-11
Publication Date 2024-04-18
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Koizumi Haruki
  • Hosobuchi Keiichiro
  • Yamamoto Masaya
  • Kimura Katsuhiko

Abstract

A surface inspecting device (1) according to the present invention comprises: a plate-shaped sample holding member (3) capable of holding a sample (2); a rotation drive unit (19) for rotating the sample holding member (3); a supporting member (21) that is fixed to the sample holding member (3) and the rotation drive unit (19) and supports the sample holding member (3); and a sample drive unit (11) that displaces the sample holding member (3) in the height direction relative to the rotation drive unit (19). The supporting member (21) comprises a first supporting member (22) and a plurality of second supporting members (23) that support the first supporting member (22). The first supporting member (22) is a plate-shaped member positioned between the sample holding member (3) and the rotation drive unit (19), and is displaceable in the height direction relative to the sample holding member (3) and the rotation drive unit (19). A part of the plurality of second supporting members (23) is fixed to the sample holding member (3), while the remainder are fixed to the rotation drive unit (19).

IPC Classes  ?

  • H01L 21/66 - Testing or measuring during manufacture or treatment

3.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023031063
Publication Number 2024/080011
Status In Force
Filing Date 2023-08-28
Publication Date 2024-04-18
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Sato Kakeru
  • Takahashi Takuya

Abstract

The purpose of the present invention is to inhibit condensation in unintended locations, even in an automatic analysis device provided with a water-cooled reagent cold storage, by cooling and drying external air in an efficient manner before the external air is discharged into an interior space. Therefore, the present invention is an automatic analysis device provided with a reagent cold storage (1) for keeping a reagent cold, wherein the reagent cold storage (1) has a cooling water channel that feeds cooling water to the outside of an inner wall demarcating a space in which a reagent container is stored and that cools the inner wall, and an air channel (10, 13) that feeds air to the inside of the inner wall and creates a positive pressure in the space, a cooling water inflow port (8a) is formed at a prescribed position on the lower surface of the cooling water channel disposed below the bottom surface of the space, and a part of the air channel (10, 13) disposed on the upper surface of the inner wall demarcating the bottom surface of the space is located on the vertical projection of the cooling water inflow port (8a).

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

4.

AUTOMATED ANALYZING DEVICE, AND METHOD FOR OPERATING AUTOMATED ANALYZING DEVICE

      
Application Number JP2023028491
Publication Number 2024/075383
Status In Force
Filing Date 2023-08-03
Publication Date 2024-04-11
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yamamoto Haruyoshi
  • Miyakawa Takushi
  • Miyake Masafumi

Abstract

This automated analyzing device comprises: a diluent flow passage 1033 and an internal standard solution flow passage 1043 from a diluent accommodating bottle 1032 and an internal standard solution accommodating bottle 1042 to a dilution tank 1010; a measurement solution suction nozzle 1052 from the dilution tank 1010 to an analyzing unit 1092; a first temperature regulating unit 1091 which performs temperature regulation of the dilution tank 1010, the measurement solution suction nozzle 1052 and the analyzing unit 1092; a second temperature regulating unit 1036 which is controlled for temperature regulation independently of the first temperature regulating unit 1091, and which performs temperature regulation of the diluent flow passage 1033 and the internal standard solution flow passage 1043; and a thermal insulation mechanism 1037, 1095 provided between the first temperature regulating unit 1091 and the second temperature regulating unit 1036. The present invention thereby provides an automated analyzing device and a method for operating an automated analyzing device with which it is possible for a temperature regulation state of a measuring system to be improved in comparison with a conventional example.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

5.

AUTOMATIC ANALYSIS DEVICE AND METHOD FOR CLEANING PROBE

      
Application Number JP2023031517
Publication Number 2024/075441
Status In Force
Filing Date 2023-08-30
Publication Date 2024-04-11
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tanaka Yuto
  • Mori Takamichi

Abstract

The purpose of the present invention is to provide: an automatic analysis device that reduces the frequency of manual cleaning of a probe and that has a higher analysis efficiency; and a method for cleaning a probe. For this purpose, an automatic analysis device according to the present invention comprises: a probe that dispenses a liquid; and a clogging detection unit that detects clogging of the probe. When the clogging detection unit detects clogging of the probe, the probe is cleaned with a liquid having an adjusted temperature. In addition, a method for cleaning a probe that dispenses a liquid according to the present invention involves cleaning the probe with a liquid having an adjusted temperature when a clogging detection unit detects clogging of the probe.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

6.

DISPENSING DEVICE AND PROBE STATE CONFIRMATION METHOD

      
Application Number JP2023031390
Publication Number 2024/075437
Status In Force
Filing Date 2023-08-30
Publication Date 2024-04-11
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hasegawa Naoki
  • Mori Takamichi
  • Wakui Akihito

Abstract

The purpose of the present invention is to provide a dispensing device and probe state confirmation method which make it possible to ascertain a suitable replacement period for the probe, while suppressing a lowering of dispensing accuracy. In order to achieve this, the present invention provides a dispensing device comprising: a probe that suctions and discharges a liquid; a sensor that detects the contact of a tip of the probe; a drive unit that drives the probe in the vertical direction; and a control unit that controls the drive unit, wherein the control unit performs a confirmation operation for a length change of the probe by lowering the probe via the drive unit until contact with a prescribed reference surface forming a portion of the dispensing device is detected.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

7.

AUTOMATED ANALYSIS DEVICE

      
Application Number JP2023033904
Publication Number 2024/075511
Status In Force
Filing Date 2023-09-19
Publication Date 2024-04-11
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Horikawa Hiroshi
  • Fukaya Masashi

Abstract

The objective of the present invention is to provide an automated analyzing device with which it is easy for a user to understand a current usage status and a replacement time of a limited-life member. To this end, according to the present invention, an automated analyzing device for analyzing an analysis target in a sample comprises a limited-life member used to perform the analysis, a control unit for estimating the remaining service life of the limited-life member, and a display unit capable of using different methods to display the remaining service life, wherein, if the remaining service life of the limited-life member has reached a predefined reference value, the control unit switches the method for displaying the remaining service life that is to be displayed on the display unit.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 21/00 - Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light

8.

SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM AND MANUFACTURING METHOD

      
Application Number JP2022035648
Publication Number 2024/069684
Status In Force
Filing Date 2022-09-26
Publication Date 2024-04-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Satake, Makoto
  • Zhao, Pushe
  • Ichino, Takamasa
  • Morizuki, Masahiro

Abstract

To provide a semiconductor device manufacturing system and a semiconductor device manufacturing method having an improved processing yield, the semiconductor manufacturing system comprises a semiconductor device manufacturing device and a wafer temperature calculation system. The semiconductor device manufacturing device includes a wafer stage in which a wafer is placed on an upper surface, a plurality of heaters disposed in an interior of this wafer stage, below a plurality of regions of the upper surface, and a controller that adjusts outputs of a plurality of heater power supplies supplied to the plurality of heaters, the semiconductor device manufacturing device being configured to process the wafer. The wafer temperature calculation system determines whether first output values of the plurality of heater power supplies calculated in advance to realize a target temperature during processing of the wafer are within a permissible range, and if said values are outside the permissible range, calculates second output values obtained by correcting all of the first output values to values within the permissible range.

IPC Classes  ?

  • H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof

9.

MODEL GENERATING METHOD AND DEFECT INSPECTION SYSTEM

      
Application Number JP2022035715
Publication Number 2024/069701
Status In Force
Filing Date 2022-09-26
Publication Date 2024-04-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Inadomi Taichi
  • Urano Takahiro
  • Yamamoto Junji
  • Hirose Nobuaki
  • Hatano Hisashi
  • Sakurai Hironori

Abstract

The present invention has: a first step for reading defect candidate images used for training deep learning models; a second step for assigning labels to a portion of the defect candidate images to create teaching images and evaluation images; a third step for, after updating the parameters for each of a plurality of the deep learning models using teaching images, evaluating the classification accuracy using the evaluation images, and selecting the best model with the highest classification accuracy among the plurality of deep learning models; and a fourth step for classifying defect candidate images that have not been assigned a label using the best model, and select a portion of the defect candidate images for assigning labels on the basis of the DOI-likeness according to the best model, and executes the second step and the third step again after execution of the fourth step.

IPC Classes  ?

  • H01L 21/66 - Testing or measuring during manufacture or treatment

10.

CHARGING PLAN CREATION METHOD, CHARGING PLAN CREATION DEVICE, AND CHARGING PLAN PROVIDING SYSTEM

      
Application Number JP2023014096
Publication Number 2024/070016
Status In Force
Filing Date 2023-04-05
Publication Date 2024-04-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Sumikawa Yosuke
  • Tajiri Rikiya
  • Horikoshi Nobuya
  • Hirasawa Shigeki
  • Yoshimura Mina

Abstract

The present invention creates a charging plan for a plurality of batteries to be deployed at a station. Provided is a charging plan creation method for creating a charging plan for a plurality of batteries at one or a plurality of stations linked by one or a plurality of power contracts, the charging plan creation method comprising: receiving the power usage amount at a station, the planned power consumption amounts to be consumed by the plurality of batteries, and the charging-availability times during which the plurality of batteries can be charged (S901); setting the peak for power to be used at the station on the basis of the usage amount (S902); and creating, in accordance with the charging-availability times, a peak control charging plan for each battery for charging the respective power consumption amount, so as not to surpass the set peak (S903).

IPC Classes  ?

  • H02J 7/02 - Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries for charging batteries from ac mains by converters

11.

DISTANCE MEASUREMENT METHOD, DISTANCE MEASUREMENT DEVICE, AND DISTANCE MEASUREMENT SYSTEM

      
Application Number JP2023018154
Publication Number 2024/070034
Status In Force
Filing Date 2023-05-15
Publication Date 2024-04-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hariyama Tatsuo
  • Watanabe Masahiro
  • Maruno Kenji
  • Akiyama Hirohito
  • Kando Hidehiko

Abstract

The present invention provides a distance measurement device and a distance measurement method that can reduce a distance error caused by polarization. The distance measurement method splits light generated in a laser light source to a reference optical system and a measurement optical system, detects a reference optical path measurement beat signal from reference light having passed through the reference optical system, detects a measurement optical path measurement beat signal from measurement light having routed through an object of measurement in the measurement optical system, and measures a distance to the object of measurement on the basis of the measurement optical path measurement beat signal and the reference optical path measurement beat signal, the distance measurement method being characterized in that a polarization-caused distance error reduction element is installed in one or both of the reference optical system and the measurement optical system.

IPC Classes  ?

  • G01C 3/06 - Use of electric means to obtain final indication
  • G01B 9/02004 - Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using frequency scans
  • G01B 9/02015 - Interferometers characterised by the beam path configuration
  • G01B 9/02056 - Passive reduction of errors
  • G01B 11/24 - Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures

12.

AUTOMATED ANALYZING DEVICE, AND LIGHT SOURCE STABILIZATION METHOD FOR AUTOMATED ANALYZING DEVICE

      
Application Number JP2023026282
Publication Number 2024/070144
Status In Force
Filing Date 2023-07-18
Publication Date 2024-04-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Fukaya Masashi
  • Takahashi Takuya
  • Horikawa Hiroshi
  • Fukumura Mami

Abstract

Provided is an automated analyzing device capable of avoiding a light intensity drift accompanying a temperature change caused by the start of energization of a light source, and capable of shortening a stabilization waiting time. An automated analyzing device 50 comprises: a light source 39 which illuminates a reaction vessel 2 accommodating a mixed solution of a sample and a reagent with light for measuring the sample; a temperature regulating mechanism 27 for performing temperature regulation of the light source 39 by means of a temperature regulating medium; a reaction tank 5 for performing temperature regulation of the reaction vessel 2 by means of the temperature regulating medium; circulating pumps 30, 35 for delivering the temperature regulating medium; an analyzing unit 42 for analyzing the sample; and an operation control unit 43. When transitioning from a sample non-measurement state to a measurable state via a measurement preparation state, the operation control unit 43, in the measurement preparation state, increases a current or a voltage applied to the light source 39, increases a flow rate of the temperature regulating medium for a fixed time period, and returns the flow rate of the temperature regulating medium to the flow rate prior to the increase, and then migrates to the measurable state and causes the sample to be measured.

IPC Classes  ?

  • G01N 21/75 - Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

13.

ANALYZING DEVICE

      
Application Number JP2023028239
Publication Number 2024/070206
Status In Force
Filing Date 2023-08-02
Publication Date 2024-04-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Fukumura Mami
  • Takahashi Takuya
  • Horikawa Hiroshi

Abstract

The objective of the present invention is to provide an analysis device capable of using a light source effectively by appropriately controlling a temperature of the light source. The analyzing device according to the present invention comprises an in-housing temperature regulating mechanism for regulating a temperature inside a light source housing, a base for supporting a board on which a light emitting element is mounted, and a base temperature regulating mechanism for regulating a temperature of the base, wherein the base temperature regulating mechanism is covered such that the base is not exposed to outside air (see Fig. 2).

IPC Classes  ?

  • G01N 21/75 - Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

14.

INSPECTION METHOD AND CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2022035887
Publication Number 2024/069737
Status In Force
Filing Date 2022-09-27
Publication Date 2024-04-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Uchiho Minami
  • Takada Satoshi
  • Sakakibara Makoto
  • Mitsugi Shota
  • Shirasaki Yasuhiro
  • Tsuno Natsuki

Abstract

Provided is an inspection method for inspecting the electrical characteristics of a pattern on a sample where a pattern 102 comprising a conductor or a semiconductor has been formed in a dielectric region 101. A secondary electron image is acquired by scanning a charged particle beam on the sample. A feature amount is calculated on the basis of a luminance value of a third region 113, which is higher in luminance than a second region, that spreads toward a first region 111 side from a boundary between the first region 111 corresponding to a dielectric region in the secondary electron image and a second region 112 corresponding to the pattern. The electrical characteristics of the pattern are inspected on the basis of the feature amount.

IPC Classes  ?

  • G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
  • H01L 21/66 - Testing or measuring during manufacture or treatment

15.

CONTAINER STORAGE DEVICE

      
Application Number JP2023024302
Publication Number 2024/070105
Status In Force
Filing Date 2023-06-30
Publication Date 2024-04-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kumagai Takahiro
  • Okusa Takenori
  • Muramatsu Yoshiki

Abstract

The present invention improves the cooling performance of a container storage device in which electric heating devices are used. This container storage device includes: a storage part for storing a container that accommodates a liquid; and a cooling part that cools air suctioned out from the storage part and supplies the cooled air to the storage part, wherein the cooling section comprises a plurality of fins that are disposed along the flow of the air, and electric heating devices that are respectively connected to the fins.

IPC Classes  ?

  • F25D 11/00 - Self-contained movable devices associated with refrigerating machinery, e.g. domestic refrigerators
  • F25D 17/08 - Arrangements for circulating cooling fluids; Arrangements for circulating gas, e.g. air, within refrigerated spaces for circulating gas, e.g. by natural convection by forced circulation using ducts
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • F25B 21/02 - Machines, plants or systems, using electric or magnetic effects using Nernst-Ettinghausen effect

16.

AUTOMATED ANALYSIS DEVICE

      
Application Number JP2023026283
Publication Number 2024/062751
Status In Force
Filing Date 2023-07-18
Publication Date 2024-03-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yokoyama Koki
  • Umeki Hiroya
  • Takakura Tatsuki
  • Noda Kazuhiro
  • Tanoue Hidetsugu

Abstract

An automated analysis device 1 comprises a B/F separating unit 104, a reaction solution suction nozzle 106, and a substitution liquid discharge nozzle 108, the B/F separating unit 104 being configured to be movable in a vertical direction and a horizontal direction, or the automated analysis device 1 comprises the B/F separating unit 104, the reaction solution suction nozzle 106, the substitution liquid discharge nozzle 108, a photometric unit 134, a measurement flow passage introduction nozzle 130, a washing solution storage container 122, and a buffer solution storage container 120, wherein the B/F separating unit 104, the washing solution storage container 122 and the buffer solution storage container 120 are mounted on a turntable 102. As a result, the present invention provides an automated analysis device having fewer movable axes than in the past.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • G01N 1/10 - Devices for withdrawing samples in the liquid or fluent state

17.

AUTOMATED ANALYSIS DEVICE

      
Application Number JP2023026285
Publication Number 2024/062752
Status In Force
Filing Date 2023-07-18
Publication Date 2024-03-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tomita Jun
  • Noda Kazuhiro
  • Tanoue Hidetsugu
  • Takakura Tatsuki
  • Umeki Hiroya
  • Wada Kentaro
  • Okabe Shugo

Abstract

A chute 305 for guiding a reaction vessel 116a from a conveying portion 117 to a waste storage unit 202 comprises a reaction vessel disposal hole 113 for accepting the reaction vessel 116a dropped from the conveying portion 117 into the chute 305, a first passage 411 that extends a first distance in a vertical direction from the reaction vessel disposal hole 113, and a second passage 421 that extends a second distance from a first end portion 412 of the first passage 411 on the opposite side to the reaction vessel disposal hole 113, in a state inclined through a first angle, wherein, in the second passage 421, a second end portion 423 on the opposite side to first end portions 412 and 422 is inclined through a second angle such that the chute 305 is directed toward the waste storage unit 202. As a result, the present invention provides an automated analysis device with which it is possible to achieve a reduction, compared with the past, in splashing of a residual liquid in the reaction vessel in the course of disposing of the reaction vessel.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system

18.

LIGHTING OPTICAL DEVICE AND INSPECTION DEVICE

      
Application Number JP2022035197
Publication Number 2024/062563
Status In Force
Filing Date 2022-09-21
Publication Date 2024-03-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tamura Masanori
  • Iwamatsu Akihiro
  • Matsumoto Shunichi

Abstract

In substrate inspection devices, the size of defects and foreign matter which need to be detected has decreased, and use of a high-power deep ultraviolet laser light source to form a beam spot with high precision has increased detection sensitivity. Thus, there is a need to further increase the stability of size and position of a beam spot. Furthermore, it is important that variations in focus position does are not caused when there is a change in ambient temperature during device operation. To this end, provided is a lighting optical system that flexibly changes the beam spot diameter of lighting light in accordance with inspection conditions and stage movement, while also maintaining high-precision focus performance which can handle changes in ambient temperature. More specifically, suppression of variations in focus position is made possible by optimizing the arrangement and materials of an optical element of a transparent optical system constituting a device (see fig. 1).

IPC Classes  ?

  • G01N 21/84 - Systems specially adapted for particular applications
  • G02B 27/09 - Beam shaping, e.g. changing the cross-sectioned area, not otherwise provided for

19.

POINT MUTATION RATE DETECTION METHOD

      
Application Number JP2022035397
Publication Number 2024/062603
Status In Force
Filing Date 2022-09-22
Publication Date 2024-03-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kato Hirokazu
  • Sumida Noriyuki
  • Miyazaki Mitsuhiro
  • Yamazaki Motohiro

Abstract

MTWTMTMTMTMT, wherein the upper limit of the measurement dynamic range for a fluorescent signal of the electrophoresis device is equal to or greater than a predetermined value.

IPC Classes  ?

20.

AUTOMATED ANALYSIS DEVICE, AND METHOD FOR OPERATING AUTOMATED ANALYSIS DEVICE

      
Application Number JP2023030361
Publication Number 2024/062831
Status In Force
Filing Date 2023-08-23
Publication Date 2024-03-28
Owner
  • HITACHI HIGH-TECH CORPORATION (Japan)
  • F. HOFFMANN-LA ROCHE AG (Switzerland)
  • ROCHE DIAGNOSTICS GMBH (Germany)
  • ROCHE DIAGNOSTICS OPERATIONS, INC. (USA)
Inventor
  • Onose Toma
  • Shibuya Satoshi
  • Takakura Tatsuki
  • Datz Stefan
  • Foester Elisabeth
  • Pauselius-Fuchs Ursula
  • Bishr Bassem
  • Degroot Peter

Abstract

This automated analysis device comprises an analyzing unit 40 for analyzing a sample, and a control device 20 for controlling operations of each mechanism of the analyzing unit 40, wherein the control device 20 calculates a waiting time that a user should wait until the sample or a consumable required to analyze the sample is replaced, on the basis of a time at which the sample or the consumable is to be used last, in an analysis schedule created at a time point at which a replacement request for the sample or the consumable is accepted. By this means, the present invention provides an automated analysis device, and a method for operating the automated analysis device, capable of improving work efficiency.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

21.

SPECIMEN ANALYSIS DEVICE

      
Application Number JP2022034309
Publication Number 2024/057425
Status In Force
Filing Date 2022-09-14
Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yabuhara Tadao
  • Matsumura Jin

Abstract

The purpose of the present invention is to uniformly suppress dew condensation in each housing chamber when multiple housing chambers each house a specimen container. The specimen analysis device according to the present invention comprises two or more openings, wherein warm air is supplied from each of the openings to each housing chamber, and the volume of the air supplied from each of the openings is uniformed by a first air volume adjusting material (see FIG. 2).

IPC Classes  ?

22.

OPTICAL DEVICE

      
Application Number JP2022034453
Publication Number 2024/057455
Status In Force
Filing Date 2022-09-14
Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Anazawa Takashi

Abstract

Provided is an optical device in which a two-dimensionally distributed sample, a single condenser lens, a dichroic mirror array in which a plurality of dichroic mirrors are arranged, and an area sensor are arranged in this order along the optical axis of the condenser lens, the direction in which the plurality of dichroic mirrors are arranged is perpendicular to the optical axis, and an image of a measurement area on the sample is measured by dividing the image into a plurality of images having different wavelength components on the area sensor. The dichroic mirror array is closer to the area sensor in comparison to the condenser lens.

IPC Classes  ?

  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

23.

SPECIMEN ANALYSIS DEVICE

      
Application Number JP2022034311
Publication Number 2024/057426
Status In Force
Filing Date 2022-09-14
Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yabuhara Tadao
  • Matsumura Jin

Abstract

The purpose of the present invention is to precisely control the temperature in each storage chamber of a specimen analysis device in which a plurality of storage chambers store specimen containers, respectively. The specimen analysis device according to the present invention generates cold air (see fig. 2) such that the temperature at the bottom of the specimen container is lower than the temperature at a lid of the specimen container.

IPC Classes  ?

24.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023026698
Publication Number 2024/057718
Status In Force
Filing Date 2023-07-20
Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Inagaki Erika
  • Yagi Kenichi
  • Ito Kenta

Abstract

The present invention makes it possible to identify, at a glance, the presence/absence of an abnormality and a cause thereof, in relation to a sample that is transported into an automatic analysis device. This automatic analysis device comprises an analysis unit 101 that performs measurement of a sample accommodated in a sample container 105, a display unit 104 that displays the result of the measurement by the analysis unit, a transportation unit 107 that transports the sample container to the analysis unit, and a camera 108 that images the sample container being transported to the analysis unit. The automatic analysis device analyzes an image of the sample container that is captured by the camera, and causes the display unit to collectively display, in relation to the sample for which the measurement result is displayed, one or more icons that are based on the result of analyzing the image of the sample container in which the sample is accommodated.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

25.

OBSERVATION ASSISTANCE DEVICE

      
Application Number JP2022033400
Publication Number 2024/052986
Status In Force
Filing Date 2022-09-06
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tan Wei Chean
  • Chiba Hiroyuki
  • Mise Hiromi

Abstract

This observation assistance device for a sample comprises: an observation position display unit that displays, in association with an image display unit, the positions of a plurality of captured images in which a sample is image-captured by a charged particle beam device; a display processing unit that controls the observation position display unit; and a representative image selection processing unit that selects a representative image on the basis of the plurality of captured images. According to a change in the magnification of the image display unit, the display processing unit controls the representative image to a size that is easily visible and displays the representative image on the observation position display unit.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube

26.

DISPENSER AND ANALYSIS DEVICE

      
Application Number JP2022033595
Publication Number 2024/053025
Status In Force
Filing Date 2022-09-07
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Shibahara Masashi
  • Hara Daisuke

Abstract

A multidispenser 100 comprises: a plurality of syringes 103 which are each constituted by a plunger 101 and a housing 102; a drive motor 104 which drives at least one plunger 101; tip end parts 106 to which dispensing tips 105 are attached; and tubes 107A, 107B which connect the syringes 103 and the tip end parts 106, wherein the outer diameter 109 of each housing 102 is greater than the pitch distance 108 of the dispensing tips 105, and the plurality of syringes 103 are arranged in a plurality of rows. Thus, it is possible to increase plunger diameter as compared to the prior art, and to perform dispensation in amounts ranging from minute to large.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

27.

BATTERY MANAGEMENT DEVICE, BATTERY MANAGEMENT METHOD, AND BATTERY MANAGEMENT PROGRAM

      
Application Number JP2023012808
Publication Number 2024/053143
Status In Force
Filing Date 2023-03-29
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tsunoda Jun
  • Kouno Toru
  • Ueda Yutaka
  • Fujimoto Hiroya
  • Fujimoto Akira
  • Isozaki Eri
  • Akizuki Keito

Abstract

The purpose of the present invention is to provide technology that enables a degree of wear of a battery to be accurately estimated in a short time. A battery management device according to the present invention estimates, on the basis of temporal change of battery voltage in a rest period of the battery, a deterioration mode of the battery, selects the Eyring plot corresponding to the deterioration mode that is estimated, and diagnoses a state of the battery on the basis of the plot that is selected (see Fig. 8).

IPC Classes  ?

  • G01R 31/392 - Determining battery ageing or deterioration, e.g. state of health
  • G01R 31/367 - Software therefor, e.g. for battery testing using modelling or look-up tables
  • G01R 31/3828 - Arrangements for monitoring battery or accumulator variables, e.g. SoC using current integration
  • G01R 31/385 - Arrangements for measuring battery or accumulator variables
  • G01R 31/396 - Acquisition or processing of data for testing or for monitoring individual cells or groups of cells within a battery
  • H01M 10/48 - Accumulators combined with arrangements for measuring, testing or indicating the condition of cells, e.g. the level or density of the electrolyte
  • H02J 7/00 - Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries

28.

FILTER DEVICE, FILTER FIXING TOOL, AND FILTERING METHOD

      
Application Number JP2023016422
Publication Number 2024/053155
Status In Force
Filing Date 2023-04-26
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Ishimaru Masako
  • Fukuzono Shinichi
  • Hisamatsu Mitsuko

Abstract

The present invention enables easy fitting or removal of a filter container with a small force while keeping airtightness between the filter container and an elastic body through division of a part for achieving airtightness between the the filter container and the elastic body and a part for fixing the filter container. This filter device comprises: a funnel 10 having an inlet 11 through which a liquid sample is inputted and an outlet 12 having an opening area smaller than that of the inlet 11; a filter container 20 which has a filter 23 for capturing an object included in the liquid sample and into which a tip having the outlet 12 of the funnel 10 is inserted; a rubber plug 40 having a through-hole 41 which serves as a flow channel of the liquid sample that passed through the filter 23; and a filter fixing tool 30 that abuts against the filter container 20 to support the filter container 20, and presses the filter container 20 to the rubber plug 40.

IPC Classes  ?

  • G01N 1/40 - Concentrating samples
  • B01D 29/01 - Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups ;   Filtering elements therefor with flat filtering elements
  • G01N 1/10 - Devices for withdrawing samples in the liquid or fluent state

29.

CONTAINER STORAGE DEVICE, AUTOMATIC ANALYSIS SYSTEM, AND METHOD FOR RETRIEVING SAMPLE CONTAINER

      
Application Number JP2023026457
Publication Number 2024/053256
Status In Force
Filing Date 2023-07-19
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Joji Akira
  • Matsuda Yuki
  • Watanabe Yutaka
  • Chida Saori
  • Sasaki Shunsuke

Abstract

Provided is a container storage device 101 that is connected to an automatic analysis device via a transport path through which a rack is transported, wherein: the container storage device has a storage chamber 204 in which sample containers are stored, a container transport mechanism 208 that moves the sample containers between the storage chamber and a rack 203, and a control unit; the transport path allows transport of the rack in a direction from the container storage device toward the automatic analysis device; the rack is provided with a plurality of placement positions at which the sample containers are placed; and once a plurality of sample containers to be carried out that accommodate samples for which a measurement request was issued from the automatic analysis device can be carried out, the control unit determines a carry-out priority for the plurality of sample containers to be carried out and performs control such that sample containers to be carried out that have higher degrees of carry-out priority are mounted at container placement positions on the rack that are farther toward the transport direction of the transport path. This reduces a sample-loading-related burden on a user and improves the efficiency of measurement by the automatic analysis device.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

30.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023026697
Publication Number 2024/053263
Status In Force
Filing Date 2023-07-20
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Shirai Kotaro

Abstract

The present invention reduces the operation time of an automatic analysis device and improves the convenience of the automatic analysis device. For this purpose, this automatic analysis device is configured to be able to display, on a display device, an operation menu screen 400 that displays a hierarchically defined operation menu for the automatic analysis device, and a shortcut screen 600 in which a plurality of shortcut buttons for performing specific operations included in the operation menu are arranged. When a shortcut button for performing a predetermined operation is selected on the shortcut screen, the predetermined operation included in the operation menu screen is performed. The arrangement of the shortcut buttons in the shortcut screen is determined by the user.

IPC Classes  ?

  • G06F 3/0482 - Interaction with lists of selectable items, e.g. menus
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

31.

LIGHT DETECTION DEVICE

      
Application Number JP2022033397
Publication Number 2024/052984
Status In Force
Filing Date 2022-09-06
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Imai Ryo
  • Anazawa Takashi

Abstract

00120122 of a substance inside each tube.

IPC Classes  ?

32.

DIMENSION MEASUREMENT SYSTEM, ESTIMATION SYSTEM AND DIMENSION MEASUREMENT METHOD

      
Application Number JP2022033680
Publication Number 2024/053043
Status In Force
Filing Date 2022-09-08
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Sawada, Atsushi
  • Ikeuchi, Akira

Abstract

Provided is a dimension measurement system or the like which uses a method in which a human inputs and sets some information while making it possible to reduce the manual operation time or burden for the human. This dimension measurement system involves: displaying, for a user, a screen which includes an image and a graphical user interface (GUI), designating a reference line (interface reference line) for identifying part of a region of a structure to be subjected to dimension measurement, on the basis of a manual user operation, on an image on the screen, and designating a reference point (region reference point) within said region, said point being for identifying the region of the structure to be subjected to the dimension measurement (step 3); detecting an outline or an edge of the region of the structure to be subjected to a dimension measurement in the image by using the reference line and the reference point (step 4); and measuring a dimension of the structure to be subjected to a dimension measurement in the image by using the detected outline or edge information (step 5).

IPC Classes  ?

  • G06T 1/00 - General purpose image data processing
  • G01B 21/02 - Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness

33.

ION MILLING DEVICE, SECTION MILLING PROCESSING METHOD, AND SECTION MILLING HOLDER

      
Application Number JP2022033809
Publication Number 2024/053073
Status In Force
Filing Date 2022-09-08
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Fujita Naohiro
  • Takasu Hisayuki
  • Kamoshida Hitoshi
  • Kamino Atsushi

Abstract

An ion milling device has: a sample stage (2) on which is installed a section milling holder that holds a sample (2) and a shielding plate (3); an ion gun (4) that emits a non-convergent ion beam toward the sample; and a shielding plate driving unit (8) that changes the adhesion of the sample and the shielding plate and the position of the shielding plate with respect to the sample in an edge direction along a border between the sample and the shielding plate held by the section milling holder.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/30 - Electron-beam or ion-beam tubes for localised treatment of objects

34.

ION MILLING DEVICE AND METHOD FOR PROCESSING SPECIMEN

      
Application Number JP2022033810
Publication Number 2024/053074
Status In Force
Filing Date 2022-09-08
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Horinouchi Kento
  • Aida Shota

Abstract

This ion milling device comprises: a specimen stage (103) on which a specimen is to be placed; a specimen table (102) and a shielding-plate-fixing part (106) which are supported by the specimen stage; a shielding plate (105) fixed to the shielding-plate-fixing part; an ion source (101) which emits an unfocused ion beam toward the specimen; and a temperature regulation unit (108) which is connected to the shielding-plate-fixing part by a heat transfer cable (107) and which regulates the temperature of the shielding-plate-fixing part. The specimen is sandwiched between the shielding plate and the specimen table and held thereby, and the amount in which the specimen protrudes from the shielding plate is regulated in accordance with temperatures of the shielding-plate-fixing part which are set by the temperature regulation unit.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/30 - Electron-beam or ion-beam tubes for localised treatment of objects
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

35.

ELECTROPHORESIS DEVICE AND CAPILLARY ARRAY

      
Application Number JP2022032425
Publication Number 2024/047701
Status In Force
Filing Date 2022-08-29
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Morioka Tomonari
  • Miyata Hitoshi
  • Yamamoto Shuhei
  • Okuno Ayaka
  • Yamazaki Motohiro
  • Shibasaki Takehiko

Abstract

In order to provide an electrophoresis device in which it is possible to reduce a noise signal caused by foreign matter surrounding an excitation-light-irradiated part of a capillary array, the present invention provides an electrophoresis device comprising a capillary array in which capillaries used in electrophoresis of a sample are arranged in a planar form, an excitation light source that irradiates the capillary array with excitation light, and a fluorescence measurement unit that measures fluorescence induced from the capillary array, the electrophoresis device characterized in that the capillary array has a hermetic structure in which the surroundings of an excitation-light-irradiated part are filled with air, the excitation-light-irradiated part being the location irradiated with the excitation light.

IPC Classes  ?

36.

LIQUID ATOMIZING DEVICE AND ANALYSIS DEVICE USING SAME

      
Application Number JP2022032484
Publication Number 2024/047722
Status In Force
Filing Date 2022-08-30
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Miyasaka Tooru
  • Terui Yasushi

Abstract

A liquid atomizing device that continuously atomizes liquid samples of a plurality of types which are continuously supplied thereto, wherein different liquid samples are prevented from mixing with one another. This liquid atomizing device comprises: a liquid supply part that has a liquid passage; and an ultrasonic wave vibration unit that is positioned so as to be in contact with the liquid supply part, wherein the liquid supply part has a fine hole communicating the interior and the exterior of the liquid passage, the ultrasonic wave vibration unit is configured so as to apply vibrations to a liquid flowing through the liquid passage, and the liquid is discharged as fine droplets from the fine hole.

IPC Classes  ?

  • G01N 27/62 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electric discharges, e.g. emission of cathode

37.

PLASMA PROCESSING DEVICE, INTERNAL MEMBER OF PLASMA PROCESSING DEVICE, AND METHOD FOR MANUFACTURING INTERNAL MEMBER OF PLASMA PROCESSING DEVICE

      
Application Number JP2022032583
Publication Number 2024/047746
Status In Force
Filing Date 2022-08-30
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Ueda Kazuhiro
  • Ikenaga Kazuyuki

Abstract

In order to provide a plasma processing device with increased processing yield, an internal member thereof, or a method for manufacturing those, the present invention comprises a processing chamber which is disposed inside a vacuum chamber and in which plasma is formed and a member which is disposed inside the processing chamber and a surface of which faces the plasma. The member is configured to include, on the surface, a film composed of a material containing at least one of yttrium oxide, yttrium fluoride, and yttrium oxyfluoride and an element that becomes a +4-valent or +6-valent ion having a smaller ionic radius than that of a +3-valent yttrium ion, the material containing, on average, 1.5 times or more as much oxygen in molar ratio as yttrium and 1 times or more, preferably 1.4 times or more as much fluorine in molar ratio as yttrium.

IPC Classes  ?

38.

CAPILLARY ELECTROPHORESIS DEVICE AND OPTICAL PERFORMANCE DIAGNOSTIC METHOD FOR SAME

      
Application Number JP2022032426
Publication Number 2024/047702
Status In Force
Filing Date 2022-08-29
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Takeuchi Shinji
  • Gomi Takashi
  • Yamazaki Motohiro
  • Shibasaki Takehiko
  • Maruoka Katsunari

Abstract

The purpose of the present invention is to provide a capillary electrophoresis device that can confirm optical performance without performing a specialized task, and an optical performance diagnostic method for the capillary electrophoresis device. In order to achieve said purpose, the present invention is a capillary electrophoresis device comprising: a capillary array formed by a plurality of capillaries; a light source that oscillates laser light; a detector that detects light emitted when the capillary array is irradiated with the laser light; and a control unit that performs prescribed processing on the basis of signals from the detector. The control unit extracts a prescribed absolute value related to an optical index on the basis of an image captured by the detector, and calculates the optical index by comparing the extracted absolute value and a predetermined reference value.

IPC Classes  ?

39.

ION SOURCE AND ANALYSIS DEVICE USING SAME

      
Application Number JP2022032487
Publication Number 2024/047723
Status In Force
Filing Date 2022-08-30
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Miyasaka Tooru
  • Terui Yasushi

Abstract

Provided is a new ion source that produces microdroplets from a liquid sample continuously supplied from a liquid chromatograph or the like, electrically charges the microdroplets, executes a series of treatments for vaporizing a solvent at a low gas flow rate, and introduces ions of a solute component contained in the liquid sample into an analysis block. This ion source is for supplying, to an analysis block for analyzing a liquid sample containing a solute component, ions of the solute component, the ion source comprising: a droplet production unit that produces droplets of the liquid sample; a heated and pressure-adjusted gas supply block that heats a carrier gas that flows therein from the droplet production unit together with the droplets; and an electrically charging unit that electrically charges the solute component and ionizes the same. The heated and pressure-adjusted gas supply block includes: a sample transport tube path that is arranged between the analysis block and the droplet production unit; a heated and pressure-adjusted gas reservoir unit that is configured to be in contact with the sample transport tube path so that heat can be transferred therebetween; a gas-heating unit that heats a prescribed gas to a prescribed temperature; and a pressure-adjusting unit that maintains the pressure of the prescribed gas in a prescribed range. The droplets and the carrier gas are heated by the heated prescribed gas. The droplets and the carrier gas are supplied from the droplet production unit to the sample transport tube path. The heated prescribed gas is introduced from the heated and pressure-adjusted gas reservoir unit into the sample transport tube path.

IPC Classes  ?

  • H01J 49/04 - Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components

40.

ELECTRIC VEHICLE CHARGING MANAGEMENT DEVICE, ELECTRIC VEHICLE CHARGING MANAGEMENT METHOD, AND PROGRAM

      
Application Number JP2022032633
Publication Number 2024/047762
Status In Force
Filing Date 2022-08-30
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hosoda Junko
  • Nagahara Satoshi
  • Dong Hang
  • Kurita Norio
  • He Qian

Abstract

The present invention suppresses concentrated charging for a plurality of electric vehicles (EVs) to achieve even charging. The present invention provides an electric vehicle charging management device 10 that manages the charging of a plurality of EVs 40 and comprises a charging time slot information creation unit 121 that uses delivery course information 1001 and vehicle information 1003 to create charging time slot information 1007 indicating a schedule for charging each of the plurality of EVs 40, a used power amount calculation unit 122 that calculates used-power-amount-by-time-slot information 1008 indicating a used power amount including an executed charging amount in each of a plurality of time slots, and a charging time slot information changing unit 123 that changes the charging time slot information 1007 by changing the charging of a change target electric vehicle EV in a maximum time slot which is among the plurality of time slots and has the highest used power amount among used power amounts.

IPC Classes  ?

41.

CAPACITY DETERIORATION ESTIMATION DEVICE

      
Application Number JP2023023085
Publication Number 2024/048033
Status In Force
Filing Date 2023-06-22
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yonemoto Masahiro
  • Inoue Takeshi
  • Honkura Kohei
  • Hirasawa Shigeki
  • Konishi Hiroaki
  • Mochizuki Masahito
  • Sumikawa Yosuke
  • Horikoshi Nobuya

Abstract

AA) on the basis of first to fourth relational expressions at the start of charging.

IPC Classes  ?

  • G01R 31/392 - Determining battery ageing or deterioration, e.g. state of health
  • G01R 31/382 - Arrangements for monitoring battery or accumulator variables, e.g. SoC
  • G01R 31/385 - Arrangements for measuring battery or accumulator variables
  • G01R 31/389 - Measuring internal impedance, internal conductance or related variables
  • H01M 10/48 - Accumulators combined with arrangements for measuring, testing or indicating the condition of cells, e.g. the level or density of the electrolyte
  • H02J 7/00 - Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries

42.

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFACTURING DEVICE

      
Application Number JP2022031666
Publication Number 2024/042597
Status In Force
Filing Date 2022-08-23
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Yamaguchi, Yoshihide

Abstract

The purpose of the present invention is to provide semiconductor device manufacturing method and a semiconductor manufacturing device that, without requiring a complex gas supply system, can ensure processing efficiency and suppress contamination by foreign bodies. A representative example of this semiconductor device manufacturing method comprises: a step in which the quantity of fabrication residue of a film subjected to processing that has been formed on a semiconductor wafer is compared with a threshold value; a step in which the semiconductor wafer is heated while an organic gas that includes a substance having, in a molecule thereof, at least two substituents having a lone electron pair is supplied, to form a compound of the film subjected to processing and the organic gas; and a step in which, on the basis of the result of the comparison, after the step in which the compound is formed, the wafer is further heated, raising the temperature thereof to a prescribed temperature, to detach the compound from the surface of the semiconductor wafer.

IPC Classes  ?

43.

AUTOMATIC ANALYSIS DEVICE AND CONTROL METHOD FOR SAME

      
Application Number JP2023019594
Publication Number 2024/042801
Status In Force
Filing Date 2023-05-26
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Akimoto Maki
  • Mishima Hiroyuki
  • Suzuki Naoto
  • Ito Masayuki

Abstract

The purpose of the present invention is to provide an automatic analysis device that makes it possible to more accurately find the time required for a pre-operation from the reception of an analysis instruction to the start of analysis. This automatic analysis device comprises: an analysis module that analyzes a sample; a control unit that controls the analysis module; and a display unit that displays a state of the analysis module, the automatic analysis device being characterized in that the control unit calculates the remaining time until a pre-operation ends, on the basis of the time required for an operation confirmation of each type of mechanism of the analysis module, and causes the display unit to display the remaining time.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

44.

COMPUTER SYSTEM, DIMENSION MEASUREMENT METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM

      
Application Number JP2022032199
Publication Number 2024/042702
Status In Force
Filing Date 2022-08-26
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Okuyama Yutaka
  • Ohmori Takeshi

Abstract

Provided is a computer system that provides a function for extracting, from image data, coordinate information of base points for measuring dimensions of a desired portion of a pattern of the image data, and measuring the dimensions using the coordinate information of the base points, the computer system comprising a preprocessing unit that, even when a learning data set to be used for a learning machine contains both samples for which all base point coordinates are provided and samples for which only some of base point coordinates are provided, allows the learning machine to learn all the samples together by setting, for each of the samples for which only some of the base point coordinate values are provided, a missing base point as a missing measurement portion in annotation data, and by masking the missing measurement portion in the image data. The preprocessing unit includes the learning machine in which a posture estimation model is implemented that outputs the coordinate information of at least two of the base points as learning results. The leaning machine is pre-trained using learning data containing the image data as an input and the coordinate information of the at least two base points as an output. The preprocessing unit extracts the dimensions and the coordinate information of the at least two base points with respect to new image data inputted to the learning machine.

IPC Classes  ?

  • G01B 15/00 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
  • G01B 11/03 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness by measuring coordinates of points

45.

BATTERY MANAGEMENT DEVICE AND BATTERY MANAGEMENT METHOD

      
Application Number JP2023011628
Publication Number 2024/042758
Status In Force
Filing Date 2023-03-23
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kouno Toru
  • Tsunoda Jun
  • Ueda Yutaka
  • Fujimoto Akira
  • Fujimoto Hiroya
  • Isozaki Eri
  • Akizuki Keito

Abstract

The purpose of the present invention is to provide a technology capable of diagnosing the deterioration speed of a battery in a short time. A battery management device according to the present invention specifies a first period during an idle period and a second period after the first period, and estimates the deterioration speed of a battery dependent on the battery temperature, on the basis of a ratio between a first change portion of a voltage during the first period and a second change portion of the voltage during the second period (see fig. 5).

IPC Classes  ?

  • G01R 31/392 - Determining battery ageing or deterioration, e.g. state of health
  • G01R 31/382 - Arrangements for monitoring battery or accumulator variables, e.g. SoC
  • G01R 31/385 - Arrangements for measuring battery or accumulator variables
  • H01M 10/48 - Accumulators combined with arrangements for measuring, testing or indicating the condition of cells, e.g. the level or density of the electrolyte
  • H02J 7/00 - Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries

46.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023020605
Publication Number 2024/042808
Status In Force
Filing Date 2023-06-02
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Funakoshi Sunao
  • Okusa Takenori
  • Isoshima Nobuyuki
  • Yokoyama Koki

Abstract

This automatic analysis device comprises an analysis unit that analyzes a specimen and a treatment unit that pre-treats the specimen before the analysis, wherein the treatment unit is provided with a temperature adjustment unit that heats or cools the air in the treatment unit, the temperature adjustment unit includes a first reagent temperature adjustment unit and a second reagent temperature adjustment unit, the first reagent temperature adjustment unit is configured to heat or cool a first reagent through contact heat transfer, the second reagent temperature adjustment unit is configured to heat or cool a second reagent through contact heat transfer or forced convection heat transfer, and the first reagent temperature adjustment unit is configured to have a heat exchange rate greater than that of the second reagent temperature adjustment unit. Thus, a plurality of reagents can be adjusted to appropriate temperatures irrespective of the ambient temperature around the automatic analysis device.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

47.

ION GUIDE, AND MASS SPECTROMETRY DEVICE PROVIDED WITH SAME

      
Application Number JP2023025965
Publication Number 2024/042908
Status In Force
Filing Date 2023-07-13
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Sugiyama Masuyuki
  • Hasegawa Hideki
  • Hashimoto Yuichiro

Abstract

In order to achieve an ion guide wherein the m/z range of ions that can pass through the ion guide is large, and the structure is simple and resistant to contamination, the present application proposes (see fig. 2A) an ion guide that has ions introduced thereinto, causes said ions to converge, and emits the result, said ion guide having a multipole electrode for forming a multipolar electric field, and an axial electric field electrode for forming an axial electric field, wherein the cross-sectional area, perpendicular to the center axis of the ion guide, of at least one of the multipole electrode and the axial electric field electrode varies from an inlet of the ion guide to an outlet of the same.

IPC Classes  ?

  • H01J 49/06 - Electron- or ion-optical arrangements

48.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023027259
Publication Number 2024/042966
Status In Force
Filing Date 2023-07-25
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Shiota Yohei
  • Kon Misaki
  • Yokoyama Koki

Abstract

An automatic analysis device 1 has, in a duct 140 provided in the automatic analysis device 1, a guiding part for guiding air flowing in at prescribed angles with respect to heat sinks 120 due to a change in the flowing direction of the air from a suction port 130 in between the heat sinks 120 to flow toward the sides closest to Peltier elements 110 in the heat sinks 120. Accordingly, an automatic analysis device that comprises a reagent storage capable of improving cooling efficiency compared with conventional products is provided.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

49.

DISPENSING DEVICE, AND GENETIC TEST DEVICE PROVIDED WITH SAME

      
Application Number JP2022031443
Publication Number 2024/038603
Status In Force
Filing Date 2022-08-19
Publication Date 2024-02-22
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Sato Koma
  • Satoh Wataru
  • Isoshima Nobuyuki
  • Shibahara Masashi
  • Makino Yoko
  • Kumazaki Nobutaka

Abstract

In order to reduce the risk of cross-contamination from occurring when integrating reaction cartridges comprising a plurality of lanes, without providing partition walls that define lanes or air intake ports on the cartridges, this dispensing device comprises: a plurality of dispensers; a dispensing device body to which the plurality of dispensers can be fitted and which can move along the direction of lanes of a solution plate in which a plurality of containers for containing a sample or specimen are integrally formed along a plurality of lanes; a top plate for testing on which the dispensing device body and the solution plate are placed; and a device cover that covers, in combination with the top plate for testing, the dispensing device body. The dispenser device body has formed therein a plurality of ribs separating and covering the space above each of a plurality of lanes of a container plate.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 1/00 - Sampling; Preparing specimens for investigation

50.

TEMPERATURE CONTROL DEVICE AND BIOCHEMICAL DEVICE, ANALYSIS DEVICE, AND GENETIC TESTING DEVICE COMPRISING SAME

      
Application Number JP2022030360
Publication Number 2024/033994
Status In Force
Filing Date 2022-08-09
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Satoh Wataru
  • Sato Koma
  • Shibahara Masashi
  • Makino Yoko
  • Kumazaki Nobutaka
  • Isoshima Nobuyuki

Abstract

Provided is a temperature control device comprising a housing, a partition plate that partitions the housing into an upper portion and a lower portion, a temperature control unit, and an exhaust fan, wherein the temperature control unit includes a temperature adjustment unit and a multiwell plate, the multiwell plate is disposed above the partition plate, the temperature adjustment unit is disposed below the partition plate, an air intake port that introduces outside air is provided at a predetermined position located above the partition plate on the side portion of the housing, an exhaust port is provided in the partition plate, an exhaust fan is disposed so as to discharge air from an exhaust path located below the partition plate to the outside of the housing, and the multiwell plate is disposed between the air intake port and the exhaust port and configured so that air flows from the air intake port into the housing, passes above the multiwell plate, and flows from the exhaust port into the exhaust path. Variations in the amount of evaporation of solutions held in each of the plurality of wells provided in the multiwell plate can be decreased in this way.

IPC Classes  ?

  • C12M 1/00 - Apparatus for enzymology or microbiology

51.

PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE AND PLASMA PROCESSING METHOD

      
Application Number JP2022030488
Publication Number 2024/034023
Status In Force
Filing Date 2022-08-09
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Miura Makoto
  • Sato Kiyohiko
  • Kawamura Kohei
  • Sakai Satoshi

Abstract

In relation to production steps for a device having a structure in which a gate is insulated and separated from a Si substrate in a three-dimensional structure of a GAA-type FET or the like having a laminated channel in which fine line-shaped or sheet-shaped channels are vertically laminated in the substrate, the present invention provides a method that does not complicate the production steps without changing a SiGe sacrificial layer for forming the laminated channel and the Ge compositional makeup in the SiGe sacrificial layer required for insulating and separating the gate and the substrate. In order to achieve the above, after etching of a laminated film formed of a Si channel 4B and a SiGe sacrificial layer 3B, a protective insulating film 9 is formed on a sidewall of the laminated film by film formation/etching, and this is performed a plurality of times with different protective film materials. Thereafter, a Si sacrificial layer 4A and a SiGe sacrificial layer 3A remaining in a lower portion are removed by isotropic etching to form a region in which the insulating separation membrane is embedded. By conducting, in a continuous process using the same device, the forming of the laminated film of the protective insulating film to the removing of the sacrificial layer by etching, it is possible to simplify the steps.

IPC Classes  ?

  • H01L 29/78 - Field-effect transistors with field effect produced by an insulated gate

52.

ION MILLING DEVICE AND PROCESSING METHOD USING SAME

      
Application Number JP2022030559
Publication Number 2024/034052
Status In Force
Filing Date 2022-08-10
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Aida Shota
  • Takasu Hisayuki
  • Kamino Atsushi
  • Kamoshida Hitoshi
  • Fujita Naohiro

Abstract

The present invention comprises: a sample chamber (109); a sample stage (102) on which a sample (120) is placed via a rotation stage (103) that can be tilted about a tilt axis (T) and rotates about a rotation axis (R) and a 3-axis drive stage (104) drivable in three axial directions orthogonal to one another; an ion source (101) which emits unfocused ion beam toward the sample and which is installed in the sample chamber such that the ion beam center (B) of the ion beam is orthogonal to the tilt axis (T); and a first finder (105). An optical system of the first finder is installed on the sample stage such that an optical axis thereof matches the tilt axis (T).

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

53.

SAMPLE SURFACE INSPECTION DEVICE

      
Application Number JP2022030610
Publication Number 2024/034071
Status In Force
Filing Date 2022-08-10
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kimura Katsuhiko
  • Satou Yoshihiro
  • Yamamoto Masaya
  • Tomiyama Ayumi

Abstract

Provided is a sample surface inspection device capable of performing a highly accurate inspection while suppressing vibration of the sample and a sample holding member. A sample surface inspection device 1 comprises: a sample holding member 3 that holds a sample 2; a spindle motor 4 that rotates the sample holding member 3; a turntable 5 that is fixed to the spindle motor 4 and rotates by the action of the spindle motor 4; and a focus drive mechanism 11 that generates a drive force for displacing the sample holding member 3 in a focus direction that is the height direction with respect to the turntable 5. The focus drive mechanism 11 comprises: a plurality of support members 1 of which one end is fixed to the sample holding member 3 and the other end is fixed to the turntable 5, the plurality of support members 1 supporting the sample holding member 3 so as to be displaceable in the focus direction that is the height direction with respect to the turntable 5; a yoke 13; a magnet 14 that is fixed to the yoke 13; and a coil 15 that is disposed to oppose the magnet 14. The yoke 13 includes a yoke attachment portion 13a extending in the vertical direction and connected to the sample holding member 3. The yoke attachment portion 13a is fixed on a circumference that is a node of the primary nodal circular vibration mode of the sample holding member 3.

IPC Classes  ?

  • H01L 21/66 - Testing or measuring during manufacture or treatment

54.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023019177
Publication Number 2024/034220
Status In Force
Filing Date 2023-05-23
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tamezane Hideto
  • Takayama Hiroyuki

Abstract

The present invention comprises: an image acquisition unit 203 that acquires an image of a sample container 105; a specifying unit 204 that specifies information on the distance from an opening in the sample container 105 to the liquid surface of a sample, and specifies, from the image, information on the type or the diameter of the sample container 105; a storage unit 205 that stores a threshold for the distance, according to the type of the sample container 105; and a determination unit 206 that determines, on the basis of the distance specified by the specifying unit 204 and the threshold stored in the storage unit 205, whether or not to dispense the sample for which the image was acquired. Due to this configuration, an automatic analysis device is provided which, by implementing lower-risk sample dispensing, improves test result reliability and, by minimizing sample containers which are unusable in a specific analysis module, enables improved testing efficiency.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

55.

PARTS MANAGEMENT SYSTEM, AUTOMATIC ANALYZER, AND PARTS MANAGEMENT METHOD

      
Application Number JP2023019187
Publication Number 2024/034221
Status In Force
Filing Date 2023-05-23
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Maeda Shota
  • Yamano Teruhiro

Abstract

A parts management system comprising: a display unit 14 that displays information relating to a parts management system 1; an automatic analyzer storage unit 23 that, for each of a plurality of analytical devices 25, stores the ID of the corresponding analytical device 25 and state information indicating the state of the analytical device 25 in association with each other; an input unit 13 that receives a request for replacement of the analytical device 25; and a parts management device control unit 11 that causes a display unit 14 to display the ID of the analysis device 25 for which the state information satisfies a predetermined condition and the first state information of the position where the analysis device 25 is used when the input unit 13 receives the request for replacement of the analytical device 25. This provides a parts management system, an automatic analyzer, and a parts management method that can support identification of parts to be removed even when the parts of the same type are used in multiple applications or locations.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

56.

OBJECT CLASSIFICATION DEVICE, OBJECT CLASSIFICATION METHOD, AND OBJECT CLASSIFICATION SYSTEM

      
Application Number JP2023026974
Publication Number 2024/034374
Status In Force
Filing Date 2023-07-24
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kakishita Yasuki
  • Hattori Hideharu

Abstract

This object classification device generates region unit information representing regional information pertaining to an object, determines the type or the state of an object and classifies the object on the basis of a region unit feature quantity extracted from the region unit information and a partial region unit feature quantity extracted from a partial region of an input image, and presents the result of object classification to a user. This makes it possible to classify the types or states of objects with excellent accuracy, even when objects having a variety of sizes, lengths, shapes, and other parameters coexist in the image.

IPC Classes  ?

57.

AUTOMATIC ANALYSIS DEVICE AND METHOD FOR ADJUSTING AMOUNT OF CLEANING LIQUID

      
Application Number JP2023027123
Publication Number 2024/034381
Status In Force
Filing Date 2023-07-25
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Etoh Jun
  • Takahashi Takuya
  • Ochi Manabu
  • Suzuki Yoichiro
  • Kawahara Tetsuji
  • Sakata Kenshiro

Abstract

The purpose of the present invention is to provide an automatic analysis device and an adjustment method which are capable of accurately adjusting the amount of a cleaning liquid in a short time. To this end, the present invention is an automatic analysis device which discharges, during cleaning of a dispensing probe, a reference amount of a cleaning liquid from a cleaning nozzle while the tip of the dispensing probe is at a cleaning position. When setting, as a first adjustment position, a position which is lower than the cleaning position and at which the horizontal distance from the cleaning nozzle is greater than from the cleaning position, and a liquid contact is detected when the tip of the dispensing probe is present at the position and the reference amount of the cleaning liquid is discharged, a control unit, upon adjusting the amount of the cleaning liquid discharges the cleaning liquid while the tip of the dispensing probe is at the first adjustment position to confirm whether the liquid contact has been detected, discharges the cleaning liquid while the tip of the dispensing probe is positioned above or downstream of the first adjustment position to confirm whether the liquid contact has been detected, and determines, on the basis of the confirmation results, the setting of a liquid amount adjustment means required for setting the amount of the cleaning liquid to the reference liquid amount.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

58.

SAMPLE SURFACE QUALITY MANAGEMENT DEVICE

      
Application Number JP2022030592
Publication Number 2024/034067
Status In Force
Filing Date 2022-08-10
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Ishizuka Masato
  • Honda Toshifumi
  • Ukai Ryuji
  • Ohtsubo Kenshiro

Abstract

Provided is a sample surface quality management device that measures the microroughness of a sample, the sample surface quality management device comprising a scattered light measurement device that measures scattered light produced at the sample, an interference light measurement device that measures interference light that includes reflected light produced at the sample, and a signal processing device that processes signals from the scattered light measurement device and the interference light measurement device. The signal processing device computes a first evaluation value for the microroughness of the sample on the basis of a signal from the interference light measurement device, computes a scattering characteristics signal on the basis of a signal from the scattered light measurement device, and computes, for a spatial frequency band for which the first evaluation value is not computed, a second evaluation value for the microroughness on the basis of the first evaluation value and the scattering characteristics signal.

IPC Classes  ?

  • G01B 11/30 - Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
  • H01L 21/66 - Testing or measuring during manufacture or treatment

59.

METHOD FOR CONTINUOUSLY USING SEPARATION MEDIUM

      
Application Number JP2022030683
Publication Number 2024/034098
Status In Force
Filing Date 2022-08-10
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kato Hirokazu
  • Yamazaki Motohiro
  • Haraura Isao
  • Sumida Noriyuki
  • Terakado Asami

Abstract

Provided is a method for continuously using a separation medium, which makes it possible to reduce running cost for an analysis when a liquid polymer is used as the separation medium. The method for continuously using a separation medium according to the present invention comprises a separation medium packing step (S1) for packing a separation medium in a capillary, a first pre-running step (S2) for performing a pre-running, a first sample injection step (S3) for injecting a first-round sample into the capillary, a first electrophoresis step (S4) for applying a voltage to perform a first-round electrophoresis, a second pre-running step (S5) for performing a pre-running after the first electrophoresis step (S4), a second sample injection step (S6) for injecting a next-round sample into the capillary that has been subjected to the second pre-running step (S5), and a second electrophoresis step (S7) for performing a next-round electrophoresis, in which the second pre-running step (S5), the second sample injection step (S6) and the second electrophoresis step (S7) are performed repeatedly preset times.

IPC Classes  ?

60.

METHOD FOR WAFER TREATMENT

      
Application Number JP2022029761
Publication Number 2024/029000
Status In Force
Filing Date 2022-08-03
Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yoshioka, Nozomu
  • Okuma, Kazumasa
  • Kuwahara, Kenichi

Abstract

The purpose of the present invention is to provide a method for wafer treatment, the method making it possible to inhibit wafer-position shifting in wafer treatments. This method for wafer treatment comprises: a wafer-less charge removal step in which, in a treatment device equipped with a sample table having an electrode capable of electrostatically holding a wafer, any charge accumulated on the sample table is removed, with the sample table having no wafer placed thereon; and a wafer treatment step in which after the wafer-less charge removal step, a wafer placed on the sample table is electrostatically held thereon and the wafer is treated. The wafer-less charge removal step comprises a plasma generation step in which a plasma is generated using a first gas for charge removal and a power supply step in which first electric power is supplied to the electrode of the sample table.

IPC Classes  ?

61.

SAMPLE MEASURING DEVICE

      
Application Number JP2022030067
Publication Number 2024/029060
Status In Force
Filing Date 2022-08-05
Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Shirasaki Yasuhiro
  • Uchiho Minami
  • Bizen Daisuke
  • Sakakibara Makoto

Abstract

This sample measuring device comprises: a light source that irradiates a sample including an insulating film with light; an excitation source that irradiates the sample with a primary beam to emit charged particles; a detector that applies at least one of an electric field or a magnetic field to the charged particles to separate the trajectories in accordance with the energy of the charged particles, and outputs a detection signal that depends on the energy of the charged particles; and a control device that processes the detection signal of the charged particles obtained from the detector. The control device changes a light irradiation condition, acquires a detection signal by the detector under a different irradiation condition, and determines and outputs material characteristic values from the detection signal under the different irradiation condition by using information indicating the relationship between the detection signal and the material characteristic values of the insulating film.

IPC Classes  ?

  • G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]

62.

ANALYZING DEVICE, AND INFORMATION OUTPUT METHOD

      
Application Number JP2023019184
Publication Number 2024/029167
Status In Force
Filing Date 2023-05-23
Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Ito Masayuki

Abstract

Provided is an analyzing device that outputs information enabling tracing of databases and logs. The analyzing device comprises: an analyzing unit for analyzing a specimen; a storage unit for storing databases DB1 to DB3, and a log including a specimen ID, the databases DB1 to DB3 storing, in association with one another, the specimen ID, which is linked to personal information of a patient who provided the specimen, and specimen information of the specimen, analyzed by the analyzing unit, an analysis result of the specimen obtained by the analyzing unit, or the personal information of the patient; and a control unit for setting a unique identifier for each record in the database DB1, replacing the specimen ID in the log with the identifier set for the specimen ID in the same database DB1 as the specimen ID in the log (S1108), deleting the specimen ID and the personal information in the databases DB1 to DB3 and the log (S1112), and then outputting the databases DB1 to DB3 and the log to an external device (S1113).

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G16H 10/40 - ICT specially adapted for the handling or processing of patient-related medical or healthcare data for data related to laboratory analysis, e.g. patient specimen analysis

63.

ELECTROPHORESIS DEVICE

      
Application Number JP2022029518
Publication Number 2024/028949
Status In Force
Filing Date 2022-08-01
Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Maruoka Katsunari
  • Shibasaki Takehiko
  • Gomi Takashi
  • Yamazaki Motohiro

Abstract

The purpose of the present invention is to provide an electrophoresis device that has a high degree of freedom in selecting a laser device while limiting deterioration in analysis performance. To this end, the present invention is an electrophoresis device that emits laser beams from both ends of a capillary array in which a plurality of capillaries are placed side by side, and detects light from the plurality of capillaries, the electrophoresis device being provided with a beam isolator on an optical path from the light source of the laser beams to the capillary array. As a result, there can be provided an electrophoresis device that exhibits good analysis performance because reflective returning beams can be limited even without causing the laser to emit laser beams while inclined with respect to the capillary axes. In addition, the degree of freedom in selecting a laser device is improved because transmissive return beams and reflective return beams can be reliably limited.

IPC Classes  ?

64.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023026449
Publication Number 2024/029337
Status In Force
Filing Date 2023-07-19
Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Matsuoka Yuya
  • Ando Takahiro

Abstract

The purpose of the present invention is to provide an automatic analysis device capable of highly reliable analysis in a situation where a light emission amount fluctuates, while suppressing device enlargement and degradation of processing performance. For this purpose, the automatic analysis device of the present invention comprises: a vessel holding part capable of holding a plurality of vessels containing a reaction solution produced by mixing a specimen and a reagent; a light source that emits light; an optical receiver that receives the light emitted by the light source; and a control unit that performs measurement pertaining to light, based on a signal outputted by the optical receiver. The vessels are disposable. The control unit corrects measurement values pertaining to light emitted in positions where the vessels are held in the vessel holding part, on the basis of measurement values pertaining to light emitted in positions where the vessels are not held in the vessel holding part.

IPC Classes  ?

  • G01N 21/75 - Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

65.

GENETIC TESTING METHOD AND GENETIC TESTING DEVICE

      
Application Number JP2022028838
Publication Number 2024/023944
Status In Force
Filing Date 2022-07-26
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Akutsu Masashi

Abstract

A genetic testing device 1 further comprises a calculation unit 2d that adds, to the time at which an analyte is put, an available standby time depending on the priority of the analyte and calculates a target time by which dispensation to the analyte is to be completed. A control unit 2c executes dispensation of analytes in the order of target time. Consequently, in the genetic testing method and genetic testing device provided by the present invention, priority is given to measurement of an analyte with high priority, and measurement of an analyte with low priority is prevented from being overly delayed when analytes with high priority are introduced in succession.

IPC Classes  ?

  • C12Q 1/6844 - Nucleic acid amplification reactions
  • C12M 1/00 - Apparatus for enzymology or microbiology
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

66.

ANALYSIS METHOD AND CAPILLARY ELECTROPHORESIS DEVICE

      
Application Number JP2022028984
Publication Number 2024/023979
Status In Force
Filing Date 2022-07-27
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Terakado Asami
  • Yamazaki Motohiro
  • Kato Hirokazu
  • Sumida Noriyuki
  • Tanai Hiroyuki

Abstract

The purpose of the present invention is to provide an analysis method that suppresses unnecessary repetition of electrophoresis or sample preparation. An analysis method according to the present invention involves analyzing the characteristics of a sample by electrophoresis of the sample using a capillary and a migration medium and includes a read-in step for reading-in analysis conditions, a migration medium filling step for filling the capillary with the migration medium, a sample injection step for injecting the sample into the capillary filled with the migration medium at the migration medium filling step, an electrophoresis step for electrophoresing the sample injected at the sample injection step through the migration medium, an abnormality determination step for comparing analysis results obtained at the electrophoresis step with other analysis results for the same analysis conditions to statistically determine whether there is an abnormality, and an analysis conditions adjustment step for adjusting the analysis conditions. When it has been determined that there is an abnormality at the abnormality determination step, the method returns to the read-in step via the analysis conditions adjustment step.

IPC Classes  ?

67.

DISTANCE MEASURING DEVICE AND DISTANCE MEASURING METHOD

      
Application Number JP2023019326
Publication Number 2024/024242
Status In Force
Filing Date 2023-05-24
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hariyama Tatsuo
  • Watanabe Masahiro
  • Maruno Kenji
  • Akiyama Hirohito
  • Kando Hidehiko

Abstract

According to the present invention, a distance to a target object is measured with a high accuracy by suppressing stray light inside a probe tip end portion. In this distance measuring device, a probe tip end portion includes, at a tip end of the probe tip end portion, an optical path switching element for switching an optical path of measuring light entering from an optical element, wherein a material of a part of the probe tip end portion disposed in a position facing at least a fifth surface absorbs the measuring light.

IPC Classes  ?

  • G01C 3/06 - Use of electric means to obtain final indication
  • G01B 11/24 - Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures

68.

PLASMA PROCESSING METHOD

      
Application Number JP2022028584
Publication Number 2024/023877
Status In Force
Filing Date 2022-07-25
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Nam, Juhyun
  • Ishimaru, Masato
  • Tahara, Shota

Abstract

The present invention provides a technology that can realize vertical etching by controlling process conditions. A plasma processing method according to one embodiment of the present invention involves a method for forming a shallow trench isolation and comprises: a first step for etching silicon by plasma; a second step for depositing a deposition film containing a silicon element on a mask; a third step for etching the silicon by plasma so as to have a vertical etching shape; and a fourth step for depositing a deposition film containing SiO on the mask. The first to fourth steps are repeated a prescribed number of times. The plasma in the third step is generated by high‐frequency power obtained by modulation using a first pulse, and the third step is performed while high‐frequency power obtained by modulation using a second pulse is supplied to a test piece in which the silicon is used as the substrate. The first pulse frequency in the third step is higher than the second pulse frequency in the third step.

IPC Classes  ?

  • H01L 21/76 - Making of isolation regions between components
  • H01L 21/3065 - Plasma etching; Reactive-ion etching

69.

LENGTH MEASUREMENT SYSTEM, MODEL CREATION SYSTEM, AND LENGTH MEASUREMENT METHOD

      
Application Number JP2022028873
Publication Number 2024/023955
Status In Force
Filing Date 2022-07-27
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Chen Jun
  • Yumiba Ryou
  • Toyoda Yasutaka

Abstract

In the present invention, a measurement-subject captured image in which a specimen is captured is converted to a measurement-subject length-measurement image by a length-measurement image conversion model, and the dimensions of a measurement pattern image included in the measurement-subject length-measurement image are measured. The measurement-subject image conversion model is trained using teaching data that is a combination of a training captured image in which the specimen is captured and a training length-measurement image that corresponds to the training captured image. The contrast between a measurement pattern image and a non-measurement pattern image present near the measurement pattern image in the training length-measurement image is improved over the contrast between a measurement pattern image and a non-measurement pattern image in the training captured image. Alternatively, the non-measurement pattern image in the training captured image is deleted from the training length-measurement image.

IPC Classes  ?

  • G01B 15/00 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
  • G06T 5/00 - Image enhancement or restoration

70.

ION MILLING DEVICE AND ION MILLING METHOD

      
Application Number JP2022029195
Publication Number 2024/024061
Status In Force
Filing Date 2022-07-28
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Asai Kengo
  • Takasu Hisayuki

Abstract

The present invention improves the milling speed and lengthen the maintenance cycle of an ion milling device. This ion generating unit of an ion gun comprises: a disk-shaped first cathode 11 and a disk-shaped second cathode 12 provided with an ion beam extraction hole 32, the first cathode and the second cathode being arranged opposite to each other; an anode arranged between the first cathode and the second cathode in a state of being electrically insulated from the first cathode and the second cathode; an ionization chamber 18 which is surrounded by the first cathode, the second cathode, and the anode and into which a gas is supplied from a gas supply mechanism 40; and a magnet 14 that generates a magnetic field in the ionization chamber, wherein the anode has a cylindrical shape with the longitudinal direction thereof being along the central axis of the ion generating unit, and at the inner wall that is in contact with the ionization chamber, a first protrusion is formed toward the central axis in a range from a position that is equidistant from both ends of the anode to the end opposite the first cathode.

IPC Classes  ?

  • H01J 37/08 - Ion sources; Ion guns
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

71.

CHARGED PARTICLE BEAM DEVICE AND METHOD FOR CONTROLLING CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2022029361
Publication Number 2024/024108
Status In Force
Filing Date 2022-07-29
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Tamaki Hirokazu

Abstract

In the present invention, a charged particle beam device includes: a movement mechanism that holds and moves a sample; a particle source that outputs a charged particle beam; a detector that detects a signal that is generated by irradiating the sample with the charged particle beam; and a controller that controls the movement mechanism, the particle source, and the detector. The controller determines an irradiation target area in the sample in accordance with the sample, moves the irradiation position of the charged particle beam in the irradiation target area, acquires a diffraction pattern obtained using the detection result from the detector at a different irradiation position, and controls the movement mechanism on the basis of an analysis result of the diffraction pattern so as to adjust the inclination of the sample.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams

72.

GRIPPING DEVICE

      
Application Number JP2023025005
Publication Number 2024/024436
Status In Force
Filing Date 2023-07-05
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Shiraiwa Hiroyuki
  • Oda Takahiro
  • Itagaki Yuto

Abstract

The purpose of the present disclosure is to, with respect to a gripping device that grips an object, provide utility that enables a gripping action and various tasks to be performed. A gripping device according to the present disclosure comprises a first member and a second member that extend from an arm part. The first member and the second member are configured so as to grip an object by sandwiching the object. The rigidity of the first member is greater than the rigidity of the second member.

IPC Classes  ?

  • B25J 15/08 - Gripping heads having finger members
  • B25J 15/12 - Gripping heads having finger members with flexible finger members

73.

CHARGED PARTICLE BEAM SYSTEM AND CONTROL METHOD THEREFOR

      
Application Number JP2022028118
Publication Number 2024/018544
Status In Force
Filing Date 2022-07-19
Publication Date 2024-01-25
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yatsu Anno
  • Kitayama Shinya
  • Sakamoto Naoki

Abstract

The present disclosure provides a charged particle beam system that comprises: a specimen replacement chamber in which an existing specimen stage is utilized as is, and which, in order to improve specimen conveyance efficiency, is used to replace a specimen conveyed to an observation chamber; and a computer that controls the conveyance of the specimen from the specimen replacement chamber to the observation chamber. The specimen replacement chamber includes a multi-sample table that has an extrusion mechanism for extruding a specimen and whereon a plurality of specimens can be placed; and a conveyance mechanism for moving the multi-sample table between the specimen replacement chamber and the observation chamber. The computer: controls the conveyance mechanism to execute a process of conveying the multi-sample table into the observation chamber; controls the extrusion mechanism to execute a process of placing one specimen on a specimen placement part of the observation chamber, from the multi-sample table conveyed to the observation chamber; and controls the conveyance mechanism, once the one specimen has been placed on the specimen placement part, to execute a process of retracting the multi-sample table from the observation chamber to the specimen replacement chamber.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

74.

CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2022028259
Publication Number 2024/018568
Status In Force
Filing Date 2022-07-20
Publication Date 2024-01-25
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kubo Takashi
  • Sakamaki Minoru
  • Morita Hiroshi

Abstract

The purpose of the present invention is to provide a charged particle beam device that: has an electrode short-circuit mechanism with which a change in lens action that occurs between accelerating electrodes during a change in an acceleration voltage can be suppressed; and is capable of operating with the acceleration voltage applied as-is to the electrode short-circuit mechanism. The charged particle beam device according to the present invention controls the potential difference between a short electrode and a first multi-stage accelerating electrode to the extent that discharge does not occur with the acceleration voltage applied as-is to a first accelerating electrode, and connects the first multi-stage accelerating electrode and the short electrode which are at the potential difference.

IPC Classes  ?

  • H01J 37/248 - Components associated with high voltage supply

75.

SHAPE MEASUREMENT DEVICE AND SHAPE MEASUREMENT METHOD

      
Application Number JP2023019832
Publication Number 2024/018758
Status In Force
Filing Date 2023-05-29
Publication Date 2024-01-25
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Watanabe Masahiro
  • Hariyama Tatsuo
  • Maruno Kenji
  • Akiyama Hirohito
  • Kando Hidehiko

Abstract

When a multi-joint robot is adopted in this shape measurement device, the shape of a target object is accurately measured without adding an additional driving axis to the multi-joint robot. The shape measurement device comprises: a multi-joint robot having a plurality of driving axes; and a non-contact distance sensor attached to the multi-joint robot, wherein the multi-joint robot drives one predetermined axis among the plurality of driving axes, thereby scanning the target object, with measurement light emitted from the non-contact distance sensor.

IPC Classes  ?

  • G01B 11/24 - Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
  • G01B 11/25 - Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. moiré fringes, on the object

76.

METHOD FOR ESTIMATING CAUSE OF PROLONGATION OF BLOOD COAGULATION TIME, AND INFORMATION PROCESSING DEVICE

      
Application Number JP2023022245
Publication Number 2024/018789
Status In Force
Filing Date 2023-06-15
Publication Date 2024-01-25
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Minemura Hiroyuki
  • Yamamoto Kyoko
  • Yabutani Chie
  • Umeda Mariko

Abstract

The objective of the present invention is to estimate a cause of prolongation of a blood coagulation time of a test specimen. This method for estimating a cause of prolongation of a blood coagulation time includes: acquiring a coagulation waveform representing a change over time in a light intensity, said change resulting from a coagulation reaction of a reaction solution obtained by mixing the test specimen and a reagent (S301b); acquiring a first waveform by means of before-after difference processing of the coagulation waveform (S302b); acquiring first and second fitting waveforms by means of fitting processing of the coagulation waveform and the first waveform (S303b, S304b); acquiring a third waveform by means of before-after difference processing of the second fitting waveform (S305b); acquiring first to third normalized waveforms by normalizing light intensity axes and time axes of each of the first and second fitting waveforms and the third waveform (S306b); extracting feature quantities from each of the first to third normalized waveforms (S307b); and estimating the cause of the prolongation of the blood coagulation time of the test specimen on the basis of known feature quantities and the extracted feature quantities.

IPC Classes  ?

  • G01N 33/86 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving blood coagulating time
  • G01N 33/48 - Biological material, e.g. blood, urine; Haemocytometers
  • G16H 10/40 - ICT specially adapted for the handling or processing of patient-related medical or healthcare data for data related to laboratory analysis, e.g. patient specimen analysis

77.

CHARGED PARTICLE SOURCE, CHARGED PARTICLE GUN, AND CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2022028263
Publication Number 2024/018570
Status In Force
Filing Date 2022-07-20
Publication Date 2024-01-25
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Jokoji Yuki
  • Fukuta Masahiro
  • Fukumoto Masayuki

Abstract

The purpose of the present disclosure is to stabilize the probe current of a charged particle source over long periods of time. In a charged particle source according to the present disclosure, an emitter tip has a first flat surface perpendicular to an optical axis, a plurality of second flat surfaces parallel to the optical axis, and a plurality of third flat surfaces each disposed between the first flat surface and a second flat surface. Among the plurality of second flat surfaces, a first distance between second flat surfaces located at positions facing each other across the optical axis is greater than the outer diameter of the boundary portion between the tip and a needle.

IPC Classes  ?

78.

ION GUIDE AND MASS SPECTROMETER

      
Application Number JP2023021787
Publication Number 2024/014208
Status In Force
Filing Date 2023-06-12
Publication Date 2024-01-18
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hasegawa Hideki
  • Sugiyama Masuyuki

Abstract

The present invention provides an ion guide and a mass spectrometer that achieve both high ion intake efficiency and high ion convergence efficiency. Provided is an ion guide wherein ions advance through an internal space from an inlet side toward an outlet side. The ion guide comprises a plurality of plate-shaped electrodes. The plurality of plate-shaped electrodes are stacked with an interval therebetween in a stacking direction that is orthogonal to the advancement direction in which the ions advance. At least two of the plurality of plate-shaped electrodes are inclined plate-shaped electrodes having an inclined surface which is inclined with respect to the advancement direction, at a part that faces the internal space. The inclined plate-shaped electrodes each have, at an inlet side end face, an inclination start point at which the inclined surface starts. In at least two of the inclined plate-shaped electrodes which are adjacent in the stacking direction, the position of the inclination start point differs in a direction orthogonal to both the advancement direction and the stacking direction.

IPC Classes  ?

  • H01J 49/06 - Electron- or ion-optical arrangements

79.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023023887
Publication Number 2024/014286
Status In Force
Filing Date 2023-06-28
Publication Date 2024-01-18
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Matsuzawa Mitsuhiro
  • Shimizu Hayato
  • Kumagai Takahiro
  • Okusa Takenori

Abstract

The purpose of the present invention is to provide an automatic analysis device including a cold storage box that prevents external heat and moisture from entering through a container entrance, without being provided with a fan that serves as a heat source in a cold storage chamber. For said purpose, the present invention provides an automatic analysis device including a cold storage box for storing a liquid in a cold state, wherein: the cold storage box has a cold storage chamber for holding the liquid, and a cooling device that generates and supplies cooling air to the cold storage chamber; the cold storage chamber includes a rotatable disk that supports a container storing a liquid, a jacket for housing the disk, and a cover that covers over the jacket; and the cover has formed therein a container entrance for taking in and out the container, and a flow path for generating a transverse airflow below the container entrance.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

80.

METHOD FOR CONTROLLING LIQUID TRANSPORT IN FLOW PATH OF BIOMOLECULE ANALYZER USING COMPUTER, AND BIOMOLECULE PURIFICATION SYSTEM

      
Application Number JP2022027757
Publication Number 2024/013952
Status In Force
Filing Date 2022-07-14
Publication Date 2024-01-18
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tezuka Sayaka
  • Nakagawa Tatsuo

Abstract

To prevent air from exceeding a purification membrane even in the absence of an additional flow path structure, the present disclosure proposes a method for controlling liquid transfer in a flow path of a biomolecule analyser using a computer, the biomolecular analyser having a first chamber containing a first liquid, a second chamber containing a second liquid, a membrane chamber having a purification membrane, and a waste liquid chamber, the method including: performing control, by computer, so as to transport the second liquid until at least beyond a confluence of a first flow path leading from the first chamber to the waste liquid chamber and a second flow path extending from the second chamber, and draining a fluid different from the first and second liquids from the second flow path; performing control, by computer, so as to transport the first liquid from the first chamber to the waste liquid chamber via the membrane chamber; and performing control, by computer, so as to transport the second liquid in the second chamber from the second chamber to the membrane chamber (see fig. 6).

IPC Classes  ?

  • G01N 1/00 - Sampling; Preparing specimens for investigation

81.

INSPECTION APPARATUS

      
Application Number JP2022026959
Publication Number 2024/009454
Status In Force
Filing Date 2022-07-07
Publication Date 2024-01-11
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Honda Toshifumi

Abstract

An inspection apparatus for inspecting a sample having a surface formed by a transparent film and an opaque substance, the apparatus comprising: a first optical unit that condenses first reflected light obtained as a result of illumination light, emitted from a light source, being reflected on the sample; a second optical unit that condenses second reflected light obtained as a result of the illumination light being emitted toward and reflected by a reflection mirror; an optical interference unit that causes the first reflected light and the second reflected light to interfere with each other to obtain interference light; a plurality of interference light sensors that detect the reflected light intensity of the interference light; and a signal-processing device that processes the amount of light detected by the interference light sensors, wherein the signal-processing device determines whether a given coordinate point of the sample is in the transparent film or in the opaque substance, on the basis of the amount of light detected by the interference light sensors and the refractive indexes of the transparent film and the opaque substance, and measures the surface height or the thickness of the sample at the coordinate point.

IPC Classes  ?

  • G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness
  • G01B 11/06 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness for measuring thickness

82.

AUTOMATED ANALYSIS SYSTEM AND ALARM MANAGEMENT METHOD

      
Application Number JP2023019736
Publication Number 2024/009645
Status In Force
Filing Date 2023-05-26
Publication Date 2024-01-11
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Seki Yoshihiro

Abstract

The present invention facilitates identification of the cause of an alarm and specification of a method for addressing the alarm. This automated analysis system comprises an inspection processing unit that executes at least one process for the purpose of inspection, and a management device that manages the inspection processing unit. The management device is provided with: an alarm detection unit that detects that an alarm indicating the occurrence of an abnormality in the inspection processing unit is being emitted; an alarm notification unit that, in accordance with the result of detection by the alarm detection unit, issues a notification to indicate that the alarm is being emitted; and a related alarm determination unit that determines, from among related alarms that are other alarms having a prescribed degree of relatedness to the alarm being emitted, a related alarm that is in an unaddressed state.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

83.

OPTICAL FILTERING DEVICE AND MEMS SHUTTER

      
Application Number JP2022026555
Publication Number 2024/009340
Status In Force
Filing Date 2022-07-04
Publication Date 2024-01-11
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yoshimura Yasuhiro
  • Tomotsune Hitoyuki
  • Kanamaru Masatoshi
  • Aono Takanori
  • Otani Yuko
  • Kanzaki Nobuhiko

Abstract

Provided is an optical filtering device used as a spatial filter for a dark field optical microscope, wherein the optical filtering device is highly reliable and is capable of controlling a shutter at a desired opening angle without fully opening the shutter. This optical filtering device is characterized in that: the optical filtering device comprises a shutter that can be opened and closed through voltage control, and a substrate having a shutter opening part that is the movable range of the shutter; the substrate has a stopper disposed extending in the thickness direction of the substrate on a side surface of the shutter opening part, and of which any cross sections in the thickness direction of the substrate have substantially the same shape; the shutter has a cut-out part; and the cut-out part abuts on the stopper when the shutter is opened.

IPC Classes  ?

  • G02B 26/02 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
  • B81B 3/00 - Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
  • G02B 21/00 - Microscopes
  • H01L 21/66 - Testing or measuring during manufacture or treatment

84.

ABERRATION CORRECTION DEVICE AND ABERRATION CORRECTION METHOD

      
Application Number JP2022025576
Publication Number 2024/003987
Status In Force
Filing Date 2022-06-27
Publication Date 2024-01-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Suzuki Michiko
  • Kubo Yudai

Abstract

This aberration correction device for correcting aberration of an optical system has a first multipole lens that generates a first hexapole field, a second multipole lens that generates a second hexapole field, a first deflector that generates a first deflection field, and a second deflector that generates a second deflection field. The first deflector is disposed in a position of a beam cross between the first multipole lens and the second multipole lens, and the second deflector is disposed between the first deflector and the first multipole lens or the second multipolar lens. The aberration correction device deflects back, by means of the second deflector, a beam deflected by means of the first deflector, and passes the beam through the center of at least one of the first multipole lens or the second multipole lens, thereby correcting at least one of two-fold symmetric first-order astigmatism (A1) and five-fold symmetric fourth-order astigmatism (A4).

IPC Classes  ?

  • H01J 37/153 - Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

85.

MEASUREMENT DEVICE AND MASS SPECTROMETER

      
Application Number JP2023014169
Publication Number 2024/004311
Status In Force
Filing Date 2023-04-06
Publication Date 2024-01-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Nishimoto Takuma
  • Furuya Isao
  • Hashimoto Yuichiro
  • Sugiyama Masuyuki

Abstract

Provided are a measurement device and a mass spectrometer that allow estimating the range of an abnormal portion that is a source of noise superimposed on a detection signal. In order to achieve the above purpose, a measurement device that includes a measurement unit that measures a measurement target and outputs a measurement signal, a detector that detects the measurement signal and outputs a detection signal, an analysis processing unit that calculates and outputs analysis results from the detection signal, an analysis result indicator that indicates the analysis results, and a device control module that controls the measurement unit and outputs a control signal, comprises an anomaly detection module that detects noise in the measurement device, wherein the anomaly detection module stores drive intervals of each component of the measurement device in a memory resource, and for each component of the measurement device, determines whether noise is mixed in or not on the basis of the corresponding driving intervals stored in the memory resource and the analysis results of the analysis processing unit.

IPC Classes  ?

  • H01J 49/00 - Particle spectrometers or separator tubes
  • H01J 49/26 - Mass spectrometers or separator tubes

86.

SAMPLE LIFTING/LOWERING MECHANISM AND SAMPLE CONVEYING DEVICE

      
Application Number JP2023017478
Publication Number 2024/004385
Status In Force
Filing Date 2023-05-09
Publication Date 2024-01-04
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Miyamoto Kazuaki
  • Tamura Kazuma
  • Watanabe Hiroshi

Abstract

The purpose of the present invention is to provide a sample lifting/lowering mechanism and a sample conveying device able to transport a sample holder without tipping over the sample holder. In order to achieve said purpose, a sample lifting/lowering mechanism of the present invention comprises a sample holder carrying part for carrying the sample holder and able to rotate around a rotary shaft, and which lifts, lowers, and transports the sample holder loaded on the sample holder carrying part, wherein an operation in which the sample holder carrying part rotates around the rotary shaft is initiated after an operation in which the rotary shaft lifts or lowers is completed. Additionally, this sample conveying device comprises: a first conveying line that conveys the sample holder; a second conveying line that is disposed above or below the first conveying line and conveys the sample holder; and the sample lifting/lowering mechanism that, when the sample holder conveyed by the first conveying line has been loaded, lifts or lowers the sample holder and transports the sample holder to the second conveying line.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

87.

ELECTRON MICROSCOPE AND IMAGE CAPTURING METHOD THEREOF

      
Application Number JP2022024470
Publication Number 2023/248272
Status In Force
Filing Date 2022-06-20
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Morishita Hideo
  • Ohshima Takashi
  • Ide Tatsuro
  • Ose Yoichi
  • Takane Daichi

Abstract

The problem of an axisymmetric electron gun structure is that some of gas molecules flowing in from a relatively low-vacuum chamber reach a photoelectric film, thereby causing deterioration of an NEA surface, instability of an emission current, and shortening of the life of the photoelectric film. This electron microscope is provided with: an excitation light source, a photoelectric film formed on a transparent substrate; a condensing lens for condensing excitation light onto the photoelectric film; an anode electrode for accelerating an electron beam generated by the excitation light being condensed and projected onto the photoelectric film; a first differential pumping diaphragm having a passage hole in an off-axis location and disposed on the photoelectric film side; and a second differential pumping diaphragm having a passage hole on the optical axis and disposed on the sample side. The electron microscope is provided with a deflector for controlling the trajectory of the electron beam between the first differential pumping diaphragm and the second differential pumping diaphragm.

IPC Classes  ?

  • H01J 37/073 - Electron guns using field emission, photo emission, or secondary emission electron sources
  • H01J 37/18 - Vacuum locks

88.

CHARGED PARTICLE BEAM SYSTEM AND SAMPLE EVALUATION INFORMATION GENERATION METHOD

      
Application Number JP2022024510
Publication Number 2023/248287
Status In Force
Filing Date 2022-06-20
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hasumi Kazuhisa
  • Fukuda Muneyuki

Abstract

According to the present disclosure, in order to enable evaluation of a semiconductor on the basis of characteristics that are equivalent to transistor (Tr) characteristics and are acquired in an earlier stage during a semiconductor manufacturing process, the amount of a signal from a drain is measured, the amount corresponding to the number of irradiations (where the amount of a single irradiation is determined in advance) by a charged particle beam irradiating a gate-corresponding part of a wafer of which the internal structure includes a Tr or a structure similar to a Tr. That is, the gate is continuously irradiated with the charged particle beam in a stepwise manner to render a Tr in ON state, and then the amount of signal obtained from the drain is measured each time the drain is irradiated with the charged particle beam. Then, the relationship between the number of irradiations of the gate with the charged particle beam and the corresponding amount of signal from the drain is generated, thereby making it possible to acquire characteristics equivalent to the relationship (Tr characteristics) between a gate voltage Vg and a source-drain current Ids of the Tr during the semiconductor manufacture process (see Fig. 6).

IPC Classes  ?

  • H01L 21/66 - Testing or measuring during manufacture or treatment
  • G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path
  • H01L 21/336 - Field-effect transistors with an insulated gate
  • H01L 29/78 - Field-effect transistors with field effect produced by an insulated gate

89.

CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2022024624
Publication Number 2023/248320
Status In Force
Filing Date 2022-06-21
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tanaka Shunya
  • Tamaki Hirokazu
  • Ide Tatsuro

Abstract

In order that, according to a defocused state at the start of an AF operation, a just focus search range is adjusted and focus adjustment is completed quickly, precisely, stably, and automatically, the present invention provides a charged particle beam device and a sample observation method, wherein: a defocus amount is calculated by using a first image blur amount, which is calculated from the change amount of sharpness obtained by performing defocus processing on one photographed image, and a second image blur amount, which is calculated in accordance with photographing conditions for an observation subject by changing the magnification for the observation subject in accordance with the value of the first image blur amount; the defocus amount is used to determine a first excitation current value; and the first excitation current value is used to start an AF operation for the observation subject.

IPC Classes  ?

  • H01J 37/141 - Electromagnetic lenses
  • H01J 37/21 - Means for adjusting the focus
  • H01J 37/22 - Optical or photographic arrangements associated with the tube

90.

PLASMA TREATMENT DEVICE AND HEATING DEVICE

      
Application Number JP2022024731
Publication Number 2023/248347
Status In Force
Filing Date 2022-06-21
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tamura Hitoshi
  • Ikeda Norihiko

Abstract

In order to reduce the effects of reflected waves and enable the efficient use of circularly polarized waves in plasma treatment in a plasma treatment device that uses circularly polarized waves, the present invention provides a plasma treatment device having a microwave source that generates microwaves, a plasma treatment chamber that uses plasma generated by the microwaves to treat an object to be treated placed inside the chamber, and a waveguide part that is provided with a rectangular waveguide connected to the microwave source and a circular waveguide connected to the plasma treatment chamber, wherein a reflected wave generator for generating reflected waves that cancel out reflected waves which propagate through the circular waveguide from the plasma treatment chamber side in a state in which plasma is generated inside the plasma treatment chamber by the microwaves is provided inside the circular waveguide.

IPC Classes  ?

  • H05H 1/46 - Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

91.

INCOMPATIBILITY DETECTION DEVICE AND INCOMPATIBILITY DETECTION METHOD

      
Application Number JP2022024750
Publication Number 2023/248355
Status In Force
Filing Date 2022-06-21
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Unuma Munetoshi
  • Toyoda Yasutaka
  • Shinoda Shinichi
  • Okuda Tomoyuki
  • Motoyoshi Takahiro
  • Komatsu Sota
  • Ishikawa Masayoshi

Abstract

An incompatibility detection unit (10) comprises: an image conversion unit (12) that converts an input low-quality image (11) into a corresponding high-quality image (13) using a learning model (14); an incompatibility detection unit (15) that detects whether or not the input low-quality image (11) is incompatible with the learning model (14); an incompatibility reporting unit (16) that reports detected incompatibility; and a storage unit that stores, as a model-compatible region, the distribution of evaluation values of high-quality correct images (13B) used in the training stage of the learning model (14), in association with the learning model (14). The incompatibility detection unit (15) determines that the learning model (14) is incompatible when an evaluation value of the input low-quality image (11) is not within the model-compatible region.

IPC Classes  ?

92.

PLASMA PROCESSING APPARATUS

      
Application Number JP2022025026
Publication Number 2023/248406
Status In Force
Filing Date 2022-06-23
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hyodo Tomoaki
  • Nakatani Shintaro
  • Ichino Takamasa
  • Tanaka Yuki

Abstract

Provided are techniques for making electrodes of a heater layer (heater wires) in multiple zones safely, easily, and at low cost. This plasma processing apparatus is provided with: a processing chamber which is disposed in a vacuum container and in which a wafer to be processed is disposed and a plasma is formed; a cylindrical sample table which is disposed in the processing chamber and on the surface of which the wafer is mounted; a first heater layer which is disposed inside a dielectric membrane covering the upper surface of a disc-shaped base material of the sample table, the first heater layer having a plurality of membrane-like heaters respectively disposed in a plurality of regions each having a rectangular shape; and a plurality of temperature sensors disposed inside the base material under the rectangular regions of the first heater layer. The plurality of regions are disposed corresponding to the circuit patterns of a plurality of semiconductor devices formed on the wafer upper surface, and include four regions in which the plurality of regions are disposed with one side of each rectangular region facing one side of another adjacent rectangular region. The membrane-like heaters respectively disposed in the four regions constitute one set. The one set includes four power supply paths each electrically connected to one location of each of the membrane-like heaters to supply power from a DC power supply, and one return path which is electrically connected to another location of each of the membrane-like heaters and along which the power is fed back to the DC power supply.

IPC Classes  ?

  • H01L 21/3065 - Plasma etching; Reactive-ion etching
  • H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping

93.

SAMPLE CONDITION ASSESSING DEVICE, SAMPLE CONDITION ASSESSING METHOD, AND SAMPLE TESTING DEVICE

      
Application Number JP2023021066
Publication Number 2023/248789
Status In Force
Filing Date 2023-06-06
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hattori Hideharu
  • Kakishita Yasuki
  • Tamezane Hideto
  • Suzuki Yoichiro

Abstract

This sample condition assessing device includes a processor which executes a program for subjecting an image of a target sample container to image processing, and a memory for storing a result of the image processing. The processor executes: processing for inputting the image; processing for detecting boundary positions from the image; processing for assessing the types of regions above and below each boundary position to determine the boundary positions of each contained object; and processing to assess whether inspection of the target sample container is possible on the basis of the boundary positions of each contained object.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • G06T 7/00 - Image analysis
  • G06T 7/12 - Edge-based segmentation
  • G01N 33/48 - Biological material, e.g. blood, urine; Haemocytometers
  • G01N 21/88 - Investigating the presence of flaws, defects or contamination

94.

FIELD EMISSION ELECTRON SOURCE, METHOD OF PRODUCING SAME, AND ELECTRON BEAM DEVICE USING SAME

      
Application Number JP2022024469
Publication Number 2023/248271
Status In Force
Filing Date 2022-06-20
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kusunoki Toshiaki
  • Hashizume Tomihiro
  • Arai Noriaki
  • Fukuta Masahiro

Abstract

The present invention: improves the ratio of an emission angle current density to the total current of a field emission electron source in which a (100) plane of hexaboride single crystal or transition metal carbide single crystal is used as an electron emission surface; and improves current stability. Formed at a distal end of a tip of hexaboride single crystal or transition metal carbide single crystal of a <100> axis constituting an electron source is a top facet of a first (100) plane, surrounded by such side facets as to be constituted of at least four {n11} planes and at least four {n10} planes where n = an integer 1, 2, or 3, the total surface area of the side facets of the {n11} planes being > than the total surface area of the {n10} side facets. Furthermore formed is a microcrystal having a top facet of a second (100) plane, inside the top facet plane of the first (100) plane. Electrons are mainly emitted from the top facet of the second (100) plane.

IPC Classes  ?

  • H01J 37/073 - Electron guns using field emission, photo emission, or secondary emission electron sources
  • H01J 9/02 - Manufacture of electrodes or electrode systems
  • H01J 1/304 - Field-emissive cathodes

95.

PRIMER, DNA DETECTION METHOD, AND DNA DETECTION KIT

      
Application Number JP2022024591
Publication Number 2023/248310
Status In Force
Filing Date 2022-06-20
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Tanaka Junko

Abstract

The present invention relates to: a primer for a nucleic acid amplification reaction, in particular, an asymmetric nucleic acid amplification reaction; a DNA detection method; and a DNA detection kit. Specifically, the present invention relates to: a primer for introducing a mutation into a subject nucleic acid and amplifying the nucleic acid, the primer comprising, in the sequence thereof, a mutation for introducing a mutation in the subject nucleic acid that results in, at the temperature at which a probe and a nucleic acid amplified from the subject nucleic acid are bonded, an increased ratio of the single-strand formation bases in the probe bonding region of the nucleic acid amplified from the subject nucleic acid; and a DNA detection method and a DNA detection kit which use the primer.

IPC Classes  ?

96.

AUTOMATIC ANALYSIS DEVICE AND METHOD FOR READING INFORMATION ON AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023012511
Publication Number 2023/248565
Status In Force
Filing Date 2023-03-28
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Denawa Masahide
  • Takeda Naohiro
  • Kikuchi Satoshi
  • Noda Kazuhiro
  • Tanoue Hidetsugu

Abstract

The present invention comprises: a specimen disk 114 which holds a specimen container 102 having, attached to an outer wall thereof, a first identifier 101 for storing information regarding contained liquid; a holding region 103A which is positioned in the specimen disk 114 and in which the specimen container 102 having the first identifier 101 attached thereto is set; a region 105A in which a second identifier 104 for storing information regarding an automatic analysis device 1 is set; and a reader 106 which has a reading range 111 including the holding region 103A and the region 105A and which is fixed so as to be able to read the information stored in the first identifier 101 and the second identifier 104. With this configuration, the present invention provides an automatic analysis device and a method for reading information on the automatic analysis device with which it is possible to reduce the installation area of the device over the prior art.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

97.

CLASSIFIER GENERATION DEVICE AND IMAGE DIAGNOSIS ASSISTANCE DEVICE

      
Application Number JP2023021065
Publication Number 2023/248788
Status In Force
Filing Date 2023-06-06
Publication Date 2023-12-28
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hattori Hideharu
  • Kakishita Yasuki
  • Sakurai Toshinari
  • Maeshima Muneo
  • Obara Takayuki

Abstract

This classifier generation device updates a classifier, analyzes classification grounds, analyzes the cause of an erroneous classification, uses the analysis results to update the classifier, and achieves the creation of a classifier capable of accurately classifying an object in an image. The classifier generation device: acquires a target image; uses the classifier to extract a feature amount of the target image from the target image; uses the classifier to classify the target image from the feature amount and determine a classification value; uses the feature amount and the classification value to determine classification grounds; uses the classification grounds and a teaching image to determine an improvement spot; and updates the classifier on the basis of the improvement spot.

IPC Classes  ?

  • G06T 7/00 - Image analysis
  • G06V 10/778 - Active pattern-learning, e.g. online learning of image or video features

98.

CHARGED PARTICLE BEAM DEVICE AND METHOD FOR OUTPUTTING IMAGE DATA OF INTEREST

      
Application Number JP2022023817
Publication Number 2023/242954
Status In Force
Filing Date 2022-06-14
Publication Date 2023-12-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yamamoto Hiroyuki
  • Ohmori Takeshi
  • Tanaka Shunya
  • Sato Hirofumi

Abstract

This charged particle beam device comprises: a sample stage that moves a sample; an imaging unit that acquires observation image data of the sample; an output unit that digitizes an operating state of the charged particle beam device, and outputs time series data of the operating state; a display unit on which the observation image data is displayed, and a graphical user interface for inputting observation setting parameters is displayed; and a computer system that stores time series image data in which the observation image data is arranged in a time series, and executes an arithmetic process that is related to the time series data of the operating state and the observation image data. The charged particle beam device automatically determines, on the basis of the time series data of the operating state, a date and time that match a specific fluctuation pattern that is set in advance, acquires, from the time series image data, observation image data that corresponds to the date and time, and outputs the observation image data as image data of interest.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube

99.

NUCLEIC ACID ELUTION LIQUID AND NUCLEIC ACID ELUTION METHOD USING SAID NUCLEIC ACID ELUTION LIQUID

      
Application Number JP2022023851
Publication Number 2023/242964
Status In Force
Filing Date 2022-06-14
Publication Date 2023-12-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Fujioka Michiru
  • Akimoto Kaoru
  • Matsumoto Yuki

Abstract

The present invention improves the recovery rate of nucleic acid bonded to a nucleic acid capturing carrier, and recovers the nucleic acid at a high concentration. In the present invention, nucleic acid bonded to a nucleic acid capturing carrier is recovered by using a nucleic acid elution liquid containing: a polar solvent for dissolving the nucleic acid; and a hydrophobic solution that undergoes liquid-liquid layer separation with respect to the polar solvent.

IPC Classes  ?

  • C12Q 1/6834 - Enzymatic or biochemical coupling of nucleic acids to a solid phase
  • C12M 1/00 - Apparatus for enzymology or microbiology

100.

BUNDLING MEMBER-EQUIPPED REAGENT CONTAINER AND TESTING DEVICE

      
Application Number JP2022023992
Publication Number 2023/243006
Status In Force
Filing Date 2022-06-15
Publication Date 2023-12-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hokari, Junpei
  • Yamagata, Toshiki
  • Shibahara, Masashi

Abstract

The purpose of the present invention is to provide: a bundling member-equipped reagent container with which it is possible to manipulate a plurality of reagent containers as one and which can prevent the contamination of a reagent by not coming directly into contact with the reagent containers; and a testing device which uses said bundling member-equipped reagent container. A bundling member-equipped reagent container 1 comprises: a plurality of reagent containers 11 that are disposed in a row and so as to be in contact; and a removable band-shaped bundling member 21 that integrally surrounds the plurality of reagent containers 11. A testing device 101 can have the bundling member-equipped reagent container 1 inserted therein and comprises an accommodation rack 311 that has in the top thereof an insertion port 311a into which the bundling member-equipped reagent container 1 is inserted and that can have the bundling member-equipped reagent container 1 inserted therein such that the plurality of reagent containers 11 are all stacked in the vertical direction, wherein the accommodation rack 311 is provided with an opening 311b such that the bundling member 21 of the inserted bundling member-equipped reagent container 1 can be removed from the outside.

IPC Classes  ?

  • C12M 1/00 - Apparatus for enzymology or microbiology
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