- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/004 - Photosensitive materials
Patent holdings for IPC class G03F 7/004
Total number of patents in this class: 8808
10-year publication summary
|
521
|
557
|
564
|
558
|
572
|
622
|
636
|
638
|
706
|
553
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 27478 |
1811 |
| Shin-Etsu Chemical Co., Ltd. | 5271 |
531 |
| Tokyo Ohka Kogyo Co., Ltd. | 1499 |
504 |
| JSR Corporation | 2480 |
501 |
| Sumitomo Chemical Company, Limited | 8880 |
288 |
| Toray Industries, Inc. | 6737 |
240 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 37480 |
167 |
| Hitachi Chemical Company, Ltd. | 2424 |
158 |
| Rohm and Haas Electronic Materials LLC | 611 |
137 |
| Samsung SDI Co., Ltd. | 6923 |
134 |
| LG Chem, Ltd. | 17493 |
114 |
| Taiyo Ink Mfg. Co., Ltd. | 216 |
112 |
| Samsung Electronics Co., Ltd. | 135388 |
104 |
| Mitsubishi Chemical Corporation | 4331 |
104 |
| Mitsubishi Gas Chemical Company, Inc. | 3259 |
96 |
| Merck Patent GmbH | 5841 |
82 |
| Nissan Chemical Industries, Ltd. | 1788 |
81 |
| Resonac Corporation | 2413 |
78 |
| Tokyo Electron Limited | 11848 |
77 |
| Central Glass Company, Limited | 1234 |
67 |
| Other owners | 3422 |