Hitachi High-Tech Corporation

Japan

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IPC Class
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor 605
H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams 554
G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices 415
H01J 37/22 - Optical or photographic arrangements associated with the tube 311
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations 301
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09 - Scientific and electric apparatus and instruments 42
42 - Scientific, technological and industrial services, research and design 13
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1.

FLOW PATH WASHING METHOD OF AUTO SAMPLER AND FLOW PATH WASHING APPARATUS OF AUTO SAMPLER

      
Application Number 18038273
Status Pending
Filing Date 2021-12-10
First Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Harada, Yushi
  • Hashimoto, Yuichiro

Abstract

A flow path washing method and apparatus for an auto sampler in which, when a cleaning fluid supplied to a flow path which is switched between a first flow path including a nozzle for aspirating a sample and a sample loop for holding the aspirated sample, and a second flow path including a washing tub for washing at least an outer wall of the nozzle, a control unit changes a flow velocity of the cleaning fluid supplied between measurement of a first measurement item and measurement of a second measurement item based on washing information showing washing patterns corresponding to measurement items of the sample, including at least one of first washing information showing a washing pattern corresponding to the first measurement item of the sample and second washing information showing a washing pattern corresponding to the second measurement item to be measured subsequent to the first measurement item.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • B08B 9/032 - Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing

2.

Mobile Robot

      
Application Number 18272759
Status Pending
Filing Date 2021-02-18
First Publication Date 2024-03-21
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Mitsuyama, Toshifumi
  • Kanai, Yoshiki
  • Shibata, Toru
  • Okada, Yuuko
  • Takahashi, Hiroki
  • Inoue, Tomohiro

Abstract

The present invention provides a mobile robot that can simultaneously absorb an impact received from an uneven road surface while moving and estimate the position or orientation of the mobile robot while functioning. The mobile robot according to the present invention has an operation mechanism having a multi-jointed arm, and a movement mechanism that causes the operation mechanism to move, the mobile robot being characterized in that: the movement mechanism has a first support part and a second support part, which support the weight of the movement mechanism; and the second support part is installed at a position that is nearer to an outer peripheral section, in terms of the movement direction of the movement mechanism, than is the installation position of the first support part.

IPC Classes  ?

  • B60G 17/016 - Resilient suspensions having means for adjusting the spring or vibration-damper characteristics, for regulating the distance between a supporting surface and a sprung part of vehicle or for locking suspension during use to meet varying vehicular or s the regulating means comprising electric or electronic elements characterised by their responsiveness, when the vehicle is travelling, to specific motion, a specific condition, or driver input
  • B25J 5/00 - Manipulators mounted on wheels or on carriages
  • B60G 3/00 - Resilient suspensions for a single wheel

3.

AUTOMATIC ANALYZER AND AUTOMATIC ANALYSIS METHOD

      
Application Number 18259810
Status Pending
Filing Date 2021-12-13
First Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Karo, Hikaru
  • Nishigaki, Kenichi

Abstract

In an automatic analyzer, an influence due to a disturbance component on a measurement result can be appropriately prevented. An automatic analyzer 1 includes: a first light source 102 configured to emit light toward a sample 44; a drive circuit 101 configured to supply a first drive current I3 whose frequency changes from f1 to f2 intermittently or continuously to the first light source 102; a light receiver 113 configured to output a light detection signal IR based on the light transmitted through the sample 44; and a signal processing circuit 111 configured to demodulate the light detection signal IR in accordance with the frequency f1 to f2 of the first drive current I3 and output a measurement signal VL based on a demodulation result.

IPC Classes  ?

  • G01N 21/77 - Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator

4.

DEFECT INSPECTION DEVICE

      
Application Number 18272859
Status Pending
Filing Date 2021-01-29
First Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yamakawa, Hiromichi
  • Honda, Toshifumi
  • Urano, Yuta
  • Matsumoto, Shunichi
  • Yamamoto, Masaya
  • Arima, Eiji

Abstract

A defect inspection device in which an optical axis of a detection optical system is inclined with respect to a surface of a sample, and an imaging sensor is inclined with respect to the optical axis, a height variation amount of an illumination spot in a normal direction of the surface of the sample is calculated based on an output of a height measuring unit, a deviation amount of the focusing position with respect to the light receiving surface in an optical axis direction of the detection optical system is calculated based on the height variation amount of the illumination spot, the deviation amount of the focusing position being generated accompanying a height variation of the illumination spot, and the focus actuator is controlled based on the deviation amount of the focusing position, and scattered light intensities at the same coordinates of the sample are added.

IPC Classes  ?

  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
  • G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined
  • G06T 7/60 - Analysis of geometric attributes
  • G06T 7/70 - Determining position or orientation of objects or cameras

5.

SAMPLE COLLECTION CALL TIME PREDICTION SYSTEM AND METHOD

      
Application Number 18275571
Status Pending
Filing Date 2022-01-31
First Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Takahashi, Kenichi
  • Tasaka, Masatsuna

Abstract

Provided are a sample collection call time prediction system and a sample collection call time prediction method, with which it is possible to improve the accuracy of predicting the time at which a patient is called for sample collection. This call time prediction system includes a first processor that predicts, by machine learning, the time at which a patient is called for sample collection, the prediction being made on the basis of at least one of reception time information indicating the reception time for a patient from whom a sample is to be collected, sample type information indicating the type of the sample to be collected from the patient, a reception number indicating the order of reception of the patient, inpatient/outpatient classification information indicating whether the patient is an inpatient or an outpatient, and the number of waiting patients waiting to be called for sample collection at the reception time.

IPC Classes  ?

6.

SPECIMEN ANALYSIS DEVICE

      
Application Number JP2022034309
Publication Number 2024/057425
Status In Force
Filing Date 2022-09-14
Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yabuhara Tadao
  • Matsumura Jin

Abstract

The purpose of the present invention is to uniformly suppress dew condensation in each housing chamber when multiple housing chambers each house a specimen container. The specimen analysis device according to the present invention comprises two or more openings, wherein warm air is supplied from each of the openings to each housing chamber, and the volume of the air supplied from each of the openings is uniformed by a first air volume adjusting material (see FIG. 2).

IPC Classes  ?

7.

OPTICAL DEVICE

      
Application Number JP2022034453
Publication Number 2024/057455
Status In Force
Filing Date 2022-09-14
Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Anazawa Takashi

Abstract

Provided is an optical device in which a two-dimensionally distributed sample, a single condenser lens, a dichroic mirror array in which a plurality of dichroic mirrors are arranged, and an area sensor are arranged in this order along the optical axis of the condenser lens, the direction in which the plurality of dichroic mirrors are arranged is perpendicular to the optical axis, and an image of a measurement area on the sample is measured by dividing the image into a plurality of images having different wavelength components on the area sensor. The dichroic mirror array is closer to the area sensor in comparison to the condenser lens.

IPC Classes  ?

  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

8.

Automatic Analyzer

      
Application Number 18274759
Status Pending
Filing Date 2021-11-25
First Publication Date 2024-03-21
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Suenari, Tsukasa
  • Okusa, Takenori

Abstract

There is provided an automatic analyzer that stops a back-flowing waste fluid from reaching a cleaning tank when bubbles are produced in a waste fluid pipe. An automatic analyzer includes: a cleaning tank in which cleaning using a detergent is performed with analysis operation of a specimen; and a waste fluid pipe through which a waste fluid flowing from the cleaning tank is discharged. The waste fluid pipe has an upward pipe branched upward. At a tip end of the upward pipe, opening is provided. The opening is disposed blow from the cleaning tank.

IPC Classes  ?

  • B08B 9/032 - Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
  • B08B 9/08 - Cleaning of containers, e.g. tanks
  • B08B 17/04 - Preventing deposition of fouling or of dust by using removable coverings

9.

ELECTROLYTE ANALYZER

      
Application Number 18276157
Status Pending
Filing Date 2021-12-07
First Publication Date 2024-03-21
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Miyakawa, Takushi
  • Yamashita, Taichiro

Abstract

Problem Provided is an electrolyte analyzer that allows reducing a load of a user in a replacement work compared with conventional one. Problem Provided is an electrolyte analyzer that allows reducing a load of a user in a replacement work compared with conventional one. Solution An electrolyte analyzer includes an ISE electrode 1 that includes at least one electrode, a reference electrode 2 that includes at least one electrode different from the ISE electrode 1, and a housing 200 that houses the electrodes of the ISE electrode 1 and the reference electrode 2. The housing 200 includes a pressing unit that presses the electrodes to one another, a first press switching unit 210 that switches the ISE electrode 1 between a secured state and a released state, and a second press switching unit 215 that switches the reference electrode 2 between a secured state and a released state. The ISE electrode 1 and the reference electrode 2 are each switched between the secured state and the released state. Selected Drawing: FIG. 3

IPC Classes  ?

  • G01N 27/411 - Cells and probes with solid electrolytes for investigating or analysing of liquid metals
  • G01N 27/30 - Electrodes, e.g. test electrodes; Half-cells
  • G01N 27/42 - Measuring deposition or liberation of materials from an electrolyte; Coulometry, i.e. measuring coulomb-equivalent of material in an electrolyte

10.

Specimen Transportation Device

      
Application Number 18266662
Status Pending
Filing Date 2021-11-10
First Publication Date 2024-03-21
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Kobayashi, Hiroyuki
  • Kaneko, Satoru
  • Suzuki, Takahiro
  • Aoyama, Yasuaki
  • Hoshi, Ryosuke
  • Watanabe, Hiroshi
  • Azuma, Shinji

Abstract

The present invention controls liquid shaking during transportation while maintaining high-precision with respect to the stopping position of a specimen at the time of device start-up. This specimen carrying device includes a plurality of coils that transport a transportation container of a specimen, a coil drive unit, and a control unit, wherein: the control unit includes a liquid shaking determination unit that determines liquid shaking of the specimen from a velocity fluctuation of the specimen; the control unit sets, near a stopping coil 3 that is nearest to the stopping position of the specimen, a first section S1 on a side separated from the stopping coil 3 and a second section S2 on a side nearer to the stopping coil 3 than the first section S1, and sets a first current as a current that energizes the stopping coil 3 when the specimen is in the first section S1 and a second current as a current that energizes the stopping coil 3 when the specimen is in the second section S2; and the first current is set, on the basis of determination information of the liquid shaking determination unit 65, to a magnitude whereby the liquid shaking of the specimen is controlled, and the second current is set to a current value larger than that of the first current.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system

11.

PLASMA PROCESSING DEVICE

      
Application Number 17641538
Status Pending
Filing Date 2021-02-08
First Publication Date 2024-03-21
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Takasaki, Koichi
  • Iwase, Taku

Abstract

In order to execute stable processing by suppressing plasma diffusion and non-stationary discharge generation, there is provided a plasma processing device which includes a processing chamber in which a sample stage is provided for placing a sample thereon, an exhaust unit for evacuating the processing chamber, a magnetic field forming mechanism for forming a magnetic field in the processing chamber, and a power supply unit that supplies radio frequency power for generating plasma to the inside of the processing chamber evacuated by the exhaust unit and has the magnetic field formed by the magnetic field forming mechanism. The processing chamber includes a shielding section which divides an inner part of the processing chamber into a first area at a side for supplying the radio frequency power from the power supply unit and a second area at a side where the sample stage is disposed. The shielding section includes a first shielding plate disposed at the side that faces the first area, in which a first opening is formed, a second shielding plate disposed at the side that faces the second area, in which a second opening is formed at the center, and a third shielding plate disposed between the first and the second shielding plates.

IPC Classes  ?

12.

SPECIMEN ANALYSIS DEVICE

      
Application Number JP2022034311
Publication Number 2024/057426
Status In Force
Filing Date 2022-09-14
Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yabuhara Tadao
  • Matsumura Jin

Abstract

The purpose of the present invention is to precisely control the temperature in each storage chamber of a specimen analysis device in which a plurality of storage chambers store specimen containers, respectively. The specimen analysis device according to the present invention generates cold air (see fig. 2) such that the temperature at the bottom of the specimen container is lower than the temperature at a lid of the specimen container.

IPC Classes  ?

13.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023026698
Publication Number 2024/057718
Status In Force
Filing Date 2023-07-20
Publication Date 2024-03-21
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Inagaki Erika
  • Yagi Kenichi
  • Ito Kenta

Abstract

The present invention makes it possible to identify, at a glance, the presence/absence of an abnormality and a cause thereof, in relation to a sample that is transported into an automatic analysis device. This automatic analysis device comprises an analysis unit 101 that performs measurement of a sample accommodated in a sample container 105, a display unit 104 that displays the result of the measurement by the analysis unit, a transportation unit 107 that transports the sample container to the analysis unit, and a camera 108 that images the sample container being transported to the analysis unit. The automatic analysis device analyzes an image of the sample container that is captured by the camera, and causes the display unit to collectively display, in relation to the sample for which the measurement result is displayed, one or more icons that are based on the result of analyzing the image of the sample container in which the sample is accommodated.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

14.

ANALYSIS SYSTEM AND ANALYSIS METHOD

      
Application Number 18510758
Status Pending
Filing Date 2023-11-16
First Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Anazawa, Takashi

Abstract

An analysis system includes an analyzer configured to separate a sample including a plurality of components labeled with any of M kinds of fluorescent substances by chromatography and acquire first time-series data of fluorescence signals detected in N kinds (M>N) of wavelength bands in a state in which at least a part of the plurality of components is not completely separated; and a computer configured to compare the first time-series data with the second time-series data, and determine which kind of fluorescent substance of M kinds of fluorescent substances individually labels each of the plurality of components.

IPC Classes  ?

15.

OBSERVATION ASSISTANCE DEVICE

      
Application Number JP2022033400
Publication Number 2024/052986
Status In Force
Filing Date 2022-09-06
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tan Wei Chean
  • Chiba Hiroyuki
  • Mise Hiromi

Abstract

This observation assistance device for a sample comprises: an observation position display unit that displays, in association with an image display unit, the positions of a plurality of captured images in which a sample is image-captured by a charged particle beam device; a display processing unit that controls the observation position display unit; and a representative image selection processing unit that selects a representative image on the basis of the plurality of captured images. According to a change in the magnification of the image display unit, the display processing unit controls the representative image to a size that is easily visible and displays the representative image on the observation position display unit.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube

16.

DISPENSER AND ANALYSIS DEVICE

      
Application Number JP2022033595
Publication Number 2024/053025
Status In Force
Filing Date 2022-09-07
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Shibahara Masashi
  • Hara Daisuke

Abstract

A multidispenser 100 comprises: a plurality of syringes 103 which are each constituted by a plunger 101 and a housing 102; a drive motor 104 which drives at least one plunger 101; tip end parts 106 to which dispensing tips 105 are attached; and tubes 107A, 107B which connect the syringes 103 and the tip end parts 106, wherein the outer diameter 109 of each housing 102 is greater than the pitch distance 108 of the dispensing tips 105, and the plurality of syringes 103 are arranged in a plurality of rows. Thus, it is possible to increase plunger diameter as compared to the prior art, and to perform dispensation in amounts ranging from minute to large.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

17.

BATTERY MANAGEMENT DEVICE, BATTERY MANAGEMENT METHOD, AND BATTERY MANAGEMENT PROGRAM

      
Application Number JP2023012808
Publication Number 2024/053143
Status In Force
Filing Date 2023-03-29
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tsunoda Jun
  • Kouno Toru
  • Ueda Yutaka
  • Fujimoto Hiroya
  • Fujimoto Akira
  • Isozaki Eri
  • Akizuki Keito

Abstract

The purpose of the present invention is to provide technology that enables a degree of wear of a battery to be accurately estimated in a short time. A battery management device according to the present invention estimates, on the basis of temporal change of battery voltage in a rest period of the battery, a deterioration mode of the battery, selects the Eyring plot corresponding to the deterioration mode that is estimated, and diagnoses a state of the battery on the basis of the plot that is selected (see Fig. 8).

IPC Classes  ?

  • G01R 31/392 - Determining battery ageing or deterioration, e.g. state of health
  • G01R 31/367 - Software therefor, e.g. for battery testing using modelling or look-up tables
  • G01R 31/3828 - Arrangements for monitoring battery or accumulator variables, e.g. SoC using current integration
  • G01R 31/385 - Arrangements for measuring battery or accumulator variables
  • G01R 31/396 - Acquisition or processing of data for testing or for monitoring individual cells or groups of cells within a battery
  • H01M 10/48 - Accumulators combined with arrangements for measuring, testing or indicating the condition of cells, e.g. the level or density of the electrolyte
  • H02J 7/00 - Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries

18.

FILTER DEVICE, FILTER FIXING TOOL, AND FILTERING METHOD

      
Application Number JP2023016422
Publication Number 2024/053155
Status In Force
Filing Date 2023-04-26
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Ishimaru Masako
  • Fukuzono Shinichi
  • Hisamatsu Mitsuko

Abstract

The present invention enables easy fitting or removal of a filter container with a small force while keeping airtightness between the filter container and an elastic body through division of a part for achieving airtightness between the the filter container and the elastic body and a part for fixing the filter container. This filter device comprises: a funnel 10 having an inlet 11 through which a liquid sample is inputted and an outlet 12 having an opening area smaller than that of the inlet 11; a filter container 20 which has a filter 23 for capturing an object included in the liquid sample and into which a tip having the outlet 12 of the funnel 10 is inserted; a rubber plug 40 having a through-hole 41 which serves as a flow channel of the liquid sample that passed through the filter 23; and a filter fixing tool 30 that abuts against the filter container 20 to support the filter container 20, and presses the filter container 20 to the rubber plug 40.

IPC Classes  ?

  • G01N 1/40 - Concentrating samples
  • B01D 29/01 - Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups ;   Filtering elements therefor with flat filtering elements
  • G01N 1/10 - Devices for withdrawing samples in the liquid or fluent state

19.

CONTAINER STORAGE DEVICE, AUTOMATIC ANALYSIS SYSTEM, AND METHOD FOR RETRIEVING SAMPLE CONTAINER

      
Application Number JP2023026457
Publication Number 2024/053256
Status In Force
Filing Date 2023-07-19
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Joji Akira
  • Matsuda Yuki
  • Watanabe Yutaka
  • Chida Saori
  • Sasaki Shunsuke

Abstract

Provided is a container storage device 101 that is connected to an automatic analysis device via a transport path through which a rack is transported, wherein: the container storage device has a storage chamber 204 in which sample containers are stored, a container transport mechanism 208 that moves the sample containers between the storage chamber and a rack 203, and a control unit; the transport path allows transport of the rack in a direction from the container storage device toward the automatic analysis device; the rack is provided with a plurality of placement positions at which the sample containers are placed; and once a plurality of sample containers to be carried out that accommodate samples for which a measurement request was issued from the automatic analysis device can be carried out, the control unit determines a carry-out priority for the plurality of sample containers to be carried out and performs control such that sample containers to be carried out that have higher degrees of carry-out priority are mounted at container placement positions on the rack that are farther toward the transport direction of the transport path. This reduces a sample-loading-related burden on a user and improves the efficiency of measurement by the automatic analysis device.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

20.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023026697
Publication Number 2024/053263
Status In Force
Filing Date 2023-07-20
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Shirai Kotaro

Abstract

The present invention reduces the operation time of an automatic analysis device and improves the convenience of the automatic analysis device. For this purpose, this automatic analysis device is configured to be able to display, on a display device, an operation menu screen 400 that displays a hierarchically defined operation menu for the automatic analysis device, and a shortcut screen 600 in which a plurality of shortcut buttons for performing specific operations included in the operation menu are arranged. When a shortcut button for performing a predetermined operation is selected on the shortcut screen, the predetermined operation included in the operation menu screen is performed. The arrangement of the shortcut buttons in the shortcut screen is determined by the user.

IPC Classes  ?

  • G06F 3/0482 - Interaction with lists of selectable items, e.g. menus
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

21.

Light Source and Automatic Analyzer

      
Application Number 18274581
Status Pending
Filing Date 2021-11-25
First Publication Date 2024-03-14
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Arita, Shohei
  • Matsuoka, Yuya
  • Ando, Takahiro
  • Keta, Yasuhiro

Abstract

There is provided an automatic analyzer that keeps a temperature of alight emitting element of alight source constant and has high accuracy analysis performance. A light source for an automatic analyzer includes: a substrate including a light source; a temperature adjustment unit configured to adjust a temperature of the light source; a first optical element configured to emit light from the light source to an outside; and a member configured to cover the light source, in which the temperature adjustment unit, the substrate, the member, and the first optical element are arranged in this order, the optical element is assembled so as to be accommodated in the member, and the temperature adjustment unit puts the light source, the member, and the optical element under the same temperature control.

IPC Classes  ?

  • G01N 21/01 - Arrangements or apparatus for facilitating the optical investigation
  • G01N 21/31 - Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

22.

Thin Film Damage Detection Function and Charged Particle Beam Device

      
Application Number 17767813
Status Pending
Filing Date 2019-10-10
First Publication Date 2024-03-14
Owner
  • Hitachi High-Tech Corporation (Japan)
  • National Institute of advanced Industrial Science and Technology (Japan)
Inventor
  • Hatano, Michio
  • Nakamura, Mitsuhiro
  • Ogura, Toshihiko

Abstract

A risk of breakage of a sample holder can be reduced and a biochemical sample or a liquid sample can be observed easily and with a high observation throughput. A sample holder 101 holding a sample includes: a sample chamber including a first insulating thin film 110 and a second insulating thin film 111 that sandwich and hold the sample 200 in a liquid or gel form and face each other, a vacuum partition wall inside which the sample chamber holding the sample is fixed in a state in which the thin film is exposed to a surrounding atmosphere, and whose internal space is kept at a degree of vacuum at least lower than that of the sample room at the time of observation of the sample, a detection electrode 820 disposed to face the second insulating thin film in a state in which the sample chamber is fixed to the vacuum partition wall, and a signal detection unit 50 connected to the detection electrode. Before the surrounding atmosphere of the sample holder is evacuated from an atmospheric pressure to a vacuum, the charged particle beam device receives a detection signal from the signal detection unit via a connector and detects an abnormality of the sample chamber based on the detection signal.

IPC Classes  ?

  • G01N 23/2204 - Specimen supports therefor; Sample conveying means therefor
  • G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]

23.

LIGHT DETECTION DEVICE

      
Application Number JP2022033397
Publication Number 2024/052984
Status In Force
Filing Date 2022-09-06
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Imai Ryo
  • Anazawa Takashi

Abstract

00120122 of a substance inside each tube.

IPC Classes  ?

24.

DIMENSION MEASUREMENT SYSTEM, ESTIMATION SYSTEM AND DIMENSION MEASUREMENT METHOD

      
Application Number JP2022033680
Publication Number 2024/053043
Status In Force
Filing Date 2022-09-08
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Sawada, Atsushi
  • Ikeuchi, Akira

Abstract

Provided is a dimension measurement system or the like which uses a method in which a human inputs and sets some information while making it possible to reduce the manual operation time or burden for the human. This dimension measurement system involves: displaying, for a user, a screen which includes an image and a graphical user interface (GUI), designating a reference line (interface reference line) for identifying part of a region of a structure to be subjected to dimension measurement, on the basis of a manual user operation, on an image on the screen, and designating a reference point (region reference point) within said region, said point being for identifying the region of the structure to be subjected to the dimension measurement (step 3); detecting an outline or an edge of the region of the structure to be subjected to a dimension measurement in the image by using the reference line and the reference point (step 4); and measuring a dimension of the structure to be subjected to a dimension measurement in the image by using the detected outline or edge information (step 5).

IPC Classes  ?

  • G06T 1/00 - General purpose image data processing
  • G01B 21/02 - Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness

25.

ION MILLING DEVICE, SECTION MILLING PROCESSING METHOD, AND SECTION MILLING HOLDER

      
Application Number JP2022033809
Publication Number 2024/053073
Status In Force
Filing Date 2022-09-08
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Fujita Naohiro
  • Takasu Hisayuki
  • Kamoshida Hitoshi
  • Kamino Atsushi

Abstract

An ion milling device has: a sample stage (2) on which is installed a section milling holder that holds a sample (2) and a shielding plate (3); an ion gun (4) that emits a non-convergent ion beam toward the sample; and a shielding plate driving unit (8) that changes the adhesion of the sample and the shielding plate and the position of the shielding plate with respect to the sample in an edge direction along a border between the sample and the shielding plate held by the section milling holder.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/30 - Electron-beam or ion-beam tubes for localised treatment of objects

26.

ION MILLING DEVICE AND METHOD FOR PROCESSING SPECIMEN

      
Application Number JP2022033810
Publication Number 2024/053074
Status In Force
Filing Date 2022-09-08
Publication Date 2024-03-14
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Horinouchi Kento
  • Aida Shota

Abstract

This ion milling device comprises: a specimen stage (103) on which a specimen is to be placed; a specimen table (102) and a shielding-plate-fixing part (106) which are supported by the specimen stage; a shielding plate (105) fixed to the shielding-plate-fixing part; an ion source (101) which emits an unfocused ion beam toward the specimen; and a temperature regulation unit (108) which is connected to the shielding-plate-fixing part by a heat transfer cable (107) and which regulates the temperature of the shielding-plate-fixing part. The specimen is sandwiched between the shielding plate and the specimen table and held thereby, and the amount in which the specimen protrudes from the shielding plate is regulated in accordance with temperatures of the shielding-plate-fixing part which are set by the temperature regulation unit.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/30 - Electron-beam or ion-beam tubes for localised treatment of objects
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

27.

HOUSING BOX

      
Application Number 18273117
Status Pending
Filing Date 2021-11-25
First Publication Date 2024-03-07
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Shima, Yuki
  • Okusa, Takenori
  • Suenari, Tsukasa

Abstract

There is provided a housing box that prevents breakage of a rod-shaped member like a nozzle use for an automatic analyzer at the time of transportation. A housing box in which a rod-shaped member used for an automatic analyzer is housed, the housing box includes: a base provided with a housing part in a groove shape on which the rod-shaped member is placed; and a cover put on the base, wherein the housing part has a step on which a projection is caught, the projection being provided on a bottom of the rod-shaped member, the projection projecting in a radial direction, and a space between a tip end and an inner wall of the rod-shaped member.

IPC Classes  ?

  • B65D 85/38 - Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for delicate optical, measuring, calculating or control apparatus
  • B65D 1/36 - Trays or like shallow containers with moulded compartments or partitions
  • B65D 43/16 - Non-removable lids or covers hinged for upward or downward movement
  • B65D 51/26 - Closures not otherwise provided for combined with auxiliary devices for non-closing purposes with means for keeping contents in position, e.g. resilient means
  • B65D 81/05 - Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents specially adapted to protect contents from mechanical damage maintaining contents at spaced relation from package walls, or from other contents
  • B65D 85/24 - Containers, packaging elements or packages, specially adapted for particular articles or materials for incompressible or rigid rod-shaped or tubular articles for needles, nails or like elongate small articles

28.

Microscope Slide and Method for Selecting the Same

      
Application Number 17766962
Status Pending
Filing Date 2019-10-16
First Publication Date 2024-03-07
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Fujimura, Toru
  • Hashimoto, Takahito
  • Kato, Shigehiko
  • Nakazawa, Eiko
  • Ajima, Masahiko
  • Sawaguchi, Akira

Abstract

Provided is an efficient method for attaching a tissue section. In the invention, one of problems is solved by changing attachment conditions of the tissue section depending on an organ from which the tissue section is derived. A technique of achieving good adhesiveness between a microscope slide and a section by introducing unevenness on a front surface of the microscope slide using reactive ion etching as one of the attachment conditions is provided. Further, a technique of optimizing the attachment of the section using a machine learning technique or the like is provided.

IPC Classes  ?

  • G02B 21/34 - Microscope slides, e.g. mounting specimens on microscope slides
  • G01N 1/30 - Staining; Impregnating

29.

ELECTROPHORESIS DEVICE AND CAPILLARY ARRAY

      
Application Number JP2022032425
Publication Number 2024/047701
Status In Force
Filing Date 2022-08-29
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Morioka Tomonari
  • Miyata Hitoshi
  • Yamamoto Shuhei
  • Okuno Ayaka
  • Yamazaki Motohiro
  • Shibasaki Takehiko

Abstract

In order to provide an electrophoresis device in which it is possible to reduce a noise signal caused by foreign matter surrounding an excitation-light-irradiated part of a capillary array, the present invention provides an electrophoresis device comprising a capillary array in which capillaries used in electrophoresis of a sample are arranged in a planar form, an excitation light source that irradiates the capillary array with excitation light, and a fluorescence measurement unit that measures fluorescence induced from the capillary array, the electrophoresis device characterized in that the capillary array has a hermetic structure in which the surroundings of an excitation-light-irradiated part are filled with air, the excitation-light-irradiated part being the location irradiated with the excitation light.

IPC Classes  ?

30.

LIQUID ATOMIZING DEVICE AND ANALYSIS DEVICE USING SAME

      
Application Number JP2022032484
Publication Number 2024/047722
Status In Force
Filing Date 2022-08-30
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Miyasaka Tooru
  • Terui Yasushi

Abstract

A liquid atomizing device that continuously atomizes liquid samples of a plurality of types which are continuously supplied thereto, wherein different liquid samples are prevented from mixing with one another. This liquid atomizing device comprises: a liquid supply part that has a liquid passage; and an ultrasonic wave vibration unit that is positioned so as to be in contact with the liquid supply part, wherein the liquid supply part has a fine hole communicating the interior and the exterior of the liquid passage, the ultrasonic wave vibration unit is configured so as to apply vibrations to a liquid flowing through the liquid passage, and the liquid is discharged as fine droplets from the fine hole.

IPC Classes  ?

  • G01N 27/62 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electric discharges, e.g. emission of cathode

31.

PLASMA PROCESSING DEVICE, INTERNAL MEMBER OF PLASMA PROCESSING DEVICE, AND METHOD FOR MANUFACTURING INTERNAL MEMBER OF PLASMA PROCESSING DEVICE

      
Application Number JP2022032583
Publication Number 2024/047746
Status In Force
Filing Date 2022-08-30
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Ueda Kazuhiro
  • Ikenaga Kazuyuki

Abstract

In order to provide a plasma processing device with increased processing yield, an internal member thereof, or a method for manufacturing those, the present invention comprises a processing chamber which is disposed inside a vacuum chamber and in which plasma is formed and a member which is disposed inside the processing chamber and a surface of which faces the plasma. The member is configured to include, on the surface, a film composed of a material containing at least one of yttrium oxide, yttrium fluoride, and yttrium oxyfluoride and an element that becomes a +4-valent or +6-valent ion having a smaller ionic radius than that of a +3-valent yttrium ion, the material containing, on average, 1.5 times or more as much oxygen in molar ratio as yttrium and 1 times or more, preferably 1.4 times or more as much fluorine in molar ratio as yttrium.

IPC Classes  ?

32.

Sample Holder, Intermembrane Distance Adjustment Mechanism, and Charged Particle Beam Device

      
Application Number 17767595
Status Pending
Filing Date 2019-10-10
First Publication Date 2024-03-07
Owner
  • Hitachi High-Tech Corporation (Japan)
  • National Institute of Advanced Industrial Science and Technology (Japan)
Inventor
  • Hatano, Michio
  • Nakamura, Mitsuhiro
  • Ogura, Toshihiko

Abstract

A sample holder reliably holds a liquid or gel sample, and the yield of observation with a charged particle beam device is improved. A sample holder 101 includes a first member 102 that has a lid member 111 and a first chip 105 provided with a first window 123 where a laminated film including a first insulating thin film 104 is formed, and a second member 103 that has a base material 127 having a first bottom seal surface 203 and a second bottom seal surface 200, an electrode 108 disposed on the base material, and a second chip 107 provided with a second window 124 where a second insulating thin film 106 is formed and held on the second bottom seal surface via a second seal material 119 such that the second window faces the electrode, in which a region inside a first seal material is maintained airtightly from a region outside the first seal material by the first member and the second member being combined and the first seal material being crushed between the first bottom seal surface and an upper seal surface of the lid member.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

33.

CAPILLARY ELECTROPHORESIS DEVICE AND OPTICAL PERFORMANCE DIAGNOSTIC METHOD FOR SAME

      
Application Number JP2022032426
Publication Number 2024/047702
Status In Force
Filing Date 2022-08-29
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Takeuchi Shinji
  • Gomi Takashi
  • Yamazaki Motohiro
  • Shibasaki Takehiko
  • Maruoka Katsunari

Abstract

The purpose of the present invention is to provide a capillary electrophoresis device that can confirm optical performance without performing a specialized task, and an optical performance diagnostic method for the capillary electrophoresis device. In order to achieve said purpose, the present invention is a capillary electrophoresis device comprising: a capillary array formed by a plurality of capillaries; a light source that oscillates laser light; a detector that detects light emitted when the capillary array is irradiated with the laser light; and a control unit that performs prescribed processing on the basis of signals from the detector. The control unit extracts a prescribed absolute value related to an optical index on the basis of an image captured by the detector, and calculates the optical index by comparing the extracted absolute value and a predetermined reference value.

IPC Classes  ?

34.

ION SOURCE AND ANALYSIS DEVICE USING SAME

      
Application Number JP2022032487
Publication Number 2024/047723
Status In Force
Filing Date 2022-08-30
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Miyasaka Tooru
  • Terui Yasushi

Abstract

Provided is a new ion source that produces microdroplets from a liquid sample continuously supplied from a liquid chromatograph or the like, electrically charges the microdroplets, executes a series of treatments for vaporizing a solvent at a low gas flow rate, and introduces ions of a solute component contained in the liquid sample into an analysis block. This ion source is for supplying, to an analysis block for analyzing a liquid sample containing a solute component, ions of the solute component, the ion source comprising: a droplet production unit that produces droplets of the liquid sample; a heated and pressure-adjusted gas supply block that heats a carrier gas that flows therein from the droplet production unit together with the droplets; and an electrically charging unit that electrically charges the solute component and ionizes the same. The heated and pressure-adjusted gas supply block includes: a sample transport tube path that is arranged between the analysis block and the droplet production unit; a heated and pressure-adjusted gas reservoir unit that is configured to be in contact with the sample transport tube path so that heat can be transferred therebetween; a gas-heating unit that heats a prescribed gas to a prescribed temperature; and a pressure-adjusting unit that maintains the pressure of the prescribed gas in a prescribed range. The droplets and the carrier gas are heated by the heated prescribed gas. The droplets and the carrier gas are supplied from the droplet production unit to the sample transport tube path. The heated prescribed gas is introduced from the heated and pressure-adjusted gas reservoir unit into the sample transport tube path.

IPC Classes  ?

  • H01J 49/04 - Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components

35.

ELECTRIC VEHICLE CHARGING MANAGEMENT DEVICE, ELECTRIC VEHICLE CHARGING MANAGEMENT METHOD, AND PROGRAM

      
Application Number JP2022032633
Publication Number 2024/047762
Status In Force
Filing Date 2022-08-30
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hosoda Junko
  • Nagahara Satoshi
  • Dong Hang
  • Kurita Norio
  • He Qian

Abstract

The present invention suppresses concentrated charging for a plurality of electric vehicles (EVs) to achieve even charging. The present invention provides an electric vehicle charging management device 10 that manages the charging of a plurality of EVs 40 and comprises a charging time slot information creation unit 121 that uses delivery course information 1001 and vehicle information 1003 to create charging time slot information 1007 indicating a schedule for charging each of the plurality of EVs 40, a used power amount calculation unit 122 that calculates used-power-amount-by-time-slot information 1008 indicating a used power amount including an executed charging amount in each of a plurality of time slots, and a charging time slot information changing unit 123 that changes the charging time slot information 1007 by changing the charging of a change target electric vehicle EV in a maximum time slot which is among the plurality of time slots and has the highest used power amount among used power amounts.

IPC Classes  ?

36.

CAPACITY DETERIORATION ESTIMATION DEVICE

      
Application Number JP2023023085
Publication Number 2024/048033
Status In Force
Filing Date 2023-06-22
Publication Date 2024-03-07
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yonemoto Masahiro
  • Inoue Takeshi
  • Honkura Kohei
  • Hirasawa Shigeki
  • Konishi Hiroaki
  • Mochizuki Masahito
  • Sumikawa Yosuke
  • Horikoshi Nobuya

Abstract

AA) on the basis of first to fourth relational expressions at the start of charging.

IPC Classes  ?

  • G01R 31/392 - Determining battery ageing or deterioration, e.g. state of health
  • G01R 31/382 - Arrangements for monitoring battery or accumulator variables, e.g. SoC
  • G01R 31/385 - Arrangements for measuring battery or accumulator variables
  • G01R 31/389 - Measuring internal impedance, internal conductance or related variables
  • H01M 10/48 - Accumulators combined with arrangements for measuring, testing or indicating the condition of cells, e.g. the level or density of the electrolyte
  • H02J 7/00 - Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries

37.

EVAPORATION CONCENTRATION MECHANISM AND METHOD FOR CONTROLLING SAME

      
Application Number 18272150
Status Pending
Filing Date 2022-01-06
First Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Ito, Mayuko
  • Matsuoka, Shinya

Abstract

An evaporation concentration mechanism is realized that can control a depressurization rate by an inexpensive and simple mechanism to inhibit bumping at the time of evaporation and concentration. The evaporation concentration mechanism includes a reaction vessel that holds a sample solution, a depressurization channel connected to the reaction vessel, and a depressurization source that is connected to the reaction vessel via the depressurization channel and depressurizes the inside of the reaction vessel. The evaporation concentration mechanism further includes at least one of solenoid valves provided in the depressurization channel, and a control unit 8 that controls an operation of the solenoid valves. The control unit 8 intermittently opens and closes the solenoid valves during a depressurization period in which the inside of the reaction vessel is depressurized by the depressurization source.

IPC Classes  ?

38.

Sample Conveyance System and Sample Conveyance Method

      
Application Number 18272323
Status Pending
Filing Date 2021-10-13
First Publication Date 2024-02-29
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Tamakoshi, Takeshi
  • Yano, Shigeru
  • Azuma, Shinji
  • Shiga, Yuichiro
  • Shishido, Daigo

Abstract

There are provided a sample conveyance system and a sample conveyance method capable of conveying a sample in a more stable manner than in the related art corresponding to a conveyance method using an electromagnetic actuator. A driving unit 208 applies a first voltage to a first coil 207a located on a front side in a traveling direction of a holder 202, which is selected to attract or repel the holder 202, to excite the first coil 207a and applies a second voltage having a polarity opposite to a polarity of the first voltage to at least one or more of second coils 207b among coils 207 adjacent to the first coil 207a except for the coils 207 in the front side in the traveling direction to excite the second coil 207b, and a control unit 210A estimates a position of the holder 202 based on a value of a current flowing through a winding 206 of the first coil 207a.

IPC Classes  ?

  • B65G 54/02 - Non-mechanical conveyors not otherwise provided for electrostatic, electric, or magnetic
  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system

39.

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFACTURING DEVICE

      
Application Number JP2022031666
Publication Number 2024/042597
Status In Force
Filing Date 2022-08-23
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Yamaguchi, Yoshihide

Abstract

The purpose of the present invention is to provide semiconductor device manufacturing method and a semiconductor manufacturing device that, without requiring a complex gas supply system, can ensure processing efficiency and suppress contamination by foreign bodies. A representative example of this semiconductor device manufacturing method comprises: a step in which the quantity of fabrication residue of a film subjected to processing that has been formed on a semiconductor wafer is compared with a threshold value; a step in which the semiconductor wafer is heated while an organic gas that includes a substance having, in a molecule thereof, at least two substituents having a lone electron pair is supplied, to form a compound of the film subjected to processing and the organic gas; and a step in which, on the basis of the result of the comparison, after the step in which the compound is formed, the wafer is further heated, raising the temperature thereof to a prescribed temperature, to detach the compound from the surface of the semiconductor wafer.

IPC Classes  ?

40.

AUTOMATIC ANALYSIS DEVICE AND CONTROL METHOD FOR SAME

      
Application Number JP2023019594
Publication Number 2024/042801
Status In Force
Filing Date 2023-05-26
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Akimoto Maki
  • Mishima Hiroyuki
  • Suzuki Naoto
  • Ito Masayuki

Abstract

The purpose of the present invention is to provide an automatic analysis device that makes it possible to more accurately find the time required for a pre-operation from the reception of an analysis instruction to the start of analysis. This automatic analysis device comprises: an analysis module that analyzes a sample; a control unit that controls the analysis module; and a display unit that displays a state of the analysis module, the automatic analysis device being characterized in that the control unit calculates the remaining time until a pre-operation ends, on the basis of the time required for an operation confirmation of each type of mechanism of the analysis module, and causes the display unit to display the remaining time.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

41.

AUTOMATIC ANALYSIS DEVICE AND AUTOMATIC ANALYSIS SYSTEM

      
Application Number 18271491
Status Pending
Filing Date 2021-12-08
First Publication Date 2024-02-29
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Koizumi, Nobuhiro
  • Kawasaki, Kenji
  • Nakajima, Aika
  • Seki, Yoshihiro

Abstract

Provided is an automatic analysis device in which safety is ensured, and operability is improved. The automatic analysis device includes: an operation unit that receives voice input from a microphone or a mobile device; and a measurement unit that analyzes a sample. The operation unit has: an equipment state acquisition unit that acquires equipment state data for the measurement unit; a voice detection/recognition unit that acquires voice data and converts the voice data into voice instruction text; and a unit for determining device operability that, in cases in which the voice instruction text includes operation instructions for the measurement unit, determines the executability of the operation instructions included in the voice instruction text, on the basis of the equipment state data for the measurement unit acquired by the equipment state acquisition unit, and on the basis of the accuracy of the voice instruction text.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G10L 15/22 - Procedures used during a speech recognition process, e.g. man-machine dialog

42.

AUTOMATIC ANALYZER

      
Application Number 18271494
Status Pending
Filing Date 2021-11-25
First Publication Date 2024-02-29
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Tsujikawa, Masaki
  • Tanaka, Yoshiyuki

Abstract

To provide an automatic analyzer with no need to control a residual amount of a quality control sample. An automatic analyzer includes an input unit which receives a container including a specimen and a quality control sample, an ID reader which reads ID attached to the container, a control unit which assigns measurement items to the ID and controls each unit, and an analysis unit which dispenses the specimen and the quality control sample from the container and performs analysis based on the measurement items, in which when a liquid amount of a first container including the quality control sample is not enough, the control unit assigns measurement items not yet performed, of measurement items assigned to ID of the first container, to ID of a second container including the quality control sample and controls the analysis unit to perform analysis.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

43.

COMPUTER SYSTEM, DIMENSION MEASUREMENT METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM

      
Application Number JP2022032199
Publication Number 2024/042702
Status In Force
Filing Date 2022-08-26
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Okuyama Yutaka
  • Ohmori Takeshi

Abstract

Provided is a computer system that provides a function for extracting, from image data, coordinate information of base points for measuring dimensions of a desired portion of a pattern of the image data, and measuring the dimensions using the coordinate information of the base points, the computer system comprising a preprocessing unit that, even when a learning data set to be used for a learning machine contains both samples for which all base point coordinates are provided and samples for which only some of base point coordinates are provided, allows the learning machine to learn all the samples together by setting, for each of the samples for which only some of the base point coordinate values are provided, a missing base point as a missing measurement portion in annotation data, and by masking the missing measurement portion in the image data. The preprocessing unit includes the learning machine in which a posture estimation model is implemented that outputs the coordinate information of at least two of the base points as learning results. The leaning machine is pre-trained using learning data containing the image data as an input and the coordinate information of the at least two base points as an output. The preprocessing unit extracts the dimensions and the coordinate information of the at least two base points with respect to new image data inputted to the learning machine.

IPC Classes  ?

  • G01B 15/00 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
  • G01B 11/03 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness by measuring coordinates of points

44.

BATTERY MANAGEMENT DEVICE AND BATTERY MANAGEMENT METHOD

      
Application Number JP2023011628
Publication Number 2024/042758
Status In Force
Filing Date 2023-03-23
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kouno Toru
  • Tsunoda Jun
  • Ueda Yutaka
  • Fujimoto Akira
  • Fujimoto Hiroya
  • Isozaki Eri
  • Akizuki Keito

Abstract

The purpose of the present invention is to provide a technology capable of diagnosing the deterioration speed of a battery in a short time. A battery management device according to the present invention specifies a first period during an idle period and a second period after the first period, and estimates the deterioration speed of a battery dependent on the battery temperature, on the basis of a ratio between a first change portion of a voltage during the first period and a second change portion of the voltage during the second period (see fig. 5).

IPC Classes  ?

  • G01R 31/392 - Determining battery ageing or deterioration, e.g. state of health
  • G01R 31/382 - Arrangements for monitoring battery or accumulator variables, e.g. SoC
  • G01R 31/385 - Arrangements for measuring battery or accumulator variables
  • H01M 10/48 - Accumulators combined with arrangements for measuring, testing or indicating the condition of cells, e.g. the level or density of the electrolyte
  • H02J 7/00 - Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries

45.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023020605
Publication Number 2024/042808
Status In Force
Filing Date 2023-06-02
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Funakoshi Sunao
  • Okusa Takenori
  • Isoshima Nobuyuki
  • Yokoyama Koki

Abstract

This automatic analysis device comprises an analysis unit that analyzes a specimen and a treatment unit that pre-treats the specimen before the analysis, wherein the treatment unit is provided with a temperature adjustment unit that heats or cools the air in the treatment unit, the temperature adjustment unit includes a first reagent temperature adjustment unit and a second reagent temperature adjustment unit, the first reagent temperature adjustment unit is configured to heat or cool a first reagent through contact heat transfer, the second reagent temperature adjustment unit is configured to heat or cool a second reagent through contact heat transfer or forced convection heat transfer, and the first reagent temperature adjustment unit is configured to have a heat exchange rate greater than that of the second reagent temperature adjustment unit. Thus, a plurality of reagents can be adjusted to appropriate temperatures irrespective of the ambient temperature around the automatic analysis device.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

46.

ION GUIDE, AND MASS SPECTROMETRY DEVICE PROVIDED WITH SAME

      
Application Number JP2023025965
Publication Number 2024/042908
Status In Force
Filing Date 2023-07-13
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Sugiyama Masuyuki
  • Hasegawa Hideki
  • Hashimoto Yuichiro

Abstract

In order to achieve an ion guide wherein the m/z range of ions that can pass through the ion guide is large, and the structure is simple and resistant to contamination, the present application proposes (see fig. 2A) an ion guide that has ions introduced thereinto, causes said ions to converge, and emits the result, said ion guide having a multipole electrode for forming a multipolar electric field, and an axial electric field electrode for forming an axial electric field, wherein the cross-sectional area, perpendicular to the center axis of the ion guide, of at least one of the multipole electrode and the axial electric field electrode varies from an inlet of the ion guide to an outlet of the same.

IPC Classes  ?

  • H01J 49/06 - Electron- or ion-optical arrangements

47.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023027259
Publication Number 2024/042966
Status In Force
Filing Date 2023-07-25
Publication Date 2024-02-29
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Shiota Yohei
  • Kon Misaki
  • Yokoyama Koki

Abstract

An automatic analysis device 1 has, in a duct 140 provided in the automatic analysis device 1, a guiding part for guiding air flowing in at prescribed angles with respect to heat sinks 120 due to a change in the flowing direction of the air from a suction port 130 in between the heat sinks 120 to flow toward the sides closest to Peltier elements 110 in the heat sinks 120. Accordingly, an automatic analysis device that comprises a reagent storage capable of improving cooling efficiency compared with conventional products is provided.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

48.

NANOSLYNX

      
Serial Number 98422625
Status Pending
Filing Date 2024-02-27
Owner Hitachi High-Tech Corporation (Japan)
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable computer software programs for analyzing data of electron microscopes, scanning electron microscopes, transmission electron microscopes, semiconductor process equipment, semiconductor inspection and metrology equipment; Computer peripheral apparatus; Electron microscopes; Scanning electron microscopes; Transmission electron microscopes Computer rental; Providing on-line non-downloadable computer software for analyzing data of electron microscopes, scanning electron microscopes, transmission electron microscopes, semiconductor process equipment, semiconductor inspection and metrology equipment; Providing virtual computer systems through cloud computing; Software as a service (SAAS) services featuring software for analyzing data of electron microscopes, scanning electron microscopes, transmission electron microscopes, semiconductor process equipment, semiconductor inspection and metrology equipment; Server hosting; Platform as a service (PAAS) featuring computer software platforms for analyzing data of electron microscopes, scanning electron microscopes, transmission electron microscopes, semiconductor process equipment, semiconductor inspection and metrology equipment; Analysis of technical data obtained from electron microscopes, scanning electron microscopes, transmission electron microscopes, semiconductor process equipment, semiconductor inspection and metrology equipment; Off-site data backup; Monitoring of computer system operation by remote access; Maintenance of computer software; Design, development and implementation of software; updating of computer software; Consultancy in the design and development of computer hardware; Material testing; Quality control for others; Mechanical research; Testing the functionality of machines; Calibration [measuring]; Research in the field of artificial intelligence technology; Technology consultation in the field of artificial intelligence

49.

NSTREAM

      
Serial Number 98422632
Status Pending
Filing Date 2024-02-27
Owner Hitachi High-Tech Corporation (Japan)
NICE Classes  ?
  • 09 - Scientific and electric apparatus and instruments
  • 42 - Scientific, technological and industrial services, research and design

Goods & Services

Downloadable computer software programs for analyzing data of electron microscopes, scanning electron microscopes, transmission electron microscopes, semiconductor process equipment, semiconductor inspection and metrology equipment; Computer peripheral apparatus; Electron microscopes; Scanning electron microscopes; Transmission electron microscopes Computer rental; Providing on-line non-downloadable computer software for analyzing data of electron microscopes, scanning electron microscopes, transmission electron microscopes, semiconductor process equipment, semiconductor inspection and metrology equipment; Providing virtual computer systems through cloud computing; Software as a service (SAAS) services featuring software for analyzing data of electron microscopes, scanning electron microscopes, transmission electron microscopes, semiconductor process equipment, semiconductor inspection and metrology equipment; Server hosting; Platform as a service (PAAS) featuring computer software platforms for analyzing data of electron microscopes, scanning electron microscopes, transmission electron microscopes, semiconductor process equipment, semiconductor inspection and metrology equipment; Analysis of technical data obtained from electron microscopes, scanning electron microscopes, transmission electron microscopes, semiconductor process equipment, semiconductor inspection and metrology equipment; Off-site data backup; Monitoring of computer system operation by remote access; Maintenance of computer software; Design, development and implementation of software; updating of computer software; Consultancy in the design and development of computer hardware; Material testing; Quality control for others; Mechanical research; Testing the functionality of machines; Calibration [measuring]; Research in the field of artificial intelligence technology; Technology consultation in the field of artificial intelligence

50.

SEPARATION COLUMN CONNECTION DEVICE AND SEPARATION DEVICE

      
Application Number 18265787
Status Pending
Filing Date 2021-11-26
First Publication Date 2024-02-22
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yamashita, Taichiro
  • Tomida, Shoji
  • Shimizu, Yusuke
  • Iijima, Yu
  • Masuda, Ai
  • Furukawa, Daichi

Abstract

A technique for replacing a separation column includes: a driving device supporting a first pipe along a first direction; a fixing member that fixes a second pipe to be opposed to the first pipe along the first direction; a column case between the first pipe and the second pipe, having a first and second holes communicating with the first and second pipes, respectively; and an interlocking mechanism that moves the column case in the first direction in conjunction with movement of the first pipe. The column case allows a column cartridge retaining a separation column to be connected and disconnected. The driving device moves the first pipe and the interlocking mechanism such that two states are reversibly taken; a closed state in which the separation column is between the first and second pipes and an open state in which the first and second pipes are positioned outside the column case.

IPC Classes  ?

51.

MASS SPECTROMETRY DEVICE AND METHOD FOR CONTROLLING SAME

      
Application Number 18270878
Status Pending
Filing Date 2022-01-17
First Publication Date 2024-02-22
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Sugawara, Yuka
  • Hashimoto, Yuichiro
  • Yasuda, Hiroyuki
  • Sugiyama, Masuyuki
  • Tamura, Riku

Abstract

A mass spectrometry device can reduce a deviation in a mass axis due to the generation of heat from an AC voltage control circuit; and a method for controlling the mass spectrometry device. The mass spectrometry device has a quadrupole electrode, to which a controlled AC voltage is applied, and uses the quadrupole electrode as a mass filter. Before measurement, the mass spectrometry device applies an AC voltage of a prescribed amplitude V1 to the multipole electrode for a prescribed time T1, and a heating value J1 that is generated when the AC voltage of the prescribed amplitude V1 is applied to the multipole electrode for the prescribed time T1 is equivalent to a heating value that is generated when the AC voltage of the amplitude that is applied during the measurement is applied until a thermally steady state is reached (see FIG. 3A).

IPC Classes  ?

  • H01J 49/02 - Particle spectrometers or separator tubes - Details
  • H01J 49/42 - Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons

52.

SPECTROSCOPIC MEASUREMENT DEVICE

      
Application Number 18270880
Status Pending
Filing Date 2021-11-02
First Publication Date 2024-02-22
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Watanabe, Masahiro
  • Zhang, Kaifeng
  • Baba, Shuichi
  • Hirose, Takenori

Abstract

Provided is a spectroscopic measurement device capable of improving detection sensitivity to a change in a physical property value such as expansion of a sample to which energy is applied by an infrared ray or the like. The spectroscopic measurement device includes: a stage on which a sample is to be placed; an energy source configured to generate an energy beam to be emitted to a predetermined region of the sample; an electromagnetic wave source configured to generate an electromagnetic wave to be emitted to the sample; an objective lens configured to focus the electromagnetic wave in the predetermined region; two confocal detectors configured to detect the electromagnetic wave reflected by the sample; and a calculation unit configured to calculate, based on each of outputs of the confocal detectors, a change in a physical property value of the sample when the energy beam is emitted to the predetermined region.

IPC Classes  ?

  • G01N 21/35 - Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
  • G02B 21/06 - Means for illuminating specimen
  • G02B 21/26 - Stages; Adjusting means therefor

53.

ELECTROLYTE ANALYSIS DEVICE AND METHOD FOR IDENTIFYING ABNORMALITY IN SAME

      
Application Number 18271506
Status Pending
Filing Date 2021-10-12
First Publication Date 2024-02-22
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Iwasawa, Airi
  • Ushiku, Emiko
  • Furuya, Miki

Abstract

Provided are an electrolyte analysis device and a method for identifying an abnormality in the same that make it possible to detect an abnormality in an ion-selective electrode at an early stage. The electrolyte analysis device comprises an ion-selective electrode that generates a sample potential that is a potential corresponding to the ion concentration of a sample, a reference electrode that generates a reference potential that is a potential to serve as a reference, and a concentration calculation unit that calculates the ion concentration on the basis of the potential difference between the sample potential and the reference potential. The electrolyte analysis device is characterized by additionally comprising an abnormality determination unit for determining whether there is an abnormality on the basis of an evaluation value that has been calculated using a detergent potential that is a potential generated by the ion-selective electrode when a detergent was supplied.

IPC Classes  ?

54.

ANALYZER COLUMN CARTRIDGE

      
Application Number 18261299
Status Pending
Filing Date 2021-12-07
First Publication Date 2024-02-22
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Shimizu, Yusuke
  • Watanabe, Yoshito
  • Iijima, Yu
  • Yamamura, Shuhei
  • Hashimoto, Yuichiro

Abstract

Provided is an analyzer column cartridge that can control the temperature of an analysis column while saving resources and costs. An analyzer column cartridge 1 includes: metal blocks 7, 8 that accommodate an analysis column 10 used in a liquid chromatography; and housings 2, 3 that accommodate the metal blocks 7, 8. A plurality of holes 11A, 11B, 11C, 11D, and 11E that communicate with an accommodation space of the analysis column 10 are formed in the metal block 8. The housing has a plurality of windows 6A, 6B, 6C, 6D, and 6E formed at positions facing the plurality of holes 11A, 11B, 11C, 11D, and 11E formed in the metal block 8.

IPC Classes  ?

  • G01N 30/60 - Construction of the column
  • G01N 30/54 - Temperature
  • B01D 15/16 - Selective adsorption, e.g. chromatography characterised by constructional or operational features relating to the conditioning of the fluid carrier

55.

Charged Particle Beam Device

      
Application Number 18270937
Status Pending
Filing Date 2021-03-01
First Publication Date 2024-02-22
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Terao, Naho
  • Yokosuka, Toshiyuki
  • Kotsuji, Hideyuki
  • Nakano, Tomohito
  • Kawano, Hajime

Abstract

The purpose of the present invention is to provide a charged particle beam device that can specify irradiation conditions for primary charged particles that can obtain a desired charged state without adjusting the acceleration voltage. The charged particle beam device according to the present invention specifies the irradiation conditions for a charged particle beam in which the charged state of a sample is switched between a positive charge and a negative charge, and adjusts the irradiation conditions according to the relationship between the specified irradiation conditions and the irradiation conditions when an observation image of the sample has been acquired (see FIG. 8).

IPC Classes  ?

  • H01J 37/02 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - Details
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/244 - Detectors; Associated components or circuits therefor
  • H01J 37/22 - Optical or photographic arrangements associated with the tube

56.

DISPENSING DEVICE, AND GENETIC TEST DEVICE PROVIDED WITH SAME

      
Application Number JP2022031443
Publication Number 2024/038603
Status In Force
Filing Date 2022-08-19
Publication Date 2024-02-22
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Sato Koma
  • Satoh Wataru
  • Isoshima Nobuyuki
  • Shibahara Masashi
  • Makino Yoko
  • Kumazaki Nobutaka

Abstract

In order to reduce the risk of cross-contamination from occurring when integrating reaction cartridges comprising a plurality of lanes, without providing partition walls that define lanes or air intake ports on the cartridges, this dispensing device comprises: a plurality of dispensers; a dispensing device body to which the plurality of dispensers can be fitted and which can move along the direction of lanes of a solution plate in which a plurality of containers for containing a sample or specimen are integrally formed along a plurality of lanes; a top plate for testing on which the dispensing device body and the solution plate are placed; and a device cover that covers, in combination with the top plate for testing, the dispensing device body. The dispenser device body has formed therein a plurality of ribs separating and covering the space above each of a plurality of lanes of a container plate.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 1/00 - Sampling; Preparing specimens for investigation

57.

Sample rack

      
Application Number 29828132
Grant Number D1015577
Status In Force
Filing Date 2022-02-24
First Publication Date 2024-02-20
Grant Date 2024-02-20
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Fukushi, Yudai
  • Keta, Yasuhiro
  • Takada, Eiichiro
  • Matsudaira, Fuka
  • Masuda, Ai

58.

ION SOURCE, MASS SPECTROMETER, AND CAPILLARY INSERTION METHOD

      
Application Number 18257941
Status Pending
Filing Date 2021-10-25
First Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hasegawa, Hideki
  • Sugiyama, Masuyuki

Abstract

Provided is a technique for realizing high analysis reproducibility. An ion source of the present disclosure includes a capillary and a gas spray tube into which the capillary is inserted, the gas spray tube spraying a gas to an outer side of the capillary, and the gas spray tube having a deflection site, which deflects a downstream end of the capillary with respect to a central axis of a tip hole of the gas spray tube, on an upstream side of the tip hole of the gas spray tube.

IPC Classes  ?

  • H01J 49/16 - Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission

59.

CALIBRATION SAMPLE, MANUFACTURING METHOD FOR CALIBRATION SAMPLE, AND CALIBRATION METHOD FOR AUTOFOCUS TARGET POSITION

      
Application Number 18260813
Status Pending
Filing Date 2021-01-27
First Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Masuya, Akira

Abstract

Provided is a calibration sample that can be used for three-dimensional structures and is unlikely to change over time. To this end, the calibration sample is a calibration sample for an autofocus target position in an optical microscope, and comprises a light-transmissive resin sample container that accommodates a first layer, which is disposed on a bottom side along the optical axis direction of the optical microscope and in which a target object having contrast with respect to a light-transmitting first resin is disposed inside the light-transmitting first resin, and a second layer which is disposed so as to cover the first layer and is composed of a light-transmitting second resin.

IPC Classes  ?

  • G02B 7/28 - Systems for automatic generation of focusing signals
  • G02B 21/24 - Base structure
  • G06T 7/80 - Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
  • H04N 23/67 - Focus control based on electronic image sensor signals

60.

CAPILLARY-ARRAY-ELECTROPHORESIS DEVICE

      
Application Number 18267242
Status Pending
Filing Date 2020-12-18
First Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Anazawa, Takashi
  • Inaba, Ryoji
  • Yamamoto, Shuhei

Abstract

When arraying laser-irradiation portions of a plurality of capillaries on the same array plane, simultaneous irradiation of the capillaries with a laser beam incident from the side is enabled by filling the capillaries with a separation medium having a low refractive index of n3<1.36 and by setting n1=1.00, n2=1.46, R/r<5.9, and ΔZ≤9 μm, wherein a distance in a direction perpendicular to the array plane between two capillaries, which are farthest from each other in the perpendicular direction among the capillaries in the laser-irradiation portions, is denoted by 2×ΔZ, wherein an outer radius, an inner radius, a refractive index of an external medium, a refractive index of a material, and a refractive index of an internal medium of each of the capillaries in the laser-irradiation portions are denoted by R, r, n1, n2, and n3, respectively.

IPC Classes  ?

  • G02F 1/167 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect by electrophoresis
  • G02F 1/1677 - Structural association of cells with optical devices, e.g. reflectors or illuminating devices

61.

Aseptic Sampling Apparatus and Aseptic Sampling Method

      
Application Number 18267523
Status Pending
Filing Date 2021-01-26
First Publication Date 2024-02-15
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Nanba, Masaru
  • Shibuya, Keisuke
  • Oka, Kenichiro

Abstract

The aseptic sampling apparatus according to the present invention includes: a sampling channel for pulling out a culture solution in a culture tank to supply the same to an analytical unit; and a pressure-applying unit for applying a pressure to the inside of the sampling channel. The pressure-applying unit controls the flow pressure or fluid flow rate of a fluid in the sampling channel such that a pressure gradient toward the outlet-side open end nozzle of the sampling channel is not less than 1 kPa/m.

IPC Classes  ?

  • C12M 1/26 - Inoculator or sampler
  • C12M 1/34 - Measuring or testing with condition measuring or sensing means, e.g. colony counters

62.

GAS SUPPLY APPARATUS, VACUUM PROCESSING APPARATUS, AND GAS SUPPLY METHOD

      
Application Number 17762821
Status Pending
Filing Date 2021-02-08
First Publication Date 2024-02-15
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Ogawa, Yoshifumi
  • Kouzuma, Yutaka
  • Akinaga, Keisuke
  • Hirozane, Kazuyuki
  • Sonoda, Yasushi

Abstract

There is provided a gas supply apparatus that can effectively suppress a trouble caused by backflow of a process gas to the upstream side when processing is performed by using the process gas inside a chamber. The gas supply apparatus supplies gas to a processing chamber in which a sample is processed. The gas supply apparatus includes: ports respectively connected to gas sources of a plurality of types of gases containing a purging gas and a processing gas; and a collective pipe in which the plurality of types of gases supplied from the ports are joined and flowed. A gas flow path through which gas supplied from the port connected to the gas source for the purging gas flows is formed on an uppermost stream side of the collective pipe.

IPC Classes  ?

  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

63.

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

      
Application Number 17763320
Status Pending
Filing Date 2021-03-25
First Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tanaka, Yuki
  • Ichino, Takamasa
  • Nakatani, Shintarou
  • Eijima, Ryusuke

Abstract

A plasma processing apparatus having an improved yield includes a metal base member having a disk shape or a cylindrical shape arranged inside a sample table; a refrigerant flow path arranged multiple times in a concentrical shape around a center of the base member; at least one temperature sensor; and a controller configured to detect a temperature of the base member or the wafer using the temperature sensor. The controller is configured to detect the temperature of the base member or the wafer based on one of a plurality of linear functions indicating a relation between an error and a set temperature of the refrigerant, and the linear functions are different corresponding to regions of a plurality of continuous temperature ranges within an adjustable temperature range of the refrigerant, and the plurality of linear functions include the same coefficient and have a point where the error is 0.

IPC Classes  ?

  • H01J 37/32 - Gas-filled discharge tubes
  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

64.

TEMPERATURE CONTROL DEVICE AND BIOCHEMICAL DEVICE, ANALYSIS DEVICE, AND GENETIC TESTING DEVICE COMPRISING SAME

      
Application Number JP2022030360
Publication Number 2024/033994
Status In Force
Filing Date 2022-08-09
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Satoh Wataru
  • Sato Koma
  • Shibahara Masashi
  • Makino Yoko
  • Kumazaki Nobutaka
  • Isoshima Nobuyuki

Abstract

Provided is a temperature control device comprising a housing, a partition plate that partitions the housing into an upper portion and a lower portion, a temperature control unit, and an exhaust fan, wherein the temperature control unit includes a temperature adjustment unit and a multiwell plate, the multiwell plate is disposed above the partition plate, the temperature adjustment unit is disposed below the partition plate, an air intake port that introduces outside air is provided at a predetermined position located above the partition plate on the side portion of the housing, an exhaust port is provided in the partition plate, an exhaust fan is disposed so as to discharge air from an exhaust path located below the partition plate to the outside of the housing, and the multiwell plate is disposed between the air intake port and the exhaust port and configured so that air flows from the air intake port into the housing, passes above the multiwell plate, and flows from the exhaust port into the exhaust path. Variations in the amount of evaporation of solutions held in each of the plurality of wells provided in the multiwell plate can be decreased in this way.

IPC Classes  ?

  • C12M 1/00 - Apparatus for enzymology or microbiology

65.

PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE AND PLASMA PROCESSING METHOD

      
Application Number JP2022030488
Publication Number 2024/034023
Status In Force
Filing Date 2022-08-09
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Miura Makoto
  • Sato Kiyohiko
  • Kawamura Kohei
  • Sakai Satoshi

Abstract

In relation to production steps for a device having a structure in which a gate is insulated and separated from a Si substrate in a three-dimensional structure of a GAA-type FET or the like having a laminated channel in which fine line-shaped or sheet-shaped channels are vertically laminated in the substrate, the present invention provides a method that does not complicate the production steps without changing a SiGe sacrificial layer for forming the laminated channel and the Ge compositional makeup in the SiGe sacrificial layer required for insulating and separating the gate and the substrate. In order to achieve the above, after etching of a laminated film formed of a Si channel 4B and a SiGe sacrificial layer 3B, a protective insulating film 9 is formed on a sidewall of the laminated film by film formation/etching, and this is performed a plurality of times with different protective film materials. Thereafter, a Si sacrificial layer 4A and a SiGe sacrificial layer 3A remaining in a lower portion are removed by isotropic etching to form a region in which the insulating separation membrane is embedded. By conducting, in a continuous process using the same device, the forming of the laminated film of the protective insulating film to the removing of the sacrificial layer by etching, it is possible to simplify the steps.

IPC Classes  ?

  • H01L 29/78 - Field-effect transistors with field effect produced by an insulated gate

66.

ION MILLING DEVICE AND PROCESSING METHOD USING SAME

      
Application Number JP2022030559
Publication Number 2024/034052
Status In Force
Filing Date 2022-08-10
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Aida Shota
  • Takasu Hisayuki
  • Kamino Atsushi
  • Kamoshida Hitoshi
  • Fujita Naohiro

Abstract

The present invention comprises: a sample chamber (109); a sample stage (102) on which a sample (120) is placed via a rotation stage (103) that can be tilted about a tilt axis (T) and rotates about a rotation axis (R) and a 3-axis drive stage (104) drivable in three axial directions orthogonal to one another; an ion source (101) which emits unfocused ion beam toward the sample and which is installed in the sample chamber such that the ion beam center (B) of the ion beam is orthogonal to the tilt axis (T); and a first finder (105). An optical system of the first finder is installed on the sample stage such that an optical axis thereof matches the tilt axis (T).

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

67.

SAMPLE SURFACE INSPECTION DEVICE

      
Application Number JP2022030610
Publication Number 2024/034071
Status In Force
Filing Date 2022-08-10
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kimura Katsuhiko
  • Satou Yoshihiro
  • Yamamoto Masaya
  • Tomiyama Ayumi

Abstract

Provided is a sample surface inspection device capable of performing a highly accurate inspection while suppressing vibration of the sample and a sample holding member. A sample surface inspection device 1 comprises: a sample holding member 3 that holds a sample 2; a spindle motor 4 that rotates the sample holding member 3; a turntable 5 that is fixed to the spindle motor 4 and rotates by the action of the spindle motor 4; and a focus drive mechanism 11 that generates a drive force for displacing the sample holding member 3 in a focus direction that is the height direction with respect to the turntable 5. The focus drive mechanism 11 comprises: a plurality of support members 1 of which one end is fixed to the sample holding member 3 and the other end is fixed to the turntable 5, the plurality of support members 1 supporting the sample holding member 3 so as to be displaceable in the focus direction that is the height direction with respect to the turntable 5; a yoke 13; a magnet 14 that is fixed to the yoke 13; and a coil 15 that is disposed to oppose the magnet 14. The yoke 13 includes a yoke attachment portion 13a extending in the vertical direction and connected to the sample holding member 3. The yoke attachment portion 13a is fixed on a circumference that is a node of the primary nodal circular vibration mode of the sample holding member 3.

IPC Classes  ?

  • H01L 21/66 - Testing or measuring during manufacture or treatment

68.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023019177
Publication Number 2024/034220
Status In Force
Filing Date 2023-05-23
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Tamezane Hideto
  • Takayama Hiroyuki

Abstract

The present invention comprises: an image acquisition unit 203 that acquires an image of a sample container 105; a specifying unit 204 that specifies information on the distance from an opening in the sample container 105 to the liquid surface of a sample, and specifies, from the image, information on the type or the diameter of the sample container 105; a storage unit 205 that stores a threshold for the distance, according to the type of the sample container 105; and a determination unit 206 that determines, on the basis of the distance specified by the specifying unit 204 and the threshold stored in the storage unit 205, whether or not to dispense the sample for which the image was acquired. Due to this configuration, an automatic analysis device is provided which, by implementing lower-risk sample dispensing, improves test result reliability and, by minimizing sample containers which are unusable in a specific analysis module, enables improved testing efficiency.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

69.

PARTS MANAGEMENT SYSTEM, AUTOMATIC ANALYZER, AND PARTS MANAGEMENT METHOD

      
Application Number JP2023019187
Publication Number 2024/034221
Status In Force
Filing Date 2023-05-23
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Maeda Shota
  • Yamano Teruhiro

Abstract

A parts management system comprising: a display unit 14 that displays information relating to a parts management system 1; an automatic analyzer storage unit 23 that, for each of a plurality of analytical devices 25, stores the ID of the corresponding analytical device 25 and state information indicating the state of the analytical device 25 in association with each other; an input unit 13 that receives a request for replacement of the analytical device 25; and a parts management device control unit 11 that causes a display unit 14 to display the ID of the analysis device 25 for which the state information satisfies a predetermined condition and the first state information of the position where the analysis device 25 is used when the input unit 13 receives the request for replacement of the analytical device 25. This provides a parts management system, an automatic analyzer, and a parts management method that can support identification of parts to be removed even when the parts of the same type are used in multiple applications or locations.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

70.

OBJECT CLASSIFICATION DEVICE, OBJECT CLASSIFICATION METHOD, AND OBJECT CLASSIFICATION SYSTEM

      
Application Number JP2023026974
Publication Number 2024/034374
Status In Force
Filing Date 2023-07-24
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kakishita Yasuki
  • Hattori Hideharu

Abstract

This object classification device generates region unit information representing regional information pertaining to an object, determines the type or the state of an object and classifies the object on the basis of a region unit feature quantity extracted from the region unit information and a partial region unit feature quantity extracted from a partial region of an input image, and presents the result of object classification to a user. This makes it possible to classify the types or states of objects with excellent accuracy, even when objects having a variety of sizes, lengths, shapes, and other parameters coexist in the image.

IPC Classes  ?

71.

AUTOMATIC ANALYSIS DEVICE AND METHOD FOR ADJUSTING AMOUNT OF CLEANING LIQUID

      
Application Number JP2023027123
Publication Number 2024/034381
Status In Force
Filing Date 2023-07-25
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Etoh Jun
  • Takahashi Takuya
  • Ochi Manabu
  • Suzuki Yoichiro
  • Kawahara Tetsuji
  • Sakata Kenshiro

Abstract

The purpose of the present invention is to provide an automatic analysis device and an adjustment method which are capable of accurately adjusting the amount of a cleaning liquid in a short time. To this end, the present invention is an automatic analysis device which discharges, during cleaning of a dispensing probe, a reference amount of a cleaning liquid from a cleaning nozzle while the tip of the dispensing probe is at a cleaning position. When setting, as a first adjustment position, a position which is lower than the cleaning position and at which the horizontal distance from the cleaning nozzle is greater than from the cleaning position, and a liquid contact is detected when the tip of the dispensing probe is present at the position and the reference amount of the cleaning liquid is discharged, a control unit, upon adjusting the amount of the cleaning liquid discharges the cleaning liquid while the tip of the dispensing probe is at the first adjustment position to confirm whether the liquid contact has been detected, discharges the cleaning liquid while the tip of the dispensing probe is positioned above or downstream of the first adjustment position to confirm whether the liquid contact has been detected, and determines, on the basis of the confirmation results, the setting of a liquid amount adjustment means required for setting the amount of the cleaning liquid to the reference liquid amount.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

72.

Charged Particle Beam Device

      
Application Number 18267502
Status Pending
Filing Date 2020-12-23
First Publication Date 2024-02-15
Owner Hitachi High-Tech Corporation (Japan)
Inventor Ii, Yuka

Abstract

A charged particle beam device includes a sample stage on which a sample is mounted and moved, a charged particle beam irradiation optical system irradiating with a charged particle beam, a sample piece movement unit holding and conveying a sample piece extracted from the sample, a holder fixing table holding a sample piece holder to which the sample piece is transferred, and a computer. When allowing the sample piece movement unit to approach the sample piece, the computer selects a matching region for performing image matching between a reference image obtained in advance by irradiating the sample with the charged particle beam and a comparison image obtained by irradiating the sample, which is an extraction target for the sample piece, with the charged particle beam.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/304 - Controlling tubes by information coming from the objects, e.g. correction signals
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

73.

EXPERIMENT POINT RECOMMENDATION DEVICE, EXPERIMENT POINT RECOMMENDATION METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING DEVICE

      
Application Number 17641214
Status Pending
Filing Date 2021-03-01
First Publication Date 2024-02-15
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Wang, Yuyao
  • Mori, Yasuhide
  • Egi, Masashi
  • Ohmori, Takeshi
  • Sakai, Satoshi
  • Matsuda, Kohei

Abstract

For a machine learning model that receives control parameters of a semiconductor processing device and outputs shape parameters that express a processed shape of a semiconductor sample processed by the semiconductor processing device, an experiment point obtaining learning data is recommended. A contribution of each control parameter to the prediction of the machine learning model is evaluated from feature quantity data that is a value of a control parameter of the learning data used for learning of the machine learning model, and the experiment point is recommended based on a stability evaluation and an uncertainty evaluation of the prediction by the machine learning model in a space defined by the control parameters selected based on the contribution as axes.

IPC Classes  ?

74.

SAMPLE SURFACE QUALITY MANAGEMENT DEVICE

      
Application Number JP2022030592
Publication Number 2024/034067
Status In Force
Filing Date 2022-08-10
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Ishizuka Masato
  • Honda Toshifumi
  • Ukai Ryuji
  • Ohtsubo Kenshiro

Abstract

Provided is a sample surface quality management device that measures the microroughness of a sample, the sample surface quality management device comprising a scattered light measurement device that measures scattered light produced at the sample, an interference light measurement device that measures interference light that includes reflected light produced at the sample, and a signal processing device that processes signals from the scattered light measurement device and the interference light measurement device. The signal processing device computes a first evaluation value for the microroughness of the sample on the basis of a signal from the interference light measurement device, computes a scattering characteristics signal on the basis of a signal from the scattered light measurement device, and computes, for a spatial frequency band for which the first evaluation value is not computed, a second evaluation value for the microroughness on the basis of the first evaluation value and the scattering characteristics signal.

IPC Classes  ?

  • G01B 11/30 - Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
  • H01L 21/66 - Testing or measuring during manufacture or treatment

75.

METHOD FOR CONTINUOUSLY USING SEPARATION MEDIUM

      
Application Number JP2022030683
Publication Number 2024/034098
Status In Force
Filing Date 2022-08-10
Publication Date 2024-02-15
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Kato Hirokazu
  • Yamazaki Motohiro
  • Haraura Isao
  • Sumida Noriyuki
  • Terakado Asami

Abstract

Provided is a method for continuously using a separation medium, which makes it possible to reduce running cost for an analysis when a liquid polymer is used as the separation medium. The method for continuously using a separation medium according to the present invention comprises a separation medium packing step (S1) for packing a separation medium in a capillary, a first pre-running step (S2) for performing a pre-running, a first sample injection step (S3) for injecting a first-round sample into the capillary, a first electrophoresis step (S4) for applying a voltage to perform a first-round electrophoresis, a second pre-running step (S5) for performing a pre-running after the first electrophoresis step (S4), a second sample injection step (S6) for injecting a next-round sample into the capillary that has been subjected to the second pre-running step (S5), and a second electrophoresis step (S7) for performing a next-round electrophoresis, in which the second pre-running step (S5), the second sample injection step (S6) and the second electrophoresis step (S7) are performed repeatedly preset times.

IPC Classes  ?

76.

OPTICAL FOREIGN MATTER INSPECTION DEVICE

      
Application Number 18267137
Status Pending
Filing Date 2021-02-18
First Publication Date 2024-02-08
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Kanai, Hisaaki
  • Makuuchi, Masami

Abstract

An optical foreign matter inspection device includes a rotation stage; a laser light source; a sensor that is a charge accumulation type sensor; a detecting circuit; a light emission timing signal generating circuit configured to generate a light emission timing synchronizing signal synchronized with laser emission; a trigger signal generating circuit configured to receive a first signal (a stage encoder signal) indicating a rotation state of a sample, and generate a trigger signal synchronized with the light emission timing synchronizing signal; a number-of-emitted-pulse calculating circuit configured to receive the light emission timing synchronizing signal and the first signal, and calculate the number of pulses in each period corresponding to a position in a radial direction of the sample; and a processing system configured to measure a state of each position on a surface of the sample by using a detection signal and the number of pulses.

IPC Classes  ?

  • G01N 21/94 - Investigating contamination, e.g. dust
  • G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined
  • G01N 21/39 - Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
  • G01N 21/47 - Scattering, i.e. diffuse reflection

77.

Automatic Analyzer and Method of Storing Reagent in Automatic Analyzer

      
Application Number 18267274
Status Pending
Filing Date 2021-11-29
First Publication Date 2024-02-08
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Umeki, Hiroya
  • Yasui, Akihiro
  • Tanoue, Hidetsugu

Abstract

There is provided an automatic analyzer and a method of storing reagents in an automatic analyzer, in which restrictions on installation of reagent packs are smaller than those of the device in the related art. The automatic analyzer includes a reagent storage 105 that stores reagent packs 201, 301 containing reagents. The reagent storage 105 includes: a first holding unit 403 capable of holding only an immune reagent pack 201 containing a first reagent among the reagents; a second holding unit 404 capable of holding only a biochemical reagent pack 301 containing a second reagent that is different from the first reagent; and a third holding unit 405 capable of holding both the immune reagent pack 201 and the biochemical reagent pack 301.

IPC Classes  ?

  • B01L 3/00 - Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

78.

PLASMA TREATMENT APPARATUS

      
Application Number 17641886
Status Pending
Filing Date 2021-05-27
First Publication Date 2024-02-08
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Kiyosue, Kentaro
  • Sato, Kohei
  • Isomura, Ryoichi
  • Nagai, Koji
  • Matsuyoshi, Tsutomu

Abstract

A plasma treatment apparatus includes a treatment chamber 2 and a gas supply device 30 for supplying a treatment gas into the treatment chamber 2. The gas supply device 30 includes: a mass flow controller box 40 having an intake port 41 and an exhaust port 42; a plurality of pipes 43 to each of which a mass flow controller (43a) is attached; and a plurality of pipes 52 which are connected to the pipes 43 in the mass flow controller box 40 and connected to a plurality of pipes 54 as supply sources of the treatment gas by a plurality of joints 53 outside the mass flow controller box. At least one of the joints 53 is covered by a pipe cover 60 so that the joint 53 is hermetically sealed. The inside of the pipe cover 60 and the inside of the mass flow controller box 40 are communicated by a communicating member (circumferential pipe 61, tube 62).

IPC Classes  ?

79.

METHOD FOR WAFER TREATMENT

      
Application Number JP2022029761
Publication Number 2024/029000
Status In Force
Filing Date 2022-08-03
Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Yoshioka, Nozomu
  • Okuma, Kazumasa
  • Kuwahara, Kenichi

Abstract

The purpose of the present invention is to provide a method for wafer treatment, the method making it possible to inhibit wafer-position shifting in wafer treatments. This method for wafer treatment comprises: a wafer-less charge removal step in which, in a treatment device equipped with a sample table having an electrode capable of electrostatically holding a wafer, any charge accumulated on the sample table is removed, with the sample table having no wafer placed thereon; and a wafer treatment step in which after the wafer-less charge removal step, a wafer placed on the sample table is electrostatically held thereon and the wafer is treated. The wafer-less charge removal step comprises a plasma generation step in which a plasma is generated using a first gas for charge removal and a power supply step in which first electric power is supplied to the electrode of the sample table.

IPC Classes  ?

80.

SAMPLE MEASURING DEVICE

      
Application Number JP2022030067
Publication Number 2024/029060
Status In Force
Filing Date 2022-08-05
Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Shirasaki Yasuhiro
  • Uchiho Minami
  • Bizen Daisuke
  • Sakakibara Makoto

Abstract

This sample measuring device comprises: a light source that irradiates a sample including an insulating film with light; an excitation source that irradiates the sample with a primary beam to emit charged particles; a detector that applies at least one of an electric field or a magnetic field to the charged particles to separate the trajectories in accordance with the energy of the charged particles, and outputs a detection signal that depends on the energy of the charged particles; and a control device that processes the detection signal of the charged particles obtained from the detector. The control device changes a light irradiation condition, acquires a detection signal by the detector under a different irradiation condition, and determines and outputs material characteristic values from the detection signal under the different irradiation condition by using information indicating the relationship between the detection signal and the material characteristic values of the insulating film.

IPC Classes  ?

  • G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]

81.

ANALYZING DEVICE, AND INFORMATION OUTPUT METHOD

      
Application Number JP2023019184
Publication Number 2024/029167
Status In Force
Filing Date 2023-05-23
Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Ito Masayuki

Abstract

Provided is an analyzing device that outputs information enabling tracing of databases and logs. The analyzing device comprises: an analyzing unit for analyzing a specimen; a storage unit for storing databases DB1 to DB3, and a log including a specimen ID, the databases DB1 to DB3 storing, in association with one another, the specimen ID, which is linked to personal information of a patient who provided the specimen, and specimen information of the specimen, analyzed by the analyzing unit, an analysis result of the specimen obtained by the analyzing unit, or the personal information of the patient; and a control unit for setting a unique identifier for each record in the database DB1, replacing the specimen ID in the log with the identifier set for the specimen ID in the same database DB1 as the specimen ID in the log (S1108), deleting the specimen ID and the personal information in the databases DB1 to DB3 and the log (S1112), and then outputting the databases DB1 to DB3 and the log to an external device (S1113).

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G16H 10/40 - ICT specially adapted for the handling or processing of patient-related medical or healthcare data for data related to laboratory analysis, e.g. patient specimen analysis

82.

FLOW CELL FOR ANALYSIS OF NUCLEIC ACID AND DEVICE FOR ANALYSIS OF NUCLEIC ACID

      
Application Number 18266309
Status Pending
Filing Date 2020-12-21
First Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Ebine, Noriko
  • Tamura, Terumi
  • Narahara, Masatoshi

Abstract

Embodied is a flow cell that is for analysis of nucleic acid and that is capable of inhibiting complication of data processing without a reduction in throughput. The flow cell for analysis of nucleic acid comprises: a flow path formation body that has a flow path into which a nucleic acid sample flows; and a flow path formation body support member that has a region in which nucleic acid in a nucleic acid sample flowing into the flow path is to be adsorbed. The flow path formation body support member has the nucleic acid adsorption region in which nucleic acid is to be adsorbed, and a fluorescent particle adsorption region which is separated from the nucleic acid adsorption region, and in which fluorescent particles are to be adsorbed. In the fluorescent particle adsorption region, a blocking substance that can be specifically adsorbed to the fluorescent particle adsorption region is adsorbed.

IPC Classes  ?

83.

CAPILLARY-ARRAY-ELECTROPHORESIS DEVICE

      
Application Number 18267133
Status Pending
Filing Date 2020-12-18
First Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Anazawa, Takashi
  • Inaba, Ryoji
  • Yamamoto, Shuhei

Abstract

When laser-irradiation portions of N capillaries with capillary numbers n=1, 2, . . . , and N are arranged on a same plane, a laser-irradiation intensity of each capillary is denoted by L(n), and an output intensity of each capillary by a computer when a light emitting substance having an equal concentration exists inside each capillary is denoted by H(n), an absolute value of an average value of a second derivative of H(n) becomes smaller than an absolute value of an average value of a second derivative of L(n) for any refractive index n3 of a separation medium in a range of 1.33≤n3≤1.41 by digital correction by the computer, which changes according to the refractive index n3 (see FIG. 11).

IPC Classes  ?

84.

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

      
Application Number 17641233
Status Pending
Filing Date 2020-12-16
First Publication Date 2024-02-08
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Matsui, Miyako
  • Usui, Tatehito
  • Kuwahara, Kenichi

Abstract

The plasma processing device according to the present invention includes a processing chamber in which a sample is plasma processed, a radio frequency power supply which supplies radio frequency power for generating plasma, and a sample stand on which the sample is placed. The plasma processing device includes a control device which measures a thickness of a protective film selectively formed on a desired material of the sample using an interference light reflecting from the sample which has been irradiated with an ultraviolet-ray, or determines selectivity of the protective film using the interference light reflecting from the sample which has been irradiated with the ultraviolet-ray.

IPC Classes  ?

  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
  • H01J 37/32 - Gas-filled discharge tubes

85.

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

      
Application Number 17641871
Status Pending
Filing Date 2021-03-24
First Publication Date 2024-02-08
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Nakatani, Shintarou
  • Ichino, Takamasa
  • Kondo, Yuki

Abstract

A plasma processing apparatus includes a sample stage including a placement surface on which a semiconductor wafer is placed, a ring-shaped thin film electrode surrounding the sample stage, and a susceptor ring made of a dielectric covering the thin film electrode, in which the thin film electrode includes a first portion located lower than the rear surface of the semiconductor wafer, a second portion located higher than the main surface of the semiconductor wafer, and a third portion connecting the first portion and the second portion, and the first portion of the thin film electrode has an overlap region that overlaps the semiconductor wafer in a plan view.

IPC Classes  ?

86.

ETCHING METHOD

      
Application Number 17642356
Status Pending
Filing Date 2021-04-22
First Publication Date 2024-02-08
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Shinoda, Kazunori
  • Hamamura, Hirotaka
  • Maeda, Kenji
  • Yokogawa, Kenetsu
  • Ishikawa, Kenji
  • Hori, Masaru

Abstract

Provided is an etching technique providing higher uniformity of etching amount and a higher yield of etching processing. An etching method for etching a film layer as a processing object containing nitride of transition metal, the film layer being disposed on a surface of a wafer, includes a step of supplying reactive particles containing fluorine and hydrogen but containing no oxygen to a surface of the film layer to form a reaction layer on the surface of the film layer, and a step of eliminating the reaction layer by heating the film layer.

IPC Classes  ?

  • H01L 21/311 - Etching the insulating layers
  • H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L 21/3065 - Plasma etching; Reactive-ion etching

87.

PLASMA PROCESSING APPARATUS

      
Application Number 17642821
Status Pending
Filing Date 2021-02-25
First Publication Date 2024-02-08
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Tamura, Tomoyuki
  • Ikenaga, Kazuyuki

Abstract

A plasma processing apparatus including a processing chamber; a wafer stage on which a processing target wafer is placed; an electrostatic chuck including a film-shaped electrostatic attraction electrode which is disposed in a dielectric film covering an upper surface of the wafer stage; a radio frequency electrode which is disposed inside the wafer stage; and a lift pin which is disposed inside the wafer stage and which moves the wafer up and down by movement thereof, a lower portion of the lift pin being connected to a member made of a conductor, in which a voltage value Eps of the lower portion of the lift pin and an average value Eesc of the potential of the electrostatic attraction electrode are adjusted during the processing of the wafer so as to match the predicted value Vdcs of the self-bias voltage of the wafer.

IPC Classes  ?

  • H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
  • H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
  • H01J 37/32 - Gas-filled discharge tubes
  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

88.

ELECTROPHORESIS DEVICE

      
Application Number JP2022029518
Publication Number 2024/028949
Status In Force
Filing Date 2022-08-01
Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Maruoka Katsunari
  • Shibasaki Takehiko
  • Gomi Takashi
  • Yamazaki Motohiro

Abstract

The purpose of the present invention is to provide an electrophoresis device that has a high degree of freedom in selecting a laser device while limiting deterioration in analysis performance. To this end, the present invention is an electrophoresis device that emits laser beams from both ends of a capillary array in which a plurality of capillaries are placed side by side, and detects light from the plurality of capillaries, the electrophoresis device being provided with a beam isolator on an optical path from the light source of the laser beams to the capillary array. As a result, there can be provided an electrophoresis device that exhibits good analysis performance because reflective returning beams can be limited even without causing the laser to emit laser beams while inclined with respect to the capillary axes. In addition, the degree of freedom in selecting a laser device is improved because transmissive return beams and reflective return beams can be reliably limited.

IPC Classes  ?

89.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2023026449
Publication Number 2024/029337
Status In Force
Filing Date 2023-07-19
Publication Date 2024-02-08
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Matsuoka Yuya
  • Ando Takahiro

Abstract

The purpose of the present invention is to provide an automatic analysis device capable of highly reliable analysis in a situation where a light emission amount fluctuates, while suppressing device enlargement and degradation of processing performance. For this purpose, the automatic analysis device of the present invention comprises: a vessel holding part capable of holding a plurality of vessels containing a reaction solution produced by mixing a specimen and a reagent; a light source that emits light; an optical receiver that receives the light emitted by the light source; and a control unit that performs measurement pertaining to light, based on a signal outputted by the optical receiver. The vessels are disposable. The control unit corrects measurement values pertaining to light emitted in positions where the vessels are held in the vessel holding part, on the basis of measurement values pertaining to light emitted in positions where the vessels are not held in the vessel holding part.

IPC Classes  ?

  • G01N 21/75 - Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

90.

THERMAL CYCLER AND GENETIC INSPECTION APPARATUS

      
Application Number 18266055
Status Pending
Filing Date 2020-12-18
First Publication Date 2024-02-01
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Isoshima, Nobuyuki
  • Kobari, Tatsuya
  • Shibahara, Masashi
  • Yamagata, Toshiki
  • Makino, Yoko
  • Satoh, Wataru

Abstract

The present invention provides a thermal cycler capable of rapidly and efficiently heating and cooling a reaction liquid. The thermal cycler according to the present invention comprises: a temperature control block where a reaction vessel can be installed, a thermoelectric conversion unit capable of heating and cooling, a temperature sensor that measures the temperature of the temperature control block, an insulating substrate that is in contact at one surface with the thermoelectric conversion unit, and a heat radiating unit that is provided on the other surface of the insulating substrate and serves for discharging the heat of the thermoelectric conversion unit to the outside, wherein the temperature control block is heated and cooled by controlling a current or voltage supplied to the thermoelectric conversion unit on the basis of the temperature of the temperature adjustment block measured by the temperature sensor.

IPC Classes  ?

  • B01L 7/00 - Heating or cooling apparatus; Heat insulating devices

91.

Biochemical Analysis Device, Reaction Unit, and Cassette Guide

      
Application Number 18020683
Status Pending
Filing Date 2020-08-31
First Publication Date 2024-02-01
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Cheng, Bohao
  • Shimizu, Hayato
  • Yamagata, Toshiki
  • Shibahara, Masashi
  • Makino, Yoko

Abstract

This biochemical analysis device has a configuration in which a reaction unit is installed on a device body, the reaction unit including: a test tube unit having a plurality of test tubes or a test tube unit in which a plurality of test tubes can be installed; a cassette guide; and a cassette box that allows attachment/detachment of the cassette guide. The cassette guide includes a flange part, a ventilation opening provided in the flange part, and a test tube insertion part provided to the flange part. The test tube insertion part is a closed structure, the flange part is installed on the upper surface section of the cassette box, and the ventilation opening suctions air above the flange part via negative pressure generated by an internal space of the cassette box. The foregoing provides a biochemical analysis device in which it is possible to stabilize descending air flow even in a case where a cassette is provided only to a section of the cassette guide, and with which it is possible to easily exchange the cassette guide if the cassette guide becomes contaminated

IPC Classes  ?

  • B01L 9/00 - Supporting devices; Holding devices
  • B01L 9/06 - Test-tube stands; Test-tube holders

92.

CANCER TEST METHOD USING METABOLITE LIST

      
Application Number 18021413
Status Pending
Filing Date 2020-09-09
First Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Sakairi, Minoru
  • Abe, Mayumi
  • Ishigaki, Takashi

Abstract

The present invention provides a cancer test method and a cancer test system for evaluating cancer in a subject. Specifically, the present invention provides a method for testing cancer in a subject, including: preparing a database that has stored a marker panel on which information of multiple cancer markers with respect to multiple healthy subjects and cancer patients is registered, the database including discrimination information that classifies a measured value of each cancer marker, into any of three groups: within the reference range, higher than the reference range, and lower than the reference range; analyzing, with respect to measured values of one or more cancer markers of the subject, and evaluating cancer in the subject on the basis of a result of the analysis.

IPC Classes  ?

  • G01N 33/574 - Immunoassay; Biospecific binding assay; Materials therefor for cancer
  • G01N 33/68 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving proteins, peptides or amino acids
  • G01N 33/92 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving lipids, e.g. cholesterol

93.

GENETIC TESTING METHOD AND GENETIC TESTING DEVICE

      
Application Number JP2022028838
Publication Number 2024/023944
Status In Force
Filing Date 2022-07-26
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Akutsu Masashi

Abstract

A genetic testing device 1 further comprises a calculation unit 2d that adds, to the time at which an analyte is put, an available standby time depending on the priority of the analyte and calculates a target time by which dispensation to the analyte is to be completed. A control unit 2c executes dispensation of analytes in the order of target time. Consequently, in the genetic testing method and genetic testing device provided by the present invention, priority is given to measurement of an analyte with high priority, and measurement of an analyte with low priority is prevented from being overly delayed when analytes with high priority are introduced in succession.

IPC Classes  ?

  • C12Q 1/6844 - Nucleic acid amplification reactions
  • C12M 1/00 - Apparatus for enzymology or microbiology
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

94.

ANALYSIS METHOD AND CAPILLARY ELECTROPHORESIS DEVICE

      
Application Number JP2022028984
Publication Number 2024/023979
Status In Force
Filing Date 2022-07-27
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Terakado Asami
  • Yamazaki Motohiro
  • Kato Hirokazu
  • Sumida Noriyuki
  • Tanai Hiroyuki

Abstract

The purpose of the present invention is to provide an analysis method that suppresses unnecessary repetition of electrophoresis or sample preparation. An analysis method according to the present invention involves analyzing the characteristics of a sample by electrophoresis of the sample using a capillary and a migration medium and includes a read-in step for reading-in analysis conditions, a migration medium filling step for filling the capillary with the migration medium, a sample injection step for injecting the sample into the capillary filled with the migration medium at the migration medium filling step, an electrophoresis step for electrophoresing the sample injected at the sample injection step through the migration medium, an abnormality determination step for comparing analysis results obtained at the electrophoresis step with other analysis results for the same analysis conditions to statistically determine whether there is an abnormality, and an analysis conditions adjustment step for adjusting the analysis conditions. When it has been determined that there is an abnormality at the abnormality determination step, the method returns to the read-in step via the analysis conditions adjustment step.

IPC Classes  ?

95.

DISTANCE MEASURING DEVICE AND DISTANCE MEASURING METHOD

      
Application Number JP2023019326
Publication Number 2024/024242
Status In Force
Filing Date 2023-05-24
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Hariyama Tatsuo
  • Watanabe Masahiro
  • Maruno Kenji
  • Akiyama Hirohito
  • Kando Hidehiko

Abstract

According to the present invention, a distance to a target object is measured with a high accuracy by suppressing stray light inside a probe tip end portion. In this distance measuring device, a probe tip end portion includes, at a tip end of the probe tip end portion, an optical path switching element for switching an optical path of measuring light entering from an optical element, wherein a material of a part of the probe tip end portion disposed in a position facing at least a fifth surface absorbs the measuring light.

IPC Classes  ?

  • G01C 3/06 - Use of electric means to obtain final indication
  • G01B 11/24 - Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures

96.

SPECIMEN INSPECTION SYSTEM, AND CONVEYANCE METHOD

      
Application Number 18275448
Status Pending
Filing Date 2021-11-25
First Publication Date 2024-02-01
Owner Hitachi High-Tech Corporation (Japan)
Inventor
  • Yano, Shigeru
  • Azuma, Shinji
  • Matsuka, Takeshi

Abstract

In a two-dimensional conveyance line employing an electromagnetic conveyance technique, carriers are conveyed in consideration of the length of a group of stagnated carriers, so as to reduce idle positions and ensure conveyance efficiency of a specimen inspection system and maximize the number of carriers conveyed simultaneously. Current is supplied to a winding of an electromagnetic circuit and an electromagnetic force is generated between the winding and a carrier with a magnet that holds a test tube to move the carrier. The processing efficiency of a specimen inspection system is improved by changing the current of the electromagnetic circuit to change a conveyance speed of the carrier to which the specimen sample is mounted, and by shortening the conveyance time, and reducing the conveyance speed of the carrier and increasing the number of carriers that are conveyed simultaneously as an alternative to detouring the carrier during congestion.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system
  • B65G 54/02 - Non-mechanical conveyors not otherwise provided for electrostatic, electric, or magnetic
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

97.

PLASMA PROCESSING METHOD

      
Application Number JP2022028584
Publication Number 2024/023877
Status In Force
Filing Date 2022-07-25
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Nam, Juhyun
  • Ishimaru, Masato
  • Tahara, Shota

Abstract

The present invention provides a technology that can realize vertical etching by controlling process conditions. A plasma processing method according to one embodiment of the present invention involves a method for forming a shallow trench isolation and comprises: a first step for etching silicon by plasma; a second step for depositing a deposition film containing a silicon element on a mask; a third step for etching the silicon by plasma so as to have a vertical etching shape; and a fourth step for depositing a deposition film containing SiO on the mask. The first to fourth steps are repeated a prescribed number of times. The plasma in the third step is generated by high‐frequency power obtained by modulation using a first pulse, and the third step is performed while high‐frequency power obtained by modulation using a second pulse is supplied to a test piece in which the silicon is used as the substrate. The first pulse frequency in the third step is higher than the second pulse frequency in the third step.

IPC Classes  ?

  • H01L 21/76 - Making of isolation regions between components
  • H01L 21/3065 - Plasma etching; Reactive-ion etching

98.

LENGTH MEASUREMENT SYSTEM, MODEL CREATION SYSTEM, AND LENGTH MEASUREMENT METHOD

      
Application Number JP2022028873
Publication Number 2024/023955
Status In Force
Filing Date 2022-07-27
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Chen Jun
  • Yumiba Ryou
  • Toyoda Yasutaka

Abstract

In the present invention, a measurement-subject captured image in which a specimen is captured is converted to a measurement-subject length-measurement image by a length-measurement image conversion model, and the dimensions of a measurement pattern image included in the measurement-subject length-measurement image are measured. The measurement-subject image conversion model is trained using teaching data that is a combination of a training captured image in which the specimen is captured and a training length-measurement image that corresponds to the training captured image. The contrast between a measurement pattern image and a non-measurement pattern image present near the measurement pattern image in the training length-measurement image is improved over the contrast between a measurement pattern image and a non-measurement pattern image in the training captured image. Alternatively, the non-measurement pattern image in the training captured image is deleted from the training length-measurement image.

IPC Classes  ?

  • G01B 15/00 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
  • G06T 5/00 - Image enhancement or restoration

99.

ION MILLING DEVICE AND ION MILLING METHOD

      
Application Number JP2022029195
Publication Number 2024/024061
Status In Force
Filing Date 2022-07-28
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor
  • Asai Kengo
  • Takasu Hisayuki

Abstract

The present invention improves the milling speed and lengthen the maintenance cycle of an ion milling device. This ion generating unit of an ion gun comprises: a disk-shaped first cathode 11 and a disk-shaped second cathode 12 provided with an ion beam extraction hole 32, the first cathode and the second cathode being arranged opposite to each other; an anode arranged between the first cathode and the second cathode in a state of being electrically insulated from the first cathode and the second cathode; an ionization chamber 18 which is surrounded by the first cathode, the second cathode, and the anode and into which a gas is supplied from a gas supply mechanism 40; and a magnet 14 that generates a magnetic field in the ionization chamber, wherein the anode has a cylindrical shape with the longitudinal direction thereof being along the central axis of the ion generating unit, and at the inner wall that is in contact with the ionization chamber, a first protrusion is formed toward the central axis in a range from a position that is equidistant from both ends of the anode to the end opposite the first cathode.

IPC Classes  ?

  • H01J 37/08 - Ion sources; Ion guns
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

100.

CHARGED PARTICLE BEAM DEVICE AND METHOD FOR CONTROLLING CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2022029361
Publication Number 2024/024108
Status In Force
Filing Date 2022-07-29
Publication Date 2024-02-01
Owner HITACHI HIGH-TECH CORPORATION (Japan)
Inventor Tamaki Hirokazu

Abstract

In the present invention, a charged particle beam device includes: a movement mechanism that holds and moves a sample; a particle source that outputs a charged particle beam; a detector that detects a signal that is generated by irradiating the sample with the charged particle beam; and a controller that controls the movement mechanism, the particle source, and the detector. The controller determines an irradiation target area in the sample in accordance with the sample, moves the irradiation position of the charged particle beam in the irradiation target area, acquires a diffraction pattern obtained using the detection result from the detector at a different irradiation position, and controls the movement mechanism on the basis of an analysis result of the diffraction pattern so as to adjust the inclination of the sample.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
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