Tantalum powder that is highly spherical is described. The tantalum powder can be useful in additive manufacturing and other uses. Methods to make the tantalum powder are further described as well as methods to utilize the tantalum powder in additive manufacturing processes. Resulting products and articles using the tantalum powder are further described.
B22F 10/34 - Process control of powder characteristics, e.g. density, oxidation or flowability
B22F 1/142 - Thermal or thermo-mechanical treatment
B22F 1/052 - Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
2.
Spherical Niobium Alloy Powder, Products Containing The Same, And Methods Of Making The Same
Niobium alloy powder that is highly spherical is described. The niobium alloy powder can be useful in additive manufacturing and other uses. Methods to make the niobium alloy powder are further described as well as methods to utilize the niobium alloy powder in additive manufacturing processes. Resulting products and articles using the niobium alloy powder are further described.
B22F 9/04 - Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor using physical processes starting from solid material, e.g. by crushing, grinding or milling
C22C 27/02 - Alloys based on vanadium, niobium or tantalum
B22F 9/04 - Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor using physical processes starting from solid material, e.g. by crushing, grinding or milling
C25D 11/26 - Anodisation of refractory metals or alloys based thereon
H01G 11/00 - Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
B22F 1/052 - Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
A tantalum-titanium alloy powder that is highly spherical is described. The alloy powder can be useful in additive manufacturing and other uses. Methods to make the alloy powder are further described as well as methods to utilize the alloy powder in additive manufacturing processes. Resulting products and articles using the alloy powder are further described.
C22C 27/02 - Alloys based on vanadium, niobium or tantalum
B22F 9/16 - Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor using chemical processes
B22F 9/06 - Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor using physical processes starting from liquid material
B33Y 70/00 - Materials specially adapted for additive manufacturing
B33Y 80/00 - Products made by additive manufacturing
A Ti—Zr alloy in powder form is described. Sintered pellets containing the Ti—Zr alloy powder of the present invention, as well as capacitor anodes, are further described.
H01G 9/042 - Electrodes characterised by the material
B22F 9/30 - Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor using chemical processes with decomposition of metal compounds, e.g. by pyrolysis
H01G 9/00 - Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
Tantalum powder that is highly spherical is described. The tantalum powder can be useful in additive manufacturing and other uses. Methods to make the tantalum powder are further described as well as methods to utilize the tantalum powder in additive manufacturing processes. Resulting products and articles using the tantalum powder are further described.
H01G 9/00 - Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
H01G 9/042 - Electrodes characterised by the material
B22F 1/00 - Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
H01G 11/00 - Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
C25D 11/26 - Anodisation of refractory metals or alloys based thereon
B22F 9/04 - Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor using physical processes starting from solid material, e.g. by crushing, grinding or milling
8.
Powder Metallurgy Sputtering Targets And Methods Of Producing Same
The present invention relates to sputtering targets and other metal articles as well as methods of making the same. More particularly, the present invention relates to methods for forming powder metallurgy sputtering targets and other metallurgical articles made from metal powders that include spherical metal powders, and the resulting product.
B22F 1/00 - Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
B22F 3/24 - After-treatment of workpieces or articles
B22F 9/20 - Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor using chemical processes with reduction of metal compounds starting from solid metal compounds
C22C 28/00 - Alloys based on a metal not provided for in groups
C22C 1/04 - Making non-ferrous alloys by powder metallurgy
9.
Process for manufacturing agglomerated particles of tantalum, mixed tantalum powder and process for manufacturing same, tantalum pellet and process for manufacturing same, and capacitor
A method for producing agglomerated tantalum particles, comprising: a step for grinding secondary tantalum particles, which are obtained by reducing a tantalum salt, and adding water thereto to give a water-containing mass; a step for drying said water-containing mass to give a dry mass; a step for sieving said dry mass to give spherical particles; and a step for heating said spherical particles. A mixed tantalum powder comprising a mixture of agglomerated tantalum particles (X) with agglomerated tantalum particles (Y), wherein said agglomerated tantalum particles (X) show a cumulative percentage of particles with particle size of 3 μm or less of 5 mass % or less after 25 W ultrasonic radiation for 10 min, while said agglomerated tantalum particles (Y) show a cumulative percentage of particles with particle size of 3 μm or less of 10 mass % or more after 25 W ultrasonic radiation for 10 min.
B22F 9/24 - Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
A method of making metal articles as well as sputtering targets is described, which involves deforming an ingot to preferred dimensions. In addition, products made by the process of the present invention are further described.
C22C 27/02 - Alloys based on vanadium, niobium or tantalum
C22F 1/18 - High-melting or refractory metals or alloys based thereon
B21B 1/02 - Metal rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling heavy work, e.g. ingots, slabs, billets, in which the cross-sectional form is unimportant
B21B 1/08 - Metal rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling work of special cross-section, e.g. angle steel
11.
Sputter targets and methods of forming same by rotary axial forging
A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.
C22F 1/18 - High-melting or refractory metals or alloys based thereon
C22F 1/04 - Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon
C22F 1/14 - Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of noble metals or alloys based thereon
C22F 1/08 - Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
Process for manufacturing agglomerated particles of tantalum, mixed tantalum powder and process for manufacturing same, tantalum pellet and process for manufacturing same, and capacitor
A method for producing agglomerated tantalum particles, comprising: a step for grinding secondary tantalum particles, which are obtained by reducing a tantalum salt, and adding water thereto to give a water-containing mass; a step for drying said water-containing mass to give a dry mass; a step for sieving said dry mass to give spherical particles; and a step for heating said spherical particles. A mixed tantalum powder comprising a mixture of agglomerated tantalum particles (X) with agglomerated tantalum particles (Y), wherein said agglomerated tantalum particles (X) show a cumulative percentage of particles with particle size of 3 μm or less of 5 mass % or less after 25 W ultrasonic radiation for 10 min, while said agglomerated tantalum particles (Y) show a cumulative percentage of particles with particle size of 3 μm or less of 10 mass % or more after 25 W ultrasonic radiation for 10 min.
A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.
A method of heat treating metal powder and/or metal oxide powder by microwave energy is described. Furthermore, products made by the various processes of the present invention are further described.
Methods to at least partially reduce a niobium oxide are described wherein the process includes mixing the niobium oxide and niobium powder to form a powder mixture that is then heat treated to form heat treated particles which then undergo reacting in an atmosphere which permits the transfer of oxygen atoms from the niobium oxide to the niobium powder, and at a temperature and for a time sufficient to form an oxygen reduced niobium oxide. Oxygen reduced niobium oxides having high porosity are also described as well as capacitors containing anodes made from the oxygen reduced niobium oxides.
xO powder wherein x is 0.1 to 0.5 is described. Further, this powder, as well as niobium suboxide powders, can be doped with at least one dopant oxide. Pressed bodies of the powder, sintered bodies, capacitor anodes, and capacitors are also described.
3, then the pellets are chemically converted in a phosphoric acid aqueous solution of concentration 0.1 vol. % at a voltage of 6V and a current of 90 mA/g, and the chemically converted pellets are used as measuring samples to measure the CV value in a sulfuric acid aqueous solution of concentration 30.5 vol. % at a temperature of 25° C. under a frequency of 120 Hz and a voltage of 1.5V.
A method of making metal articles as well as sputtering targets is described, which involves deforming an ingot to preferred dimensions. In addition, products made by the process of the present invention are further described.
A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.
A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.
A method to passivate a metal or metal oxide or metal suboxide powder, especially a valve metal powder such as tantalum or niobium and the passivated powders formed therefrom are described. The method includes passivating a starting powder with a gas having at least 25 wt. % oxygen present. Passivation is preferably achieved without performing any evacuation steps. Capacitors made from the passivated powders are also described.
C23C 8/06 - Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
22.
Method of forming sputtering articles by multidirectional deformation
A method of producing a valve metal mill form having dimensions sufficient to be divided to form a plurality of sputter targets is described. The method includes multidirectional deformation of an ingot to form a mill form having a preferred average grain size of about 100 microns or less and/or a texture substantially void of textural bands.
Methods to at least partially reduce a niobium oxide are described wherein the process includes mixing the niobium oxide and niobium powder to form a powder mixture that is then heat treated to form heat treated particles which then undergo reacting in an atmosphere which permits the transfer of oxygen atoms from the niobium oxide to the niobium powder, and at a temperature and for a time sufficient to form an oxygen reduced niobium oxide. Oxygen reduced niobium oxides having high porosity are also described as well as capacitors containing anodes made from the oxygen reduced niobium oxides.
Valve metal material, including a valve metal, a nitride layer located on the valve metal, and an oxide layer located on the nitride layer is described. Methods of forming such a valve metal material are also described. The method includes forming an oxide layer onto the valve metal and then forming a nitride layer between the oxide layer and the valve metal.
Capacitor anodes that include metallic columns formed on a substrate so as to form a porous microstructure and methods of making the anodes are described. The metallic columns can be distinct from one another and project outward from the substrate. Also described is the formation of the metallic columns on the substrate by vapor deposition, including glancing angle deposition (GLAD), and by etching a portion of a metal layer. High capacitance capacitors made from the capacitor anodes are also described.
Valve metal suboxides having a primary suboxide phase and optionally a secondary suboxide phase, a valve metal phase, and/or at least one tertiary suboxide phase can be present in varying amounts. Also disclosed is anodes and capacitors containing the valve metal suboxides of the present invention. Also, a method to prepare a valve metal suboxide is further described which includes granulating one or more of the starting materials individually or together and/or granulating the final product.
C22C 29/12 - Alloys based on carbides, oxides, borides, nitrides or silicides, e.g. cermets, or other metal compounds, e. g. oxynitrides, sulfides based on oxides
H01G 9/042 - Electrodes characterised by the material
C01B 13/14 - Methods for preparing oxides or hydroxides in general
Methods of forming tantalum powders and other valve metal powders are described. The method involves high impact milling a starting powder in a fluid medium and optionally a milling media using a high energy mill. The methods of the present invention have the ability to reduce DC leakage and/or increase capacitance capabilities of valve metal powders when formed into capacitor anodes. The methods of present invention further reduce the milling time necessary to form high surface area valve metal powders and leads to reducing contaminant levels in the valve metal powders. The process is particularly well-suited for forming metal flakes, such as tantalum or niobium flakes, of high purity.
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