Hitachi High-Technologies Corporation

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H01L 21/66 - Testing or measuring during manufacture or treatment 259
H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams 248
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor 238
H01J 37/22 - Optical or photographic arrangements associated with the tube 224
H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support 195
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1.

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

      
Application Number JP2019016930
Publication Number 2020/217266
Status In Force
Filing Date 2019-04-22
Publication Date 2020-10-29
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Shinoda Kazunori
  • Otake Hiroto
  • Kobayashi Hiroyuki
  • Kawamura Kohei
  • Izawa Masaru

Abstract

Provided is a plasma processing method in which the etching amount is highly uniformly and the processing yield is improved, and a plasma processing device. This method for etching a tungsten film includes: a first step of supplying plasma of an organic gas containing fluorine to a substrate having a tungsten film on at least a portion of the surface thereof to deposit a fluorocarbon layer, and forming an intermediate layer containing tungsten and fluorine and having self-saturating properties between the fluorocarbon layer and the tungsten film; and a second step of removing the fluorocarbon layer and the intermediate layer using plasma of oxygen gas.

IPC Classes  ?

  • H01L 21/3065 - Plasma etching; Reactive-ion etching
  • H01L 21/28 - Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups
  • H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
  • H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels

2.

AUTOMATIC ANALYZING DEVICE

      
Application Number JP2020004541
Publication Number 2020/208919
Status In Force
Filing Date 2020-02-06
Publication Date 2020-10-15
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Suenari Tsukasa
  • Yamashita Taichiro
  • Okusa Takenori

Abstract

This automatic analyzing device is equipped with an interlock unit having: an actuating member which is supported to be movable between a lock position and a release position, and which engages, at the lock position, with a projection provided on a frontward end section of a cover that covers an upper face of a housing, thereby inhibiting the cover from rotating to an open position; an electromagnetic drive means for driving the actuating member; and a drive connection means that connects the actuating member and the electromagnetic drive means together and drives the actuating member by transmitting the movement of the electromagnetic drive means to the actuating member. The interlock unit is disposed on a front face of the housing at a position corresponding to the interlock unit so as to be attachable to and detachable from the housing in a state where a front plate of a front opening has been removed. Due to this configuration, access to the interlock unit is made easier, thereby improving maintenance performance.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

3.

PLASMA PROCESSING DEVICE, INTERNAL MEMBER FOR PLASMA PROCESSING DEVICE, AND METHOD FOR MANUFACTURING SAID INTERNAL MEMBER

      
Application Number JP2019015912
Publication Number 2020/208801
Status In Force
Filing Date 2019-04-12
Publication Date 2020-10-15
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Tamura Tomoyuki
  • Ikenaga Kazuyuki

Abstract

Provided are: a plasma processing device which suppresses the contamination of samples and improves processing yield; an internal member for a plasma processing device; and a method for manufacturing said internal member. A plasma processing device that uses plasma, which is formed from a processing gas supplied into a processing chamber inside a vacuum vessel, to process a to-be-processed wafer that has been placed in the processing chamber, wherein the surface of a member disposed inside the processing chamber and facing the plasma is formed from a dielectric material, and the dielectric material includes a first material which chemically combines with the supplied processing gas and is volatilized, and a second material in which the volume of a non-volatile compound that is generated by the second material chemically combining with the processing gas is greater than before the chemical combination.

IPC Classes  ?

  • H01L 21/3065 - Plasma etching; Reactive-ion etching
  • B01J 19/08 - Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
  • C23C 4/11 - Oxides
  • C23C 24/04 - Impact or kinetic deposition of particles

4.

INTERLOCK UNIT AND AUTOMATED ANALYZER EQUIPPED WITH SAME

      
Application Number JP2020005499
Publication Number 2020/208934
Status In Force
Filing Date 2020-02-13
Publication Date 2020-10-15
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Yamashita Taichiro
  • Suenari Tsukasa
  • Okusa Takenori

Abstract

Provided is an interlock unit which can inhibit the rotation of a cover from a closed position to an open position, and which comprises: a hollow case that has a cuboid shape and is disposed in a position that is adjacent to an inner side surface of a housing and below an end of the cover on the opposite side from a support shaft in the closed position; a working member that is provided to the top surface of the case, is movably supported between a non-operating position and an operating position, and in the operating position prevents rotation of the cover to the open position by engaging with a protruding portion provided to the cover; an electromagnetic drive means that is provided below the working member and is for driving the working member; and a driving-coupling means that drives the working member by coupling the working member and the electromagnetic drive means and transmitting the operation of the electromagnetic drive means to the working member. It is thereby possible to improve maintenance of the interlock unit by facilitating access to the interlock unit.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

5.

MEDICAL MATERIAL TRANSPORT SYSTEM

      
Application Number JP2020004295
Publication Number 2020/175057
Status In Force
Filing Date 2020-02-05
Publication Date 2020-09-03
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor Takizawa Hikaru

Abstract

The present invention realizes a medical material transport system that is low-cost, stable, and safe, the medical material transport system being such that even if a failure occurs in an individual specimen transport device, the failure does not extend to the system as a whole. Collection of a specimen is requested from a specimen collection request terminal 107, and a management unit (108) issues a reception command 110 for the specimen. A drone 101 that has received the reception command 110 for the specimen departs from a standby dock 105 on the basis of the received information and flies to a specimen recovery location 106, and a specimen tray for placing the specimen is taken out from a specimen holder 102. A specimen container is contained in the specimen tray, and the specimen tray is returned to the specimen holder 102 and locked using a lock mechanism. The drone 101 flies to an arrival station 104, and after arriving, uses an unlocking key, and the specimen tray is disengaged from the specimen holder 102. After the specimen container in the specimen tray is collected, the specimen tray is placed in the specimen holder 102, and the drone 101 returns to the standby dock 105.

IPC Classes  ?

  • B64C 39/02 - Aircraft not otherwise provided for characterised by special use
  • B65G 61/00 - Use of pick-up or transfer devices or of manipulators for stacking or de-stacking articles not otherwise provided for

6.

METHOD FOR MONITORING GAS COMPONENT, DEVICE THEREFOR, AND PROCESSING DEVICE USING SAME

      
Application Number JP2019005467
Publication Number 2020/166048
Status In Force
Filing Date 2019-02-15
Publication Date 2020-08-20
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Ogawa Yoshifumi
  • Kouzuma Yutaka
  • Izawa Masaru

Abstract

This gas component monitoring device comprises a gas component monitoring part that forms plasma by re-excitation downstream of an installed position of a workpiece and monitors light emission of the plasma, wherein the gas component monitoring part includes: an introduction gas supply part that supplies an introduction gas; a nozzle part which has a hole through which the introduction gas supplied from the introduction gas supply part passes and an opening for allowing a portion of gas to be analyzed that flows through an exhaust pipe part to be taken up into the interior of the hole at an intermediate point in the hole; a discharge electrode part that causes an electrical discharge in the gas to be analyzed that is taken up into the interior of the nozzle part from the opening and the introduction gas supplied into the hole to generate a plasma inside the nozzle; and a light emission detection part that detects light emission of the plasma generated inside the nozzle by the discharge electrode part.

IPC Classes  ?

  • H01L 21/3065 - Plasma etching; Reactive-ion etching
  • G01N 21/73 - Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches

7.

SEMICONDUCTOR MANUFACTURING DEVICE

      
Application Number JP2019005262
Publication Number 2020/165990
Status In Force
Filing Date 2019-02-14
Publication Date 2020-08-20
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Yamaguchi Yoshihide
  • Fujisaki Sumiko

Abstract

The present invention provides a semiconductor manufacturing device with which it is possible to use a complex gas to etch, at a high speed and a high accuracy, a metal film containing a transition metal element. This semiconductor manufacturing device has: a vacuum container 60; a processing chamber 1 provided in the vacuum container, a sample 3 that has formed thereon a metal film containing a transition metal element being placed on a stage 4 installed in the processing chamber 1; and a vaporization chamber 2 provided in the vacuum container, a vaporization nozzle unit 70 for vaporizing a complex gas raw material liquid fed from the exterior being installed in the vaporization chamber 2. A complex gas obtained by vaporizing the complex gas raw material liquid is introduced into the processing chamber, and the metal film on the sample is etched.

IPC Classes  ?

8.

METHOD FOR OPERATING VACUUM PROCESSING DEVICE

      
Application Number JP2019004511
Publication Number 2020/161873
Status In Force
Filing Date 2019-02-07
Publication Date 2020-08-13
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Saigou, Yoshikazu
  • Suemitsu, Yoshiro
  • Ishikawa, Hiroyuki

Abstract

Provided is a technique which pertains to a method for operating a vacuum processing device and with which effective transportation and processing can be achieved in processing a plurality of steps when the vacuum processing device is a link type vacuum processing device. A method for operating a vacuum processing device according to an embodiment has a first step (steps 601-607) for selecting a single first processing unit and a single second processing unit among a plurality of processing units with regard to each of wafers so as to minimize the time required for processing all the plurality of wafers in a plurality of processing steps, and determining a transport schedule including a transportation path for using the selected processing units. In the first step, the transportation schedule including the transport path is constructed for at least a single wafer, by using the first processing unit selected excluding at least a single first processing unit from the plurality of first processing units. This operation method selects an optimal transportation schedule when the second step is rate-controlled.

IPC Classes  ?

  • H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
  • B65G 49/07 - Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers

9.

DRY ETCHING METHOD AND DRY ETCHING APPARATUS

      
Application Number JP2019004577
Publication Number 2020/161879
Status In Force
Filing Date 2019-02-08
Publication Date 2020-08-13
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kofuji, Naoyuki
  • Kuwahara, Kenichi

Abstract

In this dry etching method using plasma, when etching an organic film, by alternately repeating a first step of shielding Ar ions and irradiating only oxygen radicals on the organic film of a sample, and a second step of irradiating noble gas ions on the organic film, it is possible to perform an etching process with good precision while suppressing variation in etching of the organic film. This makes it possible to suppress collapse of an LS pattern formed on a silicon substrate, etc.

IPC Classes  ?

10.

PLASMA TREATMENT DEVICE

      
Application Number JP2019004749
Publication Number 2020/161919
Status In Force
Filing Date 2019-02-08
Publication Date 2020-08-13
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Ichino, Takamasa
  • Sato, Kohei
  • Nakamoto, Kazunori

Abstract

Provided is a plasma treatment device comprising: a treatment chamber wherein a wafer 1 is treated using plasma; a high-frequency power source which supplies high-frequency electricity for generating the plasma; a sample stage 2 which is positioned in the treatment chamber and whereon the wafer 1 is mounted; and a DC power source 106 which is electrically connected to the sample stage 2 and which causes the sample stage 2 to generate an adsorptive power. The sample stage 2 comprises: a protrusion part 201a which adsorbs the wafer 1 by the adsorptive power; and a step part 201b which protrudes from the protrusion part 201a at the lower part of the protrusion part 201a. A ring 5, which can abut the lower surface of the wafer 1, is disposed on the outer side of the protrusion part 201a. When the wafer 1 is adsorbed on the upper surface of the protrusion part 201a of the sample stage 2, a space 7 defined by the wafer 1, the protrusion part 201a, and the ring 5 is sealed.

IPC Classes  ?

  • H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
  • H01L 21/3065 - Plasma etching; Reactive-ion etching

11.

ETCHING PROCESSING DEVICE, ETCHING PROCESSING METHOD AND DETECTOR

      
Application Number JP2019004629
Publication Number 2020/161887
Status In Force
Filing Date 2019-02-08
Publication Date 2020-08-13
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Eto, Soichiro
  • Minemura, Hiroyuki
  • Usui, Tatehito

Abstract

In film thickness/depth measurement of a wafer in processing during etching, because the detected light intensity amount fluctuates and the measurement accuracy of the film thickness/depth decreases due to fluctuations in light intensity of the light source and fluctuations in the air of the region through which the light passes, the total light intensity or average light intensity at a given frequency is calculated from the spectroscopic spectrum measured at each time during etching processing; a present-time estimated total light intensity or estimated average light intensity, estimated using the total light intensity or average light intensity measured in the past prior to the present time is calculated; a change ratio is calculated, which is the ratio of the present-time total light intensity and estimated total light intensity, or the ratio of the average light intensity and the estimated average light intensity; the light intensity at each for wavelength at the present time is corrected using the calculated change ratio; and film thickness/depth measurement is carried out using the corrected light intensity at each wavelength.

IPC Classes  ?

12.

ETCHING METHOD AND PLASMA TREATMENT DEVICE

      
Application Number JP2019003601
Publication Number 2020/157954
Status In Force
Filing Date 2019-02-01
Publication Date 2020-08-06
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Fujisaki Sumiko
  • Yamaguchi Yoshihide
  • Kobayashi Hiroyuki
  • Shinoda Kazunori
  • Kawamura Kohei
  • Kouzuma Yutaka
  • Izawa Masaru

Abstract

The present invention enables high-accuracy etching while also curbing and reducing surface roughness on a transition metal film. With regard to a transition metal film containing a transition metal element formed on a sample, the invention involves etching by: a first step for isotropically generating a transition metal oxide layer on the surface of the transition metal film while keeping the temperature of the sample at or below 100°C; a second step for raising the temperature of the sample to a predetermined temperature between 150°C and 250°C while supplying a complexation gas to the transition metal oxide layer; a third step for removing, by sublimating, a reactant generated by a reaction between the complexation gas and the transition metal oxide formed in the first step, while keeping the temperature of the sample at 150°C to 250°C; and a fourth step for cooling the sample.

IPC Classes  ?

  • H01L 21/3065 - Plasma etching; Reactive-ion etching
  • H01L 21/3213 - Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
  • H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device

13.

PLASMA PROCESSING DEVICE AND SAMPLE PROCESSING METHOD USING SAME

      
Application Number JP2018043542
Publication Number 2020/110192
Status In Force
Filing Date 2018-11-27
Publication Date 2020-06-04
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor Tanaka Keiichi

Abstract

In order to enable a wafer to be heated uniformly and to enable processing throughput to be increased, this sample processing method of processing a sample repeats, a plurality of times, processing steps that include: an adsorption step of forming a layer of a reactant on the surface of a sample placed on a sample stage inside a processing chamber that is connected to a plasma generating chamber, with plasma being generated by a plasma generating means inside the plasma generating chamber into which processing gas has been introduced; a detaching step of heating the sample by a heating lamp disposed outside a sample chamber and a heater installed inside the sample stage to vaporize the layer of the reactant to detach the layer of the reactant from the surface of the sample; and a cooling step of cooling the sample heated in the detaching step, wherein in the adsorption step, the heating lamp and heater are feedforward controlled by a control unit to set the sample to a first temperature state, and in the detaching step, the heating lamp and heater are controlled by the control unit such that when the sample is heated, the heater is feedback controlled to set the sample to a second temperature state.

IPC Classes  ?

  • H01L 21/26 - Bombardment with wave or particle radiation

14.

PLASMA TREATMENT DEVICE, AND METHOD FOR TREATING SAMPLE FOR TREATMENT USING SAME

      
Application Number JP2018042106
Publication Number 2020/100227
Status In Force
Filing Date 2018-11-14
Publication Date 2020-05-22
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kobayashi Hiroyuki
  • Miyoshi Nobuya
  • Shinoda Kazunori
  • Kouzuma Yutaka
  • Izawa Masaru

Abstract

A method for treating a film structure comprising an underlayer film disposed in advance on a sample to be treated, and an overlayer film of the treatment object disposed on the underlayer film, in order to achieve a configuration with which it is possible to remove a reaction layer so that roughness is not generated on a surface other than the layer to be etched due to adhered/deposited radicals on the surface other than the layer to be etched, in a case in which the radicals are adsorbed on the surface of the layer to be etched, a reaction layer is formed, and the reaction layer is removed, wherein the film structure is treated by repeating: an adsorption step in which activated particles are supplied into a treatment chamber, the activated particles are adsorbed on the surface of the overlayer film to create a compound with the material of the overlayer film, and a reaction product layer is formed; a removal step in which plasma formed by supplying oxygen into the treatment chamber is used to remove deposits including particles that adhered to the surface of the underlayer film, among the activated particles supplied into the treatment chamber; and a desorption step in which a sample to be treated, which has passed through the adsorption step and the removal step, is heated, and the reaction product layer on the overlayer film is desorbed and removed.

IPC Classes  ?

15.

PATTERN MEASUREMENT METHOD, MEASUREMENT SYSTEM, AND COMPUTER-READABLE MEDIUM

      
Application Number JP2018041036
Publication Number 2020/095346
Status In Force
Filing Date 2018-11-05
Publication Date 2020-05-14
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Doi Ayumi
  • Suzuki Makoto
  • Bizen Daisuke
  • Mizutani Shunsuke

Abstract

The present disclosure pertains to a method, a system, and a computer-readable medium for highly precisely measuring the depth of a recess formed in a sample even when, inter alia, the material or pattern density of the sample differs. In order to achieve the purpose described above, there are proposed a method, a measurement system, and a non-temporary computer-readable medium for storing program commands that can be executed by a computer system, the method, system, and medium involving: using a measurement tool to acquire an image or a luminance distribution of a region including a recess formed in a sample; extracting a first characteristic of the interior of the recess, and a second characteristic pertaining to the dimensions or area of the recess, from the acquired image or luminance distribution; and inputting the extracted first characteristic and second characteristic to a model that indicates the relationship between the first characteristic, the second characteristic, and a depth index value of the recess to thereby derive the depth index value of the recess.

IPC Classes  ?

  • G01B 15/00 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01L 21/66 - Testing or measuring during manufacture or treatment

16.

AUTOMATED ANALYZER

      
Application Number JP2019039672
Publication Number 2020/095604
Status In Force
Filing Date 2019-10-08
Publication Date 2020-05-14
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Horie Yosuke
  • Ochi Manabu
  • Kawahara Tetsuji
  • Nonaka Kohei
  • Takayama Hiroyuki

Abstract

Provided is an automated analyzer comprising an ultrasonic cleaner capable of obtaining a consistent cleaning effect regardless of the operating temperature environment. This automated analyzer comprises: a dispensing mechanism having a nozzle for dispensing a sample or reagent; an ultrasonic cleaner 26 for cleaning the nozzle; and a control unit 28. The ultrasonic cleaner comprises: a cleaning tank 206; an ultrasonic vibrator 205; and a vibration head 209 that extends from the ultrasonic vibrator to the cleaning tank and has a distal end part that is inserted into the cleaning tank. The control unit inserts the nozzle into the cleaning tank and carries out a heating operation for heating the ultrasonic vibrator by driving the ultrasonic vibrator according to a driving condition different from that for a cleaning operation for cleaning the nozzle by driving the ultrasonic vibrator.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

17.

ELECTROPHORESIS DEVICE

      
Application Number JP2018040041
Publication Number 2020/089958
Status In Force
Filing Date 2018-10-29
Publication Date 2020-05-07
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Matsumura Jin
  • Okuno Ayaka
  • Kimura Ryusuke
  • Anazawa Takashi
  • Fujioka Michiru
  • Sato Wataru
  • Nakazawa Taro
  • Yamazaki Motohiro

Abstract

The present invention addresses the problem of improving analysis performance of an electrophoresis device. In order to resolve the problem, this electrophoresis device is provided with: a capillary array provided with capillaries, a capillary head that binds one end of the capillaries, an electrode holder that holds an electrode provided at the other end of the capillaries, and a detecting unit provided to the capillaries; a first heating unit for heating the capillaries; and an irradiation detecting unit that irradiates the detecting unit with light and detects fluorescent light generated by a fluorescence labelling sample inside the capillaries, wherein the electrophoreses device is characterized by having a second heating unit for heating the detecting unit.

IPC Classes  ?

18.

CHARGED PARTICLE BEAM DEVICE, AUTOFOCUS PROCESSING METHOD FOR CHARGED PARTICLE BEAM DEVICE, AND DETECTOR

      
Application Number JP2018039624
Publication Number 2020/084729
Status In Force
Filing Date 2018-10-25
Publication Date 2020-04-30
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Nakamura Mitsuhiro
  • Hatano Michio

Abstract

Provided are a charged particle beam device and a detector which enable non-invasive observation of a biochemical sample, without staining or immobilization, with a simple and high observation throughput. The charged particle beam device comprises: an electron optical system; a stage (64); a sample chamber (100) having a first insulating layer (110) that holds a sample (200) and is in contact with the sample (200), and a conductive layer (120) formed on the first insulating layer (110); signal detection circuits (20), (50) that are connected to the conductive layer (120) and detect a current flowing in the conductive layer (120); and a main control unit (14) that controls the electron optical system and the stage (64). The main control unit (14) irradiates the conductive layer (120) of the sample chamber (100) placed on the stage (64) with an electron beam (12) from the electron optical system, and detection signals from the signal detection circuits (20), (50) are input.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/18 - Vacuum locks
  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01J 37/244 - Detectors; Associated components or circuits therefor
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams

19.

BIOCHEMICAL CARTRIDGE AND BIOCHEMICAL ANALYSIS DEVICE

      
Application Number JP2018038591
Publication Number 2020/079767
Status In Force
Filing Date 2018-10-17
Publication Date 2020-04-23
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Fujioka Michiru
  • Adachi Sakuichiro
  • Hiratsuka Toshiaki
  • Terakado Asami

Abstract

Several kV of applied voltage are required to take a biological sample and, as a result, EWOD electrodes, etc., are damaged and electrodes cannot be reused for droplet movement. The present invention addresses the issue of providing: a biochemical cartridge that can be used a plurality of times for taking biological samples using a capillary array, etc.; and a biochemical analysis device using the biochemical cartridge. In order to solve this issue, this biochemical cartridge is characterized by having provided therein: a channel through which samples are transported; a plurality of electrodes that are arranged upon the channel, along the direction that samples are transported, and are provided for transporting the samples; and openings facing the plurality of electrodes arranged on the downstream side of the channel.

IPC Classes  ?

  • G01N 35/08 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a stream of discrete samples flowing along a tube system, e.g. flow injection analysis
  • G01N 1/00 - Sampling; Preparing specimens for investigation
  • G01N 37/00 - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES - Details not covered by any other group of this subclass

20.

BIOCHEMICAL CARTRIDGE AND BIOCHEMICAL ANALYSIS DEVICE

      
Application Number JP2018039027
Publication Number 2020/079834
Status In Force
Filing Date 2018-10-19
Publication Date 2020-04-23
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Fujioka Michiru
  • Adachi Sakuichiro

Abstract

In order to enable a biological sample to be taken at a position at a prescribed distance from an EWOD electrode, this biochemical cartridge comprises: a droplet channel having a plurality of EWOD electrodes that transport sample droplets being droplets including the biological sample, said EWOD electrodes being arranged in a direction in which the sample droplets are transported; and a sample intake unit at a position at which the biological sample in the sample droplet is taken in, said position being at a prescribed distance from an EWOD electrode at an end of the droplet channel. The biochemical cartridge is characterized by: the sample intake unit being at a position that is lower than the droplet channel having the EWOD electrode at the end thereof, when the biological sample is taken; and there being a smooth continuation between the droplet channel and the sample intake unit.

IPC Classes  ?

  • G01N 35/08 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a stream of discrete samples flowing along a tube system, e.g. flow injection analysis
  • G01N 1/00 - Sampling; Preparing specimens for investigation
  • G01N 37/00 - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES - Details not covered by any other group of this subclass

21.

ALIGNMENT SYSTEM AND POSITION ADJUSTING SEAL

      
Application Number JP2019041027
Publication Number 2020/080508
Status In Force
Filing Date 2019-10-18
Publication Date 2020-04-23
Owner
  • HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
  • RIKEN (Japan)
Inventor
  • Maeda Yaku
  • Hoshino Yoshinobu
  • Toyooka Kiminori

Abstract

The present invention implements an alignment system which has high reproducibility of position information at the time of re-observation, and enables a user to efficiently and easily re-observe an area of interest. In the alignment system which enables correlated observation between an image capturing device (104) and a charged particle ray device (100), a plurality of position adjustment points are set on a sample carrier in a state where the samples are placed. An alignment control unit (153) obtains a conversion matrix for converting a coordinate system of the image capturing device and a coordinate system of the charged particle ray device, on the basis of position information and magnification for each of the plurality of position adjustment points when a first image is captured by the image capturing device and position information and magnification for each of the plurality of position adjustment points when observation is performed by the charged particle ray device, and converts a field of view designated for the first image to field-of-view information about the charged particle ray device by using the conversion matrix.

IPC Classes  ?

  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

22.

CHARGED PARTICLE BEAM SYSTEM

      
Application Number JP2018037738
Publication Number 2020/075241
Status In Force
Filing Date 2018-10-10
Publication Date 2020-04-16
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor Tamaki, Hirokazu

Abstract

A control system for this charged particle beam system obtains a first factor by performing a multiresolution analysis using a wavelet transformation or a discrete wavelet transformation on at least a part of an image or a signal obtained by a charged particle beam device. The control system obtains a second factor by performing any of maximum value calculation, numerical calculation corresponding to a designated order among the orders of magnitude, fitting to a histogram, average value calculation, and summation calculation on at least a part of the first factor or the absolute value of the first factor.

IPC Classes  ?

  • H01J 37/21 - Means for adjusting the focus
  • H01J 37/22 - Optical or photographic arrangements associated with the tube

23.

FUEL BATTERY CELL

      
Application Number JP2018038029
Publication Number 2020/075285
Status In Force
Filing Date 2018-10-12
Publication Date 2020-04-16
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Sakuma Noriyuki
  • Sasago Yoshitaka
  • Sugimoto Aritoshi
  • Mise Nobuyuki
  • Watanabe Seiichi

Abstract

The present invention provides a highly reliable fuel battery cell such that power generation efficiency for the fuel battery cell is improved and such that an electrode and an electrolyte film are not susceptible to damage. The fuel battery cell includes: a support substrate (2,3) which has a region provided with a support part that has a reticulated pattern in a plan view; a first electrode 4 on the support substrate; an electrolyte film 5 on the first electrode; and a second electrode 6 on the electrolyte film. The first electrode includes: a first thin film electrode 4A that is formed to cover at least the region; and a first reticulated electrode 4B provided corresponding to the support part and connected to the first thin film electrode, the first reticulated electrode having a greater thickness than the first thin film electrode and a reticulated shape in a plan view.

IPC Classes  ?

  • H01M 8/1286 - Fuel cells applied on a support, e.g. miniature fuel cells deposited on silica supports
  • H01M 4/86 - Inert electrodes with catalytic activity, e.g. for fuel cells
  • H01M 4/92 - Metals of platinum group
  • H01M 8/12 - Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte

24.

DICHROIC MIRROR ARRAY AND LIGHT DETECTING DEVICE

      
Application Number JP2018038131
Publication Number 2020/075293
Status In Force
Filing Date 2018-10-12
Publication Date 2020-04-16
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Anazawa Takashi
  • Inaba Ryoji
  • Yamamoto Shuhei
  • Nakazawa Taro

Abstract

A dichroic mirror array according to the present disclosure is provided with, with respect to a right-handed XYZ cartesian coordinate system: a first group in which m (m≥2) dichroic mirrors DA1-DAm are arranged parallel to each other in the positive direction of the X-axis; and a second group in which n (n≥2) dichroic mirrors DB1-DBn are arranged parallel to each other in the negative direction of the X-axis. Incident surfaces of DA1-DAm and DB1-DBn are perpendicular to the XZ plane. In addition, the slopes of straight lines, formed by projecting the normal lines of the incident surfaces of DA1-DAm onto the XZ plane, are negative, and the slopes of straight lines, formed by projecting the normal lines of the incident surfaces of DB1-DBn onto the XZ plane, are positive.

IPC Classes  ?

  • G01J 3/36 - Investigating two or more bands of a spectrum by separate detectors
  • G01N 21/64 - Fluorescence; Phosphorescence
  • G02B 27/10 - Beam splitting or combining systems

25.

AUTOMATED ANALYZER

      
Application Number JP2019037098
Publication Number 2020/071163
Status In Force
Filing Date 2019-09-20
Publication Date 2020-04-09
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Fukushi Yudai
  • Mori Takamichi

Abstract

This automated analyzer 100 comprises: a sample probe 11a for dispensing a substance to be dispensed into a plurality of reaction vessels 2 for causing a sample to be analyzed to react with a reagent, a measurement unit (light source 4a, spectrophotometer 4, and control device 21) for measuring a reaction liquid produced from the sample and reagent in a reaction vessel 2, a cleaning tank for probe cleaning, and a control device 21 for controlling the operation of the probe, measurement unit, and cleaning tank 13. The cleaning tank 13 comprises a cleaning pool 36 for storing cleaning water for immersing and cleaning the probe and a drying tank 37 for sucking up cleaning water having adhered to the surface of the probe. The control device 21 causes the drying tank 37 to suck up the cleaning water on the surface of the probe after the probe has been immersed in the cleaning water of the cleaning water pool 36 and cleaned. As a result, it is possible to reduce the amount of cleaning water used to clean the probe.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

26.

THERMAL CYCLER AND REAL-TIME PCR DEVICE HAVING SAME

      
Application Number JP2018036250
Publication Number 2020/065917
Status In Force
Filing Date 2018-09-28
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Shimizu Hayato
  • Yamagata Toshiki
  • Makino Yoko
  • Kumazaki Nobutaka

Abstract

A thermal cycler 160 comprises: a support block 3 that supports a reaction vessel 2, a Peltier element 5 that is thermally coupled to the support block 3 and adjusts the temperature of a sample solution 1 held in the reaction vessel 2 by heating and cooling the support block 3, a temperature sensor 4 for measuring the temperature of the support block 3, and a temperature adjustment unit 230 that controls current and voltage supplied to the Peltier element 5 in accordance with the temperature of the support block 3 measured by the temperature sensor 4, wherein the reaction vessel 2 having an opening at an upper part 21 and a conical portion tapering down to the lower part is employed, and the Peltier element 5 is arranged so as to be parallel to the portion of a conical generatrix 23 in the reaction vessel 2.

IPC Classes  ?

  • C12M 1/00 - Apparatus for enzymology or microbiology

27.

PATTERN SHAPE EVALUATION DEVICE, PATTERN SHAPE EVALUATION SYSTEM, AND PATTERN SHAPE EVALUATION METHOD

      
Application Number JP2019021368
Publication Number 2020/066128
Status In Force
Filing Date 2019-05-29
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Shintani, Atsuko
  • Kawasaki Takahiro
  • Hasumi Kazuhisa
  • Ikota Masami
  • Kawada Hiroki

Abstract

The present invention suppresses an influence of noise caused by a device or an environment, and evaluates line edge roughness or a line width roughness. To this end, an averaged signal profile 405 is obtained from a moving average of S pixels (S is an integer larger than 1) in a Y-direction on a signal profile that represents an X-directional secondary electronic signal volume distribution for prescribed Y coordinates obtained from a top-down image, an edge position 406 of a line pattern is extracted on the basis of the averaged signal profile, and the height of the noise floor is calculated on the basis of first power spectrum density 407 of LER data or LWR data based on the extracted edge position and a second power spectrum density 409 of a rectangular window function corresponding to the moving average of the S pixels.

IPC Classes  ?

  • G01B 15/04 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
  • G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
  • H01L 21/66 - Testing or measuring during manufacture or treatment

28.

REACTION VESSEL FOR AUTOMATED ANALYZER

      
Application Number JP2019024425
Publication Number 2020/066165
Status In Force
Filing Date 2019-06-20
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Matsuoka Yuya
  • Takada Eiichiro

Abstract

Provided is a reaction vessel that makes it possible to measure the amount of light from a reaction liquid without degrading a function for keeping the reaction vessel at a prescribed temperature. A reaction vessel for an automated analyzer according to an embodiment of this invention has a cylindrical shape around a first axis. The overall length of the reaction vessel in the first axis direction is longer than the overall length in the direction of a second axis perpendicular to the first axis and the overall length in the direction of a third axis perpendicular to the first axis and second axis. An opening for dispensing liquid is provided at a portion of the reaction vessel at one end in the first axis direction. The reaction vessel has a first flat surface that has one side that extends in the first axis direction from a portion of the reaction vessel at the other end in the first axis direction and another side that extends in the second axis direction. At a portion of the reaction vessel opposing the first flat surface in the third axis direction, the reaction vessel has a second flat surface that is roughly parallel to the first flat surface. Lateral surface side portions of the first and second flat surfaces are formed so as to bend toward the outside of the reaction vessel. The lengths of the first and second flat surfaces in the first axis direction are less than half the overall length in the first axis direction.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

29.

AUTOMATIC ANALYSIS SYSTEM

      
Application Number JP2019025684
Publication Number 2020/066189
Status In Force
Filing Date 2019-06-27
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Sasaki, Nobuhiko
  • Sawada, Takanori
  • Shimamori, Toshiyuki
  • Yabutani, Chie

Abstract

According to the present invention, a chemical dispensing mechanism 115 is provided with a liquid surface sensor for detecting the liquid surface of a chemical. A chemical container 122 is mounted on a chemical disk 116. A computer 132 has a calculation control unit comprising a control unit 140 and a calculation unit 141 and generating a control signal for controlling the operation of the chemical dispensing mechanism 115. The calculation control unit performs a first raising operation, in which a chemical stored in the chemical container 122 is suctioned by the chemical dispensing mechanism 115 and the chemical dispensing mechanism is then raised up to a first bubble detection position, determines whether a liquid surface is present by acquiring the detection result of the liquid surface sensor, and outputs an alert indicating the presence of a bubble on the liquid surface when the liquid surface has been determined to be absent. The first bubble detection position is the position at which the tip section of a dispensing nozzle of the chemical dispensing mechanism 115 remains inside the liquid when there are no bubbles present on the liquid surface, and is exposed from the inside of the liquid when there are bubbles present on the liquid surface.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

30.

TEST METHOD AND DISPENSING DEVICE

      
Application Number JP2019030626
Publication Number 2020/066300
Status In Force
Filing Date 2019-08-05
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Nojima Akihiro
  • Mori Takamichi
  • Yamazaki Isao
  • Kawahara Tetsuji
  • Aruga Youichi

Abstract

The purpose of this invention is to provide a test method that can efficiently execute a step of evaluating the surface condition of a dispensing probe of a dispensing device. In this test method, using a first dispensing probe, a first solution in which a pigment has been dissolved is dispensed into a first container in advance and a second solution in which a pigment has not been dissolved is dispensed into a second container in advance. Using a second dispensing probe, the first solution and the second are drawn and discharged, respectively. Afterward, the surface condition of the second dispensing probe is evaluated by finding the amount of pigment recovered by the second solution (see fig. 2).

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

31.

ELECTROLYTE MEASURING DEVICE

      
Application Number JP2019034356
Publication Number 2020/066472
Status In Force
Filing Date 2019-09-02
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor Ozawa Satoshi

Abstract

Provided is an electrolyte measuring device capable of highly accurately detecting malfunction in the device. This electrolyte measuring device is provided with: an ion-selective electrode to which an ionic solution containing ions is supplied; a reference electrode; a measuring unit for measuring the electric potential difference between the ion-selective electrode and the reference electrode; and an electric current measuring unit for measuring an electric current flowing through the reference electrode.

IPC Classes  ?

  • G01N 27/26 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by using electrolysis or electrophoresis
  • G01N 27/416 - Systems

32.

AUTOMATED ANALYZER

      
Application Number JP2019034915
Publication Number 2020/066523
Status In Force
Filing Date 2019-09-05
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Muramatsu Yoshiki
  • Kawahara Tetsuji

Abstract

The present invention provides an automated analyzer that is highly maintainable and reliable by eliminating dripping from and drop adhesion to a probe distal end when a dispensing probe is being replaced. This automated analyzer comprises a probe 120 that is replaceably attached to an arm part 206 of a dispensing mechanism, a tube 201 that is connected to the probe and forms a dispensing flow path, a syringe 121 that is connected to the tube and discharges/draws out system water into/from the dispensing flow path, and a controller 181. Before the probe is removed from the arm part, the controller causes the syringe to draw the system water out from the dispensing flow path such that the system water is removed from the probe.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

33.

THERMAL FIELD EMISSION ELECTRON SOURCE AND ELECTRON BEAM APPLICATION DEVICE

      
Application Number JP2018035308
Publication Number 2020/065703
Status In Force
Filing Date 2018-09-25
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Matsunaga Soichiro
  • Katagiri Souichi
  • Kasuya Keigo
  • Takei Aki
  • Kawano Hajime
  • Doi Takashi

Abstract

The present invention stabilizes the amount of the electron beam emitted from a thermal field emission electron source. Accordingly, the thermal field emission electron source has: a needle-shaped electron source 301; a metal wire 302 to which the electron source is fixed and which heats the electron source; a stem 303 fixed to an insulator and energizing the meal wire; a first electrode 304 having a first opening portion 304a and disposed so that the end of the electron source is projected from the first opening portion; a second electrode 306 having a second opening portion 306a; and an insulating body 307 for positioning the first electrode and the second electrode so that the central axis of the first opening portion and the central axis of the second opening portion coincide with each other and electrically insulating the first electrode from the second electrode. The thermal field emission electron source is provided with a structure for reducing the amount of a gas emitted by the heating of the first electrode.

IPC Classes  ?

34.

SAMPLE PROCESSING DEVICE AND APPARATUS

      
Application Number JP2018035825
Publication Number 2020/065803
Status In Force
Filing Date 2018-09-27
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Nagaoka Yoshihiro
  • Sato Wataru
  • Yamamoto Shuhei
  • Nakazawa Taro
  • Fujioka Michiru
  • Okuno Ayaka

Abstract

In order to introduce a reagent with little residual liquid amount and enable fluidic manipulation to be carried out by deformation of an elastic film, a sealed sample processing device is configured to include: a reagent storing part 80 which comprises a bonding part bonding an upper film and a lower film and provided around a storage space for storing a reagent between the upper film and lower film; an analysis chip 10 which has a lower side channel through which a liquid flows on the lower side and an upper side channel through which a liquid flows on the upper side; and an elastic film 20 which seals the lower side of the analysis chip. At least a portion of the lower film of the reagent storing part 80 is bonded to the upper side of the analysis chip, with a removed part, where a portion of the lower film is removed, being provided over the upper side channel, the bonding part has a low strength bonding portion where at least a portion of the area between the removed part and the storage space has a weaker bonding strength than the other portions, and both ends of the upper side channel are in communication with different lower side channels.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • B81B 3/00 - Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
  • G01N 37/00 - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES - Details not covered by any other group of this subclass

35.

AUTOMATED ANALYZER AND CLEANING METHOD

      
Application Number JP2019026299
Publication Number 2020/066198
Status In Force
Filing Date 2019-07-02
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Fukaya Masashi
  • Hirano Masaaki
  • Yasui Akihiro

Abstract

In this invention, there are cleaning positions 25a, 25b, 25c where cleaning tanks 19, 20, 21 discharge cleaning water onto the surfaces of nozzles 10, 12, 14 and drying positions 26a, 26b, 26c where the cleaning water adhered to the surfaces of the nozzles 10, 12, 14 is sucked up. During movement from the cleaning positions 25a, 25b, 25c for the nozzles 10, 12, 14 to the drying positions 26a, 26b, 26c for the nozzles 10, 12, 14, a control device 24 causes system water to be discharged from the nozzles 10, 12, 14 for a first time, and during the sucking up of the cleaning water on the surfaces of the nozzles 10, 12, 14 at the drying positions 26a, 26b, 26c, the control device 24 causes the system water to be discharged from the nozzles 10, 12, 14 for a second time. As a result, it is possible to effectively remove adhered water drops during nozzle cleaning.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

36.

AUTOMATED ANALYSIS DEVICE

      
Application Number JP2019033908
Publication Number 2020/066449
Status In Force
Filing Date 2019-08-29
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Yokota Yuki
  • Hamasaki Koshin
  • Yamashita Yoshihiro

Abstract

Provided is an automated analysis device which makes use of an existing sensor to measure a quantity of liquid in a container, and which is capable of detecting a flow passage abnormality, including failure of a solenoid valve or a pressure changing unit. This automated analysis device operates a syringe 103, a first solenoid valve 104, and a second solenoid valve 105, to implement prescribed suction, ejection, and discharge operations in a container 101, a drainage unit 108, and flow passage systems 113, 114, and determines the presence or absence of an abnormality in the flow passage systems on the basis of a quantity of liquid measured by a sensor 102.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

37.

SAMPLE TRANSPORTING DEVICE, SYSTEM AND METHOD

      
Application Number JP2019037176
Publication Number 2020/066965
Status In Force
Filing Date 2019-09-24
Publication Date 2020-04-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Shiga Yuichiro
  • Onizawa Kuniaki

Abstract

In sample transporting devices, the operation sound of a belt conveyor and the driving sound of a drive motor are caused by operating a transportation line when transporting samples, and reducing the driving sound and operation sound is required. In the present invention, a detection signal of the detection sensor 309 is detected by a detection unit 310, and a control unit 111 performs controlling to change the current value and the driving frequency of a belt driving motor 304 of a transporting line 301 and change the driving torque and the driving rotary speed of the transporting line on the basis of the amount and number of samples transported by a belt 303, wherein the amount and number of samples transported by the belt can be obtained by the detection signal or a sample amount measured by a sample transporting system. Accordingly, noise reduction is achieved by driving the belt driving motor under suitable conditions according to the amount and number of the samples transported by the transporting line, and reducing the operation sound of the belt driving motor or mechanisms and the like.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

38.

LIQUID DROPLET EJECTION DEVICE

      
Application Number JP2019037859
Publication Number 2020/067289
Status In Force
Filing Date 2019-09-26
Publication Date 2020-04-02
Owner
  • THE UNIVERSITY OF TOKYO (Japan)
  • HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kazoe Yutaka
  • Kitamori Takehiko
  • Shimizu Yusuke
  • Terui Yasushi

Abstract

Provided is a liquid droplet ejection device with which it is possible to introduce a sample into an analysis apparatus so that highly precise analysis can be performed even if there is a very small liquid sample. This liquid droplet ejection device 10 comprises: a first flow path C1, which is formed along a first direction D1 and in which a liquid flows; a second flow path C2 and a third flow path C3, which are connected to an outlet of the first flow path and through which a gas flows; a fourth flow path C4, which is connected to the outlet of the first flow path, an outlet of the second flow path, and an outlet of the third flow path and is formed along the first direction, and in which the liquid and the gas flow; a fifth flow path C5 and a sixth flow path C6, which are connected to an outlet of the fourth flow path and in which the gas flows; and a seventh flow path C7, which is connected to the outlet of the fourth flow path, an outlet of the fifth flow path, and an outlet of the sixth flow path, is formed along the first direction, has a width greater than that of the fourth flow path, and in which the liquid and the gas flow.

IPC Classes  ?

  • G01N 1/00 - Sampling; Preparing specimens for investigation
  • B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 37/00 - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES - Details not covered by any other group of this subclass

39.

CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2018035048
Publication Number 2020/059114
Status In Force
Filing Date 2018-09-21
Publication Date 2020-03-26
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Sekiguchi Yoshifumi
  • Imamura Shin
  • Mizutani Shunsuke
  • Hoque Shahedul
  • Ikeda Uki

Abstract

Provided is a charged particle beam device using a light guide capable of enhancing light utilization efficiency. The charged particle beam device is provided with: a scintillator 10 which emits light when a charged particle beam is incident thereon; a light receiving element 12; and a detector 16 having a light guide 11 for guiding the light generated by the scintillator 10 to the light receiving element 12. The light guide 11 is provided with: an incident plane 11a disposed opposite a light emitting plane of the scintillator 10 and receiving the light emitted by the scintillator 10; an exit plane 11b disposed opposite the light receiving element 12 and having light exit therefrom; and a reflecting plane 11c1 opposing the incident plane 11a and disposed at an angle with respect to the incident plane 11a so as to reflect the light incident from the incident plane 11a toward the exit plane 11b. The exit plane 11b is smaller than the incident plane 11a, and a slope 11d opposing the reflecting plane 11c1 and disposed at an angle with respect to the incident plane 11a is provided between the incident plane 11a and the exit plane 11b.

IPC Classes  ?

  • H01J 37/244 - Detectors; Associated components or circuits therefor

40.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2019024692
Publication Number 2020/059231
Status In Force
Filing Date 2019-06-21
Publication Date 2020-03-26
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Yamashita Taichiro
  • Okusa Takenori
  • Sakairi Susumu

Abstract

Provided is an automatic analysis device that has a simple structure and can be miniaturized. The automatic analysis device according to the present disclosure comprises: a reagent tank that holds a reagent container that contains a reagent; and a lid opening/closing device including a lid opening/closing member configured to be movable in a first direction parallel to a vertical direction and a second direction perpendicular to the first direction. The lid opening/closing member is characterized by: integrally comprising a first member for opening a lid of the reagent container and a second member for closing the lid; being configured to be movable between a first position and a second position, the first position located above the reagent container and the second position located below the first position in the first direction such that the bottom surface of the lid opening/closing member comes into contact with the reagent container; being configured to be movable between the second position and a third position that is away from the second position in the second direction; opening the lid by means of the first member when moving from the second position to the third position; and closing the lid by means of the second member when moving from the third position to the second position.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

41.

ANALYSIS DEVICE HAVING LIQUID CHROMATOGRAPH, AND LIQUID CHROMATOGRAPH ANALYSIS METHOD

      
Application Number JP2019029082
Publication Number 2020/059290
Status In Force
Filing Date 2019-07-24
Publication Date 2020-03-26
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Matsuoka Shinya
  • Sugime Takayuki
  • Ebihara Daisuke

Abstract

Through the present invention, an analysis device having a liquid chromatograph, and a liquid chromatograph analysis method are realized, whereby it is possible to avoid a condition in which a plurality of separation columns reach the end of their service life and a plurality of streams become unusable at the same time, and to suppress device stoppage or a significant reduction in throughput. In the present invention, a control unit determines whether a condition exists in which there are no usable streams among streams 1, 2, and 3, and when there is no usable stream, the control unit skips sample introduction in the cycle. When there is one usable stream in the cycle, the stream is used. When there are a plurality of usable streams in the cycle, the stream having the smallest stream number is used when there are a plurality of streams having the smallest remaining number of uses of a separation column. When there is one stream having the smallest remaining number of uses of the separation column, the stream to which the separation column having the smallest remaining number of uses is connected is used.

IPC Classes  ?

  • G01N 30/86 - Signal analysis
  • G01N 27/62 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electric discharges, e.g. emission of cathode
  • G01N 30/32 - Control of physical parameters of the fluid carrier of pressure or speed
  • G01N 30/46 - Flow patterns using more than one column
  • G01N 30/72 - Mass spectrometers

42.

AUTOMATED ANALYZER

      
Application Number JP2019025683
Publication Number 2020/054180
Status In Force
Filing Date 2019-06-27
Publication Date 2020-03-19
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Setomaru, Takeshi
  • Mishima, Hiroyuki
  • Suenari, Tsukasa

Abstract

Provided is an automated analyzer for clinical testing that makes it possible to reduce the costs, and the like, associated with the handling of a plurality of exterior structural components necessary for various device configurations corresponding to a single-module method or module-assembly method. This automated analyzer (1) is configured from a single module or a combination of a plurality of modules. Each module is selected from a plurality of types of modules varying by specifications and/or analysis types. Each module may be, for example, a biological analysis module (for example, analysis module 2C) or an immunity analysis module (for example, analysis module 2D). The automated analyzer (1) has a universalized cover member (for example, exterior structural component 3g) that can be attached to and removed from a lateral surface of any of the plurality of modules. Each of the lateral surfaces of the modules has an attachment part at a position corresponding to the position of an attachment component of the cover member.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

43.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2019032542
Publication Number 2020/054336
Status In Force
Filing Date 2019-08-21
Publication Date 2020-03-19
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Hiroki Kohei
  • Yasui Akihiro
  • Mishima Hiroyuki

Abstract

Provided is an automatic analysis device that can suppress concentration of a reagent made to react with a specimen. This automatic analysis device is provided with: a reagent container which accommodates a reagent and which has attached thereto a perforable lid; a perforation unit for perforating the lid; and a reagent suction nozzle that is inserted into a hole formed by perforation and that sucks up the reagent. The automatic analysis device is characterized by being further provided with a state storage unit that stores the state as to whether the reagent container is in an unused state or in a used state, and a state update unit that, when the lid is perforated by the perforation unit while the reagent container is in an unused state, updates the state stored in the state storage unit to the used state.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

44.

ELECTRON BEAM DEVICE

      
Application Number JP2018033669
Publication Number 2020/053967
Status In Force
Filing Date 2018-09-11
Publication Date 2020-03-19
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Shouji Minami
  • Tsuno Natsuki
  • Agemura Toshihide

Abstract

pixelpixel, the device control unit sets a sampling frequency fpixelsampshotshot of optical pulse irradiations per unit pixel time by the unit pixel time.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams

45.

MIRROR ELECTRON INSPECTION DEVICE

      
Application Number JP2018033745
Publication Number 2020/053979
Status In Force
Filing Date 2018-09-12
Publication Date 2020-03-19
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Yamaoka Masahiro
  • Hasegawa Masaki
  • Sugaya Masakazu
  • Furukawa Akihiro
  • Onuki Katsunori

Abstract

Provided is a mirror electron inspection device that is a defect inspection device for detecting defects of, for example, a semiconductor substrate and evaluates the temperature dependence of the defects in vacuum. A heating stage (6) is mounted through an electrically and thermally insulated fixing member (206) on a moving stage (7) installed in a sample chamber of the device, wherein said heating stage (6) has: a heater (heat generating body) (201) that is electrically insulated and covered with an insulator (202); a heater base (203) mounted with a sample (5); and a heat shield plate serving also as an equipotential surface (204). A heater power supply (12) is connected to the heater (heat generating body) (201). A sample application power supply (11) is connected to the heater base (203). The heater power supply (12) and the sample application power supply (11) are electrically isolated from each other.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/29 - Reflection microscopes

46.

AUTOMATED ANALYZER

      
Application Number JP2019024952
Publication Number 2020/054172
Status In Force
Filing Date 2019-06-24
Publication Date 2020-03-19
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Funakoshi Sunao
  • Okusa Takenori
  • Isoshima Nobuyuki
  • Yokoyama Koki

Abstract

Provided is an automated analyzer comprising a temperature regulator that can be made more compact in size while maintaining high-precision temperature regulation. In a temperature-regulating unit (20) of the automated analyzer, a first chemical reservoir (1) is constituted by a large-diameter spiral-shaped pipe, and a second chemical reservoir (2) is constituted by a large-diameter chemical reservoir container. The first chemical reservoir (1), which is positioned upstream of the second chemical reservoir (2), has an internal capacity that is set so as to be greater than the volume of a single discharge of each of syringe pumps (29, 30, 31), and the second chemical reservoir (2) also has an internal capacity (volume) that is set so as to be greater than the volume of a single discharge of each of the respective syringe pumps (29, 30, 31).

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

47.

SPECTRAL CALIBRATION DEVICE AND SPECTRAL CALIBRATION METHOD

      
Application Number JP2019031581
Publication Number 2020/054292
Status In Force
Filing Date 2019-08-09
Publication Date 2020-03-19
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kawaguchi Yohei
  • Chalkidis George
  • Yasuda Tomohiro

Abstract

Provided are a spectral calibration device and a spectral calibration method that can highly accurately carry out spectral calibration even when peaks emerge simultaneously among fluorescent pigments. This spectral calibration device is for calculating a color conversion matrix for use in a color conversion process, and is provided with: a spectroscopy signal acquisition unit that acquires a spectroscopy signal of fluorescent light detected over time; a candidate calculation unit that calculates, on the basis of the spectroscopy signal, a color conversion matrix candidate for each of parameter values which are dependent on the frequency of simultaneous emergences of the fluorescent peaks of the fluorescent pigments; and a selection unit that selects a color conversion matrix on the basis of an evaluation value calculated for each of the candidates.

IPC Classes  ?

48.

ELECTROLYTE CONCENTRATION MEASUREMENT DEVICE

      
Application Number JP2019034355
Publication Number 2020/054473
Status In Force
Filing Date 2019-09-02
Publication Date 2020-03-19
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kishioka Atsushi
  • Ono Tetsuyoshi

Abstract

This electrolyte concentration measurement device is provided with: an ion selective electrode to which a liquid is supplied; a reference electrode serving as a reference of an electric potential; an electric potential measurement unit that acquires the electric potential of the ion selective electrode; a concentration calculation unit that calculates the concentration of ions included in the liquid from the electric potential acquired by the electric potential measurement unit; an electric potential monitoring unit that continuously monitors the electric potential of the ion selective electrode and generates an electric potential response curve; and a timing signal acquisition unit that acquires a timing signal relating to a timing of each operation; and an electric potential response curve analysis unit that detects an abnormality sign of the device on the basis of a relationship between the electric potential response curve and the timing signal.

IPC Classes  ?

  • G01N 27/26 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by using electrolysis or electrophoresis
  • G01N 27/333 - Ion-selective electrodes or membranes
  • G01N 27/416 - Systems

49.

CELL ANALYSIS APPARATUS AND CELL ANALYSIS METHOD

      
Application Number JP2018032823
Publication Number 2020/049642
Status In Force
Filing Date 2018-09-05
Publication Date 2020-03-12
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Hisada Akiko
  • Oominami Yuusuke
  • Matsumoto Yuji
  • Tsuchida Takaaki
  • Motoi Noriko
  • Fujima Mizuho

Abstract

The present invention rapidly and very accurately quantitatively discriminates cancer using a cellular sample, e.g., a tissue fragment or smear. More specifically, provided are a method and apparatus for analyzing the growth activity or malignancy of cells by measuring the signal intensity for phosphorus, or the signal intensity for phosphorus and sulfur, of the cells.

IPC Classes  ?

  • C12Q 1/02 - Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions involving viable microorganisms

50.

CAPILLARY ARRAY UNIT

      
Application Number JP2019034342
Publication Number 2020/050193
Status In Force
Filing Date 2019-09-02
Publication Date 2020-03-12
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Aritome Katsuhiro
  • Ooura Takeshi
  • Kariya Shunichi

Abstract

Provided is a capillary array unit configured for easy attachment/detachment. A capillary array unit comprises: a capillary; a load header provided at one end of the capillary; a capillary head provided at the other end of the capillary; a detection unit provided to a part of the capillary; and a holding body for holding the capillary. The holding body is provided with a first holding part for holding the capillary in a curved shape, a second holding part for holding the capillary in a straight line, and a guide for moving the second holding part in a prescribed direction.

IPC Classes  ?

51.

DISPLAY DEVICE, INFORMATION TERMINAL, PERSONAL INFORMATION PROTECTION METHOD, PROGRAM, AND RECORDING MEDIUM WHEREON PROGRAM IS RECORDED

      
Application Number JP2019033610
Publication Number 2020/050109
Status In Force
Filing Date 2019-08-28
Publication Date 2020-03-12
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Nishida Masaharu
  • Ohtake Hitoshi
  • Yamazaki Isao

Abstract

Provided are a program and personal information protection method which are executed by a system which is operated by a medical practitioner, said program and method comprising: a display process of causing a monitor part 2 to display an examination result screen 3 including personal information which identifies a subject; an identification process of identifying the personal information in the examination result screen 3 which is displayed in the display process; and an invalidation process of invalidating the personal information identified in the identification process in a captured image which includes the examination result screen 3. Instances of personal information being displayed in error to outside users are thus reduced in comparison to the prior art, and sharing of examination result information is implemented smoothly.

IPC Classes  ?

  • G06F 21/62 - Protecting access to data via a platform, e.g. using keys or access control rules
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G06F 21/84 - Protecting input, output or interconnection devices output devices, e.g. displays or monitors
  • G16H 10/00 - ICT specially adapted for the handling or processing of patient-related medical or healthcare data

52.

ELECTRON SOURCE, METHOD FOR MANUFACTURING SAME, AND ELECTRON BEAM DEVICE IN WHICH SAME IS USED

      
Application Number JP2018031497
Publication Number 2020/044389
Status In Force
Filing Date 2018-08-27
Publication Date 2020-03-05
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kusunoki Toshiaki
  • Hashizume Tomihiro
  • Kasuya Keigo
  • Arai Noriaki
  • Seino Hiromitsu
  • Kaneda Minoru
  • Ohshima Takashi
  • Matsunaga Soichiro

Abstract

The present invention is an electron source provided with a columnar tip (4) of a hexaboride single crystal, a metal tube (12) for holding the columnar tip (4) of a hexaboride single crystal, and a filament (18) connected to the metal tube (12) at the center portion, wherein the electron source is characterized in that a portion of the columnar tip (4) of a hexaboride single crystal beyond the portion held by the metal tube (12) is formed as a cone shape, the distal end portion of the cone shape has a (310) crystal face, and Schottky electrons are released from the (310) crystal face. The present invention makes it possible to provide a novel electron source provided with a large current density and long-term stability of the released current and monochromaticity.

IPC Classes  ?

  • H01J 1/148 - Solid thermionic cathodes characterised by the material with compounds having metallic conductive properties, e.g. lanthanum boride, as an emissive material
  • H01J 1/15 - Cathodes heated directly by an electric current
  • H01J 9/04 - Manufacture of electrodes or electrode systems of thermionic cathodes
  • H01J 37/06 - Electron sources; Electron guns

53.

CONCAVE DIFFRACTION GRATING, METHOD FOR PRODUCTION THEREFOR, AND OPTIC DEVICE

      
Application Number JP2019017442
Publication Number 2020/044658
Status In Force
Filing Date 2019-04-24
Publication Date 2020-03-05
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Aono Takanori
  • Ebata Yoshisada
  • Yaegashi Kenta
  • Matsui Shigeru

Abstract

The present invention provides a concave diffraction grating capable of improved diffraction efficiency by suppressing spherical aberration. The concave diffraction grating is a concave diffraction grating 2 for dispersing and focusing light and comprises sawtooth grating grooves 21 on a concave substrate 24, with the sawtooth grating grooves 21 being unequally spaced. The concave diffraction grating 2 for dispersing and focusing light is formed by preparing a planar diffraction grating with a sawtooth shape which is formed on a planar substrate by photo-lithography and etching or machining and which forms unequally spaced grating grooves 21, deforming and mounting the planar diffraction grating along a fixed convex substrate to obtain a mold of a concave diffraction grating, and transferring the mold of the concave diffraction grating to the surface of a metal or a resin.

IPC Classes  ?

  • G02B 5/18 - Diffracting gratings
  • G01J 3/18 - Generating the spectrum; Monochromators using diffraction elements, e.g. grating

54.

AUTOMATIC ANALYSIS DEVICE AND METHOD

      
Application Number JP2019026440
Publication Number 2020/044781
Status In Force
Filing Date 2019-07-03
Publication Date 2020-03-05
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Hagiwara Takaaki
  • Yamano Teruhiro
  • Yamazawa Kazunori
  • Sakazume Taku

Abstract

The present invention minimizes the worsening of a measurement turnaround time when a plurality of mixed measurement items having different incubation times are measured using an automatic analysis device. In this invention, after an automatic analysis device receives a sample request (step 5-1), a request analysis unit of a computer of an analysis module acquires the ratio of shortened measurement items among inspection items in a received analysis request (step 5-2). A planning unit of the computer determines an idle cycle from the ratio of shortened measurement items and the number of schedule items (step 5-3) and if the idle cycle is necessary (step 5-4), schedules a shortened measurement idle cycle for, for example, making an incubator available, at a time scheduled for a sample to be measured in advance (step 5-8). As a result, it is possible to use the position of a shortened measurement item during the measurement thereof and reduce waiting for measurement to start.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

55.

ULTRASONIC CLEANER AND AUTOMATED ANALYZER USING SAME

      
Application Number JP2019031124
Publication Number 2020/044998
Status In Force
Filing Date 2019-08-07
Publication Date 2020-03-05
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Nonaka Kohei
  • Takayama Hiroyuki
  • Kawahara Tetsuji

Abstract

The purpose of the invention is to stably operate an ultrasonic vibrator and prevent cleaning liquid from splashing in an ultrasonic cleaner. This ultrasonic cleaner comprises: a cleaning tank 206 for storing cleaning liquid; an ultrasonic vibrator 205; a vibration head 209 having a neck 304 that extends from the ultrasonic vibrator to the cleaning tank and a leading end part 210 that has a cylindrical hole 211 for which the longitudinal direction is the vertical direction; and a first cover 601 that has openings corresponding to the neck and cylindrical hole. The first cover is installed so as to cover the cleaning tank at a height where the first cover is in contact with the liquid surface of the cleaning liquid.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • B08B 3/12 - Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

56.

ION BEAM DEVICE

      
Application Number JP2018031714
Publication Number 2020/044429
Status In Force
Filing Date 2018-08-28
Publication Date 2020-03-05
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Matsubara Shinichi
  • Shichi Hiroyasu
  • Kurata Sayaka
  • Ikota Masami

Abstract

The purpose of the present invention is to provide an ion beam device with which it is possible to efficiently and accurately acquire information regarding the three-dimensional structure of a sample. The ion beam device according to the present invention comprises an ion source capable of generating a plurality of types of ion beams. By repeatedly shaving the sample surface uniformly in the thickness direction of the sample and observing the surface shape, the surface shape at each position in the thickness direction of the sample is obtained (see fig. 1).

IPC Classes  ?

  • H01J 37/08 - Ion sources; Ion guns
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams

57.

ION MILLING DEVICE

      
Application Number JP2018032337
Publication Number 2020/044531
Status In Force
Filing Date 2018-08-31
Publication Date 2020-03-05
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kamoshida Hitoshi
  • Takasu Hisayuki
  • Kamino Atsushi

Abstract

Provided is an ion milling device with which it is possible to enhance ion distribution reproducibility. The ion milling device has: an ion source (1); a sample stage (2) on which a sample (4) that is processed by being irradiated with an unfocused ion beam from the ion source (1) is mounted; and a drive unit (8) which is disposed between the ion source (1) and the sample stage (2) and causes a linear ion beam measurement member (7) extending in a first direction to be moved in a second direction orthogonal to the first direction. In a state in which an ion beam is being output from the ion source (1) under a first irradiation condition, the ion beam measurement member (7) is moved by the drive unit (8) within an ion beam irradiation range, and an ion beam current that flows through the ion beam measurement member (7) due to irradiation of the ion beam measurement member (7) with the ion beam is measured.

IPC Classes  ?

  • H01J 37/30 - Electron-beam or ion-beam tubes for localised treatment of objects

58.

AUTOMATED ANALYZER

      
Application Number JP2019021205
Publication Number 2020/044688
Status In Force
Filing Date 2019-05-29
Publication Date 2020-03-05
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kumagai Takahiro
  • Noda Kazuhiro
  • Sakashita Yukinori

Abstract

When a dispensing tip is imaged from below, liquid adhered to the tip falls downward and makes an imaging mechanism unclean. The present invention comprises a buffer having a hole for holding a tip for dispensing by being penetrated by the same, a probe for dispensing that has a distal end to which the tip is to be attached, an imaging unit for imaging the tip, and a control unit for carrying out control so as to mount the tip on the probe by pressing the probe into the tip while the same is being held by the buffer as a result of the passage of the same through the hole. The imaging unit is disposed so as to image the tip in an orientation facing from the upper side to the lower side in the gravity direction.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

59.

BIOMOLECULE ANALYSIS DEVICE

      
Application Number JP2019026406
Publication Number 2020/044780
Status In Force
Filing Date 2019-07-03
Publication Date 2020-03-05
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Akahori Rena
  • Goto Yusuke
  • Yanagi Itaru
  • Aoki Mayu

Abstract

This biomolecule analysis device is characterized by comprising a thin film having a nanopore, a liquid tank that is disposed so as to be in contact with the thin film and contains an electrolyte solution, an electrode that is in contact with the liquid tank, a measurement unit that is connected to the electrode, and a control unit for controlling the voltage applied to the electrode according to the measurement results of the measurement unit, wherein a biomolecule is introduced into the electrolyte solution, a first end of the biomolecule is connected to a control chain and a molecular motor, and the control chain is joined to a primer at the upstream end thereof and has a spacer at the downstream end thereof.

IPC Classes  ?

  • G01N 27/00 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
  • C12M 1/00 - Apparatus for enzymology or microbiology
  • C12Q 1/6869 - Methods for sequencing
  • G01N 27/02 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance

60.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2019026612
Publication Number 2020/044790
Status In Force
Filing Date 2019-07-04
Publication Date 2020-03-05
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Umeki Hiroya
  • Okusa Takenori
  • Sasaki Shunsuke
  • Imai Kenta
  • Fujita Hiroki

Abstract

Provided is an automatic analysis device which appropriately manages and efficiently make use of consumables. This automatic analysis device is provided with: a storage container holding part that holds storage containers for storing consumables; a conveyance mechanism for conveying the consumables stored in the storage containers; and a control unit, wherein the storage containers store first consumables and second consumables, and the control unit determines the use state of the storage containers for the first consumables and the use state of the storage containers for the second consumables, determines whether the first consumables stored in the storage containers can be used on the basis of the use state of the storage containers for the first consumables, and determines whether the second consumables stored in the storage containers can be used on the basis of the use state of the storage containers for the second consumables.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

61.

SPECIMEN HOLDER CONVEYANCE LINE AND SPECIMEN INSPECTION AUTOMATION SYSTEM

      
Application Number JP2019032541
Publication Number 2020/040165
Status In Force
Filing Date 2019-08-21
Publication Date 2020-02-27
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Tamura Kazuma
  • Kambara Katsuhiro
  • Endo Masashi

Abstract

The present invention enables transfer of a specimen holder between conveyance lines which have different conveyance directions, without using a new driving mechanism. This specimen holder conveyance line is provided with: a first conveyance line for conveying a specimen holder in a first direction; a second conveyance line for conveying the specimen holder in a second direction different from the first direction; and a passage port which is provided between the first conveyance line and the second conveyance line and through which the specimen holder passes. The specimen holder conveyance line is characterized by being further provided with an inclined guide that is inclined with respect to the first conveyance line so as to guide the specimen holder to the passage port, wherein: when the specimen holder comes into contact with the inclined guide, the inclined guide is pushed out or warped by the conveyance force of the first conveyance line; and, in accordance with movement of the specimen holder along the inclined guide, the inclined guide is returned to the original state so that the specimen holder passes through the passage port and is transferred to the second conveyance line.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system

62.

LIQUID LEVEL DETECTION DEVICE

      
Application Number JP2019032744
Publication Number 2020/040239
Status In Force
Filing Date 2019-08-22
Publication Date 2020-02-27
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Sato Fumiyasu
  • Kakuno Masahito
  • Shimane Nobuyoshi

Abstract

Provided is a liquid level detection device capable of accurately detecting an interface inside a container regardless of the type of a separator or the state of the interface. This liquid level detection device 100 is configured to have: an irradiation unit 110 which irradiates a side surface of a sample container 200, containing a sample having layers 210, 220, 300, with light; a light receiving unit 120 that receives transmitted light from the sample container; an analysis unit 130 that acquires the interfaces between the layers from the received amount of the transmitted light; a first drive unit 150 that moves the sample container vertically relative to the irradiation unit and the light receiving unit; a second drive unit 160 that moves the sample container in the circumferential direction of the sample container relative to the irradiation unit and the light receiving unit; and a control unit 170 that controls the first and second drive units, wherein the second drive unit is controlled so that the light receiving unit receives the transmitted light at first and second irradiation angles, and the interfaces between the layers are acquired on the basis of the received amounts of transmitted light at the first and second irradiation angles.

IPC Classes  ?

  • G01F 23/292 - Light
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

63.

AUTOMATIC ANALYSIS DEVICE AND AUTOMATIC ANALYSIS SYSTEM

      
Application Number JP2019021040
Publication Number 2020/039679
Status In Force
Filing Date 2019-05-28
Publication Date 2020-02-27
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Enta Kunio
  • Akutsu Masashi

Abstract

The present invention comprises: a biochemical analysis unit 201 and an electrolyte analysis unit 211, that analyze a sample; one analysis unit-use control CPU 120 for controlling the operation of the biochemical analysis unit 201 and the electrolyte analysis unit 211; and a storage unit 133 that stores, for the biochemical analysis unit 201 and the electrolyte analysis unit 211, time charts 302, 312, 314, 322 for operations having different objectives. At least one of each of the biochemical analysis unit 201 and the electrolyte analysis unit 211 operates in a mutually independent manner on the basis of the time charts 302, 312, 314, 322 stored in the storage unit 133.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

64.

AUTOMATIC ANALYZER AND OPTICAL MEASUREMENT METHOD

      
Application Number JP2019031829
Publication Number 2020/039997
Status In Force
Filing Date 2019-08-13
Publication Date 2020-02-27
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Suzuki Kosuke
  • Onishi Fujio
  • Tanoue Hidetsugu

Abstract

Provided are an automatic analyzer and an optical measurement method for correcting a variation in the multiplication factor of a photoelectric element with high accuracy. The automatic analyzer comprises: a photoelectric element which generates electrons by light and outputs a current signal; a voltage application unit which applies a voltage to the photoelectric element; and a processing unit which corrects a variation in the multiplication factor of the photoelectric element, wherein the photoelectric element outputs a pulse signal as the current signal, and the processing unit corrects the variation in the multiplication factor on the basis of the pulse area of the pulse signal.

IPC Classes  ?

  • G01J 1/42 - Photometry, e.g. photographic exposure meter using electric radiation detectors
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

65.

CHARGED PARTICLE GUN AND CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2018043468
Publication Number 2020/031399
Status In Force
Filing Date 2018-11-27
Publication Date 2020-02-13
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Enomoto Hirohisa
  • Kaneda Minoru
  • Sato Shunsuke
  • Suzuki Wataru

Abstract

Provided are a charged particle gun and a charged particle beam device in which the vibration of an electron source is reduced and which have a small machine difference in vibration resistance performance. The charged particle gun of the present disclosure is provided with: a charged particle source that emits a charged particle beam; a cylinder to which the charged particle source is fixed; a fixing component that is fitted into the cylinder and is movable in a perpendicular direction; a chassis having an opening into which the cylinder can be inserted and a support portion that supports the fixing component; a first support component and a second support component that are disposed between the fixing component and the support portion; and a push-in component that moves the cylinder downwards by being pressed against the fixing component. The charged particle gun is characterized in that the second support component is compressively deformed in the perpendicular direction and is larger than the first support component in the perpendicular direction.

IPC Classes  ?

  • H01J 37/06 - Electron sources; Electron guns
  • H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
  • H01J 37/065 - Construction of guns or parts thereof

66.

MASS SPECTROMETRY DEVICE AND MASS SPECTROMETRY METHOD

      
Application Number JP2019029084
Publication Number 2020/031703
Status In Force
Filing Date 2019-07-24
Publication Date 2020-02-13
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor Hashimoto Yuichiro

Abstract

The purpose of the present invention is to achieve a mass spectrometry device which is inexpensive yet capable of obtaining a quantification result with high precision. A short-section measurement instruction unit 101 instructs a detector 9 to perform measurement in multiple short sections 5 in a channel 4 and stores signals detected by the detector 9 into a data storage unit 102, the signals are added up by a short-section signal amount addition unit 103, and the variation of the added signals is calculated by a signal variation calculation unit 104. A signal variation evaluation unit 105 evaluates the variation of the signals in each short section 5 in the same channel 4. When the evaluation result indicates a stable state, an operation control unit 106 controls operation of an ion source 6 and continues with the measurement without issuing a warning. When the evaluation result indicates an unstable state, a warning is issued during the measurement or after the measurement.

IPC Classes  ?

  • H01J 49/26 - Mass spectrometers or separator tubes
  • G01N 27/62 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electric discharges, e.g. emission of cathode
  • H01J 49/10 - Ion sources; Ion guns

67.

PLASMA TREATMENT METHOD AND PLASMA ASHING DEVICE

      
Application Number JP2018029335
Publication Number 2020/031224
Status In Force
Filing Date 2018-08-06
Publication Date 2020-02-13
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Ito Toru
  • Mori Masahito
  • Kanekiyo Tadamitsu

Abstract

233F gas.

IPC Classes  ?

68.

SEMICONDUCTOR INSPECTION APPARATUS AND PROBE UNIT

      
Application Number JP2018028403
Publication Number 2020/026293
Status In Force
Filing Date 2018-07-30
Publication Date 2020-02-06
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Komori Masaaki
  • Oki Katsuo

Abstract

Provided is a semiconductor inspection apparatus capable of performing high-speed response analysis for analysis of a failure in a microdevice constituting an LSI. In order to achieve this, the semiconductor inspection apparatus comprises: a vacuum chamber 3; a sample stand 4 which is disposed in the vacuum chamber and on which a sample 6 is placed; an electronic optical system 1 which is disposed so as to be able to irradiate the sample from above with an electron beam; a plurality of probe units 24 which are connected, via a coaxial cable 10, to external apparatuses 11, 12 disposed outside the vacuum chamber; and an electrode 5 which is disposed on or near the sample stand. The probe units 24 each include a measurement probe 8 which is brought into contact with the sample, a GND terminal 9 which is connected to the electrode 5, and a probe holder 7 which holds the measurement probe and the GND terminal, connects a signal wire of the coaxial cable to the measurement probe, and connects a GND wire of the coaxial cable to the GND terminal. When the measurement probe of the probe unit is brought into contact with the sample, the GND terminal is brought into contact with the electrode.

IPC Classes  ?

  • G01R 31/26 - Testing of individual semiconductor devices
  • G01R 1/073 - Multiple probes
  • G01R 31/28 - Testing of electronic circuits, e.g. by signal tracer

69.

BIOPOLYMER ANALYSIS METHOD AND BIOPOLYMER ANALYSIS DEVICE

      
Application Number JP2018029093
Publication Number 2020/026418
Status In Force
Filing Date 2018-08-02
Publication Date 2020-02-06
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Takahashi Satoshi
  • Fujioka Michiru
  • Kobayashi Mikihiro
  • Haraura Isao
  • Ooura Takeshi
  • Yamazaki Motohiro

Abstract

In capillary electrophoresis, impurities, and the like, can result in the detection of spike-like noise or noise peaks having different wavelength spectrums from labeling fluorescent substances. The present invention is for specifying the intensity of a labeling fluorescent substance without influence from a noise fluorescence peak resulting from an impurity. In this disclosure, a fluorescence intensity characteristic (noise fluorescence profile) shared by noise peaks is set, noise peaks are treated as a different fluorescent substance from a labeling fluorescent substance, and the fluorescent substance and noise are separated through color conversion with the labeling fluorescent substance and noise fluorescent substance (see fig. 5).

IPC Classes  ?

70.

CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2018029127
Publication Number 2020/026422
Status In Force
Filing Date 2018-08-02
Publication Date 2020-02-06
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor Komatsuzaki Ryo

Abstract

The present invention provides a charged particle beam device that enables accurate movement of the convergence point of charged particle beams onto the surface of a sample and facilitates a user's understanding of the positional relationship between the sample surface and the convergence point of the charged particle beam. This charged particle beam device is provided with: an electronic optical system that emits charged particle beams toward a sample stand; a movable stage on which the sample stand is placed; a sample chamber that accommodates the movable stage; a detector that detects a signal from a sample placed on the sample stand; a camera that captures an image of the sample stand and the sample; an extraction means for extracting outer shape information about the outer shapes of the sample stand and the sample from the image captured by the camera; a control unit that controls the movable stage on the basis of the outer shape information; and a display unit that displays an image related to the outer shape information together with the image captured by the camera.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/22 - Optical or photographic arrangements associated with the tube

71.

AUTOMATIC ANALYSIS DEVICE AND AUTOMATIC ANALYSIS SYSTEM

      
Application Number JP2019020011
Publication Number 2020/021829
Status In Force
Filing Date 2019-05-21
Publication Date 2020-01-30
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Horiuchi Rie
  • Yasui Akihiro

Abstract

A reagent loading mechanism (14) having a reagent loading part (15) as the installation location of containers (9a, 9b, 9c, 19) for retaining a reagent or other solution is installed on a side surface of an analysis unit (100) so as to be able to be drawn out, and an RFID reader (10) for reading RFID tags (13) attached to the containers (9a, 9b, 9c, 19) is disposed so that the position thereof coincides with the RFID tags (13) when the containers (9a, 9b, 9c, 19) are placed in the reagent loading part (15) of the drawn-out reagent loading mechanism (14). User burden that accompanies replacement of large-capacity reagents can thereby be alleviated while also saving space.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

72.

CHARGED-PARTICLE BEAM APPARATUS

      
Application Number JP2018027859
Publication Number 2020/021649
Status In Force
Filing Date 2018-07-25
Publication Date 2020-01-30
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Komatsuzaki Ryo
  • Sawada Atsushi

Abstract

The purpose of the present invention is to provide a charged-particle beam apparatus that enables a user to easily and quickly bring up a necessary function on a GUI. The charged-particle beam apparatus according to the present invention presents, in accordance with an operation history thereof, operation components that are recommended to be placed on a component set (see figure 5).

IPC Classes  ?

  • H01J 37/24 - Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for

73.

AUTOMATIC ANALYSIS SYSTEM

      
Application Number JP2019020433
Publication Number 2020/021837
Status In Force
Filing Date 2019-05-23
Publication Date 2020-01-30
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Imai Kenta
  • Kawai Tomoakira
  • Sakazume Taku
  • Yano Shigeru
  • Minegishi Manabu
  • Suzuki Takahiro
  • Watanabe Atsushi

Abstract

Provided is an automatic analysis system which uses an autonomous mobile robot and reduces human burden to increase the rate of operation while suppressing initial costs. This automatic analysis system has: a plurality of instruments that are arranged in an automatic analysis area 101 and include analysis units 103, 104 constituting an automatic analysis apparatus; and a robot 102 moving within the automatic analysis area. Operation screens of the analysis units each have a first screen mode for a user and a second screen mode for the robot, wherein it is possible to switch between the modes. The robot acquires state information about the analysis units from the operation screens in the second screen mode.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

74.

DISTRIBUTED CONTROL SYSTEM, AUTOMATIC ANALYSIS DEVICE, AND AUTOMATIC ANALYSIS SYSTEM

      
Application Number JP2019020808
Publication Number 2020/021839
Status In Force
Filing Date 2019-05-27
Publication Date 2020-01-30
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor Hasegawa Takafumi

Abstract

In a distributed control system 500, when the determination that an error has occurred is made as a result of comparison of correct connection information retained in a storage unit 100 and connection information of an actually connected control object device or terminal communication device 12 by a comparison unit 101, a central computation device 10 outputs a display signal of an abnormal part to a display device, and the display device displays the abnormal part on the basis of the display signal. A distributed control system and an automatic analysis device provided with the same, and an automatic analysis system are thereby provided, whereby an erroneous connections or defects can be more easily and reliably detected than in the prior art, even when a plurality of control boards are distributedly arranged in the same device.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

75.

METHOD AND DEVICE FOR MANUFACTURING CONCAVE DIFFRACTION GRATING, AND CONCAVE DIFFRACTION GRATING

      
Application Number JP2019026231
Publication Number 2020/021989
Status In Force
Filing Date 2019-07-02
Publication Date 2020-01-30
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Yaegashi Kenta
  • Ebata Yoshisada
  • Aono Takanori

Abstract

A method for manufacturing a concave diffraction grating, the method including: a step for disposing a flat surface die and a concave substrate so that a pressing surface thereof of the flat surface die faces the concave surface of the concave substrate, the flat surface die having a groove pattern of a diffraction grating on the pressing surface thereof, and a resin being applied on the concave surface of the concave substrate; a step for applying pressure to the flat surface die through use of a fluid and pressing the pressing surface against the resin applied to the concave surface; and a step for curing the resin to which the groove pattern has been transferred by the pressing of the pressing surface. Load uniformity can thereby be improved, and a concave diffraction grating having high surface precision can be manufactured.

IPC Classes  ?

  • G02B 5/18 - Diffracting gratings
  • B29C 35/08 - Heating or curing, e.g. crosslinking or vulcanising by wave energy or particle radiation
  • B29C 59/02 - Surface shaping, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
  • B29C 59/16 - Surface shaping, e.g. embossing; Apparatus therefor by wave energy or particle radiation

76.

CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2018027070
Publication Number 2020/016988
Status In Force
Filing Date 2018-07-19
Publication Date 2020-01-23
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Yabu Shuhei
  • Hatano Michio
  • Imamura Shin
  • Komatsu Masaaki

Abstract

To improve the yield of light generated by the collision between secondary electrons and gas molecules, the present invention is a charged particle beam device comprising: a charged particle beam source that irradiates charged particle beams on a sample; a sample chamber in which the sample and gas molecules are held; a positive electrode that forms an electric field that accelerates secondary electrons emitted from the sample; and a photodetector that detects light generated by the collision of the accelerated secondary electrons between the gas molecules, wherein the charged particle beam device is characterized by further comprising a light condensing unit that is placed between the sample and the photodetector, has a light emission space in which the light is generated, and condenses light generated in the light emission space on the photodetector side.

IPC Classes  ?

  • H01J 37/244 - Detectors; Associated components or circuits therefor

77.

LIGHT MEASUREMENT DEVICE AND SAMPLE OBSERVATION METHOD

      
Application Number JP2018027268
Publication Number 2020/017017
Status In Force
Filing Date 2018-07-20
Publication Date 2020-01-23
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Obara Takayuki
  • Osawa Kentaro
  • Sakurai Toshinari

Abstract

This light measurement device comprises: a light source; a light splitting part for splitting light emitted from the light source into reference light and signal light; a scanning unit for irradiating the signal light so as to scan an object of measurement; an optical system for generating interference light by combining signal light that has been reflected or scattered by the object of measurement and the reference light; a photodetection unit for receiving the interference light generated by the optical system and converting the same into an electrical signal; and a signal processing unit for calculating the intensity of the signal light on the basis of the electrical signal produced from the conversion by the photodetection unit. The photodetection unit detects the signal light using a plurality of photodetection elements associated with a plurality of measurement areas overlapping a signal light irradiation area. The signal processing unit calculates the intensities of the signal light detected by each of the plurality of photodetection elements. The scanning unit scans the object of measurement by moving the irradiation area of the signal light irradiated onto the object of measurement such that some of the plurality of measurement areas at a first point in time overlap with other measurement areas from among the plurality of measurement areas at a second point in time.

IPC Classes  ?

  • G01N 21/17 - Systems in which incident light is modified in accordance with the properties of the material investigated

78.

PLASMA PROCESSING DEVICE

      
Application Number JP2018027260
Publication Number 2020/017015
Status In Force
Filing Date 2018-07-20
Publication Date 2020-01-23
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Pandey Anil
  • Kamaji Yoshito
  • Sumiya Masahiro

Abstract

In order to reduce damage due to degradation of a seal member in a plasma processing device without making the structure of a vacuum seal portion of a vacuum container have a complex shape, and to thereby make it possible to perform cleaning without affecting the lifetime of the seal member, this plasma processing device is provided with a processing chamber, an evacuation unit for exhausting the inside of the processing chamber to a vacuum, a gas supply unit for supplying a gas into the processing chamber, a sample base which is disposed in the processing chamber and on which a sample to be processed is placed, a window portion which constitutes a ceiling surface of the processing chamber over the sample base, and a high-frequency power supply unit for supplying high-frequency power into the processing chamber. The window portion and the processing chamber are connected together with a seal member made of elastomer interposed therebetween, wherein the seal member is installed in a position such that, in a state in which the inside of the processing chamber has been exhausted to a vacuum by the evacuation unit, the ratio, with respect to an interval between the window portion and the processing chamber sandwiching the seal member, of the distance from an inner wall surface of the processing chamber to the seal member in the portion of the interval is three or more.

IPC Classes  ?

79.

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

      
Application Number JP2019007598
Publication Number 2020/012693
Status In Force
Filing Date 2019-02-27
Publication Date 2020-01-16
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Takagi, Yuta
  • Hirota, Kosa
  • Inoue, Yoshiharu
  • Miyaji, Masakazu

Abstract

This plasma processing method, which includes an etching step for etching a wafer within a chamber and with which residual halogen, or the like, within the chamber is removed in a short period of time and throughput is improved, comprises: a plasma cleaning step for removing foreign material from the inner walls of the chamber by introducing a halogen component–containing gas within the chamber; and a residual halogen removal step for removing halogen components remaining within the chamber from the plasma cleaning step by repeatedly causing oxygen-containing plasma to alternate between an on state and an off state within the chamber.

IPC Classes  ?

80.

PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD, AND ECR HEIGHT MONITOR

      
Application Number JP2019008930
Publication Number 2020/012704
Status In Force
Filing Date 2019-03-06
Publication Date 2020-01-16
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Ikeda, Norihiko
  • Yasui, Naoki
  • Yamada, Kazuya

Abstract

Provided is a plasma processing device comprising a treatment chamber 101 in which a wafer 114 is treated using plasma 111, a high-frequency power supply 106 which supplies high-frequency power for generating the plasma 111, a mechanism which causes the formation of a magnetic field for forming ECR and controls the magnetic flux density thereof, and a sample platform 113 upon which the wafer 114 is placed. The plasma processing device is additionally equipped with a control unit 107 which uses image data of the plasma 111 to monitor the height of the ECR, i.e. the electron cyclotron resonance occurring as a result of the interaction between the high-frequency power and the magnetic field, and which controls the frequency of the high-frequency power such that the height of the monitored ECR reaches a prescribed height.

IPC Classes  ?

  • H01L 21/3065 - Plasma etching; Reactive-ion etching
  • H05H 1/00 - Generating plasma; Handling plasma
  • H05H 1/46 - Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

81.

ELECTROPHORESIS METHOD, ELECTROPHORESIS SYSTEM, AND ELECTROPHORESIS GEL

      
Application Number JP2019021161
Publication Number 2020/012805
Status In Force
Filing Date 2019-05-28
Publication Date 2020-01-16
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Ogawa Mima
  • Yokoi Takahide
  • Uematsu Chihiro

Abstract

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IPC Classes  ?

82.

MACHINE LEARNING DEVICE, IMAGE DIAGNOSIS ASSISTANCE DEVICE, MACHINE LEARNING METHOD, AND IMAGE DIAGNOSIS ASSISTANCE METHOD

      
Application Number JP2019024953
Publication Number 2020/012935
Status In Force
Filing Date 2019-06-24
Publication Date 2020-01-16
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Hattori Hideharu
  • Kakishita Yasuki
  • Uchida Kenko
  • Aso Sadamitsu
  • Sakurai Toshinari

Abstract

Provided is a machine learning device including a processor and a memory, wherein the processor: receives an image and calculates a characteristic amount of an object included in the image; identifies a section from the characteristic amount and calculates a section identification value; calculates an overall identification value using the section identification value; and generates an identifier using the section identification value and the overall identification value, and stores the identifier in the memory.

IPC Classes  ?

83.

CELL ANALYSIS METHOD

      
Application Number JP2019021458
Publication Number 2020/012816
Status In Force
Filing Date 2019-05-30
Publication Date 2020-01-16
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kawabe Shunsuke
  • Sakai Tomoyuki
  • Shirai Masataka

Abstract

To highly efficiently analyze cell data without increasing cost. A cell analysis method, wherein a single cell analyzer 11 provided with an analysis chip and a membrane filter laminated on the analysis chip is used, comprises: a step for introducing a first liquid containing a cell into the analysis chip; a step for introducing a second liquid having a smaller surface tension than the first liquid into the analysis chip; a step for sucking the first and second liquids with a liquid feeding pump connected to a flow channel on the membrane filter side; a step for introducing a reaction reagent capable of reacting with the cell into the analysis chip and reacting a molecule extracted from the cell with a solid phase; a step for sucking the reaction reagent with a liquid feeding pump; and a step for taking out the solid phase from the analysis chip and analyzing the same.

IPC Classes  ?

84.

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

      
Application Number JP2019024437
Publication Number 2020/012907
Status In Force
Filing Date 2019-06-20
Publication Date 2020-01-16
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor Sonoda, Yasushi

Abstract

The purpose of the present invention is to provide a plasma processing device and a plasma processing method with which it is possible to perform plasma etching with high shape controllability and little difference in the application time of high-frequency power among a plurality of plasma processing devices that perform plasma processing while periodically switching between gases. According to the present invention, when controlling, on the basis of the change in plasma impedance that occurs when switching from a first gas at a first step to a second gas at a second step, so as to change a second high-frequency power to be applied to a stage from the value of the second high-frequency power at the first step to the value of the second high-frequency power at the second step, the supply time for the first gas is controlled using the time spanning from the start time of the first step to the supply start time of the first gas and the time spanning from the end time of the first step to the supply end time of the first gas, such that the supply time of the second high-frequency power at the first step is substantially the same as the time of the first step.

IPC Classes  ?

85.

PLASMA PROCESSING METHOD

      
Application Number JP2019016735
Publication Number 2020/008703
Status In Force
Filing Date 2019-04-19
Publication Date 2020-01-09
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Takamatsu Tomohiro
  • Arase Takao
  • Kajifusa Hiroyuki

Abstract

The present invention provides a plasma processing method for forming a polysilicon film mask layer, and makes it possible to suppress etching shape abnormalities. This plasma processing method is for plasma etching a polysilicon film, wherein a mixed gas comprising a halogen gas, a fluorocarbon gas, an oxygen gas, and a carbonyl sulfide gas is used for plasma etching the polysilicon film.

IPC Classes  ?

86.

SCANNING ELECTRON MICROSCOPE

      
Application Number JP2018025029
Publication Number 2020/008492
Status In Force
Filing Date 2018-07-02
Publication Date 2020-01-09
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Sohda Yasunari
  • Bizen Kaori
  • Abe Yusuke
  • Tanimoto Kenji

Abstract

To make it possible, in a scanning electron microscope in which an electron beam having a high energy is used, to correct the focal point at a high speed. This invention has: an electron optical system including an objective lens 113 and an electron source 100 for releasing an electron beam 116; a sample stand 1025 disposed on a stage 115, a sample 114 being placed on the sample stand 1025; a reflected electron detector 1023 disposed between the objective lens and the sample stand, the reflected electron detector 1023 detecting reflected electrons 1017 released by an interaction between the electron beam and the sample; a reflected electron detection system control unit 138 provided so as to correspond to the reflected electron detector, the reflected electron detection system control unit applying a voltage onto the reflected electron detector; and a device control computation device 146. The objective lens has an opening in the stage direction, and the device control computation device controls the voltage applied from the reflected electron detection system control unit to the reflected electron detector and thereby performs a correction of the focal point of the electron beam.

IPC Classes  ?

  • H01J 37/21 - Means for adjusting the focus
  • H01J 37/244 - Detectors; Associated components or circuits therefor

87.

CHARGED PARTICLE BEAM DETECTOR, ELECTRON MICROSCOPE, ELECTRON ENERGY LOSS SPECTROSCOPE, AND IMAGING DEVICE

      
Application Number JP2018025207
Publication Number 2020/008526
Status In Force
Filing Date 2018-07-03
Publication Date 2020-01-09
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Komatsu Masaaki
  • Imamura Shin
  • Tamura Keiji
  • Kaji Kazutoshi
  • Okada Satoshi

Abstract

This charged particle beam detector is provided with a laminated body in which a fluorescent layer comprising fluorescent particles and a metal layer are laminated, the charged particle beam detector being characterized by being provided with a resin layer that is disposed between the fluorescent layer and the metal layer.

IPC Classes  ?

  • H01J 37/244 - Detectors; Associated components or circuits therefor

88.

CHARGED PARTICLE BEAM GENERATION DEVICE AND CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2018024493
Publication Number 2020/003428
Status In Force
Filing Date 2018-06-28
Publication Date 2020-01-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Morita Hiroshi
  • Kato Shinichi
  • Ito Hiroyuki

Abstract

Provided are a charged particle beam generation device and a charged particle beam device that can improve insulation reliability as a result of reducing the high electric field generated around a connection section for a conductor. The charged particle beam generation device 100 has: a plug 151 that guides high voltage from outside to a charged particle source that is in a vacuum; and a socket 251 having the charged particle source attached thereto. An electric field reduction ring 161 that electrically connects to one of a plurality of conductors that guide high voltage is embedded inside the tip of the plug 151. The plurality of conductors that guide the high voltage are arranged so as to penetrate the electric field reduction ring 161.

IPC Classes  ?

  • H01J 37/07 - Eliminating deleterious effects due to thermal effects or electric or magnetic fields
  • H01J 37/248 - Components associated with high voltage supply

89.

SEMICONDUCTOR INSPECTION APPARATUS

      
Application Number JP2018024678
Publication Number 2020/003458
Status In Force
Filing Date 2018-06-28
Publication Date 2020-01-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Komori Masaaki
  • Oki Katsuo

Abstract

Provided is a semiconductor inspection apparatus capable of detecting an abnormality with high sensitivity during defect analysis of a micro device. The semiconductor inspection apparatus comprises: a sample base 6 on which a sample is placed; an electronic optical system 1 which irradiates the sample with an electron beam; a measurement probe 3 to which the sample comes into contact; a measurement device 8 which measures an output from the measurement probe; and an information processing device 9 which acquires the measurement value of an output from the measurement probe in response to irradiation of the sample with the electron beam. The information processing device sets a timing for starting irradiation of the sample with the electron beam and a timing for freezing the irradiation with the electron beam, sets a first measurement time period during which the measurement device measures an output from the measurement probe in a state where the sample is being irradiated with the electron beam, sets a second measurement time period during which the measurement device measures an output from the measurement probe after the irradiation with the electron beam is frozen, and then, obtains the measurement value of the output from the measurement probe in response to irradiation of the sample with the electron beam, from the difference between a first measurement value measured during the first measurement time period and a second measurement value measured during a second measurement time period.

IPC Classes  ?

  • H01L 21/66 - Testing or measuring during manufacture or treatment
  • G01R 31/28 - Testing of electronic circuits, e.g. by signal tracer
  • G01R 31/3183 - Generation of test inputs, e.g. test vectors, patterns or sequences

90.

NUCLEIC ACID ANALYSIS SUBSTRATE, NUCLEIC ACID ANALYSIS FLOW CELL, AND ANALYSIS METHOD

      
Application Number JP2019020374
Publication Number 2020/003823
Status In Force
Filing Date 2019-05-23
Publication Date 2020-01-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Yokoyama Toru
  • Itabashi Naoshi
  • Narahara Masatoshi

Abstract

According to the present invention, high-density, positionable spot patterns are arranged on a substrate to improve the throughput of nucleic acid analysis. A nucleic acid analysis pattern arrangement and a nucleic acid analysis substrate in which a spot area that has a plurality of spot patterns that are formed on a substrate and to which biopolymers adhere is partitioned into a plurality of blocks. The spot patterns of adjacent blocks A, AX, AY, AXY have the same high-density hexagonal lattice pattern but different topologies.

IPC Classes  ?

  • C12M 1/00 - Apparatus for enzymology or microbiology
  • C12N 15/09 - Recombinant DNA-technology
  • C12Q 1/6874 - Methods for sequencing involving nucleic acid arrays, e.g. sequencing by hybridisation [SBH]

91.

BLOOD FLOW ANALYSIS DEVICE, BLOOD FLOW ANALYSIS PROGRAM, AND BLOOD FLOW ANALYSIS SYSTEM

      
Application Number JP2019023177
Publication Number 2020/004020
Status In Force
Filing Date 2019-06-12
Publication Date 2020-01-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Tanaka Takeshi
  • Kurata Sayaka
  • Toyomura Takashi

Abstract

The purpose of the present invention is to provide a blood flow analysis device with which it is possible to identify, with high accuracy, a muscle blood flow change associated with a test subject's muscle-load exercise. The blood flow analysis device according to the present invention specifies a muscle-load exercise period in which a test subject's muscle present at a site where a motion sensor takes measurement is engaged in muscle-load exercise, and computes a feature quantity of a blood flow change in the test subject's muscle in the muscle-load exercise period by analyzing an optical detection signal during said muscle-load exercise period (see fig. 1).

IPC Classes  ?

  • A61B 5/026 - Measuring blood flow
  • A61B 5/11 - Measuring movement of the entire body or parts thereof, e.g. head or hand tremor or mobility of a limb
  • A61B 5/22 - Ergometry; Measuring muscular strength or the force of a muscular blow
  • A63B 69/00 - Training appliances or apparatus for special sports

92.

CHEMICAL ANALYSIS DEVICE

      
Application Number JP2019018864
Publication Number 2020/003769
Status In Force
Filing Date 2019-05-13
Publication Date 2020-01-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kourai Yuusuke
  • Sasaki Kota
  • Maeda Jun
  • Yamada Azusa
  • Ono Tetsuyoshi

Abstract

This chemical analysis device (100) is provided with: a plurality of ultrasonic elements (202); a waveform generator (203) which generates an ultrasonic waveform; a determiner (207) which determines the positions and the number of ultrasonic elements (202) to be driven from among the plurality of ultrasonic elements (202); a variable matching circuit (205) which, on the basis of the determination result, matches impedance between the waveform generator (203) and each of the ultrasonic elements (202) to be driven; and a switch (209) which selects the ultrasonic elements (202) to be driven from among the plurality of the ultrasonic elements (202).

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • B01F 11/02 - Mixing by means of ultrasonic vibrations

93.

OBSERVATION DEVICE

      
Application Number JP2018023455
Publication Number 2019/244275
Status In Force
Filing Date 2018-06-20
Publication Date 2019-12-26
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Masuya Akira
  • Yabuhara Tadao
  • Fujita Hiroko

Abstract

This observation device that captures images at focal positions inside a sample container comprises: a holding part that holds the sample container; an optical system that captures images at the focal positions; and a computation device that controls the optical system. The optical system includes: an objective lens disposed below the sample container; an objective lens actuator; an irradiation unit that irradiates the bottom surface of the sample container with light; a detection unit that detects the reflected light intensity; a focus control unit that positions the focal point of the objective lens on a reflection surface imparting a peak in the reflected light intensity; and a counting unit that counts the reflection surfaces. The focus control unit drives the objective lens actuator and positions the focal point on a reflection surface when a peak is detected in the reflected light intensity. The counting unit counts the reflection surface when the focus control unit has positioned the focal point on the reflection surface. The computation unit determines, on the basis of the count value, whether or not the focal point is positioned at the focal position, and causes the optical system to captures images if the focal point is positioned at the focal position.

IPC Classes  ?

94.

ION MILLING DEVICE

      
Application Number JP2018023782
Publication Number 2019/244331
Status In Force
Filing Date 2018-06-22
Publication Date 2019-12-26
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kaneko Asako
  • Takasu Hisayuki

Abstract

The present invention obtains an ion milling device capable of performing high-speed milling processing even on a sample containing a material having an imide bond. Accordingly, the ion milling device has: a vacuum chamber 6 for holding a sample 3 in a vacuum atmosphere; an ion gun 1 for irradiating the sample with an unfocused ion beam 2; a vaporizing container 17 for storing a mixed solution 13 of an ionic liquid soluble in water and water; and nozzles 11, 12 for supplying vapor obtained by vaporizing the mixed solution to the vicinity of the surface of the sample to be processed by the ion beam.

IPC Classes  ?

  • H01J 37/30 - Electron-beam or ion-beam tubes for localised treatment of objects
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • G01N 1/28 - Preparing specimens for investigation
  • G01N 1/32 - Polishing; Etching

95.

ELECTROPHORESIS APPARATUS

      
Application Number JP2018023894
Publication Number 2019/244358
Status In Force
Filing Date 2018-06-22
Publication Date 2019-12-26
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Takahashi Satoshi
  • Inaba Ryoji
  • Anazawa Takashi
  • Sakai Tomoyuki
  • Goto Yusuke

Abstract

The purpose of this invention is to provide an electrophoresis apparatus that makes high-throughput protein analysis possible. This electrophoresis apparatus comprises a capillary array consisting of a plurality of arrayed capillaries, a measurement light irradiation unit for irradiating measurement light, a first lens array including a plurality of first lenses arrayed so as to correspond to the plurality of capillaries, a second lens array including a plurality of second lenses arrayed so as to correspond to the plurality of capillaries, and a light reception unit for receiving light from the measurement light irradiation unit that has passed through the first lens array, entered the capillaries, and then passed through the second lens array.

IPC Classes  ?

  • G01N 21/17 - Systems in which incident light is modified in accordance with the properties of the material investigated
  • G01N 21/64 - Fluorescence; Phosphorescence
  • G01N 27/447 - Systems using electrophoresis

96.

AUTOMATIC ANALYSIS DEVICE

      
Application Number JP2019011710
Publication Number 2019/244427
Status In Force
Filing Date 2019-03-20
Publication Date 2019-12-26
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Sakairi Susumu
  • Okusa Takenori
  • Kumagai Takahiro

Abstract

When a dispensation tip is not attached properly or when smudges or residue on the leading end of a dispensation tip adheres to a disposal path, dispensation tips cannot be disposed of due to being adhered to the disposal path, or fallen dispensation tips pile up in a bamboo shoot manner, causing the dispensation tips to spill out of the disposal box. According to the present invention, attachment of a tip is stabilized by adding a countersink 201 to the backside of a dispensation tip mounding position 132 of an installation table of specimen dispensation tips and by reducing the amount of contact with respect to the tip lateral surface during pulling-up from the installation table. In addition, sticking of a specimen to the disposal path is suppressed by adding a member for controlling the attitude of a tip when falling to a disposal position so as to cause the tip to drop vertically. Further, when raising a dispensation probe during release of a dispensation tip, the attitude of the tip during release is stabilized by raising the tip until the upper end thereof touches a base, temporarily halting the motion of the tip, and then raising the tip again. Still further, a plurality of positions for releasing tips are provided, and the timing for disposal is changed from one position to another.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

97.

ELECTRONIC MICROSCOPE DEVICE

      
Application Number JP2018022758
Publication Number 2019/239546
Status In Force
Filing Date 2018-06-14
Publication Date 2019-12-19
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Nishihata Takahiro
  • Osaki Mayuka
  • Sun Wei
  • Yamamoto Takuma

Abstract

In the present invention, an electro-optical condition generation unit includes: a condition setting unit that sets, as a plurality of electro-optical conditions, a plurality of electro-optical conditions in which the combinations of the aperture angle and focal-point height for an electron beam are different; an index calculating unit that determines a measurement-performance index in the electro-optical conditions set by the condition setting unit; and a condition deriving unit that derives an electro-optical condition, including an aperture angle and a focal-point height, so that the measurement-performance index determined by the index calculating unit becomes a prescribed value.

IPC Classes  ?

  • H01J 37/21 - Means for adjusting the focus
  • G01B 15/00 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
  • H01J 37/22 - Optical or photographic arrangements associated with the tube
  • H01L 21/66 - Testing or measuring during manufacture or treatment

98.

CHARGED PARTICLE BEAM DEVICE

      
Application Number JP2018022463
Publication Number 2019/239497
Status In Force
Filing Date 2018-06-12
Publication Date 2019-12-19
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Ootsuga, Kazuo
  • Imai, Yuta
  • Nomaguchi, Tsunenori

Abstract

Provided is a charged particle beam device comprising: a charged particle source that generates a charged particle beam with which a sample is irradiated; a charged particle detection unit that detects a charged particle that is generated when the sample is irradiated with the charged particle beam; an intensity data generating unit that generates data on the intensity of the charged particle detected by the charged particle detection unit; a peak value data generating unit that generates data on a peak value of the charged particle detected by the charged particle detection unit; and an output unit that outputs a first image of the sample on the basis of the data on the intensity and a second image of the sample on the basis of the data on the peak value.

IPC Classes  ?

  • H01J 37/244 - Detectors; Associated components or circuits therefor
  • H01J 37/22 - Optical or photographic arrangements associated with the tube

99.

ELECTRON BEAM DEVICE

      
Application Number JP2018021335
Publication Number 2019/234787
Status In Force
Filing Date 2018-06-04
Publication Date 2019-12-12
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor Yamazawa Yu

Abstract

In this electron beam device that performs angle scanning for changing the incident angle of an electron beam applied to a prescribed incident position on a sample, spherical aberration can be corrected following a deflection signal even if a deflection frequency is high when a correction coil (3) is provided to a gap in a yoke (magnetic path) (61) of an objective lens (6). Thus, a main control unit (16) for controlling an electron optical system sets prescribed phase changing amounts (a, b) with respect to control of a scanning coil for control of the correction coil, and varies the prescribed phase changing amounts (a, b) in accordance with a plurality of scanning modes having different scanning speeds.

IPC Classes  ?

  • H01J 37/153 - Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
  • H01J 37/141 - Electromagnetic lenses
  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path

100.

ANALYZER

      
Application Number JP2019009851
Publication Number 2019/235015
Status In Force
Filing Date 2019-03-12
Publication Date 2019-12-12
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Sugiyama Kiyotaka
  • Tsujimura Naoto
  • Tamura Kazuma

Abstract

The purpose of the present invention is to provide an analyzer that is capable of accurately detecting sample components inside a container and the position of an interface between the sample components without using a plurality of light sources. An analyzer according to the present invention irradiates light onto a container accommodating one or more layers of sample components separated from a sample and identifies each sample component accommodated in the container by identifying, for each layer, the wavelength at which the intensity of the light that has passed through the sample is greatest (see fig. 4C).

IPC Classes  ?

  • G01N 21/17 - Systems in which incident light is modified in accordance with the properties of the material investigated
  • G01N 21/27 - Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
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