Hitachi High-Technologies Corporation

Japan

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IPC Class
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor 8
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations 8
G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system 8
G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices 7
H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support 5
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Status
Pending 8
Registered / In Force 56
Found results for  patents

1.

Automated Analysis Device

      
Application Number 18136406
Status Pending
Filing Date 2023-04-19
First Publication Date 2023-08-17
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Akutsu, Masashi
  • Suzuki, Naoto
  • Fujita, Hiroki
  • Yasui, Akihiro

Abstract

This automated analysis device is provided with a plurality of analysis units for analyzing a specimen, a buffer portion which holds a plurality of specimen racks on which are placed specimen containers holding the specimen, a sampler portion which conveys the specimen racks held in the buffer portion to the analysis units, and a control portion which, when performing a process to deliver the specimen racks to the plurality of analysis units, outputs synchronization signals to all the plurality of analysis units, wherein the analysis unit performs a delivery process starting from the synchronization signal, and the analysis unit performs a delivery process starting from the synchronization signal.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

2.

Method of washing an aspiration probe of an in-vitro diagnostic system, in-vitro diagnostic method, and in-vitro diagnostic system

      
Application Number 17507874
Grant Number 11879904
Status In Force
Filing Date 2021-10-22
First Publication Date 2022-04-14
Grant Date 2024-01-23
Owner
  • Roche Diagnostics Operations, Inc. (USA)
  • Hitachi High-Technologies Corporation (Japan)
Inventor
  • Nonaka, Kouhei
  • Mori, Takamichi
  • Aruga, Yoichi
  • Horie, Yosuke
  • Mccaughey, Andrew
  • Seiler, Alexander

Abstract

A method of washing an aspiration probe of an in-vitro diagnostic system is disclosed. The aspiration probe comprises an outer surface and an inner surface forming an inner space for receiving a fluid. The method comprises dipping the aspiration probe into a first wash fluid so that the outer surface is immersed at least in part into the first wash fluid, aspirating an amount of the first wash fluid into the inner space of the aspiration probe, propagating an ultrasonic vibration to the outer surface of the aspiration probe via the first wash fluid, and rinsing the outer surface and the inner surface of the aspiration probe with a second wash fluid. Further, an in-vitro diagnostic method and an in-vitro diagnostic system are disclosed.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • B01L 3/02 - Burettes; Pipettes
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • B01F 31/00 - Mixers with shaking, oscillating, or vibrating mechanisms

3.

Automated Analyzer and Automated Analysis Method

      
Application Number 17474586
Status Pending
Filing Date 2021-09-14
First Publication Date 2021-12-30
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Kazama, Yuto
  • Iijima, Masahiko
  • Yabutani, Chie
  • Kogure, Kenji

Abstract

An automated analyzer includes two or more types of photometers to obtain suitable output of the measurement results of the plurality of photometers and suitable data alarm output even if there is an abnormality, or the like, at the time of measurement. The automated analyzer includes, for example, two types of photometers having different quantitative ranges and an analysis control unit for controlling analysis that includes measurement of a given sample using the two types of photometers. If two types of data alarms corresponding to abnormalities, or the like, during measurement have been added to the two types of measurement results from the two types of photometers, the analysis control unit selects measurement result and data alarm output corresponding to the combination of the two types of data alarms and outputs the same to a user as analysis results.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • G01N 21/27 - Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection
  • G01N 21/47 - Scattering, i.e. diffuse reflection
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

4.

Charged particle beam apparatus

      
Application Number 17462455
Grant Number 11784023
Status In Force
Filing Date 2021-08-31
First Publication Date 2021-12-23
Grant Date 2023-10-10
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Kawamoto, Yuta
  • Ikegami, Akira
  • Ebizuka, Yasushi
  • Fujinaga, Nobuo

Abstract

An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

IPC Classes  ?

  • H01J 37/10 - Lenses
  • H01J 37/153 - Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path

5.

Charged particle beam apparatus

      
Application Number 17230650
Grant Number 11791124
Status In Force
Filing Date 2021-04-14
First Publication Date 2021-07-29
Grant Date 2023-10-17
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Kawamoto, Yuta
  • Ikegami, Akira
  • Ebizuka, Yasushi
  • Fujinaga, Nobuo

Abstract

An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

IPC Classes  ?

  • H01J 37/10 - Lenses
  • H01J 37/153 - Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
  • H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path

6.

Capillary electrophoresis device

      
Application Number 16633641
Grant Number 11360047
Status In Force
Filing Date 2017-07-31
First Publication Date 2021-05-27
Grant Date 2022-06-14
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Aritome, Katsuhiro
  • Kimura, Ryusuke
  • Yamazaki, Motohiro

Abstract

An electrophoresis device has: a sample tray (112) on which there are placed a positive-electrode-side buffer solution container (103) containing a buffer solution and a phoresis medium container (102) containing a phoresis medium, and which is driven in a vertical direction and a horizontal direction; a thermostat oven unit (113) that holds a capillary array having a capillary head in which a plurality of capillaries are bundled in a single unit at one end thereof in a state where the capillary array being held in a state in which the capillary head protrudes downward, and that keeps the interior temperature constant; a solution-delivering mechanism (106) for delivering the phoresis medium in the phoresis medium container to the capillary array from the capillary head; and a power source for applying a voltage to both ends of the capillary array. Holes for insertion of the capillary head are provided in upper sections of the positive-electrode-side buffer solution container and the phoresis medium container. The thermostat oven unit is provided with a first lid member (207) that is positioned above the sample tray and seals the upper section of the positive-electrode-side buffer solution container while the phoresis medium is being delivered by the solution-delivering mechanism.

IPC Classes  ?

7.

Far-infrared spectroscopic device and far-infrared spectroscopic method

      
Application Number 16638638
Grant Number 11016023
Status In Force
Filing Date 2017-08-22
First Publication Date 2021-05-06
Grant Date 2021-05-25
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Mohara, Mizuki
  • Shimura, Kei
  • Aiko, Kenji

Abstract

In an is-TPG method in which lasers having two different wavelengths are used to generate a wavelength-variable far-infrared light, a far-infrared light (TPG light) having an unstable output at a broad wavelength is also slightly generated at the same time with only one laser light. The generated is-TPG and the TPG light are converted, after passing through a specimen, to near-infrared light inside a nonlinear optical crystal for detection and are observed by a detector. The signal light output of the is-TPG light becomes unstable due to the TPG light. According to the present invention, the TPG light is removed by means of a slit and the like (filter) immediately before the specimen and is not introduced into the nonlinear optical crystal for detection. At this time, by using a change in the emission direction when the frequency of the is TPG light is changed, the filter is moved in accordance with the frequency so that only the is-TPG light passes therethrough (see FIG. 1C).

IPC Classes  ?

  • G01N 21/3581 - Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using Terahertz radiation
  • G01J 3/10 - Arrangements of light sources specially adapted for spectrometry or colorimetry
  • G01J 3/02 - Spectrometry; Spectrophotometry; Monochromators; Measuring colours - Details
  • G01J 3/42 - Absorption spectrometry; Double-beam spectrometry; Flicker spectrometry; Reflection spectrometry

8.

GENOME ASSEMBLY METHOD, NON-TRANSITORY COMPUTER READABLE MEDIUM, AND GENOME ASSEMBLY DEVICE

      
Application Number 16598319
Status Pending
Filing Date 2019-10-10
First Publication Date 2021-04-15
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Nagai, Tateo
  • Ogino, Tsuyoshi

Abstract

Provided is a method of assembling a genome, including: determining the reference appearance rates, that are the appearance rates of all n-base motifs in the nucleotide sequence of a reference genome, in which the n-base motif is a nucleotide sequence containing n bases; and the sample appearance rates, that are the appearance rates of all the n-base motifs in the nucleotide sequences of DNA fragments, calculating the deviations of the sample appearance rates from the reference appearance rates for all the n-base motifs; selecting a predetermined number of n-base motifs having smallest deviations and sample appearance rates of not less than a predetermined value; converting the nucleotide sequences of the DNA fragments into DNA fragments in genome map format using the predetermined number of n-base motifs selected; and assembling the DNA fragments converted in genome map format to generate assemble contigs derived from the DNA in the sample.

IPC Classes  ?

  • G16B 30/20 - Sequence assembly
  • G16B 20/20 - Allele or variant detection, e.g. single nucleotide polymorphism [SNP] detection

9.

AUTOMATIC ANALYSIS APPARATUS

      
Application Number 16644622
Status Pending
Filing Date 2018-08-22
First Publication Date 2021-03-04
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Yamashita, Taichiro
  • Okusa, Takenori
  • Sakairi, Susumu

Abstract

A driving mechanism for moving a vessel having a disposal box placed thereon in a front-rear direction the same as an opening/closing direction of a drawer is provided lower than a bottom surface of the vessel. A first rail extended in a movement direction of an operating unit, a second rail extended in a movement direction of the vessel provided in the drawer, and toothed pulleys for rotating a toothed belt within a horizontal plane are arranged. The first rail, the second rail, and the toothed belt are placed side by side without overlapping with each other in a vertical direction. As a result, the operation of taking out the disposal box in which used sample dispensing tips or reaction vessels are accumulated is simple.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system

10.

Height measuring device and beam irradiation device

      
Application Number 16747942
Grant Number 11959735
Status In Force
Filing Date 2020-01-21
First Publication Date 2020-09-17
Grant Date 2024-04-16
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Nakai, Naoya
  • Shimoda, Yuichi
  • Suzuki, Makoto

Abstract

An object of the present disclosure is to propose a height measuring device which performs height measurement with high accuracy at each height with a relatively simple configuration even when the sample surface height changes greatly. A height measuring device which includes a projection optical system configured to project a light ray onto an object to be measured and a detection optical system including a detection element configured to detect a reflected light ray from the object to be measured, where the projection optical system includes a light splitting element (103) which splits a trajectory of the light ray with which the object to be measured is irradiated into a plurality of parts, and thus it is possible to project a light ray to a predetermined position even when the object to be measured is located at a plurality of heights, is proposed.

IPC Classes  ?

  • G01B 11/06 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness for measuring thickness
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams

11.

Automated analyzer

      
Application Number 16646465
Grant Number 11619639
Status In Force
Filing Date 2018-08-23
First Publication Date 2020-09-17
Grant Date 2023-04-04
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Yasui, Akihiro
  • Fukugaki, Tatsuya
  • Akutsu, Masashi
  • Suzuki, Naoto

Abstract

The present invention reduces the turnaround time of an automated analyzer. During a period when cyclic measurement by a measurement unit is unnecessary, a controller washes a reaction vessel using a washing cycle having a cycle time shorter than that of an analysis cycle. A single analysis cycle and a single washing cycle both include a reaction disc stopping period and rotation period. In the washing cycle, there is no time during the stopping period when a sample dispensing mechanism, reagent dispensing mechanism, or stirring mechanism operates but there is a time when a washing mechanism operates. The washing cycle stopping period is shorter than the analysis cycle stopping period. The amount of rotation of the reaction disk in the analysis cycle rotation period is the same as the amount of rotation of the reaction disk in the washing cycle rotation period.

IPC Classes  ?

  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices

12.

Automatic Analysis Device

      
Application Number 16646824
Status Pending
Filing Date 2019-01-23
First Publication Date 2020-09-03
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Konishi, Rei
  • Sasaki, Nobuhiko
  • Iijima, Masahiko

Abstract

Provided is an automatic analysis device that avoids carryover and prevents deterioration of analysis performance without controlling reaction cell position. This automatic analysis device is provided with: a reaction cell in which a sample and a reagent are mixed and allowed to react; a light source that radiates light onto the mixed liquid of the sample and the reagent, which has been dispensed into the reaction cell; a detector that detects the light radiated from the light source; and a cleaning mechanism that cleans the reaction cell. The cleaning mechanism includes an intake nozzle that draws in liquid from the reaction cell and a discharge nozzle that discharges the liquid into the reaction cell; the intake nozzle and the discharge nozzle can move vertically; and the intake nozzle is cleaned by lowering the intake nozzle into the reaction cell, in which a cleaning liquid or cleaning water have been accumulated, without drawing in the cleaning liquid or the cleaning water.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 21/47 - Scattering, i.e. diffuse reflection
  • G01N 21/59 - Transmissivity

13.

Pattern measurement device and pattern measurement method

      
Application Number 16645885
Grant Number 11353798
Status In Force
Filing Date 2017-10-13
First Publication Date 2020-09-03
Grant Date 2022-06-07
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Yamamoto, Takuma
  • Ohta, Hiroya
  • Tanimoto, Kenji
  • Abe, Yusuke
  • Tamori, Tomohiro
  • Nojiri, Masaaki

Abstract

The present invention has a computation device for measuring the dimensions of patterns formed on a sample on the basis of a signal obtained from a charged particle beam device. The computation device has a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights on the basis of an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.

IPC Classes  ?

  • G03F 7/20 - Exposure; Apparatus therefor
  • G01B 15/04 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes

14.

Automatic analyzer

      
Application Number 16646683
Grant Number 11402397
Status In Force
Filing Date 2019-01-22
First Publication Date 2020-09-03
Grant Date 2022-08-02
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Kabe, Yoshihiro
  • Okusa, Takenori

Abstract

In the case of adopting a configuration in which reagent bottles are radially disposed on a reagent disk and a reagent dispensing mechanism is rotated to access the reagent bottles, one reagent bottle includes a plurality of suction ports in which suction positions are different from each other, resulting in prolonging a step of dispensing a reagent. The invention is directed to an automatic analyzer including: a reagent disk that accommodates a plurality of reagent bottles including a plurality of suction ports and conveys the reagent bottles to a desired position by rotating in a circumferential direction around a central axis; and a reagent dispensing mechanism that rotates around a rotational axis and sucks a reagent of the reagent bottle placed at a predetermined position on the reagent disk. The reagent bottle is accommodated in the reagent disk such that the central axis of the reagent bottle and a diameter of the reagent disk form a predetermined inclination.

IPC Classes  ?

  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor

15.

Automated analyzer and automated analysis method

      
Application Number 16646386
Grant Number 11187712
Status In Force
Filing Date 2018-09-06
First Publication Date 2020-08-27
Grant Date 2021-11-30
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Kazama, Yuto
  • Iijima, Masahiko
  • Yabutani, Chie
  • Kogure, Kenji

Abstract

The present invention makes it possible for an automated analyzer including two or more types of photometers to obtain suitable output of the measurement results of the plurality of photometers and suitable data alarm output even if there is an abnormality, or the like, at the time of measurement. This automated analyzer includes, for example, two types of photometers having different quantitative ranges and an analysis control unit for controlling analysis that includes measurement of a given sample using the two types of photometers. If two types of data alarms corresponding to abnormalities, or the like, during measurement have been added to the two types of measurement results from the two types of photometers, the analysis control unit selects measurement result and data alarm output corresponding to the combination of the two types of data alarms and outputs the same to a user as analysis results.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 21/27 - Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection
  • G01N 21/47 - Scattering, i.e. diffuse reflection
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 27/416 - Systems
  • G01N 27/417 - Systems using cells and probes with solid electrolytes

16.

Specimen Processing System

      
Application Number 16646023
Status Pending
Filing Date 2018-11-19
First Publication Date 2020-08-27
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Yamamoto, Tsuyoshi
  • Onizawa, Kuniaki

Abstract

A specimen processing system comprising a pre-processing device performing analysis pre-processing of a specimen contained in a specimen container, an analyzing device performing analysis processing of the specimen having been subjected to the pre-processing by the pre-processing device, a specimen transport unit transporting the specimen container between the pre-processing device and the analyzing device, and a transfer unit transferring the specimen between the analyzing device and the specimen transport unit, the specimen transport unit comprising a transport unit body, an extending line unit, a direction turning unit, and a terminal unit, and further provided with one control board that is mounted on the transport unit body or the transfer unit and controls operation of the transfer unit, the transport unit body, the extending line unit, the direction turning unit, and the terminal unit as transport control of the specimen container.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

17.

AUTOMATIC ANALYZER

      
Application Number 16646189
Status Pending
Filing Date 2019-01-29
First Publication Date 2020-08-27
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Nakano, Hiroki
  • Tanoue, Hidetsugu
  • Suzuki, Yoichiro
  • Okusa, Takenori

Abstract

An automatic analyzer which accurately detects a liquid volume of a reagent irrespective of a shape of a reagent container is provided. The invention is directed to an automatic analyzer including: a reagent container that contains a reagent; an emission unit that is provided outside the reagent container and emits light so as to pass inside the reagent container; a light receiving unit that is provided outside the reagent container and receives the light emitted from the emission unit; and a determination unit that, based on the light received by the light receiving unit, detects a liquid level inside the reagent container, and determines whether a liquid volume in the reagent container becomes equal to or less than a predetermined value from the liquid level. A wavelength of the light is determined based on a material of the reagent container and a type of the reagent.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system

18.

Automated analysis device

      
Application Number 16646410
Grant Number 11662357
Status In Force
Filing Date 2018-10-29
First Publication Date 2020-08-27
Grant Date 2023-05-30
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Akutsu, Masashi
  • Suzuki, Naoto
  • Fujita, Hiroki
  • Yasui, Akihiro

Abstract

This automated analysis device is provided with a plurality of analysis units for analyzing a specimen, a buffer portion which holds a plurality of specimen racks on which are placed specimen containers holding the specimen, a sampler portion which conveys the specimen racks held in the buffer portion to the analysis units, and a control portion which, when performing a process to deliver the specimen racks to the plurality of analysis units, outputs synchronization signals to all the plurality of analysis units, wherein the analysis unit performs a delivery process starting from the synchronization signal, and the analysis unit performs a delivery process starting from the synchronization signal.

IPC Classes  ?

  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 27/447 - Systems using electrophoresis
  • A61P 7/00 - Drugs for disorders of the blood or the extracellular fluid
  • A61K 35/14 - Blood; Artificial blood
  • A61M 1/02 - Blood transfusion apparatus
  • G01N 37/00 - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES - Details not covered by any other group of this subclass
  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system

19.

Defect classification device, inspection device, and inspection system

      
Application Number 16642948
Grant Number 11442024
Status In Force
Filing Date 2017-09-11
First Publication Date 2020-08-13
Grant Date 2022-09-13
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Kondo, Takanori
  • Honda, Toshifumi
  • Hamamatsu, Akira
  • Ota, Hideo
  • Kimoto, Yoshio

Abstract

In order to prevent an erroneous determination of an on-film defect, the sensitivity of the post-inspection is reduced so that a film swelling due to a minute defect would not be detected. Classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling, by performing a coordinate correction on the result of a post-inspection by an actual-defect fine alignment using the result of a pre-inspection performed with two-stage thresholds, and by checking defects against each other. In addition, classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling by, during the post-inspection, preparing instruction data from information of the refractive index and thickness of a film formed on a wafer and comparing the instruction data with a signal intensity ratio of a detection system.

IPC Classes  ?

  • G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined
  • G01N 21/956 - Inspecting patterns on the surface of objects

20.

Charged particle beam device

      
Application Number 16641870
Grant Number 11640897
Status In Force
Filing Date 2017-09-04
First Publication Date 2020-08-06
Grant Date 2023-05-02
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Hirano, Ryo
  • Nomaguchi, Tsunenori
  • Kamiya, Chisato
  • Katane, Junichi

Abstract

The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/141 - Electromagnetic lenses
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/244 - Detectors; Associated components or circuits therefor

21.

Apparatus, method for determining state of sample, and analysis system

      
Application Number 16635502
Grant Number 11282184
Status In Force
Filing Date 2018-05-31
First Publication Date 2020-07-30
Grant Date 2022-03-22
Owner HITACHI-HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kakishita, Yasuki
  • Hattori, Hideharu
  • Sakazume, Taku
  • Suzuki, Yoichiro

Abstract

A state of a sample surface is accurately determined without lowering analysis efficiency. There is provided an apparatus for determining a state of a sample to be analyzed contained in a container, in which the apparatus acquires an image of the sample, analyzes a position and a size of an object to be detected with respect to a detection range set in the image by using the image of the sample, and determines the state of the sample based on a result of the analysis.

IPC Classes  ?

22.

Charged particle beam apparatus

      
Application Number 16641035
Grant Number 11430630
Status In Force
Filing Date 2017-09-04
First Publication Date 2020-07-09
Grant Date 2022-08-30
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Hirano, Ryo
  • Nomaguchi, Tsunenori
  • Kamiya, Chisato
  • Katane, Junichi

Abstract

The present invention realizes a composite charged particle beam apparatus capable of suppressing a leakage magnetic field from a pole piece forming an objective lens of an SEM with a simple structure. The charged particle beam apparatus according to the present invention obtains an ion beam observation image while passing a current to a first coil constituting the objective lens, and performs an operation of reducing the image shift by passing a current to a second coil with a plurality of current values, and determines a current to be passed to the second coil based on a difference between the operations.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/141 - Electromagnetic lenses
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/30 - Electron-beam or ion-beam tubes for localised treatment of objects

23.

SPECIMEN PROCESSING SYSTEM

      
Application Number 16645838
Status Pending
Filing Date 2018-11-21
First Publication Date 2020-06-25
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Umeki, Taro
  • Yano, Shigeru

Abstract

Provided is a specimen processing system which can contribute to space saving. The specimen processing system includes a put-in module which puts a specimen on a put-in tray in a holder, a housing module which houses the specimen from the holder in a housing tray, and a stock module which stocks the holder, in which an empty holder which is generated because the specimen is housed is directly conveyed to the put-in module without being conveyed to the stock module and is used for putting a new specimen therein.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system
  • G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations

24.

Light guide, detector having light guide, and charged particle beam device

      
Application Number 16751705
Grant Number 10679821
Status In Force
Filing Date 2020-01-24
First Publication Date 2020-06-09
Grant Date 2020-06-09
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Sekiguchi, Yoshifumi
  • Imamura, Shin
  • Kawano, Hajime
  • Hoque, Shahedul

Abstract

a light guide. The light guide has an incident surface configured to incident a light from the scintillator, an emission surface configured to emit a light incident from the incident surface, and a first surface configured to guide the light incident from the incident surface to a side of the emission surface. The light guide has a bent portion. The bent portion has a second surface configured to guide the light to the side of the emission surface in regions excluding a region between the incident surface and the emission surface.

IPC Classes  ?

  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 37/28 - Electron or ion microscopes; Electron- or ion-diffraction tubes with scanning beams
  • H01J 37/244 - Detectors; Associated components or circuits therefor

25.

Automated analyzer and image processing method

      
Application Number 16626413
Grant Number 11009519
Status In Force
Filing Date 2018-06-07
First Publication Date 2020-05-07
Grant Date 2021-05-18
Owner Hitachi High-Technologies Corporation (Japan)
Inventor Tokiwa, Koji

Abstract

This automated analyzer comprises: a sample disk for mounting sample containers accommodating samples; a sample disk control unit for controlling the rotation of the sample disk; a sample dispensing probe for sucking the sample out of a sample container that has arrived at a prescribed suction position as a result of the rotation of the sample disk; a photometer for carrying out automatic biochemical analysis; a blood coagulation time detection unit for carrying out blood coagulation time analysis; a light-blocking cover that covers the photometer and blood coagulation time detection unit; and a sample information output unit for outputting sample information. The sample information output unit acquires analysis information indicating the analysis state of the mounted samples and position information indicating the positions of the samples as sample disk monitor information 401 and displays the analysis information, the position information, and an image 402 showing the light-blocking cover on the imaging unit so as to overlap.

IPC Classes  ?

  • G01N 35/04 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations - Details of the conveyor system
  • G01N 21/17 - Systems in which incident light is modified in accordance with the properties of the material investigated
  • G01N 33/86 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving blood coagulating time

26.

Apparatus and method for storing thin film device and method for measuring biological molecule

      
Application Number 16624265
Grant Number 11656219
Status In Force
Filing Date 2017-07-07
First Publication Date 2020-04-16
Grant Date 2023-05-23
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Matsui, Kazuma
  • Fujioka, Michiru
  • Goto, Yusuke

Abstract

(3) A solution that contains a salt with a concentration of 1 mol/L or more and a saturation concentration or less and is cooled and maintained to a temperature equal to or higher than a solidification point and lower than 25° C.

IPC Classes  ?

  • G01N 33/487 - Physical analysis of biological material of liquid biological material
  • C12Q 1/6869 - Methods for sequencing
  • B82Y 5/00 - Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery

27.

Plasma ion source and charged particle beam apparatus

      
Application Number 15019987
Grant Number 09773637
Status In Force
Filing Date 2016-02-10
First Publication Date 2016-08-18
Grant Date 2017-09-26
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Oba, Hiroshi
  • Sugiyama, Yasuhiko
  • Okabe, Mamoru

Abstract

A plasma ion source includes: a gas introduction chamber, into which raw gas is introduced; an insulation member provided in the gas introduction chamber; a plasma generation chamber connected to the gas introduction chamber; a coil that is wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; and an electrode arranged at a boundary between the gas introduction chamber and the plasma generation chamber and having a plurality of through-holes formed therein, wherein a size of the through-holes is smaller than a length of a plasma sheath.

IPC Classes  ?

  • H01J 37/08 - Ion sources; Ion guns
  • H05H 1/30 - Plasma torches using applied electromagnetic fields, e.g. high-frequency or microwave energy
  • H05H 1/46 - Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

28.

Plasma ion source and charged particle beam apparatus

      
Application Number 15019990
Grant Number 09773646
Status In Force
Filing Date 2016-02-10
First Publication Date 2016-08-18
Grant Date 2017-09-26
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Oba, Hiroshi
  • Sugiyama, Yasuhiko
  • Okabe, Mamoru

Abstract

A plasma ion source includes: a gas introduction chamber, into which raw gas is introduced; a plasma generation chamber connected to the gas introduction chamber and made of a dielectric material; a coil wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; an envelope surrounding the gas introduction chamber, the plasma generation chamber and the coil; and insulating liquid filled inside the gas introduction chamber, the plasma generation chamber and the envelope to immerse the coil and having an dielectric strength voltage relatively greater than that of the envelope and the same dielectric dissipation factor as the plasma generation chamber.

IPC Classes  ?

  • H01J 37/08 - Ion sources; Ion guns
  • H01J 37/32 - Gas-filled discharge tubes
  • H01J 37/20 - Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
  • H01J 27/16 - Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
  • H01J 37/06 - Electron sources; Electron guns

29.

Electrochemiluminescence method of detecting an analyte in a liquid sample and analysis system

      
Application Number 14968118
Grant Number 10422797
Status In Force
Filing Date 2015-12-14
First Publication Date 2016-04-07
Grant Date 2019-09-24
Owner
  • ROCHE DIAGNOSTICS OPERATIONS, INC. (USA)
  • HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Kraus, Ralf
  • Larbolette, Oliver
  • Staebler, Friedrich
  • Yamashita, Yoshihiro
  • Sakashita, Yukinori
  • Matsuoka, Shinya
  • Saito, Michihiro
  • Sakazume, Taku
  • Takahashi, Katsuaki

Abstract

An electrochemiluminescence method of detecting an analyte in a liquid sample and a corresponding analysis system. An analyte in a liquid sample is detected by first providing a receptacle containing a fluid comprising protein coated magnetic microparticles to a stirring unit. Stirring of the fluid is necessary since the density of the microparticles is usually higher than the density of the buffer fluid. Thus the microparticles tend to deposit on the bottom of the receptacle leading to an aggregation of the microparticles because of weak interactions. To obtain representative measurements a homogeneous distribution of the microparticles in the buffer fluid is necessary to ensure a constant concentration of microparticles for each analysis cycle. It is further necessary to provide disaggregation of the microparticles, which is also realized by stirring the fluid. Stirring is conducted with a rotational frequency that is adapted to the amount of fluid to be stirred.

IPC Classes  ?

  • G01N 33/543 - Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
  • G01N 21/66 - Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
  • G01N 21/76 - Chemiluminescence; Bioluminescence
  • G01N 33/58 - Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving labelled substances
  • G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor
  • G01N 21/69 - Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence specially adapted for fluids

30.

Sample preparation container

      
Application Number 29468113
Grant Number D0748813
Status In Force
Filing Date 2013-09-26
First Publication Date 2016-02-02
Grant Date 2016-02-02
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Ishiguro, Koji
  • Morokuma, Hidetoshi
  • Ogawa, Yukihiro
  • Somekawa, Tsuyoshi

31.

Component analyzer

      
Application Number 29466163
Grant Number D0746476
Status In Force
Filing Date 2013-09-05
First Publication Date 2015-12-29
Grant Date 2015-12-29
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Noda, Hiroyuki
  • Morokuma, Hidetoshi
  • Ishiguro, Koji

32.

Light shielding sheet of a biological optical measuring instrument

      
Application Number 29466319
Grant Number D0723701
Status In Force
Filing Date 2013-09-06
First Publication Date 2015-03-03
Grant Date 2015-03-03
Owner HITACHI HIGH-TECHNOLOGIES CORPORATION (Japan)
Inventor
  • Maki, Atsushi
  • Hasegawa, Kiyoshi
  • Sugimoto, Hideo
  • Kimura, Osamu

33.

Sample holder for a component analyzer

      
Application Number 29468101
Grant Number D0711011
Status In Force
Filing Date 2013-09-26
First Publication Date 2014-08-12
Grant Date 2014-08-12
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Noda, Hiroyuki
  • Morokuma, Hidetoshi
  • Ishiguro, Koji

34.

Component analyzer

      
Application Number 29409008
Grant Number D0708530
Status In Force
Filing Date 2011-12-20
First Publication Date 2014-07-08
Grant Date 2014-07-08
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Noda, Hiroyuki
  • Oonuma, Mitsuru
  • Sato, Yoko
  • Ishiguro, Kouji
  • Morokuma, Hidetoshi

35.

Electron microscope

      
Application Number 29456320
Grant Number D0708244
Status In Force
Filing Date 2013-05-30
First Publication Date 2014-07-01
Grant Date 2014-07-01
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Matoba, Kosuke
  • Suzuki, Hiroyuki
  • Sato, Hirofumi
  • Sakamoto, Naoki
  • Moriya, Toshiyuki

36.

Cover for an electron microscope

      
Application Number 29456325
Grant Number D0708245
Status In Force
Filing Date 2013-05-30
First Publication Date 2014-07-01
Grant Date 2014-07-01
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Matoba, Kosuke
  • Suzuki, Hiroyuki
  • Sato, Hirofumi
  • Sakamoto, Naoki
  • Moriya, Toshiyuki

37.

Pump for liquid chromatograph analyzer

      
Application Number 29429033
Grant Number D0691280
Status In Force
Filing Date 2012-08-07
First Publication Date 2013-10-08
Grant Date 2013-10-08
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Matoba, Kosuke
  • Oonuma, Mitsuru
  • Tomioka, Masaru
  • Mori, Kiyotoshi
  • Owada, Akira
  • Sato, Yoko
  • Noda, Hiroyuki

38.

Fixation device for a sample case for an electron microscope

      
Application Number 29384357
Grant Number D0660335
Status In Force
Filing Date 2011-01-31
First Publication Date 2012-05-22
Grant Date 2012-05-22
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Nagakubo, Yasuhira
  • Tanigaki, Toshiaki
  • Hirota, Hideki
  • Asakawa, Takayuki
  • Itou, Katsuji

39.

Sample case for an electron microscope

      
Application Number 29384355
Grant Number D0651226
Status In Force
Filing Date 2011-01-31
First Publication Date 2011-12-27
Grant Date 2011-12-27
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Nagakubo, Yasuhira
  • Tanigaki, Toshiaki
  • Hirota, Hideki
  • Asakawa, Takayuki
  • Itou, Katsuji

40.

Organizer for liquid chromatograph analyzer

      
Application Number 29383310
Grant Number D0646797
Status In Force
Filing Date 2011-01-14
First Publication Date 2011-10-11
Grant Date 2011-10-11
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Oonuma, Mitsuru
  • Omachi, Akira
  • Noda, Hiroyuki
  • Maruoka, Kantaro
  • Tomida, Shoji
  • Shoji, Tomohiro

41.

Auto sampler for liquid chromatograph analyzer

      
Application Number 29383285
Grant Number D0646398
Status In Force
Filing Date 2011-01-14
First Publication Date 2011-10-04
Grant Date 2011-10-04
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Oonuma, Mitsuru
  • Omachi, Akira
  • Maruoka, Kantaro
  • Tomida, Shoji
  • Shoji, Tomohiro

42.

Pump for liquid chromatograph analyzer

      
Application Number 29383228
Grant Number D0645977
Status In Force
Filing Date 2011-01-14
First Publication Date 2011-09-27
Grant Date 2011-09-27
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Oonuma, Mitsuru
  • Omachi, Akira
  • Nishiyama, Kazuhiko
  • Maruoka, Kantaro
  • Tomida, Shoji
  • Shoji, Tomohiro

43.

Pump for liquid chromatograph analyzer

      
Application Number 29383264
Grant Number D0645979
Status In Force
Filing Date 2011-01-14
First Publication Date 2011-09-27
Grant Date 2011-09-27
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Oonuma, Mitsuru
  • Omachi, Akira
  • Sato, Yoko
  • Maruoka, Kantaro
  • Tomida, Shoji
  • Shoji, Tomohiro

44.

Column oven for liquid chromatograph analyzer

      
Application Number 29383251
Grant Number D0645978
Status In Force
Filing Date 2011-01-14
First Publication Date 2011-09-27
Grant Date 2011-09-27
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Oonuma, Mitsuru
  • Omachi, Akira
  • Maruoka, Kantaro
  • Tomida, Shoji
  • Shoji, Tomohiro

45.

Control panel of detector for liquid chromatograph analyzer

      
Application Number 29383238
Grant Number D0645570
Status In Force
Filing Date 2011-01-14
First Publication Date 2011-09-20
Grant Date 2011-09-20
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Oonuma, Mitsuru
  • Omachi, Akira
  • Nishiyama, Kazuhiko
  • Maruoka, Kantaro
  • Tomida, Shoji
  • Shoji, Tomohiro

46.

Controller for liquid chromatograph analyzer

      
Application Number 29383298
Grant Number D0643936
Status In Force
Filing Date 2011-01-14
First Publication Date 2011-08-23
Grant Date 2011-08-23
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Oonuma, Mitsuru
  • Omachi, Akira
  • Maruoka, Kantaro
  • Tomida, Shoji
  • Shoji, Tomohiro

47.

Handles of module for liquid chromatograph analyzer

      
Application Number 29383235
Grant Number D0643130
Status In Force
Filing Date 2011-01-14
First Publication Date 2011-08-09
Grant Date 2011-08-09
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Oonuma, Mitsuru
  • Omachi, Akira
  • Maruoka, Kantaro
  • Tomida, Shoji
  • Shoji, Tomohiro

48.

Molecular testing machine

      
Application Number 29365821
Grant Number D0638952
Status In Force
Filing Date 2010-07-15
First Publication Date 2011-05-31
Grant Date 2011-05-31
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Oonuma, Mitsuru
  • Omachi, Akira
  • Ishizawa, Masato
  • Shoji, Yoshiyuki

49.

Electron microscope

      
Application Number 29363415
Grant Number D0636005
Status In Force
Filing Date 2010-06-09
First Publication Date 2011-04-12
Grant Date 2011-04-12
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Oonuma, Mitsuru
  • Omachi, Akira
  • Taniguchi, Yoshifumi
  • Nagaoki, Isao
  • Aoyagi, Hiroshi

50.

Optical inspection method and optical inspection system

      
Application Number 12963416
Grant Number 08189185
Status In Force
Filing Date 2010-12-08
First Publication Date 2011-03-31
Grant Date 2012-05-29
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Soeda, Hideki
  • Ochi, Masayuki

Abstract

An optical semiconductor wafer inspection system and a method thereof are provided for voids and particles produced in a flattening process by classifying and inspecting defects such as scratches, a polishing or grinding technique used for semiconductor manufacturing. The present invention is an optical semiconductor wafer inspection system and a method thereof characterized by obliquely illuminating a scratch, void or particle produced on the surface of a polished or ground insulating film at substantially the same velocity of light, detecting scattered light at the time of oblique illumination from the surface of an inspection target at different angles and thereby classifying the scratch, void or particle.

IPC Classes  ?

  • G01N 21/00 - Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light

51.

Portable terminal with sensors for recording data of activities

      
Application Number 29341495
Grant Number D0629785
Status In Force
Filing Date 2009-08-06
First Publication Date 2010-12-28
Grant Date 2010-12-28
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Yachida, Takashi
  • Ohkubo, Norio

52.

Method for detecting particles and defects and inspection equipment thereof

      
Application Number 12574185
Grant Number 08094298
Status In Force
Filing Date 2009-10-06
First Publication Date 2010-01-28
Grant Date 2012-01-10
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Togashi, Takahiro
  • Matsui, Shigeru

Abstract

A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.

IPC Classes  ?

  • G01N 21/00 - Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
  • G03B 242/02 -
  • H01J 37/304 - Controlling tubes by information coming from the objects, e.g. correction signals

53.

Template creation method and image processor therefor

      
Application Number 12399367
Grant Number 08180140
Status In Force
Filing Date 2009-03-06
First Publication Date 2009-12-10
Grant Date 2012-05-15
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Yang, Kyoungmo
  • Nishihara, Makoto
  • Koshihara, Shunsuke

Abstract

To create a template for use in image recognition based on design data, luminance information is set for each area in the template based on the information regarding the region defined by the template. The luminance information may be set based on material information, pattern size information of a pattern arranged in the region defined by the template, and layer information of the region defined by the template. Alternatively, luminance information may be set based on material information, setup conditions of the scanning electron microscope, and pattern outline information of a pattern arranged in the region defined by the template.

IPC Classes  ?

  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints

54.

Charged particle beam apparatus

      
Application Number 12410174
Grant Number 08168951
Status In Force
Filing Date 2009-03-24
First Publication Date 2009-07-23
Grant Date 2012-05-01
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Kawasaki, Takeshi
  • Nakano, Tomonori

Abstract

A charged particle beam apparatus having an aberration correction capability at high acceleration voltages. The charged particle beam apparatus comprises a charged particle beam source; an extraction electrode to extract charged particles from the charged particle beam source; a charged particle beam gun including a means for converging a charged particle beam; an acceleration means for accelerating a charged particle beam emitted from the charged particle beam gun; and an aberration correction means disposed between the charged particle beam gun and the acceleration means, in which an aberration enough to cancel out an aberration of a charged particle beam on the specimen surface is provided to an extraction electrical potential or an equivalent beam at the initial acceleration stage.

IPC Classes  ?

  • G01N 23/00 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or

55.

Scanning electron microscope alignment method and scanning electron microscope

      
Application Number 12182704
Grant Number 08188427
Status In Force
Filing Date 2008-07-30
First Publication Date 2009-02-05
Grant Date 2012-05-29
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Kakuta, Junichi
  • Ueda, Kazuhiro
  • Maeda, Tatsuya
  • Saito, Hiroyuki
  • Sasada, Katsuhiro

Abstract

A method and apparatus for alignment and astigmatism correction for a scanning electron microscope can prevent an alignment or correction error attributable to the conditions of a particular specimen. First, a difference is determined between optimal values acquired from an automatic axis alignment result on a standard sample, and those obtained from each of a plurality automatic axis alignment results on a observation target sample. An optimal value is then adjusted using the standard sample, by use of the difference thus obtained. Correspondingly, an optimal stigmator value (astigmatism correction signal) is acquired by using the standard sample, and storing the optimal stigmator value as a default value. The optimal stigmator value and the default value depending on the height of an observation target sample pattern are added, and an astigmatism correction is performed on the basis of the resultant stigmator value.

IPC Classes  ?

  • G01N 23/00 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or
  • G21K 7/00 - Gamma ray or X-ray microscopes

56.

Visual inspection method and apparatus and image analysis system

      
Application Number 12141947
Grant Number 08139841
Status In Force
Filing Date 2008-06-19
First Publication Date 2008-12-25
Grant Date 2012-03-20
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Shibuya, Hisae
  • Maeda, Shunji

Abstract

An image feature is calculated based on the image of a detected defect, a coordinate feature is calculated based on position coordinates of the detected defect, and false alarm judgment is performed according to a decision tree constructed by threshold processing to the image feature or the coordinate feature.

IPC Classes  ?

  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints

57.

Method and apparatus for creating imaging recipe

      
Application Number 11342694
Grant Number 07559047
Status In Force
Filing Date 2006-01-31
First Publication Date 2006-12-21
Grant Date 2009-07-07
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Miyamoto, Atsushi
  • Nagatomo, Wataru
  • Matsuoka, Ryoichi
  • Morokuma, Hidetoshi
  • Sutani, Takumichi

Abstract

In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.

IPC Classes  ?

  • G06F 17/50 - Computer-aided design
  • G06K 9/00 - Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints

58.

Measurement method of electron beam current, electron beam writing system and electron beam detector

      
Application Number 11207710
Grant Number 07425714
Status In Force
Filing Date 2005-08-22
First Publication Date 2006-03-23
Grant Date 2008-09-16
Owner
  • Hitachi High-Technologies Corporation (Japan)
  • Canon Kabushiki Kaisha (Japan)
Inventor
  • Sakakibara, Makoto
  • Nakayama, Yoshinori
  • Ohta, Hiroya
  • Sohda, Yasunari
  • Tanaka, Noriyuki
  • Someda, Yasuhiro

Abstract

A technology capable of reducing the influence of the noise overlapped in a long transmission line when accurately measuring weak beam current in an electron beam writing system and capable of accurately and efficiently measuring weak beam current in a beam writing system using multiple beams is provided. With using a switch for connecting and disconnecting an electron beam detecting device and a detected signal line, the electron beam detecting device is disconnected from the detected signal line to accumulate the detected signals in the electron beam detecting device during the beam current measurement. Simultaneously with the finish of the measurement, the electron beam detecting device and the detected signal line are connected to measure the accumulated signals. Also, in order to simultaneously perform the measurement method, a plurality of electron beam detecting devices and switches are used to simultaneously measure a plurality of electron beams with high accuracy.

IPC Classes  ?

  • G21K 5/10 - Irradiation devices with provision for relative movement of beam source and object to be irradiated

59.

Magnetic shielding apparatus and biomagnetism measuring device

      
Application Number 11196750
Grant Number 07339373
Status In Force
Filing Date 2005-08-04
First Publication Date 2006-03-16
Grant Date 2008-03-04
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Seki, Yusuke
  • Onuma, Mitsuru
  • Kandori, Akihiko
  • Suzuki, Daisuke
  • Akashi, Takuya
  • Murakami, Masahiro
  • Watanabe, Atsushi
  • Matsuoka, Yoshio

Abstract

The object of the invention is to provide a biomagnetism measuring device using a high-performance cylindrical shielding apparatus provided with a flange-type plate having an opening formed on a circumferential face, an auxiliary cylinder in which one or plural cylindrical members are connected so that the central axis of the opening of the flange-type plate and each central axis of the cylindrical members are coincident, cylindrical shields having first, second and third angular ranges with the y-axis, a revolving door having a cutout in a portion parallel to the y-axis and acquired by integrating the cylindrical shields, shield bases for supporting the cylindrical shield to which the flange-type plate is connected in a circular-arc part at both ends, revolving parts for revolving the revolving door in a circumferential direction of the y-axis along a circumferential part of the cylindrical shield and opening or closing an opening in the circumferential direction, a cryostat arranged inside the opening of the auxiliary cylinder and the opening and a SQUID fluxmeter arranged on a measurement face parallel to an XY plane inside the cryostat held at low temperature and characterized in that the circumferential part of the cylindrical shield is inserted between the circumferential parts of the cylindrical shields when the revolving door is closed, cylindrical internal space is formed and an environmental magnetic field that invades the internal space is screened.

IPC Classes  ?

  • G01R 33/035 - Measuring direction or magnitude of magnetic fields or magnetic flux using superconductive devices

60.

Liquid feeding system

      
Application Number 11171216
Grant Number 07350401
Status In Force
Filing Date 2005-07-01
First Publication Date 2006-01-05
Grant Date 2008-04-01
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Takao, Kunihiko
  • Kaji, Hironori
  • Ito, Masahito

Abstract

This liquid feeding system has the first and second pumps each of which is provided with a plunger. Liquid sucked through each of the pump suction ports is discharged out of the discharging port through the first pump and/or second pump. Under the starting operation mode, the second pump is stopped and only the first pump is operated. When the discharging pressure at the discharging port reaches up to a predetermined value, the starting operation mode is changed over to the normal operation mode. Under the normal operation mode, the first pump is stopped and only the second pump is operated.

IPC Classes  ?

  • G01N 30/00 - Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography

61.

Charged particle beam emitting device and method for adjusting the optical axis

      
Application Number 11166370
Grant Number 07355174
Status In Force
Filing Date 2005-06-27
First Publication Date 2005-12-29
Grant Date 2008-04-08
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Sato, Mitsugu
  • Ezumi, Makoto
  • Yamaguchi, Satoru

Abstract

A charged-particle beam emitting device which includes the following configuration devices so that a lowering in the image resolution will be suppressed even if a primary beam is tilted relative to a sample: A device for causing orbit of the primary beam to pass through off-axes of a plurality of lenses, and controlling off-axis orbit of the primary beam. This device allows the aberration which occurs in the objective lens at the time of beam tilt to be cancelled out by the aberration which occurs in the other lens. Also, there is provided a device for simultaneously modulating excitations of the plurality of lenses including the objective lens.

IPC Classes  ?

  • G01N 23/00 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or

62.

Mass spectrometer

      
Application Number 11146157
Grant Number 07348554
Status In Force
Filing Date 2005-06-07
First Publication Date 2005-12-08
Grant Date 2008-03-25
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Hashimoto, Yuichiro
  • Hasegawa, Hideki
  • Baba, Takashi
  • Satake, Hiroyuki
  • Waki, Izumi

Abstract

A mass spectrometer includes: an ion source for ionizing a specimen to generate ions, an ion transport portion for transporting the ions, a linear ion trap portion for accumulating the transported ions by a potential formed axially, and a control portion of ejecting the ions within a second m/z range different from a first m/z range, from the linear ion trap portion, and substantially at the same timing as the timing of accumulating the ions within the first m/z range from the transport portion into the linear ion trap portion. The ion transportation portion having a mass selection means for selecting the ions in the first m/z range.

IPC Classes  ?

  • B01D 59/44 - Separation by mass spectrography
  • H01J 49/00 - Particle spectrometers or separator tubes

63.

Scanning electron microscope and a method for adjusting a focal point of an electron beam of said scanning electron microscope

      
Application Number 11130121
Grant Number 07361896
Status In Force
Filing Date 2005-05-17
First Publication Date 2005-11-24
Grant Date 2008-04-22
Owner Hitachi High-Technologies Corporation (Japan)
Inventor
  • Honda, Toshifumi
  • Fukunishi, Munenori
  • Obara, Kenji

Abstract

In a scanning electron microscope, scanning region is set to be narrow, upon which focused electron beam is scanned, so that the focused electron beam can be irradiated at the almost same position by plural numbers of times, irrespective of movement of the stage or of moving of the stage during braking thereof, and upon that region to be scanned is irradiated the focused electron beam, by plural numbers of times, while changing the focal position, thereby forming an image thereof. From the image formed is calculated out a section, from which a focus-in position can be calculated out, and then the focus-in position is calculated out from that calculated section.

IPC Classes  ?

  • G01N 23/00 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or

64.

Service providing system and method

      
Application Number 10964687
Grant Number 07275687
Status In Force
Filing Date 2004-10-15
First Publication Date 2005-06-02
Grant Date 2007-10-02
Owner
  • Hitachi, Ltd. (Japan)
  • Hitachi High-Technologies Corporation (Japan)
Inventor
  • Wada, Kenji
  • Okamoto, Chikashi
  • Narita, Yoshishige
  • Kobayashi, Naohisa
  • Ito, Masanori

Abstract

A delivery service providing system includes an entrance and exit control unit, an identifier control unit, and a delivery service providing unit. The entrance and exit control unit inputs a ticket identifier of a user who has entered or exited a predetermined area and transmits the identifier to the identifier control unit. The identifier control unit registers the ticket identifier to a database and erases the ticket in case of exit. The identifier control unit receives an identifier set of a ticket identifier and a user's unit identifier from a user's unit, checks to judge whether an identifier set matching the received identifier set in the database. If the result is positive, the delivery service providing unit delivers digital contents to the user's unit. It then becomes possible to provide only the users existing in the area with the contents deliver service.

IPC Classes  ?

  • G06K 5/00 - Methods or arrangements for verifying the correctness of markings on a record carrier; Column-detection devices