A segmented stator for an electric motor comprises : a plurality of tooth segments arranged in a circular configuration, the tooth segments having body portions and front surfaces extending inward from the body portions; and wire wound on the body portions. A distance between adjacently positioned front surfaces of the tooth segments is less than a width of the wire. The wire wound on the body portions substantially fills space between adjacently positioned tooth segments.
An apparatus includes a platform configured to traverse a stationary base along a motion path; a drive coupled to the platform; and a movable arm assembly. The movable arm assembly includes a pivoting base connected to the drive, first and second linkages connected to the pivoting base, each linkage having links connected via rotary joints and each link having at least one end-effector. The platform is configured to traverse the stationary base along a motion path in two opposing directions and the drive and the movable arm assembly are configured to cause independent and simultaneous movement and trans fer of substrates from at least one of a first substrate holding area, a second substrate holding area, a third substrate holding area, or a fourth substrate holding area into or from a respective substrate workstation.
B25J 5/02 - Manipulators mounted on wheels or on carriages travelling along a guideway
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
An apparatus includes a drive; a movable arm having a base pivotally connected to the drive, first and second linkages, the first linkage having a first link rotatable on the base at a first rotary joint, a second link connected to the first link at a second rotary joint, and a third link connected to the second link at a third rotary joint, the third link having an end-effector, and the second linkage having a fourth link rotatable on the base at a fourth rotary joint, a fifth link connected to the fourth link at a fifth rotary joint, and a sixth link connected to the fifth link at a sixth rotary joint, the sixth link having another end-effector. The apparatus also includes a master controller coupled to the drive, the master controller being configured to control movements of the movable arm and the base relative to the drive.
B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
B25J 9/06 - Programme-controlled manipulators characterised by multi-articulated arms
B65G 49/07 - Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
4.
VACUUM-ENVIRONMENT ROBOT WITH INTEGRATED PAYLOAD GRIPPER
An apparatus includes a drive; a movable arm connected to the drive and having a first link rotatable about the drive at a first rotary joint, a first actuator configured to cause a rotation of the first link about the first rotary joint, at least one second link connected to the first link at a second rotary joint, at least one second actuator configured to cause a rotation of the second link about the second rotary joint, and at least one gripper on the second link, the gripper being configured to carry a payload. The gripper includes a dielectric substrate, at least one electrode disposed on the dielectric substrate, the electrode being configured to produce an attractive force on a surface of the electrode to attract the payload, and a main electronic module configured to apply a voltage to the electrode from a source of current.
An apparatus includes a drive unit; and an arm assembly- connected to the drive unit, where the arm assembly comprises a traversing platform having an end-effector configured to carry a payload located thereon; a linear actuation system configured to drive the traversing platform in a linear direction; and a magnetic support system comprising at least one guide attached to a frame of the arm assembly, a plurality of vertical actuators attached to the traversing platform, and a plurality of horizontal actuators attached to the traversing platform, the plurality of vertical actuators being configured, with the at least one guide, to move the traversing platform in a vertical direction relative to the linear direction, and the plurality of horizontal actuators being configured, with the at least one guide, to move the traversing platform in a horizontal direction relative to the linear direction.
An apparatus including a drive unit; and an arm assembly connected to the drive unit. The arm assembly includes an upper arm connected to a first drive shaft of the drive unit; a first set of forearms connected to a first end of the upper arm; a second set of forearms connected to a second end of the upper arm, where the second set has a different number of forearms than the first set; and a respective end effector connected to the forearms.
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
B25J 9/10 - Programme-controlled manipulators characterised by positioning means for manipulator elements
An apparatus including a robot drive; and a robot arm connected to the robot drive, where the robot arm includes a first link connected to the robot drive, a second link rotatably connected to the first link at a first rotatable connection, and an end effector rotatably connected to the second link at a second rotatable connection, The end effector includes a heat choke located between a substrate support area of the end effector and the second rotatable connection. At least one of the first rotatable connector or the second rotatable connection includes a rotary thermal coupling having interleaved members which are rotatable relative to each other.
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
B25J 11/00 - Manipulators not otherwise provided for
8.
CORE-SHELL PARTICLES AND COMPOSITE MATERIAL SYNTHESIZED THEREFROM
A system for producing a soft magnetic material having a core-shell structure includes a gas supply configured to supply at least one gas; and a furnace configured to receive the at least one gas. A flow of the at least one gas is configured to be varied to provide a shell on a particle in the furnace.
B22F 1/00 - Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
B22F 1/02 - Special treatment of metallic powder, e.g. to facilitate working, to improve properties; Metallic powders per se, e.g. mixtures of particles of different composition comprising coating of the powder
B22F 9/24 - Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
B82Y 30/00 - Nanotechnology for materials or surface science, e.g. nanocomposites
An apparatus includes a spindle platform; a traversing platform configured to move in a first direction; a lift system connected to the spindle platform and the traversing platform, the lift system configured to move the spindle platform in a second direction perpendicular to the first direction; a movable arm connected to the spindle platform, the movable arm including a first link connected to the spindle platform, a second link connected to the first link, and a third link connected to the second link, and a first actuator connected to the spindle platform and configured to cause a rotation of the first link, and a second actuator in the movable arm and configured to cause a rotation of the second link. The first actuator extends from the spindle platform into the first link to occupy a combined thickness of the spindle platform and the first link.
B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
B25J 3/02 - Manipulators of master-slave type, i.e. both controlling unit and controlled unit perform corresponding spatial movements involving a parallelogram coupling of the master and slave units
B25J 9/10 - Programme-controlled manipulators characterised by positioning means for manipulator elements
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
10.
VACUUM-ENVIRONMENT ROBOT WITH DISTRIBUTED ACTUATORS
An apparatus includes a drive; a movable arm connected to the drive, the movable arm comprising a first link connected to the drive at a shoulder, a second link connected to the first link at an elbow, a third link connected to the second link at a wrist, and a fourth link connected to the second link at the wrist; at least one first actuator located in the second link configured to cause a rotation of the third link about the wrist; and at least one second actuator located in the second link configured to cause a rotation of the fourth link about the wrist, One or more of a thermal management, a power distribution, or a communication is effected through the second link.
B25J 15/10 - Gripping heads having finger members with three or more finger members
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
An apparatus including a drive having motors and coaxial drive shafts; an arm assembly having a first arm and a second arm; and a controller, The first arm includes a first upper arm, a first forearm, a first end effector, and a first transmission, where the first transmission includes a non-circular pulley, and where the first upper arm and the first forearm have unequal effective lengths, The second arm includes a second upper arm, a second forearm, a second end effector, and a second transmission, where the second upper arm and the second forearm have substantially equal effective lengths. The controller is configured to cause the drive to extend and retract the arms to move an upper substrate and a lower substrate on the substrate holding areas such that the arm assembly and upper substrate do not travel over the lower substrate.
B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
An apparatus includes a first arm comprising an unequal-link linkage having a first end effector; a second arm comprising an equal-link linkage having a second end effector; and a drive unit coupled to the first arm and the second arm, the drive unit being configured to move the first arm and the second arm. The first end effector is asymmetric to the second end effector, The first end effector is angled relative to the second end effector such that a first substrate support section on the first end effector is not positioned over or under a second substrate support section on the second end effector.
B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
An apparatus including a first device configured to support a substrate thereon; a first transport having the first device connected thereto, where the first transport includes: rails or maglev guides; a magnetic system configured to vertically space the first device over the rails or maglev guides with a gap between the first device and the rails or maglev guides, where the magnetic system comprises a first electromagnetic actuator at a first corner of a first side of the first device, a second electromagnetic actuator at a second corner of the first side of the first device, and a third electromagnetic actuator at a second opposite side of the first device, where the third electromagnetic actuator is not located proximate a corner of three sides of the first device; and a linear actuator configured to move the first device along the rails or maglev guides.
An apparatus including at least one emitter configured to emit energy; at least one receiver configured to receive the emitted energy, where the at least one emitter is mounted on at least one of: a robot arm, an end effector of the robot arm, a substrate on the robot arm, or a substrate process module, where the at least one receiver is mounted on at least one of: the robot arm, the end effector of the robot arm, the substrate on the robot arm, or the substrate process module.
H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment
B25J 13/08 - Controls for manipulators by means of sensing devices, e.g. viewing or touching devices
B65G 49/07 - Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
An apparatus including a linear transport configured to move in a transport chamber along a straight path; a robot connected to the linear transport, where the robot includes a robot drive and a robot arm connected to the robot drive, where the robot arm is a dual-link arm having a first link connected to the robot drive and a second link forming an end effector for supporting a substrate thereon; a controller connected to the linear transport and to the robot drive, where the controller is configured to provide movement of the linear transport along the straight path at a same time as extension and retraction of the dual-link arm to thereby move the end effector into or out of a substrate process chamber or a substrate holding area while both the linear transport and the dual-link arm are moving.
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
B25J 5/02 - Manipulators mounted on wheels or on carriages travelling along a guideway
B65G 49/07 - Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
An apparatus including a first base plate, where the first base plate is configured to have at least one linear drive component and/or at least one power coupling component connected to a top side of the first base plate, where the first base plate is configured to be located inside a vacuum chamber; and a plurality of rails or transport guides on the top side of the first base plate. An end of the first base plate includes at least one alignment feature configured to align an end of the first base plate to an end of a second base plate, The first base plate is configured to provide, in combination with the second base plate, a structural platform inside the vacuum chamber for a robot drive to move in the vacuum chamber along the plurality of transport guides.
B60L 9/00 - Electric propulsion with power supply external to the vehicle
B60L 9/02 - Electric propulsion with power supply external to the vehicle using dc motors
B25J 11/00 - Manipulators not otherwise provided for
H01L 21/00 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
17.
DIRECT-DRIVE FLEXURE-MECHANISM VACUUM CONTROL VALVE
A valve including a first member including a fluid flow aperture therethrough; a second member movably connected to the first member between an open position and a closed position relative to the fluid flow aperture; at least one electromagnetic actuator connected between the first member and the second member, where the at least one electromagnetic actuator is configured to move the second member between the open position and the closed position, where the at least one electromagnetic actuator includes a first electromagnetic actuator having a stationary portion connected to the first member and a movable portion connected to the second member; and at least one mechanical flexure connected between the first member and the movable member of the actuator, where the at least one mechanical flexure constrains motion of the movable member to along a substantially straight line.
F16K 1/00 - Lift valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
F16K 3/00 - Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
F16K 31/02 - Operating means; Releasing devices magnetic
F16K 31/06 - Operating means; Releasing devices magnetic using a magnet
Disclosed herein is a method. The method includes moving a payload through a motion path proximate at least one sensor. Detecting edges of the payload such that at least three points on at least two edges are detected. Capturing a position when the at least one sensor detects at least one edge of the payload.
B25J 13/08 - Controls for manipulators by means of sensing devices, e.g. viewing or touching devices
G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness
G01B 11/03 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness by measuring coordinates of points
G01B 11/04 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness specially adapted for measuring length or width of objects while moving
19.
MATERIAL-HANDLING ROBOT WITH MULTIPLE END-EFFECTORS
An apparatus including a robot drive having motors and coaxial drive shafts connected to the motors; and a robot arm connected to the robot drive. The robot arm includes two upper arms, a first set of forearms connected to a first one of the upper arms, a second set of forearms connected to a second one of the upper arms and end effectors connected to respective ones of the forearms. The first and second upper arms are connected to respective first and second ones of the coaxial drive shafts. The first set of the forearms is mounted on the first upper arm and connected to a third one of the coaxial drive shafts by respective first and second drive belt assemblies. The second set of the forearms is mounted to the second upper arm and connected to a fourth one of the coaxial drive shafts by respective third and fourth drive belt assemblies.
B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
B25J 9/06 - Programme-controlled manipulators characterised by multi-articulated arms
An apparatus including a plurality of robot arm links movably connected to one another, where a first one of the robot arm links includes a frame, where the frame has a first end movably connected onto a second one of the robot arm links; and at least one vibration damper arrangement on the frame of the first robot arm link, where the at least one vibration damper arrangement includes at least one viscoelastic element connected to the frame of the first robot arm link by a connection such that, as the frame of the first robot arm link experiences vibrations r the at least one viscoelastic element dampens the vibrations in the frame of the first robot arm link based upon viscoelasticity and the connection of the at least one viscoelastic element to the frame of the first robot arm link.
B25J 19/00 - Accessories fitted to manipulators, e.g. for monitoring, for viewing; Safety devices combined with or specially adapted for use in connection with manipulators
A material comprises at least one layer of a plurality of domains, each domain being flattened in a first direction and elongated in a second direction normal to the first direction. The flattened and elongated domains define an anisotropic microstructure that facilitates a magnetic flux flow in the second direction.
H01F 41/02 - Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils or magnets
H02K 1/06 - DYNAMO-ELECTRIC MACHINES - Details of the magnetic circuit characterised by the shape, form or construction
H02K 21/24 - Synchronous motors having permanent magnets; Synchronous generators having permanent magnets with stationary armatures and rotating magnets with magnets axially facing the armatures, e.g. hub-type cycle dynamos
An apparatus including a frame, an optical sensor connected to the frame, and an environment separation barrier. The frame is configured to be attached to a housing of a motor assembly proximate an aperture which extends through the housing. The optical sensor comprises a camera. The environment separation barrier is configured to be connected to the housing at the aperture, where the environment separation barrier is at least partially transparent and located relative to the camera to allow the camera to view an image inside the housing through the environment separation barrier and the aperture.
B25J 13/08 - Controls for manipulators by means of sensing devices, e.g. viewing or touching devices
H02K 5/10 - Casings or enclosures characterised by the shape, form or construction thereof with arrangements for protection from ingress, e.g. of water or fingers
H02K 5/22 - Auxiliary parts of casings not covered by groups , e.g. shaped to form connection boxes or terminal boxes
H02K 11/21 - Devices for sensing speed or position, or actuated thereby
An apparatus having a drive unit having a first drive axis rotatable about a first axis of rotation and a second drive axis rotatable about a second axis of rotation, the second drive axis being coaxial with and partially within the first drive axis and axially rotatable within the first drive axis. A robot arm has an upper arm connected to the drive unit at the first drive axis, a forearm coupled to the upper arm, the forearm being coupled to the upper arm at a first rotary joint and rotatable about the first rotary joint, the first rotary joint being actuatable by a first band arrangement coupled to the second drive axis, and an end effector coupled to the forearm, the end effector being coupled to the forearm at a second rotary joint and rotatable about the second rotary joint, the second rotary joint being actuatable by a second band arrangement coupled to the first rotary joint. The second band arrangement is configured to provide a variable transmission ratio.
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
B25J 9/10 - Programme-controlled manipulators characterised by positioning means for manipulator elements
An apparatus comprises a first induction section comprising a first core and a first coil on the first core. A second induction section comprises a second core and a second coil on the second core. The first core comprises rail extensions, where at least two of the rail extensions extend from opposite ends of the first core. The second core comprises shoe portions located at respective ones of the rail extensions, where a gap is provided between each of the rail extensions and respective ones of the shoe portion. The second induction section is configured to move relative to the first induction section in a path along the extensions. The first induction section is configured to induce current in the second induction section, including when the second core moves relative to the first core along the extensions, to provide a contactless induction coupling between the first induction section and the second induction section.
An apparatus includes a motor having a rotor; and a stator, where the rotor is located at least partially in a rotor receiving area of the stator, where the stator includes at least one coil winding and teeth, where the at least one coil winding is located on at least some of the teeth, where the teeth include a first set of the teeth and a second set of the teeth, where the teeth of the first set of teeth are longer in a radial direction from the rotor receiving area than the teeth of the second set of teeth.
An apparatus including at least one drive; a first robot arm having a first upper arm, a first forearm and a first end effector. The first upper arm is connected to the at least one drive at a first axis of rotation. A second robot arm has a second upper arm, a second forearm and a second end effector. The second upper arm is connected to the at least one drive at a second axis of rotation which is spaced from the first axis of rotation. The first and second robot arms are configured to locate the end effectors in first retracted positions for stacking substrates located on the end effectors at least partially one above the another. The first and second robot arms are configured to extend the end effectors from the first retracted positions in a first direction along parallel first paths located at least partially directly one above the other.
B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
27.
ROBOT ADAPTIVE PLACEMENT SYSTEM WITH END-EFFECTOR POSITION ESTIMATION
A method including, based at least partially upon a command transmission to at least one motor of a robot, estimating deflection for at least one member of the robot during movement of the robot; based at least partially upon the estimated deflection, determining calculated end effector coordinates for an end effector of the robot; and based at least partially upon the calculated end effector coordinates, adjusting movement of the robot for placing a substrate, located on the robot, at a desired location.
G06F 19/00 - Digital computing or data processing equipment or methods, specially adapted for specific applications (specially adapted for specific functions G06F 17/00;data processing systems or methods specially adapted for administrative, commercial, financial, managerial, supervisory or forecasting purposes G06Q;healthcare informatics G16H)
An apparatus including a housing; a motor having a stator and a rotor, where the stator is connected to the housing; an environment barrier extending between the stator and the rotor; and a sealing system connecting the environment barrier with the housing. The sealing system includes a first seal interface and a second seal interface. The first seal interface connects to the housing at a first diameter which is at least partially less than or equal to an inner diameter of the stator. The second seal interface connects to the housing at a second diameter which is at least partially greater than or equal to an outer diameter of the stator.
H02K 5/128 - Casings or enclosures characterised by the shape, form or construction thereof specially adapted for operating in liquid or gas using air-gap sleeves or air-gap discs
An apparatus including a stator configured to be stationarily connected to a housing; and a rotor configured to have a robot arm connected thereto. The rotor includes a shaft and an robot arm mount adjustably connected to the shaft. The stator and the rotor include mechanical reference locators to temporarily stationarily locate the robot arm mount to the stator for subsequently stationarily fixing the robot arm mount to the shaft.
An apparatus including a first device configured to support at least one substrate thereon; and a first transport having the device connected thereto. The transport is configured to carry the device. The transport includes a plurality of supports which are movable relative to one another along a linear path; at least one magnetic bearing which at least partially couples the supports to one another. A first one of the magnetic bearings includes a first permanent magnet and a second magnet. The first permanent magnet is connected to a first one of the supports. A magnetic field adjuster is connected to the first support which is configured to move the first permanent magnet and/or vary influence of a magnetic field of the first permanent magnet relative to the second magnet.
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
31.
STRUCTURES AND METHODS UTILIZING STRUCTURED MAGNETIC MATERIAL
A composition comprises a plurality of iron-containing particles and an insulating layer on the iron-containing particles. The iron-containing particles define an aggregate of permeable micro-domains separated by insulation boundaries. A method comprises heating an iron-aluminum alloy particle, thermally spraying the iron-aluminum particle', causing the iron-aluminum particle to oxidize, and depositing the oxidized iron-aluminum particle on a substrate.
C23C 8/06 - Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
An apparatus including a drive; a movable arm assembly; a plurality of sets of end effectors; and a controller. The end effectors are connected to the drive by the movable arm assembly. A first one of the sets of end effectors includes at least two of the end effectors, where the drive and the movable arm assembly are configured to move the at least two end effectors substantially in unison from a retracted position towards an extended position towards two different respective target locations. The at least two end effectors are at least partially independently movable relative to each other on the moveable arm assembly. The controller is configured to detect an offset of respective substrates on the at least two end effectors and adjust movement of the at least two end effectors relative to each other prior to placement of the substrates at the respective target locations.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
33.
SYSTEM AND METHOD FOR MAKING A STRUCTURED MAGNETIC MATERIAL WITH INTEGRATED PARTICLE INSULATION
A system for forming a soft magnetic bulk material of a predetermined shape from a magnetic material and a source of insulating material, including a heating device; a deposition device; a support, and a mask configured as a negative of at least a portion of the predetermined shape. The heating device heats the magnetic material to form particles having a softened state and wherein the deposition device deposits successive layers of particles of the magnetic material in the softened state on the support with the mask located between the deposition device and the support. The mask is indexed to a position relative to the support upon deposition of the successive layers. The mask selectively blocks the successive layers of particles of the magnetic material in the softened state from being deposited on the support forming the soft magnetic bulk material of a predetermined shape on the support.
A transport apparatus including a drive; a first arm connected to the drive, where the first arm includes a first link, a second link and an end effector connected in series with the drive, where the first link and the second link have different effective lengths; and a system for limiting rotation of the end effector relative to the second link to provide substantially only straight movement of the end effector relative to the drive when the first arm is extended or retracted.
B25J 9/10 - Programme-controlled manipulators characterised by positioning means for manipulator elements
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
A system for operation of a robot including a substantially transparent display configured such that an operator can see a portion of the robot and data and/or graphical information associated with the operation of a robot. Preferably, a controller in communication with the robot and the transparent display is configured to allow the operator to control the operation of the robot.
An apparatus including a frame, a first position sensor, a drive and a chamber. The frame has at least three members including at least two links forming a movable arm and an end effector. The end effector and the links are connected by movable joints. The end effector is configured to support a substrate thereon. The first position sensor is on the frame proximate a first one of the joints. The first position sensor is configured to sense a position of two of the members relative to each other. The drive is connected to the frame. The drive is configured to move the movable arm. The frame is located in the chamber, and the drive extends through a wall in the chamber.
A method of transporting a substrate with a substrate support, the method includes defining a frictional breakaway force between the substrate and the substrate support in a horizontal plane, moving the substrate in the horizontal plane along a horizontal trajectory, moving the substrate in a vertical direction along a vertical trajectory simultaneously while moving the substrate in the horizontal plane, and wherein the horizontal trajectory is determined based on the acceleration profile of the vertical trajectory and wherein the horizontal trajectory prevents the moving of the substrate from overcoming the coefficient of friction in the horizontal plane.
A substrate transport apparatus including a drive section and a first movable arm assembly. The drive section includes a first motor. The first motor includes a stator and a passive rotor. The first movable arm assembly is connected to the first motor. The substrate transport apparatus is configured for the first movable arm assembly to be positionable in a vacuum chamber with the passive rotor being in communication with an environment inside the vacuum chamber.
B66C 23/00 - Cranes comprising essentially a beam, boom or triangular structure acting as a cantilever and mounted for translatory or swinging movements in vertical or horizontal planes or a combination of such movements, e.g. jib cranes, derricks or tower cranes
A system for position sensing includes an incremental track including a plurality of sectors and a measurement subsystem. The measurement subsystem includes at least two differential read-heads each having at least one primary coil and at least two differential secondary coils, the at least two differential secondary coils of one of the at least two differential read-heads configured to generate output signals having their amplitudes modulated by the sectors of the incremental track and the at least two differential secondary coils of the other of said two differential read-heads configured to generate output signals having their amplitudes modulated by the sectors of the incremental track.
A system for forming a bulk material having insulated boundaries from a metal material and a source of an insulating material is provided. The system includes a heating device, a deposition device, a coating device, and a support configured to support the bulk material. The heating device heats the metal material to form particles having a softened or molten state and the coating device coats the metal material with the insulating material from the source and the deposition device deposits particles of the metal material in the softened or molten state on the support to form the bulk material having insulated boundaries.
C23C 8/06 - Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
A bulk material formed on a surface, the bulk material including a plurality of adhered domains of metal material, substantially all of the domains of the plurality of domains of metal material separated by a predetermined layer of high resistivity insulating material. A first portion of the plurality of domains forms a surface. A second portion of the plurality of domains includes successive domains of metal material progressing from the first portion. Substantially all of the domains in the successive domains each include a first surface and a second surface, the first surface opposing the second surface, the second surface conforming to a shape of progressed domains, and a majority of the domains in the successive domains in the second portion having the first surface comprising a substantially convex surface and the second surface comprising one or more substantially concave surfaces.
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