An apparatus is provided that includes a word line coupled to a word line driver circuit, bit lines, a plurality of non-volatile memory cells each coupled to the word line and a corresponding one of the bit lines, and a control circuit coupled to the word line and the bit lines. The control circuit is configured to program the memory cells by causing the word line driver to apply a program pulse to the word line, and biasing each bit line to a corresponding bit line voltage that has a value that varies based on a distance between the word line driver and the corresponding bit line.
A memory system reads data from non-volatile memory cells using a set of read compare voltages to determine which data state the memory cells are in, where each data state is associated with predetermined data values. The read compare voltages are determined dynamically based on a difference between memory cell current at time of programming and memory cell current at time of reading.
Selector material layers are formed over the first electrically conductive lines, and magnetic tunnel junction material layers are formed over the selector material layers. The magnetic tunnel junction material layers are patterned into a two-dimensional array of magnetic tunnel junction (MTJ) pillar structures. A dielectric spacer material layer is deposited over the two-dimensional array of MTJ pillar structures. The dielectric spacer material layer and the selector material layers are anisotropically etched. Patterned portions of the selector material layers include a two-dimensional array of selector-containing pillar structures. Second electrically conductive lines are formed over the two-dimensional array of MTJ pillar structures.
H01L 27/22 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate using similar magnetic field effects
H01L 43/12 - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
H01L 43/02 - Devices using galvano-magnetic or similar magnetic effects; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof - Details
Memory cell sensing by charge sharing between two sense nodes is disclosed. A first sense node and a second sense node are pre-charged and the second node is discharged initiating charge sharing between the first sense node and the second sense node that results in an improved sense margin. Sensing circuitry disclosed herein may include one or more pre-charge circuits, sense enable circuits, and charge-sharing circuits. The increased sense margin achieved by sensing circuitry disclosed herein provides better noise immunity and more accurate sensing results.
An apparatus disclosed herein comprises: a plurality of memory cells and a control circuit coupled to the plurality of memory cells. The control circuit is configured to: determine whether the apparatus is in low power mode; in response to determining that the apparatus is in low power mode, perform a normal order read operation on a set of memory cells of the plurality of memory cells; and in response to determining that the apparatus is not in low power mode, perform a reverse order read operation on the set of memory cells of the plurality of memory cells.
G11C 11/4096 - Input/output [I/O] data management or control circuits, e.g. reading or writing circuits, I/O drivers or bit-line switches
G11C 11/4074 - Power supply or voltage generation circuits, e.g. bias voltage generators, substrate voltage generators, back-up power, power control circuits
A method of forming a memory device includes forming vertical stacks each including a respective first electrically conductive line and a respective selector rail over a substrate, such that the vertical stacks laterally extend along a first horizontal direction and are laterally spaced apart from each other along a second horizontal direction, forming magnetic tunnel junction material layers over the vertical stacks, and patterning the magnetic tunnel junction material layers and an upper portion of each of the selector rails to form a two-dimensional array of magnetic tunnel junctions and periodic notches at least in an upper portion of each of the selector rails.
H01L 43/02 - Devices using galvano-magnetic or similar magnetic effects; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof - Details
H01L 27/22 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate using similar magnetic field effects
H01L 43/12 - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
The memory device includes a plurality of memory cells which are arranged in an array. The memory device further includes a plurality of bit lines that are coupled with the memory cells and a controller. The controller is configured to program the memory cells from an erased data state to three programmed data states in a programming operation that includes three programming pulses and zero verify operations using different patterns to dictate the application of inhibit voltages to the bit lines during each of the three programming pulses. The patterns include two pre-established patterns and additional patterns that are derived from the pre-established patterns using logic operations.
A semiconductor structure includes a memory die bonded to a logic die. The memory die includes an alternating stack of insulating layers and electrically conductive layers, a semiconductor material layer located on a distal surface of the alternating stack, a dielectric spacer layer located on a distal surface of the semiconductor material layer, memory opening fill structures vertically extending through the alternating stack, through the semiconductor material layer, and at least partly through the dielectric spacer layer, and a source layer located on a distal surface of the dielectric spacer layer and contacting pillar portions of the vertical semiconductor channels that are embedded within the dielectric spacer layer.
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 23/522 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
H01L 23/528 - Layout of the interconnection structure
H01L 27/11519 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the top-view layout
H01L 27/11524 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11565 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the top-view layout
H01L 27/1157 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the memory core region with cell select transistors, e.g. NAND
H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
9.
EP CYCLING DEPENDENT ASYMMETRIC/SYMMETRIC VPASS CONVERSION IN NON-VOLATILE MEMORY STRUCTURES
A method for programming a target memory cell of a memory array of a non-volatile memory system, the method comprises determining a total number of erase/programming (EP) cycles that were applied previously to the memory cell and, (1) if the determined total number of cycles does not exceed a threshold value, applying an asymmetric programming scheme, and, (2) if the determined total number of cycles exceeds the threshold value, applying a symmetric programming scheme. Further, a magnitude of a boosting voltage bias (VPASS) that is to be applied to an unselected word line may be determined according to the determined total number of erase/programming (EP) cycles.
The memory device includes a chip with circuitry, a plurality of memory blocks, and a plurality of bit lines. The memory blocks include an array of memory cells, and the circuitry either overlies or underlies the array of memory cells. The bit lines are divided into two portions that are electrically connected with one another via at least one transistor so that at least one portion of each bit line can be charged independently of the other portion of the same bit line. During some read operations, this allows the memory device to operate with lower power requirements.
A non-volatile semiconductor memory device comprises non-volatile storage elements and one or more control circuits in communication with the non-volatile storage elements. The one or more control circuits are configured to determine for a program iteration of a program operation on a word line whether a condition is met and in response to determining that the condition is met, identify one or more memory cells of the word line that are in an erased state that have a threshold voltage higher than an erase threshold voltage and perform the program iteration of the program operation. The program iteration includes applying a first bitline inhibit voltage to bitlines connected to the identified one or more memory cells and a second bitline inhibit voltage to bitlines connected to one or more memory cells that are in the erased state that do not have a threshold voltage higher than the erase threshold voltage.
Contact via openings are formed through a retro-stepped dielectric material portion in a three-dimensional memory device to underlying etch stop structures. The etch stop structures may include a stepped conductive or semiconductor etch stop plate overlying stepped surfaces in the staircase region. The contact via openings are extended through the etch stop structures. Alternatively, electrically conductive layers, including a topmost dummy electrically conductive layer in the staircase region, may be employed as etch stop structures. In this case, the contact via openings can be extended through the electrically conductive layers. Insulating spacers are formed at peripheral regions of the extended contact via openings. Contact via structures surrounded by the insulating spacers are formed in the extended contact via openings to a respective underlying electrically conductive layer.
H01L 23/535 - Arrangements for conducting electric current within the device in operation from one component to another including internal interconnections, e.g. cross-under constructions
H01L 23/528 - Layout of the interconnection structure
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
13.
THREE-DIMENSIONAL MEMORY DEVICE CONTAINING ETCH-STOP STRUCTURES AND SELF-ALIGNED INSULATING SPACERS AND METHOD OF MAKING THE SAME
Contact via openings are formed through a retro-stepped dielectric material portion in a three-dimensional memory device to underlying etch stop structures. The etch stop structures may include a stepped conductive or semiconductor etch stop plate overlying stepped surfaces in the staircase region. The contact via openings are extended through the etch stop structures. Alternatively, electrically conductive layers, including a topmost dummy electrically conductive layer in the staircase region, may be employed as etch stop structures. In this case, the contact via openings can be extended through the electrically conductive layers. Insulating spacers are formed at peripheral regions of the extended contact via openings. Contact via structures surrounded by the insulating spacers are formed in the extended contact via openings to a respective underlying electrically conductive layer.
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
H01L 27/11519 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the top-view layout
H01L 27/11524 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/1157 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11565 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the top-view layout
H01L 23/522 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
14.
NON-VOLATILE MEMORY WITH EFFICIENT WORD LINE HOOK-UP
A three dimensional non-volatile memory structure includes word lines connected to non-volatile memory cells arranged in blocks. A plurality of word line switches are connected to the word lines and one or more sources of voltage. The word line switches are arranged in groups of X word line switches such that each group of X word line switches is positioned in a line under Y blocks of non-volatile memory cells and has a length that is equal to the width of the Y blocks of non-volatile memory cells, where X>Y.
An alternating stack of insulating layers and sacrificial material layers is formed over a substrate, and support pillar structures are formed through the alternating stack. Stepped surfaces are formed by patterning the alternating stack and the support pillar structures. A retro-stepped dielectric material portion is formed over the stepped surfaces. Memory openings and memory opening fill structures are formed through the alternating stack. Electrically conductive layers are formed by replacing at least the sacrificial material layers with at least one electrically conductive material. Contact via structures are formed through the retro-stepped dielectric material portion on the electrically conductive layers. A first support pillar structure is located directly below a first contact via structure.
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 23/522 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
H01L 27/11519 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the top-view layout
H01L 27/11524 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11565 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the top-view layout
H01L 27/1157 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
Technology is disclosed for improving read margin in a cross-point memory array. Drive transistors pass a read and write currents to the cross-point memory array. The read current charges a selected word line to turn on a threshold switching selector of a selected memory cell. While the threshold switching selector is on, the current (read or write) passes through the selected memory cell. The memory system applies a smaller overdrive voltage to the drive transistor when the drive transistor is passing the read current than when the drive transistor is passing the write current. A smaller overdrive voltage increases the resistance of the drive transistor which improves read margin. Increasing the resistance of the drive transistor increases the resistance seen by the threshold switching selector in the selected memory cell, which reduces the Ihold of the threshold switching selector. Reducing Ihold of the threshold switching selector improves read margin.
G11C 11/16 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
G11C 13/00 - Digital stores characterised by the use of storage elements not covered by groups , , or
17.
NON-VOLATILE MEMORY WITH PLANE INDEPENDENT SCREENING
A non-volatile storage apparatus that comprises a plurality of planes of non-volatile memory cells is capable of concurrently programming memory cells in multiple planes. In order to screen for failure of the programming process in a subset of planes, the completion of programming of a fastest plane to a particular data state is used as a trigger to test for program failure of other planes to a different data state. In one embodiment, the test for program failure of other planes to the different data state comprises determining if the memory cells of the other planes that are targeted for programming to the different data state have successfully completed verification of programming for the different data state. The programming process is stopped for those planes that fail the test.
A memory apparatus and operating method are provided. The apparatus includes memory cells connected to word lines and disposed in memory holes and configured to retain a threshold voltage. The memory holes are organized in rows grouped in strings. A control means is coupled to the word lines and the memory holes and programs the memory cells associated with a first one of the strings in a program operation and acquire a smart verify programming voltage in a smart verify operation including smart verify loops. The control means discards the smart verify programming voltage and determines another smart verify programming voltage in another smart verify operation on the memory cells associated with a second one of the strings in response to a quantity of the smart verify loops needed to complete programming of the memory cells associated with the first one of the strings being outside a predetermined threshold criteria.
A memory device includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, a memory opening fill structure including a vertical semiconductor channel and a memory film. The memory film includes a tunneling dielectric layer in contact with the vertical semiconductor channel, a first vertical stack of first dielectric oxide material portions located at levels of the insulating layers and including a dielectric oxide material of a first element, and a second vertical stack of second dielectric oxide material portions located at levels of the electrically conductive layers and including a mixed dielectric oxide material that is a dielectric oxide material of the first element and a second element.
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/1157 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11565 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the top-view layout
20.
GENERATING BOOSTED VOLTAGES WITH A HYBRID CHARGE PUMP
A hybrid charge pump is disclosed that employs novel arrangements of depletion-mode n-channel semiconductor devices and enhancement-mode p-channel semiconductor devices that eliminate or otherwise substantially reduce voltage drops that would otherwise occur across semiconductor device arrangements in existing charge pumps. As a result, the hybrid charge pump disclosed herein achieves the same output voltages as conventional charge pumps while requiring a reduced physical die area. Additionally, a hybrid charge pump arrangement disclosed herein employs a novel clocking scheme that reduces or eliminates reverse currents in the hybrid charge pump arrangement.
H02M 3/07 - Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using resistors or capacitors, e.g. potential divider using capacitors charged and discharged alternately by semiconductor devices with control electrode
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
G11C 16/26 - Sensing or reading circuits; Data output circuits
21.
AUDIT TECHNIQUES FOR READ DISTURB DETECTION IN AN OPEN MEMORY BLOCK
Read disturb audit techniques that include algorithmically applying audit verify voltages to erased wordlines in an open memory block are described. In an audit verify technique, a pass-through voltage ensured to be higher than any threshold voltage of any cell is applied to each wordline in an open memory block that includes one or more programmed memory cells, and an audit verify voltage lower than the pass-through voltage is applied to each erased wordline. A first bit count representing a number of non-conductive bitline(s) is determined and compared to a threshold value to determine whether to continue or discontinue block operation. In an audit verify and audit gap technique, the erased wordlines are divided into disjoint first and second groups, and an audit verify voltage and a non-verify voltage are alternatively applied to the groups in different audit verify stages.
Technology is disclosed herein for loading redundancy information during a memory system power on read (POR). A memory structure has primary regions (e.g., primary columns) and a number of redundant regions (e.g., redundant columns). The status of the regions is stored in isolation latches during the POR. Initially, simultaneously all latches for primary regions are reset to used and all latches for redundant regions are reset to unused. Then, isolation latches for defective primary regions are set to unused while isolation latches for corresponding redundant regions are set to used. There is no need to individually set isolation latches for redundant regions to unused, which saves time during POR. Moreover, whenever the isolation latch for a defective primary region is set from used to unused, in parallel the isolation latch for the replacement redundant column may be set from unused to used, thereby not incurring a time penalty.
A circuit is provided that includes a first transistor having a first terminal, a second terminal and a third terminal, and a second transistor comprising a first terminal, a second terminal and a third terminal. The first terminal of the first transistor comprises an input terminal of the circuit, the second terminal of the first transistor is coupled to a power supply bus, and the first transistor conducts a first current. The first terminal of the first transistor comprises an output terminal of the circuit, the second terminal of the second transistor is coupled to the power supply bus, and the third terminal of the second transistor is coupled to the third terminal of the first transistor. The second transistor conducts a second current proportional to the first current substantially independent of distance between the first transistor and the second transistor.
When erasing multiple sub-blocks of a block, erase verify is performed for memory cells connected to even word lines to generate even results and for memory cells connected to odd word lines to generate odd results. The even results and the odd results are used to determine that the erase verify process successfully completed. For each NAND string of a first sub-block, a last even result for the NAND string is compared to a last odd result for the NAND string. Despite the determination that the first sub-block successfully completed erase verify, the erasing failed for the first sub-block because the number of NAND strings that have the last even result different than the last odd result is greater than a limit. The system determines that one or more additional sub-blocks also failed erasing based on and in response to determining that the first sub-block failed erasing.
Systems and methods are provided for environmental testing of memory devices without altering the physical environment. One or more voltage source(s) of the memory die can be used as additional test mode inputs as test analogues for environmental sensor signals, such as voltage proportional signals. This can improve environmental circuit testability (e.g., cost, performance, speed, up-time) inasmuch as target circuitry can be used in an automatic way to reduce or prevent production failures. Target circuitry can be exercised in an on-the-fly manner to enable rapid, frequent testing, including in the field, with little memory system down-time.
G11C 29/12 - Built-in arrangements for testing, e.g. built-in self testing [BIST]
G11C 7/04 - Arrangements for writing information into, or reading information out from, a digital store with means for avoiding disturbances due to temperature effects
G11C 7/16 - Storage of analogue signals in digital stores using an arrangement comprising analogue/digital [A/D] converters, digital memories and digital/analogue [D/A] converters
H03M 1/46 - Analogue value compared with reference values sequentially only, e.g. successive approximation type with digital/analogue converter for supplying reference values to converter
The present disclosure provides for improving data retention reliability. During a programming operation associated with a memory cell, after the memory cell passes verification of a first verification voltage level, a second verification voltage level can be applied to the memory cell. Based on a comparison of the voltage in the memory cell with the second verification voltage level, a bit line voltage may be applied. Based on the applied bit line voltage, fast bits associated with the memory cell can be upshifted to an upper portion of a final voltage distribution associated with the programming operation. Upshifting the fast bits counteracts the downshifting effect in a final voltage distribution that may be caused by charge leakage or electron loss.
Technology is disclosed for a non-volatile memory system that decouples dataload from program execution. A memory controller transfers data for a program operation and issues a first type of program execution command. When in a coupled mode, the die programs the data in response to the first type of program execution command. When in a decoupled mode, rather than program the data into non-volatile memory cells the die enters a wait state. Optionally, the memory controller can instruct another die to execute a memory operation while the first die is in the wait state. In response to receiving a second type of program execution command from the memory controller when in the wait state, the first die will program the data into non-volatile memory cells. The memory controller may issue the second type of program execution command in response to determining that sufficient power resources (or thermal budget) exist.
The memory device includes a plurality of dies, and each die includes a plurality of blocks with a plurality of word lines. Some of the word lines are arranged in a plurality of exclusive OR (XOR) sets with each XOR set containing word lines in the same positions across the plurality of dies. The memory device further includes a controller that is configured to program the word lines of the blocks of at least one of the dies in a first programming direction. The controller is further configured to program the word lines of the blocks of at least one other die in a second programming direction that is opposite of the first programming direction.
A memory apparatus and method of operation are provided. The apparatus includes memory cells connected to word lines including a dummy word line and other data word lines. The memory cells are disposed in memory holes and configured to retain a threshold voltage. A control means is coupled to the word lines and the memory holes and is configured to determine whether one of the word lines being programmed in a program operation is a particular one of the word lines adjacent the dummy word line needing a dummy positioning operation. The control means is also configured to program the memory cells connected to the dummy word line to adjust the threshold voltage to a predetermined position threshold voltage in the dummy positioning operation in response to determining the one of the plurality of word lines being programmed in the program operation is the particular one of the word lines.
The memory device includes an array of memory cells, which are configured to retain multiple bits per memory cell, arranged in a plurality of word lines. A controller is configured to program the memory cells of a selected word line in a first programming pass. The first programming pass includes a plurality of programming pulses, each including the application of a programming voltage Vpgm by the controller to a control gate of the selected word line for a first duration. The controller is also configured to further program the memory cells of the selected word line in a second programming pass. The second programming pass includes a plurality of programming pulses, each of which includes the application of a programming voltage Vpgm by the controller to the control gate of the selected word line for a second duration that is different than the first duration.
A bonded assembly of a primary semiconductor die and a complementary semiconductor die includes first pairs of first primary bonding pads and first complementary bonding pads that are larger in area than the first primary bonding pads, and second pairs of second primary bonding pads and second complementary bonding pads that are smaller in area than the second primary bonding pads.
H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
The present disclosure provides for calibrating clock signals in an unmatched data input system. In various embodiments, an unmatched data input system uses multi-delay circuits to calibrate a clock signal distributed to various input/outputs in the unmatched data input system. These multi-delay circuits can include coarse delay circuits and fine delay circuits that provide a broad range as well as accurate delay capabilities. Through the use of these multi-delay circuits, the unmatched data input system can optimally align a clock signal with its associated data signal across multiple input/outputs.
H03L 7/081 - Automatic control of frequency or phase; Synchronisation using a reference signal applied to a frequency- or phase-locked loop - Details of the phase-locked loop provided with an additional controlled phase shifter
G11C 7/22 - Read-write [R-W] timing or clocking circuits; Read-write [R-W] control signal generators or management
A non-volatile semiconductor memory device, described herein, comprises non-volatile storage elements and one or more control circuits in communication with the non-volatile storage elements. The one or more control circuits are configured to, during a program iteration of a program operation, determine whether a program voltage level of the program iteration exceeds a threshold program voltage level and in response to the determination, identify a set of voltage levels to apply to a source line connected to a set of the non-volatile storage elements. The one or more control circuits are further configured to perform the program iteration of the program operation on the set of non-volatile storage elements, where the program iteration includes applying the set of voltage levels to the source line.
A non-volatile semiconductor memory device, described herein, comprises a bit line, a source line, a memory string comprising a plurality of memory cells connected in series between the source line and the bit line, and control circuitry coupled to the plurality of memory cells, the source line, and the bit line. The control circuitry is configured to: determine if a program operation is a single-bit program operation or multi-bit program operation; in response to the determination, identify a voltage level to set the source line to during performance of the program operation; and perform the program operation on the memory string, the program operation including setting the source line to the voltage level.
A memory apparatus and method of operation are provided. The memory apparatus includes memory cells connected to word lines and disposed in memory holes organized in rows grouped in strings. The memory cells are configured to retain a threshold voltage. The rows include full circle rows and semi-circle rows in which the memory holes are partially cut by a slit half etch. The memory holes of the semi-circle rows are coupled semi-circle bit lines and the memory holes of the full circle rows are coupled to full circle bit lines. A control means is configured to erase the memory cells in an erase operation. During the erase operation, the control means creates a capacitive coupling between each of the semi-circle bit lines and at least one neighboring one of the full circle bit lines to increase a semi-circle erase voltage applied to each of the semi-circle bit lines.
A semiconductor structure includes an alternating stack of insulating layers and electrically conductive layers, a memory opening vertically extending through the alternating stack, and a memory opening fill structure located in the memory opening and including a vertical semiconductor channel, a memory film in contact with the vertical semiconductor channel, and a vertical stack of tubular dielectric spacers laterally surrounding the memory film. The tubular dielectric spacers may include tubular graded silicon oxynitride portions having a composition gradient such that an atomic concentration of nitrogen decreases with a lateral distance from an outer sidewall of the memory film, or may include tubular composite dielectric spacers including a respective tubular silicon oxide spacer and a respective tubular dielectric metal oxide spacer. Each of the electrically conductive layers has a hammerhead-shaped vertical cross-sectional profile.
H01L 29/423 - Electrodes characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
H01L 21/28 - Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
37.
NON-VOLATILE MEMORY WITH ZONE BASED PROGRAM SPEED ADJUSTMENT
In order to decrease the width of threshold voltage distributions of programmed memory cells without unreasonably increasing the time needed to complete programming, a non-volatile memory uses a zone based program speed adjustment. The non-volatile memory starts programming a first set of the non-volatile memory cells until a minimum number of memory cells of the first set of non-volatile memory cells reach a first threshold voltage. In response to the minimum number of memory cells reaching the first threshold voltage, the first set of non-volatile memory cells are categorized into zones/groups based on threshold voltage. The speed of programming is then adjusted differently for each zone/group and programming is completed for the first set of non-volatile memory cells.
A semiconductor structure includes an alternating stack of insulating layers and electrically conductive layers, a memory opening vertically extending through the alternating stack, and a memory opening fill structure located in the memory opening and including a vertical semiconductor channel, a memory film in contact with the vertical semiconductor channel, and a vertical stack of tubular dielectric spacers laterally surrounding the memory film. The tubular dielectric spacers may include tubular graded silicon oxynitride portions having a composition gradient such that an atomic concentration of nitrogen decreases with a lateral distance from an outer sidewall of the memory film, or may include tubular composite dielectric spacers including a respective tubular silicon oxide spacer and a respective tubular dielectric metal oxide spacer. Each of the electrically conductive layers has a hammerhead-shaped vertical cross-sectional profile.
H01L 29/423 - Electrodes characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
H01L 21/28 - Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
39.
THREE-DIMENSIONAL MEMORY DEVICE WITH SELF-ALIGNED ETCH STOP RINGS FOR A SOURCE CONTACT LAYER AND METHOD OF MAKING THE SAME
A memory device includes a lower source-level semiconductor layer, a source contact layer, an upper source-level semiconductor layer, and an alternating stack of insulating layers and electrically conductive layers, and a memory opening fill structure vertically extending through the alternating stack and down to an upper portion of the lower source-level semiconductor layer. The memory opening fill structure includes a vertical semiconductor channel, a memory film laterally surrounding the vertical semiconductor channel, and an annular semiconductor cap contacting a bottom surface of the memory film and contacting a top surface segment of the source contact layer. The annular semiconductor cap may be employed as an etch stop structure during a manufacturing process.
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
The memory device includes a block with a plurality of memory cells arranged in a plurality of data word lines, which are arranged in sub-blocks that are not separated from one another by physical joints or by dummy word lines. A controller is configured to erase the memory cells of a selected sub-block of the plurality of sub-blocks without erasing the memory cells of the unselected sub-blocks. The controller reads data of the edge one word lines of the unselected sub-blocks adjacent the selected sub-block and stores this data in a temporary location external of the block before erasing the memory cells of the selected sub-block. The controller then re-programs the data that is being temporarily stored back into the memory cells of the edge word lines of the unselected sub-blocks after erase of the selected sub-block is completed.
A semiconductor structure includes an alternating stack of insulating layers and composite layers. Each of the composite layers includes a plurality of electrically conductive word line strips laterally extending along a first horizontal direction and a plurality of dielectric isolation strips laterally extending along the first horizontal direction and interlaced with the plurality of electrically conductive word line strips. Rows of memory openings are arranged along the first horizontal direction. Each row of memory openings vertically extends through each insulating layer within the alternating stack and one electrically conductive strip for each of the composite layers. Rows of memory opening fill structures are located within the rows of memory openings. Each of the memory opening fill structures includes a respective vertical stack of memory elements and a respective vertical semiconductor channel.
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
H01L 25/18 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different subgroups of the same main group of groups , or in a single subclass of ,
H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices
H01L 23/535 - Arrangements for conducting electric current within the device in operation from one component to another including internal interconnections, e.g. cross-under constructions
H01L 27/11524 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/1157 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/1159 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with the gate electrodes comprising a layer used for its ferroelectric memory properties, e.g. metal-ferroelectric-semiconductor [MFS] or metal-ferroelectric-metal-insulator-semiconductor [MFMIS] characterised by the memory core region
H01L 27/11597 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with the gate electrodes comprising a layer used for its ferroelectric memory properties, e.g. metal-ferroelectric-semiconductor [MFS] or metal-ferroelectric-metal-insulator-semiconductor [MFMIS] characterised by three-dimensional arrangements, e.g. cells on different height levels
H01L 27/24 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including solid state components for rectifying, amplifying, or switching without a potential-jump barrier or surface barrier
H01L 25/00 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices
42.
FERROELECTRIC DEVICES INCLUDING A SINGLE CRYSTALLINE FERROELECTRIC LAYER AND METHOD OF MAKING THE SAME
A semiconductor structure includes an active region including a source region, a drain region, and a channel region extending between the source region and the drain region, a gate stack, and a gate dielectric layer located between the gate stack and the active region. The gate stack includes an electrically conductive gate electrode and a single crystalline III-nitride ferroelectric plate located between the electrically conductive gate electrode and the gate dielectric layer, and an entirety of the single crystalline III-nitride ferroelectric plate is single crystalline.
H01L 27/1159 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with the gate electrodes comprising a layer used for its ferroelectric memory properties, e.g. metal-ferroelectric-semiconductor [MFS] or metal-ferroelectric-metal-insulator-semiconductor [MFMIS] characterised by the memory core region
H01L 29/78 - Field-effect transistors with field effect produced by an insulated gate
H01L 21/28 - Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups
A semiconductor structure includes an active region including a source region, a drain region, and a channel region extending between the source region and the drain region, a gate stack, and a gate dielectric layer located between the gate stack and the active region. The gate stack includes an electrically conductive gate electrode and a single crystalline III-nitride ferroelectric plate located between the electrically conductive gate electrode and the gate dielectric layer, and an entirety of the single crystalline III-nitride ferroelectric plate is single crystalline.
H01L 27/11597 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with the gate electrodes comprising a layer used for its ferroelectric memory properties, e.g. metal-ferroelectric-semiconductor [MFS] or metal-ferroelectric-metal-insulator-semiconductor [MFMIS] characterised by three-dimensional arrangements, e.g. cells on different height levels
H01L 29/78 - Field-effect transistors with field effect produced by an insulated gate
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 23/48 - Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads or terminal arrangements
44.
METHODS AND APPARATUSES FOR FORMING SEMICONDUCTOR DEVICES CONTAINING TUNGSTEN LAYERS USING A TUNGSTEN GROWTH SUPPRESSANT
A method of depositing a metal includes providing a structure a process chamber, and providing a metal fluoride gas and a growth-suppressant gas into the process chamber to deposit the metal over the structure. The metal may comprise a word line or another conductor of a three-dimensional memory device.
H01L 21/285 - Deposition of conductive or insulating materials for electrodes from a gas or vapour, e.g. condensation
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11597 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with the gate electrodes comprising a layer used for its ferroelectric memory properties, e.g. metal-ferroelectric-semiconductor [MFS] or metal-ferroelectric-metal-insulator-semiconductor [MFMIS] characterised by three-dimensional arrangements, e.g. cells on different height levels
H01L 27/24 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including solid state components for rectifying, amplifying, or switching without a potential-jump barrier or surface barrier
H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device
C23C 16/14 - Deposition of only one other metal element
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
45.
THREE-DIMENSIONAL MEMORY DEVICE INCLUDING DIELECTRIC RAILS FOR WARPAGE REDUCTION AND METHOD OF MAKING THE SAME
A memory die includes dielectric isolation rails embedded within a substrate semiconductor layer, laterally spaced apart along a first horizontal direction, and each laterally extending along a second horizontal direction that is perpendicular to the first horizontal direction, and alternating stacks of insulating layers and electrically conductive layers located over the substrate semiconductor layer. The alternating stacks are laterally spaced apart along the second horizontal direction by line trenches that laterally extend along the first horizontal direction. Arrays of memory stack structures are provided such that each array of memory stack structures among the arrays of memory stack structures vertically extends through a respective alternating stack. Each of the memory stack structures includes a respective vertical stack of memory elements and a respective vertical semiconductor channel.
H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
H01L 25/18 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different subgroups of the same main group of groups , or in a single subclass of ,
H01L 25/00 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices
A memory device that uses different programming parameters base on the word line(s) to be programmed is described. The programming parameter PROGSRC_PCH provides a pre-charge voltage to physical word lines. In some instances, the PROGSRC_PCH voltage is decoupled, and a new PROGSRC_PCH represents an adjusted (e.g., increased) pre-charge voltage for a certain physical word line or word line zone (i.e., predetermined group of word lines). Using different PROGSRC_PCH voltages can limit or prevent Vt distribution window degradation, particularly for relatively low physical word lines. Additionally, the overall programming time and average current consumed can also be reduced.
The memory device includes a plurality of memory cell that arranged in an array, which includes a plurality of channels that are in electrical communication with a source line. The memory device also includes a controller that is configured to erase the memory cells in at least one erase pulse. During the at least one erase pulse, the controller is configured to drive the source line to an elevated voltage that is equal to an erase voltage Vera plus a kick voltage V_kick for a duration t_kick. The controller is then configured to reduce the voltage of the source line to the erase voltage Vera such that a voltage of the channel remains elevated during the entire erase pulse, including after the voltage of the source line has been reduced to the erase voltage Vera.
A method of depositing a metal includes providing a structure a process chamber, and providing a metal fluoride gas and a growth-suppressant gas into the process chamber to deposit the metal over the structure. The metal may comprise a word line or another conductor of a three-dimensional memory device.
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
49.
METHODS AND APPARATUSES FOR FORMING SEMICONDUCTOR DEVICES CONTAINING TUNGSTEN LAYERS USING A TUNGSTEN GROWTH SUPPRESSANT
A method of depositing a metal includes providing a structure a process chamber, and providing a metal fluoride gas and a growth-suppressant gas into the process chamber to deposit the metal over the structure. The metal may comprise a word line or another conductor of a three-dimensional memory device.
H01L 21/285 - Deposition of conductive or insulating materials for electrodes from a gas or vapour, e.g. condensation
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11597 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with the gate electrodes comprising a layer used for its ferroelectric memory properties, e.g. metal-ferroelectric-semiconductor [MFS] or metal-ferroelectric-metal-insulator-semiconductor [MFMIS] characterised by three-dimensional arrangements, e.g. cells on different height levels
H01L 27/24 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including solid state components for rectifying, amplifying, or switching without a potential-jump barrier or surface barrier
H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device
C23C 16/14 - Deposition of only one other metal element
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
50.
HYBRID MULTI-BLOCK ERASE TECHNIQUE TO IMPROVE ERASE SPEED IN A MEMORY DEVICE
The memory device includes a plurality of memory cells arranged in a plurality of blocks, which are arranged in at least one plane. A controller is in electrical communication with the plurality of memory cells. The controller is configured to define a multi-block group that includes at least two blocks to be erased. The controller is further configured to simultaneously apply at least one erase pulse to the multi-block group. The controller is further configured to individually and sequentially apply a verify pulse to the blocks. In response to all blocks passing verify, the controller is configured to complete the erase operation. In response to at least one of the blocks not passing verify, the controller is configured to individually and sequentially apply an erase pulse and then a verify pulse to the at least one block that did not pass verify.
An integrated memory assembly comprises a control die bonded to a memory die. The memory die includes multiple non-volatile memory structures (e.g., planes, arrays, groups of blocks, etc.), each comprising a stack of alternating conductive and dielectric layers forming staircases at one or more edges of the non-volatile memory structures. The non-volatile memory structures are positioned with gaps between the non-volatile memory structures such that the gaps separate the staircases of adjacent non-volatile memory structures. Metal interlayer segments positioned in the gaps are connected to a top metal layer positioned above non-volatile memory structures and to one or more electrical circuits on the control die via zero, one or more other metal layers/segments.
H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
H01L 25/18 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different subgroups of the same main group of groups , or in a single subclass of ,
H01L 25/00 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices
52.
STRING OR BLOCK OR DIE LEVEL DEPENDENT SOURCE LINE VOLTAGE FOR NEIGHBOR DRAIN SIDE SELECT GATE INTERFERENCE COMPENSATION
A memory apparatus and method of operation are provided. The memory apparatus includes memory cells connected to word lines and disposed in memory holes. The memory cells are connected in series between a drain-side select gate transistor on a drain-side and connected to one of a plurality of bit lines and a source line on a source-side. A control means is configured to apply a first and a second select gate voltage to the drain-side select gate transistor while applying a predetermined source line voltage to the source line of selected ones of the memory holes in a predetermined grouping and a read level voltage to at least one of the word lines associated with the predetermined grouping. The control means counts the memory cells conducting during each of a first and a second read operation and adjusts the predetermined source line voltage accordingly.
A local data bus of a sense amplifier associated with one bit line is used to perform logical operations for a sensing operation performed by another sense amplifier associated with a different bit line. Each sense amplifier circuit includes a sensing node that is pre-charged, then discharged through a selected memory cell and a local data bus with a number of data latches connected. Target program data can be stored in the latches and combined in logical combinations with the sensed value of the memory cell to determine whether it has verified. By including a transfer circuit between the local data buses of a pair of sense amplifiers, the logical operations of a first sense amplifier can be performed using the local data bus of the paired sense amplifier, freeing the first sense amplifier's sense node to be concurrently pre-charged for a subsequent sensing operation, thereby improving performance.
G11C 16/34 - Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
G11C 11/16 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
54.
FIELD EFFECT TRANSISTORS HAVING CONCAVE DRAIN EXTENSION REGION AND METHOD OF MAKING THE SAME
A field effect transistor includes a source region embedded in a semiconductor material layer, a drain region embedded in the semiconductor material layer and laterally spaced from the source region by a channel, a gate stack including a gate dielectric and a gate electrode, a shallow trench isolation portion embedded in an upper portion of the semiconductor material layer and contacting the drain region and the gate stack, and a concave drain extension region continuously extending underneath the shallow trench isolation portion from a bottom surface of the gate dielectric to a bottom surface of the drain region.
H01L 27/11524 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11519 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the top-view layout
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
H01L 29/06 - Semiconductor bodies characterised by the shapes, relative sizes, or dispositions of the semiconductor regions
55.
THREE-DIMENSIONAL MEMORY DEVICE INCLUDING SENSE AMPLIFIERS HAVING A COMMON WIDTH AND SEPARATION
A semiconductor structure includes a memory array including first and second bit lines and a sense amplifier circuit. The sense amplifier circuit includes a first sense amplifier array containing first active sense amplifier transistors that each have an active region having a first width, where the first active sense amplifier transistors are electrically connected to the first bit lines, and a second sense amplifier array including second active sense amplifier transistors that each have the active region having the first width, where the second active sense amplifier transistors are electrically connected to the second bit lines, and dummy active regions which are electrically inactive located between columns of the second active sense amplifier transistors.
H01L 27/11573 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the peripheral circuit region
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
H01L 25/18 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different subgroups of the same main group of groups , or in a single subclass of ,
H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11529 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the peripheral circuit region of memory regions comprising cell select transistors, e.g. NAND
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
G11C 16/26 - Sensing or reading circuits; Data output circuits
56.
ZERO STATIC CURRENT HIGH-SPEED VOLTAGE LEVEL SHIFTER
An improved cross-coupled voltage level shifter is disclosed that is capable of achieving substantially higher data transfer speeds with reduced transistor sizes than existing cross-coupled voltage level shifters. The voltage level shifter includes a cross-coupled latch, control circuitry that initiates a state transition of the latch responsive to activation, where the control circuitry is activated by a change in a logic voltage level of an input signal to the voltage level shifter, and feedback circuitry that reinforces the latch action of the cross-coupled latch. The control circuitry may include pull-down transistors that are thin-gate devices, and thus, substantially smaller in area than what would otherwise be needed to meet the large current requirement of the pull-down transistors as compared to latch transistors of the latch.
H03K 19/20 - Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits characterised by logic function, e.g. AND, OR, NOR, NOT circuits
A memory device with adaptive sense time tables is disclosed. In order to maintain a desired (initial or preset) threshold voltage distribution, the sense time is adjusted as the program-erase cycle count increases. The program-erase cycle process tends to wear down memory cells, causing the QPW window to expand and the threshold voltage to widen. However, by adjusting (i.e., reducing) the sense time for increased program-erase cycles, the QPW window and the threshold voltage can be at least substantially maintained. Additionally, systems and methods for adjusting sense time based on die-to-die variations are also disclosed.
A system has been described that performs differential temperature compensation based on a differential between the temperature at time of programming and temperature at time of reading for a set of data. Differential temperature compensation is useful for bulk programming/reading (e.g., many pages of data) and/or programming/reading super pages of data (multiple pages residing on different memory die).
A method for performing a program verify operation with respect to a target memory cell in a memory structure of a non-volatile memory system, wherein the method may comprise determining a location of the target memory cell within the structure and, based upon the determined location of the target cell and with respect to each programmable memory state: (1) applying a first sense signal at a first point in time, and (2) applying a second sense signal at a second point in time, wherein a time interval between the first and the second points in time is equal to a predetermined optimal time period plus or minus an offset parameter time value.
A memory apparatus and method of operation are provided. The memory apparatus includes memory cells connected to one of a plurality of word lines including an edge word line and a plurality of other data word lines. The memory cells are disposed in memory holes organized in rows grouped in a plurality of strings. The rows include full circle rows and semi-circle rows. A control means is configured to program the memory cells connected to the edge word line and in the semi-circle rows of a first one and a second one of the plurality of strings to a predetermined one of a plurality of data states in a first program operation. The control means then selects both the first one and the second one of the plurality of strings together and programs the memory cells of the full circle rows together in a second program operation.
A system has been described that performs differential temperature compensation based on a differential between the temperature at time of programming and temperature at time of reading for a set of data. Differential temperature compensation is useful for bulk programming/reading (e.g., many pages of data) and/or programming/reading super pages of data (multiple pages residing on different memory die).
G11C 7/04 - Arrangements for writing information into, or reading information out from, a digital store with means for avoiding disturbances due to temperature effects
A memory system identifies memory cells connected to a common word line that have had their threshold voltage unintentionally drift lower than programmed by determining whether memory cells meet two criteria: (1) the memory cells have threshold voltages within an offset of a read compare voltage of a data state; and (2) adjacent memory cells (connected to word lines that are adjacent to the common word line) are in one or more low data states. For those memory cells meeting the two criteria, the memory system performs some amount of programming on the memory cells to refresh the data stored in those memory cells to be as originally intended.
Technology is disclosed herein for testing circuitry that controls memory operations in a memory structure having non-volatile memory cells. The testing of the circuitry can be performed without the memory structure. The memory structure may reside on one semiconductor die, with sense blocks and a control circuit on another semiconductor die. The control circuit is able to perform die level control of memory operations in the memory structure. The control circuit may control the sense blocks to simulate sensing of non-volatile memory cells in the memory structure even though the sense blocks are not connected to the memory structure. The control circuit verifies correct operation of the semiconductor die based on the simulated sensing. For example, the control circuit may verify correct operation of a state machine that controls sense operations at a die level. Thus, the operation of the semiconductor die may be tested without the memory structure.
G11C 29/54 - Arrangements for designing test circuits, e.g. design for test [DFT] tools
H10B 80/00 - Assemblies of multiple devices comprising at least one memory device covered by this subclass
G01R 31/3177 - Testing of logic operation, e.g. by logic analysers
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
H01L 25/18 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different subgroups of the same main group of groups , or in a single subclass of ,
64.
METHOD TO FIX CUMULATIVE READ INDUCED DRAIN SIDE SELECT GATE DOWNSHIFT IN MEMORY APPARATUS WITH ON-PITCH DRAIN SIDE SELECT GATE
A memory apparatus and method of operation are provided. The memory apparatus includes memory cells configured to retain a threshold voltage. The memory cells are connected to one of a plurality of word lines and are arranged in strings comprising a plurality of blocks. A control means is coupled to the plurality of word lines and the strings and is configured to periodically determine a read frequency metric associated with a plurality of read operations of one of the plurality of blocks of the memory cells. The control means is also configured to relocate data of the one of the plurality of blocks and cause the one of the plurality of blocks to remain unused for a predetermined relaxation time based on the read frequency metric.
The nonvolatile memory includes a plurality of nonvolatile memory cells configured to store multiple data states; a word line connected to a control gate of at least one of the plurality of non-volatile memory cells; a control gate line to supply a control gate signal; a word line switch connected between the word line and the control gate line to control the potential applied to the word line from the control gate line; and a memory controller circuit. The memory controller circuit is configured to control a word line potential on the word line and a control gate potential on the control gate line and to control a state of the control gate. The memory controller circuit, when the nonvolatile memory transitions to a not-on state, is further configured to turn off the word line switch and to charge the control gate line to a charged potential.
A method of forming a structure includes forming an alternating stack of first material layers and second material layers over a substrate, forming a first etch mask material layer, forming a first cladding liner, and forming a via opening through the alternating stack by performing an anisotropic etch process that employs a combination of at least the first cladding liner and the first etch mask material layer as a composite etch mask structure.
A method of forming a memory device includes forming an alternating stack of disposable material layers and silicon nitride layers over a substrate, forming a memory opening through the alternating stack, forming a memory film and a vertical semiconductor channel in the memory opening, where the memory film includes a continuous silicon nitride charge storage material layer and a tunneling dielectric layer, forming a backside trench through the alternating stack, forming laterally-extending cavities by removing the disposable material layers selective to the silicon nitride layers through the backside trench, oxidizing portions of the silicon nitride layers and the continuous silicon nitride charge storage material layer exposed in the laterally-extending cavities to form silicon oxide insulating layers and to separate the continuous silicon nitride charge storage material layer into a vertical stack of discrete silicon nitride charge storage material portions, and replacing remaining portions of the silicon nitride layers with electrically conductive layers.
H10B 41/27 - Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
H10B 41/10 - Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the top-view layout
H10B 41/35 - Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region with a cell select transistor, e.g. NAND
H10B 43/10 - EEPROM devices comprising charge-trapping gate insulators characterised by the top-view layout
H10B 43/27 - EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H10B 43/35 - EEPROM devices comprising charge-trapping gate insulators characterised by the memory core region with cell select transistors, e.g. NAND
68.
THREE-DIMENSIONAL MEMORY DEVICE AND METHOD OF MAKING THE SAME USING DIFFERENTIAL THINNING OF VERTICAL CHANNELS
An alternating stack of insulating layers and spacer material layers is formed over a substrate. An insulating cap layer is formed thereupon. A memory opening is formed, which has a greater lateral dimension at a level of an upper insulating cap sublayer than at a level of a lower insulating cap sublayer. A memory film and a semiconductor channel material layer is formed in the memory opening. Ions of at least one dopant species is implanted into a top portion of the semiconductor channel material layer. An isotropic etch process etches an unimplanted portion of the semiconductor channel material layer at a higher etch rate than the implanted top portion of the semiconductor channel material layer to form a vertical semiconductor channel.
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/1157 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11565 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the top-view layout
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11519 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the top-view layout
H01L 27/11524 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the memory core region with cell select transistors, e.g. NAND
69.
MEMORY DEVICE THAT IS OPTIMIZED FOR OPERATION AT DIFFERENT TEMPERATURES
A plurality of memory programming the memory cells to at least one programmed data state in a plurality of program-verify iterations. In each iteration, after a programming pulse, a sensing operation is conducted to compare the threshold voltages of the memory cells to a low verify voltage associated with a first programmed data state and to a high very voltage associated with the first programmed data state. The sensing operation includes discharging a sense node through a bit line coupled to one of the memory cells and monitoring a discharge time of the sense node. At least one aspect of the sensing operation is temperature dependent so that a voltage gap between the high and low verify voltages is generally constant across a range of temperatures.
A memory device includes an alternating stack of insulating layers and control gate layers, a memory opening vertically extending through the alternating stack, and a memory opening fill structure containing a memory film and a vertical semiconductor channel located within the memory opening. The memory film contains a resonant tunneling barrier stack, a semiconductor barrier layer, and a memory material layer located between the resonant tunneling barrier stack and the semiconductor barrier layer.
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 29/15 - Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
H01L 29/205 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds in different semiconductor regions
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
A bonded assembly includes a first three-dimensional memory die containing a first alternating stack of first insulating layers and first electrically conductive layers and first memory structures located in the first alternating stack, a second three-dimensional memory die bonded to the first three-dimensional memory die, and containing a second alternating stack of second insulating layers and second electrically conductive layers, and second memory structures located in the second alternating stack. The first electrically conductive layers have different lateral extents along the first horizontal direction that decrease with a respective vertical distance from driver circuit devices, and the second electrically conductive layers have different lateral extents along the first horizontal direction that increase with the respective vertical distance from the driver circuit devices.
H01L 25/18 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different subgroups of the same main group of groups , or in a single subclass of ,
H01L 25/00 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
H10B 43/40 - EEPROM devices comprising charge-trapping gate insulators characterised by the peripheral circuit region
72.
THREE DIMENSIONAL MEMORY DEVICE CONTAINING RESONANT TUNNELING BARRIER AND HIGH MOBILITY CHANNEL AND METHOD OF MAKING THE SAME
A memory device includes an alternating stack of insulating layers and control gate layers, a memory opening vertically extending through the alternating stack, and a memory opening fill structure containing a memory film and a vertical semiconductor channel located within the memory opening. The memory film includes a resonant tunneling barrier stack, a barrier layer, and a memory material layer located between the resonant tunneling barrier stack and the barrier layer. The barrier layer may be a dielectric blocking barrier layer.
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11519 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the top-view layout
H01L 27/11524 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11565 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the top-view layout
H01L 27/1157 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the memory core region with cell select transistors, e.g. NAND
73.
THREE DIMENSIONAL MEMORY DEVICE CONTAINING RESONANT TUNNELING BARRIER AND HIGH MOBILITY CHANNEL AND METHOD OF MAKING THEREOF
A memory device includes at least one instance of a unit layer stack including a source layer, a channel-containing layer that contains a semiconductor channel, and a drain layer that are stacked along a vertical direction over a substrate; a memory opening vertically extending through the at least one instance of the unit layer stack; and a memory opening fill structure located in the memory opening and including a control gate electrode and a memory film in contact with each instance of the semiconductor channel The memory film includes a resonant tunneling barrier stack, a barrier layer, and a memory material layer located between the resonant tunneling barrier stack and the barrier layer.
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11519 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the top-view layout
H01L 27/11565 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the top-view layout
H01L 27/11524 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/1157 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 23/522 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
74.
THREE DIMENSIONAL MEMORY DEVICE CONTAINING RESONANT TUNNELING BARRIER AND HIGH MOBILITY CHANNEL AND METHOD OF MAKING THEREOF
A three-dimensional memory device containing a plurality of levels of memory elements includes a memory film containing a layer stack that includes a resonant tunneling barrier stack, a semiconductor barrier layer, and a memory material layer located between the resonant tunneling barrier stack and the semiconductor barrier layer, a semiconductor channel, and a control gate electrode.
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11519 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the top-view layout
H01L 27/11565 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the top-view layout
H01L 27/11524 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/1157 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 29/15 - Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
75.
SOFT ERASE PROCESS DURING PROGRAMMING OF NON-VOLATILE MEMORY
Programming a plurality of non-volatile memory cells includes performing a soft erase process during the programming. The soft erase process includes pre-charging channels of the memory cells and performing an erase operation subsequent to the pre-charging while the channels are at one or more elevated voltages at least partially due to the pre-charging.
A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, memory stack structures vertically extending through the alternating stack, etch stop plates located in the staircase region, laterally and vertically spaced apart among one another, and overlying an end portion of a respective one of the electrically conductive layers, and contact via structures located in a staircase region, vertically extending through a respective one of the etch stop plates, and contacting a respective one of the electrically conductive layers.
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device
77.
NON-VOLATILE MEMORY WITH STAGGERED RAMP DOWN AT THE END OF PRE-CHARGING
In order to inhibit memory cells from programming and mitigate program disturb, the memory pre-charges channels of NAND strings connected to a common set of control lines by applying positive voltages to the control lines and applying voltages to a source line and bit lines connected to the NAND strings. The control lines include word lines and select lines. The word lines include an edge word line. The memory ramps down the positive voltages applied to the control lines, including ramping down control lines on a first side of the edge word line, ramping down the edge word line, and performing a staggered ramp down of three or more control lines on a second side of the edge word line. After the pre-charging, unselected NAND strings have their channel boosted to prevent programming and selected NAND strings experience programming on selected memory cells.
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
G11C 16/08 - Address circuits; Decoders; Word-line control circuits
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
A method of erasing memory cells in a memory device is provided. The method includes grouping a plurality of word lines into a first group, which does not include edge word lines, and a second group, which does include edge word lines. An erase operation is performed on the memory cells of the first and second groups until erase-verify of the memory cells of the first group passes. It is then determined if further erase of the memory cells of the second group is necessary. In response to it being determined that the additional erase operation is necessary, an additional erase operation is performed on at least some of the memory cells of the second group until erase-verify of the memory cells of the second group passes.
A CMP system includes a polishing apparatus configured to polish a wafer and roll cleaning apparatus, which includes a rotating roll brush configured to roll against a surface of the wafer during operation, a fluid supply system configured to apply a fluid on the surface of the wafer, and an array of liquid sensors configured to detect a distribution of the fluid on the surface of the wafer in areas that are not covered by the rotating roll brush.
A memory device with one or more planes having sub-blocks is disclosed. The memory device may further include a voltage switch transistor for each of sub-blocks. Additionally, the memory device may further include a row decoder for each of sub-blocks. As a result, an operation to two sub-blocks can be performed at different times. For example, using a row decoder and voltage switch transistor, a sub-block can be initially read, followed by a subsequent read of another sub-block using a separate row decoder and voltage switch transistor. By staggering the read operations through a time delay, the peak current Icc associated with the supply voltage can be reduced.
G11C 11/4074 - Power supply or voltage generation circuits, e.g. bias voltage generators, substrate voltage generators, back-up power, power control circuits
81.
MODELLING AND PREDICTION SYSTEM WITH AUTO MACHINE LEARNING IN THE PRODUCTION OF MEMORY DEVICES
To provide more test data during the manufacture of non-volatile memories and other integrated circuits, machine learning is used to generate virtual test values. Virtual test results are interpolated for one set of tests for devices on which the test is not performed based on correlations with other sets of tests. In one example, machine learning determines a correlation study between bad block values determined at die sort and photo-limited yield (PLY) values determined inline during processing. The correlation can be applied to interpolate virtual inline PLY data for all of the memory dies, allowing for more rapid feedback on the processing parameters for manufacturing the memory dies and making the manufacturing process more efficient and accurate. In another set of embodiments, the machine learning is used to extrapolate limited metrology (e.g., critical dimension) test data to all of the memory die through interpolated virtual metrology data values.
A method of forming a semiconductor structure includes forming a semiconductor device over a substrate, forming a combination of a connection-level dielectric layer and a connection-level metal interconnect structure over the semiconductor device, where the connection-level metal interconnect structure is electrically connected to a node of the semiconductor device and is embedded in the connection-level dielectric layer, forming a line-and-via-level dielectric layer over the connection-level dielectric layer, forming an integrated line-and-via cavity through the line-and-via-level dielectric layer over the connection-level metal interconnect structure, selectively growing a conductive via structure containing cobalt from a bottom of the via portion of the integrated line-and-via cavity without completely filling a line portion of the integrated line-and-via cavity, and forming a copper-based conductive line structure that contains copper at an atomic percentage that is greater than 90% in the line portion of the integrated line-and-via cavity on the conductive via structure.
H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11519 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the top-view layout
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11565 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the top-view layout
H01L 23/532 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
H01L 23/522 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
83.
SYSTEMS AND METHODS FOR DYNAMICALLY SENSING A MEMORY BLOCK
A memory device that dynamically adjusts the sense time to read an open block of a memory block is disclosed. The adjusted sense time is based upon various considerations, including the sense time of the closed block equivalent and the openness of the open block. This allows the memory device to maintain a fixed Vt as well as reduce failed bit count, i.e., read errors due to an insufficient sense time. Also, the dynamic adjustment of sense time can optimize system performance and increase efficiency.
A non-volatile memory device is configured for in-memory computation of discrete Fourier transformations and their inverses. The real and imaginary components of the twiddle factors are stored as conductance values of memory cells in non-volatile memory arrays having a cross-point structure. The real and imaginary components of inputs are encoded as word line voltages applied to the arrays. Positive and negative valued components of the twiddle factors are stored separately and positive and negative of the inputs are separately applied to the arrays. Real and imaginary parts of the outputs for the discrete Fourier transformation are determined from combinations of the output currents from the arrays.
Read and write circuitry, described herein, comprises data latches, each data latch connected to a bit line and arranged in a same column as the bit line; and transfer latches, each transfer latch connected to a data latch and arranged in a same column as the data latch. Further, circuitry described herein is configured to: transfer a word to and from the transfer latches of a first column and the subset of transfer latches of a second column; transfer a first portion of the word between the transfer latches of the first column and data latches of the first column that are connected to the transfer latches of the first column; and transfer a second portion of the word between the subset of transfer latches and data latches of the second column that are connected to the subset of transfer latches.
An alternating stack of insulating layers and spacer material layers is formed over a substrate. The spacer material layers are formed as, or are subsequently replaced with, electrically conductive layers. Memory openings and support openings are formed through the alternating stack. The memory openings are arranged in a first hexagonal array having a nearest-neighbor direction that is parallel to a first horizontal direction, and the support openings are arranged in a second hexagonal array having a nearest-neighbor direction that is perpendicular to the first horizontal direction. Memory opening fill structures are formed within a respective one of the memory openings, and support pillar structures within a respective one of the support openings.
H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
87.
EDGE WORD LINE DATA RETENTION IMPROVEMENT FOR MEMORY APPARATUS WITH ON-PITCH SEMI-CIRCLE DRAIN SIDE SELECT GATE TECHNOLOGY
A memory apparatus and method of operation are provided. The apparatus includes memory cells connected to word lines including at least one edge word line and other data word lines. The memory cells are arranged in strings and are configured to retain a threshold voltage corresponding to data states. The strings are organized in rows and a control means is coupled to the word lines and the strings and identifies the at least one edge word line. The control means programs the memory cells of the strings in particular ones of the rows and associated with the at least one edge word line to have an altered distribution of the threshold voltage for one or more of the data states compared to the memory cells of the strings not in particular ones of the rows and not associated with the at least one edge word line during a program operation.
A memory apparatus and method of operation are provided. The apparatus includes memory cells connected to one of a plurality of word lines and arranged in strings and configured to retain a threshold voltage. A control means is coupled to the plurality of word lines and the strings. The control means is configured to apply a primary predetermined voltage to a primary location of the memory apparatus following an erase operation of the memory cells while simultaneously applying a secondary predetermined voltage being lower than the primary predetermined voltage to a secondary location of the memory apparatus and measuring a leak current at the primary location. The control means then determines the erase operation passed in response to the leak current measured not being greater than a predetermined leak threshold.
A memory apparatus and method of operation are provided. The apparatus includes memory cells connected to word lines and arranged in strings. Each of the strings has a drain-side select gate transistor on a drain-side connected to one of a plurality of bit lines. A control means is coupled to the word lines and the plurality of bit lines and the drain-side select gate transistors. The control means determines a unique select gate voltage for each of a plurality of groupings of the memory cells that is individually adapted for each of the plurality of groupings. The control means then applies the unique select gate voltage to the drain-side select gate transistor of selected ones of the strings of each of the plurality of groupings of the memory cells to turn on the drain-side select gate transistor of the selected ones of the strings during a memory operation.
Technology is disclosed for applying a positive temperature coefficient (Tco) voltage to a control terminal of a dummy select transistor. The dummy select transistor resides on a NAND string having non-volatile memory cells and a regular select transistor. The dummy select transistor is typically ON (or conductive) during memory operations such as selected string program, read, and verify. In an aspect, the positive Tco voltage is applied to the control terminal of a dummy select transistor during a program operation. Applying the positive Tco voltage during program operations reduces or eliminates program disturb to the dummy select transistor. In some aspects, the dummy select transistor is used to generate a gate induced drain leakage (GIDL) current during an erase operation. In some aspects, the dummy select transistor is a depletion mode transistor.
A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers, and memory stack structures extending through the alternating stack. Each of the memory stack structures includes a vertical semiconductor channel, a tunneling dielectric layer, a vertical stack of discrete silicon nitride memory elements located at levels of the electrically conductive layers, and a vertical stack of discrete silicon oxide blocking dielectric structures laterally surrounding the vertical stack of discrete silicon nitride memory elements. Each of the silicon oxide blocking dielectric structures includes a silicon oxynitride surface region, and an atomic concentration of nitrogen atoms within the silicon oxynitride surface region decreases with a lateral distance from an interface between the silicon oxynitride surface region and a respective one of the silicon nitride memory elements.
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11519 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the top-view layout
H01L 27/11524 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/1157 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the memory core region with cell select transistors, e.g. NAND
H01L 27/11565 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by the top-view layout
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
92.
HIGH ASPECT RATIO VIA FILL PROCESS EMPLOYING SELECTIVE METAL DEPOSITION AND STRUCTURES FORMED BY THE SAME
A method includes forming a semiconductor device, forming a combination of a connection-level dielectric layer and a connection-level metal interconnect structure over the semiconductor device, forming a line-and-via-level dielectric layer over the connection-level dielectric layer, forming an integrated line-and-via cavity through the line-and-via-level dielectric layer over the connection-level metal interconnect structure, selectively growing a conductive via structure consisting essentially of an elemental metal that is not copper from a physically exposed conductive surface located at a bottom of the via portion of the integrated line-and-via cavity without filling a line portion of the integrated line-and-via cavity, and forming a copper-based conductive line structure that includes copper at an atomic percentage that is greater than 90% in the line portion of the integrated line-and-via cavity.
H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device
H01L 23/532 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
93.
SYSTEMS AND METHODS FOR RETAINING INFLIGHT DATA DURING A POWER LOSS EVENT
Memory devices, or memory systems, described herein may include a controller (e.g., SSD controller) and a NAND memory device for storing inflight data. When the power loss event occurs, a memory system maintains (i.e., not un-select) the existing memory block being programmed at the time of power loss. The existing program operation at the event of power loss can be suspended by controller. The inflight data can be re-sent by controller directly to NAND latches, when power loss event was detected. The memory system can select a next, immediate available erased page and begin one-pulse programming to store the inflight data, without ramping down the program pump and program pulse, which was in use before the power loss event. The existing programming voltage is used to store/program the inflight data via single pulse programming. When power is restored, the inflight data is moved/programmed to another block for good data reliability.
An apparatus includes a control circuit and a plurality of non-volatile memory cells arranged in a plane of a memory die. The plane includes a first word line including a first word line portion coupled to a corresponding first group of the non-volatile memory cells, and a second word line including a second word line portion coupled to a corresponding second group of the non-volatile memory cells, the second word line different from the first word line. The control circuit is configured to apply a first voltage to the first word line portion and apply a second voltage to the second word line portion to concurrently read the first group of the non-volatile memory cells and the second group of the non-volatile memory cells. The first group of the non-volatile memory cells and the second group of the non-volatile memory cells each store less than a page of data.
G11C 11/4074 - Power supply or voltage generation circuits, e.g. bias voltage generators, substrate voltage generators, back-up power, power control circuits
G06F 3/06 - Digital input from, or digital output to, record carriers
95.
DATA CONVERSION WITH DATA PATH CIRCUITS FOR USE IN DOUBLE SENSE AMP ARCHITECTURE WITH FRACTIONAL BIT ASSIGNMENT IN NON-VOLATILE MEMORY STRUCTURES
A method for programming a non-volatile memory structure, comprises initiating a two-dimensional fractional number of bits-per-cell programming scheme of a plurality of memory cells, wherein the memory structure comprises: (1) a first memory array comprising a first population of memory cells and the associated peripheral circuitry disposed below the first population of cells, (2) a second memory array positioned above the first memory array and comprising a second population of memory cells and associated peripheral circuitry disposed above the second population of cells, and (3) a data bus tap electrically coupling the first and second memory arrays. Further, the method comprises: (1) storing input data in data latches associated with the first array and with the second array. Additionally, the method comprises converting the stored data using data conversion logic implemented by a data path circuit of the first and second arrays and rewriting the converted data to the latches.
G11C 11/56 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
A semiconductor structure includes a first dielectric material layer, a first metal interconnect structure embedded within the first dielectric material layer and including a first metallic material portion including a first metal, a second dielectric material layer located over the first dielectric material layer, and a second metal interconnect structure embedded within the second dielectric material layer and including an integrated line-and-via structure that includes a second metallic material portion including a second metal. A metal-semiconductor alloy portion including a first metal-semiconductor alloy of the first metal and a semiconductor material is located underneath the second metallic material portion, and contacts a top surface of the first metal interconnect structure.
H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device
H01L 23/532 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
H01L 23/535 - Arrangements for conducting electric current within the device in operation from one component to another including internal interconnections, e.g. cross-under constructions
97.
HIGH ASPECT RATIO VIA FILL PROCESS EMPLOYING SELECTIVE METAL DEPOSITION AND STRUCTURES FORMED BY THE SAME
A metal interconnect assembly includes a first metal interconnect structure, and a second metal interconnect structure embedded in a second dielectric material layer and containing a metal line portion having a top surface located within a first horizontal plane and having a bottom surface located within a second horizontal plane, and further containing a metal via portion adjoined to a bottom of the metal line portion and contacting a top surface of the first metal interconnect structure. The second metal interconnect structure contains a metallic liner including a first metallic material that includes an entire volume of the metal via portion and an outer part of the metal line portion, and a metallic fill material portion contains a second metallic material that includes an inner part of the metal line portion, does not contact and is spaced from the second dielectric material layer by the metallic liner.
H01L 23/535 - Arrangements for conducting electric current within the device in operation from one component to another including internal interconnections, e.g. cross-under constructions
H01L 23/532 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device
98.
THREE-DIMENSIONAL MEMORY DEVICE INCLUDING DISCRETE CHARGE STORAGE ELEMENTS AND METHODS OF FORMING THE SAME
A memory device includes an alternating stack of insulating layers and electrically conductive layers, a memory opening vertically extending through the alternating stack, and a memory opening fill structure located in the memory opening and including a vertical semiconductor channel and a memory film. The memory film includes a memory material layer having a straight inner cylindrical sidewall that vertically extends through a plurality of electrically conductive layers within the alternating stack without lateral undulation and a laterally-undulating outer sidewall having outward lateral protrusions at levels of the plurality of electrically conductive layers.
H10B 41/27 - Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
H10B 41/10 - Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the top-view layout
H10B 41/35 - Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region with a cell select transistor, e.g. NAND
H10B 43/10 - EEPROM devices comprising charge-trapping gate insulators characterised by the top-view layout
H10B 43/27 - EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H10B 43/35 - EEPROM devices comprising charge-trapping gate insulators characterised by the memory core region with cell select transistors, e.g. NAND
99.
NON-VOLATILE MEMORY WITH ADJUSTED BIT LINE VOLTAGE DURING VERIFY
A control circuit connected to non-volatile memory cells applies a programming signal to a plurality of the non-volatile memory cells in order to program the plurality of the non-volatile memory cells to a set of data states. The control circuit performs program verification for the non-volatile memory cells, including applying bit line voltages during program verification based on word line position and data state being verified.
G11C 16/34 - Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
H01L 25/18 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different subgroups of the same main group of groups , or in a single subclass of ,
H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices
G11C 11/56 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
The memory device includes a control circuitry that is communicatively coupled to memory cells are arranged in a plurality of word lines. The control circuitry is configured to perform a first programming pass on a selected word line. The first programming pass includes a plurality of programming loops, each of which includes the application of a programming pulse (Vpgm). The programming pulse voltage is increased between programming loops of the first programming pass by a step size. The step size is a first step size between two programming loops of the first programming pass and is a second step size that is different than the first step size between two other programming loops of the first programming pass. The control circuitry is also configured to perform a second programming pass to further program the memory cells of the selected word line to the plurality of data states.
G11C 11/56 - Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
G11C 16/04 - Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
patents
