G03F 1/00
|
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof |
G03F 1/02
|
by photographic processes for production of originals simulating relief |
G03F 1/04
|
by montage processes |
G03F 1/06
|
from printing surfaces |
G03F 1/08
|
Originals having inorganic imaging layers, e.g. chrome masks (G03F 1/12 takes precedence);; |
G03F 1/10
|
by exposing and washing out pigmented or coloured organic layers; by colouring macromolecular patterns |
G03F 1/12
|
by exposing silver-halide-containing photosensitive materials or diazo-type photosensitive materials |
G03F 1/14
|
Originals characterised by structural details, e.g. supports, cover layers, pellicle rings |
G03F 1/16
|
Originals having apertures, e.g. for corpuscular lithography |
G03F 1/20
|
Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof |
G03F 1/22
|
Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof |
G03F 1/24
|
Reflection masks; Preparation thereof |
G03F 1/26
|
Phase shift masks [PSM]; PSM blanks; Preparation thereof |
G03F 1/28
|
Phase shift masks [PSM]; PSM blanks; Preparation thereof with three or more diverse phases on the same PSM; Preparation thereof |
G03F 1/29
|
Rim PSM or outrigger PSM; Preparation thereof |
G03F 1/30
|
Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof |
G03F 1/32
|
Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof |
G03F 1/34
|
Phase-edge PSM, e.g. chromeless PSM; Preparation thereof |
G03F 1/36
|
Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes |
G03F 1/38
|
Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof |
G03F 1/40
|
Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate |
G03F 1/42
|
Alignment or registration features, e.g. alignment marks on the mask substrates |
G03F 1/44
|
Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales |
G03F 1/46
|
Antireflective coatings |
G03F 1/48
|
Protective coatings |
G03F 1/50
|
Mask blanks not covered by groups ; Preparation thereof |
G03F 1/52
|
Reflectors |
G03F 1/54
|
Absorbers, e.g. opaque materials |
G03F 1/56
|
Organic absorbers, e.g. photo-resists |
G03F 1/58
|
Absorbers, e.g. opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers |
G03F 1/60
|
Substrates |
G03F 1/62
|
Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof |
G03F 1/64
|
Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material thereof |
G03F 1/66
|
Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof |
G03F 1/68
|
Preparation processes not covered by groups |
G03F 1/70
|
Adapting basic layout or design of masks to lithographic process requirements, e.g. second iteration correction of mask patterns for imaging |
G03F 1/72
|
Repair or correction of mask defects |
G03F 1/74
|
Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam |
G03F 1/76
|
Patterning of masks by imaging |
G03F 1/78
|
Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam |
G03F 1/80
|
Etching |
G03F 1/82
|
Auxiliary processes, e.g. cleaning |
G03F 1/84
|
Inspecting |
G03F 1/86
|
Inspecting by charged particle beam [CPB] |
G03F 1/88
|
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for producing originals simulating relief |
G03F 1/90
|
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes |
G03F 1/92
|
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces |
G03F 3/00
|
Colour separation; Correction of tonal value |
G03F 3/02
|
Colour separation; Correction of tonal value by retouching |
G03F 3/04
|
Colour separation; Correction of tonal value by photographic means |
G03F 3/06
|
Colour separation; Correction of tonal value by photographic means by masking |
G03F 3/08
|
Colour separation; Correction of tonal value by photoelectric means |
G03F 3/10
|
Checking the colour or tonal value of separation negatives or positives |
G03F 5/00
|
Screening processes; Screens therefor |
G03F 5/02
|
Screening processes; Screens therefor by projecting methods |
G03F 5/04
|
Screening processes; Screens therefor by projecting methods changing the screen effect |
G03F 5/06
|
Screening processes; Screens therefor by projecting methods changing the diaphragm effect |
G03F 5/08
|
Screening processes; Screens therefor by projecting methods using line screens |
G03F 5/10
|
Screening processes; Screens therefor by projecting methods using cross-line screens |
G03F 5/12
|
Screening processes; Screens therefor by projecting methods using other screens, e.g. granulated screen |
G03F 5/14
|
Screening processes; Screens therefor by contact methods |
G03F 5/16
|
Screening processes; Screens therefor by contact methods using grey half-tone screens |
G03F 5/18
|
Screening processes; Screens therefor by contact methods using colour half-tone screens |
G03F 5/20
|
Screening processes; Screens therefor using screens for gravure printing |
G03F 5/22
|
Screening processes; Screens therefor combining several screens; Elimination of moire |
G03F 5/24
|
Screening processes; Screens therefor by multiple exposure, e.g. combined processes for line photo and screen |
G03F 7/00
|
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor |
G03F 7/04
|
Chromates |
G03F 7/06
|
Silver salts |
G03F 7/07
|
Silver salts used for diffusion transfer |
G03F 7/008
|
Azides |
G03F 7/09
|
Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers |
G03F 7/11
|
Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers |
G03F 7/12
|
Production of screen printing forms or similar printing forms, e.g. stencils |
G03F 7/14
|
Production of collotype printing forms |
G03F 7/16
|
Coating processes; Apparatus therefor |
G03F 7/18
|
Coating curved surfaces |
G03F 7/20
|
Exposure; Apparatus therefor |
G03F 7/021
|
Macromolecular diazonium compounds; Macromolecular additives, e.g. binders |
G03F 7/22
|
Exposing sequentially with the same light pattern different positions of the same surface |
G03F 7/23
|
Automatic means therefor |
G03F 7/24
|
Curved surfaces |
G03F 7/025
|
Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds |
G03F 7/26
|
Processing photosensitive materials; Apparatus therefor |
G03F 7/027
|
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds |
G03F 7/28
|
Processing photosensitive materials; Apparatus therefor for obtaining powder images |
G03F 7/029
|
Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur |
G03F 7/30
|
Imagewise removal using liquid means |
G03F 7/031
|
Organic compounds not covered by group |
G03F 7/32
|
Liquid compositions therefor, e.g. developers |
G03F 7/033
|
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers |
G03F 7/34
|
Imagewise removal by selective transfer, e.g. peeling away |
G03F 7/035
|
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes |
G03F 7/36
|
Imagewise removal not covered by groups , e.g. using gas streams, using plasma |
G03F 7/037
|
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides |
G03F 7/38
|
Treatment before imagewise removal, e.g. prebaking |
G03F 7/039
|
Macromolecular compounds which are photodegradable, e.g. positive electron resists |
G03F 7/40
|
Treatment after imagewise removal, e.g. baking |
G03F 7/42
|
Stripping or agents therefor |
G03F 7/075
|
Silicon-containing compounds |
G03F 7/085
|
Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives |
G03F 7/095
|
Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer |
G03F 7/105
|
Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images |
G03F 7/115
|
Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing |
G03F 7/207
|
Means for focusing, e.g. automatically |
G03F 7/213
|
Exposing with the same light pattern different positions of the same surface at the same time |
G03F 9/00
|
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically |
G03F 9/02
|
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically combined with means for automatic focusing |