Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.
C03C 17/245 - Oxides by deposition from the vapour phase
C23C 16/50 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating using electric discharges
The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12).
C23C 16/00 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
H01L 21/00 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H05H 1/46 - Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
C23C 16/50 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating using electric discharges
Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.
C23C 16/00 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
H01L 21/00 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
C23C 16/50 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating using electric discharges
4.
Method of producing plasma by multiple-phase alternating or pulsed electrical current
A method of producing a plasma is provided. The method includes providing at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode. Each hollow cathode has a plasma exit region. The method further includes providing a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave. The first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave. Electrical current flows between the at least three hollow cathodes that are out of electrical phase. A plasma is generated between the hollow cathodes.
C23C 16/50 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating using electric discharges
5.
PROCESS FOR PRODUCING ALKALI FREE GLASS AND ALKALI FREE GLASS PLATE
To provide a process for producing and alkali free glass for effectively suppressing bubbles, and an alkali free glass produced by the process, which is suitable as a glass substrate for flat panel displays and has few bubbles.
To provide a process for producing and alkali free glass for effectively suppressing bubbles, and an alkali free glass produced by the process, which is suitable as a glass substrate for flat panel displays and has few bubbles.
A process for producing an alkali free glass containing substantially no alkali metal oxide, which comprises melting a glass starting material having a matrix composition of the following composition, and subjecting the molten glass to a treatment process of removing bubbles under reduced pressure, stirring or transferring under a condition where the molten glass is in contact with a platinum member, wherein the starting material is prepared so as to contain SnO2 in an amount of from 0.01 to 2.0% per 100% of the total amount of the above matrix composition; the starting material is melted under heating at from 1,500 to 1,650° C.; then bubbles contained in the molten glass are permitted to rise to the surface of the molten glass, together with oxygen bubbles generated by a reduction reaction in which SnO2 in the molten glass is reduced to SnO; and in the above treatment process, the oxygen bubbles generated at the interface between the molten glass and the platinum member are permitted to be absorbed by an oxidation reaction in which SnO is oxidized to SnO2, under a condition where the molten glass is from 1,300 to 1,500° C.
To provide a process for producing and alkali free glass for effectively suppressing bubbles, and an alkali free glass produced by the process, which is suitable as a glass substrate for flat panel displays and has few bubbles.
A process for producing an alkali free glass containing substantially no alkali metal oxide, which comprises melting a glass starting material having a matrix composition of the following composition, and subjecting the molten glass to a treatment process of removing bubbles under reduced pressure, stirring or transferring under a condition where the molten glass is in contact with a platinum member, wherein the starting material is prepared so as to contain SnO2 in an amount of from 0.01 to 2.0% per 100% of the total amount of the above matrix composition; the starting material is melted under heating at from 1,500 to 1,650° C.; then bubbles contained in the molten glass are permitted to rise to the surface of the molten glass, together with oxygen bubbles generated by a reduction reaction in which SnO2 in the molten glass is reduced to SnO; and in the above treatment process, the oxygen bubbles generated at the interface between the molten glass and the platinum member are permitted to be absorbed by an oxidation reaction in which SnO is oxidized to SnO2, under a condition where the molten glass is from 1,300 to 1,500° C.
Composition as represented by the mass percentage:
To provide a process for producing and alkali free glass for effectively suppressing bubbles, and an alkali free glass produced by the process, which is suitable as a glass substrate for flat panel displays and has few bubbles.
A process for producing an alkali free glass containing substantially no alkali metal oxide, which comprises melting a glass starting material having a matrix composition of the following composition, and subjecting the molten glass to a treatment process of removing bubbles under reduced pressure, stirring or transferring under a condition where the molten glass is in contact with a platinum member, wherein the starting material is prepared so as to contain SnO2 in an amount of from 0.01 to 2.0% per 100% of the total amount of the above matrix composition; the starting material is melted under heating at from 1,500 to 1,650° C.; then bubbles contained in the molten glass are permitted to rise to the surface of the molten glass, together with oxygen bubbles generated by a reduction reaction in which SnO2 in the molten glass is reduced to SnO; and in the above treatment process, the oxygen bubbles generated at the interface between the molten glass and the platinum member are permitted to be absorbed by an oxidation reaction in which SnO is oxidized to SnO2, under a condition where the molten glass is from 1,300 to 1,500° C.
Composition as represented by the mass percentage:
SiO2
58.4 to 66.0%,
Al2O3
15.3 to 22.0%,
B2O3
5.0 to 12.0%,
MgO
0 to 6.5%,
CaO
0 to 7.0%,
SrO
4 to 12.5%,
BaO
0 to 2.0%,
MgO + CaO + SrO + BaO
9.0 to 18.0%.
The present invention provides a sintered body with spacers, its production process and bonding method and a ceramic honeycomb filter, which enable to bond adjacent sintered bodies as they are aligned in the same direction at a time of forming a filter by bonding the sintered bodies and to carry out the bonding step automatically by a machine even if the sintered bodies have sintering deformation by e.g. sintering shrinkage. The sintered body with spacers comprises a sintered main body of column shape having both ends opening in a honeycomb shape and having a rectangular cross-section and spacers provided on side faces of the sintered main body, wherein the spacers are provided on at least two opposing side faces among four side faces of the sintered main body, and top faces of the spacers of the opposing side faces are parallel with each other. The sintered body with spacers is bonded with adjacent sintered body with spacers as the spacers are contact with each other.
B32B 3/12 - Layered products essentially comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products essentially having particular features of form characterised by a discontinuous layer, i.e. apertured or formed of separate pieces of material characterised by a layer of regularly-arranged cells whether integral or formed individually or by conjunction of separate strips, e.g. honeycomb structure
3/sec., and a laminate and coated product thereof. The fluorocopolymer is excellent in adhesion, heat resistance, weather resistance, stress cracking resistance and fuel barrier properties. The laminate is excellent in interlaminar bonding and fuel barrier properties. The coated product is excellent in heat resistance, chemical resistance, corrosion resistance, oil resistance, weather resistance, abrasion resistance and lubricating properties.
The present invention provides a low dielectric insulating film having low relative dielectric constant, high mechanical strength and high adhesion to substrates, i.e. a low dielectric constant insulating film having one-dimensional through channels from one surface to the other surface and having a relative dielectric constant between the relative dielectric constant of a matrix phase and 1, thus suitable for use as an interlayer film, wherein the film is formed by removing columnar phases from a composite film comprising many columnar phases one-dimensionally grown on the substrate and a matrix phase surrounding them.
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