- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/20 - Exposure; Apparatus therefor
Patent holdings for IPC class G03F 7/20
Total number of patents in this class: 21277
10-year publication summary
|
1302
|
1544
|
1684
|
1812
|
1994
|
2157
|
1994
|
1703
|
1807
|
1485
|
| 2014 | 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 6663 |
3992 |
| Carl Zeiss SMT GmbH | 2542 |
1742 |
| Nikon Corporation | 7269 |
1316 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 34962 |
1118 |
| FUJIFILM Corporation | 26437 |
942 |
| Shin-Etsu Chemical Co., Ltd. | 5017 |
451 |
| Canon Inc. | 36613 |
401 |
| Applied Materials, Inc. | 16117 |
371 |
| ASML Holding N.V. | 553 |
365 |
| KLA-Tencor Corporation | 2581 |
356 |
| Gigaphoton Inc. | 1084 |
329 |
| JSR Corporation | 2488 |
322 |
| Samsung Electronics Co., Ltd. | 127295 |
315 |
| Tokyo Ohka Kogyo Co., Ltd. | 1475 |
291 |
| Carl Zeiss SMT AG | 332 |
286 |
| Tokyo Electron Limited | 11305 |
277 |
| KLA Corporation | 1138 |
192 |
| Boe Technology Group Co., Ltd. | 34148 |
164 |
| International Business Machines Corporation | 61980 |
134 |
| Nissan Chemical Corporation | 1662 |
133 |
| Other owners | 7780 |